Plasma ball mill jar and plasma ball mill

Abstract

The application relates to the technical field of plasma ball mills, in particular to a plasma ball mill tank and a plasma ball mill. The ball mill tank comprises a first tank body and a discharge assembly. The first tank body is formed of an insulating material and comprises an electrode groove and an inner cavity. The electrode groove is arranged inside the tank wall of the tank body and is independent of and not communicated with the inner cavity. The discharge assembly comprises an electrode arranged in the electrode groove. Since the electrode groove is arranged in the tank wall of the first tank body, the electrode does not occupy the space of the inner cavity. In this way, the electrode can avoid affecting the capacity of the ball mill tank for containing materials to be processed, thereby ensuring the processing capacity of the ball mill tank for the materials to be processed. When the grinding balls in the ball mill tank are forced to vibrate, the grinding balls cannot collide with the electrode, so that the loss of the vibration mechanical energy of the grinding balls can be reduced.

Description

Technical Field

[0001] This application relates to the field of plasma ball mill technology, and more particularly to a plasma ball mill jar and a plasma ball mill. Background Technology

[0002] A plasma ball mill is a highly efficient grinding device, commonly used for operations such as crushing, mixing, homogenization, and mechanical alloying. A typical plasma ball mill jar consists of a jar body and electrode rods. The jar body houses the grinding balls and the material to be processed. The electrode rods are mounted on the jar body, with parts of the rods extending into the jar's interior. The electrode rods are electrically connected to a plasma power source, the jar body is grounded, and the jar is filled with a protective gas. Under the potential difference between the electrode rods and the jar body, plasma can be generated within the jar body through ionization.

[0003] The electrode rods occupy internal space within the plasma ball mill jar, reducing the space available for loading the material to be processed and the grinding balls. This affects the jar's batch processing capacity and restricts the forced vibration space of the grinding balls, thus impacting contact between the grinding balls and the material. During operation, the mechanical energy of the grinding balls is lost due to collisions with the electrode rods; some of the grinding balls' mechanical energy is converted into heat and dissipated. Furthermore, some material may adhere to the electrode rods due to moisture, static electricity, or adsorption from the micropores on the rod surface. Additionally, some material may react with and corrode the electrode rod's insulation layer, posing a risk of breakdown and ablation, ultimately affecting the plasma ball mill jar's discharge performance and lifespan. Utility Model Content

[0004] To address the aforementioned problems, this utility model provides a plasma ball milling jar and a plasma ball mill.

[0005] In a first aspect, embodiments of this application provide a plasma ball milling jar, comprising: The first tank is a structure formed of insulating material. The first tank includes an electrode groove and an inner cavity. The electrode groove is disposed inside the tank wall of the first tank, and the electrode groove and the inner cavity are independent of each other and not connected. The inner cavity is used to accommodate the material to be processed and the grinding balls. A discharge assembly, the discharge assembly including electrodes disposed within the electrode groove.

[0006] Optionally, the electrode slot includes a positive electrode slot and a negative electrode slot, and the electrode includes a positive electrode and a negative electrode. The positive electrode is disposed in the positive electrode slot, and the negative electrode is disposed in the negative electrode slot. The positive electrode is used to be electrically connected to the plasma power supply, and the negative electrode is used to be grounded.

[0007] Optionally, the first tank body includes a first tank wall and a second tank wall, the second tank wall being embedded in the first tank wall, and the electrode groove being disposed at the first tank wall and / or the second tank wall.

[0008] Optionally, the positive electrode groove and the negative electrode groove extend along the axial direction of the first tank body. At least two positive electrode grooves and negative electrode grooves are provided and are staggered along the circumference of the first tank body. At least two positive electrode grooves are provided with one positive electrode, and at least two negative electrode grooves are provided with one negative electrode.

[0009] Optionally, the discharge assembly includes a first conductive structure, one of which is connected to all of the positive electrodes or all of the negative electrodes; The first conductive structure is provided in two parts: one first conductive structure is connected to all the positive electrodes, and the other first conductive structure is connected to all the negative electrodes.

[0010] Optionally, the inner wall of the first tank is provided with a manifold, one of the manifolds being connected to all of the positive electrode slots or all of the negative electrode slots, or; There are two manifolds, one of which is connected to all the positive electrode slots, and the other of which is connected to all the negative electrode slots.

[0011] Optionally, the discharge assembly includes a second conductive structure having a first connection portion and a second connection portion; the first connection portion is connected to the first conductive structure, and the second connection portion is used for electrical connection with the plasma power supply or for grounding, or; The second conductive structure is provided in two parts: the second connecting part of one second conductive structure is used for electrical connection with the plasma power supply, and the second connecting part of the other second conductive structure is used for grounding.

[0012] Optionally, the plasma ball mill jar includes a first cover; The first cover is connected to the first tank body, and the first cover is a structure formed of insulating material; a connecting groove is provided inside the first cover, the connecting groove connects the manifold to the external environment, and the second conductive structure is disposed in the connecting groove.

[0013] Optionally, the first cover includes a first cover plate and a second cover plate, the first cover plate and the second cover plate are arranged along the axial direction of the first tank, and the first cover plate is located between the second cover plate and the first tank. The connecting groove includes a main body, a first through part, and a second through part. The main body is located at the first cover plate and / or the second cover plate. The first through part is disposed through the first cover plate and connects the main body with the confluence groove. The first connecting part is embedded in the first through part. The second through part is disposed through the second cover plate and connects the main body with the external environment. The second connecting part is embedded in the second through part.

