Semiconductor basket multi-slot cleaning machine
Patent Information
- Application Number
- CN202522230411.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-10-22
- Publication Date
- 2026-10-13
- Estimated Expiration
- 2035-10-22
AI Technical Summary
[0004]为了弥补以上不足,本实用新型提供了半导体花篮多槽式清洗机,旨在改善现有技术中半导体花篮清洗机缺乏多槽式设计,无法独立有序清洗流程,各环节易混同导致交叉污染,清洗效率大幅降低,洁净度难以达标,无法满足半导体生产对花篮清洁的严苛要求的问题
[0021]1、本实用新型中,启动滑块一底部的电动推杆,可驱动连接盒下移,通过夹持爪钩起并转移半导体花篮,启动滑块二前侧的伺服电机一带动滑轮旋转,使防滑套转动,因其顶部接触滑轨底部,故防滑套旋转时会带动滑块一在滑轨底部滑动,将半导体花篮转移至其他机箱,使清洗机拥有独立有序的清洗流程,各槽分工明确,可依次预洗主洗漂洗等,避免交叉污染,显著提升清洗效率与洁净度,满足半导体生产严苛要求。
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Figure CN224852542U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of semiconductor cleaning technology, and in particular to a semiconductor basket multi-tank cleaning machine. Background Technology
[0002] Semiconductor basket cleaning machines are specialized equipment for deep cleaning of baskets that carry wafers in semiconductor manufacturing. They remove contaminants through a combination of chemical and physical processes. Chemically, specific cleaning agents break down the chemical bonds of contaminants such as organic matter and metal ions on the basket surface. Physically, high-pressure spraying and ultrasonic waves are used to peel off stubborn impurities and remove them from the surface. Combined with precise rinsing and drying processes, secondary contamination caused by cleaning agent residue and moisture is avoided. In terms of structural design, the equipment typically includes a corrosion-resistant frame, a functional tank system, an automated material transfer mechanism, and a drying system. All parts work together to ensure the efficiency and stability of the cleaning process. Through orderly planning of the cleaning process and strict control of key links, the overall system ensures that the cleaned baskets meet the stringent cleanliness requirements of semiconductor manufacturing and avoids damage to the basket's structure and performance.
[0003] The mechanical structure of a semiconductor basket cleaning machine mainly consists of a corrosion-resistant frame, a tank, and a drying device. The corrosion-resistant frame is made of stainless steel and other materials, providing stable support for the equipment and resisting chemical reagent corrosion. The tank includes multiple functional tanks, such as acid and alkali tanks and ultrasonic cleaning tanks for chemical cleaning, as well as water tanks for rinsing. The drying device uses hot air and vacuum to remove moisture from the surface of the baskets after cleaning. However, existing semiconductor basket cleaning machines lack a multi-tank design, making it impossible to have an independent and orderly cleaning process. The various stages are easily mixed, leading to cross-contamination, significantly reducing cleaning efficiency, and making it difficult to meet the cleanliness standards required for basket cleaning in semiconductor production. Utility Model Content
[0004] To overcome the above shortcomings, this utility model provides a semiconductor basket multi-tank cleaning machine, which aims to improve the existing semiconductor basket cleaning machine's lack of multi-tank design, inability to independently and orderly clean the process, easy mixing of various links leading to cross-contamination, significantly reduced cleaning efficiency, difficulty in achieving cleanliness standards, and inability to meet the stringent requirements of semiconductor production for basket cleaning.
[0005] To achieve the above objectives, the present invention adopts the following technical solution: a semiconductor basket multi-tank cleaning machine, comprising a chassis and semiconductor baskets, wherein a transfer mechanism is installed on the top of the inner wall of the chassis, the transfer mechanism being used to transfer the semiconductor baskets to other tanks for cleaning, and a vibration mechanism is installed on the bottom of the inner wall of the chassis, the vibration mechanism being used to improve the cleaning efficiency of the semiconductor baskets, the transfer mechanism comprising a slide rail, the slide rail being fixedly connected to the top of the inner wall of the chassis, an electric push rod being installed on the bottom of the outer wall of the slide rail, the output end of the electric push rod being fixedly connected to a connecting box, clamping claws being installed on both the left and right sides of the bottom of the outer wall of the connecting box, and a sliding component being slidably connected to the bottom of the outer wall of the slide rail.
[0006] As a further description of the above technical solution:
[0007] The sliding assembly includes a servo motor, which is installed at the bottom of the outer wall of the slide rail. A pulley is fixedly connected to the output end of the servo motor, and an anti-slip sleeve is fixedly connected to the middle of the outer wall of the pulley. A slider is installed at the bottom of the outer wall of the anti-slip sleeve.
