Sputter cathode structure and coating apparatus

Abstract

The utility model discloses a sputtering cathode structure and coating equipment. Among them, sputtering cathode structure includes: frame and installation body, the installation body is used to install target material, adjustment part, the adjustment part includes: adjusting assembly, adjusting assembly includes slide rail mechanism and sliding block mechanism, one side of slide rail mechanism can be along vertical direction slidingly connected frame, one side of sliding block mechanism can be along horizontal direction slidingly connected the other side of slide rail mechanism, rotating assembly, rotating assembly includes connecting rod, one end of connecting rod rotatably connects the other side of sliding block mechanism, the other end of connecting rod connects installation body. The utility model discloses sputtering cathode structure and coating equipment need not to dismantle target material or replace backboard, can change target base distance and sputtering angle through adjustment part, not only satisfy perovskite battery, semiconductor etc. Large -size base's even coating demand, also improved process debugging efficiency significantly.

Description

Technical Field

[0001] This utility model relates to the technical field of mechanical structures related to sputtering cathodes, and in particular to a sputtering cathode structure and coating equipment. Background Technology

[0002] Sputtering technology is a core process that uses ions to bombard the surface of a target material, causing the target atoms or molecules to escape and deposit onto a substrate to form a thin film. Sputtering technology's significant advantages in thin film quality, material adaptability, and process controllability have led to its widespread application in coating processes in high-end fields such as semiconductors, optical devices, and new energy (e.g., perovskite batteries). With the accelerating pace of industrialization and the continuous increase in device size, coating equipment is required to balance efficient production with high process quality.

[0003] However, existing sputtering technologies suffer from rigid target adjustment: large-size sputtering equipment generally employs a multi-cavity structure, resulting in heavy targets that are fixed and non-adjustable after installation. Adjusting the target-substrate distance (distance between the target and the substrate) requires disassembling the target and replacing the backplate thickness, which is cumbersome and only allows for minute adjustments at the original angle, severely limiting the scope for process optimization.

[0004] The utilization rate of sputtering targets in existing sputtering technologies is low: fixed installation results in a single sputtering area and target etching position, the utilization rate of rotating targets is 70%, while the utilization rate of planar targets is only about 30%, resulting in a significant waste of valuable target materials.

[0005] Furthermore, existing sputtering technologies lack sufficient process control capabilities: the target-substrate distance directly affects the uniformity of thin film deposition and the coating rate, and requires coordinated optimization with other process parameters (such as gas pressure and power). Existing large-scale equipment lacks in-situ adjustment methods, making it unable to flexibly respond to different process requirements, especially the challenge of uniform coating on large-size substrates.

[0006] To solve at least one of the above-mentioned technical problems, this utility model provides a sputtering cathode structure and a coating equipment. Utility Model Content

[0007] The purpose of this invention is to provide a sputtering cathode structure and a coating equipment that can change the target-substrate distance and sputtering angle through the adjustment part, without disassembling the target material or replacing the back plate, thus significantly improving the efficiency of process debugging.

[0008] The objective of this utility model is achieved through the following technical solution:

[0009] On the one hand, this utility model provides a sputtering cathode structure, including:

[0010] Mounting body, the mounting body being used to mount the target material;

[0011] A frame for mounting the mounting body;

[0012] Adjustment unit, the adjustment unit comprising:

[0013] An adjustment assembly, comprising a slide rail mechanism and a slider mechanism, wherein one side of the slide rail mechanism is slidably connected to the frame in a vertical direction, and one side of the slider mechanism is slidably connected to the other side of the slide rail mechanism in a horizontal direction;

[0014] A rotating assembly, the rotating assembly including a connecting rod, one end of the connecting rod being rotatably connected to the other side of the slider mechanism, and the other end of the connecting rod being connected to the mounting body.

[0015] The beneficial effects of the above solution are that this invention can change the target-base distance and sputtering angle through the adjustment part without disassembling the target or replacing the backplate, significantly improving process debugging efficiency. Specifically, this invention achieves horizontal and vertical position adjustment of the mounting body through a combination of a slide rail mechanism and a slider mechanism; this invention also allows the mounting body (target) to rotate at multiple angles through the rotation setting of the connecting rod, dynamically adjusting the sputtering area, improving target utilization, and avoiding localized over-etching.

