Radio frequency feed-in assembly and semiconductor process apparatus

Abstract

The application provides a radio frequency feeding assembly and a semiconductor process equipment, which comprises a support provided with a mounting hole; a plug used for plugging with a feeding electrode and comprising a connecting part and a plug part, the connecting part is arranged in the mounting hole, one end of the connecting part is connected with the plug part located at a first side of the support, and the other end of the connecting part is used for being connected with a radio frequency receiving member located at a second side of the support; and a plug sleeve comprising an insulating support and an insulating sleeve structure, wherein the insulating support is arranged at the first side of the support and located between the support and the plug part, and is used for supporting the plug part; the insulating support is provided with a avoiding part for the connecting part to pass through; and the insulating sleeve structure is sleeved around the plug part and completely covers the outer peripheral surface of the plug part. The application can reduce the risk of sparking, so as to ensure the stability and consistency of the machine and process results.

Description

Technical Field

[0001] This application relates to the field of semiconductor manufacturing, and more specifically, to a radio frequency feed component and semiconductor process equipment. Background Technology

[0002] Currently, dry etching equipment based on inductively coupled plasma (ICP) technology plays an irreplaceable role in deep silicon etching. Compared to traditional capacitively coupled plasma (CCP) etching machines, ICP etching machines can independently control plasma density and ion energy. Its dual-RF system architecture enables the equipment to maintain high-density plasma even under low ion energy conditions. This characteristic allows for dual optimization of etching rate and selectivity in the etching of hard materials such as silicon and metals.

[0003] The principle of plasma generation in an ICP etching machine is as follows: radio frequency power is applied to the coil through the radio frequency feed post, and the alternating electromagnetic field generated by the coil excites the gas in the reaction chamber to dissociate into plasma. When maintaining the etching machine, the radio frequency feed post is usually separated from the coil plug, and after maintenance, the radio frequency feed post is reinserted into the coil plug.

[0004] However, the existing structural design for connecting the RF feed post to the coil plug is unreasonable and can easily lead to arcing, affecting the stability and consistency of the equipment and process results. Utility Model Content

[0005] This application aims to solve at least one of the technical problems existing in the prior art, and proposes a radio frequency feed component and semiconductor process equipment.

[0006] To achieve the purpose of this application, an RF feed-in component is provided, comprising:

[0007] The bracket is equipped with mounting holes;

[0008] A plug for insertion with a feed electrode, comprising a connecting portion and a plug portion, the connecting portion passing through the mounting hole, one end of the connecting portion being connected to the plug portion located on a first side of the bracket, and the other end of the connecting portion being used to connect to an RF receiver located on a second side of the bracket; and

[0009] A plug sleeve includes an insulating support and an insulating sleeve structure, wherein the insulating support is disposed on a first side of the bracket and located between the bracket and the plug portion, for supporting the plug portion; the insulating support is provided with a clearance portion for the connecting portion to pass through;

[0010] The insulating sleeve structure is fitted around the plug portion and completely covers the outer peripheral surface of the plug portion.

[0011] In some embodiments, the end face of the insulating sleeve structure adjacent to the bracket is provided with a first limiting portion for limiting the position of the insulating support member on the bracket.

[0012] In some embodiments, the first limiting portion is a limiting groove formed on the end face of the insulating sleeve structure adjacent to the bracket, the bottom surface of the limiting groove is in contact with the surface of the insulating support member away from the bracket, and the side surface of the limiting groove is in contact with the side surface of the insulating support member.

[0013] In some embodiments, the end face of the insulating sleeve structure adjacent to the bracket is in contact with the bracket.

[0014] In some embodiments, the insulating sleeve structure includes a first sleeve and a second sleeve stacked on top of each other, wherein the second sleeve is located on the side of the first sleeve away from the support.

[0015] The hardness of the second sleeve is lower than that of the first sleeve.

[0016] In some embodiments, the second sleeve is a resin sleeve; and / or, the first sleeve is a ceramic sleeve.

[0017] In some embodiments, a limiting structure is provided between the opposite end faces of the first sleeve and the second sleeve to make the first sleeve and the second sleeve coaxial.

[0018] In some embodiments, the limiting structure includes a matching limiting recess and a limiting protrusion, wherein one of the opposing end faces of the first sleeve and the second sleeve is provided with the limiting recess and the other is provided with the limiting protrusion.

