An automatic chemical liquid adding system

Abstract

The utility model discloses a kind of automatic liquid adding systems, including etching device, liquid adding device and control system, etching device includes etching groove, main water tank and spare water tank;Liquid adding device includes liquid storage tank, first buffer tank and second buffer tank, first buffer tank is connected with first metering pump, first metering pump is connected with first liquid adding pipeline, first liquid adding pipeline is communicated with main water tank and spare water tank respectively, second buffer tank is connected with second metering pump, second metering pump is communicated with main pipeline by second liquid adding pipeline, the pipe diameter of first liquid adding pipeline is greater than the pipe diameter of second liquid adding pipeline. By setting liquid adding device and control system, control system can be large flow liquid supplement, improve production efficiency. Second metering pump can also be controlled directly into etching groove into liquid, effectively improve the precision of liquid addition.

Description

Technical Field

[0001] This utility model relates to the field of etching equipment technology, and in particular to an automatic chemical solution addition system. Background Technology

[0002] When copper acid etching solution is used in a customer's WET (wet etching) machine, the addition of reagents is required depending on the production process. Specifically, this involves replenishing the etching solution with reagents such as catalysts and stabilizers, collectively referred to as "B-agents." Because B-agents are consumed during etching, their concentration decreases, necessitating timely replenishment to maintain the stability of the etching solution's composition and ensure the consistency of the etching process. Traditional WET machines use reagent addition devices with water pumps to deliver the required reagents. This approach not only struggles to guarantee the accuracy of addition and the integrity of data recording, but also makes it difficult to increase the flow rate when changing to other reagents or adding large quantities, resulting in low reagent replacement efficiency and impacting production efficiency. Utility Model Content

[0003] The purpose of this invention is to provide an automatic medicine dispensing system that can accurately add medicine and quickly replenish large quantities of medicine, thereby improving production efficiency.

[0004] To achieve this objective, the present invention adopts the following technical solution: an automatic liquid addition system, comprising an etching device, a liquid addition device, and a control system. The etching device includes an etching tank, a main water tank, and a backup water tank. The main water tank and the backup water tank are respectively connected to the etching tank via main pipelines. A first level gauge is installed in both the main water tank and the backup water tank. The liquid addition device includes a storage tank, a first buffer tank, and a second buffer tank. The capacity of the second buffer tank is smaller than that of the first buffer tank. The storage tank is connected to both the first and second buffer tanks. The first buffer tank is connected to a first metering pump. The first metering pump is connected to a first liquid addition pipeline. The first liquid addition pipeline is connected to both the main water tank and the backup water tank. The second buffer tank is connected to a second metering pump. The second metering pump is connected to the main pipeline via a second liquid addition pipeline. The diameter of the first liquid addition pipeline is larger than that of the second liquid addition pipeline. The control system is communicatively connected to the first level gauge, the first metering pump, and the second metering pump.

[0005] Preferably, the liquid filling device further includes an installation cabinet, which has an upper chamber and a lower chamber. The upper chamber is located above the lower chamber, the first buffer box is fixed in the lower chamber, and the second buffer box is fixed in the upper chamber.

[0006] Preferably, the liquid filling device further includes a first leak-proof pallet, which is fixed to the ground, and the installation cabinet is attached to the first leak-proof pallet.

[0007] Preferably, the capacity of the first buffer box is aL and the capacity of the second buffer box is bL, satisfying a / 20≤b≤a / 15.

[0008] Preferably, both the first liquid filling pipe and the second liquid filling pipe are equipped with regulating valves.

[0009] Preferably, the regulating valve is configured as a pneumatic diaphragm regulating valve.

[0010] Preferably, the bottom of the first buffer box is provided with a shut-off valve.

[0011] Preferably, the control system is connected to an audible and visual alarm.

[0012] Preferably, the main water tank and the backup water tank are the same shape and equal in size.

