Waterproof structure of continuous vacuum magnetron sputtering machine

Abstract

The application relates to the technical field of continuous vacuum magnetron sputtering machines, in particular to a waterproof structure of a continuous vacuum magnetron sputtering machine, which comprises a main machine frame, a sealing assembly and a flow guide assembly. The sealing assembly realizes multilayer sealing through synchronous opening and closing actions of first and second sealing plates and in combination with elastic sealing strips, so that the waterproof performance is improved; the flow guide assembly effectively discharges internal accumulated liquid through the synergistic action of a flow guide groove, a drain pipe and a filter screen, so that the maintenance frequency is reduced. The application can comprehensively protect key components of the main machine frame, solve the problems of limited waterproof range and liquid accumulation in the prior art, significantly improve the operation reliability and service life of the equipment, and meet the demand of complex working conditions.

Description

Technical Field

[0001] This utility model belongs to the technical field of vacuum coating equipment, specifically a waterproof structure for a continuous vacuum magnetron sputtering machine. Background Technology

[0002] With the development of vacuum magnetron sputtering technology, various magnetron sputtering equipment has been widely used in industrial production. However, in actual use, the existing waterproof structures of magnetron sputtering machines still have some problems that need to be solved. For example, the waterproof design of some equipment is relatively simple, making it difficult to effectively prevent sputtering liquid or cleaning liquid from seeping into key components, thereby affecting the stability and service life of the equipment. In addition, the design of existing waterproof structures often fails to balance efficiency and convenience, leading to increased maintenance costs and potentially affecting production efficiency.

[0003] A search revealed a fully automatic integrated acid and alkali cleaning machine for silicon materials, with publication number CN118808226B and publication date November 22, 2024. This design uses a portable waterproof cover and a lifting cover to prevent cleaning fluid splashing. It also employs a locking mechanism in conjunction with the drive mechanism to achieve rapid connection and separation of the storage frame, improving cleaning efficiency. However, the waterproof cover design primarily provides localized protection for the cleaning fluid, and its waterproof range is limited, failing to completely prevent the risk of liquid seeping into the equipment through gaps. Furthermore, the operation of the lifting cover relies on a mechanical transmission mechanism, which may lead to a decline in sealing performance after long-term use, especially under high pressure or high frequency operating environments, easily causing liquid leakage and affecting the safety and reliability of the equipment.

[0004] A search revealed an electrical controller protection device with publication number CN112888221B, published on May 3, 2022. This design effectively prevents water from splashing into the enclosure from the outside through a combination of a top waterproof mechanism and a door panel sealing gasket. However, this waterproof design primarily addresses the static protection of the electrical controller and lacks comprehensive consideration for dynamic operating environments. For example, with frequent opening and closing of the door panel, the sealing gasket may wear down due to long-term friction, leading to a decrease in waterproofing effectiveness. Furthermore, this design does not include an effective drainage mechanism for internal liquid accumulation, which could potentially cause water buildup, further affecting the normal operation and lifespan of the equipment.

[0005] The aforementioned problems indicate that current waterproof structures for magnetron sputtering machines on the market still have shortcomings in dealing with complex working conditions, particularly in terms of comprehensive protection, long-term stability, and ease of maintenance. Therefore, this invention provides a waterproof structure for a continuous vacuum magnetron sputtering machine to overcome the deficiencies of existing technologies and achieve a more efficient, reliable, and easy-to-maintain waterproof solution. Utility Model Content

[0006] This utility model relates to a waterproof structure for a continuous vacuum magnetron sputtering machine, including a main frame, a sealing component, and a flow guiding component. The sealing component is installed inside the main frame, and the flow guiding component is provided at the bottom of the main frame.

[0007] The sealing assembly includes a first sealing plate, a second sealing plate, a sliding rail, an elastic sealing strip, a drive shaft, a gear set, a drive motor, and a limiting block. Sliding rails are symmetrically arranged on the inner walls of both sides of the main frame, and the first and second sealing plates are slidably connected to the main frame via these rails. Elastic sealing strips are embedded in the outer edges of both the first and second sealing plates, and these strips are tightly fitted against the inner walls of the main frame. A limiting block is fixedly connected to one end of each of the first and second sealing plates, and this limiting block engages with the end of the sliding rail to restrict the movement range of the first and second sealing plates. A rack is fixedly connected to the other end of each of the first and second sealing plates, and the rack meshes with the gear set. A drive shaft is fixedly connected to the center of the gear set, and one end of the drive shaft passes through the main frame and is fixedly connected to the output shaft of the drive motor. The drive motor is embedded in the outer wall of the main frame.

