Photoresist drying apparatus exhaust treatment device

Abstract

The utility model relates to a photoresist drying equipment tail gas treatment device, including intercommunication component, heat exchange component and cleaning component, intercommunication component includes box, air inlet pipe and air outlet pipe, is provided with containing chamber in the box, and air inlet pipe and air outlet pipe all are open with containing chamber, heat exchange component includes cooling pipe and heat exchange fin, and multiple heat exchange fins are arranged on cooling pipe interval, cleaning component includes liquid storage tank, and liquid storage tank communicates with containing chamber through inlet pipe, and the bottom of box is connected to liquid outlet pipe. The utility model discloses a photoresist drying equipment tail gas treatment device is set up through cleaning component, makes inlet pipe to be able to input cleaning fluid to containing chamber, to clean the colloid that heat exchange component tail gas processing after staying on cooling pipe and heat exchange fin, and is discharged through liquid outlet pipe, realizes the automatic cleaning of heat exchange component, guarantees the heat exchange capacity of heat exchange component, reduces the frequency of manual dismounting, and maintenance is convenient and the cleaning maintenance efficiency is high.

Description

Technical Field

[0001] This utility model relates to the field of heat exchange technology, and in particular to a tail gas treatment device for photoresist drying equipment. Background Technology

[0002] The photolithography process for display panels includes steps such as applying photoresist, exposure, and development. After applying the photoresist, a drying device is needed to dry it. The high-temperature gas discharged from the drying device needs to enter a heat exchanger to recover its heat. Figure 1 As shown, the existing exhaust gas treatment device for drying equipment includes a housing 1′, an installation cavity 11′ for the exhaust gas of the drying equipment to circulate inside the housing 1′, a heat exchanger 2′ inside the installation cavity 11′, the heat exchanger 2′ includes a cooling pipe 21′ that is connected to an external heat exchange mechanism and through which coolant flows, and heat exchange plates 22′ disposed on the cooling pipe 21′.

[0003] The existing technology has the following drawbacks: the high-temperature exhaust gas contains photoresist components. During the cooling process in the heat exchanger 2′, the gaseous photoresist is prone to condensation into liquid photoresist. The liquid photoresist is easy to stick to the heat exchange plate 22′ and the cooling pipe 21′, requiring regular disassembly and cleaning. The cleaning and maintenance workload is large and the efficiency is low. Utility Model Content

[0004] The purpose of this invention is to provide a tail gas treatment device for photoresist drying equipment, whose cleaning component can automatically clean the heat exchange components in the cavity, making maintenance convenient and efficient.

[0005] To achieve this objective, the present invention adopts the following technical solution:

[0006] A photoresist drying equipment exhaust gas treatment device is provided, comprising a communication component, a heat exchange component, and a cleaning component. The communication component includes a housing, an inlet pipe, and an outlet pipe. The housing has a receiving cavity. The inlet pipe and the outlet pipe are spaced apart at the top of the housing and both communicate with the receiving cavity. The end of the inlet pipe away from the housing is connected to the exhaust gas outlet of the photoresist drying equipment. The heat exchange component is disposed in the receiving cavity and includes a cooling pipe and heat exchange plates. Coolant flows in the cooling pipe, and multiple heat exchange plates are spaced apart along the length of the cooling pipe. The cleaning component includes a storage tank, an inlet pipe, and an outlet pipe. The storage tank contains cleaning liquid and communicates with the receiving cavity through the inlet pipe. The end of the inlet pipe away from the storage tank is located at the top of the housing, and the outlet pipe is connected to the bottom of the housing.

[0007] As a preferred embodiment of the exhaust gas treatment device for photoresist drying equipment, a partition is provided inside the housing, which horizontally divides the receiving cavity into a first placement cavity and a second placement cavity. The first placement cavity and the second placement cavity are respectively provided with a set of heat exchange components and a cleaning component. The connecting component further includes a first three-way valve, a first branch pipe, a second branch pipe, a second three-way valve, a third branch pipe, and a fourth branch pipe. The first three-way valve is provided at the end of the air inlet pipe away from the photoresist drying equipment. The first three-way valve is connected to the first branch pipe and the second branch pipe. The first branch pipe and the second branch pipe are respectively connected to the first placement cavity and the second placement cavity. The second three-way valve is provided at the end of the air outlet pipe adjacent to the housing. The second three-way valve is connected to the third branch pipe and the fourth branch pipe. The third branch pipe and the fourth branch pipe are respectively connected to the first placement cavity and the second placement cavity.

