A magnetic polishing device for aluminum wafer processing

Abstract

The application discloses a magnetic polishing device for aluminum bar processing and belongs to the field of metal processing, which comprises a polishing machine and storage containers for storing polishing liquid, the polishing machine comprises a control panel and a placing table, a plurality of the storage containers are arranged, magnetic beads for stirring the polishing liquid are placed in the storage containers, and limiting devices for fixing the storage containers are arranged on the placing table. The application has the effect of avoiding collision and scratches of aluminum bars during polishing, thereby improving product quality.

Description

Technical Field

[0001] This application relates to the field of metal processing technology, and in particular to a magnetic polishing apparatus for processing aluminum foil. Background Technology

[0002] Aluminum foil, also known as aluminum strip, is commonly used as an important component for current collection and transmission. As current collectors, they can effectively collect and transmit current while possessing conductivity, stability, and reliability to support the normal operation of the battery and improve overall performance.

[0003] Magnetic polishing is a surface treatment technology that uses magnetic force to drive abrasives to polish the surface of workpieces efficiently and precisely. It is especially suitable for complex shapes, small parts, thin-walled parts, soft metals (such as aluminum and copper), or workpieces with high precision requirements. Polishing fluid is added to a container, and a magnetic field is generated by an electromagnet or permanent magnet. Under the action of the magnetic field, the magnetic abrasives form a "flexible abrasive tool." Through the synergistic effect of chemical corrosion and mechanical friction, the polishing process is accelerated and the surface quality is improved. Changes in the direction and intensity of the magnetic field can control the movement trajectory of the abrasives.

[0004] Existing magnetic polishing machines use large containers, such as a large pot, to polish the cut aluminum foil. Although this method can process more aluminum foil at once, the large number of foils in the container and their constant collisions can cause scratches on the surface of the polished foil, affecting product quality. Utility Model Content

[0005] In order to avoid collisions and scratches on aluminum foil during polishing and thus improve product quality, this application provides a magnetic polishing device for processing aluminum foil.

[0006] The magnetic polishing device for aluminum foil processing provided in this application adopts the following technical solution: A magnetic polishing device for aluminum foil processing includes a polishing machine and a storage container for storing polishing fluid. The polishing machine includes a control panel and a placement platform. Multiple storage containers are provided, and magnetic beads for stirring the polishing fluid are placed inside the storage containers. A limiting device for fixing the storage containers is provided on the placement platform.

[0007] By adopting the above technical solution, when polishing the processed aluminum foil, the processed aluminum foil is placed in a storage container, with one aluminum foil in each storage container. Multiple storage containers can polish multiple aluminum foils simultaneously. The storage container contains magnetic beads and polishing fluid. Parameters are set on the control panel and the polishing machine is started. The polishing machine generates a magnetic field that drives the magnetic beads to move. The movement of the magnetic beads causes the polishing fluid in the storage container to flow, enhancing the contact strength between the aluminum foil surface and the polishing fluid, improving the polishing effect. This avoids scratches caused by polishing a large number of aluminum foils simultaneously, thereby improving product quality and increasing the pass rate.

[0008] Preferably, the limiting device includes a limiting frame and a placement rack. The limiting frame is fixedly installed on the placement platform, the placement rack is placed inside the limiting frame, and the placement rack is provided with a plurality of placement holes, into which the storage container is placed.

[0009] By adopting the above technical solution, the limiting frame forms a fence around the placement platform. The placement rack is placed inside the limiting frame, which can stabilize the position of the placement rack. The storage container is placed in the placement hole on the placement rack, which can limit the position of the storage container and prevent the storage container from shaking, shifting, or tipping over during operation.

[0010] Preferably, the placement rack is movably placed on the placement platform.

[0011] By adopting the above technical solution, staff can remove the placement rack without tools, and replace or remove the placement rack as needed.

[0012] Preferably, the placement rack is fixedly connected with a plurality of first legs, the first legs abutting against the surface of the placement platform.