[0014] Optionally, the plasma ball mill jar includes a second jar body, a second cover body, and fasteners; The first tank is embedded in the second tank, the first cover and the second cover are arranged along the axial direction of the first tank, and the first cover is located on the side of the second cover facing the first tank; the fastener passes through the first cover and is connected to the second cover and the second tank respectively.

[0015] Optionally, the plasma mill jar includes a third jar body; The third tank is a structure formed of conductive material, the first tank is embedded in the third tank, the electrode is used to electrically connect to the plasma power supply, and the third tank is used to ground.

[0016] Secondly, embodiments of this application provide a plasma ball mill, the plasma ball mill including a plasma power supply and any of the plasma ball milling jars described in the first aspect, wherein the plasma power supply is electrically connected to at least a portion of the electrodes of the plasma ball milling jar.

[0017] In some implementations of this application, the plasma grinding jar includes a discharge assembly and a first jar body made of insulating material. Electrode grooves are provided within the jar wall of the first jar body, and electrodes from the discharge assembly are disposed within these electrode grooves. The inner cavity of the first jar body is used to accommodate the material to be processed and the grinding balls; the inner cavity and the electrode grooves are independent and not connected.

[0018] Since the electrode slots are all located within the wall of the first chamber, the electrodes do not occupy the space of the internal cavity. This prevents the electrodes from affecting the plasma grinding jar's capacity to hold the material to be processed, thus ensuring the plasma grinding jar's batch processing capacity. Simultaneously, the grinding balls inside the plasma grinding jar will not collide with the electrodes during forced vibration, thereby reducing the loss of the grinding balls' vibrational mechanical energy and facilitating contact between the grinding balls and the material to be processed, thus improving the processing efficiency of the plasma grinding jar. Because the electrode slots and internal cavity are independent and not interconnected, the electrodes will not contact the material to be processed. This prevents the material to be processed from adhering to the electrodes and also avoids contact between the material and the electrodes. This helps ensure the discharge performance and service life of the plasma grinding jar.

[0019] Additional aspects and advantages of this application will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of this application. Attached Figure Description

[0020] The above and / or additional aspects and advantages of this application will become apparent and readily understood from the description of the embodiments taken in conjunction with the following drawings, in which: Figure 1 This is an isometric view of the plasma ball mill jar described in some embodiments of this application; Figure 2 yes Figure 1 A front view along the radial direction of the first tank body; Figure 3 yes Figure 2 Sectional view along AA; Figure 4 yes Figure 2 A cross-sectional view along BB; Figure 5 This is an isometric view of the second tank wall described in some embodiments of this application; Figure 6 This is an isometric view of the first tank wall described in some embodiments of this application; Figure 7 This is a schematic diagram showing the connection of the first cover, the second cover, and the second tank as described in some embodiments of this application; Figure 8 This is an isometric view of the plasma ball mill jar described in some embodiments of this application; Reference numerals: 1. First tank body; 1a. First tank wall; 1b. Second tank wall; 11. Electrode groove; 11a. Positive electrode groove; 11b. Negative electrode groove; 12. Inner cavity; 13. Combination groove; 14. Sealing groove; 2. Discharge assembly; 21. Electrode; 21a. Positive electrode; 21b. Negative electrode; 22. First conductive structure; 23. Second conductive structure; 231. First connecting part; 232. Second connecting part; 3. First cover body; 3a. First cover plate; 3b. Second cover plate; 31. Connecting groove; 311. Main body; 312. First through part; 313. Second through part; 32. Through hole; 4. Second tank body; 41. Cylinder part; 42. Flange part; 421. Second connecting hole; 5. Second cover body; 51. First connecting hole; 6. Fastener; 7. Third tank body; 8. Seal. Detailed Implementation

[0021] The embodiments of this utility model will now be described in detail. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this utility model, and should not be construed as limiting this utility model. All other embodiments obtained by those skilled in the art based on the embodiments in this application without inventive effort are within the scope of protection of this application.

[0022] Plasma ball mills are highly efficient powder processing equipment, primarily used for processes such as pulverization, mixing, homogenization, and mechanical alloying. On one hand, high-frequency vibration generates intense impact, friction, and shear forces within the plasma grinding jar using grinding media (such as steel balls or ceramic balls), thereby pulverizing and mixing the materials to be processed. On the other hand, electrical discharge occurs within the plasma grinding jar, creating plasma. Plasma is an ionized gas containing high-energy electrons, ions, active free radicals, and ultraviolet radiation, exhibiting high chemical activity and energy. When plasma bombards the surface of the material being processed, it can remove oxides or contaminants from the particle surface, exposing fresh active sites. Simultaneously, plasma can also introduce lattice defects such as vacancies and dislocations into the material, thereby lowering the energy threshold for mechanical processing such as ball milling. The synergistic effect of plasma bombardment and ball milling significantly improves the material processing efficiency of plasma ball mills. Furthermore, plasma ball mills can also achieve grain refinement and specific functional modification.