[0019] In some embodiments, the inner wall of the second sleeve is formed with a stepped surface, which contacts and engages with the end face of the plug portion away from the bracket, and the orthographic projection of the stepped surface on the plug portion is located outside the socket of the plug portion.

[0020] In some embodiments, the inner wall of the second sleeve has a guide opening on the portion of the plug portion above the socket, and the circumferential dimension of the guide opening increases in a direction away from the socket.

[0021] In some embodiments, the inner wall of the second sleeve further includes a vertical opening located between the guide opening and the socket of the plug portion, and the circumferential dimension of the vertical opening is equal to the circumferential dimension of the socket and equal to the minimum circumferential dimension of the guide opening.

[0022] In some embodiments, the insulating support is an annular gasket with a notch, the notch being used to allow the annular gasket to be fitted around the connection portion; or, the insulating support is an annular gasket formed by splicing together multiple arc-shaped gaskets.

[0023] The annular hole of the annular gasket serves as the clearance portion.

[0024] In some embodiments, the insulating support is a ceramic support.

[0025] In some embodiments, an insulating fastener is further included for securing the radio frequency receiver to the bracket.

[0026] In some embodiments, the insulating fastener includes an insulating screw and an insulating washer, wherein the bracket has a positioning groove on the surface of the second side, a portion of the insulating washer is located in the positioning groove, and another portion is located outside the positioning groove and abuts against the radio frequency receiver; the bracket has a positioning hole on the surface of the first side, the positioning hole communicating with the positioning groove; the insulating screw passes sequentially through the positioning hole and the insulating washer from the first side of the bracket and is threadedly connected to the radio frequency receiver.

[0027] As another technical solution, this application also provides a semiconductor process apparatus, a radio frequency receiver, a radio frequency source, and the radio frequency feed-in component provided in this application;

[0028] The radio frequency feed component is used to electrically connect the feed electrode of the radio frequency source to the radio frequency receiver.

[0029] This application has the following beneficial effects:

[0030] In the technical solutions for the RF feed-in components and semiconductor process equipment provided in this application, an insulating support is disposed on the first side of the bracket and located between the bracket and the plug portion, providing support for the plug portion. This support can be used in conjunction with the bracket to provide a mounting base for the RF receiver. Furthermore, by completely covering the outer circumferential surface of the plug portion with an insulating sleeve structure, this application avoids simultaneous contact between the plug portion and two different media, thereby eliminating or reducing electric field concentration at the three junction points, reducing the risk of arcing, and ensuring the stability and consistency of the equipment and process results. Attached Figure Description

[0031] Figure 1 This is a schematic diagram of the structure of an ICP device;

[0032] Figure 2 A cross-sectional view of the radio frequency feed component provided in an embodiment of this application;

[0033] Figure 3 This is an exploded view of the structure of the radio frequency feed component provided in the embodiments of this application;

[0034] Figure 4 A top view of the radio frequency feed component provided in the embodiments of this application;

[0035] Figure 5 This is a schematic diagram showing the locations of the three junctions;

[0036] Figure 6 This is a schematic diagram illustrating the principle of generating three bonding points.

[0037] Figure 7 This is a cross-sectional view of the insulating fastener used in the embodiments of this application;

[0038] Figure 8 This is a flowchart illustrating the ignition monitoring process used in an embodiment of this application. Detailed Implementation

[0039] To enable those skilled in the art to better understand the technical solutions of this application, the radio frequency feed component and semiconductor process equipment provided in this application will be described in detail below with reference to the accompanying drawings.

[0040] Please see Figure 1 The inductively coupled plasma (ICP) device 100 includes, for example, a reaction chamber 101 and a lower electrode device 102 disposed in the reaction chamber 101. A dielectric window 103 is disposed at the top of the reaction chamber 101, and a coil 104 is disposed above the dielectric window 103. The ICP device also includes a radio frequency feed assembly 200. Figure 1 The plug (only schematically shown; other components of the RF feed assembly 200 are not shown) is used to connect the coil 104 to the feed electrode 106. The feed electrode 106 is electrically connected to the matching unit 108 via a connecting wire 107, and the matching unit 108 is electrically connected to the RF power supply 110 via a coaxial cable 109. During the process, the RF power output from the RF power supply 110 through the matching unit 108 is applied to the coil 104 via the feed electrode 106, and the alternating electromagnetic field generated by the coil 104 excites the gas in the reaction chamber 101 to dissociate into plasma.

