CVD reaction apparatus

CN224884166UActive Publication Date: 2026-10-23SHANGHAI SHANSHAN NEW MATERIAL CO LTD
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Patent Information

Application Number
CN202522516347.8
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-11-26
Publication Date
2026-10-23
Estimated Expiration
2035-11-26

AI Technical Summary

Technical Problem

[0003]本实用新型要解决的技术问题是为了克服现有技术中有机气体在通过管道输送的过程中,需要维持在一定温度,但在进入反应腔前,由于反应腔入口的温度过高,有机气提前发生热解,并在管道内碳化,导致活性碳源损耗、包覆效率降低的缺陷,提供一种CVD反应装置

Benefits of technology

[0025]本实用新型的CVD反应装置通过在反应腔内设置冷却物质输送管道对有机气输送管道进行冷却,可以有效控制有机气输送管道的温度,避免有机气输送管道中温度过高导致有机气在有机气输送管道中提前发生热解并碳化,进而使得有机气在输送至反应腔后才发生热解,提升有机气的利用率以及CVD反应装置的包覆效率。

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model provides a kind of CVD reaction device, it is related to organic vapor deposition technical field.The CVD reaction device includes reaction cavity, organic gas delivery pipeline is equipped in reaction cavity, CVD reaction device further includes cooling material delivery pipeline, cooling material delivery pipeline is passed into cooling material, for cooling organic gas delivery pipeline.The utility model is cooled to organic gas delivery pipeline by setting cooling material delivery pipeline in reaction cavity, can effectively control the temperature of organic gas delivery pipeline, avoid that the temperature of organic gas delivery pipeline is too high to cause organic gas to occur pyrolysis and carbonization in organic gas delivery pipeline in advance, and then make organic gas only occur pyrolysis after being transported to reaction cavity, improve the utilization of organic gas and the coating efficiency of CVD reaction device.
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Description

Technical Field

[0001] This utility model relates to the field of organic vapor deposition technology, and in particular to a CVD reaction device. Background Technology

[0002] In chemical vapor deposition (CVD) coating processes, organic gases (such as methane, ethylene, and acetylene) serve as carbon sources. Their core function is to generate active carbon atoms through high-temperature pyrolysis, which are then deposited onto the surface of a substrate (such as nanoparticles, electrode materials, or carbon fiber preforms) to form a uniform carbon coating layer. However, during the transport of these organic gases through pipelines, a certain temperature needs to be maintained. But before entering the reaction chamber, the temperature at the inlet is too high, causing premature pyrolysis and carbonization of the organic gases within the pipeline. This results in the loss of the active carbon source and a reduction in coating efficiency, becoming a key bottleneck restricting the performance of the CVD process. Utility Model Content

[0003] The technical problem to be solved by this utility model is to overcome the defects in the prior art where organic gases need to be maintained at a certain temperature during pipeline transportation, but before entering the reaction chamber, the temperature at the inlet of the reaction chamber is too high, causing the organic gases to undergo premature pyrolysis and carbonization in the pipeline, resulting in loss of active carbon source and reduced coating efficiency. The present invention provides a CVD reaction device.

[0004] The present invention solves the above-mentioned technical problems through the following technical solution:

[0005] This utility model provides a CVD reaction device, including a reaction chamber, an organic gas delivery pipe inside the reaction chamber, and a cooling material delivery pipe.

[0006] Cooling material is introduced into the cooling material delivery pipeline to cool the organic gas delivery pipeline.

[0007] In this scheme, by setting up a cooling material delivery pipeline in the reaction chamber to cool the organic gas delivery pipeline, the temperature of the organic gas delivery pipeline can be effectively controlled, avoiding excessively high temperatures in the organic gas delivery pipeline that would cause premature pyrolysis and carbonization of the organic gas in the organic gas delivery pipeline. As a result, the organic gas will only undergo pyrolysis after being delivered to the reaction chamber, thereby improving the utilization rate of the organic gas and the coating efficiency of the CVD reaction device.

