Vacuum magnetron sputtering source target device with a baffle

Abstract

The utility model provides a kind of vacuum magnetron sputtering source target material device with baffle, comprising: door plate, target box, cathode, cooling backplate, target material, anode shield, automatic baffle assembly, target material distance adjustment component and magnetic field adjustment component.Door plate separates air and vacuum portion, target box, cathode etc. are sequentially arranged in vacuum side;Target material can be accurately controlled with the distance of coating workpiece by distance adjustment component, and magnetic field adjustment component moves cathode by linear drive component to optimize target material area magnetic field distribution.Automatic baffle assembly protects target material in non-working state, and it can be manually or automatically removed when working, and it has target material self-cleaning condition.The utility model provides a kind of structure scheme of vacuum magnetron sputtering source, so that target material and coating workpiece can be adjusted in vacuum condition, strip-shaped baffle can be closed in vacuum state when non-working state, by adjusting target material area magnetic field distribution, it can improve target material utilization rate, and static seal is used in atmosphere and vacuum transmission.

Description

Technical Field

[0001] This utility model relates to the field of vacuum magnetron sputtering technology, specifically to a vacuum magnetron sputtering source target device with a baffle. Background Technology

[0002] Magnetron sputtering is a commonly used thin film deposition technology, widely applied in various industrial fields such as optics, electronics, and decoration. Traditional magnetron sputtering devices typically include a target material to generate sputtered particles and a substrate to receive these particles to form a thin film. To improve sputtering efficiency and film quality, it is usually necessary to precisely control factors such as the distance between the target and the substrate, the magnetic field strength and distribution, etc. In addition, appropriate protective measures are usually required to protect the target material from contamination or damage when it is not in operation.

[0003] The shortcomings of existing technology: 1. Insufficient target protection: In vacuum chambers with multiple targets sputtering, the targets are exposed and contaminate each other, resulting in reduced performance and shortened service life.

[0004] 2. Inconvenient adjustment of the distance between the target and the workpiece: The distance between the target and the workpiece directly affects the quality of the film, and the existing distance adjustment mechanism may be complicated to operate, affecting production efficiency.

[0005] 3. Difficulty in adjusting the magnetic field: The magnetic field is one of the key factors affecting sputtering efficiency, but existing methods of adjusting the magnetic field are often not flexible enough, thus limiting the material utilization rate during the sputtering process.

[0006] Therefore, existing technologies have shortcomings and need further improvement. Utility Model Content

[0007] To address the problems existing in the prior art, this utility model provides a vacuum magnetron sputtering source target device with a baffle.

[0008] To achieve the above objectives, the specific solution of this utility model is as follows: This utility model provides a vacuum magnetron sputtering source target device with a baffle, comprising: Door panel, target box, cathode, cooling backplate, target material, anode shield, automatic baffle assembly, target material distance adjustment assembly, magnetic field adjustment assembly; The door panel is used to separate the air and vacuum portions; The target box, cathode, cooling backplate, and target material are arranged sequentially from left to right on the vacuum side of the door panel. The cooling backplate is installed on the back of the target material. The target material and the cooling backplate are installed together on the target box. The cathode is movably arranged between the target box and the cooling backplate. The anode shield is arranged on the outside of the target material. The target distance adjustment component is installed on the door panel. The front end of the output shaft of the target distance adjustment component is installed on the back of the target box, which is used to drive the target box forward or backward, thereby driving the target material installed on the target box to move, thereby adjusting the distance between the target material and the coating workpiece. The magnetic field adjustment component is located below the target distance adjustment component and is installed on the door panel. The magnetic field adjustment component is a linear drive component. The output shaft of the magnetic field adjustment component is set along the direction of the target material approaching or moving away from the coated workpiece. The output shaft passes through the door panel and extends into the vacuum side of the door panel through a static seal. The front end of the output shaft is installed on the back of the cathode to drive the cathode to move along the direction, thereby adjusting the relative distance between the cathode and the outer anode shield of the target material to adjust the magnetic field of the target material area. The automatic baffle assembly includes: a first mounting plate, a second mounting plate, a first chain, a second chain, a first gear, a second gear, a plurality of strip baffles, a baffle power unit, and a drive shaft; The first mounting plate and the second mounting plate are located on the vacuum side of the door panel and are installed above and below the target box; A first gear is installed at each of the four corners of the lower side of the first mounting plate, and a first chain is installed on the outside of the four first gears; A second gear is installed at each of the four corners of the upper side of the second mounting plate, and a second chain is installed on the outside of the four second gears; The upper and lower ends of the drive shaft are respectively connected to a first gear and a second gear; The baffle power unit is mounted on the door panel and its output shaft has a drive gear at the front end, which meshes with the driven gear in the drive shaft. The upper and lower ends of the strip baffle are respectively mounted on the first chain and the second chain. The output shaft of the baffle power unit drives the transmission shaft to rotate through the meshing of the active transmission gear and the driven transmission gear, thereby driving the first gear and the second gear to rotate, which in turn drives the first chain and the second chain to move, and in turn drives the strip baffle installed between the first chain and the second chain to move. When the strip baffle moves to the front of the target material, it blocks the target material, thereby protecting the target material when it is not in operation, and removing it when it is in operation.

