A surface microstructure electrochemical etching device for photovoltaic solder ribbon

CN224884234UActive Publication Date: 2026-10-23TANGSHAN HAITAI NEW ENERGY TECH CO LTD
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Patent Information

Application Number
CN202522711280.3
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-12-22
Publication Date
2026-10-23
Estimated Expiration
2035-12-22

AI Technical Summary

Technical Problem

当前光伏焊带表面微结构电化学蚀刻设备在实际应用中存在诸多不足:其一,蚀刻头高度调节多依赖人工或简易机械结构,难以适配不同厚度焊带,易因间距偏差导致蚀刻深度不均;其二,电解液喷淋多为开放式或简易围挡设计,易出现飞溅浪费,且无法精准控制液层厚度,过度覆盖或局部裸露均会影响蚀刻效果,同时存在腐蚀设备与安全隐患;其三,电解液循环系统缺乏高效过滤与稳定输送结构,杂质易堵塞喷嘴、磨损泵体,缩短设备寿命,且在蚀刻过程中焊带易偏移或被刮伤的情况,进一步降低加工良品率,这些问题导致现有设备蚀刻效率低、产品一致性差、维护成本高,难以满足光伏焊带规模化、高精度生产需求

Benefits of technology

该设备通过合理布局各组件,实现了对光伏焊带表面微结构的高效、精准电化学蚀刻,其中通过电缸驱动升降板带动蚀刻头进行垂直方向上的精确移动,以适应不同厚度光伏焊带的蚀刻需求,同时防护罩与支撑缓冲组件的配合,不仅为蚀刻头提供了稳定的加工环境,还有效防止了电解液在蚀刻过程中的飞溅,保护了操作人员的安全,同时减少了电解液的浪费,且多个支管与喷嘴的设计,使得电解液能够均匀且充足地喷洒在蚀刻区域,确保了蚀刻效果的均匀性和一致性,而防护罩底侧的硅胶垫和通道设计,既保证了光伏焊带在蚀刻过程中的稳定性,又避免了电解液从接触位置过度溢出,同时防止了防护罩对光伏焊带的刮伤,且溢流口的设置能够避免防护罩内过度积聚电解液而影响正常的蚀刻加工,并能够保证电解液对光伏焊带待蚀刻加工区域的覆盖效果。

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Abstract

The utility model belongs to photovoltaic module manufacturing equipment technical field especially for a kind of surface microstructure electrochemical etching equipment for photovoltaic solder strip, including mounting bracket, lifting plate, electric jar, support box, mounting seat, etching head, protective cover, multiple branch pipes, delivery pump, support buffer assembly, backing plate and control panel;The electric jar is fixedly installed at the top side of mounting bracket.The utility model design is reasonable, can effectively carry out microstructure electrochemical etching treatment to photovoltaic solder strip surface, not only can be accurately adjusted to the position of etching head to satisfy the requirement of different etching depth, while it can be realized the uniform spraying of etching liquid under the condition of avoiding the interference of etching head by external environment, and effectively control electrolyte's covering thickness to etching area, also can realize the rapid use of electrolyte and avoid delivery pump blockage, and can provide effective positioning effect to photovoltaic solder strip, effectively improve etching efficiency and quality.
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Description

Technical Field

[0001] This utility model relates to the field of photovoltaic module manufacturing equipment technology, and in particular to an electrochemical etching device for the surface microstructure of photovoltaic ribbons. Background Technology

[0002] As a key conductive connector in photovoltaic modules, the precision and uniformity of the surface microstructure of photovoltaic ribbons directly affect the photoelectric conversion efficiency of the modules. Current electrochemical etching equipment for the surface microstructure of photovoltaic ribbons suffers from several shortcomings in practical applications: First, the height adjustment of the etching head largely relies on manual labor or simple mechanical structures, making it difficult to adapt to ribbons of different thicknesses and prone to uneven etching depth due to spacing deviations. Second, electrolyte spraying is mostly an open or simple enclosure design, easily leading to splashing and waste, and making it impossible to accurately control the liquid layer thickness. Over-coverage or partial exposure will affect the etching effect, while also posing corrosion to equipment and safety hazards. Third, the electrolyte circulation system lacks efficient filtration and stable delivery structures, allowing impurities to easily clog nozzles, wear down pumps, and shorten equipment lifespan. Furthermore, the ribbon is prone to displacement or scratches during etching, further reducing the yield rate. These problems result in low etching efficiency, poor product consistency, and high maintenance costs for existing equipment, making it difficult to meet the demands of large-scale, high-precision photovoltaic ribbon production.