[0008] As a further description of the above technical solution:
[0009] The vibration mechanism includes a support plate, which is fixedly connected to the bottom of the inner wall of the chassis. A fixing plate is fixedly connected to the top of the outer wall of the support plate. A sliding groove is installed on the rear side of the outer wall of the fixing plate. A sealing box is fixedly connected to the front side of the outer wall of the fixing plate. A drive assembly is installed in the middle of the inner wall of the sealing box.
[0010] As a further description of the above technical solution:
[0011] The drive assembly includes a second servo motor, which is installed in the middle of the inner wall of the sealed box. A rotating disk is fixedly connected to the output end of the second servo motor. A rotating shaft is fixedly connected to the bottom of the outer wall of the rotating disk. A second slider is slidably connected to the rear side of the outer wall of the rotating shaft. A connecting plate is fixedly connected to the top of the outer wall of the second slider. Connecting columns are slidably connected to the left and right sides of the outer wall of the connecting plate. A limit plate is fixedly connected to the top of the outer wall of the connecting column. A spring is fixedly connected to the bottom of the outer wall of the limit plate.
[0012] As a further description of the above technical solution:
[0013] A semiconductor basket is installed in the middle of the inner wall of the chassis, and fixing blocks are fixedly connected to the left and right sides of the outer wall of the semiconductor basket.
[0014] As a further description of the above technical solution:
[0015] Support columns are fixedly connected to the four corners of the bottom of the outer wall of the chassis, and shock-absorbing pads are installed on the bottom of the outer wall of the support columns.
[0016] As a further description of the above technical solution:
[0017] An exhaust port is installed on the top of the outer wall of the chassis.
[0018] As a further description of the above technical solution:
[0019] A connecting piece is fixedly connected to the top of the outer wall of the chassis, and two bolts are threadedly connected to the middle of the outer wall of the connecting piece.
[0020] This utility model has the following beneficial effects:
[0021] 1. In this utility model, the electric push rod at the bottom of the start slider one can drive the connecting box to move down, and the semiconductor basket is hooked and transferred by the clamping claw. The servo motor on the front side of the start slider two drives the pulley to rotate, causing the anti-slip sleeve to rotate. Since its top contacts the bottom of the slide rail, the rotation of the anti-slip sleeve will drive the slider one to slide at the bottom of the slide rail, transferring the semiconductor basket to other boxes. This gives the cleaning machine an independent and orderly cleaning process, with each tank having a clear division of labor. Pre-washing, main washing, rinsing, etc. can be carried out in sequence to avoid cross-contamination, significantly improve cleaning efficiency and cleanliness, and meet the stringent requirements of semiconductor production.
[0022] 2. In this utility model, the servo motor 2 inside the sealed box is started, driving the rotating disk and the bottom rotating shaft to rotate, causing the slider 2 to slide up and down in the groove, so that the top connecting plate moves accordingly. The spring on the connecting plate is installed inside the connecting post through the limiting plate. Therefore, when the connecting plate moves, it causes the spring to deform and extend. Through the spring top limiting plate, the connecting post is driven to slide in the connecting plate, realizing the flexible tapping vibration of the bottom of the semiconductor basket. This can enhance the contact between the cleaning liquid and the basket, make the stubborn impurities more thoroughly removed, improve the cleaning uniformity, shorten the cleaning time, help improve the overall cleaning efficiency and cleanliness, and ensure the stability of the cleaning effect. Attached Figure Description
[0023] Figure 1 This is a perspective view of the semiconductor basket multi-tank cleaning machine proposed in this utility model;
[0024] Figure 2 This is a front view of the semiconductor basket multi-tank cleaning machine proposed in this utility model;
[0025] Figure 3 This is a cross-sectional view of the semiconductor basket multi-tank cleaning machine proposed in this utility model;
[0026] Figure 4 This is a partial structural schematic diagram of the semiconductor basket multi-tank cleaning machine proposed in this utility model;
[0027] Figure 5 This is a partial structural exploded view of the semiconductor basket multi-tank cleaning machine proposed in this utility model.
