A release film with low release force

Abstract

The utility model discloses a kind of release films of light release force, belong to high molecular film material technical field, including diaphragm one, high-temperature-resistant support layer, bonding buffer layer, gradient coating, micro-nano texture layer, ultrathin release coating and diaphragm two, high-temperature-resistant support layer, bonding buffer layer, gradient coating, micro-nano texture layer, ultrathin release coating are sequentially fixedly connected from top to bottom between diaphragm one and diaphragm two, the concentration of low surface energy substance in gradient coating gradually increases along the direction away from bonding buffer layer, micron-level pit is formed on the surface of micro-nano texture layer, ultrathin release coating is covered on the surface of micro-nano texture layer.The utility model passes through the synergistic effect of gradient coating and micro-nano texture layer, solve the problem that release force is larger and coating is easy to fall off in prior art, meanwhile, through high-temperature-resistant support layer and bonding buffer layer, high-temperature-resistant performance and structural stability are improved.

Description

Technical Field

[0001] This utility model relates to the field of polymer membrane material technology, and in particular to a release membrane with light release force. Background Technology

[0002] Release film is a thin film used in the production process to temporarily support and protect adhesive materials, and it has wide applications in electronics manufacturing, tape production, and composite material molding.

[0003] Existing release films mainly rely on coating the substrate surface with a low surface energy release agent to achieve the release function. When peeling off highly viscous products, this structure generates a large peeling force. In the transfer of precision devices or demolding of composite materials, excessive peeling force will damage the product or cause the finished product to deform.

[0004] In pursuit of lower release force, the industry tends to use coating materials with lower surface energy. However, the physical and chemical properties of low surface energy materials are very different from those of the film substrate itself. This difference leads to insufficient adhesion between the release coating and the substrate. Under repeated use or high temperature conditions, the release coating may peel off or transfer, thereby contaminating the product and causing the release film to fail.

[0005] Therefore, this invention proposes a release film with light release force to overcome the shortcomings of the prior art. Utility Model Content

[0006] In view of the problems in the prior art, such as product damage caused by excessive peeling force when peeling off highly viscous products, and the release coating falling off due to insufficient adhesion between the release coating and the substrate under certain conditions, this utility model aims to provide a release film with an improved structure that can effectively solve the above problems with light release force.

[0007] This utility model provides a release film with light release force, comprising: a first film sheet, a high-temperature resistant support layer, an adhesive buffer layer; and a gradient coating, a micro-nano textured layer, an ultra-thin release coating, and a second film sheet.

[0008] Among them, the high-temperature resistant support layer is fixedly connected to the bottom of the first membrane, the adhesive buffer layer is fixedly connected to the bottom of the high-temperature resistant support layer, the gradient coating is fixedly connected to the bottom of the adhesive buffer layer, the micro-nano texture layer is fixedly connected to the bottom of the gradient coating, the ultrathin release coating is fixedly connected to the bottom of the micro-nano texture layer, and the second membrane is fixedly connected to the bottom of the ultrathin release coating.

[0009] The concentration of low surface energy material inside the gradient coating exhibits a gradient distribution that gradually increases away from the adhesive buffer layer. On the side closer to the adhesive buffer layer, the concentration of low surface energy material is lower, which ensures strong adhesion between the gradient coating and the adhesive buffer layer. On the side farther away from the adhesive buffer layer, the concentration of low surface energy material is higher, which gives the gradient coating high-efficiency release properties.

[0010] At the bottom of the gradient coating, the micro-nano texture layer forms a precise micron-scale pit structure on the entire surface. These pits play a role in reducing the actual contact area during the release process. The ultra-thin release coating covers the surface of the micro-nano texture layer and works together with the micro-nano texture layer to achieve ultra-light release.

[0011] Furthermore, membrane one and membrane two sandwich the high-temperature resistant support layer, adhesive buffer layer, gradient coating, micro-nano texture layer and ultra-thin release coating by fixing them together layer by layer, forming a structurally stable and functionally integrated whole.

[0012] Preferably, the gradient coating comprises a low surface energy material, which has a lower concentration on the side closer to the adhesive buffer layer, ensuring a strong bond between the gradient coating and the adhesive buffer layer, and a higher concentration on the side farther from the adhesive buffer layer. This gives the release film surface excellent low surface energy characteristics, thereby ensuring ultra-light release performance.

[0013] Preferably, the surface of the micro-nano textured layer has micron-sized pits. These pits can significantly reduce the actual contact area between the adhesive and the ultra-thin release coating upon contact, thereby reducing the release force through physical effects.