[0003] Therefore, this invention proposes an electrochemical etching device for the surface microstructure of photovoltaic ribbons to solve the above problems.

[0004] The information disclosed in this background section is intended only to enhance the understanding of the overall background of this utility model and should not be construed as an admission or in any way implying that the information constitutes prior art known to those skilled in the art. Utility Model Content

[0005] The purpose of this invention is to address the shortcomings mentioned in the background art by proposing an electrochemical etching device for the surface microstructure of photovoltaic ribbons.

[0006] The above-mentioned technical objective of this utility model is achieved through the following technical solution: an electrochemical etching device for surface microstructure of photovoltaic ribbon, comprising a mounting frame, a lifting plate, an electric cylinder, a support box, a mounting base, an etching head, a protective cover, multiple branch pipes, a delivery pump, a support buffer assembly, a tray, and a control panel; The electric cylinder is fixedly installed on the top side of the mounting frame, the lifting plate is fixedly installed on the telescopic end of the electric cylinder, the mounting base is fixedly installed on the bottom side of the lifting plate, the etching head is fixedly installed on the bottom side of the mounting base, the protective cover is slidably sleeved on the outside of the mounting base, the support and buffer assembly is set on the mounting base and connected to the protective cover, multiple branch pipes are fixedly installed on the protective cover and arranged radially based on the axis of the etching head, a nozzle is fixedly installed at the end of the multiple branch pipes near the etching head, and the end of the multiple branch pipes away from the etching head extends to the outside of the protective cover and is fixedly installed with the same annular pipe, and a delivery pump is fixedly installed on the bottom side of the lifting plate, and the outlet of the delivery pump is connected to the annular pipe; The support box is fixedly installed on the mounting frame and located directly below the etching head in the center. The top of the support box has a circular opening. The tray is fixedly installed inside the support box and located in the center of the circular opening. The inlet of the delivery pump is connected to the support box. The control panel is fixedly installed on the mounting frame and electrically connected to the delivery pump and the electric cylinder.

[0007] Preferably, the support and buffer assembly includes four support bars, four slide rods, and four buffer springs. Two support bars arranged in parallel to each other are fixedly installed on both sides of the mounting base. Two slide rods arranged in parallel to each other are fixedly installed on the side of the two support bars on the same side that are close to each other. Buffer springs that are fixedly connected to the top of the protective cover are movably sleeved on each of the four slide rods. The top ends of the four buffer springs are fixedly connected to the corresponding support bars above.

[0008] Preferably, the delivery pump is a magnetically driven centrifugal pump.

[0009] Preferably, the outlet and inlet of the delivery pump are respectively connected to a first elastic hose and a second elastic hose. The first elastic hose is connected to an annular pipe, and a suction pipe is fixedly installed on the support box. The top end of the suction pipe is connected to the second elastic hose.

[0010] Preferably, a spherical filter plate is fixedly installed inside the support box, and the bottom end of the suction pipe extends into the filter plate.

[0011] Preferably, the protective cover has multiple overflow ports located on the lower side wall.

[0012] Preferably, a flow guide ring is fixedly installed on the top of the support box, with the circular opening as the center.

[0013] Preferably, a ring-shaped silicone pad is fixedly installed on the bottom side of the protective cover, and the ring-shaped silicone pad has a channel for the photovoltaic welding ribbon to pass through.

[0014] Preferably, two guide rods are fixedly installed on the top side of the lifting plate, which are slidably connected to the mounting frame and arranged parallel to each other.

[0015] Preferably, the bottom inner wall of the support box is arranged with the left side higher than the right side, and a discharge pipe with a control valve is fixedly installed on the support box. The water inlet end of the discharge pipe is located at the lowest point of the bottom inner wall of the support box, and the suction pipe is located on the support box away from the discharge pipe.