[0041] Based on this, embodiments of this application provide a radio frequency (RF) feed component that can electrically connect a feed electrode to an RF receiver. The RF receiver can be the aforementioned coil, or other components that need to be electrically connected to the feed electrode, such as the lower electrode in a semiconductor device. The following description uses a coil as an example of an RF receiver.

[0042] Please refer to the following: Figure 2 and Figure 3 The RF feed assembly 200 includes a bracket 201, a plug 202, and a plug sleeve 203. The bracket 201 provides a mounting base for an RF receiver (e.g., coil 104) and has a mounting hole 2011. The plug 202 is used to connect to the feed electrode 106 and includes a connecting portion 2022 and a plug portion 2021. The connecting portion 2022 passes through the mounting hole 2011, and one end of the connecting portion 2022 is connected to the plug portion 2021 located on a first side of the bracket 201, while the other end of the connecting portion 2022 is connected to the coil 104 located on a second side of the bracket 201. Specifically, taking the upper side of the bracket 201 as the first side and the lower side as the second side as an example, the coil 104 is located on the lower side of the bracket 201, while the plug 2021 is located on the upper side of the bracket 201; the connecting part 2022 passes through the mounting hole 2011, and the upper end of the connecting part 2022 is connected to the plug 2021, for example, as one piece; the lower end of the connecting part 2022 is connected to the coil 104, for example, as one piece.

[0043] The plug portion 2021 is provided with a socket 2023 for connecting to the feed electrode 106, thereby realizing the electrical connection between the coil 104 and the feed electrode 106. It should be noted that the above-mentioned plugs 202 are usually provided in pairs, used to connect the input end and return end of the coil 104 to the two feed electrodes 106 respectively, and the two feed electrodes 106 serve as the input end and return end of the radio frequency power respectively.

[0044] Based on this, the plug sleeve 203 can be used in conjunction with the bracket 201 to provide a mounting base for the coil 104, while also preventing arcing to ensure the stability and consistency of the machine and process results.

[0045] Specifically, the plug sleeve 203 includes an insulating support member 2031 and an insulating sleeve structure 203a. The insulating support member 2031 is disposed on the first side of the bracket 201 (the side where the plug portion 2021 is located) and is located between the bracket 201 and the plug portion 2021, serving to support the plug portion 2021. The insulating support member 2031 is provided with a clearance portion 2031a for the connection portion 2022 to pass through. In some embodiments, for ease of installation, the insulating support member 2031 is an annular gasket formed by splicing multiple arc-shaped gaskets 2031b, and the annular hole of the annular gasket serves as the aforementioned clearance portion 2031a for the connection portion 2022 to pass through. In other embodiments, the insulating support member 2031 is also an annular gasket with a notch (i.e., a non-closed annular gasket), the notch being used to allow the annular gasket to be fitted around the connection portion 2022.

[0046] The inner diameter of the aforementioned annular gasket is smaller than the outer diameter of the plug portion 2021, but larger than the outer diameter of the connecting portion 2022; the outer diameter of the aforementioned annular gasket is larger than the diameter of the mounting hole 2011, and can be greater than or equal to the outer diameter of the plug portion 2021. Thus, the inner ring portion of the annular gasket can be used to support the plug portion 2021; the outer ring portion of the annular gasket is stacked on the surface of the bracket on the first side to achieve combined use with the bracket 201, jointly providing a mounting base for the coil 104. Simultaneously, the annular hole (i.e., the clearance portion 2031a) of the annular gasket allows the connecting portion 2022 to pass through.

[0047] The insulating sleeve structure 203a is fitted around the plug portion 2021 and completely covers the outer peripheral surface of the plug portion 2021. For example, Figure 2 The insulating sleeve structure 203a not only completely covers the outer peripheral surface of the plug portion 2021, but also covers the surface of the insulating support member 2031 located outside the plug portion 2021 and the surface of the upper end of the plug portion 2021 located outside the feed electrode 106. However, the embodiments of this application are not limited to this. In practical applications, the insulating sleeve structure 203a may only completely cover the outer peripheral surface of the plug portion 2021.