[0009] Furthermore, the baffle power unit includes a first motor or a rocker arm. The rocker arm can be manually cranked to drive the active transmission gear to rotate, or the first motor can automatically drive the active transmission gear to rotate, which in turn drives the transmission shaft to rotate via the driven transmission gear, thereby causing the strip baffle to block or move away from the target material. The baffle blocks the target material to prevent it from being contaminated by other sputtered target materials, and the blocked target material can achieve a self-cleaning function through self-sputtering.

[0010] Furthermore, a static seal is used between the target distance adjustment component, the magnetic field adjustment component, the baffle power unit and the door panel to prevent vacuum leakage.

[0011] Furthermore, a cooling water pipe is provided on the right side of the target material for cooling the target material.

[0012] Furthermore, a first docking assembly and a second docking assembly are respectively installed at the upper and lower ends of the target box; Both the first docking assembly and the second docking assembly pass through the door panel to the air side; The first and second docking components are statically sealed to the door panel; The first docking assembly is provided with a first water pipe connector, and the second docking assembly is provided with a second water pipe connector. The first water pipe connector and the second water pipe connector are respectively connected to the upper end and the lower end of the cooling water pipe.

[0013] Furthermore, the first docking assembly and the second docking assembly are respectively provided with a first air pipe connector and a second air pipe connector. The first air pipe connector and the second air pipe connector are both used to evacuate or inject working gas, including inert gas, to the vacuum side of the door panel.

[0014] Furthermore, the first docking assembly and the second docking assembly are respectively provided with a first power-on post and a second power-on post for supplying power to the cathode.

[0015] Furthermore, a distance feedback component is also installed on the door panel. The distance feedback component includes a first sensor and a second rod. The first sensor is installed on the door panel, the front end of the second rod is installed on the back of the target box and moves with the target box, and the rear end of the second rod is located on the side of the first sensor. The first sensor obtains the movement of the target box through the movement of the second rod.

[0016] Furthermore, the anode shield is a long, frame-shaped cover disposed on the outside of the target material to protect the target material.

[0017] The technical solution of this utility model has the following beneficial effects: 1. Improve the protective effect of the target material: The automatic baffle assembly can shield the target material when not in operation, preventing contamination from other sputtering targets. The shielded target material can then self-sputter for self-cleaning. This effectively prevents contamination or damage to the target material, extending its service life.

[0018] 2. Optimize the distance adjustment between the target and the workpiece: The target distance adjustment component allows for adjustment of the distance between the target and the workpiece to be coated, thereby enabling better control of the film quality and uniformity.

[0019] 3. Improve magnetic field regulation function: The magnetic field adjustment component can drive the cathode to move along the direction close to or away from the outer anode shield of the target material through the output shaft, thereby controlling the magnetic field strength and distribution in the target area and improving sputtering efficiency.

[0020] 4. Improve sealing performance: The statically sealed transmission design between key components effectively prevents vacuum leakage and ensures the stability of the sputtering process.

[0021] 5. Enhance cooling system efficiency: The design of the cooling water pipes helps to dissipate the heat generated by the target material in a timely manner, keeping the target material temperature within a suitable range, and ensuring the safety of the sputtering process and the stability of the target material. Attached Figure Description

[0022] Figure 1 This is a perspective view of the front of this utility model; Figure 2 This is a perspective view of the utility model from the rear view angle; Figure 3 This is a side view of the present invention; Figure 4 This is a cross-sectional view of the present invention; Figure 5 This is an exploded view of this utility model.