[0008] The flow guiding assembly includes a flow guiding channel, a drain pipe, a filter screen, a liquid collection box, and a drain valve. A flow guiding channel is formed on the bottom inner wall of the main frame, the cross-section of which is inclined, and the drain pipe is connected to its lowest point. A filter screen is embedded inside the drain pipe, and the outlet end of the drain pipe is connected to the liquid collection box, which is fixedly installed on the outer wall of the main frame. A drain valve is provided at the bottom of the liquid collection box, and the drain valve is used to control the discharge of liquid from the collection box.

[0009] The sealing assembly is driven by a motor that rotates a drive shaft. A gear set on the drive shaft meshes with a rack and pinion, enabling the first and second sealing plates to open and close synchronously along the sliding track. When the first and second sealing plates are closed, the elastic sealing strip forms a multi-layered sealing structure with the inner wall of the main frame, preventing splashed liquid or cleaning fluid from seeping into critical component areas of the main frame. Furthermore, a limiting block at the end of the sliding track acts as a stop, preventing damage to the first and second sealing plates due to excessive movement.

[0010] The flow guiding assembly directs the liquid accumulated inside the main frame to the drain pipe via a flow guide channel. After being filtered by a filter screen, the liquid flows into the collection box. The filter screen intercepts solid particles in the liquid, preventing them from clogging the drain pipe. The liquid in the collection box can be periodically drained through a drain valve, thus avoiding long-term liquid accumulation that could affect equipment operation.

[0011] This invention, through the design of the sealing assembly, utilizes the synchronous opening and closing actions of the first and second sealing plates, combined with a multi-layer sealing structure of elastic sealing strips, to effectively improve the waterproof performance of the main frame and solve the problem of limited waterproof range in existing technologies. Simultaneously, the cooperation between the drive motor and the gear set ensures the smoothness of the sealing plate's opening and closing action, avoiding the risk of decreased sealing performance after long-term use of the mechanical transmission mechanism.

[0012] Furthermore, this invention, through the design of the flow guiding component, utilizes the synergistic effect of the flow guiding channel and the drain pipe to effectively discharge liquid inside the main frame, solving the problem of existing technologies that do not address the issue of internal liquid accumulation and discharge mechanisms. The inclusion of a filter further improves the reliability of the drainage system, reduces maintenance frequency, and lowers maintenance costs.

[0013] In summary, this utility model provides a comprehensive, long-term stable, and easy-to-maintain waterproof structure for a continuous vacuum magnetron sputtering machine through the organic combination of sealing and flow guiding components. This significantly improves the operational reliability and service life of the equipment and meets the actual needs under complex working conditions. Attached Figure Description

[0014] Figure 1 This is a schematic diagram of the overall structure of this utility model.

[0015] Figure 2 This is a side view sectional structural diagram of the present invention.

[0016] Figure 3 This is a schematic diagram of the internal three-dimensional structure of this utility model.

[0017] The reference numerals in the attached drawings are as follows: 1. Main frame; 2. Sealing assembly; 3. Flow guiding assembly; 201. First sealing plate; 202. Second sealing plate; 203. Sliding track; 204. Elastic sealing strip; 205. Drive shaft; 206. Gear set; 207. Drive motor; 208. Limiting block; 209. Rack; 301. Flow guiding groove; 302. Drain pipe; 303. Filter screen; 304. Liquid collection box; 305. Drain valve. Detailed Implementation

[0018] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of the present utility model.

[0019] Specific implementation examples are given below.

