A reticle transfer arm and semiconductor apparatus

Abstract

The application provides a photomask conveying arm and a semiconductor device, wherein the photomask conveying arm comprises a fork arm body, an illumination unit and a light receiving unit. The illumination unit is installed on the fork arm body in a form of adjustable incident angle; the light receiving unit is installed on the fork arm body and is used for collecting light signals on the surface of the photomask; the photomask conveying arm has a bright field detection mode and a dark field detection mode; in the dark field detection mode, the incident angle of the illumination unit is in a first angle interval, the specular reflection light on the surface of the photomask deviates from the receiving field of view of the light receiving unit, and the light receiving unit collects the scattering light signals generated by the particles; in the bright field detection mode, the incident angle of the illumination unit is in a second angle interval, and the specular reflection light on the surface of the photomask enters the receiving field of view of the light receiving unit. The photomask conveying arm of the application realizes the bright-dark field double detection mode through the illumination unit with adjustable incident angle, and considers the micro-particle detection and the macroscopic defect identification.

Description

Technical Field

[0001] This application relates to the field of semiconductor manufacturing equipment technology, and more specifically, to a photomask conveying arm and semiconductor equipment. Background Technology

[0002] In semiconductor manufacturing processes, the photomask is the core pattern carrier in the photolithography process, and its surface cleanliness directly determines the yield of wafer photolithography and product performance. The transfer of photomasks between different process equipment is usually accomplished by mechanical transfer forks. The forks are in direct contact with the photomask surface. If microparticles adhere to the photomask contact surface, it may not only cause scratches on the photomask surface, but also contaminate the fork itself, thereby causing continuous cross-contamination of multiple subsequent photomasks, resulting in the scrapping of batch products.

[0003] Currently, there are technical solutions that integrate optical particle detection devices onto semiconductor conveying robotic arms, typically employing fixedly arranged optical transmitting and receiving components. While such solutions can achieve basic particle screening functions in specific detection scenarios, their detection modes are relatively limited due to the fixed optical path angle, making it difficult to adapt to the diverse detection needs of photomask surfaces. The requirements for optical path incident angle and imaging mode differ significantly between microparticle detection on ultra-smooth quartz surfaces and surface defect screening for macroscopic scratches and adhesive spots. A single fixed-angle detection architecture cannot simultaneously achieve a high detection rate for microparticles and clear identification of macroscopic defects, making it difficult to balance the applicable detection scenarios and detection accuracy. Utility Model Content

[0004] The purpose of this application is to provide a photomask conveying arm and a semiconductor device, wherein the photomask conveying arm realizes a dual detection mode of bright and dark fields by setting an illumination unit with an adjustable incident angle, which takes into account both microparticle detection and macroscopic defect identification.

[0005] In one aspect, this application provides a photomask conveying arm, including a fork arm body, an illumination unit, and a light receiving unit.

[0006] The illumination unit is mounted on the fork arm body with an adjustable incident angle; the light receiving unit is mounted on the fork arm body to collect light signals from the photomask surface; the photomask conveying arm has a bright field detection mode and a dark field detection mode; in the dark field detection mode, the incident angle of the illumination unit is in the first angle range, the specular reflected light from the photomask surface deviates from the receiving field of view of the light receiving unit, and the light receiving unit collects the scattered light signal generated by the particles; in the bright field detection mode, the incident angle of the illumination unit is in the second angle range, and the specular reflected light from the photomask surface enters the receiving field of view of the light receiving unit.

[0007] In one feasible solution, a first angle adjustment mechanism is also included, through which the lighting unit is mounted on the fork arm body. The first angle adjustment mechanism is used to adjust the incident angle of the light emitted from the lighting unit.

[0008] In one feasible solution, the light receiving unit is fixedly tilted and its receiving optical axis forms a preset angle with the normal of the photomask surface; in bright field detection mode, the incident angle of the illumination unit is adjusted to match the preset angle so that the specular reflected light enters the light receiving unit along the receiving optical axis.

[0009] In one feasible solution, a second angle adjustment mechanism is also included, through which the light receiving unit is mounted on the fork arm body. The second angle adjustment mechanism is used to adjust the receiving angle of the receiving field of view of the light receiving unit.

