Stage accessories and FIB-SEM dual beam microscope

Abstract

The utility model relates to electron microscope equipment technical field discloses a kind of object table accessory and FIB-SEM double-beam electron microscope.Object table accessory, for being installed on the object table of FIB-SEM double-beam electron microscope, the object table accessory is made of conductive material, and include: mounting assembly, for being installed on the upper surface of the object table;Extension assembly, the first end of the extension assembly is connected with the mounting assembly, and second end extends to the edge outside of the object table;Bearing assembly is connected with the second end of the extension assembly, and the bearing assembly includes bearing surface, and the bearing surface is lower than the upper surface of the object table.Object table accessory, the initial installation height of sample can be reduced or the higher area of sample is staggered with the pole shoe component of scanning electron microscope, so that FIB-SEM double-beam electron microscope is compatible to ultra-high sample processing and observation.

Description

Technical Field

[0001] This utility model relates to the field of electron microscopy equipment technology, and in particular to a stage accessory and a FIB-SEM dual-beam electron microscope. Background Technology

[0002] A FIB-SEM (Focused Ion Beam Scanning Electron Microscopy) dual-beam electron microscope is an electron microscope that integrates a focused ion beam (FIB) system and a scanning electron microscope (SEM) system. The FIB system generates a high-energy ion beam for nanoscale processing (etching, deposition, etc.) of the sample's upper surface on the stage. The SEM system generates a scanning electron beam for high-resolution imaging of the sample's upper surface. In other words, the FIB-SEM dual-beam electron microscope allows for simultaneous imaging and processing of the sample.

[0003] The eucentric height is a core geometric parameter of a dual-beam electron microscope (FIB-SEM), referring to the height at which the ion and electron beams intersect during focusing. When processing samples with a FIB-SEM, the upper surface of the sample must be located at this eucentric height. Existing commercially available FIB-SEMs (such as Thermo Fisher Scientific's Helios, Scios, and Verios series) have stages with multi-degree-of-freedom adjustment capabilities (X, Y, Z, Tilt, Rotation) to adjust the upper surface of the sample to this eucentric height.

[0004] Each model of FIB-SEM dual-beam electron microscope has a nominal maximum compatible sample height. However, in some cases, the sample height exceeds the nominal maximum height (hereinafter referred to as ultra-high sample). After fixing the ultra-high sample on the stage, the upper surface of the sample cannot reach the concentric point height, thus making observation and processing impossible. Utility Model Content

[0005] One objective of this invention is to provide a stage accessory that can lower the initial mounting height of the sample, making the FIB-SEM dual-beam electron microscope compatible with the processing and observation of ultra-high samples.

[0006] To achieve this objective, the present invention adopts the following technical solution:

[0007] A stage accessory for mounting on the stage of a FIB-SEM dual-beam electron microscope, the stage accessory being made of a conductive material and comprising:

[0008] Mounting components for mounting on the upper surface of the stage;

[0009] An extension component, wherein a first end of the extension component is connected to the mounting component, and a second end extends to the outside edge of the stage;

[0010] A support component is connected to a second end of the extension component, the support component including a support surface that is lower than the upper surface of the stage.

[0011] As an optional embodiment, the mounting assembly includes a nail post that is inserted into the mounting of the platform; the extension assembly includes an extension plate that is perpendicular to the axial direction of the nail post; the bearing assembly includes a vertical plate and a horizontal plate, the upper end of the vertical plate is connected to the extension plate and is perpendicular to the extension plate, the horizontal plate is connected to the lower end of the vertical plate and is arranged perpendicular to the vertical plate, and the upper surface of the horizontal plate is the bearing surface.

[0012] As an optional solution, the bearing surface is parallel to the upper surface of the stage, and the distance between them is 5mm to 30mm.

[0013] As an optional solution, the installation components include:

[0014] A nail post, the lower end of which is used to be inserted into a mounting hole on the upper surface of the stage, and the extension assembly is connected to the upper end of the nail post.

[0015] A support plate is connected to the nail post and is used to fit against the upper surface of the stage. Along the axial direction of the nail post, the support plate is spaced from the lower side of the extension assembly.

[0016] As an optional solution, the extension component and / or the load-bearing component are provided with weight-reduction holes.

[0017] As an optional embodiment, the stage accessory further includes a height adjustment component connected between the second end of the extension component and the support component. The height adjustment component is used to drive the support component to move, thereby adjusting the height of the support surface relative to the upper surface of the stage.

[0018] As an optional solution, the height adjustment assembly includes a lead screw and nut pair and an operating part. The lead screw and nut pair is connected between the second end of the extension assembly and the bearing assembly. The operating part is connected to the lead screw of the lead screw and nut pair and is used to drive the lead screw to rotate; or

[0019] The height adjustment assembly includes a lead screw and nut pair and a drive source. The lead screw and nut pair is connected between the second end of the extension assembly and the bearing assembly. The output end of the drive source is connected to the lead screw of the lead screw and nut pair and is used to drive the lead screw to rotate.