[0013] The beneficial effects of this invention are as follows: When the automatic chemical solution addition system is working, the etching tank of the etching device is used to etch the product to be treated, and the main water tank replenishes the etching tank with chemical solution, thereby maintaining the stability of the etching solution composition. When the chemical solution in the main water tank is insufficient, the main pipeline switches to the backup water tank to achieve seamless chemical solution replenishment. By setting up a chemical solution addition device and a control system, the control system can control the first metering pump to switch on and off based on the feedback from the first level gauge. When the chemical solution in the main water tank and backup water tank is insufficient, or when the chemical solution needs to be replaced, the control system can control the chemical solution addition device to replenish the solution at a large flow rate, thereby improving production efficiency. The control system can also control the second metering pump to start when the etching device is working, directly introducing the chemical solution into the etching tank through the second buffer tank, effectively improving the accuracy of chemical solution addition. The controller records the data of the second metering pump to ensure the integrity of the chemical solution addition data recording. Attached Figure Description

[0014] Figure 1 This is a schematic diagram of the structure of the automatic drug addition system according to an embodiment of this application.

[0015] In the diagram: 100, etching device; 110, etching tank; 120, main water tank; 130, spare water tank; 200, liquid filling device; 210, liquid storage tank; 220, first buffer tank; 221, first metering pump; 222, first liquid filling pipeline; 223, shut-off valve; 230, second buffer tank; 231, second metering pump; 232, second liquid filling pipeline; 233, regulating valve; 240, mounting cabinet; 241, upper chamber; 242, lower chamber; 250, first leak-proof pallet; 260, second leak-proof pallet. Specific Implementation

[0016] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present invention and not intended to limit it. Furthermore, it should be noted that, for ease of description, the accompanying drawings show only the parts relevant to the present invention, not the entire structure.

[0017] In the description of this utility model, unless otherwise explicitly specified and limited, the terms "connected," "linked," and "fixed" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0018] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0019] In the description of this embodiment, the terms "upper," "lower," "right," etc., refer to the orientation or positional relationship shown in the accompanying drawings. They are used only for ease of description and simplification of operation, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. In addition, the terms "first" and "second" are only used for distinction in description and have no special meaning.

[0020] Reference Figure 1As shown, an automatic chemical solution addition system according to an embodiment of this application includes an etching device 100, a solution addition device 200, and a control system. The etching device 100 includes an etching tank 110, a main water tank 120, and a backup water tank 130. The etching tank 110 stores etching solution, and a spraying device for spraying the etching solution is provided above the etching tank 110. The main water tank 120 and the backup water tank 130 are respectively connected to the etching tank 110 via main pipelines. Specifically, the main pipelines are in an inverted Y-shape, with the two input ends of the Y-shaped main pipeline connected to the main water tank 120 and the backup water tank 130 respectively, and the output end connected to the etching tank 110. Both the main water tank 120 and the backup water tank 130 are equipped with a first level gauge. The first level gauges are arranged in pairs along the vertical direction. That is, the main water tank 120 is equipped with two first level gauges spaced vertically apart, and the backup water tank 130 is also equipped with two first level gauges spaced vertically apart. The position of the first level gauge is set according to the height of the corresponding main water tank 120 and backup water tank 130, which will not be described in detail here.

[0021] The liquid filling device 200 includes a liquid storage tank 210, a first buffer tank 220, and a second buffer tank 230. The capacity of the second buffer tank 230 is smaller than that of the first buffer tank 220. The liquid storage tank 210 is connected to the first buffer tank 220 and the second buffer tank 230 respectively. The first buffer tank 220 is connected to a first metering pump 221. The first buffer tank 220 is equipped with a second level gauge that is used in conjunction with the first metering pump 221. The first metering pump 221 is connected to a first liquid filling pipe 222. The first liquid filling pipe 222 is connected to the main water tank 120 and the backup water tank 130 respectively. The second buffer tank 230 is connected to the second metering pump 231. The second buffer tank 230 contains a third level gauge that works in conjunction with the second metering pump 231. The second metering pump 231 is connected to the main pipeline via a second filling pipe 232. The diameter of the first filling pipe 222 is larger than that of the second filling pipe 232. Both the first buffer tank 220 and the second buffer tank 230 can temporarily store the liquid medicine delivered from the storage tank 210, shortening the suction head of the corresponding metering pump and improving the liquid supply response speed. In this embodiment, the storage tank 210 is an IBC (Intermediate Bulk Container) with a capacity of 2000-3000L, which will not be described in detail here.