[0020] like Figures 1 to 3 As shown, this utility model provides a waterproof structure for a continuous vacuum magnetron sputtering machine, including a main frame 1, a sealing assembly 2, and a flow guiding assembly 3. The main frame 1 is the main structure of the entire device, and the sealing assembly 2 is installed inside it, while the flow guiding assembly 3 is located at the bottom. Sliding tracks 203 are symmetrically arranged on the inner walls of both sides of the main frame 1. The sliding tracks 203 are straight and extend vertically. The first sealing plate 201 and the second sealing plate 202 are slidably connected to the main frame 1 through the sliding tracks 203. Elastic sealing strips 204 are embedded in the outer edges of the first sealing plate 201 and the second sealing plate 202. The elastic sealing strips 204 are made of flexible material and can tightly fit the inner wall of the main frame 1. Limiting blocks 208 are fixedly connected to one end of the first sealing plate 201 and the second sealing plate 202, respectively. The limiting blocks 208 are located at the end of the sliding tracks 203 and are used to limit the movement range of the first sealing plate 201 and the second sealing plate 202. The other ends of the first sealing plate 201 and the second sealing plate 202 are respectively fixedly connected to racks 209, which mesh with gear sets 206. A drive shaft 205 is fixedly connected to the center of the gear set 206. One end of the drive shaft 205 passes through the main frame 1 and is fixedly connected to the output shaft of the drive motor 207. The drive motor 207 is embedded in the outer wall of the main frame 1.

[0021] A flow guide groove 301 is formed on the bottom inner wall of the main frame 1. The cross-section of the flow guide groove 301 is inclined, and a drain pipe 302 is connected to its lowest point. A filter screen 303 is embedded inside the drain pipe 302. The filter screen 303 is made of metal or polymer material and has a certain strength and corrosion resistance. The outlet end of the drain pipe 302 is connected to a liquid collection box 304, which is fixedly installed on the outer side wall of the main frame 1. A drain valve 305 is provided at the bottom of the liquid collection box 304, and the drain valve 305 is fixed to the liquid collection box 304 by threaded connection or snap-fit ​​connection.

[0022] During actual operation, after the drive motor 207 starts, it drives the drive shaft 205 to rotate, and the gear set 206 on the drive shaft 205 rotates accordingly. The gear set 206 meshes with the rack 209 for transmission, and the rack 209 drives the first sealing plate 201 and the second sealing plate 202 to open and close synchronously along the sliding track 203. When the first sealing plate 201 and the second sealing plate 202 are closed, the elastic sealing strip 204 forms a multi-layer sealing structure with the inner wall of the main frame 1. The limiting block 208 at the end of the sliding track 203 plays a limiting role to prevent the first sealing plate 201 and the second sealing plate 202 from being damaged due to excessive movement.

[0023] Liquid accumulated inside the main unit frame 1 is guided to the drain pipe 302 through the guide channel 301. After being filtered by the filter screen 303, the liquid flows into the collection box 304. The filter screen 303 intercepts solid particles in the liquid, preventing them from clogging the drain pipe 302. The liquid in the collection box 304 can be periodically discharged through the drain valve 305. The drain valve 305 is operated manually by rotating or pressing, which is simple to operate and highly reliable.

[0024] In practical applications, such as during the operation of a continuous vacuum magnetron sputtering machine, liquid may accumulate inside the equipment due to splashing of sputtering or cleaning fluid. In this case, the first sealing plate 201 and the second sealing plate 202 of the sealing assembly 2 are closed by the drive motor 207, thus isolating the critical component area of ​​the main frame 1 from the liquid. Simultaneously, the flow guiding assembly 3 guides the accumulated liquid to the drain pipe 302 through the flow guide channel 301. After being filtered by the filter screen 303, the liquid flows into the collection box 304. Periodically opening the drain valve 305 drains the liquid from the collection box 304, thus preventing long-term liquid accumulation from affecting equipment operation.

[0025] The design of the sealing assembly 2 and the flow guiding assembly 3 enables this invention to achieve comprehensive protection under complex working conditions. The synchronous opening and closing of the first sealing plate 201 and the second sealing plate 202 is achieved through the cooperation of the gear set 206 and the rack 209, ensuring smooth and reliable operation. The multi-layer sealing structure of the elastic sealing strip 204 further improves the sealing performance, preventing liquid from seeping into critical component areas of the main frame 1. The inclined design of the flow guiding groove 301 allows liquid to flow quickly to the drain pipe 302, reducing the residence time of liquid inside the main frame 1. The filter screen 303 effectively intercepts solid particles in the liquid, improving the reliability of the drainage system and reducing maintenance frequency.