[0020] As an optional solution, the stage accessory also includes a guide assembly, the fixed end of which is fixedly connected to the extension assembly, and the movable end of which is fixedly connected to the bearing assembly.

[0021] As an optional feature, the stage accessory also includes a locking assembly for locking or unlocking the relative positions of the extension assembly and the support assembly.

[0022] Another objective of this invention is to provide a FIB-SEM dual-beam electron microscope, which, by adopting the aforementioned stage accessory, can be compatible with processing or observing samples exceeding the nominal height.

[0023] To achieve this objective, the present invention adopts the following technical solution:

[0024] The FIB-SEM dual-beam electron microscope includes a stage, a focal ion beam system, a scanning electron microscope system, and a stage accessory. The stage is provided with mounting holes for mounting the stage accessory or mounting component. The focal ion beam system is used to emit an ion beam to the sample on the stage accessory or the sample on the mounting component. The scanning electron microscope system is used to emit an electron beam to the sample on the stage accessory or the sample on the mounting component.

[0025] The beneficial effects of this utility model are:

[0026] This utility model discloses a stage accessory in which a mounting component is installed on the upper surface of the stage, a first end of an extension component is connected to the mounting component, and a second end extends to the outer edge of the stage, and a bearing component is connected to the second end of the extension component. The bearing surface of the bearing component is lower than the upper surface of the stage. This stage accessory allows the bearing surface to be recessed relative to the upper surface of the stage, thus reducing the initial mounting height of the sample. Therefore, even when a sample exceeding the nominal maximum height of a FIB-SEM dual-beam electron microscope is mounted on the bearing surface, the stage can adjust the upper surface of the sample to the concentric point height, enabling the FIB-SEM dual-beam electron microscope to process and observe samples exceeding the nominal maximum height.

[0027] The FIB-SEM dual-beam electron microscope of this invention, by adopting the aforementioned stage accessory, can be compatible with processing or observing samples exceeding the nominal height. Attached Figure Description

[0028] Figure 1 This is a schematic diagram of the structure for fixing a sample on a stage accessory provided in Embodiment 1 of this utility model;

[0029] Figure 2This is a comparison diagram of fixing the sample on the stage using a stage accessory and fixing the sample on the stage using a mounting component, provided in Embodiment 1 of this utility model.

[0030] Figure 3 This is a structural schematic diagram of the first type of platform accessory provided in Embodiment 1 of this utility model;

[0031] Figure 4 This is a structural schematic diagram of the second type of stage accessory provided in Embodiment 1 of this utility model;

[0032] Figure 5 This is a schematic diagram of the structure of the first type of platform accessory provided in Embodiment 2 of this utility model;

[0033] Figure 6 This is a front view of the second type of platform accessory provided in Embodiment 2 of this utility model.

[0034] In the picture:

[0035] 100. Stage accessories; 200. Stage; 210. Mounting holes; 300. Sample; 400. Mounting parts;

[0036] 10. Install components; 11. Nail posts; 12. Support plate; 13. Spacing;

[0037] 20. Extension component; 21. Extension plate; 211. Weight reduction hole; 22. Connecting plate;

[0038] 30. Load-bearing component; 31. Vertical plate; 311. Threaded hole; 32. Horizontal plate; 321. First part; 322. Second part; 323. Load-bearing surface;

[0039] 40. Height adjustment assembly; 41. Lead screw and nut pair; 411. Lead screw; 412. Nut; 413. Connecting block; 42. Operating unit; 43. Drive source;

[0040] 50. Guide assembly; 51. First guide rail; 52. Second guide rail;

[0041] 60. Locking assembly;

[0042] 70. Fixing plate. Detailed Implementation

[0043] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are for illustrative purposes only and are not intended to limit the scope of the invention. Furthermore, it should be noted that, for ease of description, the accompanying drawings show only the parts relevant to the present invention, and not the entire structure.

[0044] In the description of this utility model, unless otherwise explicitly specified and limited, the terms "connected," "linked," and "fixed" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0045] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0046] In the description of this embodiment, the terms "upper," "lower," "right," etc., refer to the orientation or positional relationship shown in the accompanying drawings. They are used only for ease of description and simplification of operation, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. In addition, the terms "first" and "second" are only used for distinction in description and have no special meaning.