[0013] By adopting the above technical solution, the first leg abutting against the surface of the placement platform can cause the lower surface of the placement rack to detach from the upper surface of the placement platform, thereby increasing the limiting height of the storage container placed in the placement hole and strengthening the fixing effect on the storage container.

[0014] Preferably, the plurality of first legs are evenly distributed around the perimeter of the placement frame.

[0015] By adopting the above technical solution, the even distribution of multiple first legs can evenly disperse the stress generated by the placement frame, thereby enhancing the stability of the placement frame.

[0016] Preferably, a second leg is provided on the opposite side of the placement platform, symmetrical to the first leg, and multiple first legs and multiple second legs are symmetrically arranged one-to-one.

[0017] By adopting the above technical solution, the first and second legs are symmetrically arranged on both sides of the placement rack, which makes it easier for staff to place the rack on the placement table and avoids distinguishing the placement surface when placing it.

[0018] Preferably, a plurality of buffer blocks are provided between the placement rack and the placement platform.

[0019] By adopting the above technical solution, the polishing machine will generate vibration during operation to improve polishing efficiency. The buffer block can effectively isolate the vibration, reduce the vibration amplitude of the placement rack, prevent the placement rack from shifting, reduce noise, and extend the equipment life.

[0020] Preferably, the buffer block is U-shaped and includes two vertical blocks and one horizontal block. The two side walls of the horizontal block abut against the upper surface of the placement platform and the lower surface of the placement rack, respectively. The two vertical blocks are inserted into two adjacent placement holes and abut against the inner wall of the placement holes.

[0021] By adopting the above technical solution, the horizontal block on the buffer block is placed between the placement rack and the placement platform to reduce the vibration on the placement rack. The two vertical blocks on the buffer block are inserted into the placement holes where no storage container is placed, which can prevent the buffer block from shifting position due to vibration.

[0022] Preferably, the buffer block can be a sponge pad, rubber pad, silicone pad, or foam.

[0023] By adopting the above technical solutions, there are various options for the choice of buffer blocks. Flexible materials such as sponge, rubber, silicone and foam have high elastic deformation capabilities and can absorb impact energy through their own deformation, reducing mechanical vibration or collision damage to equipment and reducing noise. Flexible materials have low elastic modulus and high coefficient of friction, which can disperse local impact force to a larger area, avoid structural damage caused by stress concentration, and prevent slippage to maintain the stable position of the workpiece.

[0024] In summary, this application includes at least one of the following beneficial technical effects: 1. When polishing the processed aluminum foil, the processed aluminum foil is placed in a storage container, with one aluminum foil in each container. Multiple storage containers can polish multiple aluminum foil simultaneously. The storage container contains magnetic beads and polishing fluid. The parameters are set on the control panel and the polishing machine is started. The polishing machine generates a magnetic field that drives the magnetic beads to move. The movement of the magnetic beads causes the polishing fluid in the storage container to flow, enhancing the contact strength between the aluminum foil surface and the polishing fluid, improving the polishing effect. This avoids scratches caused by polishing a large number of aluminum foil at the same time, thereby improving product quality and increasing the pass rate. 2. The limiting frame forms a fence around the placement platform. The placement rack is placed inside the limiting frame, which can stabilize the position of the placement rack. The storage container is placed in the placement hole on the placement rack, which can limit the position of the storage container and prevent the storage container from shaking, shifting or tipping over during operation. 3. When the polishing machine is working, it will generate vibration to improve polishing efficiency. The buffer block can effectively isolate the vibration, reduce the vibration amplitude of the placement rack, prevent the placement rack from shifting, reduce noise, and extend the equipment life. Attached Figure Description

[0025] Figure 1 This is a schematic diagram of the overall structure of a magnetic polishing device for processing aluminum foil.

[0026] Figure 2 This is a schematic diagram of the structure of the prominent placement rack in the embodiments of this application.

[0027] Figure 3 This is a schematic diagram of the structure of the prominent buffer block in the embodiment of this application.