[0010] In one feasible scheme, in dark field detection mode, the angle between the emitted light from the illumination unit and the surface of the photomask is less than or equal to 15°, forming a low-angle grazing dark field optical path.

[0011] In one feasible solution, the fork arm body is provided with a support plane, and a recessed groove is provided on the support plane. The lighting unit and the light receiving unit are both arranged in the recessed groove, and neither the lighting unit nor the light receiving unit exceeds the support plane.

[0012] In one feasible solution, a first linear mechanism and a second linear mechanism are also included, both installed in a recessed groove along a straight line; a first angle adjustment mechanism is installed on the first linear mechanism, and a second angle adjustment mechanism is installed on the second linear mechanism; the first linear mechanism is used to drive the first angle adjustment mechanism to move, and the second linear mechanism is used to drive the second angle adjustment mechanism to move, so as to change the distance between the lighting unit and the light receiving unit.

[0013] In one feasible embodiment, a rotary drive mechanism is further included, connected to the fork arm body, for driving the fork arm body to rotate about a rotation axis. The rotation axis is parallel to the surface of the fork arm body used to support the photomask, and the rotation axis coincides with the rotation axis of the output end of the rotary drive mechanism.

[0014] Secondly, this application provides a semiconductor device, including a process cavity, a photomask transfer arm, and a photomask buffer device.

[0015] The photomask conveying arm and the photomask buffer device are disposed in the process chamber. The photomask conveying arm is the aforementioned photomask conveying arm. The photomask buffer device is used to accommodate several photomasks, and a predetermined distance is reserved between adjacent photomasks for the photomask conveying arm to enter.

[0016] Compared with the prior art, the beneficial effects of this application include at least the following: When the photomask conveying arm of this application is in operation, it can switch between dark field detection mode and bright field detection mode by adjusting the incident angle of the illumination unit to adapt to different photomask surface detection requirements. After the detection light emitted from the illumination unit illuminates the photomask surface, depending on the incident angle, the specular reflected light from the photomask surface is either deviating from or entering the receiving field of view of the light receiving unit, corresponding to two different imaging detection mechanisms.

[0017] In dark-field detection mode, the incident angle of the illumination unit is within the first angle range. The specular reflection light generated by the smooth surface of the photomask deviates from the receiving field of view of the light receiving unit, and the light receiving unit can only collect the scattered light signal generated by the surface particles. In this mode, the background light signal of the smooth substrate is weak, which helps to reduce the detection background noise of the ultra-smooth quartz surface, improve the detection sensitivity of small particles, meet the high-precision cleanliness screening requirements of the photomask contact surface, and reduce the risk of continuous cross-contamination caused by particle contamination of the fork arm to a certain extent.

[0018] In bright-field detection mode, adjusting the incident angle of the illumination unit to the second angle range allows specular reflection light generated on the photomask surface to enter the receiving field of view of the light receiving unit, which can then collect the complete surface reflection light signal. In this mode, macroscopic scratches, adhesive spots, pits, and other morphological defects on the photomask surface will form identifiable contrast signals due to differences in reflectivity. This helps supplement the detection dimensions of dark-field mode, enabling the identification of multiple types of defects on the photomask surface and expanding the applicability of the conveyor arm detection function.

[0019] The above solution achieves dual-mode detection by setting an adjustable lighting unit on the fork arm body and combining it with a light receiving unit. It eliminates the need for multiple independent detection modules, which helps control the overall size and weight of the fork arm, adapts to the narrow conveying operation space in semiconductor production lines, and balances the detection accuracy of small particles with the ability to identify macroscopic defects, thus helping to balance detection performance and equipment integration costs. Attached Figure Description

[0020] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this application and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0021] Figure 1 This is a side view schematic diagram of a photomask conveyor arm shown in an embodiment of this application.

[0022] Figure 2For the first type of photomask transmission arm in bright field detection state along Figure 1 Cross-sectional view along the AA direction.

[0023] Figure 3 For the first type of photomask conveyor arm in dark field detection state, along Figure 1 Cross-sectional view along the AA direction.

[0024] Figure 4 For the second type of photomask conveyor arm in bright field detection state along Figure 1 Cross-sectional view along the AA direction.