[0047] Example 1

[0048] like Figure 1 and Figure 2As shown, this embodiment provides a FIB-SEM dual-beam electron microscope, which includes a sample chamber, a stage 200, a pyroion beam system, and a scanning electron microscope system. The stage 200, pyroion beam system, and scanning electron microscope system are all housed within the sample chamber. In some embodiments, the sample can be directly fixed to the stage 200. In some embodiments, the FIB-SEM dual-beam electron microscope also includes a mounting bracket 400 for fixing the sample 300. The mounting bracket 400 is detachably connected to the stage 200, facilitating the fixing or removal of the sample 300 from the stage 200. The pyroion beam system emits an ion beam onto the upper surface of the sample 300, and the scanning electron microscope system emits an electron beam onto the upper surface of the sample 300, enabling the FIB-SEM dual-beam electron microscope to perform simultaneous observation and processing. In this embodiment, the stage 200 has multi-degree-of-freedom adjustment capabilities, including X, Y, Z, Tilt, and Rotation, used to adjust the upper surface of the sample 300 to the concentric point height. The specific structure for achieving multi-degree-of-freedom movement of the stage 200 in X, Y, Z, Tilt, and Rotation is existing technology and is not limited here.

[0049] In this embodiment, as Figure 1 As shown, the stage 200 is provided with a plurality of mounting holes 210. The lower end of the mounting member 400 can be inserted into or removed from the mounting holes 210, thereby achieving a detachable connection between the mounting member 400 and the stage 200. The structure is simple and the disassembly and assembly operations are convenient. It is understood that in other embodiments, the mounting member 400 can also be mounted on the stage 200 in other detachable ways, which is not limited here. The upper surface of the mounting member 400 is used to mount and fix the sample 300. Optionally, the sample 300 can be fixed to the mounting member 400 with conductive adhesive. The conductive adhesive can be conductive glue.

[0050] Due to the diversity of sample 300 sizes, the following situations may occur during the actual use of the FIB-SEM dual-beam electron microscope: In some cases, the height of sample 300 exceeds the maximum height of the sample nominally specified by the FIB-SEM dual-beam electron microscope (hereinafter referred to as ultra-high sample). After fixing the ultra-high sample 300 on the stage 200, the upper surface of sample 300 cannot reach the concentric point height, thus making it impossible to observe and process.

[0051] In this regard, such as Figure 1 and Figure 2As shown, this embodiment also provides a stage accessory 100 for mounting on the stage 200 of a FIB-SEM dual-beam electron microscope. The stage accessory 100 is made of conductive material and includes a mounting assembly 10, an extension assembly 20, and a support assembly 30. The mounting assembly 10 is mounted within a mounting hole 210 on the upper surface of the stage 200. A first end of the extension assembly 20 is connected to the mounting assembly 10, and a second end of the extension assembly 20 extends to the outer edge of the stage 200. The support assembly 30 is connected to the second end of the extension assembly 20 and includes a support surface 323 for fixing a sample 300. The support surface 323 is lower than the upper surface of the stage 200.

[0052] On the one hand, the stage attachment 100 lowers the bearing surface 323 relative to the upper surface of the stage 200, thus reducing the initial mounting height of the sample 300. This allows the stage 200 to adjust the upper surface of the sample 300 to the concentric point height even when the sample 300, exceeding the nominal maximum height of the FIB-SEM dual-beam electron microscope, is mounted on the bearing surface 323, ensuring that the FIB-SEM dual-beam electron microscope can process and observe samples 300 exceeding their nominal maximum height. Furthermore, for FIB applications requiring auxiliary tools to be positioned above the sample 300 for assisted operations (e.g., material deposition or enhanced etching using a gas injection system (GIS), in-situ sample extraction or mechanical testing using a nanomanipulator), the lowering of the initial height of the sample 300 by the stage attachment 100 provides more space for the introduction and operation of these auxiliary tools, reducing the possibility of spatial interference.

[0053] In this embodiment, as Figure 2 As shown, the bearing surface 323 is parallel to the upper surface of the stage 200, and the distance between them is h, where h can be 5mm to 30mm. Figure 2 As shown, compared to directly attaching the sample 300 to the upper surface of the stage 200, fixing the sample 300 to the stage 200 via the stage accessory 100 allows the upper surface of the sample 200 to sink by a distance h, enabling the FIB-SEM dual-beam electron microscope to observe and process samples 200 with a height exceeding the nominal h. Compared to using the existing mounting bracket 400 to fix the sample 300 to the stage 200, fixing the sample 300 to the stage 200 via the stage accessory 100 allows the upper surface of the sample 200 to sink by a distance H, enabling the FIB-SEM dual-beam electron microscope to observe and process samples 200 with a height exceeding the nominal h.