[0048] By positioning the insulating support 2031 on the first side of the bracket 201 (the side where the plug portion 2021 is located) and between the bracket 201 and the plug portion 2021, the plug portion 2021 is supported, thus confining it to the first side of the bracket 201, above the mounting hole 2011, and preventing it from falling off the bracket 201 through the mounting hole 2011. It is readily understood that the outer circumference of the plug portion 2021 is smaller than the diameter of the mounting hole 2011, allowing the plug portion 2021 to pass through the mounting hole 2011 from the second side of the bracket 201 to the first side of the bracket 201 for insertion with the upper feed electrode 106. It is also readily understood that, since the coil 104 is connected to the plug portion 2021 via the connecting portion 2022, the insulating support 2031 supports the plug portion 2021 while simultaneously suspending the coil 104 on the second side of the bracket 201.

[0049] In some embodiments, such as Figure 5As shown, the coil 104 can be fixedly connected to the bracket 201 via an insulating fastener 204 (described in detail below). Thus, with the coil 104 suspended on the second side of the bracket 201 via the insulating support 2031, the fixing effect of the insulating fastener 204 locks the position of the coil 104, i.e., fixes the coil 104 relative to the bracket 201. This ensures that when the feed electrode 106 is pulled out of the plug 202, the plug 202 will not move with the feed electrode 106, preventing the coil 104 from deforming due to collision with the bracket 201. It also ensures that the insulating sleeve structure 203a remains fixed relative to the bracket 201. Compared to the prior art that relies solely on fastening screws to fix the coil to the bracket, this application uses both the insulating fastener 204 and the insulating support 2031, preventing the fastening screws from coming loose or the coil from localized deformation caused by repeated insertion and removal of the feed electrode 106 from the plug 202 over a long period, thereby improving the reliability of the coil fixation.

[0050] In some embodiments, the insulating support 2031 is a ceramic support. This ceramic support is, for example, made of Al2O3 ceramic. This material also has an arc resistance index (CTI) of 600 or higher, effectively reducing the risk of creepage arcing. Al2O3 ceramic has a Rockwell hardness of 80 or higher, and can provide more stable support for the plug portion 2021.

[0051] This application avoids the "three-point connection" effect by fitting the insulating sleeve structure 203a around the plug portion 2021 and completely covering the outer peripheral surface of the plug portion 2021, thereby reducing the risk of arcing.

[0052] like Figure 5 As shown, the so-called three-point junction refers to a geometric point where three different substances meet (e.g., Figure 5 As shown by the dashed circle in the diagram, these three materials are: a metallic conductor (plug part 2021), a first dielectric (insulating sleeve), and a second dielectric (air). When two dielectrics with different dielectric constants meet at the metallic conductor, it causes a local field enhancement, known as the "three-junction point" effect. Figure 6As shown, if the insulating sleeve surrounding the plug does not completely cover the bottom of the plug, a triple junction will be generated at the bottom of the plug. Since the dielectric constant of air is lower than that of other media, the equipotential line will be distorted at the triple junction, which will also distort the electric field strength in the air. This area of ​​air is usually considered the primary source of electron emission, which can easily lead to breakdown discharge and generate a risk of arcing. Moreover, in radio frequency circuits, the voltage phases of the two plugs used as input and return terminals are opposite (U+ and U-), and the voltage difference between them is large, which further increases the risk of arcing. Based on this, this application, by ensuring that the insulating sleeve structure 203a at least completely covers the outer peripheral surface of the plug 2021, can prevent the plug 2021 from contacting two different media simultaneously, thereby eliminating or reducing the electric field concentration at the triple junction and reducing the risk of arcing.

[0053] In some embodiments, such as Figure 2 As shown, the end face of the insulating sleeve structure 203a adjacent to the bracket 201 (i.e., Figure 2 The lower end face shown is provided with a first limiting part 203b, which is used to limit the position of the insulating support member 2031 on the bracket 201. With the help of the first limiting part 203b, the insulating support member 2031 can be limited, thereby fixing the insulating support member 2031 on the bracket 201 and preventing it from shifting or falling off relative to the bracket 201, thus ensuring that it provides stable support for the plug 202.