[0025] Figure 5 For the second type of photomask conveyor arm in dark field detection state along Figure 1 Cross-sectional view along the AA direction Figure 1 .

[0026] Figure 6 For the second type of photomask conveyor arm in dark field detection state along Figure 1 Cross-sectional view along the AA direction Figure 2 .

[0027] Figure 7 For the third type of photomask transmission arm along Figure 1 Cross-sectional view along the AA direction.

[0028] Figure 8 This is a schematic diagram of the fork arm body of a photomask conveyor arm after it has been flipped, as shown in an embodiment of this application.

[0029] Figure 9 This is a schematic diagram of a semiconductor device shown in an embodiment of this application.

[0030] In the diagram: 1. Photomask conveying arm; 11. Fork arm body; 101. Supporting plane; 102. Concealed groove; 12. Illumination unit; 13. Light receiving unit; 14. First angle adjustment mechanism; 15. Second angle adjustment mechanism; 16. First linear mechanism; 17. Second linear mechanism; 18. Rotation drive mechanism; 2. Photomask buffer device; 3. Process cavity; 4. Photomask; M. Particulate contaminant; Z. Rotation axis. Detailed Implementation

[0031] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. The components of the embodiments of this application described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0032] Therefore, the following detailed description of the embodiments of this application provided in the accompanying drawings is not intended to limit the scope of the claimed application, but merely to illustrate selected embodiments of the application. All other embodiments obtained by those skilled in the art based on the embodiments of this application without inventive effort are within the scope of protection of this application.

[0033] It should be noted beforehand that, in order to more intuitively demonstrate the particulate contaminants on the photomask surface, Figures 2 to 8 The particulate pollutant M is drawn at a relatively exaggerated size. This does not represent the actual size ratio of the particulate pollutant, nor does it constitute a limitation on the actual size, distribution density, or form of the particulate pollutant. The attached figure is only used to illustrate the detection principle.

[0034] like Figures 1 to 3 As shown, this embodiment first provides a photomask conveying arm 1, including a fork arm body 11, an illumination unit 12, and a light receiving unit 13.

[0035] The illumination unit 12 is mounted on the fork arm body 11 with an adjustable incident angle, and the light receiving unit 13 is mounted on the fork arm body 11 to collect light signals from the photomask surface. The photomask conveying arm has a bright field detection mode and a dark field detection mode.

[0036] In dark field detection mode, the incident angle of the illumination unit 12 is in the first angle range, the specular reflected light on the surface of the photomask deviates from the receiving field of view of the light receiving unit 13, and the light receiving unit 13 collects the scattered light signal generated by the particles.

[0037] In bright field detection mode, the incident angle of the illumination unit 12 is in the second angle range, and the specular reflected light from the surface of the photomask enters the receiving field of view of the light receiving unit 13.

[0038] It should be noted that the light-emitting side of the illumination unit 12 is generally provided with a collimating lens to converge the diverging light into a parallel narrow beam, and the light-receiving unit 13 is provided with a focusing lens and an aperture stop in sequence on the light-incident side.

[0039] In this embodiment, the photomask conveying arm can switch between dark field detection mode and bright field detection mode by adjusting the incident angle of the illumination unit 12 during operation to adapt to different photomask surface detection requirements. After the detection light emitted from the illumination unit 12 illuminates the surface of the photomask 4, depending on the different incident angles, the specular reflection light on the photomask surface is either deviating from or entering the receiving field of view of the light receiving unit 13, thus forming two different imaging detection mechanisms.

[0040] See Figure 3When in dark field detection mode, the incident angle of illumination unit 12 is within the first angle range. The specular reflection light generated by the smooth surface of the photomask deviates from the receiving field of view of light receiving unit 13, and light receiving unit 13 can only collect the scattered light signal generated by surface particles. In this mode, the background light signal of the smooth substrate is weak, which helps to reduce the detection background noise of the ultra-smooth quartz surface, improve the detection sensitivity of small particles, meet the high-precision cleanliness screening requirements of the photomask contact surface, and reduce the risk of continuous cross-contamination caused by particle contamination of the fork arm to a certain extent.