[0054] like Figure 1 and Figure 2As shown, the mounting assembly 10 includes a pin 11 and a support plate 12. The lower end of the pin 11 is inserted into the mounting hole 210 on the upper surface of the stage 200, and the extension assembly 20 is connected to the upper end of the pin 11. In this embodiment, the cross-sectional size of the lower end of the pin 11 is the same as the cross-sectional size of the lower end of the mounting component 400, so that the pin 11 and the mounting component 400 can share the mounting hole 210 for installation and fixation, without the need for invasive or permanent hardware modifications to the original stage 200 of the FIB-SEM dual-beam electron microscope. The support plate 12 is connected to the pin 11 and is used to fit against the upper surface of the stage 200. By setting the support plate 12, the stability of the stage accessory 100 installation can be improved, preventing the sample 300 on the stage accessory 100 from shaking during processing or observation, thereby ensuring processing accuracy and imaging clarity. Figure 1 As shown, along the axial direction of the nail post 11, the support plate 12 and the lower side of the extension assembly 20 form a gap 13. This gap 13 not only reduces the weight of the stage accessory 100, thereby reducing the sensitivity of the stage accessory 100 and the sample 300 on it to external vibrations, but also facilitates gripping or clamping, thereby improving the convenience of assembling and disassembling the stage accessory 100.

[0055] In this embodiment, the mounting component 10 is made of a material with high strength, high rigidity, good dimensional stability, excellent conductivity, non-magnetic or very weak magnetic properties, and meets the requirements of a high vacuum environment. Specifically, it can be: high-strength aluminum alloy (such as 7075 series, the surface of which can be conductively anodized), stainless steel (such as SUS304, SUS316L, non-magnetic grades), or titanium alloy.

[0056] In some specific embodiments, the mounting component 10 is made of hard aluminum alloy 7075-T6 and its surface is treated with black conductive anodizing to enhance wear resistance, conductivity and reduce stray light reflection. The support plate 12 is designed as a flat cylindrical ring and is arranged around the circumference of the nail post 11. The outer diameter of the support plate 12 can be 40 mm and the thickness can be 12 mm.

[0057] In some cases, the FIB-SEM dual-beam electron microscope also includes an adapter plate (not shown), which can be fixed to the stage 200. In this case, the stud 11 can be detachably connected to the adapter plate. Specifically, the bottom surface of the stud 11 can be machined with threaded holes 311 and positioning features that match the adapter plate to ensure a stable connection with the adapter plate. Optionally, a screw hole is machined on the top of the stud 11, and a screw passes through the first end of the extension assembly 20 and is threaded into the screw hole on the top of the stud 11, thereby achieving a fixed connection between the extension assembly 20 and the mounting assembly 10.

[0058] like Figure 3As shown, the extension component 20 and / or the support component 30 are provided with weight-reducing holes 11. It should be noted that the weight-reducing holes 11 are provided to ensure the overall structural strength of the stage accessory 100. The weight-reducing holes 11 reduce the weight of the entire stage accessory 100, thereby reducing the sensitivity of the stage accessory 100 and the sample 300 on it to external vibrations. In this embodiment, as... Figure 3 As shown, only the extension component 20 is provided with weight-reducing holes 11. Optionally, the shape of the weight-reducing holes 11 can be triangular, trapezoidal, circular, etc., and is not specifically limited here. In other embodiments, weight-reducing holes 11 can also be provided on the support component 30, provided that the structural strength of the support component 30 is guaranteed.

[0059] like Figure 1 and Figure 3 As shown, the axial direction of the nail post 11 is perpendicular to the upper surface of the stage 200. The extension assembly 20 includes an extension plate 21, which is perpendicular to the axial direction of the nail post 11. The support assembly 30 includes a vertical plate 31 and a horizontal plate 32. The upper end of the vertical plate 31 is connected to the extension plate 21 and is perpendicular to the extension plate 21. The horizontal plate 32 is connected to the lower end of the vertical plate 31 and is set perpendicular to the vertical plate 31. The upper surface of the horizontal plate 32 is the support surface 323. This configuration not only simplifies the structure but also ensures that the support surface 323 is lower than the upper surface of the stage 200 while remaining parallel to the upper surface of the stage 200. This makes it more convenient to adjust the position and orientation of the sample 300 by adjusting the stage 200.

[0060] Optionally, the upper end of the vertical plate 31 can be connected to the second end of the extension plate 21 by welding or fastener connection. The vertical plate 31 and the horizontal plate 32 can be integrally bent, or they can be fixedly connected by welding or fastener connection, without specific limitations. It is understood that if fasteners are used to connect the extension component 20 and the bearing component 30, the fasteners should be made of non-magnetic, high-strength, vacuum-compatible materials, such as specific grades of stainless steel or titanium alloy. In some embodiments, reinforcing ribs are added between the vertical plate 31 and the extension plate 21, and between the vertical plate 31 and the horizontal plate 32, to improve the structural strength and durability of the entire stage accessory 100.

[0061] In this embodiment, the extension component 20 and the support component 30 can be made of materials with high electrical conductivity, high thermal conductivity, ease of precision machining, low secondary electron emission coefficient, good vacuum compatibility, and ease of cleaning. The high electrical conductivity of the material ensures good grounding of the sample 200, reducing the charge effect. The high thermal conductivity of the material helps dissipate heat from the sample 300, especially during long-term ion beam processing. Specifically, both the extension component 20 and the support component 30 can be made of oxygen-free copper (OFHC), gold- or platinum-plated aluminum alloys, molybdenum (Mo), or specially treated graphite.

