Gas leakage-proof chemical vapor deposition reaction chamber sealing structure

Abstract

The utility model discloses a kind of chemical vapor deposition reaction chamber sealing structures of gas leakage prevention, including reaction cavity, sealing ring, exhaust pipe, conveying pipe, wire pipe, controller, gas pipe, steel bottle, vacuum tube, first base room, second base room, third base room, washing pipe, collection pipe, take needle, sampler, absorber and docking pipe;Sealing ring is fixedly connected on the reaction cavity, end cap is fixedly connected on sealing ring, vacuum tube is connected with on end cap, exhaust pipe is connected with on the outer wall of reaction cavity, conveying pipe is connected with on the outer wall of reaction cavity, controller is connected with on one end of conveying pipe, third interconnecting pipe is connected with on the outer wall of conveying pipe, docking pipe is connected with on one end of conveying pipe;The utility model improves the sealing reliability by optimizing reaction chamber sealing design, simultaneously integrated gas monitoring, emergency treatment and tail gas purification function, and then improve overall work efficiency and operating safety.

Description

Technical Field

[0001] This utility model relates to the field of CVD technology, and in particular to a sealing structure for a chemical vapor deposition reaction chamber that prevents gas leakage. Background Technology

[0002] Chemical vapor deposition (CVD) technology is widely used in semiconductor chip manufacturing, optical thin film preparation and hard coating production. In these fields, this technology forms functional thin films that meet product performance requirements by chemically reacting gases in a reaction chamber, and is a key technology in many high-end manufacturing processes.

[0003] Current chemical vapor deposition reaction chambers have the following defects: First, the sealing structure design of the reaction chamber is inadequate, failing to achieve a stable and reliable sealing effect, making it prone to sealing failure during the reaction process; Second, sealing failure of the reaction chamber can easily lead to leakage of reaction gases, which will not only cause unnecessary loss of raw materials required for the reaction, but may also have an adverse impact on the operating environment around the reaction chamber. Utility Model Content

[0004] The purpose of this invention is to provide a sealing structure for a chemical vapor deposition reaction chamber that prevents gas leakage, in order to solve the problems mentioned in the background art.

[0005] To solve the above-mentioned technical problems, this utility model provides the following technical solution: a gas leakage-proof chemical vapor deposition reaction chamber sealing structure, including a reaction chamber, a sealing ring fixedly connected to the reaction chamber, an end cap fixedly connected to the sealing ring, a vacuum tube conductively connected to the end cap, an exhaust pipe conductively connected to the outer wall of the reaction chamber, a delivery pipe conductively connected to the outer wall of the reaction chamber, a controller conductively connected to one end of the delivery pipe, a third connecting pipe conductively connected to the outer wall of the delivery pipe, and a connecting pipe conductively connected to one end of the delivery pipe.

[0006] As a further technical solution of this utility model, a cover is fixedly connected to the controller, and a conduit is conductively connected to the outer wall of the controller.

[0007] As a further technical solution of this utility model, a second control tube is conductively connected inside the reaction chamber, and a second connecting tube is sleeved on the second control tube, and the second connecting tube is conductively connected to the outer wall of the reaction chamber.

[0008] As a further technical solution of this utility model, a steel cylinder is conductively connected to one end of the second connecting pipe, an absorber is sleeved inside the steel cylinder, a gas supply pipe is conductively connected to one end of the absorber, and the other end of the gas supply pipe is conductively connected to the third connecting pipe.

[0009] As a further technical solution of this utility model, a sampler is conductively connected inside the reaction chamber, a collection tube is conductively connected to one end of the sampler, a collection needle is fixedly connected to one end of the collection tube, and the collection tube is conductively connected to the outer wall of the reaction chamber.

[0010] As a further technical solution of this utility model, a first control tube is conductively connected inside the reaction chamber, a first connecting tube is sleeved on the first control tube, and the first connecting tube is conductively connected to the outer wall of the reaction chamber.

[0011] As a further technical solution of this utility model, a first base chamber is conductively connected to one end of the first connecting pipe, and a second base chamber is snapped onto the outer wall of the first base chamber, and the second base chamber is conductively connected to the first base chamber.

[0012] As a further technical solution of this utility model, a third base chamber is snapped onto the outer wall of the second base chamber, and a washing pipe is conductively connected to the outer wall of the third base chamber, and the third base chamber is conductively connected to the second base chamber.

[0013] Compared with the prior art, the beneficial effects achieved by this utility model are as follows: This utility model improves the sealing reliability by optimizing the sealing design of the reaction chamber, and integrates gas monitoring, emergency treatment and exhaust gas purification functions. This can reduce the waste of raw materials and adverse environmental impact caused by gas leakage, facilitate the staff to monitor the gas status in the reaction chamber in real time, simplify the maintenance process, and thus improve the overall work efficiency and operational safety. Attached Figure Description

[0014] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0015] Figure 1 This is a schematic diagram of the overall three-dimensional structure of this utility model; Figure 2 This is a schematic diagram of the overall front view of the present invention; Figure 3 This is a schematic diagram of the overall side view sectional structure of this utility model.