[0008] As a preferred embodiment of the exhaust gas treatment device for photoresist drying equipment, the cleaning assembly further includes a third three-way valve, a fifth branch pipe, a sixth branch pipe, a fourth three-way valve, a seventh branch pipe, and an eighth branch pipe. The third three-way valve is provided at the end of the inlet pipe away from the storage tank. The third three-way valve is connected to the fifth branch pipe and the sixth branch pipe. The fifth branch pipe and the sixth branch pipe are respectively connected to the first placement chamber and the second placement chamber. The fourth three-way valve is provided at the end of the outlet pipe near the housing. The fourth three-way valve is connected to the seventh branch pipe and the eighth branch pipe. The seventh branch pipe and the eighth branch pipe are respectively connected to the first placement chamber and the second placement chamber.

[0009] As a preferred embodiment of the exhaust gas treatment device for photoresist drying equipment, the cleaning assembly further includes a pump body, a controller, and a pressure sensor. The pressure sensor is installed in the third branch pipe and the fourth branch pipe respectively. The pressure sensor is electrically connected to the pump body through the controller. The pump body is installed on the liquid inlet pipe.

[0010] As a preferred embodiment of the exhaust gas treatment device for photoresist drying equipment, the cleaning assembly further includes a pump body, a controller, and a liquid level sensor. The liquid level sensor is respectively provided on the cavity walls of the first placement cavity and the second placement cavity arranged in a horizontal direction, and the liquid level sensor is provided adjacent to the top of the housing. The liquid level sensor is electrically connected to the pump body through the controller, and the pump body is provided on the liquid inlet pipe.

[0011] As a preferred embodiment of the exhaust gas treatment device for photoresist drying equipment, the exhaust gas treatment device for photoresist drying equipment further includes a stirring assembly. The stirring assembly includes a motor, a rotating shaft, and blades. The motor is located at the bottom of the housing, the rotating shaft is rotatably connected to the bottom of the housing, and one end of the rotating shaft extends into the receiving cavity. The portion of the rotating shaft located in the receiving cavity is provided with the blades. The motor is drivenly connected to the rotating shaft, so that the rotating shaft can drive the blades to stir the cleaning liquid in the receiving cavity.

[0012] As a preferred embodiment of the exhaust gas treatment device for photoresist drying equipment, the bottom of the receiving cavity is at least partially inclined, the liquid outlet pipe is connected to the inclined bottom of the receiving cavity, and the inclined bottom is inclined downward from the end away from the liquid outlet pipe toward the end adjacent to the liquid outlet pipe.

[0013] As a preferred embodiment of the exhaust gas treatment device for photoresist drying equipment, the heat exchange assembly further includes a first mounting plate, a second mounting plate, a first connecting pipe, and a second connecting pipe. The first mounting plate and the second mounting plate are spaced apart in the horizontal direction, and the lengths of the first mounting plate and the second mounting plate extend in the vertical direction. A liquid inlet chamber is provided in the first mounting plate, and the liquid inlet chamber is connected to an external heat exchange device through the first connecting pipe. A liquid outlet chamber is provided in the second mounting plate, and the liquid outlet chamber is connected to the external heat exchange device through the second connecting pipe. A plurality of cooling pipes are spaced apart in the vertical direction, and each cooling pipe extends in the horizontal direction. The two ends of each cooling pipe are respectively connected to the liquid inlet chamber and the liquid outlet chamber.

[0014] As a preferred embodiment of the exhaust gas treatment device for photoresist drying equipment, the first connecting pipe and the second connecting pipe are set at the same height. Along the vertical direction, the connection port between the cooling pipe and the liquid inlet chamber is the liquid inlet. The diameter of the liquid inlet adjacent to the first connecting pipe is smaller than the diameter of the liquid inlet away from the first connecting pipe.