[0062] like Figure 3 As shown, the bearing surface 323 is a flat and smooth surface, which facilitates the bonding of the sample 300 to the bearing surface 323 using conductive adhesive, ensuring the convenience and reliability of sample 300 installation. Specifically, the bearing surface 323 can be finely processed, such as mirror polishing, to reduce stray signals. In some embodiments, auxiliary markings such as grid lines and crosshairs can also be provided on the bearing surface 323 to facilitate the initial positioning and alignment of the sample 300.

[0063] To ensure that the stage accessory 100 can accommodate more samples 300, the bearing surface 323 should have a sufficiently large area. In some embodiments, the horizontal plate 32 is square, therefore the bearing surface 323 is square. The side length of the square can be 5mm to 25mm. The side length of the square can be flexibly set as needed. In some embodiments, the shape of the bearing surface 323 can also be a regular shape such as a circle or rectangle, which is easy to process.

[0064] In some embodiments, such as Figure 4 As shown, the supporting part includes a first part 321 and a second part 322. The first part 321 is connected to the vertical plate 31, and the second part 322 is connected to the end of the first part 321 away from the vertical plate 31. The width of the second part 322 is greater than the width of the first part 321. That is, the width of the horizontal plate 32 on the side closer to the platform 200 is smaller, and the width on the side away from the platform 200 is larger. With this arrangement, the first part 321 can avoid some structures on the periphery of the platform 200 while ensuring that the entire supporting surface 323 has a large area.

[0065] In some specific embodiments, the horizontal plate 32 is a square with dimensions of 18mm × 18mm and a thickness of 3mm. The upper surface of the horizontal plate 32 (i.e., the bearing surface 323) is precision ground and polished to achieve a surface roughness Ra ≤ 0.2µm. The edges of the horizontal plate 32 may be slightly chamfered to avoid scratches. The height difference h between the bearing surface 323 and the upper surface of the extension component 20 can be 15mm.

[0066] It should be noted that all contact surfaces within the entire stage accessory 100, from the sample 300 to the FIB-SEM dual-beam electron microscope's ground wire (such as between the sample 300 and the bearing surface 323, and between the support plate 12 and the upper surface of the stage 200), should have high conductivity to ensure a good and stable conductive path, minimizing the charging effect. If necessary, conductive springs or conductive silver paste can be used to reinforce the connection. Furthermore, the materials of all components in the stage accessory 100 must ensure that their physical and chemical properties can withstand the high vacuum environment (typically better than 10) during FIB-SEM dual-beam electron microscope operation. - 5 To avoid contamination of the material itself (such as gas release or particle shedding) affecting microscope performance and experimental results, measures should be taken to consider factors such as Pa, possible ion / electron beam irradiation, and temperature changes.

[0067] In this embodiment, the general steps for processing and observing a sample 300 with a height exceeding the nominal maximum height using the aforementioned stage accessory 100 in a FIB-SEM dual-beam electron microscope include:

[0068] (1) Fixing of sample 300: Carefully attach and fix the sample 300 to be observed or processed to the center area of ​​the bearing surface 323 using a suitable conductive adhesive (such as conductive silver paste, conductive carbon ribbon, low temperature conductive epoxy resin, etc.); wait for the conductive adhesive to cure to ensure good mechanical and electrical contact between the bottom of sample 300 and bearing surface 323.

[0069] (2) Installation of stage accessory 100: The stage accessory 100, which already supports the sample 300, is installed into the mounting hole 210 of the stage 200 of the FIB-SEM dual-beam electron microscope using the pins 11, and the installation is ensured to be secure and locked. Based on the structure of the stage accessory 100, the initial height of the upper surface of the sample 300 or its target area is significantly reduced compared to when it is directly fixed to the stage 200 by the mounting component 400. This reduction is denoted as H.

[0070] (3) The sample chamber is evacuated, and the target position of sample 300 is moved to the vicinity of the intersection of the ion beam and the electron beam using the automatic navigation camera of the FIB-SEM dual-beam electron microscope or a low-magnification SEM for observation. The target area is then processed and observed. It should be noted that in this embodiment, the stage accessory 100 mainly optimizes the height of the upper surface of sample 300 along the Z-axis. Multi-angle observation and processing of sample 300 (such as tilting and rotating) mainly rely on the tilt and rotation functions of the FIB-SEM dual-beam electron microscope stage 200 itself.

[0071] In summary, the stage attachment 100 of this application, through the Z-shaped structure formed by the extension component 20 and the support component 30, effectively manages the initial Z-axis position of the sample 300. This not only enables the FIB-SEM dual-beam electron microscope to process and observe samples 300 with heights exceeding the nominal maximum height, but also significantly reduces the risk of collision between the sample 300 (especially its edges or protrusions) and the internal components (such as pole shoes and detectors) of the FIB-SEM dual-beam electron microscope when the stage 200 is tilted at large angles. This indirectly expands the range of safe multi-angle operations, thereby better supporting applications such as 3D reconstruction and multi-directional cross-sectional analysis.

