A planar flusher for a gas diffuser

Abstract

The utility model belongs to the technical field of gas diffuser surface treatment equipment, specifically, the utility model relates to a kind of plane flushing machine for gas diffuser;A kind of plane flushing machine for gas diffuser, including flushing machine seat, including plane fixed structure, flushing cavity is provided in the flushing machine seat, the gas diffuser is set on plane fixed structure, the plane fixed structure is movably connected with flushing machine seat, flushing structure is provided in the flushing cavity;Through the synergistic effect of first cylinder and second cylinder, realize the two-dimensional full coverage movement of flushing gun head on product surface, make high-pressure cleaning fluid accurate injection to the upper and lower surfaces and hole area of gas diffuser, and efficiently strip dirt and impurities.Produced waste liquid falls to flushing cavity bottom naturally in cleaning process, and is collected to short end's liquid discharge port under the directional guidance of flow guide slope, and is discharged outside cavity to avoid siltation quickly.

Description

Technical Field

[0001] This utility model belongs to the technical field of gas diffuser surface treatment equipment. Specifically, this utility model relates to a planar rinsing machine for gas diffusers. Background Technology

[0002] In chemical vapor deposition (CVD) equipment, the gas diffuser is a core component, and its performance directly determines the resolution of the final product. Currently, the industry commonly uses a vertical rinsing method to treat gas diffusers. This involves fixing the product on a vertical hanger and using a robot to rinse it sequentially from top to bottom, alternating between the two sides to remove residual chemicals from the orifices. However, this technology has significant drawbacks: Firstly, when the product is vertically suspended, residual chemicals flow downwards due to gravity, causing the bottom to be continuously corroded by chemicals flowing out of the orifices, resulting in discolored marks on the surface and causing abnormal appearance. Secondly, the residual chemicals in the bottom orifices remain for a much longer time than those in the top, resulting in greater corrosion of the bottom orifices and ultimately causing uneven overall orifice diameters.

[0003] Chinese Patent (Publication No.: 115156146B) discloses a gas diffuser cleaning process and auxiliary equipment, relating to the field of chemical vapor deposition (CVD) equipment cleaning technology. The gas diffuser cleaning process and auxiliary equipment of this invention include primary stripping → secondary stripping → grinding → sandblasting → chemical polishing → oven drying → outgoing inspection → packaging; the gas diffuser that is not completely stripped undergoes secondary stripping, which includes wet sandblasting → high-pressure water washing. However, this gas diffuser cleaning process is relatively cumbersome. Utility Model Content

[0004] This utility model is designed to solve the above-mentioned problems and aims to provide a planar rinsing machine for gas diffusers, which can achieve better cleaning results and reduce liquid corrosion of gas diffusers. To achieve the above objective, the technical solution adopted by this utility model is as follows: a planar rinsing machine for gas diffusers, including a rinsing machine base, including a planar fixing structure, a rinsing chamber provided in the rinsing machine base, the gas diffuser being mounted on the planar fixing structure, the planar fixing structure being movably connected to the rinsing machine base, and a rinsing structure provided in the rinsing chamber.

[0005] The rinsing structure includes a rinsing nozzle, a high-pressure pump and a storage tank are provided next to the rinsing base, the inlet of the high-pressure pump is connected to the storage tank through a pipeline, and the high-pressure pump is provided with a drain port.

[0006] The rinsing chamber is equipped with a translation structure, which includes a horizontal bar and a vertical bar. The horizontal bar and the vertical bar are arranged alternately in the rinsing chamber. The rinsing gun head is sleeved on the horizontal bar. A sliding block is sleeved on the vertical bar. A first cylinder is installed on the sliding block. The piston rod of the first cylinder is connected to the rinsing gun head. A second cylinder is installed in the rinsing chamber. The piston rod of the second cylinder is connected to the sliding block.

[0007] The planar fixing structure includes a planar frame, which is connected to the flushing machine base via a slide rail, and the gas diffuser is disposed inside the planar frame and bolted to the planar frame.

[0008] A sealing plate is provided at one end of the planar frame, and the sealing plate abuts against the opening end of the flushing chamber.

[0009] The bottom of the flushing chamber is provided with a flow guide slope, and the shorter end of the flow guide slope is located at the drain outlet.

[0010] The sealing plate is equipped with a pull handle.

[0011] The flushing structure is symmetrically arranged at the upper and lower ends of the flushing chamber.