[0015] As a preferred embodiment of the exhaust gas treatment device for photoresist drying equipment, each cooling tube is provided with a plurality of heat exchange plates along its own length direction, and the heat exchange plates of two adjacent cooling tubes are arranged alternately.

[0016] The advantages of this utility model compared to the prior art are:

[0017] The exhaust gas treatment device for photoresist drying equipment of this utility model, through the setting of the cleaning component, enables the liquid inlet pipe to input cleaning liquid into the receiving cavity to clean the colloid remaining on the cooling pipe and heat exchange plate after exhaust gas treatment of the heat exchange component, and discharges it through the liquid outlet pipe, realizing automatic cleaning of the heat exchange component, ensuring the heat exchange capacity of the heat exchange component, reducing the frequency of manual disassembly, making maintenance convenient and highly efficient, and effectively reducing maintenance costs and time investment. Attached Figure Description

[0018] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments.

[0019] Figure 1 This is a schematic diagram of a tail gas treatment device for drying equipment in the prior art.

[0020] Figure 2 This is a schematic diagram of the exhaust gas treatment device of the photoresist drying equipment according to an embodiment of the present invention.

[0021] Figure 3 This is a partial cross-sectional view of the heat exchange component according to an embodiment of the present invention.

[0022] Figure 1 middle:

[0023] 1′, Shell; 11′, Mounting cavity; 2′, Heat exchanger; 21′, Cooling pipe; 22′, Heat exchange fins.

[0024] Figures 2 to 3 middle:

[0025] 1. Connecting assembly; 11. Housing; 111. Receiving cavity; 1111. First placement cavity; 1112. Second placement cavity; 112. Partition; 113. Inclined cavity bottom; 12. Inlet pipe; 13. Outlet pipe; 14. First three-way valve; 15. First branch pipe; 16. Second branch pipe; 17. Second three-way valve; 18. Third branch pipe; 19. Fourth branch pipe; 2. Heat exchange assembly; 21. Cooling pipe; 22. Heat exchange fins; 23. First mounting plate; 231, liquid inlet chamber; 232, liquid inlet; 24, second mounting plate; 25, first connecting pipe; 26, second connecting pipe; 3, cleaning assembly; 31, liquid outlet pipe; 32, fifth branch pipe; 33, sixth branch pipe; 34, fourth three-way valve; 35, seventh branch pipe; 36, eighth branch pipe; 37, air pressure sensor; 38, liquid level sensor; 4, stirring assembly; 41, motor; 42, rotating shaft; 43, blade. Detailed Implementation

[0026] The advantages and features of this invention, as well as methods of implementing them, will become apparent from the following detailed description of the embodiments in conjunction with the accompanying drawings. However, this invention is not limited to the embodiments disclosed below, but can be implemented in various different forms. These embodiments are provided merely to complete the disclosure of this invention and to enable those skilled in the art to fully understand its scope, which is defined only by the scope of the claims. The same reference numerals denote the same constituent elements throughout the specification.

[0027] The present invention will now be described in detail with reference to the accompanying drawings.

[0028] like Figure 2 As shown, this utility model embodiment provides a tail gas treatment device for a photoresist drying equipment, including a connecting component 1, a heat exchange component 2, and a cleaning component 3. The connecting component 1 includes a housing 11, an inlet pipe 12, and an outlet pipe 13. A receiving cavity 111 is provided inside the housing 11. The inlet pipe 12 and the outlet pipe 13 are spaced apart at the top of the housing 11 and are both connected to the receiving cavity 111. The end of the inlet pipe 12 away from the housing 11 is connected to the tail gas outlet of the photoresist drying equipment. The heat exchange assembly 2 is disposed in the receiving cavity 111. The heat exchange assembly 2 includes a cooling pipe 21 and heat exchange plates 22. Coolant flows in the cooling pipe 21, and multiple heat exchange plates 22 are arranged at intervals along the length of the cooling pipe 21. The cleaning assembly 3 includes a liquid storage tank, an inlet pipe, and an outlet pipe 31. The liquid storage tank is filled with cleaning liquid. The liquid storage tank is connected to the receiving cavity 111 through the inlet pipe. The end of the inlet pipe away from the liquid storage tank is located at the top of the housing 11, and the outlet pipe 31 is connected to the bottom of the housing 11.