[0072] Example 2

[0073] This embodiment provides a stage attachment 100 and a FIB-SEM dual-beam electron microscope including the stage attachment 100. The general structure of the stage attachment 100 in this embodiment is the same as that in Embodiment 1, the main difference being the movable connection between the second end of the support component 30 and the extension component 20, thereby making the height of the support surface 323 adjustable, as detailed below:

[0074] like Figure 5 and Figure 6 As shown, the stage accessory 100 also includes a height adjustment component 40, which is connected between the second end of the extension component 20 and the support component 30. The height adjustment component 40 is used to drive the support component 30 to move, thereby adjusting the height of the support surface 323 relative to the upper surface of the stage 200. It is understood that the specific value by which different ultra-high samples 300 exceed the nominal maximum height of the FIB-SEM dual-beam electron microscope may differ. If the distance between the support surface 323 and the upper surface of the stage 200 is large, while the value by which the sample 300 exceeds the nominal maximum height is small, it may be inconvenient to adjust the upper surface of the sample 300 to the concentric point height laterally. In this embodiment, by setting the height adjustment component 40, the height of the support surface 323 can be flexibly adjusted, thereby flexibly adjusting the distance between the support surface 323 and the upper surface of the stage 200, so that the support surface 323 is at a suitable downward height, thus giving the upper surface of the ultra-high sample 300 a suitable initial height, improving the convenience of adjusting the stage 200 during subsequent observation and processing. Understandably, the height adjustment component 40 should be able to achieve adjustment resolution and repeatability at the micrometer level (e.g., 1-10µm) or even submicrometer level (<1µm, especially when using a piezoelectric motor).

[0075] In some embodiments, such as Figure 5As shown, the height adjustment assembly 40 includes a lead screw and nut pair 41 and an operating part 42. The lead screw and nut pair 41 is connected between the second end of the extension assembly 20 and the bearing assembly 30. The lead screw and nut pair 41 includes a lead screw 411 and a nut 412. The operating part 42 is connected to the lead screw 411 and is used to drive the lead screw 411 to rotate. When the user rotates the operating part 42 to drive the lead screw 411 to rotate, the lead screw 411 and the nut 412 move relative to each other along the axial direction of the lead screw 411, thereby causing the bearing assembly 30 to move up and down relative to the extension assembly 20, realizing the height adjustment of the bearing surface 323. In this embodiment, the lead screw and nut pair 41 also includes a connecting block 413. The upper end of the lead screw 411 is rotatably engaged with the extension assembly 20 through a bearing, and the operating part 42 is fixedly connected to the lower end of the lead screw 411. The nut 412 is threadedly connected to the lead screw 411, and the connecting block 413 is connected to the nut 412. The connecting block 413 is fixed on the vertical plate 31. When the lead screw 411 is rotated via the operating part 42, the nut 412 drives the connecting block 413 and the entire bearing assembly 30 to move along the axial direction of the lead screw 411. Optionally, the connecting block 413 can be connected to the vertical plate 31 by means of fastener connection, welding, etc., which is not specifically limited here.

[0076] like Figure 5 As shown, the stage accessory 100 also includes a guide assembly 50. The fixed end of the guide assembly 50 is fixedly connected to the extension assembly 20, and the movable end of the guide assembly 50 is fixedly connected to the support assembly 30. The extension assembly 20 and the support assembly 30 are connected by the guide assembly 50, ensuring the precision of the fit between the support assembly 30 and the extension assembly 20, as well as the stability, high straightness, and resistance to lateral forces and overturning moments of the support assembly 30 during vertical lifting, preventing swaying or jamming. Specifically, the guide assembly 50 is preferably a high-precision linear guide element.

[0077] In this embodiment, the extension component 20 further includes a connecting plate 22, which is connected to the end of the extension plate 21 away from the mounting component 10. The connecting plate 22 is disposed opposite to the vertical plate 31. The guide component 50 is installed between the connecting plate 22 and the vertical plate 31. Optionally, in some embodiments, the guide component 50 is a cross roller guide rail, which includes a first guide rail 51 and a second guide rail 52. The first guide rail 51 is connected to the side of the connecting plate 22 facing the vertical plate 31, and the second guide rail 52 is installed on the side of the vertical plate 31 facing the connecting plate 22. The first guide rail 51 and the second guide rail 52 are disposed opposite to each other and slidably engaged. It is understood that in other embodiments, the guide component 50 may also be a miniature linear sliding guide rail or a precision-fitted guide post and guide sleeve structure, etc., and is not specifically limited here.