[0054] Furthermore, the first limiting portion 203b that realizes the above function is, for example, formed on the end face adjacent to the support 201 of the insulating sleeve structure 203a (i.e., Figure 2 The limiting groove on the lower end face (shown) has its bottom surface (i.e., the downward-facing groove surface) in contact with the surface of the insulating support 2031 facing away from the bracket 201 (i.e., the upper end face); the side surface of the limiting groove is in contact with the side surface of the insulating support 2031. By making the bottom surface of the limiting groove contact with the surface of the insulating support 2031 facing away from the bracket 201, the insulating support 2031 can be pressed onto the bracket 201 under the gravity of the insulating sleeve structure 203a. At the same time, by making the side surface of the limiting groove contact with the side surface of the insulating support 2031, the position of the insulating support 2031 on the bracket 201 can be restricted to prevent it from shifting or falling off relative to the bracket 201.

[0055] In some embodiments, the end face (i.e. the lower end face) of the insulating sleeve structure 203a adjacent to the bracket 201 is in contact with the surface of the bracket 201 on the first side. In this way, the bracket 201 can provide overall support for the insulating sleeve structure 203a, thereby improving the structural stability.

[0056] In some embodiments, the insulating sleeve structure 203a includes a first sleeve 2032 and a second sleeve 2033 stacked on top of each other, with the second sleeve 2033 located on the side of the first sleeve 2032 away from the support 201; the hardness of the second sleeve 2033 is lower than that of the first sleeve 2032. By employing a split structure composed of two sleeves of different materials stacked on top of each other, and by ensuring that the hardness of the second sleeve 2033 is lower than that of the first sleeve 2032, the insulating sleeve structure 203a reduces the probability of damage to the feed electrode 106 when it comes into contact with the relatively less hard second sleeve 2033 during insertion, thereby improving the service life of the feed electrode 106. Simultaneously, the relatively harder first sleeve 2032 provides more stable support for the second sleeve 2033 and more firmly restricts the position of the insulating support member 2031 on the support 201. Meanwhile, the end face (i.e. the lower end face) of the first sleeve 2032 adjacent to the bracket 201 can contact and cooperate with the bracket 201. In this way, the bracket 201 can provide overall support for the first sleeve 2032 and the second sleeve 2033, thereby improving the structural stability. At the same time, the first sleeve 2032 can avoid the "three-point connection" effect and reduce the risk of sparking.

[0057] In some embodiments, the second sleeve 2033 can be a resin sleeve, such as PTFE resin. This material has an arc resistance index (CTI) of 600 or higher, effectively reducing the risk of creepage arcing. Simultaneously, PTFE resin has a Rockwell hardness of 40, effectively reducing the probability of damage between radio frequency feeds.

[0058] In some embodiments, the first sleeve 2032 can be a ceramic sleeve, such as Al2O3 ceramic. This material also has an arc resistance index (CTI) of 600 or higher, which can effectively reduce the risk of creepage arcing. Al2O3 ceramic has a Rockwell hardness of 80 or higher and can provide more stable support for the second sleeve 2033.

[0059] In some embodiments, a limiting structure 205 is provided between the opposing end faces of the first sleeve 2032 and the second sleeve 2033 to ensure that the first sleeve 2032 and the second sleeve 2033 are coaxial. With the help of this limiting structure 205, the second sleeve 2033 can be supported by the first sleeve 2032 while simultaneously being limited, thereby further improving structural stability. Further, in some embodiments, the limiting structure 205 includes, for example, a matching limiting recess 2051 and a limiting protrusion 2052, with one of the opposing end faces of the first sleeve 2032 and the second sleeve 2033 having the limiting recess 2051 and the other having the limiting protrusion 2052. Specifically, as shown... Figure 2As shown, a limiting recess 2051 is formed on the lower end face of the second sleeve 2033, and a limiting protrusion 2052 is formed on the upper end face of the first sleeve 2032. The concave bottom surface of the limiting recess 2051 contacts and engages with the top surface of the limiting protrusion 2052, and the inner side surface of the limiting recess 2051 contacts and engages with the outer side surface of the limiting protrusion 2052, thereby achieving the supporting and limiting function of the second sleeve 2033.