[0016] Furthermore, the mounting body includes a first surface and a second surface disposed opposite to each other;

[0017] The connecting rod passes through the mounting body, with one end of the connecting rod located on the first surface and the other end of the connecting rod located on the second surface;

[0018] The slide rail mechanism includes a first slide rail and a second slide rail arranged opposite to each other, and the slider mechanism includes a first slider and a second slider arranged opposite to each other; one side of the first slider is slidably connected to the first slider in the horizontal direction, and the other side of the first slider is rotatably connected to one end of the connecting rod; one side of the second slider is slidably connected to the first slider in the horizontal direction, and the other side of the second slider is rotatably connected to the other end of the connecting rod.

[0019] The beneficial effects of the above solution are that, through the symmetrical arrangement of the first slide rail / second slide rail and the first slider / second slider, the force on the mounting body is distributed, preventing unilateral displacement and enhancing the stability of the structure. Furthermore, the connecting rod of this invention passes through the mounting body and is synchronously linked at both ends, ensuring the balance of the target material during rotation and further improving rotational accuracy.

[0020] Furthermore, the adjustment unit also includes:

[0021] Guide rail mechanism, the guide rail mechanism being connected to the frame;

[0022] A telescopic mechanism, one end of which is slidably connected to the guide rail mechanism in a horizontal direction, and the other end of which is rotatably connected to the mounting body.

[0023] The beneficial effect of the above solution is that the present invention further enhances the stability of the structure through the guide rail mechanism and the telescopic mechanism, which can be used for heavy target materials and avoid deformation or shaking caused by weight.

[0024] Furthermore, the mounting body includes a first surface and a third surface that are perpendicular to each other, the first surface being slidably connected to the adjusting component, and the third surface being rotatably connected to the telescopic mechanism.

[0025] The beneficial effects of the above solution are that, through multi-faceted collaborative fixing, this utility model avoids additional support structures, saves internal space in the vacuum chamber, and makes the space more compact. Furthermore, the vertical arrangement of the first and third surfaces allows for the distribution of the adjustment components and telescopic mechanism, thereby dispersing the forces on the installed body and enhancing structural stability.

[0026] Furthermore, the telescopic mechanism is configured to extend and retract along its own length.

[0027] The beneficial effects of the above solution are that this invention achieves control over the target-substrate distance in the vertical direction through fine adjustment of the telescopic rod length, thereby optimizing film thickness uniformity. Furthermore, this invention, through its telescopic design, is compatible with both small experimental equipment and large production line equipment.

[0028] Furthermore, the mounting body includes a third surface and a fourth surface disposed opposite to each other;

[0029] The frame includes a third side and a fourth side that are positioned opposite to each other;

[0030] The guide rail mechanism includes a first guide rail and a second guide rail, the first guide rail being connected to the third side of the frame and the second guide rail being connected to the fourth side of the frame;

[0031] The telescopic mechanism includes a first telescopic member and a second telescopic member; one end of the first telescopic member is slidably connected to the first guide rail in a horizontal direction, and the other end of the first telescopic member is rotatably connected to the third surface of the mounting body; one end of the second telescopic member is slidably connected to the second guide rail in a horizontal direction, and the other end of the second telescopic member is rotatably connected to the fourth surface of the mounting body.

[0032] The first telescopic member and / or the second telescopic member are configured to be length-adjustable and to be secured by a locking member after length adjustment and after sliding along the guide rail.

[0033] The beneficial effects of the above solution are that, through dual-sided synchronous adjustment, the stability of the structure is further enhanced, making it suitable for heavy targets and avoiding deformation or shaking caused by weight. The tilt angle can be adjusted through a rotating connection, expanding the etching area of ​​the target and improving target utilization. Furthermore, the sliding and locking mechanism of the telescopic component ensures stability in high vacuum environments and prevents process vibration deviation.

[0034] Furthermore, the first telescopic member and / or the second telescopic member includes: a rod body;

[0035] One end of the rod is provided with a first connector, which is rotatably connected to the third or fourth surface of the mounting body;

[0036] The other end of the rod is provided with a second connector, which can be slidably connected to the first guide rail or the second guide rail in the horizontal direction.