[0014] Preferably, an ultra-thin release coating is applied to the surface of the micro-nano textured layer. By utilizing the structural characteristics of the micro-nano texture, the ultra-thin release coating can further effectively reduce the effective wetting area of ​​the adhesive, thereby achieving lower peel force.

[0015] Preferably, the adhesive buffer layer is configured to alleviate the stress caused by the difference in thermal expansion coefficients between the high-temperature support layer and the gradient coating. For example, the adhesive buffer layer may be made of a material with appropriate elasticity and toughness to buffer the stress caused by temperature changes and prevent delamination between layers.

[0016] Preferably, the thickness of the ultrathin release coating is 0.1 micrometers to 1 micrometer. This thickness range ensures that the release coating maintains efficient release performance without affecting the flexibility and transparency of the overall film structure, and also helps to control production costs.

[0017] Preferably, the high-temperature resistant support layer is composed of polyimide material and maintains structural stability at high temperatures. For example, materials such as polyimide or polyetheretherketone can withstand high processing or use temperatures, ensuring that the release film can still work stably in harsh environments.

[0018] This utility model has the following beneficial effects: 1. This utility model solves the problems of large release force of release film and weak bonding between release film and substrate in the prior art, and easy peeling off, by setting a gradient coating and gradually increasing the concentration of low surface energy material in the gradient coating from the inside to the outside, and setting a micro-nano textured layer with micron-level pits and an ultra-thin release coating below the gradient coating.

[0019] 2. This utility model solves the problems of insufficient high-temperature resistance of release films in the prior art, as well as structural instability and easy delamination caused by the large difference in the thermal expansion coefficients of the materials in each layer when the temperature changes, by setting a high-temperature resistant support layer in the release film structure and setting an adhesive buffer layer between the high-temperature resistant support layer and the functional coating. It achieves the effect of improving the overall high-temperature resistance of the release film and enhancing the structural reliability and service life of the product under thermal cycling environment. Attached Figure Description

[0020] Figure 1 This is a front perspective view of a release film with a light release force according to the present invention. Figure 2 This is a partial structural exploded view of the high-temperature resistant support layer of a release film with light release force proposed in this utility model; Figure 3 This is a partial structural breakdown of the adhesive buffer layer of a release film with low release force proposed in this utility model; Figure 4 This is a partial structural breakdown diagram of the gradient coating of a release film with light release force proposed in this utility model.

[0021] Legend: 1. Membrane 1; 2. High-temperature resistant support layer; 3. Adhesive buffer layer; 4. Gradient coating; 5. Micro-nano textured layer; 6. Ultra-thin release coating; 7. Membrane 2. Detailed Implementation

[0022] To make the objectives, technical solutions, and advantages of this utility model clearer, the technical solutions in the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this utility model, and not all of them. All other embodiments obtained by those skilled in the art based on the embodiments of this utility model without creative effort are within the scope of protection of this utility model. Example

[0023] Please refer to Figures 1 to 4This utility model provides a release film with light release force, which aims to solve the problems of large release force, insufficient high temperature resistance, and weak adhesion between the release coating and the substrate in the prior art, which leads to easy peeling.

[0024] Please refer to Figure 1 and Figure 2 The release film with light release force includes a membrane 1 and a high-temperature resistant support layer 2. The high-temperature resistant support layer 2 is made of polyimide material and is fixedly connected to the bottom of the membrane 1. The membrane 1 serves as the top substrate of the release film. The high-temperature resistant support layer 2 is used to provide mechanical support and stability of the entire membrane structure at high temperatures, ensuring the structural integrity of the release film in the thermal environment. The adhesive buffer layer 3 is made of high-temperature resistant silane coupling agent modified material and is fixedly connected to the bottom of the high-temperature resistant support layer 2. The adhesive buffer layer 3 is configured to effectively alleviate the stress caused by the difference in thermal expansion coefficients between the high-temperature resistant support layer 2 and the gradient coating 4 below, thereby enhancing the bonding strength between the layers and extending the service life of the release film.

[0025] The gradient coating 4 is fixedly connected to the bottom of the adhesive buffer layer 3. The gradient coating 4 is an important component for realizing the core release function of this invention. The concentration of the low surface energy material inside gradually increases in the direction away from the adhesive buffer layer 3. The concentration of the gradient coating 4 is lower on the side closer to the adhesive buffer layer 3, which ensures good adhesion between the gradient coating 4 and the adhesive buffer layer 3 and prevents the coating from falling off during use. The concentration of the gradient coating 4 is higher on the side away from the adhesive buffer layer 3, which makes the surface of the release film have extremely low surface energy, thereby achieving an ultra-light release effect.

