A lithography mask measurement device

CN224873034UActive Publication Date: 2026-10-20EXCELL PHOTOELECTRIC CO LTD
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Patent Information

Application Number
CN202522638108.X
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-12-12
Publication Date
2026-10-20
Estimated Expiration
2035-12-12

AI Technical Summary

Technical Problem

[0004]但是,该装置在使用过程中,将掩膜版四周固定在大理石平台上,掩膜板底部与大理石平台贴合,设备或者手指难以伸入掩模版下方,不方便将掩膜版取下

Benefits of technology

(1)本实用新型通过设置机台、台面、玻璃平台,以及包括安装腔、电动推杆、支撑板的两个升降组件,利用电动推杆驱使支撑板升高,将掩模版举升,增大其与台面的距离,能够方便将掩模版从台面上取下;

✦ Generated by Eureka AI based on patent content.

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    Figure CN224873034U_ABST
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Abstract

The utility model discloses a photolithography mask plate measuring device. Photolithography mask plate measuring device, include: machine table and install the mesa on machine table, the mesa middle part is provided with glass platform, be provided with at least one lifting assembly on the machine table, the lifting assembly includes the drive part fixed in the machine table and the support plate that drives by drive part and carries out the lifting movement, the support plate has first state and second state, when first state, the top surface of support plate is no higher than the top surface of mesa, when second state, the utility model provides photolithography mask plate measuring device through setting machine table, mesa, glass platform and including installation cavity, electric push rod, two lifting assemblies of support plate, utilize electric push rod and drive support plate to elevate, lift the mask plate, increase its distance with mesa, can conveniently take down mask plate from mesa.
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Description

Technical Field

[0001] This utility model relates to the field of photomask technology, and in particular to a photolithography photomask measuring device. Background Technology

[0002] A photomask is a pattern transfer tool or master used in microelectronics manufacturing, playing a crucial role in the production of flat panel displays, semiconductors, touchscreens, and circuit boards. As a highly precise, customized product, it requires rigorous precision testing after manufacturing to verify its consistency with design requirements. Photomasks are typically large in size and weight, ranging from 30kg to 120kg, and possess numerous characteristics, necessitating the use of backlighting measurement methods for inspection.

[0003] The VIEWMAX L long-stroke imaging system from Siri features a marble frame around the platform and a glass platform in the center. This allows the product to be fixed on the marble platform, eliminating the deformation issues that occur when placing the product on a glass platform and ensuring measurement accuracy. Furthermore, the VIEWMAX L imaging system uses the professional PTB-certified measurement software PC-DMIS VISION, which can cycle through arrays of similar detection feature elements at the same intervals, solving the time-consuming problem of programming large batches of identical elements.

[0004] However, during use, the mask is fixed to the marble platform around its perimeter, with the bottom of the mask adhering to the marble platform. This makes it difficult for the device or fingers to reach under the mask, making it inconvenient to remove the mask.

[0005] Therefore, it is necessary to provide a photomask measuring device to solve the above-mentioned technical problems. Utility Model Content

[0006] In view of the above situation and to overcome the defects of the existing technology, this utility model provides a photolithography mask measuring device that can easily remove the mask.

[0007] To achieve the above objectives, the technical solution adopted by this utility model is as follows: A photomask measuring apparatus includes: a machine base and a table mounted on the machine base, a glass platform disposed in the center of the table, and at least one lifting assembly disposed on the machine base; the lifting assembly includes a drive component fixed inside the machine base and a support plate driven by the drive component to perform lifting movements; the support plate has a first state and a second state; in the first state, the top surface of the support plate is not higher than the top surface of the table; in the second state, the top surface of the support plate protrudes from the top surface of the table for lifting the photomask.

[0008] Preferably, there are two lifting components, which are symmetrically arranged on both sides of the glass platform.

[0009] Preferably, the machine tool has an installation cavity, and the driving component is an electric push rod fixedly installed at the bottom of the installation cavity. The output end of the electric push rod is fixedly connected to the bottom of the support plate.

[0010] Preferably, a vertically extending groove is provided on the side wall of the mounting cavity, and a guide plate is fixedly connected to the bottom of the support plate. The guide plate is provided with a connecting part that extends into the groove and can slide along it.

[0011] Preferably, an anti-slip plate is detachably mounted on the top of the support plate.

[0012] Preferably, the top surface of the anti-slip plate is provided with a latex layer.

