A chemical vapor deposition reactor anti-pollution isolation door mechanism

Abstract

The utility model provides a kind of chemical vapor deposition reactor anti-pollution isolation door mechanism, including gas phase deposition reaction box body, the front of gas phase deposition reaction box body is equipped with box mouth, the front of gas phase deposition reaction box body right side is equipped with the square groove being communicated with box mouth, the inside of square groove is provided with isolation door, the top and bottom of isolation door are slidably connected with the inner wall of gas phase deposition reaction box body.The utility model is equipped with box mouth, square groove and isolation door on gas phase deposition reaction box body, and isolation door is slidably connected with the inner wall of box, and the linkage structure of round bar, moving frame, first sealing frame, follow-up frame, second sealing frame and linkage rod and nut seat, so that when closing isolation door, first sealing frame and second sealing frame can simultaneously play sealing effect, improve the overall sealing property of reaction box, reduce the risk of reactant leakage, improve the stability of chemical vapor deposition reaction and product quality.

Description

Technical Field

[0001] This utility model relates to the field of chemical vapor deposition, and in particular to a pollution prevention isolation door mechanism for a chemical vapor deposition reactor. Background Technology

[0002] Chemical vapor deposition (CVD) technology has wide applications in many fields such as semiconductor manufacturing and material surface coating. During CVD, complex chemical reactions occur inside the reactor, involving various gaseous reactants, a high-temperature environment, and potential byproducts. To ensure the smooth progress of the reaction and product quality, precise control of the reactor's internal environment is necessary to prevent external contaminants from entering the reactor and to avoid leakage of reactants and byproducts into the external environment.

[0003] Traditional chemical vapor deposition (CVD) reactors have simple isolation door structures with poor sealing performance. During long-term use, gaps can easily appear between the door and the reactor body, allowing external dust, impurities, and other contaminants to enter the reactor and affect the purity and quality of the deposited material. Simultaneously, gaseous reactants and byproducts may leak out, not only wasting raw materials but also potentially harming the surrounding environment and the health of operators. Furthermore, some isolation doors, lacking effective anti-loosening devices, are prone to loosening under pressure changes and vibrations within the reactor after closing, further compromising the seal. This leads to an unstable reaction environment within the reactor, affecting the repeatability and consistency of the deposition process and reducing product yield.

[0004] Therefore, it is necessary to provide a pollution prevention isolation door mechanism for chemical vapor deposition reactors to solve the above-mentioned technical problems. Utility Model Content

[0005] To solve the above-mentioned technical problems, this utility model provides a pollution prevention isolation door mechanism for a chemical vapor deposition reactor.

[0006] This utility model provides a pollution prevention isolation door mechanism for a chemical vapor deposition reactor, comprising a vapor deposition reactor body. The front of the vapor deposition reactor body has an opening. A square groove communicating with the opening is formed on the front right side of the vapor deposition reactor body. An isolation door is disposed inside the square groove. The top and bottom of the isolation door are slidably connected to the inner wall of the vapor deposition reactor body. A front sealing frame is fixedly connected to the front inside the vapor deposition reactor body. The back of the front sealing frame is fitted against the front of the isolation door. A handle is fixedly connected to the right side of the isolation door. A threaded hole penetrating through the center of the handle is formed. The internal threaded connection is equipped with anti-loosening bolts. Four through-holes are provided at the four corners of the back of the vapor deposition reaction chamber body, and a round rod is slidably connected inside each hole. The front end of the round rod extends to the front side of the interior of the vapor deposition reaction chamber body and is fixedly connected to a movable frame. The four sides of the movable frame are slidably connected to the inner wall of the vapor deposition reaction chamber body. A first sealing frame is fixedly connected to the front of the movable frame. A follower frame is fixedly connected to the rear end of the round rod. A second sealing frame is fixedly connected to the front of the follower frame. A linkage rod is fixedly connected to the center of the right side of the follower frame via a connecting plate. A nut seat that mates with the anti-loosening bolt is fixedly connected to the front end of the linkage rod.

[0007] Preferably, a stabilizing seat is slidably connected to the surface of the linkage rod, the left side of the stabilizing seat is fixedly connected to the right side of the vapor deposition reaction chamber body, a baffle is fixedly connected to the rear of the surface of the linkage rod, a compression spring is sleeved on the surface of the linkage rod, the front end of the compression spring is fixedly connected to the rear side of the stabilizing seat, and the rear end of the compression spring is fixedly connected to the front of the baffle.