[0023] In the picture: 1. Door panel; 2. Target box; 3. Cathode; 4. Cooling backplate; 5. Target material; 6. Target distance adjustment assembly; 7. Magnetic field adjustment assembly; 8. Anode shield; 901. First mounting plate; 902. Second mounting plate; 903. First chain; 904. Second chain; 905. First gear; 906. Second gear; 907. Strip baffle; 908. Rocker arm; 909. Drive shaft; 10. Cooling water pipes; 11. First water pipe connector; 12. Second water pipe connector; 13. First endotracheal connector; 14. Second endotracheal connector; 15. First power-on post; 16. Second power-on post. Detailed Implementation

[0024] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present invention and not intended to limit it. Furthermore, it should be noted that, for ease of description, the accompanying drawings show only the parts relevant to the present invention, not the entire structure.

[0025] In the description of this utility model, unless otherwise explicitly specified and limited, the terms "connected," "linked," and "fixed" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0026] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0027] In the description of this embodiment, the terms "upper," "lower," "front," "rear," "left," and "right," etc., refer to the orientation or positional relationship shown in the accompanying drawings. They are used only for ease of description and simplification of operation, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. In addition, the terms "first" and "second" are only used for distinction in description and have no special meaning.

[0028] Combination Figures 1-5 As shown, this utility model provides a vacuum magnetron sputtering source target 5 device with a baffle, comprising: Door panel 1, target box 2, cathode 3, cooling back plate 4, target material 5, anode shield 8, automatic baffle assembly, target material 5 distance adjustment assembly, magnetic field adjustment assembly 7; The door panel 1 is used to separate the air and vacuum portions; The target box 2, cathode 3, cooling back plate 4, and target material 5 are arranged from left to right with the vacuum side of the door panel 1. The cooling back plate 4 is installed on the back of the target material 5. The target material 5 and the cooling back plate 4 are installed together on the target box 2. The cathode 3 is movably arranged between the target box 2 and the cooling back plate 4. The anode shield 8 is arranged on the outside of the target material 5. The target material 5 distance adjustment component is installed on the door panel 1. The front end of the output shaft of the target material 5 distance adjustment component is installed on the back of the target box 2, which is used to drive the target box 2 forward or backward, thereby driving the target material 5 installed on the target box 2 to move, thereby adjusting the distance between the target material 5 and the coating workpiece. The magnetic field adjustment component 7 is located below the target material 5 distance adjustment component and is installed on the door panel 1. The magnetic field adjustment component 7 is a linear drive component. The output shaft of the magnetic field adjustment component 7 is set along the direction of the target material 5 approaching or moving away from the coated workpiece. The output shaft passes through the door panel 1 and extends into the vacuum side of the door panel 1 through a static seal. The front end of the output shaft is installed on the back of the cathode 3 to drive the cathode 3 to move along the direction, thereby adjusting the relative distance between the cathode 3 and the outer anode shield 8 of the target material 5 to adjust the magnetic field of the target material area. The automatic baffle assembly includes: a first mounting plate 901, a second mounting plate 902, a first chain 903, a second chain 904, a first gear 905, a second gear 906, a plurality of strip baffles 907, a baffle power unit, and a transmission shaft 909. The first mounting plate 901 and the second mounting plate 902 are located on the vacuum side of the door panel 1 and are installed above and below the target box 2; A first gear 905 is installed at each of the four corners of the lower side of the first mounting plate 901, and a first chain 903 is installed on the outer side of the four first gears 905. A second gear 906 is installed at each of the four corners of the upper side of the second mounting plate 902, and a second chain 904 is installed on the outside of the four second gears 906. The upper and lower ends of the drive shaft 909 are respectively connected to a first gear 905 and a second gear 906; The baffle power unit is mounted on the door panel 1 and its output shaft has an active transmission gear at the front end. The active transmission gear meshes with the driven transmission gear in the middle of the transmission shaft 909. The upper and lower ends of the strip baffle 907 are respectively mounted on the first chain 903 and the second chain 904. The output shaft of the baffle power unit drives the transmission shaft 909 to rotate through the meshing of the active transmission gear and the driven transmission gear, thereby driving the first gear 905 and the second gear 906 to rotate, which in turn drives the first chain 903 and the second chain 904 to move, and in turn drives the strip baffle 907 installed between the first chain 903 and the second chain 904 to move. When the strip baffle 907 moves to the front side of the target material 5, it blocks the target material 5, thereby protecting the target material 5 when it is not in operation, and removing it when it is in operation.