[0041] See Figure 2 When in bright-field detection mode, the incident angle of the illumination unit 12 is adjusted to the second angle range. The specular reflected light generated on the photomask surface enters the receiving field of view of the light receiving unit 13, which can collect the complete surface reflected light signal. In this mode, macroscopic scratches, adhesive spots, pits, and other morphological defects on the photomask surface will form identifiable contrast signals due to differences in reflection characteristics. This helps to supplement the detection dimensions of the dark-field mode, enabling the identification of multiple types of defects on the photomask surface and expanding the applicability of the conveyor arm detection function.

[0042] The above solution achieves dual-mode detection by setting an adjustable lighting unit 12 on the fork arm body 11 and cooperating with the light receiving unit 13. It eliminates the need to add multiple independent detection modules, which helps to control the overall size and weight of the fork arm, adapts to the narrow conveying operation space in the semiconductor production line, and takes into account the accuracy of micro-particle detection and the ability to identify macro-defects, thus helping to balance detection performance and equipment integration costs.

[0043] The incident angle of the lighting unit 12 is adjustable and can be achieved manually or electrically.

[0044] Specifically, in some embodiments, such as Figure 2 and Figure 3 As shown, the photomask conveying arm also includes a first angle adjustment mechanism 14. The lighting unit 12 is mounted on the fork arm body 11 through the first angle adjustment mechanism 14. The first angle adjustment mechanism 14 is used to adjust the incident angle of the light emitted from the lighting unit 12.

[0045] The first angle adjustment mechanism 14 can employ a locking structure, such as a rotating shaft with a fine-tuning screw, to achieve manual adjustment. However, the first angle adjustment mechanism 14 can preferably adopt an electric drive scheme, such as a micro stepper motor, a micro servo motor, or a piezoelectric deflection drive module. The output end of the drive element is connected to the mounting base of the illumination unit 12. After receiving an external control signal, it drives the illumination unit 12 to deflect around a set rotating shaft, thereby continuously changing the incident angle of the emitted light. This type of electric adjustment method can achieve precise quantitative control of the angle, with higher adjustment accuracy. It can automatically switch between dark field detection mode and bright field detection mode according to a preset program, without the need for manual adjustment. This helps improve the automation adaptability of the photomask conveyor arm, adapting to fully automated semiconductor manufacturing lines. At the same time, the high repeatability of angle adjustment helps ensure the consistency of detection conditions for different batches.

[0046] In some embodiments, such as Figure 2 and Figure 3 As shown, the light receiving unit 13 is fixedly tilted and its receiving optical axis forms a preset angle with the normal of the photomask surface. In bright field detection mode, the incident angle of the illumination unit 12 is adjusted to match the preset angle so that the specular reflected light enters the light receiving unit 13 along the receiving optical axis.

[0047] The light receiving unit 13 is fixedly tilted, with its receiving optical axis forming a preset angle with the normal to the photomask surface. This preset angle can be set to, for example, 15 degrees, 20 degrees, or 25 degrees, to accommodate photomasks of different thicknesses and detection width requirements. In bright-field detection mode, the incident angle of the illumination unit 12 is adjusted to match this preset angle. The specular reflection light generated on the photomask surface enters the light receiving unit 13 along the receiving optical axis, forming a stable bright-field reflection imaging optical path. This fixed tilted arrangement eliminates the need for additional angle adjustment components for the light receiving unit, helping to reduce assembly complexity and equipment cost. Furthermore, the fixed optical path provides better alignment stability, which can reduce the risk of optical path misalignment during high-speed movement of the fork arm.

[0048] In some embodiments, such as Figures 4 to 6 As shown, the photomask conveying arm may further include a second angle adjustment mechanism 15. The light receiving unit 13 is mounted on the fork arm body 11 via the second angle adjustment mechanism 15. The second angle adjustment mechanism 15 is used to adjust the receiving angle of the receiving field of view of the light receiving unit 13. The second angle adjustment mechanism 15 may adopt the same configuration as the first angle adjustment mechanism 14, such as a micro stepper motor drive structure, a rotating shaft with fine-tuning screw structure, or an arc-shaped guide rail stop structure, etc., which carries the light receiving unit 13 and adjusts the deflection angle of the receiving optical axis.