[0016] In the diagram: 1. Reaction chamber; 2. Sealing ring; 3. Exhaust pipe; 4. Delivery pipe; 5. Conduit; 6. Controller; 7. Lid opening; 8. Gas delivery pipe; 9. Gas cylinder; 10. Vacuum tube; 11. End cap; 12. First base chamber; 13. Second base chamber; 14. Third base chamber; 15. Washing tube; 16. First connecting tube; 17. First control tube; 18. Collection tube; 19. Needle; 20. Sampler; 21. Second control tube; 22. Second connecting tube; 23. Absorber; 24. Third connecting tube; 25. Connecting tube. Detailed Implementation

[0017] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this utility model.

[0018] Please see the appendix Figure 1 -Appendix Figure 3This utility model provides an embodiment of a chemical vapor deposition reaction chamber sealing structure to prevent gas leakage, comprising a reaction chamber 1, a sealing ring 2 fixedly connected to the reaction chamber 1 to prevent external air from entering or gas from leaking from the reaction chamber 1, an end cap 11 fixedly connected to the sealing ring 2, a vacuum tube 10 conductively connected to the end cap 11, an exhaust pipe 3 conductively connected to the outer wall of the reaction chamber 1, a delivery pipe 4 conductively connected to the outer wall of the reaction chamber 1, and a controller 6 conductively connected to one end of the delivery pipe 4. The gas transmission rate within the delivery pipe 4 is adjusted in real time. A third connecting pipe 24 is conductively connected to the outer wall of the delivery pipe 4, and a connecting pipe 25 is conductively connected to one end of the delivery pipe 4. A cover 7 is fixedly connected to the controller 6, and a conduit 5 is conductively connected to the outer wall of the controller 6. A second control pipe 21 is conductively connected to the reaction chamber 1, and a second connecting pipe 22 is sleeved on the second control pipe 21 and conductively connected to the outer wall of the reaction chamber 1. The second control pipe 21 absorbs leaked gas, and the absorbed leaked gas is then passed through the third connecting pipe 24. The second connecting pipe 22 returns the gas cylinder 9. One end of the second connecting pipe 22 is conductively connected to the gas cylinder 9. An absorber 23 is fitted inside the gas cylinder 9. One end of the absorber 23 is conductively connected to a gas delivery pipe 8, and the other end of the gas delivery pipe 8 is conductively connected to a third connecting pipe 24. A sampler 20 is conductively connected inside the reaction chamber 1. One end of the sampler 20 is conductively connected to a collection tube 18. A collection needle 19 is fixedly connected to one end of the collection tube 18, and the collection tube 18 is conductively connected to the outer wall of the reaction chamber 1. A third connecting pipe 24 is conductively connected inside the reaction chamber 1. A first control tube 17 is fitted with a first connecting tube 16, which is conductively connected to the outer wall of the reaction chamber 1. One end of the first connecting tube 16 is conductively connected to a first base chamber 12. A second base chamber 13 is snapped onto the outer wall of the first base chamber 12, and the second base chamber 13 is conductively connected to the first base chamber 12. A third base chamber 14 is snapped onto the outer wall of the second base chamber 13, and a washing tube 15 is conductively connected to the outer wall of the third base chamber 14, which is conductively connected to the second base chamber 13.