[0029] The baffle power unit includes a first motor or a rocker arm 908. The rocker arm 908 is manually cranked to drive the active transmission gear to rotate, or the first motor automatically drives the active transmission gear to rotate, which in turn drives the transmission shaft 909 to rotate via the driven transmission gear. This drives the strip baffle 907 to block or move away from the target material 5. The strip baffle 907 shields the target material to prevent it from being contaminated by other sputtered target materials. The shielded target material can self-sputter to achieve a self-cleaning function.

[0030] The target material 5 distance adjustment component, magnetic field adjustment component 7, baffle power unit and door panel 1 are statically sealed to prevent vacuum leakage.

[0031] A cooling water pipe 10 is also provided on the right side of the target material 5 for cooling the target material 5.

[0032] The target box 2 is equipped with a first docking component and a second docking component at its upper and lower ends, respectively. Both the first docking assembly and the second docking assembly pass through the door panel 1 to the air side; The first and second docking components are statically sealed to the door panel 1; The first docking assembly is provided with a first water pipe connector 11, and the second docking assembly is provided with a second water pipe connector 12. The first water pipe connector 11 and the second water pipe connector 12 are respectively connected to the upper end and the lower end of the cooling water pipe 10.

[0033] The first docking assembly and the second docking assembly are also provided with a first air pipe connector 13 and a second air pipe connector 14, respectively. The first air pipe connector 13 and the second air pipe connector 14 are both used to evacuate or inject working gas, including inert gas, to the vacuum side of the door panel 1.

[0034] The first docking assembly and the second docking assembly are also provided with a first power supply post 15 and a second power supply post 16, respectively, for supplying power to the cathode 3.

[0035] A distance feedback component is also installed on the door panel 1. The distance feedback component includes a first sensor and a second rod. The first sensor is installed on the door panel 1, and the front end of the second rod is installed on the back of the target box 2 and moves with the target box 2. The rear end of the second rod is located on the side of the first sensor. The first sensor obtains the movement of the target box 2 through the movement of the second rod.

[0036] The anode shield 8 is a long, frame-shaped cover disposed on the outside of the target material 5, used to protect the target material 5.

[0037] The principle of this utility model is as follows: Main components and their functions Door panel 1: Used to separate the air area and the vacuum area to ensure that the sputtering process is carried out in a stable vacuum environment.

[0038] Target box 2, cathode 3, cooling backplate 4, target material 5: These components are arranged sequentially on the vacuum side of the door panel 1, with the cooling backplate 4 mounted on the back of the target material 5. The target material 5 and the cooling backplate 4 are mounted together on the target box 2. The cathode 3 is movably positioned between the target box 2 and the cooling backplate 4 for easy adjustment.

[0039] Target 5 Distance Adjustment Components: Installed on the door panel 1, its output shaft front end is installed on the back of the target box 2, and by driving the target box 2 forward or backward, the distance between the target material 5 and the coating workpiece is adjusted.

[0040] Magnetic field adjustment component 7: Installed on the door panel 1, located below the target material 5 distance adjustment assembly, it is a linear drive assembly. Its output shaft is set along the direction of the target material 5 approaching or moving away from the coated workpiece. The output shaft passes through the door panel 1 and extends into the vacuum side of the door panel 1 through a static seal. The front end of the output shaft is installed on the back of the cathode 3. By driving the cathode 3 to move along the said direction, the relative distance between the cathode 3 and the outer anode shield 8 of the target material 5 is adjusted, thereby adjusting the magnetic field of the target material area.

[0041] Automatic baffle assembly: It includes a first mounting plate 901, a second mounting plate 902, a first chain 903, a second chain 904, a first gear 905, a second gear 906, several strip baffles 907, a baffle power unit, and a drive shaft 909.

[0042] The first mounting plate 901 and the second mounting plate 902 are respectively installed above and below the target box 2.

[0043] The first gear 905 and the second gear 906 are respectively mounted on the first mounting plate 901 and the second mounting plate 902, and the transmission shaft 909 is connected to the first gear 905 and the second gear 906.

[0044] The baffle power unit is installed on the door panel 1. Its output shaft has a drive gear at the front end. The drive gear meshes with the driven gear in the middle of the drive shaft 909, which drives the strip baffle 907 to move.