[0028] Explanation of reference numerals in the attached figures: 1. Polishing machine; 2. Storage container; 3. Control panel; 4. Placement platform; 5. Limiting device; 6. Limiting frame; 7. Placement rack; 8. Placement hole; 9. First support leg; 10. Second support leg; 11. Buffer block; 12. Vertical block; 13. Horizontal block. Detailed Implementation

[0029] The following is in conjunction with the appendix Figure 1-3 This application will be described in further detail.

[0030] This application discloses a magnetic polishing device for aluminum foil processing, such as... Figure 1 As shown, the device includes a polishing machine 1, which comprises a control panel 3 and a placement platform 4. The placement platform 4 holds multiple storage containers 2 for storing polishing fluid. Each storage container 2 contains a magnetic bead for stirring the polishing fluid. The placement platform 4 is equipped with a limiting device 5 for fixing the storage containers 2. Each storage container 2 contains one aluminum foil. Multiple storage containers 2 can polish multiple aluminum foils simultaneously, thus avoiding scratches caused by polishing a large number of aluminum foils at the same time, thereby improving product quality and increasing the pass rate.

[0031] like Figure 1 and Figure 2As shown, the limiting device 5 includes a limiting frame 6 and a placement rack 7. The size of the limiting frame 6 is similar to the size of the upper surface of the placement platform 4. The limiting frame 6 is fixedly installed on the upper surface of the placement platform 4, and its lower end is connected to the perimeter of the placement platform 4. The limiting frame 6 forms a fence on the placement platform 4, and the placement rack 7 is movably placed within the limiting frame 6. The placement rack 7 is placed within the limiting frame 6, which can stabilize its position. Workers can easily remove the placement rack 7 from the placement platform 4 without tools, making it convenient for workers to replace or remove the placement rack 7 as needed.

[0032] like Figure 1 and Figure 2 As shown, the placement rack 7 has multiple placement holes 8 evenly arranged, and the storage container 2 is inserted vertically into the placement holes 8. During magnetic polishing, the magnetic beads move within the storage container 2 and drive the polishing fluid flow, which can easily cause displacement and collisions between the storage containers 2. The placement holes 8 can limit the position of the storage containers 2, preventing displacement and collisions during operation.

[0033] like Figure 1 and Figure 2 As shown, the placement platform 4 is rectangular and made of transparent plastic sheet to avoid affecting the magnetic field on the placement platform 4. Multiple first legs 9 are fixedly connected to the side wall of the placement rack 7 facing the placement platform 4. These first legs 9 are evenly distributed around the outer surface of the placement rack 7, which evenly distributes the stress generated by the placement rack 7, thereby enhancing its stability. Furthermore, the end of each first leg 9 away from the placement rack 7 abuts against the surface of the placement platform 4, causing the lower surface of the placement platform 4 to detach from its upper surface. This increases the distance between the placement rack 7 and the placement platform 4, thus increasing the limiting height for the storage container 2 placed in the placement hole 8 and strengthening the fixation of the storage container 2.

[0034] like Figure 1 and Figure 2 As shown, multiple second legs 10 are fixedly connected to the side wall of the placement rack 7 away from the placement table 4. The number of second legs 10 is the same as the number of first legs 9, and their positions are symmetrically arranged along the placement rack 7. Positioning the first legs 9 and second legs 10 around the perimeter of the placement rack 7 reduces the impact on the handling of the storage container 2. The symmetrical arrangement of the first legs 9 and second legs 10 on both sides of the placement rack 7 allows workers to easily place the placement rack 7 within the constraint frame 6 with either side facing up, avoiding the need to distinguish the placement surface and simplifying the workload.

[0035] like Figure 1As shown, multiple buffer blocks 11 are provided between the placement rack 7 and the placement table 4 for easy access. The buffer blocks 11 can be made of flexible materials such as sponge pads, rubber pads, silicone pads, and foam. When the polishing machine 1 is working, it typically generates vibration to improve polishing efficiency. Flexible materials have high elastic deformation capabilities, which can absorb impact energy through their own deformation, reducing damage to the equipment from mechanical vibration or collisions and preventing the placement rack 7 from shifting. This also reduces noise and extends the equipment's lifespan. Furthermore, flexible materials have a low elastic modulus and a high coefficient of friction, which can disperse localized impact forces over a larger area, preventing structural damage caused by stress concentration and ensuring the workpiece remains in a stable position.