[0019] Working Principle: When using this invention, the air in the reaction chamber 1 is first evacuated through the vacuum tube 10 to create the vacuum environment required for the reaction. Simultaneously, the sealing ring 2 between the reaction chamber 1 and the end cap 11 is tightly fitted to prevent external air from entering or gas leakage from the reaction chamber 1, laying a stable and sealed foundation for the subsequent reaction. The gas cylinder 9 first receives gas from the outside, and then the gas is transported to the third connecting pipe 24 through the gas delivery pipe 8. The third connecting pipe 24 is connected to the delivery pipe 4, allowing the gas in the gas cylinder 9 to be transported into the reaction chamber 1 through the delivery pipe 4. The controller 6 receives the gas through the conduit 5. External signals are used to adjust the gas transmission rate in the delivery pipe 4 in real time, ensuring that the gas flow rate delivered to the reaction chamber 1 meets the process requirements. The cover 7 facilitates subsequent maintenance of the internal components of the controller 6 to maintain control accuracy. During the reaction, the sampler 20 extracts gas samples from the reaction chamber 1 through the collection tube 18 and the sampling needle 19 for monitoring the gas composition and reaction status within the reaction chamber 1. If a gas leak occurs, the second control pipe 21 absorbs the leaked gas. The absorbed leaked gas is then transported back to the cylinder 9 via the second connecting pipe 22. Simultaneously, the second control pipe 21... The second connecting pipe 22 can also cooperate with each other to assist in regulating the flow of gas in the reaction chamber 1 to maintain reaction stability. The gas delivered to the reaction chamber 1 is first guided by the first control pipe 17 and then introduced into the first substrate chamber 12 through the first connecting pipe 16. A substrate base is placed in the first substrate chamber 12. The base is heated to the precise temperature required for the reaction on the substrate surface by a resistance heating element or a radio frequency induction coil to promote thin film deposition. At the same time, the first substrate chamber 12 buffers and filters the gas to reduce large particulate impurities entrained in the gas. Subsequently, the gas flows into the second substrate chamber 13, where the base is heated. The gas is heated to the precise temperature required for reaction on the substrate surface to promote thin film deposition. At the same time, the second chamber 13 separates unreacted raw material components from the gas, reducing the subsequent purification pressure. Finally, the gas enters the third chamber 14. The base of the third chamber 14 is heated to the precise temperature required for reaction on the substrate surface to promote thin film deposition. Meanwhile, the third chamber 14 introduces a purification medium through the washing pipe 15 to deeply purify the gas and remove harmful components. The gas that meets the emission standards is discharged through the exhaust pipe 3. When it is necessary to remove the film, the first chamber 12, the second chamber 13 and the third chamber 14 can be disassembled.

[0020] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0021] The device embodiments described above are merely illustrative. The units described as separate components may or may not be physically separate. The components shown as units may or may not be physical units; that is, they may be located in one place or distributed across multiple network units. Some or all of the modules can be selected to achieve the purpose of this embodiment according to actual needs. Those skilled in the art can understand and implement this without any creative effort.

[0022] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this utility model, and not to limit it. Although this utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of this utility model.

Claims

1. A gas-leakage-proof chemical vapor deposition reaction chamber sealing structure, comprising a reaction chamber (1), characterized in that: A sealing ring (2) is fixedly connected to the reaction chamber (1), an end cap (11) is fixedly connected to the sealing ring (2), a vacuum tube (10) is conductively connected to the end cap (11), an exhaust pipe (3) is conductively connected to the outer wall of the reaction chamber (1), a conveying pipe (4) is conductively connected to the outer wall of the reaction chamber (1), a controller (6) is conductively connected to one end of the conveying pipe (4), a third connecting pipe (24) is conductively connected to the outer wall of the conveying pipe (4), and a connecting pipe (25) is conductively connected to one end of the conveying pipe (4).

2. The gas leakage-proof chemical vapor deposition reaction chamber sealing structure according to claim 1, characterized in that: A cover (7) is fixedly connected to the controller (6), and a conduit (5) is conductively connected to the outer wall of the controller (6).

3. The gas leakage-proof chemical vapor deposition reaction chamber sealing structure according to claim 1, characterized in that: The reaction chamber (1) is connected to a second control tube (21), and a second connecting tube (22) is sleeved on the second control tube (21). The second connecting tube (22) is connected to the outer wall of the reaction chamber (1).

4. The gas leakage-proof chemical vapor deposition reaction chamber sealing structure according to claim 3, characterized in that: A gas cylinder (9) is connected to one end of the second connecting pipe (22). An absorber (23) is fitted inside the gas cylinder (9). A gas supply pipe (8) is connected to one end of the absorber (23), and the other end of the gas supply pipe (8) is connected to the third connecting pipe (24).

5. The gas leakage-proof chemical vapor deposition reaction chamber sealing structure according to claim 1, characterized in that: A sampler (20) is connected to the reaction chamber (1) and a collection tube (18) is connected to one end of the sampler (20). A needle (19) is fixedly connected to one end of the collection tube (18) and the collection tube (18) is connected to the outer wall of the reaction chamber (1).

6. The gas leakage-proof chemical vapor deposition reaction chamber sealing structure according to claim 1, characterized in that: The reaction chamber (1) is connected to a first control tube (17), and a first connecting tube (16) is sleeved on the first control tube (17), and the first connecting tube (16) is connected to the outer wall of the reaction chamber (1).

7. The gas leakage-proof chemical vapor deposition reaction chamber sealing structure according to claim 6, characterized in that: One end of the first connecting pipe (16) is connected to a first base chamber (12), and a second base chamber (13) is snapped onto the outer wall of the first base chamber (12), and the second base chamber (13) is connected to the first base chamber (12).

8. A gas-leakage-proof chemical vapor deposition reaction chamber sealing structure according to claim 7, characterized in that: A third base chamber (14) is snapped onto the outer wall of the second base chamber (13), and a washing pipe (15) is conductively connected to the outer wall of the third base chamber (14), and the third base chamber (14) is conductively connected to the second base chamber (13).

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