[0028] Legend:
[0029] 1. Chassis; 2. Material Transfer Mechanism; 201. Slide Rail; 202. Electric Push Rod; 203. Connecting Box; 204. Clamping Claw; 205. Sliding Assembly; 2051. Servo Motor 1; 2052. Pulley; 2053. Anti-slip Sleeve; 2054. Slider 1; 3. Vibration Mechanism; 301. Support Plate; 302. Fixing Plate; 303. Slide Groove; 304. Sealing Box; 305. Drive Assembly; 3051. Servo Motor 2; 3052. Rotary Disk; 3053. Rotating Shaft; 3054. Slider 2; 3055. Connecting Plate; 3056. Connecting Column; 3057. Spring; 3058. Limiting Plate; 4. Semiconductor Basket; 5. Fixing Block; 6. Support Column; 7. Shock Absorbing Pad; 8. Exhaust Port; 9. Connecting Plate; 10. Bolt. Detailed Implementation
[0030] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.
[0031] Reference Figure 1 , Figure 3 and Figure 4This utility model provides an embodiment of a semiconductor basket multi-tank cleaning machine, including a housing 1 and semiconductor baskets 4. A transfer mechanism 2 is installed on the top of the inner wall of the housing 1, used to transfer the semiconductor baskets 4 to other tanks for cleaning. A vibration mechanism 3 is installed on the bottom of the inner wall of the housing 1, used to enhance the cleaning efficiency of the semiconductor baskets 4. The transfer mechanism 2 includes a slide rail 201, which is fixedly connected to the top of the inner wall of the housing 1. An electric push rod 202 is installed on the bottom of the outer wall of the slide rail 201. The electric push rod 202 is a LAM3 electric push rod 202, driven by a motor and gear screw, rotating into linear motion. A limit device controls the stroke of the electric push rod 202. A connecting box 203 is fixedly connected to the output end. Clamping claws 204 are installed on the left and right sides of the bottom of the outer wall of the connecting box 203. A sliding component 205 is slidably connected to the bottom of the outer wall of the slide rail 201. The sliding component 205 includes a servo motor 2051. The servo motor 2051 is an SG90 servo motor 2051. It receives PWM signals, converts them through a circuit to drive the motor, and achieves angle control through gear transmission. The servo motor 2051 is installed on the bottom of the outer wall of the slide rail 201. A pulley 2052 is fixedly connected to the output end of the servo motor 2051. An anti-slip sleeve 2053 is fixedly connected to the middle of the outer wall of the pulley 2052. A slider 2054 is installed on the bottom of the outer wall of the anti-slip sleeve 2053.
[0032] Specifically, activating the electric push rod 202 installed at the bottom of slider 1 2054 outputs a stable thrust to drive the connecting box 203 to move downwards vertically. The clamping claw 204 at the bottom of the connecting box 203 hooks onto the semiconductor basket 4, achieving reliable gripping and transfer. Activating the servo motor 2051 installed at the front of slider 2 3054 outputs torque to drive the pulley 2052 to rotate around its axis, thereby driving the anti-slip sleeve 2053, which is sleeved on the outside of the pulley 2052, to rotate synchronously. The top of the anti-slip sleeve 2053 is in close contact with the bottom of the slide rail 201, forming a frictional transmission. When the anti-slip sleeve 2053 rotates under the drive of the servo motor 2051, it can drive the slider 2054 to slide smoothly along the bottom of the slide rail 201 through friction, and accurately transfer the clamped semiconductor basket 4 to other chassis 1. This automated transfer mechanism enables the cleaning machine to form an independent and orderly cleaning process. Each tank has a clear division of labor according to the process, and can complete multiple processes such as pre-washing, main washing and rinsing in sequence. This effectively avoids cross-contamination of sewage in different cleaning stages, significantly improves the cleaning efficiency and surface cleanliness of semiconductor components, and meets the stringent requirements for component cleanliness in the semiconductor production process.
[0033] Reference Figure 1 , Figure 2 and Figure 5The vibration mechanism 3 includes a support plate 301, which is fixedly connected to the bottom of the inner wall of the housing 1. A fixing plate 302 is fixedly connected to the top of the outer wall of the support plate 301. A sliding groove 303 is installed on the rear side of the outer wall of the fixing plate 302. A sealing box 304 is fixedly connected to the front side of the outer wall of the fixing plate 302. A drive assembly 305 is installed in the middle of the inner wall of the sealing box 304. The drive assembly 305 includes a second servo motor 3051. The second servo motor 3051 is an EM5J servo motor 3051. It drives the motor by receiving signals, and achieves closed-loop precise control through encoding feedback. Servo motor 3051 is installed in the middle of the inner wall of the sealing box 304. The output end of servo motor 3051 is fixedly connected to a rotating disk 3052. The bottom of the outer wall of the rotating disk 3052 is fixedly connected to a rotating shaft 3053. The rear side of the outer wall of the rotating shaft 3053 is slidably connected to a slider 3054. The top of the outer wall of slider 3054 is fixedly connected to a connecting plate 3055. The left and right sides of the outer wall of the connecting plate 3055 are slidably connected to connecting posts 3056. The top of the outer wall of the connecting post 3056 is fixedly connected to a limit plate 3058. The bottom of the outer wall of the limit plate 3058 is fixedly connected to a spring 3057.
