Hydride vapor phase epitaxy filter and filter cleaning apparatus

Abstract

The utility model provides a kind of hydride vapor phase epitaxy filter and filter cleaning device, hydride vapor phase epitaxy filter includes: shell and compression stopper, the shell is equipped with pressurizing mouth and dust discharge port, the compression stopper is set in the dust discharge port. The hydride vapor phase epitaxy filter has the first state of pressure maintenance and the second state of pressure instantaneous release, in the first state, the inside of the shell has stable pressure difference with the collection structure, the dust discharge port is opened instantaneously by the compression stopper, so that the shell is in the second state and the dust in the shell enters the collection structure. The utility model can realize the overall improvement of dust cleaning efficiency, operation safety, process compatibility and material quality guarantee, which provides an efficient and stable tail gas treatment solution for gallium nitride epitaxial growth process.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor equipment technology, specifically to a hydride vapor phase epitaxial filter and a filter cleaning device. Background Technology

[0002] Hydride vapor phase epitaxy (HVPE) technology, with its advantages of fast growth rate, high film purity, and excellent crystal quality, has become a core technology for the fabrication of wide-bandgap semiconductor materials such as gallium nitride (GaN), widely supporting the development of high-end industries such as power electronics, optoelectronics, and 5G communications. During the gallium nitride material growth process in HVPE equipment, nitrogen-containing and chlorine-containing compounds in the reaction system undergo side reactions, generating a large amount of ammonium chloride (NH4Cl) dust. This ammonium chloride dust is emitted along with the reaction exhaust gas into a dedicated filter. If too much dust accumulates in the filter, it will increase the exhaust gas emission resistance, directly disrupting the flow field stability inside the HVPE reaction chamber, and consequently affecting the growth uniformity and crystal quality of the epitaxial layer. Therefore, it is essential to regularly clean the ammonium chloride dust from the filter to ensure the continuity and reliability of equipment operation.

[0003] However, the ammonium chloride dust generated by the HVPE process has significant physicochemical defects, posing numerous challenges to cleaning operations: First, the dust particles are extremely small, typically in the micrometer or even submicrometer range, making them highly susceptible to airborne dispersion and difficult to capture efficiently; second, ammonium chloride is highly hygroscopic and prone to deliquescence under normal operating conditions. The resulting liquid film not only adheres to the inner wall of the filter and the surface of the filter media but also exhibits strong corrosiveness, potentially damaging filter components and degrading the performance of the filter media; third, deliquescent ammonium chloride may react with other impurities in the air, further increasing the difficulty of cleaning.

[0004] In existing technologies, removing the dust from the aforementioned filters requires workers to wear full protective gear and use tools such as vacuum cleaners and excavators to remove the ammonium chloride dust. This cleaning method has significant drawbacks: firstly, it easily generates secondary dust during operation, polluting the work environment and potentially damaging the respiratory system of operators; secondly, the cleaning efficiency is low, and the HVPE equipment must be shut down during filter disassembly and assembly, resulting in a significant reduction in equipment uptime; furthermore, corrosive dust and deliquescent liquids may corrode protective equipment, posing a safety hazard to personnel. Utility Model Content

[0005] Therefore, the technical problem to be solved by this utility model is to overcome the problem that the dust treatment efficiency and environmental protection of the existing gallium nitride growth process filter need to be improved, and to provide a hydride vapor phase epitaxial filter and filter cleaning device.

[0006] This technology enables efficient cleaning of ammonium chloride dust, avoids the drawbacks of manual operation, and supports in-situ cleaning mode. It effectively isolates the mutual interference between the dust cleaning process and the reaction chamber, ensuring the stability of gallium nitride epitaxial growth and material quality.

[0007] To solve the above-mentioned technical problems, this utility model provides a hydride vapor phase epitaxy filter, which is used to connect to a hydride vapor phase epitaxy device and filter the exhaust gas. The hydride vapor phase epitaxy filter includes: The housing is provided with a pressurization port and a dust discharge port. The pressurization port is used to connect to an external pressurization device, and the dust discharge port is used to connect to an external collection structure. A pressure-resistant stop is provided in the dust discharge outlet to adjust the opening and closing of the dust discharge outlet.

[0008] In one embodiment of the present invention, the housing is provided with an air inlet and an air outlet, the air outlet and the dust discharge outlet are respectively provided at both ends of the housing along the axial direction, and a valve body is provided in both the air inlet and the air outlet.

[0009] In one embodiment of the present invention, both the air inlet and the pressurization port are disposed in the circumferential direction of the housing.

[0010] In one embodiment of the present invention, the housing includes a receiving body and a flow guide. The flow guide is disposed at one end of the receiving body along the axial direction, and the port of the flow guide is the dust discharge outlet. The sidewall of the flow guide gradually decreases in size along the direction toward the dust discharge outlet to form a conical transition wall.

[0011] In one embodiment of the present invention, the above-mentioned hydride vapor phase epitaxial filter is further provided with at least one of a first pressure sensor, a temperature detection unit, or a recovery status monitoring unit.

[0012] This utility model embodiment also provides a hydride vapor phase epitaxial filter cleaning device for cleaning the above-mentioned hydride vapor phase epitaxial filter, including: A pressurizing device, wherein the pressurizing device is connected to the pressurizing port of the aforementioned hydride vapor phase epitaxial filter; The collection structure is connected to the dust discharge port of the aforementioned hydride vapor phase epitaxial filter.

[0013] In one embodiment of the present invention, the collection structure is provided with a sealed interface, which is used to connect to the dust outlet so as to adjust the flow between the collection structure and the housing of the hydride vapor phase epitaxial filter by the pressure-resistant stop of the hydride vapor phase epitaxial filter.