[0008] Optionally, the cooling substance is an inert gas, and the cooling substance delivery pipe has an outlet, which is located between the inner wall of the reaction chamber and the outer peripheral wall of the organic gas delivery pipe.

[0009] In this scheme, by arranging the gas outlet between the inner wall of the reaction chamber and the outer wall of the organic gas delivery pipeline, the low-temperature inert gas cools the outer wall of the organic gas delivery pipeline, directly and efficiently suppressing the temperature rise of the organic gas delivery pipeline and reducing the risk of thermal decomposition of organic gas in the organic gas delivery pipeline. At the same time, the inert gas used will not react with other substances in the reaction chamber, ensuring the coating quality and the stability of the coating process.

[0010] Optionally, the outlet of the cooling substance conveying pipe faces the outer peripheral wall of the organic gas conveying pipe.

[0011] Optionally, there may be multiple cooling material delivery pipes, arranged circumferentially along the organic gas delivery pipes.

[0012] In this scheme, by setting a cooling material conveying pipe along the circumference of the organic gas conveying pipe, a relatively uniform cooling of the outer wall of the organic gas conveying pipe can be achieved.

[0013] Optionally, the outlets of the plurality of cooling substance conveying pipes are spaced apart along the axial direction of the organic gas conveying pipes.

[0014] Optionally, the CVD reaction apparatus further includes a temperature detection mechanism disposed in the reaction chamber and used to detect the temperature of the gas in the reaction chamber.

[0015] Optionally, the CVD reaction apparatus further includes a controller, which is electrically connected to the temperature detection mechanism.

[0016] In this solution, by electrically connecting the controller to the temperature detection mechanism, the data detected by the temperature detection mechanism can be transmitted to the controller in real time. When the detected gas temperature in the reaction chamber is higher than the preset temperature, in order to prevent the organic gas from prematurely pyrolyzing and carbonizing in the organic gas delivery pipeline, the controller adjusts the flow rate and temperature of the gas input to the reaction chamber.

[0017] Optionally, the CVD reaction apparatus further includes an exhaust gas treatment device, which is connected to the exhaust port of the reaction chamber.

[0018] In this solution, by setting up an exhaust gas treatment device, the exhaust gas generated in the reaction chamber can be treated, significantly reducing the harm to the environment.

[0019] Optionally, the exhaust gas treatment device further includes an exhaust gas treatment chamber and a cooling chamber. The cooling chamber is located on the outer periphery of the exhaust gas treatment chamber and is connected to the exhaust port. The cooling chamber is used to introduce a cooling substance.

[0020] In this scheme, by connecting the exhaust port to the exhaust gas treatment chamber, the exhaust gas generated in the reaction chamber enters the exhaust gas treatment chamber, and the exhaust gas is cooled by the cooling substance introduced into the cooling chamber, so that harmful substances such as tar in the exhaust gas condense and the exhaust gas is prevented from polluting the air.

[0021] Optionally, the exhaust gas treatment device further includes a twin-screw conveying pump, which is disposed in the exhaust gas treatment chamber. The air inlet of the exhaust gas treatment chamber is disposed at the first end of the twin-screw conveying pump, and the air outlet of the exhaust gas treatment chamber is disposed at the second end of the twin-screw pump away from the first end.

[0022] The inlet of the cooling chamber is located at one end near the air inlet of the exhaust gas treatment chamber, and the outlet of the cooling chamber is located at one end near the air outlet of the exhaust gas treatment chamber.

[0023] In this solution, by setting the inlet of the cooling chamber at one end near the air inlet of the exhaust gas treatment chamber and setting the outlet of the cooling chamber at one end near the air outlet of the exhaust gas treatment chamber, the flow direction of the exhaust gas can be aligned with the flow direction of the cooling substance, thereby improving the cooling efficiency.