[0026] The various components of this invention achieve efficient waterproofing through precise mechanical connections and cooperation. The sliding track 203 provides a stable sliding path for the first sealing plate 201 and the second sealing plate 202, while the limiting block 208 ensures that the movement range of the sealing plates does not exceed design requirements. The meshing transmission between the gear set 206 and the rack 209 makes the opening and closing of the sealing plates more precise and smooth. The connection between the guide channel 301 and the drain pipe 302 ensures smooth liquid discharge, and the synergistic effect of the filter screen 303 and the collection box 304 further improves the reliability and maintainability of the drainage system.

[0027] As described above, the specific embodiments of this utility model detail the structural composition, connection relationship, and operating principle of the main frame 1, sealing component 2, and flow guiding component 3. The mutual cooperation between the various components is fully demonstrated through specific connection methods and operating processes, ensuring that those skilled in the art can accurately implement this technical solution based on the contents of the specification. To better enable those skilled in the art to fully understand and implement this utility model, the following supplementary explanation of the implementation principle and operating process of this utility model is provided in conjunction with specific application scenarios.

[0028] During the actual operation of a continuous vacuum magnetron sputtering machine, liquid accumulation may occur inside the equipment due to splashing of sputtering or cleaning fluid. In this case, the waterproof structure must respond quickly to isolate critical component areas and promptly drain the accumulated liquid. The specific operating steps are as follows: First, after the drive motor 207 starts, its output shaft drives the drive shaft 205 to rotate, and the gear set 206 on the drive shaft 205 rotates accordingly. The gear set 206 meshes with the rack 209, which is fixedly connected to one end of the first sealing plate 201 and the second sealing plate 202. Through the linear movement of the rack 209, the first sealing plate 201 and the second sealing plate 202 move synchronously along the sliding track 203. The sliding track 203 provides a stable sliding path for the sealing plates, ensuring smooth and precise movement. When the first sealing plate 201 and the second sealing plate 202 are closed, the elastic sealing strip 204 embedded in their outer edges tightly adheres to the inner wall of the main frame 1, forming a multi-layer sealing structure. This design effectively fills the tiny gaps between the sealing plates and the main frame 1 through the elastic deformation characteristics of the flexible material, thereby preventing liquid from seeping into critical component areas. Meanwhile, the limiting block 208 is located at the end of the sliding track 203, which restricts the movement range of the first sealing plate 201 and the second sealing plate 202, and avoids mechanical damage due to excessive movement.

[0029] Secondly, the liquid accumulated inside the main frame 1 flows into the guide channel 301 under gravity. The cross-section of the guide channel 301 is inclined, and its lowest point is connected to the drain pipe 302. The inclined design allows the liquid to flow quickly to the drain pipe 302, reducing the residence time of the liquid inside the main frame 1, thereby reducing the impact of the liquid on the operation of the equipment. After the liquid enters the drain pipe 302, it is intercepted by the filter screen 303, and solid particles are effectively blocked to prevent them from clogging the drain pipe 302. The filter screen 303 is made of corrosion-resistant material and can maintain high strength and stability during long-term use. The filtered liquid then flows into the collection box 304, which is fixedly installed on the outer wall of the main frame 1 for easy maintenance by operators.

[0030] Finally, the operator can manually rotate or press the drain valve 305 to drain the liquid from the collection box 304. The drain valve 305 is fixed to the bottom of the collection box 304 by a threaded connection or a snap-fit ​​connection, which is simple to operate and highly reliable. By regularly draining the liquid, the potential impact of long-term liquid accumulation on equipment operation is avoided, while also reducing maintenance frequency and costs.

[0031] In the above steps, the sealing assembly 2 and the flow guiding assembly 3 work together to achieve comprehensive protection for the critical component areas inside the main frame 1. The synchronous opening and closing of the first sealing plate 201 and the second sealing plate 202 is achieved by the meshing transmission of the gear set 206 and the rack 209, ensuring the smoothness and reliability of the operation. The multi-layer sealing structure of the elastic sealing strip 204 further improves the sealing performance, while the inclined design of the flow guiding groove 301 accelerates the liquid discharge speed. The filter screen 303 effectively intercepts solid particles in the liquid, improves the reliability of the drainage system, and reduces maintenance requirements.