[0014] In one embodiment of the present invention, the above-mentioned collection structure is a dust collection bag or a dust collection chamber. The dust collection chamber is provided with a pressure regulating port, the pressure regulating port is connected to a negative pressure generating device, and a second pressure sensor is provided inside the dust collection chamber.

[0015] In one embodiment of the present invention, the cleaning device further includes a recycling detection unit located at the bottom of the collection structure.

[0016] In one embodiment of the present invention, the cleaning device further includes a recovery detection unit located inside the hydride vapor phase epitaxial filter.

[0017] The above-mentioned technical solution of this utility model has the following advantages compared with the prior art: The aforementioned hydride vapor phase epitaxial filter and filter cleaning device of this utility model can achieve a comprehensive improvement in dust cleaning efficiency, operational safety, process compatibility and material quality assurance, and provide an efficient and stable exhaust gas treatment solution for gallium nitride epitaxial growth process.

[0018] In terms of dust removal, the filter utilizes the stable pressure difference between the housing and the collection structure in the first state to achieve stable buffering of ammonium chloride dust, a typical byproduct of the HVPE process. In the second state, the instantaneous opening of the pressure-resistant stop can quickly release the pressure inside the housing, forming a directional airflow impact force that rapidly impacts the dust inside the filter into the collection structure. During this process, the pressure energy is converted into heat energy, which also promotes the transformation of some deliquescent ammonium chloride inside the filter into a drier state, making it easier to detach from the inner wall of the chamber. This reduces the adhesion of deliquescent ammonium chloride inside the chamber, improving the cleaning effect of the filter. Thus, it can efficiently blow the dust adhering to the inner wall and the surface of the filter components into the collection structure without affecting the corresponding gas path of the hydride vapor phase epitaxy equipment. This effectively solves the problems of dust accumulation, environmentally unfriendly cleaning, and time-consuming and labor-intensive cleaning in traditional equipment, and the dust removal efficiency is significantly improved compared to conventional manual cleaning.

[0019] On the other hand, ammonium chloride dust is irritating during manual operation. It is completely isolated by the closed collection structure and automated dust removal design, avoiding direct contact with operators and eliminating the risk of inhalation injury or skin contact. The simplified operation process reduces manual intervention and avoids safety hazards and human error caused by improper operation such as disassembly and cleaning.

[0020] Furthermore, the cleaning process of this application will not interfere with key process parameters such as temperature, pressure, and gas composition within the chamber, ensuring the stability of the gallium nitride epitaxial growth environment and preventing secondary dust pollution or material defects caused by process fluctuations from the source. At the same time, the sealed structure and stable differential pressure control can prevent external impurities from entering the reaction chamber, ensuring the cleanliness of the process environment. Attached Figure Description

[0021] To make the content of this utility model easier to understand, the present utility model will be further described in detail below with reference to specific embodiments and accompanying drawings.

[0022] Figure 1 This is a schematic diagram of the structure of the hydride vapor phase epitaxial filter in an embodiment of this utility model; Figure 2 This is a schematic diagram of the cleaning device and the filter in use after assembly in an embodiment of the present invention.

[0023] Explanation of reference numerals in the accompanying drawings: 100, housing; 110, main body; 120, flow guide; 130, air inlet; 140, air outlet; 150, pressurization port; 160, dust discharge port; 200, pressure-resistant stop; 300, collection structure; 400, pressurization equipment. Detailed Implementation

[0024] The present invention will be further described below with reference to the accompanying drawings and specific embodiments, so that those skilled in the art can better understand and implement the present invention. However, the embodiments are not intended to limit the present invention.

[0025] It should be noted that the ammonium chloride dust generated by the current HVPE process is difficult to remove from the filter due to its light weight and hygroscopic properties, resulting in secondary dust pollution that can harm operators' health and low cleaning efficiency. To address this industry pain point, this application provides a hydride vapor phase epitaxy filter, which is used to connect to a hydride vapor phase epitaxy device and filter the exhaust gas. Then, by adjusting the internal state of the filter, a highly efficient and environmentally friendly cleaning process is achieved.

[0026] The first exemplary embodiment of this application provides a hydride vapor phase epitaxial filter.

[0027] See Figure 1As shown, the hydride vapor phase epitaxial filter of this embodiment includes a housing 100 and a pressure-resistant stop 200. The housing 100 is provided with a pressurization port 150 and a dust discharge port 160. The pressurization port 150 is used to connect to an external pressurization device, and the dust discharge port 160 is used to connect to an external collection structure 300. Based on this, the housing 100, by integrating the pressurization port 150 and the dust discharge port 160, forms an adjustable and sealed dust treatment space, providing a stable and reliable structural foundation for subsequent dust adsorption and dust discharge processes.

[0028] In the hydride vapor phase epitaxial filter provided in this application embodiment, the housing 100 serves as the basic support and functional carrier of the filter, and the pressure-resistant stop 200 is a structure for adjusting the opening and closing of the dust discharge outlet 160. It is installed in the dust discharge outlet 160 to adjust the working state of this hydride vapor phase epitaxial filter.