[0029] It is understood that the exhaust gas treatment device for the photoresist drying equipment of this utility model, through the setting of the cleaning component 3, allows the inlet pipe to input cleaning liquid into the receiving cavity 111 to clean the colloid remaining on the cooling pipe 21 and heat exchange plate 22 after exhaust gas treatment of the heat exchange component 2, and discharges it through the outlet pipe 31, realizing automatic cleaning of the heat exchange component 2, ensuring the heat exchange capacity of the heat exchange component 2, reducing the frequency of manual disassembly, making maintenance convenient and efficient, and effectively reducing maintenance costs and time investment. The inlet pipe 12 and outlet pipe 13 are spaced apart at the top of the housing 11, which can prevent the cleaning liquid from entering and remaining in the inlet pipe 12 and outlet pipe 13, ensuring the safety of the inlet pipe 12 and outlet pipe 13 in use. At the same time, setting the end of the inlet pipe away from the storage tank at the top of the housing 11 allows the cleaning liquid entering the receiving cavity 111 to directly flush the cooling pipe 21 and heat exchange plate 22 using the gravity and driving force of the cleaning liquid, improving the cleaning effect.

[0030] It is worth noting that the intake pipe 12 and the outlet pipe 13 are spaced apart at the top of the housing 11. Some exhaust gas directly enters the receiving cavity 111 through the intake pipe 12 and flows directly along the top wall of the receiving cavity 111 to the outlet pipe 13, affecting the exhaust gas treatment effect. Therefore, in this embodiment, the intake pipe 12 can be partially extended into the interior of the receiving cavity 111 and adjacent to the bottom wall of the receiving cavity 111, while the outlet pipe 13 is connected to the top wall of the receiving cavity 111. This makes the intake and outlet ends of the exhaust gas in the receiving cavity 111 as diagonally as possible, resulting in a longer path through the heat exchange component 2 and better heat exchange effect. Alternatively, the intake pipe 12 can be connected to the top wall of the receiving cavity 111, and the outlet pipe 13 can be partially extended into the receiving cavity 111 and adjacent to the bottom wall of the receiving cavity 111.

[0031] Furthermore, a partition 112 is provided inside the housing 11, which horizontally divides the receiving cavity 111 into a first placement cavity 1111 and a second placement cavity 1112. A heat exchange assembly 2 and a cleaning assembly 3 are respectively provided in the first placement cavity 1111 and the second placement cavity 1112. The connecting assembly 1 also includes a first three-way valve 14, a first branch pipe 15, a second branch pipe 16, a second three-way valve 17, a third branch pipe 18, and a fourth branch pipe 19. The air inlet pipe 12 is located away from the photoresist dry area. One end of the drying equipment is equipped with a first three-way valve 14, which connects to a first branch pipe 15 and a second branch pipe 16. The first branch pipe 15 and the second branch pipe 16 are respectively connected to the first placement chamber 1111 and the second placement chamber 1112. A second three-way valve 17 is installed at one end of the exhaust pipe 13 near the housing 11, which connects to a third branch pipe 18 and a fourth branch pipe 19. The third branch pipe 18 and the fourth branch pipe 19 are respectively connected to the first placement chamber 1111 and the second placement chamber 1112. A partition 112 separates the housing 111 into two placement chambers, allowing the photoresist drying equipment to select one placement chamber for continued exhaust gas treatment while the other is used for cleaning, without interference. This ensures continuous exhaust gas treatment for the photoresist drying equipment, thereby improving the overall working efficiency of the equipment and reducing downtime for maintenance.

[0032] Of course, the first three-way valve 14 and the second three-way valve 17 can effectively guide the gas to one of the two placement chambers, and the gas flow rate can be flexibly adjusted according to different needs, thereby achieving rapid adaptation to different operating conditions, ensuring smooth flow and distribution of airflow, and the use of branch pipes to converge to the three-way valve can also reduce the complex pipeline setup.