[0012] The technical advantages of this invention are as follows: First, the operator pulls out the entire planar fixing structure along the slide rail between the rinsing machine base and the planar frame using the pull handle on the sealing plate. The gas diffuser to be cleaned is then placed into the planar frame, and the product is firmly connected to the planar frame through the pre-set bolt holes and bolts, ensuring that the gas diffuser remains in a horizontal position. Then, the operator pushes the pull handle to push the planar frame carrying the product into the rinsing chamber of the rinsing machine base along the slide rail until the sealing plate and the opening end of the rinsing chamber are tightly abutted, forming a closed rinsing space that isolates external dust pollution and prevents high-pressure cleaning fluid from splashing. After the cleaning operation starts, the cleaning fluid in the storage tank is pressurized by a high-pressure pump and delivered through pipelines to the symmetrically arranged rinsing nozzles in the rinsing chamber. Simultaneously, the translation structure begins to operate. The second cylinder drives the sliding block on the longitudinal rod to move longitudinally, causing the crossbar and rinsing nozzles to move longitudinally in sync. The first cylinder directly pushes the rinsing nozzles mounted on the crossbar to move laterally. Through the coordinated action of the two cylinders, the rinsing nozzles achieve two-dimensional full-coverage movement across the product surface, allowing the high-pressure cleaning fluid to be precisely sprayed onto the upper and lower surfaces and orifice areas of the gas diffuser, efficiently removing stains and impurities. Waste liquid generated during the cleaning process naturally falls to the bottom of the rinsing chamber and, guided by the flow ramp, collects at the lower end of the drain port for rapid discharge outside the chamber to prevent accumulation. Once the preset cleaning program is complete, the operator pulls the pull handle again to remove the flat frame from the rinsing chamber, loosens the bolts, and removes the cleaned gas diffuser, completing a single cleaning cycle. Attached Figure Description

[0013] This manual includes the following figures, which illustrate the following: Figure 1 This is a top view of a planar flushing machine for a gas diffuser according to the present invention; Figure 2 This is a cross-sectional view of a planar flushing machine for a gas diffuser according to the present invention.

[0014] The markings in the diagram are as follows: 1. Flushing base; 101. Flushing chamber; 2. Planar fixed structure; 201. Planar frame; 3. Flushing structure; 301. Flushing nozzle; 302. High-pressure pump; 303. Liquid storage tank; 304. Drain outlet; 4. Translation structure; 401. Horizontal bar; 402. Vertical bar; 403. First cylinder; 404. Second cylinder; 5. Sealing plate; 6. Guide ramp; 7. Pull handle. Detailed Implementation

[0015] The specific embodiments of the present invention will be further described in detail below with reference to the accompanying drawings, in order to help those skilled in the art to have a more complete, accurate and in-depth understanding of the inventive concept and technical solution of the present invention, and to facilitate its implementation.

[0016] like Figures 1-2 As shown, a planar rinsing machine for gas diffusers includes a rinsing base 1 and a planar fixing structure 2. A rinsing chamber 101 is provided within the rinsing base 1. The gas diffuser is mounted on the planar fixing structure 2, which is movably connected to the rinsing base 1. A rinsing structure 3 is provided within the rinsing chamber 101. The rinsing base 1 serves as the basic support structure for the entire rinsing machine, providing a stable working platform. The rinsing chamber 101 provides space for the rinsing operation. The planar fixing structure 2 is used to horizontally support and fix the gas diffuser to be cleaned. The planar fixing structure 2 transports the gas diffuser into the rinsing chamber 101 for cleaning, and then the rinsing structure 3 cleans the gas diffuser to remove contaminants.

[0017] The rinsing structure 3 includes a rinsing nozzle 301. A high-pressure pump 302 and a storage tank 303 are located next to the rinsing base 1. The inlet of the high-pressure pump 302 is connected to the storage tank 303 via a pipeline, and the outlet of the high-pressure pump 302 is connected to the rinsing nozzle 301 via a pipeline. A drain port 304 is provided at the bottom of the rinsing chamber 101. The storage tank 303 stores the cleaning fluid to be used, providing a stable and sufficient liquid source for the cleaning operation and avoiding interruptions or insufficient cleaning due to lack of liquid during the cleaning process. The high-pressure pump 302 delivers the liquid in the storage tank 303 to the rinsing nozzle 301. The high-pressure pump 302 pressurizes the cleaning fluid into a high-pressure fluid, giving the cleaning fluid sufficient impact force to remove dirt, oxide layers, and other impurities from the surface and channels of the gas diffuser. The flushing nozzle 301 sprays high-pressure cleaning fluid into the target cleaning area of ​​the gas diffuser to clean the gas diffuser. The drain port 304 quickly discharges the waste liquid after cleaning to prevent the waste liquid from accumulating in the flushing chamber 101. At the same time, it works with the guide slope 6 at the bottom of the flushing chamber to form a directional discharge channel for the waste liquid.

