MRC magnetron sputtering platform with high precision and high automation
Patent Information
- Application Number
- CN202522169991.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-10-14
- Publication Date
- 2026-10-23
- Estimated Expiration
- 2035-10-14
AI Technical Summary
[0005]针对现有技术中,在对物料进行上下料作业时,需要从密封门处进行操作,但由于密封门位于侧面,导致工作人员在进行上下料作业时操作不便,容易出现物料摆放不正或取出时出现物料磕碰的情况的技术问题,本实用新型提供一种具有高精度高自动化的MRC磁控溅射台
[0014]1、本实用新型通过上下料机构,在使用该磁控溅射台时,能够将滑动台进行伸出和缩入工作台内,使得工作人员便于对物料进行上下料,避免出现物料摆放不正或取出时出现物料磕碰的情况,从而提高了该磁控溅射台使用时的便捷性和实用性。
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Figure CN224884154U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of magnetron sputtering technology, and in particular to a high-precision and highly automated MRC magnetron sputtering stage. Background Technology
[0002] A search revealed Chinese patent CN215560630U, which discloses a magnetron sputtering stage for uniform etching. The stage includes a worktable with a sputtering shell welded to its top. The top of the sputtering shell is bolted to the main body of a magnetron sputtering machine. This invention achieves uniform etching through the coordinated operation of the worktable, sputtering shell, main body of the magnetron sputtering machine, outer shell, electric push rod, moving plate, support plate, support column, base, mounting seat, stepper motor, drive gear, driven gear, positive and negative screws, screw sleeve, moving rod, fixed column, clamping plate, pulley, bearing seat, slide groove, slider, slide rod, slide sleeve, and spring. This solves the problems of existing magnetron sputtering stages, such as poor etching uniformity, inability to effectively clamp and fix semiconductor materials (leading to loosening and detachment), and inability to smoothly raise and lower semiconductor materials during etching, affecting etching quality and causing inconvenience for users.
[0003] In actual use, this patent has the following drawbacks:
[0004] In this patent, when loading and unloading materials, it is necessary to operate from the sealed door. However, since the sealed door is located on the side, it is inconvenient for workers to operate when loading and unloading materials, and it is easy for materials to be placed incorrectly or to be bumped when being taken out. Utility Model Content
[0005] In view of the technical problems in the prior art, when loading and unloading materials, it is necessary to operate from the sealed door. However, since the sealed door is located on the side, it is inconvenient for the operator to operate during the loading and unloading operation, and the materials are prone to being misplaced or bumped when being taken out. This utility model provides a high-precision and highly automated MRC magnetron sputtering stage.
[0006] The technical solution adopted by this utility model is: a high-precision and highly automated MRC magnetron sputtering stage, including a worktable, a sputtering box, and a magnetron sputtering mechanism. The worktable is equipped with a loading and unloading mechanism, which includes a lifting plate, a gear, a U-shaped toothed plate, and a sliding table. An extension groove is opened in the middle of the upper side of the lifting plate. The gear is rotatably installed between the inner walls of one end of the extension groove. The U-shaped toothed plate is slidably installed in the extension groove and meshes with the gear. The sliding table is slidably disposed on the upper side of the lifting plate and is fixedly connected to the upper side of one end of the U-shaped toothed plate. A stepper motor is fixedly installed on the lower side of the lifting plate, and the output end of the stepper motor is fixedly connected to the gear.
[0007] Furthermore, two support grooves are provided on the upper side of the lifting plate, and two support rods are fixedly installed on the lower side of the sliding table, with the support rods slidably installed in the support grooves.
[0008] Furthermore, a fixed base is fixedly installed on the bottom of the inner wall of the workbench, and four mounting slots are opened on the upper side of the fixed base. An electric telescopic rod is fixedly installed in the mounting slot, and the lifting plate is fixedly installed on the output end of the electric telescopic rod.
[0009] Furthermore, a fixing mechanism is provided on the upper side of the sliding platform. The fixing mechanism includes a bidirectional threaded rod, a clamping plate, and a reduction motor. There are two clamping plates.
[0010] Furthermore, two sliding grooves and a mounting groove are provided on the upper middle part of the sliding platform. The bidirectional threaded rod is rotatably installed between the two sliding grooves. The two clamping plates are slidably installed in the two sliding grooves respectively, and the two clamping plates are threadedly connected to both ends of the bidirectional threaded rod. The reduction motor is fixedly installed in the mounting groove. Synchronous pulleys are fixedly installed at the output end of the reduction motor and in the middle of the bidirectional threaded rod. Synchronous belts are sleeved on the periphery of the two synchronous pulleys.
[0011] Furthermore, the sputtering box is fixedly installed on the upper side of the worktable, and the magnetron sputtering mechanism is disposed between the upper and lower sides of the worktable.
[0012] Furthermore, a material gate is provided on one side of the workbench, and two sealing doors are rotatably installed between the material gates.
[0013] The beneficial effects of this utility model are:
[0014] 1. This utility model, through its loading and unloading mechanism, allows the sliding table to extend and retract into the worktable when using the magnetron sputtering table, making it easier for workers to load and unload materials and preventing materials from being misplaced or bumped when being removed, thereby improving the convenience and practicality of using the magnetron sputtering table.