[0024] The positive and progressive effects of this utility model are as follows:

[0025] The CVD reactor of this invention cools the organic gas delivery pipeline by setting a cooling material delivery pipeline in the reaction chamber. This effectively controls the temperature of the organic gas delivery pipeline and prevents the organic gas from pyrolyzing and carbonizing prematurely in the pipeline due to excessively high temperature. As a result, the organic gas pyrolyzes only after being delivered to the reaction chamber, thus improving the utilization rate of the organic gas and the coating efficiency of the CVD reactor. Attached Figure Description

[0026] Figure 1 This is a schematic diagram of the structure of a CVD reaction device according to an embodiment of the present invention;

[0027] Figure 2 for Figure 1 A schematic diagram of a CVD reactor from another perspective;

[0028] Figure 3 for Figure 1 A cross-sectional schematic diagram of a CVD reactor in China;

[0029] Figure 4 for Figure 1 Schematic diagram of the internal structure of a CVD reactor;

[0030] Figure 5 This is a schematic diagram of the exhaust gas treatment device in an embodiment of the present invention;

[0031] Figure 6 for Figure 5 A cross-sectional structural diagram of the exhaust gas treatment device.

[0032] Explanation of reference numerals in the attached figures:

[0033] Reaction chamber 1

[0034] Organic gas transmission pipeline 2

[0035] First air outlet 21

[0036] Cooling material transport pipeline 3

[0037] Second air outlet 31

[0038] Flange 4

[0039] Exhaust gas treatment chamber 5

[0040] Exhaust gas inlet 51

[0041] Exhaust gas outlet 52

[0042] Cooling chamber 6

[0043] Cooling chamber inlet 61

[0044] Cooling chamber outlet 62

[0045] Twin-screw transfer pump 7 Detailed Implementation

[0046] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.

[0047] It should be noted that if the embodiments of this utility model involve directional indicators (such as up, down, left, right, front, back, etc.), the directional indicators are only used to explain the relative positional relationship and movement of the components in a specific posture. If the specific posture changes, the directional indicators will also change accordingly.

[0048] Furthermore, if the embodiments of this utility model involve descriptions such as "first" or "second," these descriptions are for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of indicated technical features. Therefore, features defined with "first" or "second" may explicitly or implicitly include at least one of those features. Additionally, the technical solutions of the various embodiments can be combined with each other, but this must be based on the ability of those skilled in the art to implement them. If the combination of technical solutions is contradictory or impossible to implement, it should be considered that such a combination of technical solutions does not exist and is not within the scope of protection claimed by this utility model.

[0049] Please see Figures 1 to 6 , Figure 1 This is a schematic diagram of the structure of a CVD reaction device according to an embodiment of the present invention. Figure 2 for Figure 1 A schematic diagram of a CVD reactor from another perspective. Figure 3 for Figure 1 A cross-sectional schematic diagram of a CVD reactor. Figure 4 for Figure 1 A schematic diagram of the internal structure of a CVD reaction apparatus. This embodiment of the invention provides a CVD reaction apparatus, which includes a reaction chamber 1, an organic gas delivery pipe 2 within the reaction chamber 1, and a cooling substance delivery pipe 3, through which a cooling substance is introduced to cool the organic gas delivery pipe 2.

[0050] By setting a cooling material delivery pipe 3 in the reaction chamber 1 to cool the organic gas delivery pipe 2, the temperature of the organic gas delivery pipe 2 can be effectively controlled, avoiding excessively high temperatures in the organic gas delivery pipe 2 and premature pyrolysis and carbonization of the organic gas in the organic gas delivery pipe 2. This allows more organic gas to be delivered to the reaction chamber 1 before pyrolysis, improving the utilization rate and coating efficiency of the organic gas.