[0060] In some embodiments, the inner wall of the second sleeve 2033 is formed with a stepped surface 2034, which contacts and engages with the end face (i.e., the upper end face) of the plug portion 2021 away from the support 201. The orthographic projection of the stepped surface 2034 onto the plug portion 2021 is located outside the socket 2023 of the plug portion 2021. By forming the stepped surface 2034 that contacts and engages with the end face of the plug portion 2021 away from the support 201, the plug portion 2021 can be axially limited, restricting its upward movement when the feed electrode 106 is pulled out. Furthermore, by combining the aforementioned limiting structure 205 and the stepped surface 2034, the second sleeve 2033 can be doubly limited, thereby making the structure more stable. In addition, by making the orthographic projection of the stepped surface 2034 onto the plug portion 2021 located outside the socket 2023 of the plug portion 2021, the socket 2023 can be avoided from being obstructed.

[0061] In some embodiments, the inner wall of the second sleeve 2033, located above the socket 2023 of the plug portion 2021, forms a guide opening 2035. The circumferential dimension of the guide opening 2035 increases in the direction away from the socket 2023 (i.e., upwards). The guide opening 2035 provides guidance for the feed electrode 106, allowing it to be smoothly inserted into the socket 2023 of the plug portion 2021 along the guide opening 2035. The angle between the inclined surface of the guide opening 2035 and the horizontal plane is, for example, 60°±5°, to achieve good guiding effect. This angle range is set to maximize the distance between the feed electrode 106 and the inner wall of the guide opening 2035 while ensuring good guiding effect, thereby reducing the risk of arcing. It is easy to understand that although the feed electrode 106 is in contact with two different media at the same time, since there is no creepage between the two feed electrodes 106, which are used as the input and return ends respectively, through the bracket 201, the risk of arcing is low. Moreover, by setting the guide opening 2035 with a large tilt angle, the risk of arcing can be reduced even further.

[0062] Furthermore, in some embodiments, such as Figure 2As shown, the inner wall of the second sleeve 2033 also includes a vertical opening 2036. The vertical opening 2036 is located between the guide opening 2035 and the socket 2023 of the plug portion 2021, and the circumferential dimension of the vertical opening 2036 is equal to the circumferential dimension of the socket 2023 and equal to the minimum circumferential dimension of the guide opening 2035. During the process of inserting the feed electrode 106 into the socket 2023 of the plug portion 2021, the feed electrode 106 first moves downward along the guide opening 2035 to be inserted into the vertical opening 2036 under the guidance of the guide opening 2035. During this movement, the second sleeve 2033, the first sleeve 2032, and the insulating support 2031 can all provide support for the feed electrode 106. Then, guided by the vertical opening 2036, the feed electrode 106 continues to move downwards until it is inserted into the socket 2023 of the plug portion 2021. The guiding effect of the vertical opening 2036 ensures the alignment of the feed electrode 106 as it is inserted into the socket 2023. During this movement, the insulating support 2031 provides support. When the feed electrode 106 can no longer move downwards, it indicates that the installation is complete.

[0063] In some embodiments, the RF feed assembly 200 further includes an insulating fastener 204 for fixing the coil 104 to the bracket 201. Thus, with the coil 104 suspended on the second side of the bracket 201 by the insulating support 2031, the fixing effect of the insulating fastener 204 locks the position of the coil 104, i.e., fixes the coil 104 relative to the bracket 201. This ensures that when the feed electrode 106 is pulled out of the plug 202, the plug 202 will not move with the feed electrode 106, preventing the coil 104 from deforming due to collision with the bracket 201. It also ensures that the insulating sleeve structure 203a remains fixed relative to the bracket 201. Compared with the prior art that relies solely on fastening screws to fix the coil to the bracket, this application combines the use of insulating fastener 204 and insulating support 2031, which can avoid the fastening screws from falling off or the coil from being locally deformed due to the long-term repeated insertion and removal of the feed electrode 106 from the plug 202, thereby improving the reliability of coil fixation.