[0018] A translation structure 4 is provided inside the rinsing chamber 101. The translation structure 4 includes a horizontal bar 401 and a vertical bar 402. The horizontal bar 401 and the vertical bar 402 are arranged alternately inside the rinsing chamber 101. The rinsing gun head 301 is sleeved on the horizontal bar 401. A sliding block is sleeved on the vertical bar 402. A first cylinder 403 is provided on the sliding block. The piston rod of the first cylinder 403 is connected to the rinsing gun head 301. A second cylinder 404 is provided inside the rinsing chamber 101. The piston rod of the second cylinder 404 is connected to the sliding block. The first cylinder 403 drives the rinsing head 301 to move on the crossbar 401. The crossbar 401 serves as a lateral guide rail for the rinsing head 301, constraining its direction of movement. It also supports the rinsing head 301, ensuring it does not deviate or wobble during movement. A sliding block is mounted on the vertical rod 402. The movement of the piston rod of the second cylinder 404 drives the sliding block to move on the vertical rod 402, which in turn drives the first cylinder 403, the crossbar 401, and the rinsing head 301 to move longitudinally. Through the combined action of the first cylinder 403 and the second cylinder 404, the rinsing head 301 achieves both lateral and longitudinal movement within the rinsing chamber 101.

[0019] The planar fixed structure 2 includes a planar frame 201, which is connected to the flushing machine base 1 via a slide rail. The gas diffuser is installed inside the planar frame 201 and bolted to the planar frame 201.

[0020] The gas diffuser and the flat frame 201 are pre-drilled with bolt holes. The gas diffuser and the flat frame 201 are connected by bolts to fix the gas diffuser in place. The flat frame 201 provides a stable support for the gas diffuser, ensuring that the gas diffuser maintains a preset horizontal posture during the rinsing process. At the same time, the flat frame 201 is connected to the rinsing base 1 via a slide rail, which allows the flat frame 201 to be quickly pulled out and sent into the rinsing chamber 101 to clean the gas diffuser.

[0021] A sealing plate 5 is provided at one end of the planar frame 201, and the sealing plate 5 abuts against the opening end of the rinsing chamber 101. After the planar frame 201 and the gas diffuser are pushed into the rinsing chamber 101, the sealing plate 5 abuts against the opening of the rinsing chamber 101, forming a physical seal, isolating the inside of the rinsing chamber 101 from the external environment, and creating a relatively closed rinsing space. This prevents dust, impurities, etc. from the outside air from entering the rinsing chamber 101, avoiding contamination of the cleaning fluid or adhesion to the surface of the gas diffuser, and ensuring the cleanliness of the product after cleaning.

[0022] The bottom of the rinsing chamber 101 is equipped with a guide slope 6, with the shorter end of the guide slope 6 located at the drain port 304. The rinsed liquid falls into the bottom of the rinsing chamber 101 and flows along the guide slope 6 to the drain port 304 for discharge. The rapid discharge of waste liquid avoids prolonged standing at the bottom of the chamber, reducing the amount of impurities, salts, and residual cleaning agents adhering to the surface of the gas diffuser after evaporation. This reduces surface defects such as yellowing and contamination, ensuring the cleanliness of the gas diffuser after cleaning.

[0023] A pull handle 7 is provided on the sealing plate 5. The pull handle 7 is provided on the sealing plate 5, and the operator can use the pull handle 7 to evenly transfer the pushing and pulling force of the operator to the sealing plate 5 and the flat frame 201, so as to facilitate the operator to operate the sealing plate 5 and the pull handle 7.

[0024] The flushing structure 3 is symmetrically arranged at the upper and lower ends of the flushing chamber 101. After the planar frame 201 and the gas diffuser are pushed into the flushing chamber 101, the flushing structure 3 is located at the upper and lower ends of the gas diffuser. The flushing structure 3 cleans the upper and lower ends of the gas diffuser, thereby achieving a comprehensive cleaning of the gas diffuser.