[0034] Specifically, servo motor 3051, installed inside the sealed box 304, is activated, outputting a stable torque to drive the rotating disk 3052 to rotate around its own axis. This, in turn, drives the rotating shaft 3053, installed at the bottom of the rotating disk 3052, to rotate synchronously via a rigid connection structure. As the rotating shaft 3053 continues to rotate under the driving force, it drives slider 3054 to slide rhythmically up and down under the guidance and constraint of the groove 303 via an eccentric transmission principle. This, in turn, drives the connecting plate 3055, fixed at its top, to move synchronously vertically. Spring 3057, installed on the connecting plate 3055, uses the positioning action of the limiting plate 3058 to elastically assemble the connecting column 3056 inside, forming a transmission component with buffering capacity. Therefore, when… When the connecting plate 3055 moves up and down, it causes the spring 3057 to deform and expand in a controllable manner. Then, through the limiting plate 3058 fixed on the top of the spring 3057, the force is flexibly transmitted to the connecting post 3056, causing the connecting post 3056 to slide adaptively within the connecting plate 3055. This ultimately achieves the effect of gently tapping and vibrating the bottom of the semiconductor basket 4. This vibration mechanism can significantly enhance the contact strength and frequency between the cleaning fluid and the semiconductor basket 4 and the surface of the internal components, making the removal of stubborn impurities more thorough, effectively improving the uniformity of the cleaning operation, greatly shortening the cleaning time required to reach the preset cleanliness standard, helping to improve the overall cleaning efficiency and the cleanliness of the component surface, and providing a reliable guarantee for the long-term stability of the cleaning effect.
[0035] Reference Figure 1 , Figure 2 and Figure 3A semiconductor basket 4 is installed in the middle of the inner wall of the chassis 1. Fixing blocks 5 are fixedly connected to the left and right sides of the outer wall of the semiconductor basket 4. Support columns 6 are fixedly connected to the four corners of the bottom of the outer wall of the chassis 1. Shock-absorbing pads 7 are installed at the bottom of the outer wall of the support columns 6. An exhaust port 8 is installed on the top of the outer wall of the chassis 1. A connecting piece 9 is fixedly connected to the top of the outer wall of the chassis 1. Two bolts 10 are threadedly connected to the middle of the outer wall of the connecting piece 9.
[0036] Specifically, the semiconductor basket 4 slides inside the housing 1 through the fixing blocks 5 fixed on both sides, assisting the operation of the vibration mechanism 3. The bottom of the support column 6 is equipped with shock-absorbing pads 7 to provide shock absorption and anti-slip effect for the device. The exhaust port 8 is installed on the top of the housing 1 to discharge the waste gas and steam generated during the cleaning process. The housings 1 with different functions are connected by connecting pieces and bolts 10.
[0037] Working principle: Activating the electric push rod 202 installed at the bottom of slider 1 2054 drives the connecting box 203 to move downwards, and hooks and transfers the semiconductor basket 4 through the clamping claw 204. Activating the servo motor 2051 installed on the front side of slider 2 3054 drives the pulley 2052 to rotate, which in turn drives the anti-slip sleeve 2053 to rotate. The top of the anti-slip sleeve 2053 contacts the bottom of the slide rail 201. Therefore, when the anti-slip sleeve 2053 rotates, it can drive slider 1 2054 to slide at the bottom of the slide rail 201, transferring the semiconductor basket 4 to other housings 1. This gives the cleaning machine an independent and orderly cleaning process. Each tank has a clear division of labor and can perform pre-washing, main washing and rinsing operations in sequence, avoiding cross-contamination, significantly improving cleaning efficiency and cleanliness, and meeting the stringent requirements of semiconductor production.
