A high temperature grill

CN224875359UActive Publication Date: 2026-10-20KUNSHAN INBORE ELECTRONICS TECH
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Patent Information

Application Number
CN202522515788.6
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-11-27
Publication Date
2026-10-20
Estimated Expiration
2035-11-27

AI Technical Summary

Technical Problem

但由于烤箱空间有限,而目前常规的晶舟盒设计复杂,不轻便,导致体积大、重量大,在烘烤结束后移运晶舟盒的过程中会出现费力的问题,人员搬运不方便;还有目前晶舟盒对于晶圆片的约束方式设计较少,导致晶圆片产品放置不稳定

Benefits of technology

[0009]根据本实用新型的一个实施例,所述第一板的顶部设置主提手。这是最自然、最安全的搬运方式,向上垂直提起时,结构受力最合理,晶圆状态最稳定。

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model provides a kind of high-temperature baking frame, including the first plate and the second plate of opposite, two side plates of mirror symmetry are set between the first plate and the second plate, the inner wall of side plate is provided with several parallel interval distribution's supporting body, each supporting body on two side plates one-to-one correspondence;Supporting body includes integrally formed first section and second section, first section is arc segment, for resting product, second section is linear segment, and the thickness of second section is greater than the thickness of first section, the arc shape of first section is outward convex, the position of first section and second section is formed arc-shaped abutment step socket.The utility model structure design is simple, easy to operate and carry, mainly by first plate, second plate, side plate and several supporting body constitute, wafer horizontally enters into baking frame, is rested on the first section of supporting body, and is limited effect by abutment step socket and the shrinkage of side plate, ensure the stable placement of wafer on supporting body.
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Description

Technical Field

[0001] This utility model relates to the field of wafer manufacturing technology, specifically, it demonstrates a high-temperature baking rack suitable for wafers. Background Technology

[0002] Specialized carrier fixtures, commonly known as wafer boats, are used during the transportation and manufacturing process of wafers. For example, some wafers require high-temperature baking during the manufacturing process, and several wafers can be placed in a wafer boat and baked in an oven. However, due to the limited space in ovens, and the complex and heavy design of current conventional wafer boats, they are bulky and heavy, making it difficult to move them after baking and inconvenient for personnel. Furthermore, current wafer boat designs offer limited constraints on wafers, resulting in unstable wafer placement. Utility Model Content

[0003] The purpose of this invention is to provide a high-temperature baking rack with a simple structure and good portability.

[0004] The technical solution is as follows: A high-temperature baking rack includes a first plate and a second plate facing each other, and two mirror-symmetrical side plates are provided between the first plate and the second plate. The inner wall of the side plates is provided with a plurality of parallel and spaced trays, and each tray on the two side plates corresponds to the other. The support body includes a first section and a second section formed in one piece. The first section is arc-shaped and is used to hold the product. The second section is straight and its thickness is greater than that of the first section. The arc shape of the first section protrudes outward, and the position where the first section and the second section are connected forms an arc-shaped abutment step.

[0005] In addition, the above embodiments of this utility model may also have the following additional technical features: According to one embodiment of this utility model, the side plate includes an integrally formed straight plate and an arc-shaped plate. The first segment is disposed on the inner wall of the arc-shaped plate, and the second segment is disposed on the inner wall of the straight plate. The distance between the outer sides of the two arc-shaped plates is smaller than the distance between the two straight plates. The straight plate design facilitates the entry of wafer products, while the arc-shaped plate design conforms to the circular outline of the wafer, providing a tapering effect. Together with the first segment of the support body, it provides stable support and a limiting effect.

[0006] Furthermore, a pair of mirrored protective partitions are provided between the first and second plates. These partitions are located near the outer side of the curved plate but do not contact it. The purpose of the protective partitions is to prevent the exposed sides of the wafers from accidentally contacting the oven.

[0007] Furthermore, the outward extension direction of the protective partition is parallel to the plane of symmetry between the two side plates. This improves the aesthetics of the design and also avoids affecting the flow of heat from the oven to the inside of the grill rack.

[0008] According to one embodiment of this utility model, inwardly recessed notches are formed at both the front and rear ends of the second plate. The notch design reduces the weight of the baking rack, saves material costs, and during baking, the notches facilitate heat flow from the bottom of the rack upwards, improving heat distribution.

[0009] According to one embodiment of this utility model, a main handle is provided at the top of the first plate. This is the most natural and safest way to handle the wafer; when lifted vertically upwards, the structural stress is most reasonable, and the wafer state is most stable.

[0010] Furthermore, both side panels are provided with side handles on their outer walls. This facilitates pushing the baking rack horizontally in or pulling it out.