[0013] Preferably, the top of the support plate is provided with a plug hole, and the bottom of the anti-slip plate is fixedly installed with a plug that matches the plug hole.

[0014] Preferably, a sealing ring is provided on the connector, and when the connector is inserted into the socket, the sealing ring is pressed between the connector and the wall of the socket.

[0015] Compared with the prior art, the present invention has the following beneficial effects: (1) This utility model sets up a machine base, a table, a glass platform, and two lifting components including an installation cavity, an electric push rod, and a support plate. The electric push rod drives the support plate to rise, thereby lifting the mask plate and increasing its distance from the table, making it easy to remove the mask plate from the table. (2) By setting a sliding groove and a guide plate, this utility model can improve the stability of the support plate and limit the stroke of the support plate; (3) This utility model can improve the safety of the device by installing a detachable anti-slip plate on the top of the support plate; (4) By providing a plug-in hole and a plug-in connector, the anti-slip plate can be plugged into the support plate, making it easy to replace the anti-slip plate; (5) By embedding a sealing ring on the connector, this utility model can improve the connection stability between the anti-slip plate and the support plate. Attached Figure Description

[0016] Figure 1 A schematic diagram of the photolithography mask measuring device provided by this utility model; Figure 2 This is a schematic diagram of the installation structure of the lifting assembly; Figure 3 This is a schematic diagram of the mounting cavity structure; Figure 4 This is a structural schematic diagram of the support plate; Figure 5 This is a schematic diagram of the connection structure between the support plate and the anti-slip plate.

[0017] The corresponding names of the attached figures are: 1-Machine platform, 2-Tabletop, 3-Glass platform, 4-Lifting assembly, 5-Mounting cavity, 6-Electric push rod, 7-Support plate, 8-Slide groove, 9-Guide plate, 10-Connecting part, 11-Anti-slip plate, 12-Insertion hole, 13-Insertion connector, 14-Sealing ring. Detailed Implementation

[0018] The present invention will be further described below with reference to the accompanying drawings and embodiments. The embodiments of the present invention include, but are not limited to, the following embodiments.

[0019] Example 1: like Figure 1-5 As shown, the photolithography mask measuring device provided by this utility model includes: a machine base 1, a marble table 2 mounted on the machine base 1, a glass platform 3 mounted in the middle of the table 2, and other structures on the machine base 1 that enable the inspection of the mask placed on the glass platform 3. For details, please refer to the structural design of the VIEWMAX L large-stroke imager, which will not be elaborated here. To facilitate the removal of the large-sized mask placed on the table 2, two lifting components 4 are installed on the machine base 2. The two lifting components 4 are symmetrically arranged on both sides of the glass platform 3, working together to lift the mask, increasing the distance between the mask and the top of the table 2, making it easier to reach tools or hands under the mask to remove it. Specifically, the lifting assembly 4 includes a mounting cavity 5 located within the machine base 1. An inspection door is installed on the side of the mounting cavity 5. An electric push rod 6 is fixedly installed inside the mounting cavity 5. The control end of the electric push rod 6 is installed on the side of the machine base 1. The control end controls the extension and retraction of two electric push rods 6. The two electric push rods 6 are of the same model and controlled by the same control circuit, thus ensuring their synchronization. A support plate 7 is fixedly installed at the output end of the electric push rod 6. During the mask inspection process, the electric push rod 6 retracts the support plate 7 into the mounting cavity 5, meaning the support plate 7 does not contact the mask, preventing unevenness of the mask and inaccurate inspection results. After inspection, the electric push rod 6 is activated, extending its output shaft and raising the support plate 7. The support plate 7 rises out of the mounting cavity 5, lifting the mask on the table 2, increasing the distance between it and the table 2, making it easier to remove the mask from the table 2.

[0020] By setting up a machine base 1, a table 2, a glass platform 3, and two lifting components 4 including an installation cavity 5, an electric push rod 6, and a support plate 7, the support plate 7 is raised by using the electric push rod 6 to lift the mask plate, increasing its distance from the table 2, so that the mask plate can be easily removed from the table 2.

[0021] Example 2: like Figure 3-4As shown, a groove 8 is opened on the side of the mounting cavity 5, and two L-shaped guide plates 9 are installed at the bottom of the support plate 7. A connecting part 10 is provided at the bottom of the guide plate 9. The connecting part 10 is inserted into the groove 8 and slides along the groove 8. Therefore, the support plate 7 can be prevented from deflecting, making its lifting and lowering more stable, and the stroke of the support plate 7 can be limited.