[0049] During operation, the second angle adjustment mechanism 15 can work synchronously with the first angle adjustment mechanism 14, see [reference]. Figure 4To ensure that the specular reflected light in bright-field detection mode is always incident along the receiving optical axis; see [link / reference]. Figure 5 and Figure 6 Furthermore, the receiving angle can be independently adjusted to match the particle signal acquisition requirements with different scattering angles. This structure enhances the flexibility of optical path configuration, enabling it to adapt to a wider range of photomask products and detection scenarios with varying precision, thus expanding the applicability of the conveyor arm's detection function to some extent.

[0050] In some embodiments, such as Figure 6 As shown, in dark field detection mode, the angle between the emitted light of the illumination unit 12 and the surface of the photomask is less than or equal to 15°, forming a low-angle grazing dark field optical path.

[0051] In this low-angle grazing dark-field optical path, the emitted light from the illumination unit 12 is incident close to the surface of the photomask. The incident angle can be set, for example, to 10 degrees, 12 degrees, or 15 degrees, to adapt to photomask products with different surface characteristics. When there are no particles on the photomask surface, the detection light undergoes specular reflection in a near-horizontal direction and basically does not enter the receiving field of view of the light receiving unit 13, resulting in a low level of background light signal from the substrate. When particles are present on the surface, the particles scatter the illumination light, and some of the scattered light enters the light receiving unit 13 to form a recognizable detection signal. This optical path configuration is designed for the smooth surface of the photomask, effectively reducing background noise caused by specular reflection from the substrate, helping to improve the signal contrast of small particles, and to a certain extent improving the detection sensitivity of microparticles, thus meeting the high-precision cleanliness screening requirements of the photomask contact surface.

[0052] In some embodiments, such as Figures 2 to 7 As shown, the fork arm body 11 is provided with a support plane 101, and a recessed groove 102 is provided on the support plane 101. The lighting unit 12 and the light receiving unit 13 are both arranged in the recessed groove 102, and neither the lighting unit 12 nor the light receiving unit 13 exceeds the support plane 101.

[0053] The supporting surface 101 forms the contact bearing surface between the fork arm body 11 and the lower surface of the photomask. The recessed groove 102 provides an embedded installation space for the detection components. The illumination unit 12 and the light receiving unit 13 are housed inside the groove, with their tops not exceeding the supporting surface 101. During operation, the sidewalls of the groove can shield lateral ambient stray light and suspended particles, reducing external interference factors from entering the detection optical path and helping to reduce the probability of false detection caused by environmental particles. The non-protruding layout of the detection components avoids hard contact and scratches with the photomask surface when picking up and placing the photomask, ensuring the integrity of the photomask glass surface. At the same time, the recessed structure can provide physical protection for optical components, reducing the risk of component damage from collisions during fork arm transportation to a certain extent, and is suitable for the cleanroom transport environment of semiconductors.

[0054] In some embodiments, such as Figure 7As shown, the photomask conveying arm also includes a first linear mechanism 16 and a second linear mechanism 17, both installed in the recessed groove 102 along a straight line. A first angle adjustment mechanism 14 is installed on the first linear mechanism 16, and a second angle adjustment mechanism 15 is installed on the second linear mechanism 17.

[0055] The first linear mechanism 16 is used to drive the first angle adjustment mechanism 14 to move, and the second linear mechanism 17 is used to drive the second angle adjustment mechanism 15 to move, so as to change the distance between the lighting unit 12 and the light receiving unit 13.

[0056] The first linear mechanism 16 and the second linear mechanism 17 can adopt structural forms such as miniature linear guide slides and miniature lead screw transmission modules. They are arranged in the interior of the recessed groove 102 along the same straight path, respectively carrying the first angle adjustment mechanism 14 and the second angle adjustment mechanism 15.