[0029] Specifically, the hydride vapor phase epitaxial filter provided in this application embodiment has a first state of pressure maintenance and a second state of instantaneous pressure release. In the first state, there is a stable pressure difference between the interior of the housing 100 and the collection structure 300. This stable pressure difference provides the core driving force for the efficient adsorption of ammonium chloride dust, ensuring that the dust generated in the process is firmly adsorbed in the inner cavity of the housing 100, preventing it from diffusing with the exhaust gas or falling into the collection structure 300 prematurely. By instantaneously opening the dust outlet 160 through the pressure-resistant stop 200, the housing 100 is in the second state and the dust inside the housing 100 enters the collection structure 300. During this process, the pressure inside the housing 100 is rapidly released in a short time, forming a strong pressure gradient with the collection structure 300, thereby generating directional airflow. Driven by the airflow, the dust originally attached to the inner wall of the housing 100 is quickly peeled off and smoothly enters the collection structure 300 through the dust discharge port 160. During this process, the pressure energy is converted into heat energy, which also promotes some deliquescent ammonium chloride in the filter to become drier and thus more easily detach from the inner wall of the cavity. This reduces the adhesion of deliquescent ammonium chloride in the cavity, improves the cleaning effect of the filter, and completes efficient and environmentally friendly dust cleaning.

[0030] Furthermore, this hydride vapor phase epitaxial filter also incorporates a third pressure regulation state, which serves as a pre-transition stage to the first state, providing precise pressure assurance for efficient dust adsorption. In the third state, the dust outlet 160 is first tightly closed by the pressure-resistant stop 200, creating a completely sealed space within the housing 100 to prevent leakage during pressure regulation. Subsequently, with the precise pressure control function of the external pressurization equipment, the pressure within the housing 100 is dynamically adjusted according to actual process requirements, gradually regulating it to the preset first target pressure value. Once the pressure within the housing 100 reaches the first target pressure and stabilizes, the hydride vapor phase epitaxial filter smoothly switches to the first state, continuously maintaining this stable pressure. This creates a constant and suitable pressure difference between the inside of the housing 100 and the external collection structure 300, laying a solid foundation for the directional adsorption and efficient capture of ammonium chloride dust, ensuring the stability, continuity, and reliability of the entire adsorption process.

[0031] Specifically, in this application, the aforementioned housing 100 is provided with a pressurization port 150 and a dust discharge port 160. The pressurization port 150 is used to connect to an external pressurization device, which allows for precise adjustment of the pressure state within the housing 100's internal cavity. The dust discharge port 160 is used to connect to an external collection structure 300, playing a crucial role in the directional discharge of dust. Through precise connection with the external collection structure 300, a closed channel for dust from filtration to collection is constructed, avoiding secondary pollution caused by dust leakage and ensuring the concentration of dust collection. Based on this, the housing 100, by integrating the pressurization port 150 and the dust discharge port 160, forms an adjustable and sealed dust treatment space, providing a stable and reliable structural foundation for subsequent dust adsorption and discharge processes.

[0032] Furthermore, the aforementioned housing 100 includes a receiving body 110 and a flow guide 120. The flow guide 120 is disposed at one end of the receiving body 110 along the axial direction, and the port of the flow guide 120 is the dust discharge outlet 160. The sidewall of the flow guide 120 gradually decreases in size along the direction towards the dust discharge outlet 160, forming a conical transition wall surface. Based on this structural design, on the one hand, the structure of the sidewall size gradually decreasing along the direction of the dust discharge outlet 160 forms a directional flow guide channel, guiding the airflow inside the housing 100 to converge towards the outlet, enhancing the airflow's ability to carry dust, preventing dust from accumulating in the corners or dead corners of the housing 100, and improving the uniformity of dust discharge. On the other hand, it can reduce the cross-sectional area of ​​the dust discharge path. According to the principles of fluid mechanics, the airflow velocity will naturally increase in the conical channel, forming a stronger directional impact force, which helps the dust to quickly detach from the shell 100 and enter the collection structure 300, forming a structure that works in conjunction with the instantaneous pressure relief dust discharge mechanism, further ensuring the thoroughness of dust discharge. In addition, it can also disperse the pressure wave, so that the pressure wave propagates gradually at the outlet, thereby reducing the problem of excessive impact force caused by the instantaneous pressure release directly impacting the right-angle structure or easily causing large stress impact on the material, which would reduce the equipment life. Overall, by setting the conical transition wall, it helps to guide the airflow in the filter to carry the ammonium chloride dust along the guide of the conical transition wall into the collection structure 300 quickly, and can smooth the propagation of pressure waves, reduce impact force and energy loss, thereby protecting the equipment, extending the equipment life, and improving the safety of the system.

[0033] Furthermore, the aforementioned hydride vapor phase epitaxial filter also includes a first pressure sensor, which is integrated inside the housing 100. Its core function is to monitor the pressure changes inside the housing 100 in real time and with precision. As a key feedback component of the pressure control system, the first pressure sensor continuously collects pressure data inside the housing 100 and transmits the signal to the filter control unit in real time, providing a reliable basis for switching between three working states and precise pressure control: In the third state, the sensor can track the dynamic process of the pressure inside the housing 100 approaching the first target pressure in real time. When the pressure reaches the preset threshold and stabilizes, it promptly sends a feedback signal to trigger the system to switch to the first state, ensuring the accurate establishment of the differential pressure environment; In the first state, the sensor continuously monitors pressure stability. If the pressure deviates from the set range due to factors such as fluctuations in exhaust gas input or slight changes in sealing condition, it can quickly issue an early warning signal, facilitating the control unit to make dynamic fine adjustments through pressurization equipment to ensure the constant differential pressure required for dust adsorption; In the second state, the sensor can record the rate of pressure release and the final pressure, providing data support for optimizing the dust exhaust airflow intensity and adjusting the opening duration of the pressure-resistant stop 200, ensuring efficient dust discharge while avoiding sudden pressure changes that could impact the equipment. In addition, the first pressure sensor can also realize real-time alarm for pressure abnormalities. When the pressure inside the housing 100 exceeds the range, or rises or falls suddenly, the safety protection mechanism is triggered in time to avoid the risk of gas leakage and equipment damage caused by pressure runaway, thereby further improving the safety and reliability of the filter operation.