[0064] like Figure 7As shown, the insulating fastener 204 that achieves the above functions includes, for example, an insulating screw 2041 and an insulating washer 2042. The bracket 201 has a positioning groove 2013 on its second-side surface. A portion of the insulating washer 2042 is located within the positioning groove 2013, and another portion is located outside the positioning groove 2013, abutting against the coil 104. The bracket 201 has a positioning hole 2012 on its first-side surface, which communicates with the positioning groove 2013. The insulating screw 2041 passes sequentially through the positioning hole 2012 and the insulating washer 2042 from the first side of the bracket 201 and is threadedly connected to the coil 104. The insulating screw 2041 is, for example, a resin screw. The insulating washer 2042 is, for example, a resin washer. Of course, the insulating screw 2041 and the insulating washer 2042 can also be made of ceramic or any other insulating material.

[0065] In some embodiments, the radio frequency feed-in component 200 provided in this application can also be used in conjunction with an arc monitoring device to realize real-time detection and alarm of whether arcing occurs at the plug 202, thereby further improving the safety of equipment operation.

[0066] Specifically, since plug 202 is located in the RF circuit, if arcing occurs there, it will cause an abnormal increase in the current and reflected power in the circuit. Although the current monitoring point is located at the matching unit and the reflected power monitoring point is located at the RF power supply, making it impossible to directly locate the arcing position, the presence of arcing can still be effectively determined by detecting abnormal changes in these two parameters.

[0067] like Figure 8 As shown, the arcing monitoring process used in this application embodiment is as follows: For non-Bosch processes, taking a main etching step with a process duration of 30 seconds as an example, the first 2 seconds after the start of each process step is a monitoring delay time. During this stage, the reflected power increases normally during impedance matching, so no monitoring is performed. After the delay ends, if the reflected power continuously exceeds 2% of the set power and the coil current continuously exceeds 30% of the normal value for more than 3 seconds within the subsequent 28 seconds, it is determined to be an arcing abnormality, and an alarm is triggered.

[0068] For Bosch process monitoring, taking the alternating cycle of 1s etching and 1s deposition steps as an example, no monitoring is performed during the first four cycles, which is considered the system stabilization phase. From the fifth cycle onwards, if the reflected power of all process steps fails to recover to within 20% of the set power in the subsequent three consecutive complete cycles, and the current continues to exceed 30% of the normal value, it is determined to be an arcing abnormality, and an alarm is issued.

[0069] The above-mentioned arcing monitoring process, by collecting current data at the matching unit and reflected power data at the RF power supply in real time, combined with process type and step logic, achieves reliable identification and timely alarm of arcing phenomena, effectively preventing equipment damage or process abnormalities caused by repeated arcing.

[0070] As another technical solution, this application embodiment also provides a semiconductor process equipment, which can be applied to, for example, an inductively coupled plasma (ICP) device, or other devices.

[0071] Semiconductor process equipment includes a radio frequency (RF) receiver, an RF source, and the RF feed-in assembly described in the embodiments of this application. The RF feed-in assembly is used to electrically connect the feed electrode of the RF source to the RF receiver. Figure 1 Taking the ICP device 100 shown as an example, it includes a reaction chamber 101 and a lower electrode device 102 disposed in the reaction chamber 101. A dielectric window 103 is disposed on the top of the reaction chamber 101, and a coil 104, which is the aforementioned radio frequency receiver, is disposed above the dielectric window 103. The radio frequency feed assembly 200 is used to connect the coil 104 to the feed electrode 106 of the radio frequency source. The radio frequency source includes, for example, a matching unit 108 and a radio frequency power supply 110. Specifically, the feed electrode 106 is electrically connected to the matching unit 108 via a connecting wire 107, and the matching unit 108 is electrically connected to the radio frequency power supply 110 via a coaxial cable 109.

[0072] The semiconductor process equipment provided in this application embodiment can provide a mounting base for the coil by using the radio frequency feed component 200 provided in this application embodiment, and can also avoid arcing, so as to ensure the stability and consistency of the equipment and process results.

[0073] It is understood that the above embodiments are merely exemplary implementations used to illustrate the principles of this application, and this application is not limited thereto. For those skilled in the art, various modifications and improvements can be made without departing from the spirit and substance of this application, and these modifications and improvements are also considered to be within the scope of protection of this application.