[0015] 2. Secondly, through the fixing mechanism, this utility model can easily clamp and fix the material in the center when loading the material, avoiding the material from sliding and shifting, which would reduce the sputtering effect and thus improve the stability of the magnetron sputtering table during use. Attached Figure Description
[0016] Figure 1 This is a three-dimensional view of the entire utility model;
[0017] Figure 2 This is a cross-sectional view of the workbench and sputtering box of this utility model;
[0018] Figure 3 This is an exploded view of the loading and unloading mechanism of this utility model;
[0019] Figure 4 This is a cross-sectional view of the sliding table of this utility model.
[0020] The following are labeled in the diagram: 1. Workbench; 2. Sputtering box; 3. Magnetron sputtering mechanism; 4. Sealing door; 5. Fixed base; 6. Loading and unloading mechanism; 7. Fixing mechanism; 8. Electric telescopic rod; 9. Lifting plate; 10. Stepper motor; 11. Gear; 12. Extending slide; 13. Support slide; 14. Sliding table; 15. Support slide rod; 16. U-shaped toothed plate; 17. Sliding groove; 18. Clamping plate; 19. Mounting groove; 20. Gear motor; 21. Bidirectional threaded rod; 23. Synchronous belt; 24. Synchronous pulley. Detailed Implementation
[0021] In the description of this utility model, it should be noted that the terms "front", "up", "down", "left", "right", "vertical", "horizontal", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.
[0022] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.
[0023] The following is in conjunction with the appendix Figures 1-4 The present invention will be further described below.
[0024] To address the problems existing in the background technology, this application proposes the following technical solution: a high-precision and highly automated MRC magnetron sputtering stage.
[0025] The specific technical solution includes a workbench 1, a sputtering box 2, and a magnetron sputtering mechanism 3. The workbench 1 is equipped with a loading and unloading mechanism 6, which includes a lifting plate 9, a gear 11, a U-shaped toothed plate 16, and a sliding table 14. The upper middle part of the lifting plate 9 has an extension groove 12. The gear 11 is rotatably installed between the inner walls of one end of the extension groove 12. The U-shaped toothed plate 16 is slidably installed in the extension groove 12 and meshes with the gear 11. The sliding table 14 is slidably installed on the upper side of the lifting plate 9 and is fixedly connected to the upper side of one end of the U-shaped toothed plate 16. A stepper motor 10 is fixedly installed on the lower side of the lifting plate 9. The output end of the stepper motor 10 is fixedly connected to the gear 11. Two support grooves 13 are opened on the upper side of the lifting plate 9. Two support rods 15 are fixedly installed on the lower side of the sliding table 14. The support rods 15 are slidably installed in the support grooves 13 and can provide support force to the sliding table 14 after it extends.
[0026] Reference Figure 2 As shown, a fixed base 5 is fixedly installed on the bottom of the inner wall of the workbench 1. Four mounting slots are opened on the upper side of the fixed base 5. An electric telescopic rod 8 is fixedly installed in the mounting slot. The lifting plate 9 is fixedly installed at the output end of the electric telescopic rod 8. The electric telescopic rod 8 can drive the loading and unloading mechanism 6 to move up and down, thereby adjusting the height of the material according to the needs.
[0027] Reference Figure 3 and Figure 4As shown, a fixing mechanism 7 is provided on the upper side of the sliding table 14. The fixing mechanism 7 includes a bidirectional threaded rod 21, a clamping plate 18, and a reduction motor 20. There are two clamping plates 18. Two sliding grooves 17 and a mounting groove 19 are opened in the middle of the upper side of the sliding table 14. The bidirectional threaded rod 21 is rotatably installed between the two sliding grooves 17. The two clamping plates 18 are slidably installed in the two sliding grooves 17 respectively, and the two clamping plates 18 are threadedly connected to both ends of the bidirectional threaded rod 21. The clamping plate 18 is T-shaped, and its vertical part has a threaded groove, so that it can be threadedly connected to the bidirectional threaded rod 21. The reduction motor 20 is fixedly installed in the mounting groove 19. Synchronous pulleys 24 are fixedly installed at the output end of the reduction motor 20 and in the middle of the bidirectional threaded rod 21. Synchronous belts 23 are sleeved around the two synchronous pulleys 24. A connecting groove is opened at the part between the inner wall of the mounting groove 19 and the two sliding grooves 17. The synchronous belts 23 are sleeved around the two synchronous pulleys 24 through the connecting groove.
[0028] Reference Figure 1 and Figure 2 As shown, the sputtering box 2 is fixedly installed on the upper side of the workbench 1, and the magnetron sputtering mechanism 3 is set on the upper side of the workbench 1. A material gate is opened on one side of the workbench 1, and two sealing doors 4 are rotatably installed between the material gates. The sealing doors 4 are installed between the material gates by hinges. The magnetron sputtering mechanism 3 is existing technology, so it will not be described in detail.