[0016] The beneficial effects of this utility model are: This equipment achieves efficient and precise electrochemical etching of the microstructure on the surface of photovoltaic ribbons through the rational layout of its components. An electric cylinder drives a lifting plate to precisely move the etching head vertically, adapting to the etching requirements of photovoltaic ribbons of varying thicknesses. The combination of a protective cover and supporting buffer components not only provides a stable processing environment for the etching head but also effectively prevents electrolyte splashing during etching, protecting operator safety and reducing electrolyte waste. The design of multiple branches and nozzles ensures that the electrolyte is sprayed evenly and sufficiently onto the etching area, guaranteeing uniformity and consistency in the etching effect. The silicone pad and channel design on the bottom of the protective cover ensures the stability of the photovoltaic ribbon during etching, prevents excessive electrolyte overflow from the contact point, and prevents the protective cover from scratching the photovoltaic ribbon. The overflow port prevents excessive electrolyte accumulation inside the protective cover, which could affect normal etching processing, and ensures effective coverage of the photovoltaic ribbon area to be etched.

[0017] The delivery pump is a magnetically driven centrifugal pump, which not only provides stable flow output but also has excellent leak-proof performance, greatly reducing equipment maintenance costs and usage risks. At the same time, the filter plate design inside the support box effectively filters impurities in the electrolyte, preventing impurities from damaging the etching head and delivery pump, and extending the service life of the equipment. Attached Figure Description

[0018] To more clearly illustrate the technical solutions in the embodiments of this utility model, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0019] Figure 1 This is a three-dimensional structural schematic diagram of an electrochemical etching device for surface microstructure of photovoltaic ribbon proposed in this utility model; Figure 2 for Figure 1 Front view structural diagram; Figure 3 This is a partial three-dimensional structural schematic diagram of the present invention; Figure 4 This is a structural schematic diagram of the mounting base and support buffer assembly proposed in this utility model; Figure 5 This is a schematic diagram of the protective cover, overflow port, and silicone pad components proposed in this utility model. Figure 6 This is a cross-sectional structural diagram of the support box, tray, and guide ring components proposed in this utility model.

[0020] In the diagram: 1. Mounting bracket; 2. Lifting plate; 21. Electric cylinder; 22. Guide rod; 3. Mounting base; 31. Support bar; 32. Slide rod; 33. Buffer spring; 4. Etching head; 5. Protective cover; 51. Overflow port; 6. Support box; 601. Discharge pipe; 61. Guide ring; 62. Support plate; 7. Branch pipe; 701. Nozzle; 71. Ring pipe; 72. Transfer pump; 73. Elastic hose one; 74. Elastic hose two; 75. Suction pipe; 751. Filter plate; 8. Control panel. Detailed Implementation

[0021] The technical solution of this utility model will now be clearly and completely described with reference to specific embodiments. Obviously, the described embodiments are only a part of the embodiments of this utility model, and not all of them. All other embodiments obtained by those skilled in the art based on the embodiments of this utility model without creative effort are within the scope of protection of this utility model.