[0008] Preferably, the top and bottom of the isolation door are fixedly connected with sliding strips that have a sealing effect, and the front of the top and bottom of the inner wall of the vapor deposition reaction chamber is provided with a sliding groove that cooperates with the sliding strip, and the surface of the sliding strip is slidably connected to the inner wall of the sliding groove.

[0009] Preferably, a groove is provided on the front left side of the inner wall of the vapor deposition reaction chamber, and a first magnetic sealing strip is fixedly connected inside the groove. A second magnetic sealing strip that works in conjunction with the first magnetic sealing strip is fixedly connected to the left side of the isolation door.

[0010] Preferably, the surface of the isolation door is provided with an observation window, and the interior of the observation window is fixedly connected with explosion-proof transparent glass by high-strength sealant.

[0011] Preferably, the depth of the nut seat is greater than the distance from the front of the first sealing frame to the back of the isolation door, and the distance from the front of the first sealing frame to the back of the isolation door is the same as the distance from the front of the second sealing frame to the back of the vapor deposition reaction chamber body.

[0012] Compared with related technologies, the anti-pollution isolation door mechanism for a chemical vapor deposition reactor provided by this utility model has the following beneficial effects:

[0013] 1. This utility model, by setting a box opening, square groove, and isolation door on the main body of the chemical vapor deposition reaction chamber, with the isolation door slidably connected to the inner wall of the chamber, and in conjunction with the front sealing frame, can effectively prevent external pollutants from entering the interior of the reaction chamber, ensuring the purity of the reaction environment. The design of the handle and anti-loosening bolts makes it convenient for operators to open and close the isolation door, while the anti-loosening bolts prevent the isolation door from loosening during use, further enhancing the sealing effect. The linkage structure of the round rod, moving frame, first sealing frame, follower frame, second sealing frame, linkage rod, and nut seat allows the first and second sealing frames to simultaneously perform a sealing function when the isolation door is closed, improving the overall sealing performance of the reaction chamber, reducing the risk of reactant leakage, and improving the stability and product quality of the chemical vapor deposition reaction.

[0014] 2. This utility model provides stable support and guidance for the linkage rod by setting a stabilizing seat that slides on the surface of the linkage rod, ensuring that the linkage rod will not shake or deviate during movement, making the operation of the entire isolation door mechanism smoother. The compression spring and baffle play a key role in preventing loosening and resetting. When the isolation door is closed, the anti-loosening bolt is screwed into the nut seat. This process moves the linkage rod forward, compressing the compression spring. The compressed spring stores elastic potential energy, and the entire mechanism is in a tightly closed state. The cooperation between the anti-loosening bolt and the nut seat, along with the compression force of the spring, effectively prevents the isolation door from loosening due to vibration, pressure changes, etc., enhancing the sealing and stability of the isolation door when closed, providing a stable and reliable environment for the chemical vapor deposition reaction. When the isolation door needs to be opened, the anti-loosening bolt is unscrewed, disengaging it from the nut seat. At this time, the elastic potential energy stored in the compression spring is released. The pressure generated by the spring resetting pushes the linkage rod backward, and the movement of the linkage rod causes the connected follower frame, moving frame, first sealing frame, and second sealing frame to quickly reset. The first sealing frame quickly moves away from the isolation door, reducing obstruction to its opening and allowing for easy and smooth opening. This design not only improves the operational efficiency of the isolation door but also reduces the workload of operators and minimizes the risk of damage to the mechanism due to improper operation. Attached Figure Description

[0015] Figure 1 This is a schematic diagram of the structure of this utility model;

[0016] Figure 2 This is a schematic diagram of the right-side structure of this utility model;

[0017] Figure 3 This is a schematic diagram of the left sectional view of the present invention;

[0018] Figure 4 This is a top sectional view of the structure of this utility model.