[0045] The upper and lower ends of the strip baffle 907 are respectively installed on the first chain 903 and the second chain 904. The chain drives the baffle to move, thereby blocking or removing the target material 5.

[0046] baffle power unit: The first motor can automatically drive the active transmission gear to rotate, or the rocker arm 908 can be manually cranked to drive the active transmission gear to rotate, which in turn drives the driven transmission gear to rotate the transmission shaft 909, and drives the strip baffle 907 to block or move away from the target material 5.

[0047] The 907 strip baffle shields the target material to prevent it from being contaminated by other sputtering targets. The shielded target material can achieve a self-cleaning function through self-sputtering.

[0048] Static sealing transmission: The distance adjustment assembly of the target material 5, the magnetic field adjustment assembly 7, the baffle power unit and the door panel 1 adopt a static sealing transmission design to prevent vacuum leakage.

[0049] Cooling system: A cooling water pipe 10 is provided on the right side of the target 5 for cooling the target 5.

[0050] The target box 2 is equipped with a first docking assembly and a second docking assembly at its upper and lower ends, respectively. These assemblies are connected to the cooling water pipe 10 via the first water pipe connector 11 and the second water pipe connector 12 to ensure temperature control of the target material 5 during operation.

[0051] Vacuum and working gas supply: The first docking assembly and the second docking assembly are provided with a first air pipe connector 13 and a second air pipe connector 14 for evacuating a vacuum or injecting working gas (such as inert gas).

[0052] Power supply system: The first docking assembly and the second docking assembly are also provided with a first power supply post 15 and a second power supply post 16, respectively, for supplying power to the cathode 3.

[0053] Distance feedback component: Installed on the door panel 1, it includes a first sensor and a second rod. The movement of the second rod is used to obtain the position change of the target box 2 and provide real-time position feedback.

[0054] Anode shield 8: It is set on the outside of the target material 5 to further protect the target material 5 and to serve as a reference component for adjusting the magnetic field when the cathode 3 moves relative to it.

[0055] Workflow Preparation phase: The required vacuum level is achieved by drawing a vacuum using the first air pipe connector 13 and the second air pipe connector 14.

[0056] The cathode 3 is powered by the first power-on post 15 and the second power-on post 16.

[0057] Target material protection 5: In the non-working state, the baffle power unit (manual or automatic) drives the strip baffle 907 to move to the front of the target material 5, blocking the target material 5 and preventing contamination or damage.

[0058] Sputtering process: The distance between the target 5 and the workpiece can be adjusted as needed, and the target box 2 can be moved forward or backward by the target 5 distance adjustment component.

[0059] Adjusting the magnetic field strength and distribution, the output shaft of the magnetic field adjustment component 7 drives the cathode 3 to move in a direction close to or away from the outer anode shield 8 of the target material 5.

[0060] Turn on the cooling system and control the temperature of the target material 5 through the cooling water pipe 10.

[0061] The position changes of the target box 2 are monitored in real time, and data is obtained through the distance feedback component.

[0062] End phase: After the work is completed, the strip baffle 907 is used again to block the target material 5 through the baffle power unit.

[0063] Through the coordinated operation of the above components, this invention achieves highly automated control of the sputtering process while ensuring effective protection of the target material 5 and stable operation of the system.

[0064] The above description is only a preferred embodiment of the present utility model and does not limit the scope of the present utility model. All equivalent structural transformations made based on the contents of the present utility model specification and drawings under the present utility model concept, or direct or indirect applications in other related technical fields, are included within the protection scope of the present utility model.