Claims

1. A radio frequency feed component, characterized in that, include: The bracket is equipped with mounting holes; A plug for connecting to a feed electrode, comprising a connecting portion and a plug portion, wherein the connecting portion passes through the mounting hole, and one end of the connecting portion is connected to the plug portion located on the first side of the bracket, and the other end of the connecting portion is used to connect to an RF receiver located on the second side of the bracket. as well as A plug sleeve includes an insulating support and an insulating sleeve structure, wherein the insulating support is disposed on a first side of the bracket and located between the bracket and the plug portion, for supporting the plug portion; the insulating support is provided with a clearance portion for the connecting portion to pass through; The insulating sleeve structure is fitted around the plug portion and covers the outer peripheral surface of the plug portion.

2. The radio frequency feed component according to claim 1, characterized in that, The insulating sleeve structure has a first limiting part on the end face adjacent to the bracket, which is used to limit the position of the insulating support on the bracket.

3. The radio frequency feed component according to claim 2, characterized in that, The first limiting part is a limiting groove formed on the end face of the insulating sleeve structure adjacent to the bracket. The bottom surface of the limiting groove contacts and engages with the surface of the insulating support member away from the bracket. The side surface of the limiting groove contacts and engages with the side surface of the insulating support member.

4. The radio frequency feed component according to claim 3, characterized in that, The end face of the insulating sleeve structure adjacent to the bracket is in contact with and fits with the bracket.

5. The radio frequency feed component according to any one of claims 1-4, characterized in that, The insulating sleeve structure includes a first sleeve and a second sleeve stacked on top of each other, with the second sleeve located on the side of the first sleeve away from the support. The hardness of the second sleeve is lower than that of the first sleeve.

6. The radio frequency feed component according to claim 5, characterized in that, The second sleeve is a resin sleeve; and / or, the first sleeve is a ceramic sleeve.

7. The radio frequency feed component according to claim 5, characterized in that, A limiting structure is provided between the opposite end faces of the first sleeve and the second sleeve to make the first sleeve and the second sleeve coaxial.

8. The radio frequency feed component according to claim 7, characterized in that, The limiting structure includes a matching limiting recess and a limiting protrusion. One of the opposing end faces of the first sleeve and the second sleeve is provided with the limiting recess, and the other is provided with the limiting protrusion.

9. The radio frequency feed component according to claim 5, characterized in that, The inner wall of the second sleeve has a stepped surface, which contacts and engages with the end face of the plug portion away from the bracket. The orthographic projection of the stepped surface onto the plug portion is located outside the socket of the plug portion.

10. The radio frequency feed component according to claim 5, characterized in that, The inner wall of the second sleeve has a guide opening on the portion above the socket of the plug, and the circumferential dimension of the guide opening increases in the direction away from the socket.

11. The radio frequency feed component according to claim 10, characterized in that, The inner wall of the second sleeve also includes a vertical opening, which is located between the guide opening and the socket of the plug portion, and the circumferential dimension of the vertical opening is equal to the circumferential dimension of the socket and equal to the minimum circumferential dimension of the guide opening.

12. The radio frequency feed component according to any one of claims 1-4, characterized in that, The insulating support is an annular gasket with a notch, the notch being used to allow the annular gasket to be fitted around the connection portion; or, the insulating support is an annular gasket formed by splicing together multiple arc-shaped gaskets. The annular hole of the annular gasket serves as the clearance portion.

13. The radio frequency feed component according to any one of claims 1-4, characterized in that, The insulating support is a ceramic support.

14. The radio frequency feed component according to claim 1, characterized in that, It also includes insulating fasteners for securing the radio frequency receiver to the bracket.

15. The radio frequency feed component according to claim 14, characterized in that, The insulating fastener includes an insulating screw and an insulating washer. The bracket has a positioning groove on the surface of the second side. A portion of the insulating washer is located in the positioning groove, and another portion is located outside the positioning groove and abuts against the radio frequency receiver. The bracket has a positioning hole on the surface of the first side, and the positioning hole communicates with the positioning groove. The insulating screw passes through the positioning hole and the insulating washer sequentially from the first side of the bracket and is threadedly connected to the radio frequency receiver.

16. A semiconductor process apparatus, characterized in that, Includes a radio frequency receiver, a radio frequency source, and a radio frequency feed-in component as described in any one of claims 1-15; The radio frequency feed component is used to electrically connect the feed electrode of the radio frequency source to the radio frequency receiver.

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