[0019] In the diagram: 1. Vapor deposition reactor body; 2. Isolation door; 3. Front sealing frame; 4. Handle; 5. Anti-loosening bolt; 6. Round rod; 7. Moving frame; 8. First sealing frame; 9. Follow-up frame; 10. Second sealing frame; 11. Linkage rod; 12. Nut seat; 13. Stabilizing seat; 14. Baffle; 15. Compression spring; 16. Sliding strip; 17. Sliding groove; 18. First magnetic sealing strip; 19. Second magnetic sealing strip; 20. Observation window; 21. Explosion-proof transparent glass. Detailed Implementation

[0020] The present invention will be further described below with reference to the accompanying drawings and embodiments.

[0021] Please refer to the following: Figures 1 to 4 A pollution prevention isolation door mechanism for a chemical vapor deposition reactor includes a vapor deposition reactor body 1. The front of the vapor deposition reactor body 1 has an opening. A square groove communicating with the opening is located on the front right side of the vapor deposition reactor body 1. An isolation door 2 is installed inside the square groove. The top and bottom of the isolation door 2 are slidably connected to the inner wall of the vapor deposition reactor body 1. A front sealing frame 3 is fixedly connected to the front inside the vapor deposition reactor body 1. The back of the front sealing frame 3 is fitted against the front of the isolation door 2. A handle 4 is fixedly connected to the right side of the isolation door 2. A threaded hole penetrating through the center of the handle 4 is provided, and an anti-loosening bolt 5 is threaded into the threaded hole. The back of the vapor deposition reaction chamber 1 has four through holes at the four corners. A round rod 6 is slidably connected to the inside of the hole through a sealing sleeve. The front end of the round rod 6 extends to the front side of the inside of the vapor deposition reaction chamber 1 and is fixedly connected to a moving frame 7. The four sides of the moving frame 7 are slidably connected to the inner wall of the vapor deposition reaction chamber 1. A first sealing frame 8 is fixedly connected to the front of the moving frame 7. A follower frame 9 is fixedly connected to the rear end of the round rod 6. A second sealing frame 10 is fixedly connected to the front of the follower frame 9. A linkage rod 11 is fixedly connected to the center of the right side of the follower frame 9 through a connecting plate. A nut seat 12 that works with the anti-loosening bolt 5 is fixedly connected to the front end of the linkage rod 11.

[0022] refer to Figure 2 As shown, a stabilizing seat 13 is slidably connected to the surface of the linkage rod 11. The left side of the stabilizing seat 13 is fixedly connected to the right side of the vapor deposition reaction chamber body 1. A baffle 14 is fixedly connected to the rear of the surface of the linkage rod 11. A compression spring 15 is sleeved on the surface of the linkage rod 11. The front end of the compression spring 15 is fixedly connected to the rear side of the stabilizing seat 13, and the rear end of the compression spring 15 is fixedly connected to the front side of the baffle 14.

[0023] It should be noted that the stabilizing seat 13, which is slidably connected to the surface of the linkage rod 11, provides stable support and guidance for the linkage rod 11, ensuring that the linkage rod 11 will not wobble or deviate during movement, making the operation of the entire isolation door 2 mechanism smoother. In terms of anti-loosening and resetting, the setting of the compression spring 15 and the baffle 14 plays a key role. When the isolation door 2 is closed, the anti-loosening bolt 5 is screwed in to enter the nut seat 12. This process will drive the linkage rod 11 to move forward, thereby compressing the compression spring 15. After being compressed, the compression spring 15 stores elastic potential energy. At this time, the entire mechanism is in a tightly closed state. The cooperation between the anti-loosening bolt 5 and the nut seat 12, as well as the compression force of the compression spring 15, work together to effectively prevent the isolation door 2 from loosening due to vibration, pressure changes, and other factors, enhancing the sealing and stability of the isolation door 2 when closed, and providing a stable and reliable environment for the chemical vapor deposition reaction. When it is necessary to open the isolation door 2, the anti-loosening bolt 5 is screwed out to disengage from the nut seat 12. At this time, the elastic potential energy stored in the compression spring 15 is released. The pressure generated by the resetting spring 15 pushes the linkage rod 11 backward. The movement of the linkage rod 11 causes the connected follower frame 9, moving frame 7, first sealing frame 8, and second sealing frame 10 to quickly reset. The first sealing frame 8 quickly moves away from the isolation door 2, reducing obstruction to the opening of the isolation door 2, allowing the isolation door 2 to open easily and smoothly. This design not only improves the operating efficiency of the isolation door 2 but also reduces the labor intensity of the operator and reduces the risk of damage to the mechanism due to improper operation.