[0033] Furthermore, such as Figure 2As shown, the cleaning assembly 3 also includes a third three-way valve, a fifth branch pipe 32, a sixth branch pipe 33, a fourth three-way valve 34, a seventh branch pipe 35, and an eighth branch pipe 36. A third three-way valve is installed at the end of the inlet pipe furthest from the storage tank. This valve connects the fifth branch pipe 32 and the sixth branch pipe 33, which in turn connect to the first placement chamber 1111 and the second placement chamber 1112, respectively. A fourth three-way valve 34 is installed at the end of the outlet pipe 31 adjacent to the housing 11. This valve connects the seventh branch pipe 35 and the eighth branch pipe 36, which in turn connect to the first placement chamber 1111 and the second placement chamber 1112, respectively. The third three-way valve connects the fifth branch pipe 32 and the sixth branch pipe 33 to the storage tank, enabling one storage tank to supply cleaning for both placement chambers. This reduces the number of storage tanks and the associated cost, simplifying the structural layout of the cleaning assembly 3. The seventh branch pipe 35 and the third branch pipe 18 are connected by the fourth three-way valve 34 so that the waste liquid after cleaning in the two placement chambers can be collected into the outlet pipe 31 for centralized discharge management, reducing the complex layout of pipelines.

[0034] Of course, in some embodiments, the first placement chamber 1111 and the second placement chamber 1112 can also be connected to a liquid storage tank respectively through the first branch pipe 15 and the second branch pipe 16 for independent control, which is not limited here. Optionally, the adhesion of gel on the heat exchange plate 22 can easily lead to local blockage and poor airflow in the receiving chamber 111. Therefore, the cleaning assembly 3 also includes a pump body, a controller and a pressure sensor 37. Pressure sensors 37 are respectively installed in the third branch pipe 18 and the fourth branch pipe 19. The pressure sensors 37 are electrically connected to the pump body through the controller, and the pump body is installed on the inlet pipe. The pressure sensor 37 on the branch pipe connected to the outlet pipe 13 monitors the pressure. When the pressure monitoring value is lower than the safety threshold, the exhaust gas is switched to another placement chamber, and the pump body is driven to clean the placement chamber with cleaning liquid. The automatic switching of the exhaust gas treatment chamber is achieved by monitoring the pressure with the pressure sensor 37, which is convenient and fast.

[0035] Preferably, the cleaning assembly 3 further includes a pump body, a controller, and a liquid level sensor 38. Liquid level sensors 38 are respectively installed on the walls of the first placement chamber 1111 and the second placement chamber 1112 arranged horizontally, and are located near the top of the housing 11. The liquid level sensor 38 is electrically connected to the pump body via the controller, and the pump body is mounted on the inlet pipe. The liquid level sensor 38 detects the level of the cleaning liquid in the placement chamber, allowing the controller to stop the pump from delivering the cleaning liquid, preventing it from overflowing into the exhaust pipe 13 and affecting subsequent exhaust gas treatment, and reducing waste of the cleaning liquid.

[0036] For example, the intake pipe 12 inputs exhaust gas into the first placement chamber 1111 for processing through the first branch pipe 15. The controller controls the first three-way valve 14 to close and disconnect from the second branch pipe 16, that is, the exhaust gas only enters the first placement chamber 1111 and not the second placement chamber 1112. The third branch pipe 18 is connected to the exhaust pipe 13, and the second three-way valve 17 is closed and disconnected from the fourth branch pipe 19, so that the exhaust gas is processed through the heat exchange assembly 2 in the first placement chamber 1111. When the air pressure monitoring value of the air pressure sensor 37 in the third branch pipe 18 is lower than the safety threshold, the controller controls the first three-way valve 14 to close and disconnect from the first branch pipe 15, the intake pipe 12 is connected to the second branch pipe 16 through the first three-way valve 14, the second three-way valve 17 is connected to the fourth branch pipe 19, and the second three-way valve 17 is closed and disconnected from the third branch pipe 18, so that the exhaust gas is processed through the heat exchange assembly 2 in the second placement chamber 1112. Simultaneously, the pump drives the cleaning fluid in the storage tank to sequentially enter the first placement chamber 1111 through the inlet pipe and the fifth branch pipe 32 for cleaning, until the cleaning fluid reaches the level sensor 38. After cleaning for a period of time, it is discharged through the outlet pipe 31 via the seventh branch pipe 35. During this process, the third control valve and the sixth branch pipe 33 are closed and not connected, and the fourth three-way valve 34 and the eighth branch pipe 36 are closed and not connected. When the first placement chamber 1111 is cleaned, if the air pressure sensor 37 in the fourth branch pipe 19 connected to the second placement chamber 1112 detects that it is below the safety threshold, the first placement chamber 1111 will switch to exhaust gas treatment, and the second placement chamber 1112 will switch to cleaning.