[0022] Reference Figure 1-6 An electrochemical etching device for surface microstructure of photovoltaic ribbon includes a mounting frame 1, a lifting plate 2, an electric cylinder 21, a support box 6, a mounting base 3, an etching head 4, a protective cover 5, multiple branch pipes 7, a delivery pump 72, a tray 62, and a control panel 8. The electric cylinder 21 is fixedly installed on the top side of the mounting frame 1, the lifting plate 2 is fixedly installed on the telescopic end of the electric cylinder 21, the mounting base 3 is fixedly installed on the bottom side of the lifting plate 2, the etching head 4 is fixedly installed on the bottom side of the mounting base 3, and the protective cover 5 is slidably sleeved on the outside of the mounting base 3. Two parallel support bars 31 are fixedly installed on both sides of the mounting base 3. Two parallel sliding rods 32 are fixedly installed on the side of the two support bars 31 on the same side that are close to each other. Each of the four sliding rods 32 is movably sleeved with a buffer spring 33 that is fixedly connected to the top of the protective cover 5. The top of the four buffer springs 33 is fixedly connected to the corresponding support bar 31 above, which can provide effective support and buffering effect for the protective cover 5, and will not affect the height adjustment of the etching head 4 during the etching process. Multiple branch pipes 7 are fixedly installed on the protective cover 5 and arranged radially based on the axis of the etching head 4. A nozzle 701 is fixedly installed at the end of the multiple branch pipes 7 near the etching head 4, and the end of the multiple branch pipes 7 away from the etching head 4 extends to the outside of the protective cover 5 and is fixedly installed with the same annular pipe 71. A delivery pump 72 is fixedly installed on the bottom side of the lifting plate 2, and the outlet of the delivery pump 72 is connected to the annular pipe 71. The delivery pump 72 is a magnetically driven centrifugal pump, which has the advantages of stable flow output, leak prevention, simple structure and low maintenance cost. The model of the magnetically driven centrifugal pump is not limited, and technicians can directly purchase and install it from the market according to actual needs. In order to ensure the stability of the photovoltaic ribbon during etching by pressing and limiting it with the protective cover 5, and to prevent the electrolyte from overflowing excessively from the contact point between the photovoltaic ribbon and the protective cover 5, and to prevent the protective cover 5 from scratching the photovoltaic ribbon, a ring-shaped silicone pad is fixedly installed on the bottom side of the protective cover 5. The ring-shaped silicone pad has a channel for the photovoltaic ribbon to pass through. Meanwhile, in order to discharge excess electrolyte from the protective cover 5 during the etching process and to prevent the electrolyte from over-covering the etching position of the photovoltaic ribbon, multiple overflow ports 51 are provided on the lower side wall of the protective cover 5. The support box 6 is fixedly installed on the mounting frame 1 and is located directly below the etching head 4 in the center. The top of the support box 6 has a circular opening. The support box 6 is designed to collect and hold electrolyte. The tray 62 is fixedly installed inside the support box 6 and is located in the center of the circular opening. The tray 62 is used to support the photovoltaic welding strip to be etched. The outer periphery of the tray 62 has multiple arc-shaped grooves for the electrolyte to flow downwards. The inlet of the delivery pump 72 is connected to the support box 6. In addition, in order to ensure the extraction of electrolyte from the support box 6 without affecting the lifting of the lifting plate 2, and to filter the electrolyte extracted from the support box 6 by the transfer pump 72 to prevent impurities from being sucked into the transfer pump 72, the outlet and inlet of the transfer pump 72 are respectively connected to a first elastic hose 73 and a second elastic hose 74. The first elastic hose 73 is connected to the annular pipe 71. A suction pipe 75 is fixedly installed on the support box 6. The top end of the suction pipe 75 is connected to the second elastic hose 74. A filter plate 751 with a spherical surface is fixedly installed inside the support box 6, and the bottom end of the suction pipe 75 extends into the filter plate 751. The control panel 8 is fixedly installed on the mounting bracket 1 and electrically connected to the delivery pump 72 and the electric cylinder 21. It is used to control the start and stop of the delivery pump 72, the flow rate adjustment, and the lifting and lowering action of the electric cylinder 21. The operator can easily set etching parameters, such as etching time and electrolyte flow rate, through the control panel 8 to realize an automated and precise etching process. At the same time, the control panel 8 should also be equipped with an emergency stop button to quickly cut off the power supply in case of an accident and ensure the safety of the operator. It is worth noting that since the content protected by this application does not involve improvements to software, circuits, and methods, the circuits, electronic components, and module mechanisms involved all adopt existing technologies, which can be fully implemented by those skilled in the art, and need not be elaborated upon.

[0023] In this embodiment, in order to avoid the electrolyte flowing out through the overflow port 51 from overflowing to the outside of the support box 6 and causing waste, a guide ring 61 with the circular opening as the center is fixedly installed on the top of the support box 6.

[0024] In this embodiment, in order to provide a stable guiding effect for the lifting plate 2, two guide rods 22 are fixedly installed on the top side of the lifting plate 2, which are slidably connected to the mounting frame 1 and arranged parallel to each other.