[0026] The micro-nano textured layer 5 is fixedly connected to the bottom of the gradient coating 4. The surface of the micro-nano textured layer 5 has a precise micron-level pit structure. These micron-level pits can form an uneven interface under the ultrathin release coating 6, and the release force can be controlled by changing the actual contact area between the adhesive and the release film.

[0027] The ultra-thin release coating 6 is fixedly connected to the bottom of the micro-nano textured layer 5. The ultra-thin release coating 6 is coated with an organosilicon coating with a thickness of only 0.1 micrometer to 1 micrometer, covering the surface of the micro-nano textured layer 5. Through the uneven interface formed by the micro-nano textured layer 5, the actual effective contact area between the adhesive and the release film surface is further reduced, thereby significantly reducing the release force and achieving efficient and ultra-light release performance.

[0028] Membrane 2 7 is fixedly connected to the bottom of the ultrathin release coating 6, serving as the bottom substrate of the release film. Together with membrane 1, it holds the high-temperature resistant support layer 2, adhesive buffer layer 3, gradient coating 4, micro-nano texture layer 5, and ultrathin release coating 6 in between, forming a multi-layer composite release film with a robust structure and complete functions.

[0029] Please refer to Figure 3 and Figure 4 The gradient coating 4 is fixedly connected to the bottom of the aforementioned adhesive buffer layer 3. The internal components of the gradient coating 4 contain low surface energy substances, and the concentration of the low surface energy substances gradually increases along the direction away from the adhesive buffer layer 3. On the side of the gradient coating 4 close to the adhesive buffer layer 3, the concentration of low surface energy substances is lower, which ensures sufficient adhesion between the gradient coating 4 and the adhesive buffer layer 3 and prevents the coating from falling off during high temperature or long-term use. On the side of the gradient coating 4 away from the adhesive buffer layer 3, the concentration of low surface energy substances is higher, which makes the surface of the gradient coating 4 have extremely low surface energy, laying the chemical basis for achieving the ultra-light release effect.

[0030] The micro-nano textured layer 5 is fixedly connected to the bottom of the gradient coating 4. The entire surface of the micro-nano textured layer 5 is precisely formed with a large number of micron-level pit structures. These micron-level pits may not be obvious on a macroscopic scale, but on a microscopic scale, they form an uneven interface. The design of these pits is one of the key physical mechanisms to achieve light release force. It can fundamentally change the contact behavior between the adhesive and the release film surface.

[0031] An ultrathin release coating 6 is fixedly attached to the bottom of the micro-nano textured layer 5. The thickness of the ultrathin release coating 6 is 0.1 micrometers to 1 micrometer. The ultrathin release coating 6 tightly covers the surface of the micron-scale pits formed by the micro-nano textured layer 5. Since the surface of the micro-nano textured layer 5 has a large number of micron-scale pits, when the ultrathin release coating 6 covers the surface, the actual contact area between the adhesive and the ultrathin release coating 6 is significantly reduced compared to the flat surface. That is, the adhesive cannot completely fill and fully wet the entire surface of these micron-scale pits. This physical incomplete contact, together with the chemical low adhesion brought by the high surface energy material of the gradient coating 4, leads to a significant reduction in the adhesion force between the adhesive and the release film, thereby achieving an ultra-light release force and ensuring that the material can be easily peeled off without residue. At the same time, the ultrathin characteristics of the ultrathin release coating 6 ensure that the release film maintains excellent release performance without increasing the overall thickness and cost.

[0032] As a preferred embodiment, in order to further improve the high temperature resistance and mechanical strength of the release film, the high temperature resistant support layer 2 is composed of polyimide material and maintains structural stability at high temperature. It has excellent thermal stability and dimensional stability, ensuring that the release film will not deform or degrade in performance during high temperature curing or molding processes.

[0033] As another preferred embodiment, in order to enhance the structural reliability of the release film under different temperature environments, the adhesive buffer layer 3 is configured to alleviate the stress caused by the difference in thermal expansion coefficients between the high-temperature support layer 2 and the gradient coating layer 4. The adhesive buffer layer 3 can be made of silicone or acrylic adhesive with a certain degree of elasticity. This material can effectively absorb and disperse the interlayer stress caused by temperature changes, thereby preventing delamination, blistering or cracking between layers, and greatly improving the durability and reliability of the release film.

[0034] As a further preferred embodiment, in order to achieve more precise release force control and optimize production costs, the thickness of the ultrathin release coating 6 can be controlled within the range of 0.1 micrometers to 1 micrometer. Within this thickness range, the release coating can completely cover the surface of the micro-nano textured layer 5, ensuring the uniformity and stability of the release effect, while avoiding problems such as increased cost or increased brittleness caused by excessive coating thickness. Thus, while ensuring performance, the best balance between cost and process is achieved.