[0036] like Figure 1 and Figure 3 As shown, the buffer block 11 is U-shaped and includes two vertical blocks 12 and a horizontal block. The two vertical blocks 12 are fixedly connected to both ends of the horizontal block, and the two vertical blocks 12 and the horizontal block are integrally formed. The upper and lower side walls of the horizontal block abut against the lower surface of the placement rack 7 and the upper surface of the placement platform 4, respectively. The two vertical blocks 12 are inserted into two adjacent placement holes 8 and abut against the inner wall of the placement holes 8. The horizontal block portion of the buffer block 11 is placed between the placement rack 7 and the placement platform 4 to reduce vibration on the placement rack 7. The two vertical blocks 12 of the buffer block 11 are inserted into the placement holes 8 where no storage container 2 is placed, which can prevent the buffer block 11 from shifting position due to vibration.

[0037] The implementation principle of this application embodiment is as follows: When polishing the processed aluminum foil, the processed aluminum foil is placed in a storage container 2, with one aluminum foil in each storage container 2. Multiple storage containers 2 can simultaneously polish multiple aluminum foils. The storage container 2 contains magnetic beads and polishing liquid. Parameters are set on the control panel 3 and the polishing machine 1 is started. The polishing machine 1 generates a magnetic field to drive the magnetic beads to move. The movement of the magnetic beads causes the polishing liquid in the storage container 2 to flow, enhancing the contact strength between the surface of the aluminum foil and the polishing liquid, improving the polishing effect, thereby avoiding scratches caused by polishing a large number of aluminum foils at the same time, and thus improving product quality and increasing the pass rate.

[0038] The above are all preferred embodiments of this application, and are not intended to limit the scope of protection of this application. Therefore, all equivalent changes made in accordance with the structure, shape and principle of this application should be covered within the scope of protection of this application.

Claims

1. A magnetic polishing device for processing aluminum foil, characterized in that: The polishing machine (1) includes a polishing machine (1) and a storage container (2) for storing polishing liquid. The polishing machine (1) includes a control panel (3) and a placement platform (4). Multiple storage containers (2) are provided. Magnetic beads for stirring polishing liquid are placed in the storage containers (2). A limiting device (5) for fixing the storage containers (2) is provided on the placement platform (4). The limiting device (5) includes a limiting frame (6) and a placement rack (7). The limiting frame (6) is fixedly installed on the placement platform (4). The placement rack (7) is placed inside the limiting frame (6). The placement rack (7) is provided with a plurality of placement holes (8). The storage container (2) is placed inside the placement holes (8). The placement rack (7) is movably placed on the placement platform (4).

2. The magnetic polishing device for aluminum foil processing according to claim 1, characterized in that: The placement rack (7) is fixedly connected with a plurality of first legs (9), and the first legs (9) abut against the surface of the placement platform (4).

3. The magnetic polishing device for aluminum foil processing according to claim 2, characterized in that: Multiple first legs (9) are evenly distributed around the perimeter of the placement rack (7).

4. The magnetic polishing device for aluminum foil processing according to claim 3, characterized in that: A second leg (10) is provided on the other side of the first leg (9) symmetrical to the placement platform (4), and a plurality of first legs (9) and a plurality of second legs (10) are arranged symmetrically one by one.

5. The magnetic polishing device for aluminum foil processing according to claim 1, characterized in that: Multiple buffer blocks (11) are provided between the placement rack (7) and the placement platform (4).

6. The magnetic polishing device for aluminum foil processing according to claim 5, characterized in that: The buffer block (11) is U-shaped and includes two vertical blocks (12) and a horizontal block. The two side walls of the horizontal block abut against the upper surface of the placement platform (4) and the lower surface of the placement rack (7), respectively. The two vertical blocks (12) are inserted into two adjacent placement holes (8) and abut against the inner wall of the placement hole (8).

Images