Claims

1. A vacuum magnetron sputtering source target device with a baffle, characterized in that, include: Door panel, target box, cathode, cooling backplate, target material, anode shield, automatic baffle assembly, target material distance adjustment assembly, magnetic field adjustment assembly; The door panel is used to separate the air and vacuum portions; The target box, cathode, cooling backplate, and target material are arranged sequentially from left to right on the vacuum side of the door panel. The cooling backplate is installed on the back of the target material. The target material and the cooling backplate are installed together on the target box. The cathode is movably arranged between the target box and the cooling backplate. The anode shield is arranged on the outside of the target material. The target distance adjustment component is installed on the door panel. The front end of the output shaft of the target distance adjustment component is installed on the back of the target box, which is used to drive the target box forward or backward, thereby driving the target material installed on the target box to move, thereby adjusting the distance between the target material and the coating workpiece. The magnetic field adjustment component is located below the target distance adjustment component and is installed on the door panel. The magnetic field adjustment component is a linear drive component. The output shaft of the magnetic field adjustment component is set along the direction of the target material approaching or moving away from the coated workpiece. The output shaft passes through the door panel and extends into the vacuum side of the door panel through a static seal. The front end of the output shaft is installed on the back of the cathode to drive the cathode to move along the direction, thereby adjusting the relative distance between the cathode and the outer anode shield of the target material to adjust the magnetic field of the target material area. The automatic baffle assembly includes: a first mounting plate, a second mounting plate, a first chain, a second chain, a first gear, a second gear, a plurality of strip baffles, a baffle power unit, and a drive shaft; The first mounting plate and the second mounting plate are located on the vacuum side of the door panel and are installed above and below the target box; A first gear is installed at each of the four corners of the lower side of the first mounting plate, and a first chain is installed on the outside of the four first gears; A second gear is installed at each of the four corners of the upper side of the second mounting plate, and a second chain is installed on the outside of the four second gears; The upper and lower ends of the drive shaft are respectively connected to a first gear and a second gear; The baffle power unit is mounted on the door panel and its output shaft has a drive gear at the front end, which meshes with the driven gear in the middle of the drive shaft. The upper and lower ends of the strip baffle are respectively mounted on the first chain and the second chain. The output shaft of the baffle power unit drives the transmission shaft to rotate through the meshing of the active transmission gear and the driven transmission gear, thereby driving the first gear and the second gear to rotate, which in turn drives the first chain and the second chain to move, and in turn drives the strip baffle installed between the first chain and the second chain to move. When the strip baffle moves to the front of the target material, it blocks the target material, thereby protecting the target material when it is not in operation, and removing it when it is in operation.

2. The vacuum magnetron sputtering source target device with a baffle according to claim 1, characterized in that, The baffle power unit includes a first motor or a rocker arm. The rocker arm is manually cranked to drive the active transmission gear to rotate, or the first motor automatically drives the active transmission gear to rotate, which in turn drives the transmission shaft to rotate via the driven transmission gear, thereby causing the strip baffle to block or move away from the target material. The baffle blocks the target material to prevent it from being contaminated by other sputtering targets, and the blocked target material achieves a self-cleaning function through self-sputtering.

3. The vacuum magnetron sputtering source target device with a baffle according to claim 1, characterized in that, The target distance adjustment assembly, magnetic field adjustment assembly, baffle power unit and door panel are statically sealed to prevent vacuum leakage.

4. The vacuum magnetron sputtering source target device with a baffle according to claim 3, characterized in that, A cooling water pipe is also provided on the right side of the target material for cooling the target material.

5. The vacuum magnetron sputtering source target device with a baffle according to claim 4, characterized in that, The target box is equipped with a first docking assembly and a second docking assembly at its upper and lower ends, respectively. Both the first docking assembly and the second docking assembly pass through the door panel to the air side; The first and second docking components are statically sealed to the door panel; The first docking assembly is provided with a first water pipe connector, and the second docking assembly is provided with a second water pipe connector. The first water pipe connector and the second water pipe connector are respectively connected to the upper end and the lower end of the cooling water pipe.

6. The vacuum magnetron sputtering source target device with a baffle according to claim 5, characterized in that, The first docking assembly and the second docking assembly are also respectively provided with a first air pipe connector and a second air pipe connector. The first air pipe connector and the second air pipe connector are both used to evacuate or inject working gas, including inert gas, into the vacuum side of the door panel.

7. The vacuum magnetron sputtering source target device with a baffle according to claim 5, characterized in that, The first docking assembly and the second docking assembly are also respectively provided with a first power-on post and a second power-on post for supplying power to the cathode.

8. The vacuum magnetron sputtering source target device with a baffle according to claim 1, characterized in that, A distance feedback component is also installed on the door panel. The distance feedback component includes a first sensor and a second rod. The first sensor is installed on the door panel, and the front end of the second rod is installed on the back of the target box and moves with the target box. The rear end of the second rod is located on the side of the first sensor. The first sensor obtains the movement of the target box through the movement of the second rod.

9. The vacuum magnetron sputtering source target device with a baffle according to claim 1, characterized in that, The anode shield is a long, frame-shaped cover placed on the outside of the target material.

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