[0037] The beneficial effect of the above solution is that the modular design of the rod and connecting parts makes it easy to replace damaged parts.

[0038] Furthermore, the rod body includes: a first rod segment and a second rod segment;

[0039] One end of the first rod segment is provided with the first connecting part, and one end of the second rod segment is provided with the second connecting part;

[0040] The other end of the first rod segment overlaps with the other end of the second rod segment and is provided with a locking hole. The locking hole is provided with a first locking member that matches the locking hole.

[0041] The beneficial effect of the above solution is that, through the setting of overlapping rod segments and locking holes, the present invention achieves continuous length locking, further enhancing the stability of the structure.

[0042] Furthermore, the frame surrounds the periphery of the mounting body;

[0043] The mounting body is provided with a groove for mounting the target material.

[0044] The beneficial effect of the above solution is that, by setting grooves, this utility model can be compatible with targets of different shapes and sizes.

[0045] On the other hand, this utility model provides a coating device, comprising:

[0046] Vacuum cavity;

[0047] As described, in the sputtering cathode structure, the frame of the sputtering cathode structure is mounted on the inner wall of the vacuum cavity, and the sputtering surface of the target material on the mounting body of the sputtering cathode structure faces the central region of the vacuum cavity, so that the target material faces the substrate to be coated.

[0048] The beneficial effect of the above solution is that the coating equipment of this utility model can realize real-time adjustment of target distance / sputtering angle during the coating process through sputtering cathode structure, so as to meet the uniform coating requirements of large-size substrates such as perovskite batteries and semiconductors.

[0049] Compared with the prior art, the beneficial effects of this utility model include at least the following:

[0050] This invention enables the adjustment of the target-base distance and sputtering angle without disassembling the target or replacing the backplate, significantly improving process debugging efficiency. Specifically, this invention uses a combination of a slide rail mechanism and a slider mechanism to adjust the position of the mounting body in the horizontal and vertical directions; the rotating design of the connecting rod allows the mounting body (target) to rotate at multiple angles, dynamically adjusting the sputtering area, improving target utilization, and avoiding localized over-etching.

[0051] Furthermore, the coating equipment of this invention, through a sputtering cathode structure, enables real-time adjustment of the target-substrate distance / sputtering angle during the coating process, thereby meeting the uniform coating requirements of large-size substrates such as perovskite batteries and semiconductors. Attached Figure Description

[0052] Figure 1 This is a schematic diagram of a sputtering cathode structure according to an embodiment of the present invention.

[0053] Figure 2 This is a schematic diagram of a portion of the sputtering cathode structure according to an embodiment of the present invention.

[0054] Figure 3 This is a schematic diagram of the structure of the mounting body according to an embodiment of the present utility model.

[0055] Figure 4 This is a schematic diagram of the structure of a telescopic component according to an embodiment of the present utility model.

[0056] In the diagram: 1. Mounting body; 11. First side; 12. Second side; 13. Third side; 14. Fourth side; 15. Fifth side; 16. Sixth side; 17. Groove; 21. First side; 22. Second side; 23. Third side; 24. Fourth side; 25. Top surface; 26. Bottom surface; 3111. First slide rail; 3112. Second slide rail; 312. Slider mechanism; 3121. First slider; 3122. Second slider; 32. Rotating assembly; 321. Connecting rod; 331. First guide rail; 332. Second guide rail; 34. Telescopic mechanism; 341. First telescopic component; 342. Second telescopic component; 343. Rod body; 3431. First rod segment; 3432. Second rod segment; 344. First connecting component; 345. Second connecting component. Detailed Implementation

[0057] Exemplary embodiments will now be described more fully with reference to the accompanying drawings. However, these exemplary embodiments can be implemented in many forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided to make the present invention more comprehensive and complete, and to fully convey the concept of the exemplary embodiments to those skilled in the art. The same reference numerals in the drawings denote the same or similar structures, and therefore repeated descriptions of them will be omitted.

[0058] The terms used to describe position and direction in this utility model are illustrated with the accompanying drawings, but changes can be made as needed, and all such changes are included within the scope of protection of this utility model.

[0059] In the description of this utility model, it should be understood that the terms "center," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicating orientation or positional relationships based on the orientation or positional relationships shown in the accompanying drawings, are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, features defined with "first," "second," etc., may explicitly or implicitly include one or more of that feature. In the description of this utility model, unless otherwise stated, "a plurality of" means two or more.