[0078] like Figure 5As shown, the stage accessory 100 also includes a locking assembly 60, which is used to lock or unlock the relative positions of the extension assembly 20 and the support assembly 30. This ensures the stability of the support assembly 30's position during processing and testing, thereby ensuring the stability of the sample 300 on the support assembly 30, ensuring processing accuracy and clear observation. In this embodiment, the locking assembly 60 includes a bolt. A threaded hole 311 is provided on the vertical plate 31, and the bolt is threaded into the threaded hole 311, with one end facing the connecting plate 22. When the bolt is rotated so that its end abuts against the connecting plate 22, the locking assembly 60 locks the relative positions of the vertical plate 31 and the connecting plate 22, thereby locking the support assembly 30 and the extension assembly 20. When the bolt is rotated so that its end separates from the connecting plate 22, the vertical plate 31 and the connecting plate 22 are unlocked, thereby unlocking the support assembly 30 and the extension assembly 20. In other embodiments (not shown), the locking component 60 may be configured as follows: the connecting plate 22 is provided with a plurality of insertion holes spaced 13 along the axial direction of the lead screw 411, the vertical plate 31 is provided with a through hole, and the locking component 60 includes a pin that passes through the through hole and can be inserted into any of the insertion holes, thereby locking the bearing component 30 in different positions.

[0079] Optionally, scale lines can be set on the connecting plate 22, and marker points can be set on the vertical plate 31. The marker points are used in conjunction with the scale lines. Users can determine the height of the bearing surface 323 by the correspondence between the marker points and the scale lines, thereby improving the convenience of adjusting the height of the bearing surface 323.

[0080] In some embodiments, such as Figure 6 As shown, the height adjustment assembly 40 includes a lead screw and nut pair 41 and a drive source 43. The lead screw and nut pair 41 is connected between the second end of the extension assembly 20 and the bearing assembly 30. The lead screw and nut pair 41 includes a lead screw 411 and a nut 412. The output end of the drive source 43 is connected to the lead screw 411 and is used to drive the lead screw 411 to rotate. When the drive source 43 drives the lead screw 411 to rotate, the lead screw 411 and the nut 412 move relative to each other along the axial direction of the lead screw 411, thereby causing the bearing assembly 30 to move up and down relative to the extension assembly 20, thus realizing the height adjustment of the bearing surface 323.

[0081] In this embodiment, the lead screw and nut assembly 41 further includes a connecting block 413 and a fixing plate 70. The upper end of the lead screw 411 is rotatably coupled to the extension assembly 20 via a bearing. The fixing plate 70 is fixedly connected to the extension assembly 20. The drive source 43 is mounted on the fixing plate 70, and its output end is fixedly connected to the lower end of the lead screw 411. The nut 412 is threadedly connected to the lead screw 411, and the connecting block 413 is connected to the nut 412. The connecting block 413 is fixed to the vertical plate 31. When the drive source 43 drives the lead screw 411 to rotate, the nut 412 drives the entire bearing assembly 30 to move along the axial direction of the lead screw 411. Optionally, the connecting block 413 can be connected to the vertical plate 31 by fastener connection, welding, etc., which is not specifically limited here. The fixing plate 70 can also be connected to the extension plate 21 of the extension assembly 20 by fastener connection, welding, etc., which is not limited here. Optionally, the drive source 43 can be a micro stepper motor, an electro-ceramic linear motor, etc. In addition, in the scheme where the drive source 43 drives the lead screw 411 to rotate, a guide component 50 and a locking component can also be provided, which will not be described in detail here.

[0082] It should be noted that the materials used for the transmission components involved in this embodiment (such as the lead screw 411, nut 412, guide rail, bearings, etc.) require high hardness, high wear resistance, and low coefficient of friction. Specifically, these can be: hardened bearing steel, silicon nitride ceramic (for ball bearings), etc. If a lubricant is used between the transmission components, the lubricant must be ultra-high vacuum compatible.

[0083] In this embodiment, the general steps for processing and observing a sample 300 with a height exceeding the nominal maximum height using the aforementioned stage accessory 100 in a FIB-SEM dual-beam electron microscope include:

[0084] (1) Adjust the height of the bearing surface 323 by the drive source 43 or the operation unit 42 so that the height of the bearing surface 323 is vertically matched with the height of the ultra-high sample 300, and lock the position of the bearing component 30 by the locking component 60. (It can be understood that the larger the ultra-high size of the sample 300, the lower the height of the bearing surface 323).

[0085] (2) Fixing of sample 300: Carefully attach and fix the sample 300 to be observed or processed onto the bearing surface 323 using a suitable conductive adhesive (such as conductive silver paste, conductive carbon ribbon, low-temperature conductive epoxy resin, etc.) to ensure that good mechanical and electrical contact is formed between the bottom of sample 300 and the bearing surface 323.