[0025] First, the operator pulls out the entire planar fixing structure 2 along the slide rail between the rinsing base 1 and the planar frame 201 using the pull handle 7 on the sealing plate 5. The gas diffuser to be cleaned is then placed into the planar frame 201, and the product is securely connected to the planar frame through the pre-set bolt holes and bolts, ensuring that the gas diffuser remains in a horizontal position. Then, the operator pushes the pull handle 7 to push the planar frame 201 carrying the product into the rinsing chamber 101 of the rinsing base 1 along the slide rail until the sealing plate 5 and the opening end of the rinsing chamber 101 are tightly abutted, forming a closed rinsing space that isolates external dust pollution and prevents high-pressure cleaning fluid from splashing. After the cleaning operation is started, the cleaning fluid in the storage tank 303 is pressurized by the high-pressure pump 302 and transported through the pipeline to the rinsing gun heads 301 arranged symmetrically in the rinsing chamber 101. At the same time, the translation structure 4 starts to move. The second cylinder 404 drives the sliding block on the longitudinal rod 402 to move longitudinally, which drives the cross rod 401 and the rinsing gun head 301 to move longitudinally in sync. The first cylinder 403 directly pushes the rinsing gun head 301 sleeved on the cross rod 401 to move laterally. Through the coordinated action of the first cylinder 403 and the second cylinder 404, the rinsing gun head 301 achieves two-dimensional full coverage movement on the product surface, so that the high-pressure cleaning fluid is accurately sprayed onto the upper and lower surfaces and channel areas of the gas diffuser, effectively removing stains and impurities. The waste liquid generated during the cleaning process falls naturally to the bottom of the rinsing chamber 101. Under the directional guidance of the guide slope 6, it gathers at the drain port 304 at the lower end and is quickly discharged out of the chamber to avoid stagnation. After the preset cleaning program is completed, the operator pulls the pull handle 7 again to pull the flat frame 201 out of the rinsing chamber. The bolts can be loosened to remove the cleaned gas diffuser, completing a single cleaning cycle.

[0026] The present invention has been described above by way of example with reference to the accompanying drawings. Obviously, the specific implementation of the present invention is not limited to the above-described manner. Any non-substantial improvements made using the inventive concept and technical solution of the present invention; or the direct application of the inventive concept and technical solution to other situations without modification, are all within the protection scope of the present invention.

Claims

1. A planar flushing machine for a gas diffuser, comprising a flushing machine base (1), characterized in that, It includes a planar fixed structure (2), a flushing chamber (101) is provided inside the flushing base (1), a gas diffuser is provided on the planar fixed structure (2), the planar fixed structure (2) is movably connected to the flushing base (1), and a flushing structure (3) is provided inside the flushing chamber (101).

2. The planar flushing machine for a gas diffuser according to claim 1, characterized in that: The rinsing structure (3) includes a rinsing gun head (301), a high-pressure pump (302) and a storage tank (303) are provided next to the rinsing base (1), the inlet end of the high-pressure pump (302) is connected to the storage tank (303) through a pipeline, the outlet end of the high-pressure pump (302) is connected to the rinsing gun head (301) through a pipeline, and a drain port (304) is provided at the bottom of the rinsing chamber (101).

3. The planar flushing machine for a gas diffuser according to claim 2, characterized in that: The rinsing chamber (101) is provided with a translation structure (4), which includes a horizontal bar (401) and a vertical bar (402). The horizontal bar (401) and the vertical bar (402) are arranged alternately in the rinsing chamber (101). The rinsing gun head (301) is sleeved on the horizontal bar (401). A sliding block is sleeved on the vertical bar (402). A first cylinder (403) is provided on the sliding block. The piston rod of the first cylinder (403) is connected to the rinsing gun head (301). A second cylinder (404) is provided in the rinsing chamber (101). The piston rod of the second cylinder (404) is connected to the sliding block.

4. The planar flushing machine for a gas diffuser according to claim 1, characterized in that: The planar fixing structure (2) includes a planar frame (201), which is connected to the flushing machine base (1) via a slide rail. The gas diffuser is installed inside the planar frame (201) and bolted to the planar frame (201).

5. The planar flushing machine for a gas diffuser according to claim 4, characterized in that: A sealing plate (5) is provided at one end of the planar frame (201), and the sealing plate (5) abuts against the opening end of the flushing chamber (101).

6. The planar flushing machine for a gas diffuser according to claim 2, characterized in that: The bottom of the flushing chamber (101) is provided with a flow guide slope (6), and the short end of the flow guide slope (6) is located at the drain port (304).

7. The planar flushing machine for a gas diffuser according to claim 5, characterized in that: The sealing plate (5) is provided with a pull handle (7).

8. The planar flushing machine for a gas diffuser according to claim 1, characterized in that: The flushing structure (3) is symmetrically arranged at the upper and lower ends of the flushing chamber (101).

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