[0032] In summary, this invention achieves efficient, reliable, and easy-to-maintain waterproofing under complex working conditions through the organic combination of the sealing component 2 and the flow guiding component 3. The precise fit between the various components ensures the overall performance of the waterproof structure, meeting the needs of practical applications.

[0033] The above description is only a preferred embodiment of the present utility model, but the protection scope of the present utility model is not limited thereto. Any equivalent substitutions or changes made by those skilled in the art within the technical scope disclosed in the present utility model, based on the technical solution and the inventive concept of the present utility model, should be included within the protection scope of the present utility model.

Claims

1. A waterproof structure for a continuous vacuum magnetron sputtering machine, characterized in that, It includes a main frame (1), a sealing component (2) and a flow guiding component (3), wherein the sealing component (2) is installed inside the main frame (1) and the flow guiding component (3) is provided at the bottom of the main frame (1).

2. The waterproof structure of a continuous vacuum magnetron sputtering machine according to claim 1, characterized in that, The sealing assembly (2) includes a first sealing plate (201), a second sealing plate (202), a sliding rail (203), an elastic sealing strip (204), a drive shaft (205), a gear set (206), a drive motor (207), and a limiting block (208). Sliding rails (203) are symmetrically provided on the inner walls of both sides of the main frame (1). The first sealing plate (201) and the second sealing plate (202) are slidably connected to the main frame (1) via the sliding rails (203). Elastic sealing strips (204) are embedded in the outer edges of the first sealing plate (201) and the second sealing plate (202), and the elastic sealing strips (204) are connected to the main frame (1) via the sliding rails (205). The inner wall is fitted together. One end of the first sealing plate (201) and the second sealing plate (202) is fixedly connected to a limiting block (208). The limiting block (208) cooperates with the end of the sliding track (203). The other end of the first sealing plate (201) and the second sealing plate (202) is fixedly connected to a rack (209). The rack (209) meshes with a gear set (206). The center position of the gear set (206) is fixedly connected to a drive shaft (205). One end of the drive shaft (205) passes through the main frame (1) and is fixedly connected to the output shaft of the drive motor (207). The drive motor (207) is embedded in the outer wall of the main frame (1).

3. The waterproof structure of a continuous vacuum magnetron sputtering machine according to claim 2, characterized in that, The flow guiding component (3) includes a flow guiding groove (301), a drain pipe (302), a filter screen (303), a liquid collection box (304), and a drain valve (305). The flow guiding groove (301) is provided on the bottom inner wall of the main frame (1). The drain pipe (302) is connected to the lowest point of the flow guiding groove (301). The filter screen (303) is embedded inside the drain pipe (302). The outlet end of the drain pipe (302) is connected to the liquid collection box (304). The liquid collection box (304) is fixedly installed on the outer side wall of the main frame (1). The drain valve (305) is provided at the bottom of the liquid collection box (304).

4. The waterproof structure of a continuous vacuum magnetron sputtering machine according to claim 2, characterized in that, The elastic sealing strip (204) is made of flexible material and has a rectangular cross-sectional shape.

5. The waterproof structure of a continuous vacuum magnetron sputtering machine according to claim 2, characterized in that, The gear set (206) includes two meshing gears, one of which is fixedly connected to the drive shaft (205).

6. The waterproof structure of a continuous vacuum magnetron sputtering machine according to claim 3, characterized in that, The cross-section of the guide channel (301) is inclined, with an inclination angle of 3 to 5 degrees.

7. The waterproof structure of a continuous vacuum magnetron sputtering machine according to claim 3, characterized in that, The filter screen (303) is made of metal or polymer material, and the pore size of the filter screen (303) is 0.5 mm to 1 mm.

8. The waterproof structure of a continuous vacuum magnetron sputtering machine according to claim 3, characterized in that, The drain valve (305) is fixed to the collection box (304) by means of threaded connection or snap-fit ​​connection.

9. The waterproof structure of a continuous vacuum magnetron sputtering machine according to claim 1, characterized in that, Two sliding tracks (203) are symmetrically opened on the inner walls of both sides of the main frame (1), and the length of each sliding track (203) is 200 mm to 300 mm.

10. The waterproof structure of a continuous vacuum magnetron sputtering machine according to claim 1, characterized in that, At least two guide grooves (301) are provided on the bottom inner wall of the main frame (1), and the width of each guide groove (301) is 10 mm to 20 mm.

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