[0051] In the CVD reactor, the organic gas is preheated by a heating mechanism before entering the organic gas delivery pipe 2 to prevent the organic gas entering the reaction chamber 1 from being too cold and affecting its pyrolysis and carbonization. The temperature of the organic gas in the organic gas delivery pipe 2 can be controlled by setting up a cooling material delivery pipe 3.

[0052] In this embodiment, the cooling substance is an inert gas, such as nitrogen. The cooling substance delivery pipe 3 has a second outlet 31, which is located between the inner wall of the reaction chamber 1 and the outer peripheral wall of the organic gas delivery pipe 2.

[0053] By arranging the second gas outlet 31 between the inner wall of the reaction chamber 1 and the outer peripheral wall of the organic gas conveying pipe 2, the inert gas at a lower temperature cools the outer wall of the organic gas conveying pipe 2, directly and efficiently suppressing the temperature rise of the organic gas conveying pipe 2, reducing the risk of thermal decomposition of organic gas in the organic gas conveying pipe 2. At the same time, the inert gas used will not react with other substances in the reaction chamber 1, ensuring the coating quality and the stability of the coating process.

[0054] Combination Figure 3 Continuing the explanation, specifically, the organic gas delivery pipe 2 is located in the middle of the reaction chamber 1, and there are multiple cooling substance delivery pipes 3. These multiple cooling substance delivery pipes 3 are arranged circumferentially along the organic gas delivery pipe 2, and their second outlets 31 are spaced apart along the axial direction of the organic gas delivery pipe 2. One end of the first outlet 21 of the organic gas delivery pipe 2 is located in the reaction chamber 1, and the second outlets 31 of the multiple cooling substance delivery pipes 3 are also located in the reaction chamber 1. The length of the cooling substance delivery pipes 3 extending into the reaction chamber 1 can be adjusted according to actual needs. The second outlets 31 of the cooling substance delivery pipes 3 are bent towards the outer peripheral wall of the organic gas delivery pipe 2.

[0055] By setting a cooling material conveying pipe 3 along the circumference of the organic gas conveying pipe 2, relatively uniform cooling of the outer wall of the organic gas conveying pipe 2 can be achieved.

[0056] In this embodiment, both the organic gas conveying pipe 2 and the cooling material conveying pipe 3 are installed on the reactor with the reaction chamber 1 via flange 4. The CVD coating process occurs in the reaction chamber 1. The organic gas conveying pipe 2 conveys organic gas into the reaction chamber 1. A low-temperature inert gas, such as nitrogen, is conveyed through the cooling material conveying pipe 3 to cool the organic gas in the organic gas conveying pipe 2. The inert gas is output from the second outlet 31 of the cooling material conveying pipe 3 and also enters the reaction chamber 1.

[0057] In this embodiment, the CVD reactor further includes a temperature detection mechanism, which is disposed in the reaction chamber 1 and used to detect the temperature of the gas in the reaction chamber 1. The CVD reactor also includes a controller (not shown in the figure), which is electrically connected to the temperature detection mechanism, wherein the temperature detection mechanism is a temperature sensor. Specifically, this embodiment uses an automatic programming PID control system to control the gas flow rate and gas temperature. After the controller obtains the temperature of the mixed gas (i.e., the mixture of organic gas and inert gas) in the reaction chamber 1 detected by the temperature detection mechanism, the preset PID algorithm in the automatic programming PID control system will estimate the temperature of the organic gas in the organic gas delivery pipe 2 based on the current temperature of the mixed gas. If the estimated temperature of the organic gas is greater than the preset temperature, the controller can adjust the input flow rate of the organic gas, the initial temperature of the organic gas, the input flow rate of the inert gas in the cooling material delivery pipe 3, or the temperature of the inert gas, so that the temperature of the organic gas in the organic gas delivery pipe 2 is below the preset temperature to avoid premature pyrolysis and carbonization of the organic gas in the organic gas delivery pipe.