[0024] refer to Figure 3 As shown, the top and bottom of the isolation door 2 are fixedly connected with sliding strips 16 that have a sealing effect. The front of the top and bottom of the inner wall of the vapor deposition reaction chamber body 1 is provided with a sliding groove 17 that works with the sliding strip 16. The surface of the sliding strip 16 is slidably connected to the inner wall of the sliding groove 17.

[0025] It should be noted that by setting up sliding strips 16 with a sealing effect that are fixedly connected to the top and bottom of the isolation door 2 and cooperate with the corresponding sliding grooves 17 on the inner wall of the chemical vapor deposition reaction chamber 1, not only is the sliding of the isolation door 2 smoother, but the sliding strips 16 can also fill the gap between the isolation door 2 and the inner wall of the chamber, achieving a good sealing effect and preventing contaminants from entering the reaction chamber from the top and bottom gaps. This sealing structure is simple and effective, and can significantly improve the sealing performance of the isolation door 2, providing a more stable environment for the chemical vapor deposition reaction.

[0026] refer to Figure 4 As shown, a groove is provided on the front left side of the inner wall of the vapor deposition reaction chamber body 1, and a first magnetic sealing strip 18 is fixedly connected inside the groove. A second magnetic sealing strip 19, which works in conjunction with the first magnetic sealing strip 18, is fixedly connected to the left side of the isolation door 2.

[0027] It should be noted that by setting a first magnetic sealing strip 18 in the groove on the left side of the inner wall of the chemical vapor deposition reaction chamber body 1, and a matching second magnetic sealing strip 19 on the left side of the isolation door 2, the sealing effect on the left side of the isolation door 2 is further enhanced by magnetic adsorption. When the isolation door 2 is closed, the first magnetic sealing strip 18 and the second magnetic sealing strip 19 attract each other and fit tightly, effectively preventing contaminants from entering the reaction chamber from the left side gap. This also improves the stability of the isolation door 2 when closed, reduces sealing failure caused by vibration and other factors, and ensures the quality of the chemical vapor deposition reaction.

[0028] refer to Figure 1 As shown, an observation window 20 is provided on the surface of the isolation door 2, and an explosion-proof transparent glass 21 is fixedly connected to the inside of the observation window 20 by high-strength sealant.

[0029] It should be noted that by opening an observation window 20 on the isolation door 2 and installing explosion-proof transparent glass 21, operators are provided with a way to observe the reaction inside the chemical vapor deposition reactor in real time. Operators can use the observation window 20 to promptly understand the reaction progress, the state of the reactants, and other information, so that appropriate measures can be taken quickly in case of abnormalities to prevent accidents. At the same time, the explosion-proof transparent glass 21 is fixed with high-strength sealant, ensuring the sealing performance of the observation window 20 and preventing reactant leakage. This satisfies the observation needs while ensuring the airtightness and safety of the reactor.

[0030] refer to Figure 3 As shown, the depth of the nut seat 12 is greater than the distance from the front of the first sealing frame 8 to the back of the isolation door 2. The distance from the front of the first sealing frame 8 to the back of the isolation door 2 is the same as the distance from the front of the second sealing frame 10 to the back of the vapor deposition reaction chamber body 1.

[0031] It should be noted that by setting the depth of the nut seat 12 to be greater than the distance from the front of the first sealing frame 8 to the back of the isolation door 2, this design ensures that the anti-loosening bolt 5 can be smoothly screwed into the nut seat 12 during the closing process of the isolation door 2. When the anti-loosening bolt 5 is screwed into the nut seat 12, it will drive the linkage rod 11 to move forward and compress the compression spring 15, making the entire mechanism tightly closed, effectively preventing the isolation door 2 from loosening and enhancing the sealing effect. If the depth of the nut seat 12 is insufficient, the anti-loosening bolt 5 may not be able to be fully screwed in, resulting in insufficient movement distance of the linkage rod 11 and insufficient compression of the compression spring 15, thus affecting the anti-loosening and sealing functions. The distance from the front of the first sealing frame 8 to the back of the isolation door 2 is the same as the distance from the front of the second sealing frame 10 to the back of the vapor deposition reaction chamber body 1, ensuring that the first sealing frame 8 and the second sealing frame 10 can apply sealing pressure simultaneously and evenly when the isolation door 2 is closed. When the anti-loosening bolt 5 is screwed into the nut seat 12 and drives the linkage rod 11 to move, the moving frame 7 and the follower frame 9 move synchronously. The first sealing frame 8 and the second sealing frame 10 simultaneously and tightly fit the isolation door 2 and the reaction chamber body, making the sealing effect of the entire isolation door 2 mechanism more balanced and reliable, and further improving the anti-pollution performance of the chemical vapor deposition reactor.