[0023] Existing plasma ball mills typically consist of a jar body and electrode rods. The jar body houses the grinding balls and the material to be processed. The electrode rods are mounted on the jar body, with a portion of the rods extending into the jar's interior. The electrode rods serve as the positive electrode, electrically connected to the plasma power supply, while the jar body serves as the negative electrode, grounded. To prevent the material to be processed from connecting the electrode rods and the jar body, thus avoiding a short circuit, and to increase the creepage distance between the jar body and the electrodes, an insulating structure can be installed on the outside of the electrode rods. This insulating structure can be an insulating layer coated on the electrode surface, such as a Teflon layer, or an insulating shell, such as a ceramic shell, surrounding the electrodes. The jar body is filled with a protective gas, typically a stable gas such as nitrogen or helium. During use, the jar body is first evacuated before being filled with the protective gas, and then a high-voltage current is supplied to the electrode rods using the plasma power supply. Under the influence of the potential difference between the electrode rods and the jar body, plasma is generated inside the jar body through ionization.

[0024] However, in existing plasma ball milling jars, the electrode rods occupy internal space. Without changing the jar volume, the electrode rods reduce the space available for loading the material to be processed and the grinding balls, thus affecting the plasma ball milling jar's batch processing capability.

[0025] On the other hand, the electrode rods also restrict the movement space of the grinding balls within the plasma grinding jar, thus affecting the contact between the grinding balls and the material being processed. During operation, the mechanical energy of the grinding balls is also lost due to collisions with the electrode rods; that is, some of the mechanical energy of the grinding balls is converted into heat and dissipated. This significantly impacts the processing efficiency and quality of the plasma grinding jar when processing materials.

[0026] During processing, some of the material to be processed may adhere to the electrode rod due to moisture, static electricity, or adsorption from the micropores on the electrode rod surface, affecting the discharge of the electrode rod. Furthermore, some of the material may react with and corrode the insulating layer of the electrode rod. This can easily lead to breakdown and ablation of the electrode rod's insulating layer, ultimately affecting the discharge performance and service life of the plasma ball mill jar.

[0027] To address the aforementioned issues, embodiments of this application provide a plasma ball mill jar and a plasma ball mill.

[0028] In a first aspect, embodiments of this application provide a plasma grinding jar, which specifically includes a first jar body 1 and a discharge assembly 2. Figure 1 The outline of the plasma ball mill jar is shown in some embodiments of this application.

[0029] refer to Figure 2 The cut position shown and Figure 3 The first tank 1 is a container used to hold the material to be processed and the grinding balls. The first tank 1 has an inner cavity 12. During processing, the material to be processed and the grinding balls are filled into the inner cavity 12 of the first tank 1 and vibrate with the vibration of the first tank 1. The volume and shape of the first tank 1 are generally designed according to the characteristics of the material to be processed, and can be cylindrical, cubic, or other special shapes. In some embodiments described in this application, the first tank 1 is a cylindrical structure with a cylindrical inner cavity 12.

[0030] refer to Figure 2 The cut position shown and Figure 4The first tank 1 is a structure formed of insulating material. Preferably, the first tank 1 is made of insulating ceramic material. Because ceramic material has high purity, it is less likely to produce impurities that can mix into the material being processed during processing. Therefore, using insulating ceramic as the first tank 1 helps ensure the purity of the material after processing. An electrode groove 11 is formed inside the tank wall of the first tank 1. The electrode groove 11 is independent of and does not communicate with the inner cavity 12. In some embodiments described in this application, the electrode groove 11 is preferably a rectangular groove. That is, the cross-section of the electrode groove 11 is rectangular along its extension direction. The extension direction of the electrode groove 11 is the same as the axial direction of the first tank 1, and the depth direction of the electrode groove 11 is radially arranged along the first tank 1. Alternatively, the extension direction of the electrode groove 11 can also be inclined relative to the axial direction of the first tank 1, and the depth direction of the electrode groove 11 can also be inclined relative to the radial direction of the first tank 1. Besides rectangular grooves, the cross-sectional shape of the electrode groove 11 in its extension direction can also be circular, triangular, or even irregular. The specific shape of the electrode groove 11 can be set according to actual needs, and will not be described in detail here.

[0031] refer to Figure 4 The discharge assembly 2 includes an electrode 21. In some embodiments described in this application, the electrode 21 is a conductive structure made of conductive metals such as copper or aluminum. The electrode 21 can be a rod-shaped structure, a sheet-shaped structure, a strip-shaped structure, etc., which will not be elaborated here.

[0032] refer to Figure 4 Since the electrode groove 11 is located inside the wall of the first tank 1, the electrode 21 does not occupy the space of the inner cavity 12. In other words, the arrangement of the electrode 21 does not reduce the volume of the inner cavity 12 of the first tank 1. This avoids the electrode 21 affecting the batch processing capacity of the plasma ball mill jar for the materials to be processed. Under the same volume, the above structure can increase the number of materials that the plasma ball mill jar can process.

[0033] Since electrode 21 and inner cavity 12 are independent and not connected, the grinding balls inside the plasma grinding jar will not collide with electrode 21 when subjected to forced vibration. This reduces the loss of mechanical energy from the vibration of the grinding balls and also facilitates contact between the grinding balls and the material to be processed, thus effectively improving the processing efficiency of the plasma grinding jar.

[0034] With the barrier of the first tank 1, the electrode 21 located in the electrode groove 11 will not come into contact with the material to be processed. This can prevent the material to be processed from adhering to the electrode 21 due to moisture, electrostatic adsorption, microporous adsorption, etc. Compared with existing grinding jars, this is beneficial to ensuring the discharge performance and service life of the plasma grinding jar.