[0037] In some embodiments, such as Figure 2 As shown, the exhaust gas treatment device of the photoresist drying equipment also includes a stirring assembly 4. The stirring assembly 4 includes a motor 41, a rotating shaft 42, and blades 43. The motor 41 is located at the bottom of the housing 11. The rotating shaft 42 is rotatably connected to the bottom of the housing 11, and one end of the rotating shaft 42 extends into the receiving cavity 111. The rotating shaft 42 is vertically spaced from the cooling pipe 21 and the heat exchange plate 22. The portion of the rotating shaft 42 located in the receiving cavity 111 is provided with blades 43. The motor 41 is connected to the rotating shaft 42 in a transmission connection, so that the rotating shaft 42 can drive the blades 43 to stir the cleaning liquid in the receiving cavity 111, thereby increasing the fluidity of the cleaning liquid, ensuring the uniformity of the cleaning liquid during long-term use, and also enabling the cleaning liquid to impact and carry away the gel adhering to the cooling pipe 21 and the heat exchange plate 22, thereby improving the cleaning effect of the cleaning liquid.

[0038] Furthermore, the bottom of the receiving cavity 111 is at least partially inclined, and the outlet pipe 31 is connected to the inclined bottom 113 of the receiving cavity 111. The inclined bottom 113 is inclined downward from the end away from the outlet pipe 31 toward the end adjacent to the outlet pipe 31. The inclined bottom 113 allows the cleaning fluid to flow along the inclined bottom 113 to the outlet pipe 31, improving the cleanliness of the discharged cleaning fluid and reducing the possibility of cleaning fluid remaining at the bottom of the receiving cavity 111 and being difficult to discharge completely, thus affecting the exhaust gas treatment.

[0039] In other embodiments, the heat exchange assembly 2 further includes a first mounting plate 23, a second mounting plate 24, a first connecting pipe 25, and a second connecting pipe 26. The first mounting plate 23 and the second mounting plate 24 are spaced apart horizontally, and the lengths of both the first mounting plate 23 and the second mounting plate 24 extend vertically. The first mounting plate 23 has a liquid inlet chamber 231, which is connected to an external heat exchange device via the first connecting pipe 25. The second mounting plate 24 has a liquid outlet chamber, which is connected to an external heat exchange device via the second connecting pipe 26. Multiple cooling pipes 21 are spaced apart vertically, and each cooling pipe 21 extends horizontally. The two ends of each cooling pipe 21 are connected to the liquid inlet chamber 231 and the liquid outlet chamber, respectively. The arrangement of multiple cooling pipes 21 effectively improves the cooling efficiency of the space within the receiving cavity 111. The liquid inlet chamber 231 of the first mounting plate 23 is used to collect liquid from all the cooling pipes 21, and the liquid outlet chamber of the second mounting plate 24 is used to collect liquid from all the cooling pipes 21. This avoids the need to connect each cooling pipe 21 to a first connecting pipe 25 and a second connecting pipe 26, reduces the number of pipes and the situation of pipe disorder, and makes the structure layout of the heat exchange component 2 simple.