[0022] By setting the slide groove 8 and the guide plate 9, the stability of the support plate 7 can be improved, and the travel of the support plate 7 can be limited.

[0023] Example 3: like Figure 4 As shown, a detachable anti-slip plate 11 is installed on the top of the support plate 7. The top of the anti-slip plate 11 is provided with a latex layer, which makes it difficult for the mask to slide when it comes into contact with the mask. When the anti-slip plate 11 is worn out and needs to be replaced, it can also be disassembled and replaced, which is convenient for maintenance.

[0024] By installing a removable anti-slip plate 11 on top of the support plate 7, the safety of the device can be improved.

[0025] Example 4: like Figure 5 As shown, in this embodiment, a plug hole 12 is opened on the top of the support plate 7, and a plug connector 13 is installed on the bottom of the anti-slip plate 11. The plug connector 13 is inserted into the plug hole 12 to connect the anti-slip plate 11 to the support plate 7. With this connection method, the anti-slip plate 11 can be easily replaced.

[0026] By setting the insertion hole 12 and the insertion connector 13, the anti-slip plate 11 can be inserted into the support plate 7, making it easy to replace the anti-slip plate 11.

[0027] Example 5: like Figure 5 As shown, a sealing ring 14 is embedded in the connector 13. The sealing ring 14 is fitted into the annular groove on the connector 13. When the connector 13 is inserted into the insertion hole 12, the sealing ring 14 is squeezed, which increases the resistance between the connector 13 and the insertion hole 12, thereby improving the connection stability between the anti-slip plate 11 and the support plate 7.

[0028] By embedding a sealing ring 14 into the connector 13, the connection stability between the anti-slip plate 11 and the support plate 7 can be improved.

[0029] Working principle: During the mask inspection process, the electric push rod 6 retracts the support plate 7 into the mounting cavity 5, ensuring that the support plate 7 does not contact the mask and preventing unevenness that could lead to inaccurate inspection results. After inspection, the electric push rod 6 is activated, extending its output shaft and raising the support plate 7 from the mounting cavity 5. This lifts the mask on the table 2, increasing the distance between it and the table 2, making it easier to remove the mask from the table 2.

Claims

1. A photomask measuring device, comprising a machine base (1) and a table (2) mounted on the machine base (1), wherein a glass platform (3) is provided in the middle of the table (2), characterized in that: At least one lifting component (4) is provided on the machine base (1); The lifting assembly (4) includes a drive unit fixed inside the machine base (1) and a support plate (7) driven by the drive unit to perform lifting movements. The support plate (7) has a first state and a second state; In the first state, the top surface of the support plate (7) is not higher than the top surface of the table (2); In the second state, the top surface of the support plate (7) protrudes from the top surface of the platform (2) to lift the mask plate.

2. The photomask measuring device according to claim 1, characterized in that, The number of lifting components (4) is two, and they are symmetrically arranged on both sides of the glass platform (3).

3. The photomask measuring device according to claim 1, characterized in that, The machine base (1) has an installation cavity (5) and the driving component is an electric push rod (6) fixedly installed at the bottom of the installation cavity (5). The output end of the electric push rod (6) is fixedly connected to the bottom of the support plate (7).

4. The photomask measuring device according to claim 3, characterized in that, The mounting cavity (5) has a vertically extending groove (8) on its side wall. The bottom of the support plate (7) is fixedly connected to a guide plate (9). The guide plate (9) has a connecting part (10) that extends into the groove (8) and can slide along it.

5. The photomask measuring device according to claim 1, characterized in that, The top of the support plate (7) is detachably fitted with an anti-slip plate (11).

6. The photomask measuring device according to claim 5, characterized in that, The top surface of the anti-slip plate (11) is provided with a latex layer.

7. The photomask measuring device according to claim 5, characterized in that, The top of the support plate (7) is provided with a plug hole (12), and the bottom of the anti-slip plate (11) is fixedly installed with a plug connector (13) that is compatible with the plug hole (12).

8. The photomask measuring device according to claim 7, characterized in that, A sealing ring (14) is fitted on the plug (13). When the plug (13) is inserted into the plug hole (12), the sealing ring (14) is pressed between the plug (13) and the hole wall of the plug hole (12).