Anti-vibration foundation for a photolithography machine

Abstract

The utility model provides a kind of anti-seismic foundation for photoetching machine, it is related to photoetching machine foundation technical field, including upper structure, the upper structure includes upper plate, the bottom of the upper plate is fixedly connected with first structure plate, the inner chamber of the first structure plate is poured with concrete, the bottom of the first structure plate is provided with lower structure, and the lower structure includes middle plate, and the bottom of the middle plate is fixedly connected with second structure plate.The utility model, by the combination design of upper structure and lower structure, can effectively improve the overall anti-seismic performance of foundation, the upper plate is directly loaded as the component of photoetching machine, the first structure plate inner chamber of its bottom pours concrete, can enhance the stability and bearing capacity of upper structure, the middle plate in lower structure connects first structure plate and second structure plate, forms transition support, and second structure plate and bottom plate cooperate base foot, and the overall weight is dispersed and transmitted to ground, reduces single-point stress.

Description

Technical Field

[0001] This utility model relates to the field of lithography machine foundation technology, and in particular to an earthquake-resistant foundation for lithography machines. Background Technology

[0002] In semiconductor manufacturing, lithography machines are core equipment, requiring nanometer-level precision and are extremely sensitive to external vibrations. Current lithography machine foundations often employ single-layer concrete structures or simple steel supports, resulting in insufficient seismic resistance. Traditional foundations lack specific designs for micro-vibrations and cannot effectively filter low-frequency vibrations, easily leading to lens focusing deviations and wafer exposure position shifts, affecting product yield. Some foundations use single-layer structures, which are prone to deformation after long-term use due to concrete aging and steel fatigue. Furthermore, the lack of effective stress dispersion mechanisms means that localized stress concentration can easily cause foundation cracking. Utility Model Content

[0003] The purpose of this invention is to address the shortcomings of existing technologies, such as insufficient seismic resistance and inadequate stability, and to provide a seismic-resistant foundation for lithography machines.

[0004] To achieve the above objectives, the present invention adopts the following technical solution: an earthquake-resistant foundation for a lithography machine, comprising an upper structure, the upper structure comprising an upper plate, a first structural plate fixedly connected to the bottom of the upper plate, the inner cavity of the first structural plate being filled with concrete, a lower structure being provided at the bottom of the first structural plate, the lower structure comprising an intermediate plate, and a second structural plate fixedly connected to the bottom of the intermediate plate.

[0005] In a preferred embodiment, the top of the intermediate plate is fixedly connected to the bottom of the first structural plate.

[0006] In a preferred embodiment, the first structural plate and the second structural plate have the same inner cavity shape, and the inner cavity shape is symmetrical.

[0007] In a preferred embodiment, the outer surfaces of both the upper and lower structures are fixedly surrounded by steel plates.

[0008] In a preferred embodiment, the steel plate of the lower structure has lifting eyelet holes.

[0009] In a preferred embodiment, a base plate is fixedly connected to the bottom of the second structural plate.

[0010] In a preferred embodiment, the bottom of the base plate is fixedly connected to a base support.

[0011] In a preferred embodiment, the base has six legs.

[0012] Compared with the prior art, the advantages and positive effects of this utility model are as follows:

[0013] This invention, through the combined design of the upper and lower structures, effectively improves the overall seismic performance of the foundation. The upper plate, as the component that directly supports the lithography machine, has its bottom first structural plate cavity filled with concrete, which enhances the stability and load-bearing capacity of the upper structure. The middle plate in the lower structure connects the first and second structural plates, forming a transition support. The second structural plate, together with the bottom plate and the base legs, distributes the overall weight to the ground, reducing single-point stress. At the same time, the steel plates surrounding the outer surfaces of the upper and lower structures further improve the integrity and deformation resistance of the structure. The setting of six base legs increases the contact stability between the foundation and the ground. The symmetrical inner cavity shape helps the concrete to be evenly stressed, avoiding stress concentration. The design of the lifting ring holes facilitates the hoisting operation of the foundation during installation or maintenance. The overall structural layout is reasonable, providing a stable and reliable seismic foundation for the lithography machine. Attached Figure Description

[0014] Figure 1 This utility model provides a structural schematic diagram of an earthquake-resistant foundation for a lithography machine.

[0015] Figure 2 This is a cross-sectional structural diagram of an earthquake-resistant foundation for a lithography machine provided by this utility model.

[0016] Figure 3 This is a schematic diagram of the superstructure of an earthquake-resistant foundation for a lithography machine, provided by this utility model.

[0017] Figure 4 This is an exploded view of the structure of an earthquake-resistant foundation for a lithography machine, provided by this utility model.