[0025] In this embodiment, in order to facilitate the discharge of electrolyte from the support box 6 as needed, and to avoid affecting the normal extraction operation of the transfer pump 72 when discharging electrolyte, the bottom inner wall of the support box 6 is set with the left side higher than the right side. A discharge pipe 601 with a control valve is fixedly installed on the support box 6. The water inlet end of the discharge pipe 601 is located at the lowest point of the bottom inner wall of the support box 6, and the suction pipe 75 is located on the support box 6 away from the discharge pipe 601.

[0026] In addition, the height of the overflow port 51 should meet the requirements of the electrolyte thickness required for the etching process of the photovoltaic ribbon. That is, it should be able to flow out from the overflow port when the electrolyte height is about to exceed the maximum allowable coverage thickness, and should not be lower than the minimum value of the electrolyte thickness required for the etching process of the photovoltaic ribbon. This is to ensure that the electrolyte can stably cover the etching area during the etching process of the photovoltaic ribbon without over-covering and interfering with the normal etching operation.

[0027] The depth of the channels opened on the ring-shaped silicone pad should be adapted to the thickness of the photovoltaic solder strip being processed.

[0028] Working principle: When in use, first turn on the power supply, and the control panel 8 will start immediately. The operator sets the corresponding etching parameters on the control panel 8 according to the material, thickness and required etching depth of the photovoltaic ribbon, such as etching time and electrolyte flow rate. After setting, press the start button, and the electric cylinder 21 will start working. Its telescopic end will drive the lifting plate 2 to move downward, thereby lowering the mounting base 3 and etching head 4 to a suitable height, ensuring that the etching head 4 can be accurately aligned with the area to be etched on the photovoltaic ribbon.

[0029] As the etching head 4 descends, the delivery pump 72 also starts operating, drawing electrolyte filtered by the filter plate 751 from the support box 6. The electrolyte is then transported to the annular pipe 71 through the flexible hose 74 and the suction pipe 75, and then evenly and sufficiently sprayed onto the etching area through multiple branch pipes 7 and nozzles 701, providing the necessary electrolyte environment for the etching process.

[0030] As the etching head 4 descends, the protective cover 5 moves down synchronously. The silicone pad on its bottom side is in close contact with the surface of the photovoltaic ribbon. The opened channel allows the photovoltaic ribbon to pass smoothly, while pressing and limiting the photovoltaic ribbon to ensure its stability during the etching process. The elastic properties of the silicone pad can also effectively prevent the protective cover 5 from scratching the photovoltaic ribbon.

[0031] During the etching process, excess electrolyte will be discharged through multiple overflow ports 51 opened at the lower position of the side wall of the protective cover 5 to prevent the electrolyte from over-covering the etching position of the photovoltaic ribbon. The electrolyte discharged from the overflow port 51 will be guided by the guide ring 61 fixedly installed on the top of the support box 6 to avoid overflowing to the outside of the support box 6 and causing waste.

[0032] After the etching time reaches the set value, the control panel 8 automatically controls the delivery pump 72 to stop running. At the same time, the electric cylinder 21 drives the lifting plate 2, the mounting base 3 and the etching head 4 to rise and return to the initial position. Then, the position of the photovoltaic welding strip is adjusted and the etching process is continued in the above manner. After the etching process is completed, the operator can use the discharge pipe 601 set on the support box 6 to discharge the remaining electrolyte in the support box 6 as needed for subsequent processing or recycling.

[0033] The above provides a detailed description of the electrochemical etching equipment for surface microstructures of photovoltaic ribbons provided by this utility model. Specific embodiments have been used to illustrate the principles and implementation methods of this utility model. The descriptions of these embodiments are merely for the purpose of helping to understand the method and core ideas of this utility model. It should be noted that those skilled in the art can make various improvements and modifications to this utility model without departing from its principles, and these improvements and modifications also fall within the protection scope of the claims of this utility model.