[0034] Specifically, the aforementioned pressure difference is within the preset pressure difference range P. A ~P B Internally, this includes endpoint values ​​to ensure efficient dust removal, safe operation, and process compatibility of the filter; among which, P A The minimum differential pressure threshold is defined, and P is explicitly set. A >1 atm (standard atmospheric pressure). It should be noted that, due to the light weight and easy suspension of ammonium chloride dust, a pressure difference below 1 atm is insufficient to generate enough adsorption power, making it impossible to ensure stable dust capture within the housing 100 cavity. This may result in dust escaping with the exhaust gas or remaining suspended in the airflow, affecting the filtration effect; while P A The setting of >1atm can form a directional adsorption force through the positive pressure difference between the inside of the housing 100 and the collection structure 300, ensuring that the ammonium chloride dust generated by the HVPE process is firmly adsorbed inside the housing 100, meeting the physical characteristics and adsorption requirements of the ammonium chloride dust, and laying the foundation for efficient dust removal in the future.

[0035] P B The maximum differential pressure threshold is given, and P is satisfied. B >P AThe prerequisite is that the numerical settings must simultaneously consider temperature constraints and structural stability constraints. Specifically, regarding temperature constraints, the decomposition temperature of ammonium chloride is approximately 338℃. If the pressure difference is too large, the energy conversion during the instantaneous release of pressure will generate excessive heat, causing the temperature of the ammonium chloride dust to rise above the decomposition temperature, thereby decomposing to produce ammonia and hydrogen chloride gases. This not only defeats the purpose of dust collection but may also cause internal corrosion of the shell 100 and aging of seals due to residual corrosive gases, and may even affect the gas environment for subsequent epitaxial processes; while P B Precise settings can prevent excessive heat generation and ensure that the dust remains solid during the dust discharge process, achieving efficient collection and safe handling. Therefore, it is necessary to strictly control the temperature rise of the dust to be less than the decomposition temperature of ammonium chloride after the heat energy converted from the pressure is transferred to the ammonium chloride dust during the instantaneous release of pressure.

[0036] Regarding structural stability constraints, P B It is necessary to ensure that the impact force generated during the instantaneous release of the maximum differential pressure does not damage the connection between the hydride gas phase epitaxial filter and the collection structure 300. During the instantaneous release of the differential pressure, a strong pressure gradient will form inside and outside the housing 100, generating an instantaneous impact force. If this force exceeds the connection strength between the filter and the collection structure 300 (such as the bearing capacity of the seals and the tightness of the interfaces), it may lead to leakage, loosening, or even detachment at the connection, causing safety hazards such as dust leakage and the diffusion of toxic gases. Therefore, P B The setting must be based on the mechanical bearing capacity of the connection structure as the upper limit to ensure that the impact force is within the safe threshold. This ensures that the dust can be quickly removed from the shell under the impact force, while maintaining the sealing and stability of the connection structure to avoid operational risks.

[0037] Specifically, based on a comprehensive consideration of the adsorption requirements of ammonium chloride dust, the load-bearing capacity of the equipment structure, and process safety, the aforementioned pressure difference can be set to 1.2 atm to 4 atm. 1.2 atm serves as the minimum pressure difference threshold, higher than standard atmospheric pressure (1.0 atm), ensuring sufficient directional adsorption force to stably capture lightweight, easily suspended ammonium chloride dust (particle size 0.1 μm to 10 μm) within the inner cavity of the housing 100, preventing it from escaping with the exhaust gas. 4 atm serves as the maximum pressure difference threshold, strictly adhering to dual constraints: firstly, when the pressure is released instantaneously, the heat energy converted from this pressure difference is transferred to the dust, resulting in a temperature rise far below the decomposition temperature of ammonium chloride (338°C), preventing the decomposition of dust into corrosive gases such as ammonia and hydrogen chloride, thus ensuring equipment lifespan and process environment safety; secondly, the impact force generated during release does not exceed the connection strength limit between the filter and the collection structure 300, maintaining the sealing and stability of the connection and eliminating the risk of dust leakage or gas leakage.

[0038] In different implementations, to improve operating efficiency and optimize energy consumption, the pressure difference can be further reduced to 1.2 atm to 3 atm (inclusive). Within this reduced range, the minimum pressure difference of 1.2 atm can still meet the power requirements for efficient dust adsorption, while the maximum pressure difference of 3 atm, compared to 4 atm, can reduce the energy consumption of the pressurizing equipment, reduce the wear on the housing 100 seals during pressure regulation, extend the equipment maintenance cycle, and further reduce the impact of sudden pressure changes on the system, thereby improving the stability of long-term operation.

[0039] To further improve the balance between adsorption efficiency, energy consumption cost, and equipment safety, the aforementioned pressure difference is further limited to 1.5 atm to 2.5 atm (inclusive). This range represents the ultimate balance between adsorption efficiency, energy consumption cost, and equipment safety: the minimum pressure difference of 1.5 atm, compared to 1.2 atm, can generate stronger adsorption power, enabling rapid capture even in the face of high-concentration exhaust gas or large-particle dust, preventing dust from suspending and accumulating; the maximum pressure difference of 2.5 atm, under the dual constraints of temperature safety and structural load-bearing capacity, maximizes dust removal efficiency—the directional airflow generated during pressure release has a moderate intensity, ensuring that dust quickly detaches from the inner wall of the housing 100 and enters the collection structure 300, while minimizing energy consumption and equipment wear. At the same time, the pressure difference fluctuation range is smaller, facilitating accurate monitoring by the first pressure sensor and dynamic fine-tuning by the control unit, providing a more stable pressure difference environment for dust adsorption and removal processes, especially suitable for continuous process requirements in large-scale mass production scenarios. In different implementations, the appropriate values ​​can be flexibly selected according to the actual process parameters (such as exhaust gas dust concentration, equipment operating load, epitaxial growth cycle), and this utility model does not impose specific limitations on this.