[0035] Working principle: When the release film is used in applications requiring bonding and peeling with adhesives or other materials, film 1 and film 7 together form the overall framework of the release film. The high-temperature resistant support layer 2 is made of polyimide material and maintains structural stability at high temperatures, providing the necessary mechanical strength and heat resistance for the entire multilayer structure. This ensures that the release film will not undergo significant deformation under high-temperature processes. Meanwhile, the adhesive buffer layer 3 effectively absorbs and alleviates the internal stress caused by the difference in thermal expansion coefficients between the high-temperature resistant support layer 2 and the gradient coating layer 4 when the temperature changes, thereby preventing interlayer delamination and ensuring the long-term stability and reliability of the overall structure of the release film. The core mechanism for achieving ultra-light release force lies in the synergy of chemical and physical effects. First, the gradient coating 4 achieves a smooth transition between adhesive performance and release performance through the gradual increase in concentration of low surface energy material in the direction away from the adhesive buffer layer 3. The side of the gradient coating 4 close to the adhesive buffer layer 3 forms a firm fixed connection with the adhesive buffer layer 3 due to the lower concentration of low surface energy material, which solves the problem of easy peeling of traditional release coatings. On the other hand, the side of the gradient coating 4 away from the adhesive buffer layer 3 exhibits extremely low surface energy due to the higher concentration of low surface energy material, which reduces the adhesion of the adhesive from a chemical perspective. The micron-scale pit structure formed on the surface of the micro-nano textured layer 5, combined with the ultrathin release coating 6 covering the surface of the micro-nano textured layer 5, further enhances the light release effect from a physical perspective. When the adhesive comes into contact with the surface of the ultrathin release coating 6, the presence of the micro-nano textured layer 5 prevents the adhesive from fully wetting and contacting the release film surface, and the actual effective contact area is greatly reduced. Finally, through the synergistic effect of the chemically low adhesion provided by the gradient coating 4 and the physically low contact area provided by the micro-nano textured layer 5 and the ultrathin release coating 6, the problems of large release force and easy coating peeling in the prior art are solved, achieving a comprehensive effect of ultra-light release force, high temperature resistance and strong coating adhesion.

Claims

1. A release film with light release force, comprising: Membrane 1 (1); High-temperature resistant support layer (2), wherein the high-temperature resistant support layer (2) is fixedly connected to the bottom of the diaphragm (1) using polyimide material; And an adhesive buffer layer (3), wherein the adhesive buffer layer (3) is made of a high-temperature resistant silane coupling agent modified material and is fixedly connected to the bottom of the high-temperature resistant support layer (2); Its characteristic is that it also includes A gradient coating (4) is fixedly connected to the bottom of the adhesive buffer layer (3); Micro-nano textured layer (5), the micro-nano textured layer (5) is fixedly connected to the bottom of the gradient coating (4); An ultrathin release coating (6) is fixedly attached to the bottom of the micro-nano textured layer (5); And diaphragm two (7), which is fixedly connected to the bottom of the ultrathin release coating (6).

2. The release film with light release force according to claim 1, characterized in that, The concentration of low surface energy material inside the gradient coating (4) gradually increases in the direction away from the adhesive buffer layer (3).

3. The release film with light release force according to claim 1, characterized in that, The surface of the micro-nano textured layer (5) has micron-sized pits.

4. The release film with light release force according to claim 1, characterized in that, The ultrathin release coating (6) is coated with an organosilicon coating with a thickness of only 0.1 micrometer to 1 micrometer on the surface of the micro-nano textured layer (5).

5. A release film with light release force according to claim 2, characterized in that, The gradient coating (4) comprises a low surface energy material, which has a lower concentration on the side closer to the adhesive buffer layer (3) and a higher concentration on the side farther from the adhesive buffer layer (3).

6. The release film with light release force according to claim 1, characterized in that, The adhesive buffer layer (3) is configured to alleviate the stress caused by the difference in the coefficient of thermal expansion between the high-temperature support layer (2) and the gradient coating (4).

7. The release film with light release force according to claim 1, characterized in that, The thickness of the ultrathin release coating (6) is 0.1 micrometers to 1 micrometer.

8. The release film with light release force according to claim 1, characterized in that, The high-temperature resistant support layer (2) is composed of polyimide material and maintains structural stability at high temperatures.

9. A release film with light release force according to claim 1, characterized in that, The first membrane (1) and the second membrane (7) sandwich the high-temperature resistant support layer (2), the adhesive buffer layer (3), the gradient coating (4), the micro-nano textured layer (5) and the ultra-thin release coating (6) between them.

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