[0060] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0061] In order to significantly improve process debugging efficiency by changing the target-substrate distance and sputtering angle solely through mechanical structure without disassembling the target or replacing the backplate, this utility model introduces a sputtering cathode structure and coating equipment.

[0062] The coating equipment of this utility model includes: a vacuum chamber and a sputtering cathode structure.

[0063] In application, the frame of the sputtering cathode structure is mounted on the inner wall of the vacuum chamber, and the sputtering surface of the target material on the mounting body 1 of the sputtering cathode structure faces the central area of ​​the vacuum chamber so that the target material faces the substrate to be coated.

[0064] In practical applications, the coating equipment of this invention, through its sputtering cathode structure, can assist in real-time adjustment of the target-substrate distance and sputtering angle during the coating process, thereby meeting the uniform coating requirements of large-size substrates such as perovskite batteries and semiconductors.

[0065] The sputtering cathode structure of this utility model includes: a mounting body 1, a frame, and an adjustment part.

[0066] The mounting body 1 of this utility model is used to mount a target material. Specifically, the mounting body 1 is provided with a groove 17, which is used to mount the target material and can accommodate targets of different shapes / sizes.

[0067] When applying, refer to Figure 3 The mounting body 1 of this utility model has a hexahedral structure, including a first face 11 and a second face 12 arranged opposite each other, a third face 13 and a fourth face 14 arranged opposite each other, and a fifth face 15 and a sixth face 16 arranged opposite each other. Among them, the first face 11 / second face 12, the third face 13 / fourth face 14, and the fifth face 15 / sixth face 16 are perpendicular to each other.

[0068] In practical applications, a groove 17 is provided on the fifth surface 15 / sixth surface 16. A dual target backplate is provided in the groove 17, and the potential of the two backplate areas is independently controllable, supporting alternating sputtering or co-sputtering modes.

[0069] The frame of this utility model is used to mount the mounting body 1. Specifically, the frame surrounds the periphery of the mounting body 1.

[0070] In application, the framework is a hexahedral framework. The hexahedral framework consists of 12 prisms: 4 lateral prisms, 4 top prisms, and 4 base prisms. (Reference) Figure 1 Twelve prisms form a first side surface 21 and a second side surface 22, a third side surface 23 and a fourth side surface 24, and a top surface 25 and a bottom surface 26, which are arranged opposite to each other. The first side surface 21 / second side surface 22, the third side surface 23 / fourth side surface 24, and the top surface 25 / bottom surface 26 are perpendicular to each other.

[0071] Preferably, the first side 21 and the first side 11 are arranged opposite to each other; the second side 22 and the second side 12 are arranged opposite to each other; the third side 23 and the third side 13 are arranged opposite to each other; the fourth side 24 and the fourth side 14 are arranged opposite to each other; the top surface 25 and the fifth surface 15 are arranged opposite to each other; and the bottom surface 26 and the sixth surface 16 are arranged opposite to each other.

[0072] The adjustment part of this utility model includes: an adjustment component and a rotation component 32. Furthermore, to further enhance the stability of the structure, enable the use of heavy-duty targets, and prevent deformation or swaying due to weight, the adjustment part of this utility model may also include: a guide rail mechanism and a telescopic mechanism 34.

[0073] The rotating component 32 of this utility model includes a connecting rod 321. The rotating configuration of the connecting rod 321 allows the target material of the mounting body 1 to rotate at multiple angles, dynamically adjust the sputtering area, improve the utilization rate of the target material, and avoid local over-etching.

[0074] In application, one end of the connecting rod 321 is rotatably connected to the other side of the slider mechanism 312, and the other end of the connecting rod 321 is connected to the mounting body 1.

[0075] In practical applications, the connecting rod 321 passes through the mounting body 1, with one end of the connecting rod 321 located on the first surface 11 and the other end of the connecting rod 321 located on the second surface 12.

[0076] In actual implementation, the connecting rod 321 is a magnetic fluid sealed hollow shaft. The internal structure of the connecting rod 321 integrates coolant pipes and brushes, enabling the mounting body 1 to rotate 360°.