[0035] refer to Figure 4In some embodiments of this application, optionally, the electrode tank 11 includes a positive electrode tank 11a and a negative electrode tank 11b. Correspondingly, the electrode 21 includes a positive electrode 21a and a negative electrode 21b. The positive electrode 21a is disposed in the positive electrode tank 11a and is used for electrical connection with the plasma power supply, while the negative electrode 21b is disposed in the negative electrode tank 11b and is used for grounding. Since the positive electrode tank 11a and the negative electrode tank 11b are both formed in the tank wall of the first tank 1 made of insulating material and are not connected, the positive electrode 21a and the negative electrode 21b are mutually insulated and isolated. In use, a stable voltage difference can be generated between the positive electrode 21a and the negative electrode 21b, so that plasma can be stably ionized and generated in the inner cavity 12 of the first tank 1.

[0036] refer to Figure 3 In some embodiments of this application, optionally, the first tank 1 includes a first tank wall 1a and a second tank wall 1b, with the second tank wall 1b embedded within the first tank wall 1a. In other words, the first tank 1 is a separate structure in which the first tank wall 1a and the second tank wall 1b are nested together, and the first tank wall 1a and the second tank wall 1b together constitute the tank wall of the first tank 1. An electrode groove 11 is disposed between the first tank wall 1a and the second tank wall 1b. Specifically, the electrode groove 11 can be located on the side of the first tank wall 1a facing the second tank wall 1b, or on the side of the second tank wall 1b facing the first tank wall 1a. Alternatively, part of the electrode groove 11 is located at the first tank wall 1a, and another part of the electrode groove 11 is located at the second tank wall 1b, with the first tank wall 1a and the second tank wall 1b nested together to form a complete electrode groove 11. Alternatively, when multiple electrode grooves 11 are provided, several electrode grooves 11 are disposed at the first tank wall 1a, and the remaining electrode grooves 11 are disposed at the second tank wall 1b.

[0037] Because the first tank body 1 adopts a split structure, the electrode groove 11 can be formed simultaneously when the first tank wall 1a and / or the second tank wall 1b are machined. The nesting of the first tank wall 1a and the second tank wall 1b ensures that the electrode groove 11 is located inside the tank wall of the first tank body 1. Compared to a one-piece structure where the electrode groove 11 is directly machined on the one-piece first tank body 1, this method facilitates the machining of the electrode groove 11. When using brittle insulating materials such as ceramics to form the first tank body 1, this reduces the risk of cracking and thus lowers the machining difficulty of the first tank body 1.

[0038] refer to Figure 5 , Figure 6Specifically, in some embodiments of this application, both the first can wall 1a and the second can wall 1b are cylindrical structures. The second can wall 1b forms the aforementioned inner cavity 12, and the inner diameter of the first can wall 1a is the same as the outer diameter of the second can wall 1b. The first can wall 1a is fitted around the outer periphery of the first can wall 1a, or in other words, the second can wall 1b is inserted into the first can wall 1a. The positive electrode groove 11a and the negative electrode groove 11b are formed on the cylindrical surface of the second can wall 1b facing the first can wall 1a. The extending direction of the positive electrode groove 11a and the negative electrode groove 11b is the same as the axial direction of the second can wall 1b, and the depth direction of the positive electrode groove 11a and the negative electrode groove 11b is the same as the radial direction of the second can wall 1b. Both the positive electrode 21a and the negative electrode 21b are copper strips. The positive electrode 21a is embedded in the positive electrode groove 11a and is tightly fitted with the positive electrode groove 11a; the negative electrode 21b is embedded in the negative electrode groove 11b and is tightly fitted with the negative electrode groove 11b.

[0039] refer to Figure 4 In some embodiments of this application, optionally, both the positive electrode groove 11a and the negative electrode groove 11b extend along the axial direction of the first tank body 1, and at least two positive electrode grooves 11a and at least two negative electrode grooves 11b are provided, and they are arranged alternately in a positive-negative-positive-negative manner along the circumference of the first tank body 1. At least two positive electrode grooves 11a each contain a positive electrode 21a, and at least two negative electrode grooves 11b each contain a negative electrode 21b. In the embodiments described in this application, the number of positive electrode grooves 11a and negative electrode grooves 11b can be set according to actual needs. For example, two, three, four, or even more positive electrode grooves 11a and negative electrode grooves 11b can be provided, and correspondingly, the number of positive electrodes 21a and negative electrodes 21b can also be two, three, four, or even more. This allows for the formation of a three-dimensional discharge network within the plasma grinding jar, ensuring the consistency and uniformity of the discharge effect. This, in turn, helps guarantee a uniform plasma distribution within the jar, ensuring that the material being processed receives consistent plasma action during the process. Furthermore, the presence of at least two positive electrodes 21a and at least two negative electrodes 21b also helps to distribute the load pressure, preventing overheating and damage to the positive and negative electrodes 21a and 21b due to concentrated discharge current.