[0040] Of course, to ensure heat exchange efficiency, the heat exchange assembly 2 may include multiple groups of cooling tubes arranged along a first direction. Each cooling tube group includes multiple cooling tubes 21 arranged vertically, and each cooling tube 21 extends along a second direction. Multiple heat exchange fins 22 are spaced apart on each cooling tube 21. The first and second directions are perpendicular to each other, and both the first and second directions are horizontal. In addition, the cooling tubes 21 may also be serpentine tubes, that is, multiple serpentine cooling tubes 21 are spaced apart vertically, and multiple heat exchange fins 22 are provided on each serpentine cooling tube 21. The application of serpentine tubes can ensure sufficient heat exchange area and reduce the number of short cooling tubes 21, thereby improving assembly efficiency.

[0041] Furthermore, such as Figure 2 and Figure 3As shown, the first connecting pipe 25 and the second connecting pipe 26 are set at the same height. In the vertical direction, the connection between the cooling pipe 21 and the liquid inlet chamber 231 is the liquid inlet 232. The diameter of the liquid inlet 232 adjacent to the first connecting pipe 25 is smaller than the diameter of the liquid inlet 232 farther away from the first connecting pipe 25. In other words, the flow rate is faster closer to the first connecting pipe 25. Therefore, by making the diameter of the liquid inlet 232 adjacent to the first connecting pipe 25 smaller than the diameter of the liquid inlet 232 farther away from the first connecting pipe 25, the flow rate of the coolant entering each cooling pipe 21 tends to be consistent, improving the uniformity of cooling of each cooling pipe 21, avoiding the situation where there is a large temperature difference between each cooling pipe 21, which would lead to unstable exhaust gas heat exchange treatment, and ensuring the stability of the heat exchange component 2.

[0042] Furthermore, each cooling pipe 21 is provided with multiple heat exchange fins 22 along its own length direction. The heat exchange fins 22 of two adjacent cooling pipes 21 are arranged alternately, so that the exhaust gas can flow between the interlaced liquid cooling plates, which facilitates the flow of exhaust gas in the receiving cavity 111. At the same time, it can make the layout of multiple cooling pipes 21 and heat exchange fins 22 more compact, realize the setting of more cooling pipes 21 and heat exchange fins 22, thereby improving the efficiency of exhaust gas treatment in the heat exchanger.

[0043] Although embodiments of the present invention have been described above with reference to the accompanying drawings, the present invention is not limited to the above embodiments, but can be made in various forms, and those skilled in the art will understand that the present invention can be implemented in other specific forms without changing the technical spirit or essential characteristics of the present invention. Therefore, it should be understood that the above embodiments are exemplary in all respects and not restrictive.

Claims

1. A tail gas treatment device for photoresist drying equipment, characterized in that, include: A connecting component, comprising a housing, an air inlet pipe, and an air outlet pipe, wherein the housing is provided with a receiving cavity, the air inlet pipe and the air outlet pipe are spaced apart at the top of the housing, and both the air inlet pipe and the air outlet pipe communicate with the receiving cavity, and the end of the air inlet pipe away from the housing is connected to the exhaust gas outlet of the photoresist drying equipment. A heat exchange assembly is disposed within the receiving cavity. The heat exchange assembly includes a cooling pipe and heat exchange plates. Coolant flows inside the cooling pipe, and a plurality of heat exchange plates are spaced apart along the length of the cooling pipe. A cleaning assembly includes a storage tank, an inlet pipe, and an outlet pipe. The storage tank contains cleaning fluid and is connected to the receiving cavity via the inlet pipe. One end of the inlet pipe away from the storage tank is located at the top of the housing, and the outlet pipe is connected to the bottom of the housing.

2. The exhaust gas treatment device for photoresist drying equipment according to claim 1, characterized in that, The housing is equipped with a partition, which horizontally divides the receiving cavity into a first placement cavity and a second placement cavity. The first placement cavity and the second placement cavity are respectively equipped with a set of heat exchange components and a cleaning component. The connecting component further includes a first three-way valve, a first branch pipe, a second branch pipe, a second three-way valve, a third branch pipe, and a fourth branch pipe. The first three-way valve is provided at the end of the air inlet pipe away from the photoresist drying equipment. The first three-way valve is connected to the first branch pipe and the second branch pipe. The first branch pipe and the second branch pipe are respectively connected to the first placement cavity and the second placement cavity. The second three-way valve is provided at the end of the air outlet pipe adjacent to the housing. The second three-way valve is connected to the third branch pipe and the fourth branch pipe. The third branch pipe and the fourth branch pipe are respectively connected to the first placement cavity and the second placement cavity.