[0077] When the number of adjustment components in this utility model is 1, the adjustment component is slidably connected to the first surface 11 / second surface 12 of the mounting body 1; when the number of adjustment components is 2, the two sets of adjustment components are slidably connected to the first surface 11 and the second surface 12 of the mounting body 1 respectively.

[0078] The adjustment component of this utility model includes a slide rail mechanism and a slider mechanism 312. By combining the slide rail mechanism and the slider mechanism 312, the position of the mounting body 1 in the horizontal and vertical directions can be adjusted.

[0079] In application, one side of the slide rail mechanism can be slidably connected to the frame in the vertical direction, and one side of the slider mechanism 312 can be slidably connected to the other side of the slide rail mechanism in the horizontal direction.

[0080] In practical applications, refer to Figure 1 and Figure 2 When the number of adjustment components is two, the slide rail mechanism includes a first slide rail 3111 and a second slide rail 3112 arranged opposite to each other. The first slide rail 3111 and the second slide rail 3112 are slidably connected to the frame in the vertical direction. The slider mechanism 312 includes a first slider 3121 and a second slider 3122 arranged opposite to each other. One side of the first slider 3121 is slidably connected to the first slide rail 3111 in the horizontal direction, and the other side of the first slider 3121 is rotatably connected to one end of the connecting rod 321. One side of the second slider 3122 is slidably connected to the second slide rail 3112 in the horizontal direction, and the other side of the second slider 3122 is rotatably connected to the other end of the connecting rod 321.

[0081] In practical implementation, this invention drives the connecting rod 321 to rotate clockwise or counterclockwise around an axis via a driving component, thereby causing the mounting body 1 to rotate clockwise or counterclockwise to adjust the sputtering angle, which can expand the target etching area and improve the target utilization rate. This invention also drives the slide rail mechanism to reciprocate along the Z-axis via a driving component, thereby causing the mounting body to reciprocate along the Z-axis to adjust the target-base distance. Furthermore, this invention drives the slider mechanism 312 to reciprocate along the X / Y axes via a driving component, thereby causing the mounting body to reciprocate along the X / Y axes to adjust the target-base distance. The driving component can be a motor or a hydraulic cylinder.

[0082] The guide rail mechanism connecting frame of this utility model has a telescopic mechanism 34, one end of which is slidably connected to the guide rail mechanism in the horizontal direction, and the other end of the telescopic mechanism 34 is rotatably connected to the mounting body 1. When there is one guide rail mechanism and one telescopic mechanism 34, the telescopic mechanism 34 is rotatably connected to the third surface 13 / fourth surface 14 of the mounting body 1; when there are two guide rail mechanisms and two telescopic mechanisms 34, the two sets of telescopic mechanisms 34 are rotatably connected to the third surface 13 and the fourth surface 14 of the mounting body 1, respectively.

[0083] In application, to control the target-base distance in the vertical direction and optimize film thickness uniformity, the telescopic mechanism 34 of this invention is configured to extend and retract along its own length. To further enhance structural stability, accommodate heavy targets, and prevent deformation or swaying due to weight, the number of guide rail mechanisms and telescopic mechanisms 34 in this invention is two, enabling simultaneous adjustment of the mounting body 1 from both sides. Specifically, the guide rail mechanism of this invention includes a first guide rail 331 and a second guide rail 332, and the telescopic mechanism 34 includes a first telescopic member 341 and a second telescopic member 342. The first telescopic member 341 and the second telescopic member 342 are configured to be length-adjustable and to be secured by locking members after length adjustment and sliding along the guide rails.

[0084] Furthermore, one end of the first telescopic member 341 of this utility model can be slidably connected to the first guide rail 331 in the horizontal direction, the first guide rail 331 is connected to the third side 23 of the frame, and the other end of the first telescopic member 341 is rotatably connected to the third side 13 of the mounting body 1; one end of the second telescopic member 342 can be slidably connected to the second guide rail 332 in the horizontal direction, the second guide rail 332 is connected to the fourth side 24 of the frame, and the other end of the second telescopic member 342 is rotatably connected to the fourth side 14 of the mounting body 1.