[0040] refer to Figure 3In some embodiments of this application, optionally, the discharge assembly 2 includes a first conductive structure 22. Only one first conductive structure 22 may be provided, in which case the first conductive structure 22 is connected to all positive electrodes 21a or all negative electrodes 21b. Alternatively, two first conductive structures 22 may be provided, one connected to all positive electrodes 21a and the other connected to all negative electrodes 21b. This provides convenient connection for the electrical connection of the positive electrodes 21a to the plasma power source and / or the grounding of the negative electrodes 21b, and simplifies the connection structure. Specifically, when the first conductive structure 22 is connected to all positive electrodes 21a, only an electrical connection between the first conductive structure 22 and the plasma power source is needed to ensure that all positive electrodes 21a are energized. When the first conductive structure 22 is connected to all negative electrodes 21b, only grounding of the first conductive structure 22 is needed to ground all negative electrodes 21b. Furthermore, connecting all positive electrodes 21a to a first conductive structure 22, or connecting all negative electrodes 21b to a first conductive structure 22, helps ensure the potential synchronization of all positive electrodes 21a or all negative electrodes 21b. This eliminates voltage deviations between adjacent electrodes and ensures the uniformity of discharge in the plasma grinding jar.

[0041] refer to Figure 3 Specifically, in some embodiments of this application, the first conductive structure 22 is a copper conductive ring. All positive electrodes 21a and all negative electrodes 21b are staggered along the axial direction of the first tank 1. Specifically, along the axial direction of the first tank 1, the first tank 1, the positive electrodes 21a, and the negative electrodes 21b each have a first end and a second end. The first end of all positive electrodes 21a is closer to the first end of the first tank 1 than the first end of the negative electrodes 21b, and the second end of all positive electrodes 21a is farther from the second end of the first tank 1 than the second end of the negative electrodes 21b. Two first conductive structures 22 are provided. One first conductive structure 22 is fitted onto the first end of all positive electrodes 21a for connection to all positive electrodes 21a. The other first conductive structure 22 is fitted onto the second end of all negative electrodes 21b for connection to all negative electrodes 21b.

[0042] refer to Figure 6 In some embodiments of this application, optionally, a manifold 13 is provided inside the tank wall of the first tank 1, as shown in the reference. Figure 3The first conductive structure 22 is disposed within the manifold 13. The manifold 13 is connected to all positive electrode slots 11a, or the manifold 13 is connected to all negative electrode slots 11b. Two manifolds 13 may also be provided, one connected to all positive electrode slots 11a and the other connected to all negative electrode slots 11b. This provides structural convenience for connecting the first conductive structure 22 to the positive and negative electrodes 21a and 21b, and also allows for insulation protection of the first conductive structure 22 using the tank wall of the first tank body 1.

[0043] Specifically, in some embodiments of this application, along the axial direction of the first tank body 1, the first tank wall 1a, the positive electrode groove 11a, and the negative electrode groove 11b have a first end and a second end. A manifold 13 can be formed on the side of the first tank wall 1a facing the second tank wall 1b, and a manifold 13 is respectively provided at the first end and the second end of the first tank wall 1a. The first end of the positive electrode groove 11a communicates with the manifold 13 located at the first end of the first tank wall 1a, and the second end of the positive electrode groove 11a is spaced apart from the manifold 13 located at the second end of the first tank wall 1a. The first end of the negative electrode groove 11b is spaced apart from the manifold 13 located at the first end of the first tank wall 1a, and the second end of the negative electrode groove 11b communicates with the manifold 13 located at the second end of the first tank wall 1a.

[0044] refer to Figure 3In some embodiments of this application, optionally, the discharge assembly 2 includes a second conductive structure 23. The second conductive structure 23 has a first connecting portion 231 and a second connecting portion 232. The first connecting portion 231 is connected to the first conductive structure 22, and the second connecting portion 232 is used for electrical connection to the plasma power supply or for grounding. Specifically, in some embodiments of this application, only one second conductive structure 23 may be provided. The first connecting portion 231 of the second conductive structure 23 is connected to the first conductive structure 22 connected to the positive electrode 21a, and the second connecting portion 232 of the second conductive structure 23 is used for connection to the plasma power supply. Alternatively, the first connecting portion 231 of the second conductive structure 23 is connected to the first conductive structure 22 connected to the negative electrode 21b, and the second connecting portion 232 of the second conductive structure 23 is used for grounding. Two second conductive structures 23 may also be provided, in which case the first connecting portion 231 of one of the second conductive structures 23 is connected to the first conductive structure 22 connected to the positive electrode 21a, and the second connecting portion 232 is used for connection to the plasma power supply. Another second conductive structure 23 has a first connecting portion 231 connected to the first conductive structure 22 connected to the negative electrode 21b, and the second connecting portion 232 is used for grounding. The provision of the second conductive structure 23 can facilitate the connection of the first conductive structure 22 to the plasma power supply, or the grounding of the first conductive structure 22. In other words, the second conductive structure 23 provides a connection point for the plasma ball mill jar to be connected to the plasma power supply or grounded. With the connection of the second conductive structure 23, the positive electrode 21a can be more easily electrically connected to the plasma power supply, and the negative electrode 21b can be more easily grounded.

[0045] refer to Figure 3 The second conductive structure 23 can have various specific configurations. In some embodiments of this application, preferably, the second conductive structure 23 includes a conductive plate and conductive bolts connected to the conductive plate. The conductive bolts serve as a second connecting part 232 for grounding or connection to a plasma power source, and a portion of the conductive plate serves as a first connecting part 231 connected to the first conductive structure 22. The shape of the conductive plate can be configured according to actual needs. For example, the conductive plate may include a circular sheet, the thickness direction of which is the same as the axial direction of the first tank 1. The side of the circular sheet facing the first tank 1 has one, two, three, or even more protrusions, which serve as the first connecting part 231 connected to the first conductive structure 22.