[0038] Activating the servo motor 3051 installed in the sealed box 304 drives the rotating disk 3052 to rotate, which in turn drives the rotating shaft 3053 installed at the bottom of the rotating disk 3052 to rotate. When the rotating shaft 3053 rotates, it drives the slider 3054 to slide up and down in the groove 303, which in turn drives the connecting plate 3055 fixed on its top to move up and down. The spring 3057 installed on the connecting plate 3055 is installed inside the connecting post 3056 through the limiting plate 3058. Therefore, when the connecting plate 3055 moves up and down, it drives the spring 3057 to deform and extend, which in turn drives the connecting post 3056 to slide in the connecting plate 3055 through the limiting plate 3058 fixed on the top of the spring 3057. This achieves the effect of flexibly tapping the bottom of the flower basket 4 of the vibrating semiconductor, which can enhance the contact between the cleaning fluid and the flower basket, remove stubborn impurities more thoroughly, improve cleaning uniformity, reduce cleaning time, help improve overall cleaning efficiency and cleanliness, and ensure the stability of cleaning effect.
[0039] Finally, it should be noted that the above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Although the present utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.
Claims
1. A semiconductor basket multi-tank cleaning machine, comprising a chassis (1) and semiconductor baskets (4), characterized in that: The top of the inner wall of the chassis (1) is equipped with a transfer mechanism (2), which is used to transfer the semiconductor basket (4) to other tanks for cleaning. The bottom of the inner wall of the chassis (1) is equipped with a vibration mechanism (3), which is used to improve the cleaning efficiency of the semiconductor basket (4). The material transfer mechanism (2) includes a slide rail (201), which is fixedly connected to the top of the inner wall of the housing (1). An electric push rod (202) is installed on the bottom of the outer wall of the slide rail (201). A connecting box (203) is fixedly connected to the output end of the electric push rod (202). Clamping claws (204) are installed on both the left and right sides of the bottom of the outer wall of the connecting box (203). A sliding component (205) is slidably connected to the bottom of the outer wall of the slide rail (201).
2. The semiconductor basket multi-tank cleaning machine according to claim 1, characterized in that: The sliding assembly (205) includes a servo motor (2051), which is installed on the bottom of the outer wall of the slide rail (201). The output end of the servo motor (2051) is fixedly connected to a pulley (2052). An anti-slip sleeve (2053) is fixedly connected to the middle of the outer wall of the pulley (2052). A slider (2054) is installed on the bottom of the outer wall of the anti-slip sleeve (2053).
3. The semiconductor basket multi-tank cleaning machine according to claim 1, characterized in that: The vibration mechanism (3) includes a support plate (301), which is fixedly connected to the bottom of the inner wall of the housing (1). A fixing plate (302) is fixedly connected to the top of the outer wall of the support plate (301). A sliding groove (303) is installed on the rear side of the outer wall of the fixing plate (302). A sealing box (304) is fixedly connected to the front side of the outer wall of the fixing plate (302). A drive assembly (305) is installed in the middle of the inner wall of the sealing box (304).
4. The semiconductor basket multi-tank cleaning machine according to claim 3, characterized in that: The drive assembly (305) includes a second servo motor (3051), which is installed in the middle of the inner wall of the sealed box (304). The output end of the second servo motor (3051) is fixedly connected to a rotating disk (3052). The bottom of the outer wall of the rotating disk (3052) is fixedly connected to a rotating shaft (3053). The rear side of the outer wall of the rotating shaft (3053) is slidably connected to a second slider (3054). The top of the outer wall of the second slider (3054) is fixedly connected to a connecting plate (3055). The left and right sides of the outer wall of the connecting plate (3055) are slidably connected to connecting posts (3056). The top of the outer wall of the connecting post (3056) is fixedly connected to a limiting plate (3058). The bottom of the outer wall of the limiting plate (3058) is fixedly connected to a spring (3057).
5. The semiconductor basket multi-tank cleaning machine according to claim 1, characterized in that: A semiconductor basket (4) is installed in the middle of the inner wall of the chassis (1), and a fixing block (5) is fixedly connected to the left and right sides of the outer wall of the semiconductor basket (4).
6. The semiconductor basket multi-tank cleaning machine according to claim 1, characterized in that: The four corners of the bottom of the outer wall of the chassis (1) are fixedly connected to support columns (6), and shock-absorbing pads (7) are installed on the bottom of the outer wall of the support columns (6).
7. The semiconductor basket multi-tank cleaning machine according to claim 1, characterized in that: An exhaust port (8) is installed on the top of the outer wall of the chassis (1).
8. The semiconductor basket multi-tank cleaning machine according to claim 1, characterized in that: A connecting piece (9) is fixedly connected to the top of the outer wall of the chassis (1), and two bolts (10) are threadedly connected to the middle of the outer wall of the connecting piece (9).