[0058] Specifically, during adjustment, the above four parameters can also be adjusted according to needs. For example, when adjusting the temperature of organic gas by controlling the input flow rate of inert gas in cooling material conveying pipe 3, the controller estimates the temperature of organic gas after receiving the specific temperature value of the mixed gas detected by the temperature detection mechanism, and then calculates the value of the input flow rate of inert gas to reduce the temperature of organic gas to below the preset temperature. The controller controls the input flow rate of inert gas according to the calculation result.

[0059] By arranging a temperature detection mechanism in the reaction chamber 1, the temperature of the gas in the reaction chamber 1 can be obtained in real time and fed back to the controller. The controller can adjust the flow rate and temperature of the gas input into the reaction chamber 1 based on the real-time detected temperature, thereby avoiding premature pyrolysis and carbonization of organic gas in the organic gas delivery pipeline 2.

[0060] In other embodiments, the temperature detection mechanism can be directly installed inside the organic gas conveying pipe 2 to directly obtain the temperature of the organic gas inside the organic gas conveying pipe 2. The controller compares the obtained temperature of the organic gas with a preset temperature. If the temperature of the organic gas is greater than the preset temperature, the controller can adjust the input flow rate of the organic gas, the initial temperature of the organic gas, the input flow rate of the inert gas in the cooling material conveying pipe 3, or the temperature of the inert gas, so that the temperature of the organic gas in the organic gas conveying pipe 2 is below the preset temperature to avoid premature pyrolysis and carbonization of the organic gas in the organic gas conveying pipe.

[0061] In other embodiments, cooling pipes can also be installed on the organic gas conveying pipe 2 to cool the organic gas.

[0062] Combination Figure 5 and Figure 6 To elaborate further, Figure 5 This is a schematic diagram of the exhaust gas treatment device in an embodiment of this utility model. Figure 6 for Figure 5 A cross-sectional schematic diagram of the exhaust gas treatment device. In this embodiment, the CVD reactor also includes an exhaust gas treatment device, which is connected to the exhaust port of the reaction chamber 1. By setting up the exhaust gas treatment device, the exhaust gas generated in the reaction chamber 1 can be treated, significantly reducing environmental hazards.

[0063] Specifically, the exhaust gas treatment device also includes an exhaust gas treatment chamber 5 and a cooling chamber 6. The cooling chamber 6 is located on the outer periphery of the exhaust gas treatment chamber 5, and the exhaust gas treatment chamber 5 is connected to the exhaust port. The cooling chamber 6 is used to introduce a cooling substance. The cooling substance can be an inert gas, such as nitrogen, or it can be water or other liquid cooling substances. The exhaust gas output from the exhaust port enters the exhaust gas treatment chamber 5, and the cooling substance in the cooling chamber 6 cools the exhaust gas, causing harmful substances such as tar in the exhaust gas to condense, thus preventing the emitted exhaust gas from polluting the air.

[0064] In this embodiment, the exhaust gas treatment device further includes a twin-screw conveying pump 7, which is disposed in the exhaust gas treatment chamber 5. The exhaust gas treatment chamber 5 includes an exhaust gas inlet 51 and an exhaust gas outlet 52. The exhaust gas inlet 51 is disposed at the first end of the twin-screw conveying pump 7, and the exhaust gas outlet 52 is disposed at the second end of the twin-screw pump 7 away from the first end. The cooling chamber inlet 61 is disposed at the end close to the exhaust gas inlet 51, and the cooling chamber outlet 62 is disposed at the end close to the exhaust gas outlet 52.

[0065] By setting the cooling chamber inlet 61 at one end near the exhaust gas inlet 51 and the cooling chamber outlet 62 at one end near the exhaust gas outlet 52, the flow direction of the exhaust gas can be aligned with the flow direction of the cooling substance, thereby improving the cooling efficiency.