[0046] refer to Figure 3In some embodiments of this application, optionally, the plasma grinding jar includes a first cover 3 formed of insulating material, which is connected to the first jar body 1. Preferably, the first cover 3 and the first jar body 1 are made of the same material, for example, the first cover 3 and the first jar body 1 are made of the same ceramic material. A connecting groove 31 is provided inside the first cover 3, which connects the manifold 13 to the external environment, and the second conductive structure 23 is disposed in the connecting groove 31. This provides structural convenience for the connection between the second conductive structure 23 and the first conductive structure 22, and at the same time, it also allows the first cover 3 to achieve insulation protection for the second conductive structure 23.

[0047] Specifically, in some embodiments of this application, the first tank 1 is a cylindrical structure, and two first covers 3 are provided, with each end of the first tank 1 connected to a first cover 3 along its own axial direction. A second conductive structure 23 is embedded within each of the two first covers 3. One of the second conductive structures 23 is connected to the first conductive structure 22 connected to the positive electrode 21a, and also serves as an electrical connection to the plasma power supply. The other second conductive structure 23 is connected to the first conductive structure 22 connected to the negative electrode 21b, and also serves as a grounding element. To ensure sealing, a sealing element 8 can be provided between the end of the first tank 1 and the first cover 3. Specifically, the sealing element 8 can be a sealing ring; correspondingly, a sealing groove 14 can be provided at the end of the first tank 1 to accommodate the sealing element 8.

[0048] refer to Figure 3 In some embodiments of this application, optionally, the first cover 3 includes a first cover plate 3a and a second cover plate 3b. The shapes of the first cover plate 3a and the second cover plate 3b can be set according to actual needs. For example, the first cover plate 3a and the second cover plate 3b can be rectangular plate structures.

[0049] The first cover plate 3a and the second cover plate 3b are arranged along the axial direction of the first tank body 1, with the first cover plate 3a located between the second cover plate 3b and the second tank wall 1b. Correspondingly, the connecting groove 31 includes a main body portion 311, a first through portion 312, and a second through portion 313. The main body portion 311 is located on the first cover plate 3a and / or the second cover plate 3b. Specifically, the main body portion 311 can be located on the side of the first cover plate 3a facing the second cover plate 3b, or it can be formed on the side of the second cover plate 3b facing the first cover plate 3a. Alternatively, part of the main body portion 311 is formed on the first cover plate 3a, and the other part is formed on the second cover plate 3b. After the first cover plate 3a and the second cover plate 3b are combined, the main body portion 311 is formed between the first cover plate 3a and the second cover plate 3b.

[0050] refer to Figure 3The first through portion 312 is disposed through the first cover plate 3a and connects the main body 311 and the junction channel 13. The first connecting portion 231 is embedded in the first through portion 312. The second through portion 313 is disposed through the second cover plate 3b and connects the main body 311 and the external environment. The second connecting portion 232 is embedded in the second through portion 313. The shapes of the main body 311, the first through portion 312, and the second through portion 313 can be specifically set according to the shape of the second conductive structure 23, which will not be described in detail here.

[0051] Since the first cover 3 is a split structure formed by combining the first cover plate 3a and the second cover plate 3b, the main body 311, the first through part 312, and the second through part 313 can be formed simultaneously during the processing of the first cover plate 3a and the second cover plate 3b. The combination of the first cover plate 3a and the second cover plate 3b ensures that the main body 311, the first through part 312, and the second through part 313 are located inside the first cover 3. This facilitates the processing of the main body 311, the first through part 312, and the second through part 313. When using brittle insulating materials such as ceramics to form the first cover 3, this reduces the risk of cracking and thus lowers the processing difficulty of the first cover 3.

[0052] refer to Figure 7 In some embodiments of this application, optionally, the plasma grinding jar includes a second jar body 4, a second cover 5, and fasteners 6. The first jar body 1 is embedded within the second jar body 4. The first cover 3 and the second cover 5 are arranged axially along the first jar body 1, with the first cover 3 located on the side of the second cover 5 facing the first jar body 1. Fasteners 6 pass through the first cover 3 and are connected to the second cover 5 and the second jar body 4 respectively, so that the first cover 3 can be stably fixed between the second cover 5 and the second jar body 4. The materials of the second jar body 4 and the second cover 5 can be selected according to actual needs; for example, the second jar body 4 and the second cover 5 can be structures made of stainless steel. Fasteners 6 can be bolts and nuts, or screws, rivets, etc. When the first jar body 1 and the first cover 3 are made of brittle insulating materials such as ceramics, directly connecting the first jar body 1 and the first cover 3 with fasteners 6 can easily cause the first jar body 1 and the first cover 3 to crack and break. Therefore, by setting up a second can 4 and a second cover 5, and connecting the fastener 6 to the second can 4 and the second cover 5, damage to the first can 1 and the first cover 3 can be prevented by the fastener 6. In addition, the second can 4 and the second cover 5 can also protect the first can 1 and the first cover 3 to prevent damage during use.