[0085] Preferably, in order to further enhance the stability of the structure, the number of guide rail mechanism and telescopic mechanism 34 of this utility model is 4. Two sets of telescopic mechanisms 34 are rotatably connected to the third surface 13 of the mounting body 1, and the other two sets of telescopic mechanisms 34 are rotatably connected to the fourth surface 14 of the mounting body 1. The four sets of telescopic mechanisms 34 can be slidably connected to a corresponding guide rail mechanism in the horizontal direction.

[0086] In practical applications, to facilitate the replacement of damaged parts of the telescopic components, refer to... Figure 4 The first telescopic member 341 and / or the second telescopic member 342 of this utility model include: a rod body 343, a first connecting member 344, and a second connecting member 345. Further, the telescopic member of this utility model may also include a first locking member and a second locking member. Specifically, one end of the rod body 343 is provided with a first connecting member 344, which is rotatably connected to the third surface 13 or the fourth surface 14 of the mounting body 1; the other end of the rod body 343 is provided with a second connecting member 345, which is slidably connected to the first guide rail 331 or the second guide rail 332 in the horizontal direction.

[0087] Furthermore, to achieve continuous length locking and further enhance structural stability, the rod 343 of this invention includes a first rod segment 3431 and a second rod segment 3432. One end of the first rod segment 3431 has a first connecting portion, and one end of the second rod segment 3432 has a second connecting portion. The other ends of the first rod segment 3431 and the second rod segment 3432 overlap, meaning the second rod segment 3432 can be slidably fitted inside or outside the first rod segment 3431, making the total length of the rod 343 adjustable. In addition, a locking hole is provided on the overlapping structure of the first rod segment 3431 and the second rod segment 3432, and a first locking member matching the locking hole is provided on the locking hole. After the second connecting portion slides along the first guide rail 331 or the second guide rail 332 to the target position, the second locking member secures the second connecting portion to the guide rail. The first locking member passes through the locking hole and is used to fasten the first rod segment 3431 and the second rod segment 3432 to each other in the tightened state, and to allow the first rod segment 3431 and the second rod segment 3432 to move relative to each other in the loosened state to adjust the total length of the rod body 343.

[0088] In actual operation, this invention uses a driving component to drive the telescopic component to extend and retract, causing the mounting body 1 to reciprocate along the Z-axis to adjust the target-base distance. This invention also uses a driving component to drive the telescopic component to reciprocate along the X / Y axes, causing the mounting body to reciprocate along the X / Y axes to adjust the target-base distance. Furthermore, this invention uses a driving component to drive the mounting body 1 to rotate clockwise or counterclockwise, causing the telescopic rod to rotate around the first connecting member 344, thus adjusting the sputtering angle. The driving component can be a motor or a hydraulic cylinder.

[0089] In summary, the sputtering cathode structure of this invention features a simple overall structure, low processing and installation costs, and intuitive and convenient operation. By adjusting the sputtering cathode structure, the target-substrate distance can be adjusted in situ, significantly improving film uniformity and deposition rate. Simultaneously, it can be coordinated with other process parameters (such as gas pressure and power) to optimize deposition quality and meet diverse experimental needs. Furthermore, by flexibly adjusting the target angle and position, the sputtering area and etching position can be dynamically changed, significantly improving the utilization rate of planar targets (e.g., from 30% to over 70%) and supporting uniform deposition of low-energy particles (e.g., tilted sputtering), avoiding bombardment damage to special films such as perovskite. The sputtering cathode structure of this invention is not limited to equipment size and can be adapted to deposition cavities of different specifications. Moreover, the backplate can be configured with dual mounting positions, such as two grooves 17, supporting the simultaneous installation of the same or different targets (e.g., metal and ceramic targets), enabling multi-material co-sputtering reactions.

[0090] Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention. Those skilled in the art can make changes, modifications, substitutions and alterations to the above embodiments within the scope of the present invention without departing from the principles and spirit of the present invention, and all such changes should fall within the protection scope of the claims of the present invention.

Claims

1. A sputtering cathode structure, characterized in that, include: Mounting body (1), the mounting body (1) is used to mount the target material; A frame for mounting the mounting body (1). Adjustment unit, the adjustment unit comprising: An adjustment assembly, comprising a slide rail mechanism and a slider mechanism (312), wherein one side of the slide rail mechanism is slidably connected to the frame in a vertical direction, and one side of the slider mechanism (312) is slidably connected to the other side of the slide rail mechanism in a horizontal direction; Rotating assembly (32), the rotating assembly (32) includes a connecting rod (321), one end of the connecting rod (321) is rotatably connected to the other side of the slider mechanism (312), and the other end of the connecting rod (321) is connected to the mounting body (1).