[0022] The control system is communicatively connected to the first level gauge, the first metering pump 221, and the second metering pump 231. In this embodiment, the control system can be a centralized or distributed controller. For example, the controller can be a single microcontroller or a combination of multiple distributed microcontrollers. The microcontroller can run a control program to control the first level gauge, the first metering pump 221, and the second metering pump 231 to achieve their functions.

[0023] Understandably, when the automatic chemical solution replenishment system is working, the etching tank 110 of the etching device 100 and the spray device work together to etch the product to be treated. The main water tank 120 replenishes the chemical solution to the etching tank 110 through the main pipeline, thereby maintaining the stability of the etching solution composition. When the chemical solution in the main water tank 120 is insufficient, the main pipeline switches to the backup water tank 130 to achieve seamless chemical solution replenishment.

[0024] By setting up a liquid replenishment device 200 and a control system, the control system can control the switching of the first metering pump 221 based on feedback from the first liquid level gauge. When the liquid in the main water tank 120 and the backup water tank 130 is insufficient, or when the liquid needs to be replaced, the control system can control the liquid replenishment device 200 to replenish the liquid. Specifically, when the first liquid level gauge in the main water tank 120 of the etching device 100 detects that the liquid level is low and the liquid needs to be replenished, the control system sends a demand signal. After receiving the signal, the first metering pump 221 of the liquid replenishment device 200 replenishes the main water tank 120 quantitatively. Similarly, when the first liquid level gauge in the backup water tank 130 of the etching device 100 detects that the liquid level is low and the liquid needs to be replenished, the control system sends a demand signal. After receiving the signal, the first metering pump 221 of the liquid replenishment device 200 replenishes the backup water tank 130 quantitatively. The liquid is quickly added through the high-flow-rate first liquid replenishment pipe 222, realizing rapid liquid replenishment or replacement, effectively improving the production efficiency of the etching device 100. The control system can also activate the second metering pump 231 when the etching device 100 is operating and the main water tank 120 and backup water tank 130 are not replenished in time. This pump directly introduces the chemical solution into the etching tank 110 through the second buffer tank 230. The second metering pump 231 injects the required chemical solution into the etching tank 110 with microliter or milliliter-level precision, ensuring that the composition deviation of the etching solution remains within a reasonable range and effectively improving the accuracy of chemical solution addition. The controller records the data from the second metering pump 231 to ensure the integrity of the chemical solution addition data. Furthermore, when the replenishing device 200 malfunctions (leakage, pump malfunction, chemical solution level below the limit, etc.), the control system can also immediately stop the replenishment of the first metering pump 221 and the second metering pump 231, and simultaneously send an alarm signal to the etching device 100 to stop etching, thus preventing product defects.

[0025] The first buffer tank 220 has a capacity of aL, and the second buffer tank 230 has a capacity of bL, satisfying a / 20 ≤ b ≤ a / 15. For example, in this embodiment, the first buffer tank 220 has a capacity of 300L, and the second buffer tank 230 has a capacity of 18L.

[0026] The capacity of the smaller second buffer tank 230 is limited to more than one-twentieth of the capacity of the larger first buffer tank 220 to prevent the second buffer tank 230 from being too small and unable to continuously replenish the medicine. Conversely, the capacity of the second buffer tank 230 is limited to less than one-tenth of the capacity of the first buffer tank 220 to prevent the second buffer tank 230 from being too large and unable to control the accuracy of the second metering pump 231. By reasonably limiting the capacity ratio between the second buffer tank 230 and the first buffer tank 220, a balance is maintained between replenishment efficiency and replenishment accuracy in the second replenishment pipeline 232, improving the structural rationality of the replenishment device 200.