3. The exhaust gas treatment device for photoresist drying equipment according to claim 2, characterized in that, The cleaning assembly further includes a third three-way valve, a fifth branch pipe, a sixth branch pipe, a fourth three-way valve, a seventh branch pipe, and an eighth branch pipe. The third three-way valve is provided at the end of the inlet pipe away from the storage tank. The third three-way valve is connected to the fifth branch pipe and the sixth branch pipe. The fifth branch pipe and the sixth branch pipe are respectively connected to the first placement chamber and the second placement chamber. The fourth three-way valve is provided at the end of the outlet pipe near the box body. The fourth three-way valve is connected to the seventh branch pipe and the eighth branch pipe. The seventh branch pipe and the eighth branch pipe are respectively connected to the first placement chamber and the second placement chamber.

4. The exhaust gas treatment device for photoresist drying equipment according to claim 2, characterized in that, The cleaning assembly also includes a pump body, a controller, and a pressure sensor. The pressure sensor is installed in the third branch pipe and the fourth branch pipe respectively. The pressure sensor is electrically connected to the pump body through the controller. The pump body is installed on the inlet pipe.

5. The exhaust gas treatment device for photoresist drying equipment according to claim 2, characterized in that, The cleaning assembly further includes a pump body, a controller, and a liquid level sensor. The liquid level sensor is respectively provided on the cavity walls of the first placement cavity and the second placement cavity arranged in a horizontal direction, and the liquid level sensor is located near the top of the housing. The liquid level sensor is electrically connected to the pump body through the controller, and the pump body is located on the inlet pipe.

6. The exhaust gas treatment device for photoresist drying equipment according to any one of claims 1-5, characterized in that, It also includes a stirring assembly, which includes a motor, a rotating shaft, and blades. The motor is located at the bottom of the housing, and the rotating shaft is rotatably connected to the bottom of the housing, with one end of the rotating shaft extending into the receiving cavity. The portion of the rotating shaft located in the receiving cavity is provided with the blades. The motor is drivenly connected to the rotating shaft, enabling the rotating shaft to drive the blades to stir the cleaning liquid in the receiving cavity.

7. The exhaust gas treatment device for photoresist drying equipment according to claim 6, characterized in that, The bottom of the receiving cavity is at least partially inclined, and the outlet pipe is connected to the inclined bottom of the receiving cavity. The inclined bottom is inclined downward from the end away from the outlet pipe toward the end adjacent to the outlet pipe.

8. The exhaust gas treatment device for photoresist drying equipment according to any one of claims 1-5, characterized in that, The heat exchange assembly further includes a first mounting plate, a second mounting plate, a first connecting pipe, and a second connecting pipe. The first mounting plate and the second mounting plate are spaced apart in the horizontal direction, and the lengths of the first mounting plate and the second mounting plate extend in the vertical direction. The first mounting plate has a liquid inlet chamber, which is connected to an external heat exchange device through the first connecting pipe. The second mounting plate has a liquid outlet chamber, which is connected to the external heat exchange device through the second connecting pipe. A plurality of cooling pipes are spaced apart in the vertical direction, and each cooling pipe extends in the horizontal direction. The two ends of each cooling pipe are connected to the liquid inlet chamber and the liquid outlet chamber, respectively.

9. The exhaust gas treatment device for photoresist drying equipment according to claim 8, characterized in that, The first connecting pipe and the second connecting pipe are set at the same height. Along the vertical direction, the connection between the cooling pipe and the liquid inlet is the liquid inlet. The diameter of the liquid inlet adjacent to the first connecting pipe is smaller than the diameter of the liquid inlet away from the first connecting pipe.

10. The exhaust gas treatment device for photoresist drying equipment according to claim 8, characterized in that, Each cooling tube is provided with a plurality of heat exchange fins along its own length, and the heat exchange fins of two adjacent cooling tubes are arranged alternately.

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