[0029] To ensure that those skilled in the art can fully understand the technical solution, this application provides the following overall overview:
[0030] In use, open both sealing doors 4, then start the stepper motor 10 to drive the gear 11 to rotate. The rotation of gear 11, through its meshing with the U-shaped toothed plate 16, moves the U-shaped toothed plate 16 towards the material gate. The movement of the U-shaped toothed plate 16 moves the sliding table 14, causing it to move off the worktable 1. Then, place the material on the upper side of the sliding table 14. Next, start the reduction motor 20 to drive the synchronous pulley 24 connected to it to rotate. The rotation of synchronous pulley 24 drives another synchronous pulley 24 to rotate via the synchronous belt 23. The rotation of the other synchronous pulley 24 drives the bidirectional threaded rod 21 to rotate. The rotation of stepper motor 10 can drive the two clamping plates 18 to move. The movement of clamping plates 18 can fix the material. Then, stepper motor 10 is started again, which drives gear 11 to rotate in the opposite direction. The reverse rotation of gear 11 can drive U-shaped toothed plate 16 to move into worktable 1. The movement of U-shaped toothed plate 16 can drive sliding table 14 to move into worktable 1, so that sliding table 14 can move the material to the position corresponding to magnetron sputtering mechanism 3. Then, sealing door 4 is closed, and magnetron sputtering mechanism 3 is started to sputter the material. A vacuum pipe is provided on one side of sputtering box 2. By connecting the vacuum pipe to an external vacuum pump, the vacuum pump can draw a vacuum from sputtering box 2.
[0031] All standard parts used in this utility model can be purchased from the market, and irregular parts can be customized according to the description and drawings. The specific connection methods of each part adopt conventional methods such as bolts, rivets, and welding that are mature in the prior art. The machinery, parts and equipment adopt conventional models in the prior art. In addition, the circuit connection adopts conventional connection methods in the prior art, which will not be described in detail here. The contents not described in detail in this specification belong to the prior art known to those skilled in the art.
[0032] Although embodiments of the present invention have been shown and described, the scope of the present invention will be defined by the appended claims and their equivalents for those skilled in the art.
Claims
1. A high-precision, highly automated MRC magnetron sputtering stage, characterized in that, The system includes a workbench (1), a sputtering box (2), and a magnetron sputtering mechanism (3). The workbench (1) is equipped with a loading and unloading mechanism (6). The loading and unloading mechanism (6) includes a lifting plate (9), a gear (11), a U-shaped toothed plate (16), and a sliding table (14). The lifting plate (9) has an extension groove (12) in the middle of its upper side. The gear (11) is rotatably installed between the inner walls of one end of the extension groove (12). The U-shaped toothed plate (16) is slidably installed in the extension groove (12) and meshes with the gear (11). The sliding table (14) is slidably arranged on the upper side of the lifting plate (9) and is fixedly connected to the upper side of one end of the U-shaped toothed plate (16). A stepper motor (10) is fixedly installed on the lower side of the lifting plate (9). The output end of the stepper motor (10) is fixedly connected to the gear (11).
2. The MRC magnetron sputtering stage with high precision and high automation according to claim 1, characterized in that, The upper side of the lifting plate (9) has two support grooves (13), and the lower side of the sliding table (14) has two support rods (15) fixedly installed. The support rods (15) are slidably installed in the support grooves (13).
3. The MRC magnetron sputtering stage with high precision and high automation according to claim 2, characterized in that, A fixed base (5) is fixedly installed on the bottom of the inner wall of the workbench (1). Four mounting slots are provided on the upper side of the fixed base (5). An electric telescopic rod (8) is fixedly installed in the mounting slot. The lifting plate (9) is fixedly installed at the output end of the electric telescopic rod (8).
4. The MRC magnetron sputtering stage with high precision and high automation according to claim 1, characterized in that, The upper side of the sliding table (14) is provided with a fixing mechanism (7), which includes a bidirectional threaded rod (21), a clamping plate (18) and a reduction motor (20). There are two clamping plates (18).
5. The MRC magnetron sputtering stage with high precision and high automation according to claim 4, characterized in that, The upper middle part of the sliding table (14) has two sliding grooves (17) and a mounting groove (19). The bidirectional threaded rod (21) is rotatably installed between the two sliding grooves (17). The two clamping plates (18) are slidably installed in the two sliding grooves (17) respectively, and the two clamping plates (18) are threadedly connected to both ends of the bidirectional threaded rod (21). The geared motor (20) is fixedly installed in the mounting groove (19). The output end of the geared motor (20) and the middle part of the bidirectional threaded rod (21) are both fixedly installed with synchronous pulleys (24). The two synchronous pulleys (24) are fitted with synchronous belts (23) around their periphery.
6. The MRC magnetron sputtering stage with high precision and high automation according to claim 1, characterized in that, The sputtering box (2) is fixedly installed on the upper side of the workbench (1), and the magnetron sputtering mechanism (3) is arranged on the upper side of the workbench (1).
7. The MRC magnetron sputtering stage with high precision and high automation according to claim 6, characterized in that, A material gate is provided on one side of the workbench (1), and two sealing doors (4) are rotatably installed between the material gates.
Citation Information
Patent Citations
Uniform-etching magnetron sputtering table
CN215560630U