[0027] Furthermore, the control system is connected to an audible and visual alarm. Specifically, in this embodiment, the control system is integrated into a remote host computer located in an area convenient for user control, and the audible and visual alarm is also integrated into the host computer and electrically connected to the control system.

[0028] By setting up an audible and visual alarm, when the control system detects an abnormality in the liquid filling device 200, the control system activates the audible and visual alarm to remind the user to check and maintain the liquid filling device 200 in a timely manner to ensure production progress. In other embodiments, the audible and visual alarm can also be replaced with common alarm devices such as buzzers, sirens, and safety warning lights, which can also serve as reminders; these will not be elaborated further here.

[0029] In some embodiments, the liquid filling device 200 further includes a mounting cabinet 240, which is a vertical cubic shape. The mounting cabinet 240 has an upper cavity 241 and a lower cavity 242. The upper cavity 241 is located above the lower cavity 242. A first buffer tank 220 and a first metering pump 221 are fixed in the lower cavity 242, and a second buffer tank 230 and a second metering pump 231 are fixed in the upper cavity 241. An openable and closable maintenance door is provided on the same side of both the upper cavity 241 and the lower cavity 242.

[0030] By setting up the installation cabinet 240, the first buffer tank 220, the first metering pump 221, the second buffer tank 230 and the second metering pump 231 are integrated in the same place, which is convenient for users to assemble, use or inspect, maintain and replace. It can not only protect the first buffer tank 220, the first metering pump 221, the second buffer tank 230 and the second metering pump 231, but also reduce the maintenance cost of the liquid filling device 200 in the later stage.

[0031] Furthermore, the liquid filling device 200 also includes a first leak-proof pallet 250, which is fixed to the ground, and the mounting cabinet 240 overlaps the first leak-proof pallet 250. The projection of the mounting cabinet 240 on the horizontal plane is located within the projection of the first leak-proof pallet 250 on the horizontal plane.

[0032] By setting a first leak-proof pallet 250, which is placed below the mounting cabinet 240, secondary leak-proof protection can be provided. If the first buffer box 220 or the second buffer box 230 in the mounting cabinet 240 leaks, the first leak-proof pallet 250 can contain the leaked liquid, preventing pollution of the workshop environment and damage to equipment, and effectively improving the safety of the liquid filling device 200.

[0033] Optionally, the liquid filling device 200 also includes a second leak-proof pallet 260, which is located below the liquid storage tank 210 to contain any liquid leakage from the liquid storage tank 210.

[0034] In some embodiments, both the first liquid filling pipe 222 and the second liquid filling pipe 232 are provided with regulating valves 233.

[0035] By setting the regulating valve 233, the user can control the flow rate and velocity of the chemical solution in real time during the process of adding chemical solution to the main water tank 120 (or the backup water tank 130) via the first adding pipe 222 and adding chemical solution to the etching tank 110 via the second adding pipe, thereby adapting to different etching requirements and improving the practicality of the adding device 200.

[0036] Furthermore, the regulating valve 233 is configured as a pneumatic diaphragm regulating valve 233. The pneumatic diaphragm regulating valve 233 uses compressed air to drive a pneumatic actuator, which in turn moves the diaphragm and valve core, thereby controlling the flow rate and pressure of the liquid medicine passing through the valve body.

[0037] By setting up a pneumatic diaphragm regulating valve, the sealing performance of the regulating valve 233 is effectively improved while ensuring the control accuracy of the regulating valve 233, reducing the probability of liquid leakage and further improving the safety of the liquid adding device 200.

[0038] Furthermore, a shut-off valve 223 is provided at the bottom of the first buffer box 220.