[0040] Based on the above-mentioned temperature control requirements, the hydride vapor phase epitaxial filter in this application also includes a temperature detection unit. The temperature detection unit is located inside the housing 100, and its core function is to monitor the temperature change inside the housing 100 in real time and accurately. It is a key monitoring component to ensure the safe operation of the filter, process compatibility, and dust treatment effect.

[0041] Specifically, the real-time monitoring function of the temperature detection unit runs through the entire filter's workflow, forming a collaborative guarantee mechanism with the pressure control system: In the third state, temperature data reflects the energy conversion during pressure control. If the temperature inside the housing 100 rises abnormally due to pressure changes during pressurization, it can be promptly fed back to the control unit to prevent the temperature from approaching the decomposition temperature of ammonium chloride (338℃), ensuring that the dust remains solid during subsequent adsorption. In the first state, the unit continuously tracks temperature stability. If local temperature rises due to fluctuations in the exhaust gas input temperature or dust adsorption and accumulation, it can be linked with the pressure control system to fine-tune the pressure difference, preventing excessively high temperatures from causing increased dust deliquescence or adhesion, thus ensuring continuous adsorption efficiency. In the second state, the temperature detection unit can capture the peak temperature change during pressure release in real time. Since instantaneous pressure conversion is accompanied by a small amount of heat release, this data can verify the maximum pressure difference P. B To ensure the rationality of the setting, if the peak temperature is close to the decomposition temperature threshold of ammonium chloride, the opening time of the pressure-resistant stop 200 can be adjusted or the differential pressure parameters can be optimized through the control unit to ensure that the dust does not decompose or produce corrosive gases during the dust discharge process.

[0042] In addition, the hydride vapor phase epitaxial filter described in this application also includes a recovery status monitoring unit, which is disposed inside the hydride vapor phase epitaxial filter and is used to monitor the recovery status of dust inside the housing 100.

[0043] Specifically, the recycling status monitoring unit can achieve quantitative control of the entire recycling process by collecting core data such as dust accumulation thickness, distribution uniformity, and dust removal dynamics. In the first state, the recycling status monitoring unit continuously tracks dust adsorption and accumulation. By monitoring the changing trend of dust accumulation thickness inside the housing 100, it accurately judges the dust enrichment level. For example, when the dust accumulation reaches a preset threshold, it immediately sends a dust removal trigger signal to the control unit to avoid decreased adsorption efficiency, blockage of the flow channel, or increased difficulty in subsequent dust removal due to excessive dust accumulation, ensuring precise control of the cleaning timing. In the second state, the recycling status monitoring unit captures the flow and discharge dynamics of dust in real time. By monitoring changes in dust concentration, dust removal rate, and dust residue inside the housing 100, it verifies the effectiveness of the dust removal process. If a sudden drop in the dust removal rate or dust residue is detected in a local area, it can link the control unit to extend the opening time of the pressure-resistant stop 200, fine-tune the pressure difference parameter, or trigger a secondary dust removal process to ensure that the dust completely leaves the housing 100 and enters the collection structure 300, preventing secondary dust generation or adsorption failure caused by residual dust.

[0044] In addition, the recycling status monitoring unit can detect the dust status before and after cleaning. By comparing the dust residue data before and after cleaning, the deep cleaning effect can be quantitatively evaluated, providing an objective basis for equipment maintenance and ensuring that the filter is always in a highly efficient, thorough and safe operating state.

[0045] Furthermore, the hydride vapor phase epitaxial filter provided in this application embodiment not only enables precise switching between pressure maintenance and instantaneous pressure release, but also supports two cleaning modes—in-situ cleaning and disassembly cleaning—based on the control of the opening / closing states of the air inlet 130 and air outlet 140 on the housing 100, adapting to different scenario requirements. Specifically, in in-situ cleaning mode, the filter does not need to be disconnected from the hydride vapor phase epitaxial equipment. At this time, the connection between the air inlet 130 and the exhaust gas outlet is cut off and sealed, and the exhaust gas outlet of the air outlet 140 is also simultaneously cut off and sealed, completing dust cleaning in a closed environment and avoiding interference with the epitaxial process. In disassembly cleaning mode, both the air inlet 130 and the air outlet 140 are in a closed state, preventing residual dust or toxic gases inside the housing 100 from leaking out, providing a safety guarantee for the overall disassembly and deep cleaning of the filter. Specifically, in the first state, the pressure-resistant stop 200 closes the dust outlet 160, and the internal pressure of the housing 100 is regulated by the pressurization port 150 to create a stable pressure difference between the housing 100 and the collection structure 300, ensuring that the ammonium chloride dust is firmly adsorbed within the housing 100 cavity and prevented from spreading with the exhaust gas. When the dust accumulates to a threshold, the pressure-resistant stop 200 is driven to open instantaneously, and the filter switches to the second state. In this state, the internal pressure of the housing 100 is rapidly released, forming a directional airflow that pushes the dust through the outlet into the collection structure 300, completing efficient cleaning.