[0086] (3) Installation of stage accessory 100: The stage accessory 100, which already supports the sample 300, is installed into the mounting hole 210 of the stage 200 of the FIB-SEM dual-beam electron microscope using the pins 11, and the installation is ensured to be secure and locked. Based on the structure of the stage accessory 100, the initial height of the upper surface of the sample 300 or its target area is significantly reduced compared to when it is directly fixed to the stage 200 by the mounting component 400.

[0087] (4) Evacuate the sample chamber and observe it using the automatic navigation camera of the FIB-SEM dual-beam electron microscope or a low-magnification SEM. Move the target position of sample 300 to the vicinity of the intersection of the ion beam and the electron beam, and process and observe the target area.

[0088] Obviously, the above embodiments of this utility model are merely examples for clearly illustrating the present utility model, and are not intended to limit the implementation of the present utility model. For those skilled in the art, based on the concept of this utility model, there will be changes in the specific implementation methods and application scope. The content of this specification should not be construed as a limitation of this utility model. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this utility model should be included within the protection scope of the claims of this utility model.

Claims

1. A stage accessory for mounting on the stage (200) of a FIB-SEM dual-beam electron microscope, characterized in that, The stage accessory is made of a conductive material and includes: Mounting assembly (10) for mounting on the upper surface of the stage (200); An extension component (20) has a first end connected to the mounting component (10) and a second end extending to the outside edge of the stage (200); A support component (30) is connected to the second end of the extension component (20), the support component (30) including a support surface (323) which is lower than the upper surface of the stage (200).

2. The stage accessory as described in claim 1, characterized in that, The mounting assembly (10) includes a nail post (11) which is inserted into a mounting hole (210) in the platform (200); the extension assembly (20) includes an extension plate (21) which is perpendicular to the axial direction of the nail post (11); the bearing assembly (30) includes a vertical plate (31) and a horizontal plate (32), the upper end of the vertical plate (31) is connected to the extension plate (21) and is perpendicular to the extension plate (21), the horizontal plate (32) is connected to the lower end of the vertical plate (31) and is set perpendicular to the vertical plate (31), and the upper surface of the horizontal plate (32) is the bearing surface (323).

3. The stage accessory as described in claim 1, characterized in that, The bearing surface (323) is parallel to the upper surface of the stage (200) and the distance between them is 5mm to 30mm.

4. The stage accessory as described in claim 1, characterized in that, The installation component (10) includes: A nail post (11) is provided, the lower end of which is inserted into a mounting hole (210) on the upper surface of the stage (200), and the extension assembly (20) is connected to the upper end of the nail post (11). A support plate (12) is connected to the nail post (11). The support plate (12) is used to fit against the upper surface of the stage (200). Along the axial direction of the nail post (11), the support plate (12) forms a gap (13) with the lower side of the extension assembly (20).

5. The stage accessory as described in claim 1, characterized in that, The extension component (20) and / or the support component (30) are provided with weight reduction holes (211).

6. The stage accessory as described in any one of claims 1-5, characterized in that, The stage accessory also includes a height adjustment component (40), which is connected between the second end of the extension component (20) and the support component (30). The height adjustment component (40) is used to drive the support component (30) to move in order to adjust the height of the support surface (323) relative to the upper surface of the stage (200).

7. The stage accessory as described in claim 6, characterized in that, The height adjustment assembly (40) includes a lead screw and nut pair (41) and an operating part (42). The lead screw and nut pair (41) is connected between the second end of the extension assembly (20) and the bearing assembly (30). The operating part (42) is connected to the lead screw of the lead screw and nut pair (41) and is used to drive the lead screw to rotate; or The height adjustment assembly (40) includes a lead screw and nut pair (41) and a drive source (43). The lead screw and nut pair (41) is connected between the second end of the extension assembly (20) and the bearing assembly (30). The output end of the drive source (43) is connected to the lead screw of the lead screw and nut pair (41) and is used to drive the lead screw to rotate.

8. The stage accessory as described in claim 6, characterized in that, The stage accessory also includes a guide assembly (50), the fixed end of which is fixedly connected to the extension assembly (20), and the movable end of which is fixedly connected to the bearing assembly (30).

9. The stage accessory as described in claim 5, characterized in that, The stage accessory also includes a locking assembly (60) for locking or unlocking the relative positions of the extension assembly (20) and the support assembly (30).

10. A FIB-SEM dual-beam electron microscope, characterized in that, The device includes a stage (200), a focal ion beam system, a scanning electron microscope system, and a stage accessory as described in any one of claims 1-8. The stage (200) is provided with a mounting hole (210) for mounting the stage accessory or a mounting component (400). The focal ion beam system is used to emit an ion beam to a sample (300) on the stage accessory or a sample (300) on the mounting component (400). The scanning electron microscope system is used to emit an electron beam to a sample (300) on the stage accessory or a sample (300) on the mounting component (400).

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