[0011] Compared with the prior art, the advantages of this utility model are: the structure is simple, easy to operate and transport, and mainly consists of a first plate, a second plate, a side plate and several trays. The wafer enters the baking rack horizontally and is placed on the first section of the tray. It is restricted by the step notch and the shrinkage opening of the side plate, thus restricting it on the first section of the tray. This restrains the wafer and ensures its stable placement on the tray. Attached Figure Description

[0012] Figure 1 This is a schematic diagram of a high-temperature baking rack according to Embodiment 1 of this utility model; Figure 2 This is a schematic diagram of the side plate portion of Embodiment 1 of this utility model; Figure 3 This is a schematic diagram of the first plate and the second plate in Embodiment 1 of this utility model; Figure 4 This is a schematic diagram of a high-temperature baking rack from another perspective, according to Embodiment 2 of this utility model; The relevant markings in the attached diagram are: 10-first plate, 20-second plate, 30-side plate, 40-support body, 50-protective partition, 60-main handle, 70-side handle; 210-notch, 310-straight plate, 320-curved plate, 410-first section, 420-second section, 430-step engagement notch. Detailed Implementation

[0013] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0014] Example 1 This utility model embodiment proposes a high-temperature baking rack, such as Figure 1 As shown, its overall structure is a roughly rectangular frame structure, mainly composed of a first plate 10, a second plate 20, two mirror-symmetrical side plates 30, and several support bodies 40.

[0015] In detail, the first plate 10 and the second plate 20 are positioned vertically opposite each other, with the second plate 20 serving as the supporting surface of the baking rack. They are arranged parallel to each other in space, with the first plate 10 located at the top of the baking rack and the second plate 20 at the bottom. The first plate 10 and the second plate 20 are connected and fixed by two side plates 30. The two side plates 30 are mirror-symmetrically arranged on the left and right sides of the first plate 10 and the second plate 20, and the side plates 30 do not contact each other, thus forming a continuous, framed load-bearing space together with the first plate 10 and the second plate 20. The entire baking rack is typically manufactured using a high-temperature resistant metal material (commonly Teflon) through welding, riveting, or one-piece molding processes.

[0016] Combination Figure 2 As shown, each side plate 30 includes an integrally formed straight plate 310 and an arc-shaped plate 320. Specifically, with the oven rack entrance as a reference, the straight plate 310 is located at the oven rack entrance, while the arc-shaped plate 320 is located at the other side entrance of the oven rack, and the arc shape of the arc-shaped plate 320 protrudes outward. The distance between the outer sides of the arc-shaped plates 320 of the two side plates 30 is smaller than the distance between the straight plates 310 of the two side plates 30. Thus, from the cross-sectional view of the oven rack, it has a tapered shape that is wider at the front and narrower at the back. This tapered structure design facilitates the horizontal placement of wafers from the oven rack entrance without the wafers sliding out from the other side of the oven rack.

[0017] On the inner walls of the two side plates 30, several sets of horizontally aligned support bodies 40 are provided. The support bodies 40 on the side plates 30 are distributed in parallel and equidistant. One set of support bodies on each side plate is used to support a single wafer. The support bodies 40 can be fixed to the inner wall of the side plates by welding, bonding, or integral processing with the side plates 30.

[0018] Among them, see Figure 2As shown, a single tray 40 is integrally formed from a first segment 410 and a second segment 420. The first segment 410 is arc-shaped, and its curvature is designed to be consistent with the bending direction of the arc-shaped plate 320 on the side plate 30, so that the circular edge of the wafer rests on the first segment 410. The second segment 420 is connected to one end of the first segment 410. The second segment 420 is generally straight. Specifically, with the entrance of the baking rack as a reference, the second segment 420 is located at the entrance, while the first segment 410 is located on the opposite side of the baking rack from the entrance.

[0019] In addition, the thickness of the second segment 420 is greater than that of the first segment 410, and an arc-shaped abutment step 430 is formed in the transition area where the first segment 410 and the second segment 420 are connected. The abutment step 430, the first segment 410 and the arc-shaped plate 320 together constitute a support groove for supporting and restricting the product.

[0020] The way wafer products are placed, combined with Figure 1 The operator places the wafer into the baking rack in a basically horizontal position through the opening between the two straight plates 310. The wafer is lowered until its edge contacts the first section 410. The wafer is primarily supported by the curved first section 410, achieving surface contact. The abutment step 430 effectively prevents the wafer from sliding forward, ensuring it remains on the first section 410. Conversely, to remove the wafer, it is slightly lifted so that it is not obstructed by the abutment step 430, allowing it to be pulled out of the baking rack.