[0046] Furthermore, the aforementioned air inlet 130 and pressurization port 150 are both located circumferentially in the housing 100, while the aforementioned air outlet 140 and dust discharge outlet 160 are respectively located at both ends of the housing 100 along the axial direction. The air inlet 130, being circumferentially located in the housing 100, enables uniform introduction of exhaust gas. When HVPE process exhaust gas enters the housing 100, the circumferential layout allows the airflow to form a circulation along the inner wall of the housing 110, avoiding localized airflow concentration caused by single-direction air intake. This allows ammonium chloride dust to be evenly distributed and adsorbed within the housing 100, reducing dust accumulation caused by dead airflow angles. Simultaneously, the pressurization port 150 and air inlet 130 are both circumferentially located, forming a staggered spatial distribution. This avoids direct collision between pressurized airflow and exhaust gas, ensuring a uniform pressure increase within the housing 100 during pressurization, providing a guarantee for stable pressure differential establishment. Moreover, the circumferential arrangement facilitates pipeline layout and equipment integration, reducing the risk of interference with external gas lines and pressurization equipment.

[0047] In addition, the air outlet 140 and the dust discharge outlet 160 are located at opposite ends of the housing 100 along the axial direction, which can form an axial flow splitting function. The air outlet 140 at one end of the axial direction serves as the discharge channel for the filtered clean gas, forming a flow path structure with the circumferential air inlet 130 that enters circumferentially and exits axially, extending the residence time of the exhaust gas in the housing 100, ensuring sufficient dust adsorption, and improving filtration efficiency. The dust discharge outlet 160 at the other end of the axial direction is precisely connected to the conical structure of the guide section 120. With the help of the directionality of the axial airflow, a concentrated airflow along the axial direction is formed when the pressure is released instantaneously, which pushes the dust to be discharged quickly through the guide section 120, avoiding mutual interference between the dust discharge airflow and the exhaust gas filtration flow path. In addition, the layout at both ends of the axis makes the connection between the dust discharge port 160 and the external collection structure 300 more direct, reducing the bends in the dust discharge path and reducing the risk of dust adhesion and residue. At the same time, the spatial separation between the air outlet 140 and the dust discharge port 160 can prevent dust from entering the air outlet 140 in reverse during the dust discharge process, ensuring the cleanliness of the filtered gas.

[0048] Specifically, both the air inlet 130 and the air outlet 140 are equipped with valve bodies. The valve body at the air inlet 130 can precisely control the airflow according to different operating states: In the normal filtration stage, the valve body is fully open to ensure that the HVPE process exhaust gas smoothly enters the inner cavity of the housing 100, providing sufficient processing flow for dust adsorption; when entering the in-situ cleaning mode, the valve body quickly closes and achieves airflow sealing, cutting off the connection between the air inlet 130 and the exhaust gas discharge end, preventing dust or gas from leaking back to external equipment during the cleaning process, while ensuring the airtightness of the inner cavity of the housing 100, creating conditions for pressure regulation and instantaneous dust removal. In the disassembly cleaning mode, the valve body remains closed and sealed to prevent residual dust and toxic gases inside the housing 100 from leaking out during disassembly, ensuring the operational safety of maintenance personnel.

[0049] The valve body at the air outlet 140 serves a dual function: controlling the discharge of clean gas and isolating the air path in the cleaning mode. During normal filtration, the valve body opens simultaneously to allow the clean gas after adsorbing dust to be discharged smoothly, maintaining the unobstructed flow path of the exhaust gas. When switching to the in-situ cleaning mode, the valve body and the valve body at the air inlet 130 close together to achieve complete isolation between the inner cavity of the housing 100 and the external exhaust system. This prevents the airflow from escaping from the air outlet 140 during pressure regulation or dust removal, ensuring that the pressure inside the housing 100 can be quickly established, maintained stably, and released instantaneously, thus guaranteeing cleaning efficiency.

[0050] Furthermore, when the hydride vapor phase epitaxial filter needs to be switched to in-situ cleaning mode, the valves at the inlet 130 and outlet 140 will close simultaneously, achieving complete isolation between the filter and the main gas path of the hydride vapor phase epitaxial equipment. At this time, the hydride vapor phase epitaxial equipment can maintain continuous operation, and the exhaust gas it generates is transported and discharged through a preset bypass path. This bypass path serves as a dedicated alternative path to the main gas path between the filter inlet 130 and outlet 140, and its core function is to ensure the coordinated unity of equipment operation continuity and exhaust gas treatment safety.

[0051] The aforementioned hydride vapor phase epitaxial filter can be cleaned in in-situ cleaning mode without disassembling the equipment or interrupting the process, greatly reducing equipment downtime and ensuring the continuity of epitaxial growth, making it particularly suitable for large-scale mass production scenarios.

[0052] A second exemplary embodiment of this application also provides a cleaning apparatus for a hydride vapor phase epitaxial filter.

[0053] This cleaning device is used to clean the aforementioned hydride vapor phase epitaxial filter, as described above. Figure 2 As shown, the cleaning device includes a pressurizing device 400 and a collection structure 300.

[0054] The aforementioned pressurizing device 400 is connected in a sealed manner to the pressurizing port 150 of the hydride vapor phase epitaxial filter via a pipeline. Its core function is to provide a stable and controllable pressure source for pressure regulation, pressure maintenance, and instantaneous pressure release of the filter. This device has precise pressure output and dynamic adjustment capabilities. It can accurately regulate the pressure inside the housing 100 to a preset first target pressure according to the working requirements of the filter, and can respond to the real-time feedback signal of the first pressure sensor to achieve dynamic fine-tuning of the pressure.

[0055] Specifically, in the first state, the pressurizing device 400 maintains a stable pressure difference to ensure dust adsorption effect; in the third state, the pressurizing device 400 gradually increases the pressure to the target value to avoid sudden pressure changes from impacting the equipment. At the same time, the pressurizing device 400 is also linked with the filter's control unit, and can adjust the pressure output parameters based on feedback data from the temperature detection unit and the recovery status monitoring unit to ensure a balance between cleaning effect and operational safety.