Claims

1. An electrochemical etching apparatus for surface microstructure of photovoltaic ribbons, characterized in that, It includes a mounting frame (1), a lifting plate (2), an electric cylinder (21), a support box (6), a mounting base (3), an etching head (4), a protective cover (5), multiple branch pipes (7), a delivery pump (72), a support buffer assembly, a tray (62), and a control panel (8); The electric cylinder (21) is fixedly installed on the top side of the mounting frame (1), the lifting plate (2) is fixedly installed on the telescopic end of the electric cylinder (21), the mounting seat (3) is fixedly installed on the bottom side of the lifting plate (2), the etching head (4) is fixedly installed on the bottom side of the mounting seat (3), the protective cover (5) is slidably sleeved on the outside of the mounting seat (3), the support buffer assembly is set on the mounting seat (3) and connected to the protective cover (5), multiple branch pipes (7) are fixedly installed on the protective cover (5) and arranged radially based on the axis of the etching head (4), a nozzle (701) is fixedly installed at the end of the multiple branch pipes (7) near the etching head (4), and the end of the multiple branch pipes (7) away from the etching head (4) extends to the outside of the protective cover (5) and is fixedly installed with the same annular pipe (71), a delivery pump (72) is fixedly installed on the bottom side of the lifting plate (2), and the outlet of the delivery pump (72) is connected to the annular pipe (71); The support box (6) is fixedly installed on the mounting frame (1) and located directly below the etching head (4) in the center. The top of the support box (6) has a circular opening. The tray (62) is fixedly installed inside the support box (6) and located in the center of the circular opening. The inlet of the delivery pump (72) is connected to the support box (6). The control panel (8) is fixedly installed on the mounting frame (1) and electrically connected to the delivery pump (72) and the electric cylinder (21).

2. The electrochemical etching equipment for surface microstructure of photovoltaic ribbons according to claim 1, characterized in that: The support and buffer assembly includes four support bars (31), four slide rods (32), and four buffer springs (33). Two support bars (31) arranged in parallel are fixedly installed on both sides of the mounting base (3). Two slide rods (32) arranged in parallel are fixedly installed on the side of the two support bars (31) located on the same side that are close to each other. Buffer springs (33) that are fixedly connected to the top of the protective cover (5) are movably sleeved on each of the four slide rods (32). The top ends of the four buffer springs (33) are fixedly connected to the corresponding support bars (31) above.

3. The electrochemical etching equipment for surface microstructure of photovoltaic ribbons according to claim 1, characterized in that: The delivery pump (72) is a magnetically driven centrifugal pump.

4. The electrochemical etching equipment for surface microstructure of photovoltaic ribbons according to claim 1, characterized in that: The outlet and inlet of the delivery pump (72) are respectively connected to a first elastic hose (73) and a second elastic hose (74). The first elastic hose (73) is connected to the annular pipe (71). A suction pipe (75) is fixedly installed on the support box (6). The top end of the suction pipe (75) is connected to the second elastic hose (74).

5. The electrochemical etching equipment for surface microstructure of photovoltaic ribbons according to claim 4, characterized in that: The support box (6) is fixedly installed with a filter plate (751) arranged in a spherical shape, and the bottom end of the suction pipe (75) extends into the filter plate (751).

6. The electrochemical etching equipment for surface microstructure of photovoltaic ribbons according to claim 1, characterized in that: The protective cover (5) has multiple overflow ports (51) located on the lower side wall.

7. The electrochemical etching equipment for surface microstructure of photovoltaic ribbons according to claim 1, characterized in that: A flow guide ring (61) is fixedly installed on the top of the support box (6) with the circular opening as the center.

8. The electrochemical etching equipment for surface microstructure of photovoltaic ribbons according to claim 1, characterized in that: A ring-shaped silicone pad is fixedly installed on the bottom side of the protective cover (5), and a channel for the photovoltaic welding strip to pass through is opened on the ring-shaped silicone pad.

9. The electrochemical etching equipment for surface microstructure of photovoltaic ribbons according to claim 1, characterized in that: Two guide rods (22) are fixedly installed on the top side of the lifting plate (2) and are slidably connected to the mounting frame (1) and arranged parallel to each other.

10. An electrochemical etching apparatus for surface microstructure of photovoltaic ribbons according to claim 4, characterized in that: The bottom inner wall of the support box (6) is set with the left side higher than the right side. A discharge pipe (601) with a control valve is fixedly installed on the support box (6). The water inlet end of the discharge pipe (601) is located at the lowest point of the bottom inner wall of the support box (6), and the suction pipe (75) is located on the support box (6) away from the discharge pipe (601).