[0021] In addition, combined Figure 3 As shown, the second plate 20 serves as the base plate, with an inwardly recessed notch 210 machined at the middle position of both its front and rear ends. The advantages of the notch 210 design are: firstly, it reduces the overall weight of the baking rack and saves materials; secondly, during the baking process, they form a natural air intake channel for hot air, and cold air can enter from the bottom notch 210, be heated and rise, forming effective thermal convection and improving the uniformity of temperature distribution inside the rack.

[0022] Example 2 Based on the above embodiment 1, such as Figure 4 As shown, this embodiment additionally includes a pair of protective partitions 50.

[0023] In detail, taking the entrance of the baking rack as a reference, two protective partitions are arranged in a mirror-symmetrical manner on the side away from the entrance. The protective partition 50 is usually a long strip, with its two ends connected and fixed to the first plate 10 and the second plate 20, respectively. The outward extension direction of the protective partition 50 is parallel to the symmetrical plane between the two side plates 30. Although the protective partition 50 is close to the arc-shaped plate 320, a certain gap is maintained between the two, and they do not directly contact each other. Since the side of the baking rack opposite the entrance is also open, the edge of the wafer will be exposed from this point. To prevent the exposed edge of the wafer from touching the inner wall of the oven and causing damage during baking, the protective partition 50 is designed to prevent the wafer from contacting the inner wall of the oven. That is, the exposed edge of the wafer will be located between the two protective partitions.

[0024] For ease of handling, a main handle 60 is provided at the top center of the first plate 10. The main handle 60 can be arched, ring-shaped, or other easy-to-grip shapes. Using the main handle 60 is the most natural and stable way when the entire baking rack needs to be lifted vertically. In addition, a pair of side handles 70 are symmetrically provided at appropriate positions (e.g., in the middle) on the outer walls of the two side plates 30. The side handles 70 facilitate the operator or automated equipment to push or pull the baking rack in or out horizontally (e.g., move it on the oven's slide rails), or provide a better point of leverage when the baking rack needs to be tilted.

[0025] When using the baking rack in this embodiment: the operator holds the baking rack horizontally with the side handle 70 and slides the wafer product horizontally into the baking rack entrance until its edge is stably placed on the first section 410 of the two trays 40 of the corresponding layer and is constrained by the abutment step latch 430. This process is repeated until all layers are filled with wafer products. Then, the baking rack is lifted with the main handle 60 and transferred to the oven, or it is directly pushed horizontally into the high-temperature oven with the side handle 70 for baking. After baking, the products are removed in the reverse order.

[0026] The above descriptions are merely some embodiments of this utility model. For those skilled in the art, various modifications and improvements can be made without departing from the inventive concept of this utility model, and all such modifications and improvements fall within the protection scope of this utility model.

Claims

1. A high-temperature baking rack, comprising a first plate (10) and a second plate (20) facing each other, wherein two mirror-symmetrical side plates (30) are disposed between the first plate (10) and the second plate (20), characterized in that, Several parallel and spaced supports (40) are provided on the inner wall of the side plate (30), and each support (40) on the two side plates (30) corresponds to the other support. The support body (40) includes an integrally formed first section (410) and a second section (420). The first section (410) is arc-shaped and is used to hold the product. The second section (420) is straight and the thickness of the second section (420) is greater than the thickness of the first section (410). The arc of the first section (410) protrudes outward. The position where the first section (410) and the second section (420) are connected forms an arc-shaped abutment step (430).

2. The high-temperature baking rack according to claim 1, characterized in that, The side plate (30) includes an integrally formed straight plate (310) and an arc plate (320). The first segment (410) is disposed on the inner wall of the arc plate (320), and the second segment (420) is disposed on the inner wall of the straight plate (310). The distance between the outer sides of the two arc plates (320) is smaller than the distance between the two straight plates (310).

3. A high-temperature baking rack according to claim 2, characterized in that, A pair of mirrored protective partitions (50) are also provided between the first plate (10) and the second plate (20). The protective partitions (50) are close to the outer side of the arc plate (320) and do not contact the arc plate (320).

4. A high-temperature baking rack according to claim 3, characterized in that, The outward extension direction of the protective partition (50) is parallel to the plane of symmetry between the two side plates (30).

5. A high-temperature baking rack according to claim 1, characterized in that, The second plate (20) has inwardly recessed notches (210) at both the front and rear ends.

6. A high-temperature baking rack according to claim 1, characterized in that, A main handle (60) is provided on the top of the first plate (10).

7. A high-temperature baking rack according to claim 6, characterized in that, Both of the side panels (30) are provided with side handles (70) on their outer walls.