[0056] The collection structure 300 serves as the terminal dust collection component and is precisely connected to the dust discharge outlet 160 of the filter through a sealed pipeline. Its structural design is adapted to the flow guide section 120 and the dust discharge logic depth of the filter. Its core function is to collect the ammonium chloride dust discharged during the cleaning process in a closed manner, avoiding secondary pollution and resource waste.

[0057] Specifically, the aforementioned collection structure 300 may be specially equipped with a sealing interface. This sealing interface is the core component for achieving precise docking between the collection structure 300 and the hydride gas phase epitaxial filter. Its structural design is deeply adapted to the dust discharge port 160 and the pressure-resistant stop 200 of the filter, which not only ensures the sealing and stability of the connection, but also realizes the precise control of the on / off state between the collection structure 300 and the filter housing 100.

[0058] Furthermore, the sealing interface can employ flange connections, threaded seals, or quick-connect sealing structures. The inner side of the interface is equipped with highly sealing materials or structures such as corrosion-resistant gaskets made of fluororubber or polytetrafluoroethylene (PTFE) to form a leak-free, airtight connection after mating. This prevents dust or gas from leaking out of the connection during instantaneous pressure release, while also resisting the erosion of ammonium chloride dust and any trace amounts of corrosive gases, ensuring long-term sealing reliability. In addition, the structural strength of the sealing interface has been precisely calculated to withstand the airflow force generated during the instantaneous release of the maximum pressure difference (PB), preventing loosening or deformation at the connection point and ensuring the stability of the connection. This synergizes with the mechanical load-bearing capacity of the filter housing 100 and the collection structure 300.

[0059] Furthermore, the sealed interface provides a reliable structural basis for the on / off adjustment of the pressure-resistant stop 200, thereby realizing the on / off control between the collection structure 300 and the filter housing 100: when the filter is in the first or third state, the pressure-resistant stop 200 is closed, and the tight connection of the sealed interface keeps the collection structure 300 and the filter housing 100 in a disconnected state, ensuring that the inner cavity of the filter housing 100 can maintain a stable pressure difference environment, creating conditions for dust adsorption; when the filter switches to the second state, the pressure-resistant stop 200 opens instantaneously, and the sealed interface, as the only channel for dust discharge, allows for rapid connection between the collection structure 300 and the filter housing 100, and the directional airflow carries the dust directly into the collection structure 300 through the sealed interface, completing the sealed collection of dust; in the disassembly cleaning mode, the sealed interface can also be quickly disassembled and reassembled, facilitating the cleaning and maintenance of the collection structure 300 or the centralized treatment of dust, while still ensuring a temporary seal at the interface after disassembly to prevent residual dust from leaking out.

[0060] In this embodiment, the above-mentioned collection structure 300 is a dust collection bag. The inside of the dust collection bag is a normal pressure environment (1.0 atm). The dust collection bag has a simple structure and low cost. It can be easily maintained by one-time replacement or repeated cleaning. There is no risk of pressure residue during the disassembly process. It takes into account dust removal efficiency, sealing safety and ease of use. It can be tightly fitted onto the sealing interface.

[0061] In different embodiments, the above-mentioned collection structure 300 can be configured as a dust collection chamber. The dust collection chamber is provided with a pressure regulating port. The pressure regulating port is connected to a negative pressure generating device, which can flexibly adjust the internal environment of the dust collection chamber to a normal pressure or negative pressure state. Furthermore, a second pressure sensor can be configured in the dust collection chamber to monitor the internal pressure data in real time and provide reliable feedback for precise pressure control.

[0062] Specifically, a sealed connection is achieved between the sealed interface and the filter dust outlet 160. The interface is equipped with corrosion-resistant seals to resist airflow impact and dust erosion. The cavity volume and strength have been precisely calculated to adapt to the dust capacity and instantaneous airflow impact requirements of a single dust discharge. When configured for an atmospheric pressure environment, the second pressure sensor verifies the stability of the atmospheric pressure in real time. Driven by the pressure difference of 1.2atm~4atm within the filter housing 100, high-pressure gas and dust quickly rush into the cavity to complete sedimentation and interception. When switching to a negative pressure environment, the negative pressure generating device dynamically adjusts the negative pressure intensity based on the feedback signal from the second pressure sensor to form a stable directional negative pressure, further enhancing the dust discharge power. This is especially suitable for high-concentration dust scenarios, improving the thoroughness of dust discharge. At the same time, the negative pressure environment reduces dust adhesion and residue. Combined with the openable and closable design of the cavity, it enables centralized dust cleaning and reuse, taking into account the adaptability to different process scenarios, the accuracy of pressure control, and the convenience of operation and maintenance.

[0063] Specifically, in this embodiment, in the first state, the pressurizing device 400 can maintain the internal air pressure of the housing 100 at 3.0 atm, so that the pressure difference is stabilized at 2.0 atm, ensuring the dust adsorption effect; in the third state, the pressurizing device 400 can gradually increase the pressure to the target value to avoid sudden pressure changes from impacting the equipment.

[0064] Furthermore, the aforementioned cleaning device also includes a recovery and detection unit, the core function of which is to accurately detect the status of the entire dust recovery process and provide multi-dimensional data support to optimize the cleaning effect. This recovery and detection unit can be configured at the bottom of the collection structure 300 or inside the hydride gas phase epitaxial filter, depending on actual needs.