[0053] refer to Figure 7Specifically, in some embodiments of this application, the second tank 4 includes a cylindrical portion 41 and a flange portion 42. Two flange portions 42 are provided, one at each end of the cylindrical portion 41. The first tank 1 is embedded in the cavity of the cylindrical portion 41. A first cover 3 is disposed between the flange portion 42 and the second cover 5, with both sides of the first cover 3 abutting against the flange portion 42 and the second cover 5, respectively. The first cover 3 has a through hole 32, the second cover 5 has a first connecting hole 51, and the flange portion 42 has a second connecting hole 421. When the fastener 6 is a screw, the screw head of the fastener 6 can be pressed against the flange portion 42, and the threaded portion of the fastener 6 passes through the second connecting hole 421 and the through hole 32, and is threadedly connected to the first connecting hole 51. When the fastener 6 is a bolt and a nut, the bolt head of the fastener 6 can be pressed onto the flange portion 42. The threaded portion of the fastener 6 passes through the first connecting hole 51, the second connecting hole 421, and the through hole 32, and is threadedly connected to the nut, which is pressed onto the second cover 5. The specific connection points between the fastener 6 and the second cover 5 and the second tank 4 can be determined according to actual needs. For example, the cross-sectional shape of the flange portion 42, the first cover 3, and the second cover 5 along the axial direction of the first tank 1 can all be rectangular. The second connecting hole 421 is opened at the four corners of the flange portion 42 and is arranged around the cylindrical portion 41; the first connecting hole 51 is opened at the four corners of the second cover 5 and is opposite to the first connecting hole 51 along the axial direction of the first tank 1.

[0054] refer to Figure 8 In some embodiments of this application, the plasma grinding jar includes a third jar body 7, which is formed from conductive materials such as stainless steel, copper alloy, or aluminum alloy. A first jar body 1 is embedded within the third jar body 7. All electrodes 21 are used for electrical connection to the plasma power supply, and the third jar body 7 is used for grounding. Since the electrode grooves 11 are formed within the jar wall of the first jar body 1, which is made of insulating material, the electrodes 21 and the third jar body 7 are mutually insulated. During use, a stable voltage difference can be generated between the electrodes 21 and the third jar body 7, allowing stable ionization to generate plasma within the inner cavity 12 of the first jar body 1.

[0055] Since the electrode groove 11 is located inside the wall of the first jar 1, the electrode 21 does not occupy the space of the inner cavity 12. This prevents the electrode 21 from affecting the batch processing capability of the plasma ball mill jar for the materials to be processed. The grinding balls inside the plasma ball mill jar will not collide with the electrode 21 when subjected to forced vibration. This reduces the loss of the mechanical energy of the grinding balls during vibration and also facilitates contact between the grinding balls and the materials to be processed, thus effectively improving the processing efficiency of the plasma ball mill jar. Under the obstruction of the first jar 1, the electrode 21 located in the electrode groove 11 will not come into contact with the materials to be processed. This prevents the materials to be processed from adhering to the electrode 21 due to moisture, electrostatic adsorption, microporous adsorption, etc. Compared with existing grinding jars, this helps to ensure the discharge performance and service life of the plasma ball mill jar.

[0056] In some embodiments of this application, the third can 7 can also be used in combination with the aforementioned second cover 5, and the third can 7 and the second cover 5 are connected by fasteners 6. In this case, the shape and connection method of the third can 7 are the same as those of the aforementioned second can 4, and will not be described again here.

[0057] Secondly, the embodiments described in this application provide a plasma ball mill. The plasma ball mill includes a plasma power supply and any of the plasma ball milling jars described in the first aspect. The plasma power supply is electrically connected to at least a portion of the electrodes 21 of the plasma ball milling jar.

[0058] Specifically, when electrode 21 includes a positive electrode 21a and a negative electrode 21b, the plasma power supply is electrically connected to the positive electrode 21a of the plasma grinding jar, and the negative electrode 21b of the plasma grinding jar is grounded. Alternatively, the plasma grinding jar includes a third jar body 7, which is a structure formed of conductive materials such as stainless steel, copper alloy, or aluminum alloy. The first jar body 1 is embedded in the third jar body 7, all electrodes 21 are used for electrical connection to the plasma power supply, and the third jar body 7 is used for grounding.

[0059] Since the electrode groove 11 is located inside the wall of the first tank 1, the electrode 21 does not occupy the space of the inner cavity 12. In other words, the arrangement of the electrode 21 does not reduce the volume of the inner cavity 12 of the first tank 1. This avoids the electrode 21 affecting the batch processing capacity of the plasma ball mill jar for the materials to be processed. Under the same volume, the above structure can increase the number of materials to be processed that the plasma ball mill jar can handle, thereby improving the batch processing capacity of the plasma ball mill for the materials to be processed.

[0060] Since the electrode groove 11 where electrode 21 is located is independent of and not connected to the inner cavity 12, the grinding balls inside the plasma ball mill will not collide with electrode 21 when subjected to forced vibration. This reduces the loss of mechanical energy from the vibration of the grinding balls and also facilitates contact between the grinding balls and the material to be processed, thus effectively improving the processing efficiency of the plasma ball mill.

[0061] With the barrier of the first tank 1, the electrode 21 located in the electrode groove 11 will not come into contact with the material to be processed. This can prevent the material to be processed from adhering to the electrode 21 due to moisture, electrostatic adsorption, microporous adsorption, etc. Compared with existing grinding jars, this is beneficial to ensure the discharge performance and service life of the plasma ball mill jar, thereby ensuring the service life of the plasma ball mill and reducing the maintenance cost of the plasma ball mill.

[0062] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs; the terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit this application.

[0063] The terms "first" and "second" in the specification and claims of this application may explicitly or implicitly include one or at least two of the features. In the description of this utility model, unless otherwise stated, "at least two" means two or more. Furthermore, in the specification and claims, "and / or" indicates at least one of the connected objects, and the character " / " generally indicates that the preceding and following objects are in an "or" relationship.