[0057] During operation, the first linear mechanism 16 drives the first angle adjustment mechanism 14 to move along a straight line, and the second linear mechanism 17 drives the second angle adjustment mechanism 15 to move in the same direction. This allows for flexible adjustment of the lateral spacing between the illumination unit 12 and the light receiving unit 13, correspondingly changing the coverage area of ​​the detection spot and the acquisition width of the scattered light to match the contact detection area of ​​photomasks of different sizes. This structure, in conjunction with the angle adjustment mechanism, enables the matching and debugging of optical path parameters over a wider range. It can adapt to the detection requirements of multiple photomasks without modifying the basic installation structure of the fork arm body 11, helping to improve the adaptability flexibility of the transmission arm's detection optical path and expanding the applicable scenarios of the equipment to a certain extent.

[0058] In some embodiments, such as Figure 1 As shown, the photomask conveying arm also includes a rotary drive mechanism 18, which is connected to the fork arm body 11 and is used to drive the fork arm body 11 to rotate around the rotation axis Z. The rotation axis Z is parallel to the surface of the fork arm body 11 used to support the photomask, and the rotation axis Z coincides with the rotation axis of the output end of the rotary drive mechanism 18. It should be noted that the surface of the fork arm body 11 used to support the photomask is the supporting plane 101 mentioned above. The rotation angle range of the fork arm body 11 around the rotation axis Z is at least 180°, thereby enabling the fork arm body 11 to complete a flipping action, thus achieving the flipping of the surface of the fork arm body 11 used to support the photomask.

[0059] Furthermore, it should be noted that the output end of the rotary drive mechanism 18 can be a connecting structure such as an output shaft or an output flange. The fork body 11 is connected to the output shaft or output flange, and the rotation axis of the output end of the rotary drive mechanism 18 is the rotation center line of the output shaft, output flange, or other components themselves. For example, the rotary drive mechanism 18 can be a DC motor, and the fork body 11 is connected to the output shaft of the motor. The rotation axis Z of the fork body 11 coincides with the axis of the motor output shaft.

[0060] Further, see Figure 2 At this time, the illumination unit 12 and the light receiving unit 13 in the fork arm body 11 are both facing upwards, which can be used to detect particulate pollutants on the lower surface of the photomask.

[0061] When the rotary drive mechanism 18 is driven Figure 2 The fork arm body 11 is rotated 180° around the rotation axis Z. After the fork arm body 11 is flipped, the result is as follows: Figure 8 The fork arm body 11 is shown in the diagram. The lighting unit 12 and light receiving unit 13 integrated on the fork arm body 11 change orientation synchronously with the fork arm. Both the lighting unit 12 and the light receiving unit 13 face downwards, meaning the illumination surface of the detection light path switches from the lower surface of the photomask to the upper surface. Therefore, particulate contaminant detection on both sides of the photomask can be completed sequentially without adjusting the photomask's placement. This design can cover the cleanliness screening of both sides of the photomask in a single operation, helping to reduce the number of photomask transfers and alignments, reducing the risk of surface scratches caused by repeated handling, and improving the detection efficiency of a single workstation.

[0062] like Figure 9 As shown, this application also provides an embodiment of a semiconductor device, including a process cavity 3, a photomask transport arm 1, and a photomask buffer device 2. The photomask transport arm 1 and the photomask buffer device 2 are disposed in the process cavity 3. The photomask transport arm 1 is the aforementioned photomask transport arm 1. The photomask buffer device 2 is used to accommodate a plurality of photomasks. A predetermined distance is reserved between adjacent photomasks for the photomask transport arm 1 to enter.

[0063] The process chamber 3 can be, for example, a photolithography process chamber, a photomask cleaning chamber, or a photomask inspection chamber, providing a closed and clean working environment for photomask manufacturing. The photomask buffer device 2 can take the form of, for example, a wafer cassette buffer rack or a layered buffer station, which houses several photomasks layer by layer. The predetermined spacing between adjacent photomasks provides operating space for the photomask transfer arm 1 to extend and pick up the masks. During operation, the photomask transfer arm 1 extends into the corresponding layer spacing. Before picking up the mask, a dual-mode detection optical path is used to screen for particles on the surface of the photomask. After confirming that the cleanliness meets the requirements, the picking and transfer operation is performed, transferring the photomask between the photomask buffer device 2 and the process station. This integrated layout integrates detection, buffering, and transfer functions within the same process chamber 3, which helps reduce the exposure time of the photomask during transfer between different devices and reduces the risk of environmental particle contamination of the photomask to a certain extent. At the same time, the layered buffer design with reserved spacing ensures the operating freedom of the photomask transfer arm 1 and adapts to the limited installation space within the chamber.