2. The sputtering cathode structure according to claim 1, characterized in that, The mounting body (1) includes a first surface (11) and a second surface (12) disposed opposite to each other; The connecting rod (321) passes through the mounting body (1), with one end of the connecting rod (321) located on the first surface (11) and the other end of the connecting rod (321) located on the second surface (12). The slide rail mechanism includes a first slide rail (3111) and a second slide rail (3112) arranged opposite to each other. The slider mechanism (312) includes a first slider (3121) and a second slider (3122) arranged opposite to each other. One side of the first slider (3121) is slidably connected to the first slider (3121) in the horizontal direction, and the other side of the first slider (3121) is rotatably connected to one end of the connecting rod (321). One side of the second slider (3122) is slidably connected to the first slider (3121) in the horizontal direction, and the other side of the second slider (3122) is rotatably connected to the other end of the connecting rod (321).

3. The sputtering cathode structure according to claim 1, characterized in that, The adjustment unit further includes: Guide rail mechanism, the guide rail mechanism being connected to the frame; Telescopic mechanism (34), one end of which is slidably connected to the guide rail mechanism in the horizontal direction, and the other end of which is rotatably connected to the mounting body (1).

4. The sputtering cathode structure according to claim 3, characterized in that, The mounting body (1) includes a first surface (11) and a third surface (13) that are perpendicular to each other. The first surface (11) is slidably connected to the adjustment component, and the third surface (13) is rotatably connected to the telescopic mechanism (34).

5. The sputtering cathode structure according to claim 3, characterized in that, The telescopic mechanism (34) is configured to extend and retract along its own length.

6. The sputtering cathode structure according to claim 3, characterized in that, The mounting body (1) includes a third surface (13) and a fourth surface (14) arranged opposite to each other. The frame includes a third side (23) and a fourth side (24) that are positioned opposite each other; The guide rail mechanism includes a first guide rail (331) and a second guide rail (332), the first guide rail (331) is connected to the third side (23) of the frame, and the second guide rail (332) is connected to the fourth side (24) of the frame. The telescopic mechanism (34) includes a first telescopic member (341) and a second telescopic member (342); one end of the first telescopic member (341) is slidably connected to the first guide rail (331) in the horizontal direction, and the other end of the first telescopic member (341) is rotatably connected to the third surface (13) of the mounting body (1); one end of the second telescopic member (342) is slidably connected to the second guide rail (332) in the horizontal direction, and the other end of the second telescopic member (342) is rotatably connected to the fourth surface (14) of the mounting body (1).

7. The sputtering cathode structure according to claim 6, characterized in that, The first telescopic member (341) and / or the second telescopic member (342) include: a rod (343); One end of the rod (343) is provided with a first connector (344), which is rotatably connected to the third surface (13) or the fourth surface (14) of the mounting body (1). The other end of the rod (343) is provided with a second connector (345), which can be slidably connected to the first guide rail (331) or the second guide rail (332) in the horizontal direction.

8. The sputtering cathode structure according to claim 7, characterized in that, The rod (343) includes: a first rod segment (3431) and a second rod segment (3432); One end of the first rod segment (3431) is provided with a first connecting part, and one end of the second rod segment (3432) is provided with a second connecting part; The other end of the first rod segment (3431) overlaps with the other end of the second rod segment (3432) and is provided with a locking hole. The locking hole is provided with a first locking member that matches the locking hole.

9. The sputtering cathode structure according to claim 1, characterized in that, The frame surrounds the periphery of the mounting body (1); The mounting body (1) is provided with a groove (17) for mounting the target material.

10. A coating apparatus, characterized in that, include: Vacuum cavity; According to any one of claims 1 to 9, the sputtering cathode structure is mounted on the inner wall of the vacuum cavity, and the sputtering surface of the target material on the mounting body (1) of the sputtering cathode structure faces the central region of the vacuum cavity, so that the target material faces the substrate to be coated.

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