[0065] In this embodiment, the prize recycling detection unit is set at the bottom of the collection structure 300 to monitor the quality or weight data of the recycled dust in real time. By quantifying the amount of dust accumulation, the collection structure 300 can be accurately judged to determine its saturation level, and a cleaning or replacement warning can be issued in a timely manner to avoid secondary pollution caused by dust overflow.

[0066] In other embodiments, if configured inside a hydride vapor phase epitaxial filter, it can collect real-time information on the thickness of remaining dust within the housing 100, directly reflecting the thoroughness of the dust removal process. When the thickness of remaining dust exceeds a preset threshold, a secondary dust removal process can be triggered or the system can switch to a deep cleaning mode to ensure no dust residue remains inside the filter, guaranteeing subsequent filtration efficiency and equipment operational stability. Both configuration options can be flexibly selected according to actual process requirements, achieving dual control over the amount of dust collected at the dust recovery terminal and the amount of residue at the source, providing reliable data support for the closed-loop operation of the cleaning device.

[0067] In summary, the hydride vapor phase epitaxial filter and filter cleaning device provided in this embodiment of the invention achieve stable buffering of ammonium chloride dust through a stable pressure difference between the housing and the collection structure in the first state. In the second state, the pressure-resistant stop instantly opens to form a directional airflow impact force, which quickly impacts the dust in the filter into the collection structure. During this process, the pressure energy is converted into heat energy, which also promotes the transformation of some deliquescent ammonium chloride in the filter into a drier state, making it easier to detach from the inner wall of the cavity. This reduces the adhesion of deliquescent ammonium chloride in the cavity and improves the cleaning effect of the filter. Thus, it can efficiently blow the dust attached to the inner wall and the surface of the filter components into the collection structure without affecting the corresponding gas of the hydride vapor phase epitaxial equipment. This system effectively solves the problems of dust accumulation, environmentally unfriendly cleaning, and time-consuming and labor-intensive cleaning associated with traditional equipment. Dust removal efficiency is significantly improved compared to conventional manual cleaning. It also avoids direct contact by operators, eliminating safety risks and reducing human intervention to mitigate potential hazards and errors caused by improper operation. Furthermore, the filter cleaning process does not interfere with key process parameters such as temperature, pressure, and gas composition within the chamber, preventing external impurities from entering and secondary dust pollution. This ensures the stability of the gallium nitride epitaxial growth environment, avoids material defects caused by process fluctuations, and reduces maintenance costs. Ultimately, it achieves a comprehensive improvement in dust removal efficiency, operational safety, process compatibility, and material quality assurance, providing a highly efficient and stable exhaust gas treatment solution for gallium nitride epitaxial growth processes.

[0068] Obviously, the above embodiments are merely illustrative examples for clear explanation and are not intended to limit the implementation. Those skilled in the art will recognize that other variations or modifications can be made based on the above description. It is neither necessary nor possible to exhaustively list all possible implementations here. However, obvious variations or modifications derived therefrom are still within the protection scope of this invention.

Claims

1. A hydride vapor phase epitaxial filter, characterized in that, The hydride vapor phase epitaxy filter is used to connect to the hydride vapor phase epitaxy equipment and filter the exhaust gas, and the hydride vapor phase epitaxy filter includes: The housing has a pressurization port and a dust discharge port. The pressurization port is used to connect to an external pressurization device, and the dust discharge port is used to connect to an external collection structure. A pressure-resistant stop is provided in the dust discharge outlet to adjust the opening and closing of the dust discharge outlet.

2. The hydride vapor phase epitaxial filter according to claim 1, characterized in that, The housing is provided with an air inlet and an air outlet. The air outlet and the dust discharge outlet are respectively located at both ends of the housing along the axial direction. A valve body is provided in both the air inlet and the air outlet.

3. The hydride vapor phase epitaxial filter according to claim 2, characterized in that, Both the air inlet and the pressurization port are located circumferentially on the housing.

4. The hydride vapor phase epitaxial filter according to claim 1, characterized in that, The housing includes a receiving body and a flow guide. The flow guide is disposed at one end of the receiving body along the axial direction. The port of the flow guide is the dust discharge outlet. The sidewall of the flow guide gradually decreases in size along the direction toward the dust discharge outlet, forming a conical transition wall.

5. The hydride vapor phase epitaxial filter according to any one of claims 1-4, characterized in that, The hydride vapor phase epitaxial filter is also equipped with at least one of a first pressure sensor, a temperature detection unit, or a recovery status monitoring unit.

6. A hydride vapor phase epitaxial filter cleaning device, characterized in that, Cleaning the hydride vapor phase epitaxial filter according to any one of claims 1 to 5 includes: A pressurizing device, wherein the pressurizing device is connected to the pressurizing port of the hydride vapor phase epitaxial filter; A collection structure is provided, which is connected to the dust discharge outlet of the hydride vapor phase epitaxial filter.

7. The cleaning device according to claim 6, characterized in that, The collection structure is provided with a sealed interface for connecting to the dust outlet, so as to adjust the flow between the collection structure and the housing of the hydride vapor phase epitaxial filter by the pressure-resistant stop of the hydride vapor phase epitaxial filter.

8. The cleaning device according to claim 6, characterized in that, The collection structure is a dust collection bag or a dust collection chamber. The dust collection chamber is provided with a pressure regulating port, which is connected to a negative pressure generating device. A second pressure sensor is provided inside the dust collection chamber.

9. The cleaning device according to claim 6, characterized in that, The cleaning device also includes a recycling detection unit located at the bottom of the collection structure.

10. The cleaning device according to claim 6, characterized in that, The cleaning device also includes a recovery detection unit located inside the hydride vapor phase epitaxial filter.

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