[0066] Specifically, the exhaust gas inlet 51 is connected to the exhaust port of the reaction chamber 1. The exhaust gas generated in the reaction chamber 1 enters the exhaust gas treatment chamber 5, is cooled by the cooling substance in the cooling chamber 6, and is discharged from the exhaust gas treatment chamber 5.

[0067] The exhaust gas treatment chamber 5 also includes a tar outlet, which is located at the second end of the twin-screw conveyor pump 7. Gaseous tar in the exhaust gas condenses after being cooled by a cooling substance. The condensed tar is then transported to the tar outlet via the twin-screw conveyor pump 7 within the exhaust gas treatment chamber 5 and discharged through this outlet. Lowering the exhaust gas temperature by using a cooling substance enables tar condensation, preventing air pollution from the emitted exhaust gas. By installing the exhaust gas treatment device, not only is air pollution from the emitted exhaust gas prevented, but also excessively high temperatures at the exhaust gas temperature discharged from the reaction chamber 1 can prevent spontaneous combustion and accidents.

[0068] The various embodiments in this specification are described in a progressive manner. Similar or identical parts between embodiments can be referred to mutually. Each embodiment focuses on describing the differences from other embodiments. In particular, the device embodiments are basically similar to the method embodiments, so the description is relatively simple; relevant parts can be referred to the descriptions of the method embodiments.

[0069] The above description is only a preferred embodiment of this application and is not intended to limit this application. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A CVD reaction apparatus, comprising a reaction chamber, wherein an organic gas delivery pipe is provided within the reaction chamber, characterized in that, The CVD reactor also includes a cooling material transport pipeline; Cooling material is introduced into the cooling material delivery pipeline to cool the organic gas delivery pipeline.

2. The CVD reaction apparatus as described in claim 1, characterized in that, The cooling substance is an inert gas, and the cooling substance delivery pipe has an outlet, which is located between the inner wall of the reaction chamber and the outer peripheral wall of the organic gas delivery pipe.

3. The CVD reaction apparatus as described in claim 2, characterized in that, The outlet of the cooling material conveying pipe faces the outer peripheral wall of the organic gas conveying pipe.

4. The CVD reaction apparatus as described in claim 2, characterized in that, The cooling material delivery pipes are multiple in number and are arranged circumferentially along the organic gas delivery pipes.

5. The CVD reaction apparatus as described in claim 4, characterized in that, The outlets of the plurality of cooling substance delivery pipes are spaced apart along the axial direction of the organic gas delivery pipes.

6. The CVD reaction apparatus as described in claim 1, characterized in that, The CVD reaction apparatus also includes a temperature detection mechanism, which is disposed in the reaction chamber and used to detect the temperature of the gas in the reaction chamber.

7. The CVD reaction apparatus as described in claim 6, characterized in that, The CVD reaction apparatus also includes a controller, which is electrically connected to the temperature detection mechanism.

8. The CVD reaction apparatus as described in claim 1, characterized in that, The CVD reaction apparatus also includes an exhaust gas treatment device, which is connected to the exhaust port of the reaction chamber.

9. The CVD reaction apparatus as described in claim 8, characterized in that, The exhaust gas treatment device further includes an exhaust gas treatment chamber and a cooling chamber. The cooling chamber is located on the outer periphery of the exhaust gas treatment chamber and is connected to the exhaust port. The cooling chamber is used to introduce a cooling substance.

10. The CVD reaction apparatus as described in claim 9, characterized in that, The exhaust gas treatment device further includes a twin-screw conveying pump, which is disposed in the exhaust gas treatment chamber. The air inlet of the exhaust gas treatment chamber is disposed at the first end of the twin-screw conveying pump, and the air outlet of the exhaust gas treatment chamber is disposed at the second end of the twin-screw pump away from the first end. The inlet of the cooling chamber is located at one end near the air inlet of the exhaust gas treatment chamber, and the outlet of the cooling chamber is located at one end near the air outlet of the exhaust gas treatment chamber.