[0039] Because the first buffer tank 220 has a large capacity, when different medications need to be replaced, the pumping of the first metering pump 221 alone cannot quickly drain the medication to be replaced. By setting a shut-off valve 223, the user can quickly drain the medication from the first buffer tank 220 by opening the shut-off valve 223, which facilitates subsequent quick medication replacement and improves the ease of use of the liquid replenishment device 200.

[0040] Optionally, the main water tank 120 and the backup water tank 130 are identical in shape and equal in size.

[0041] Setting the specifications of the main water tank 120 and the backup water tank 130 improves the interchangeability of the main water tank 120 and the backup water tank 130, reduces the layout cost of the main water tank 120 and the backup water tank 130, and facilitates the configuration and use of the first liquid filling pipeline 222.

[0042] Obviously, the above embodiments of this utility model are merely examples for clearly illustrating the present utility model, and are not intended to limit the implementation of the present utility model. Those skilled in the art can make various obvious changes, readjustments, and substitutions without departing from the protection scope of this utility model. It is neither necessary nor possible to exhaustively describe all embodiments here. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this utility model should be included within the protection scope of the claims of this utility model.

Claims

1. An automatic medicine dispensing system, characterized in that, include: The etching apparatus (100) includes an etching tank (110), a main water tank (120) and a backup water tank (130). The main water tank (120) and the backup water tank (130) are respectively connected to the etching tank (110) through a main pipeline. A first level gauge is provided in both the main water tank (120) and the backup water tank (130). The liquid filling device (200) includes a liquid storage tank (210), a first buffer tank (220), and a second buffer tank (230). The capacity of the second buffer tank (230) is smaller than that of the first buffer tank (220). The liquid storage tank (210) is connected to the first buffer tank (220) and the second buffer tank (230) respectively. The first buffer tank (220) is connected to a first metering pump (221). The first metering pump (221) is connected to a first liquid filling pipe (222). The first liquid filling pipe (222) is connected to the main water tank (120) and the backup water tank (130) respectively. The second buffer tank (230) is connected to a second metering pump (231). The second metering pump (231) is connected to the main pipeline through the second liquid filling pipe (232). The diameter of the first liquid filling pipe (222) is larger than that of the second liquid filling pipe (232). The control system is communicatively connected to the first level gauge, the first metering pump (221), and the second metering pump (231), respectively.

2. The automatic drug dispensing system according to claim 1, characterized in that, The liquid filling device (200) also includes an installation cabinet (240), which has an upper cavity (241) and a lower cavity (242). The upper cavity (241) is located above the lower cavity (242). The first buffer box (220) is fixed in the lower cavity (242), and the second buffer box (230) is fixed in the upper cavity (241).

3. The automatic drug dispensing system according to claim 2, characterized in that, The liquid filling device (200) also includes a first leak-proof pallet (250), which is fixed to the ground, and the installation cabinet (240) is attached to the first leak-proof pallet (250).

4. The automatic drug dispensing system according to any one of claims 1-3, characterized in that, The capacity of the first buffer box (220) is aL, and the capacity of the second buffer box (230) is bL, satisfying a / 20≤b≤a / 15.

5. The automatic drug dispensing system according to any one of claims 1-3, characterized in that, Both the first liquid filling pipe (222) and the second liquid filling pipe (232) are equipped with regulating valves (233).

6. The automatic drug dispensing system according to claim 5, characterized in that, The regulating valve (233) is configured as a pneumatic diaphragm regulating valve.

7. The automatic drug dispensing system according to any one of claims 1-3, characterized in that, The bottom of the first buffer box (220) is provided with a shut-off valve (223).

8. The automatic drug dispensing system according to any one of claims 1-3, characterized in that, The control system is connected to an audible and visual alarm.

9. The automatic drug dispensing system according to any one of claims 1-3, characterized in that, The main water tank (120) and the backup water tank (130) are identical in shape and size.

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