[0018] Legend:

[0019] 1. Upper structure; 2. Lower structure;

[0020] 1. Superstructure; 11. Upper slab; 12. First structural slab; 13. Concrete;

[0021] 2. Lower structure; 21. Middle plate; 22. Second structural plate; 23. Base plate; 24. Base support. Detailed Implementation

[0022] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0023] Example

[0024] like Figure 1-4 As shown, this utility model provides a technical solution: an earthquake-resistant foundation for a lithography machine, including an upper structure 1, the upper structure 1 including an upper plate 11, a first structural plate 12 fixedly connected to the bottom of the upper plate 11, concrete 13 poured into the inner cavity of the first structural plate 12, a lower structure 2 provided at the bottom of the first structural plate 12, the lower structure 2 including an intermediate plate 21, a second structural plate 22 fixedly connected to the bottom of the intermediate plate 21, a bottom plate 23 fixedly connected to the bottom of the second structural plate 22, a base support 24 fixedly connected to the bottom of the bottom plate 23, the top of the intermediate plate 21 fixedly connected to the bottom of the first structural plate 12, the inner cavity shapes of the first structural plate 12 and the second structural plate 22 are the same and symmetrical, six base supports 24 are provided, the outer surfaces of the upper structure 1 and the lower structure 2 are both fixedly surrounded by steel plates, and the steel plate of the lower structure 2 has lifting eye holes.

[0025] In this embodiment, the upper plate 11 directly supports the lithography machine and ensures a tight fit between the equipment and the foundation to avoid additional vibrations caused by gaps in the contact surface. The first structural plate 12, with its hollow and symmetrical structure, achieves uniform stress transmission and provides space for the pouring of concrete 13, thus balancing the lightweight and rigidity of the overall structure. The concrete 13 enhances the crack resistance and rigidity of the upper structure 1, initially filtering the high-frequency vibrations generated by the lithography machine itself. The middle plate 21 connects the upper and lower structures, eliminating connection gaps and facilitating subsequent disassembly and adjustment. The second structural plate 22, with its hollow structure and inner wall design, further reduces weight and absorbs lateral vibrations. The bottom plate 23 disperses the force transmitted by the base support legs 24 to prevent local ground settlement and ensure precise positioning of the support legs. The outer steel plate protects the internal structure, providing rust and dust protection while enhancing overall torsional rigidity. The lifting eye holes facilitate foundation hoisting and transportation, preventing structural deformation during installation.

[0026] Working principle:

[0027] like Figure 1-4As shown, when the ground or external environment vibrates, the vibration is first transmitted to the polyurethane vibration damping pad at the bottom of the base support 24. The vibration damping pad absorbs most of the vertical vibration energy through its own elastic deformation. After the remaining vibration is transmitted to the lower structure 2, the hollow frame of the second structural plate 22 and the inner wall rubber pad further filter the lateral vibration. When it is finally transmitted to the upper structure 1, the concrete 13 in the inner cavity of the first structural plate 12 controls the residual vibration within the range that the lithography machine can withstand through its own high rigidity characteristics, thus achieving the anti-vibration effect of multi-layer filtration and gradual attenuation.

[0028] The above description is merely a preferred embodiment of the present utility model and is not intended to limit the present utility model in any other way. Any person skilled in the art may make changes or modifications to the above-disclosed technical content to create equivalent embodiments for application in other fields. However, any simple modifications, equivalent changes, and modifications made to the above embodiments based on the technical essence of the present utility model without departing from the technical solution of the present utility model shall still fall within the protection scope of the technical solution of the present utility model.

Claims

1. A seismic-resistant foundation for a lithography machine, comprising a superstructure (1), characterized in that: The upper structure (1) includes an upper plate (11), the bottom of which is fixedly connected to a first structural plate (12), the inner cavity of which is filled with concrete (13), and the bottom of which is provided with a lower structure (2), the lower structure (2) includes an intermediate plate (21), the bottom of which is fixedly connected to a second structural plate (22).

2. The earthquake-resistant foundation for a lithography machine according to claim 1, characterized in that: The top of the intermediate plate (21) is fixedly connected to the bottom of the first structural plate (12).

3. The earthquake-resistant foundation for a lithography machine according to claim 1, characterized in that: The first structural plate (12) and the second structural plate (22) have the same inner cavity shape, and the inner cavity shape is a symmetrical structure.

4. The earthquake-resistant foundation for a lithography machine according to claim 1, characterized in that: The outer surfaces of both the upper structure (1) and the lower structure (2) are fixedly surrounded by steel plates.

5. The earthquake-resistant foundation for a lithography machine according to claim 1, characterized in that: The steel plate of the lower structure (2) has lifting eye holes.

6. The earthquake-resistant foundation for a lithography machine according to claim 1, characterized in that: The bottom of the second structural plate (22) is fixedly connected to a base plate (23).

7. The earthquake-resistant foundation for a lithography machine according to claim 6, characterized in that: The bottom of the base plate (23) is fixedly connected to the base support leg (24).

8. The earthquake-resistant foundation for a lithography machine according to claim 7, characterized in that: The base support (24) has six legs.

Images