[0064] In the description of this utility model, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "left", "right", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.

[0065] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0066] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or at least two embodiments or examples.

[0067] Although embodiments of the present invention have been shown and described, those skilled in the art will understand that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention.

Claims

1. A plasma ball mill jar, characterized in that, include: The first tank (1) is a structure formed of insulating material. The first tank (1) includes an electrode groove (11) and an inner cavity (12). The electrode groove (11) is located inside the tank wall of the first tank (1). The electrode groove (11) and the inner cavity (12) are independent of each other and do not communicate with each other. The inner cavity (12) is used to accommodate the material to be processed and the grinding ball. The discharge assembly (2) includes an electrode (21) disposed in the electrode groove (11).

2. The plasma ball mill jar according to claim 1, characterized in that, The electrode slot (11) includes a positive electrode slot (11a) and a negative electrode slot (11b). The electrode (21) includes a positive electrode (21a) and a negative electrode (21b). The positive electrode (21a) is disposed in the positive electrode slot (11a), and the negative electrode (21b) is disposed in the negative electrode slot (11b). The positive electrode (21a) is used to be electrically connected to the plasma power supply, and the negative electrode (21b) is used to be grounded.

3. The plasma ball mill jar according to claim 1, characterized in that, The first tank (1) includes a first tank wall (1a) and a second tank wall (1b), the second tank wall (1b) being embedded in the first tank wall (1a), and the electrode groove (11) being disposed at the first tank wall (1a) and / or the second tank wall (1b).

4. The plasma ball mill jar according to claim 2, characterized in that, Both the positive electrode groove (11a) and the negative electrode groove (11b) extend along the axial direction of the first tank (1). At least two positive electrode grooves (11a) and at least two negative electrode grooves (11b) are provided and are staggered along the circumference of the first tank (1). At least two positive electrode grooves (11a) are provided with a positive electrode (21a) and at least two negative electrode grooves (11b) are provided with a negative electrode (21b).

5. The plasma ball mill jar according to claim 4, characterized in that, The discharge assembly (2) includes a first conductive structure (22), one of which is connected to all of the positive electrodes (21a) or all of the negative electrodes (21b), or; Two first conductive structures (22) are provided, one of which is connected to all the positive electrodes (21a), and the other is connected to all the negative electrodes (21b).

6. The plasma ball mill jar according to claim 5, characterized in that, The first tank (1) has a manifold (13) inside its tank wall. One of the manifolds (13) is connected to all of the positive electrode slots (11a) or all of the negative electrode slots (11b), or; Two manifolds (13) are provided. One manifold (13) is connected to all the positive electrode slots (11a), and the other manifold (13) is connected to all the negative electrode slots (11b).

7. The plasma ball mill jar according to claim 6, characterized in that, The discharge assembly (2) includes a second conductive structure (23), which has a first connecting portion (231) and a second connecting portion (232); the first connecting portion (231) is connected to the first conductive structure (22), and the second connecting portion (232) is used to be electrically connected to the plasma power supply or to be grounded, or; The second conductive structure (23) is provided in two parts. The second connection part (232) of the second conductive structure (23) is used to be electrically connected to the plasma power supply, and the second connection part (232) of the other second conductive structure (23) is used to be grounded.

8. The plasma ball milling jar according to claim 7, characterized in that, The plasma ball milling jar includes a first cover (3); The first cover (3) is connected to the first tank (1), and the first cover (3) is a structure formed of insulating material; a connecting groove (31) is provided inside the first cover (3), the connecting groove (31) connects the manifold (13) to the external environment, and the second conductive structure (23) is provided in the connecting groove (31).

9. The plasma ball mill jar according to claim 8, characterized in that, The first cover (3) includes a first cover plate (3a) and a second cover plate (3b), the first cover plate (3a) and the second cover plate (3b) are arranged along the axial direction of the first tank (1), and the first cover plate (3a) is located between the second cover plate (3b) and the first tank (1); The connecting groove (31) includes a main body (311), a first through part (312) and a second through part (313). The main body (311) is located at the first cover plate (3a) and / or the second cover plate (3b). The first through part (312) is disposed through the first cover plate (3a) and connects the main body (311) and the confluence groove (13). The first connecting part (231) is embedded in the first through part (312). The second through part (313) is disposed through the second cover plate (3b) and connects the main body (311) and the external environment. The second connecting part (232) is embedded in the second through part (313).

10. The plasma ball mill jar according to claim 8, characterized in that, The plasma ball milling jar includes a second jar body (4), a second cover body (5), and fasteners (6). The first tank (1) is embedded in the second tank (4), the first cover (3) and the second cover (5) are arranged along the axial direction of the first tank (1), and the first cover (3) is located on the side of the second cover (5) facing the first tank (1); the fastener (6) passes through the first cover (3) and is connected to the second cover (5) and the second tank (4) respectively.

11. The plasma ball mill jar according to claim 1, characterized in that, The plasma ball milling jar includes a third jar body (7); The third tank (7) is a structure formed of conductive material. The first tank (1) is embedded in the third tank (7). The electrode (21) is used to connect to the plasma power supply. The third tank (7) is used to ground.

12. A plasma ball mill, characterized in that, The plasma ball mill includes a plasma power supply and a plasma ball milling jar as described in any one of claims 1-11, wherein the plasma power supply is electrically connected to at least a portion of the electrodes (21) of the plasma ball milling jar.

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