[0064] The above description is only a partial embodiment of this application and is not intended to limit this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A photomask conveyor arm, characterized in that, Includes the fork arm body (11), lighting unit (12), and light receiving unit (13). The lighting unit (12) is mounted on the fork arm body (11) in a manner with an adjustable incident angle; The light receiving unit (13) is installed on the fork arm body (11) and is used to collect the light signal on the surface of the photomask; The photomask conveyor arm has a bright field detection mode and a dark field detection mode; In dark field detection mode, the incident angle of the illumination unit (12) is in the first angle range, the specular reflected light on the surface of the photomask deviates from the receiving field of view of the light receiving unit (13), and the light receiving unit (13) collects the scattered light signal generated by the particles. In bright field detection mode, the incident angle of the illumination unit (12) is in the second angle range, and the specular reflected light from the surface of the photomask enters the receiving field of view of the light receiving unit (13).

2. The photomask conveying arm according to claim 1, characterized in that, It also includes a first angle adjustment mechanism (14), the lighting unit (12) is mounted on the fork arm body (11) through the first angle adjustment mechanism (14), and the first angle adjustment mechanism (14) is used to adjust the incident angle of the light emitted by the lighting unit (12).

3. The photomask conveying arm according to claim 2, characterized in that, The light receiving unit (13) is fixedly tilted and its receiving optical axis forms a preset angle with the normal of the photomask surface. In bright field detection mode, the incident angle of the illumination unit (12) is adjusted to match the preset angle so that the specular reflected light enters the light receiving unit (13) along the receiving optical axis.

4. The photomask conveying arm according to claim 2, characterized in that, It also includes a second angle adjustment mechanism (15), the light receiving unit (13) is mounted on the fork arm body (11) through the second angle adjustment mechanism (15), and the second angle adjustment mechanism (15) is used to adjust the receiving angle of the receiving field of view of the light receiving unit (13).

5. The photomask conveying arm according to claim 1, characterized in that, In the dark field detection mode, the angle between the emitted light of the illumination unit (12) and the surface of the photomask is less than or equal to 15°, forming a low-angle grazing dark field light path.

6. The photomask conveying arm according to claim 4, characterized in that, The fork arm body (11) is provided with a support plane (101), and a recessed groove (102) is provided on the support plane (101). The lighting unit (12) and the light receiving unit (13) are both arranged in the recessed groove (102), and neither the lighting unit (12) nor the light receiving unit (13) exceeds the support plane (101).

7. The photomask conveying arm according to claim 6, characterized in that, It also includes a first linear mechanism (16) and a second linear mechanism (17), both of which are installed in the recessed groove (102) along a straight line. The first angle adjustment mechanism (14) is installed on the first linear mechanism (16), and the second angle adjustment mechanism (15) is installed on the second linear mechanism (17). The first linear mechanism (16) is used to drive the first angle adjustment mechanism (14) to move, and the second linear mechanism (17) is used to drive the second angle adjustment mechanism (15) to move, so as to change the distance between the lighting unit (12) and the light receiving unit (13).

8. The photomask conveying arm according to claim 1, characterized in that, It also includes a rotary drive mechanism (18) connected to the fork body (11), the rotary drive mechanism (18) being used to drive the fork body (11) to rotate around the rotation axis (Z); The rotation axis (Z) is parallel to the surface of the fork arm body (11) used to support the photomask, and the rotation axis (Z) coincides with the rotation axis of the output end of the rotation drive mechanism (18).

9. A semiconductor device, characterized in that, It includes a process cavity (3), a photomask conveying arm (1), and a photomask buffer device (2); The photomask conveying arm (1) and the photomask buffer device (2) are disposed in the process cavity (3); The photomask conveying arm (1) is the photomask conveying arm according to any one of claims 1 to 8; The photomask buffer device (2) is used to accommodate several photomasks, and a predetermined distance is reserved between the upper and lower adjacent photomasks for the photomask conveying arm (1) to enter.

Images