[0032] The working principle of the anti-pollution isolation door mechanism for a chemical vapor deposition reactor provided by this utility model is as follows: In use, when it is necessary to close the isolation door 2, the operator holds the handle 4 and slides the isolation door 2 along the top and bottom grooves 17 on the inner wall of the vapor deposition reactor body 1, causing the isolation door 2 to move towards the reactor opening. At this time, the sliding strips 16 at the top and bottom of the isolation door 2 slide within the grooves 17, serving a sealing and guiding function. When the left side of the isolation door 2 approaches the left side of the reactor body, the second magnetic sealing strip 19 on the left side of the isolation door 2 attracts the first magnetic sealing strip 18 in the groove on the left side of the inner wall of the reactor body, enhancing the sealing effect on the left side. Next, the operator screws the anti-loosening bolt 5 into the central threaded hole of the handle 4, and makes it engage with the nut seat 12 at the front end of the linkage rod 11. As the anti-loosening bolt 5 is screwed in, the linkage rod 11 moves forward. Since the linkage rod 11 is connected to the follower frame 9 through the connecting plate, the follower frame 9 also moves forward accordingly. The follower frame 9 moves forward, causing the round rod 6 and the moving frame 7 to move forward as well. This brings the first sealing frame 8 on the moving frame 7 closer to the back of the isolation door 2, while the second sealing frame 10 on the follower frame 9 approaches the back of the vapor deposition reaction chamber body 1. During this process, the baffle 14 on the surface of the linkage rod 11 compresses the compression spring 15, which stores elastic potential energy. Since the distance from the front of the first sealing frame 8 to the back of the isolation door 2 is the same as the distance from the front of the second sealing frame 10 to the back of the vapor deposition reaction chamber body 1, and the depth of the nut seat 12 is greater than the distance from the front of the first sealing frame 8 to the back of the isolation door 2, the first sealing frame 8 and the second sealing frame 10 can simultaneously and evenly apply sealing pressure. This ensures a good seal between the isolation door 2 and the reaction chamber body, preventing external contaminants from entering the reaction chamber and avoiding leakage of internal reactants and byproducts. During the reaction, the operator can observe the inside of the reaction chamber through the observation window 20 on the isolation door 2. The explosion-proof transparent glass 21 inside the observation window 20 is fixed with high-strength sealant, ensuring clear observation of the internal reaction by the operator while preventing reactant leakage and ensuring safety. When the reaction is complete or maintenance of the reaction chamber is required, the operator unscrews the anti-loosening bolt 5, disengaging it from the nut seat 12. At this time, the compression spring 15 resets, releasing elastic potential energy and pushing the baffle 14 and linkage rod 11 backward. The movement of the linkage rod 11 causes the follower frame 9, the round rod 6, and the moving frame 7 to move backward, moving the first sealing frame 8 away from the back of the isolation door 2 and the second sealing frame 10 away from the back of the vapor deposition reaction chamber body 1. Due to the synchronous reset of the first sealing frame 8 and the second sealing frame 10, the obstruction to opening the isolation door 2 is reduced. Then, the operator holds the handle 4 and slides the isolation door 2 along the slide groove 17 to open the isolation door 2, facilitating subsequent operations.

[0033] The above are merely embodiments of this utility model and do not limit the patent scope of this utility model. Any equivalent structural or procedural transformations made based on the description and drawings of this utility model, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of this utility model.

Claims

1. A pollution prevention isolation door mechanism for a chemical vapor deposition reactor, characterized in that, The system includes a vapor deposition reaction chamber body (1), with an opening on the front of the body. A square groove communicating with the opening is located on the front right side of the body, and an isolation door (2) is installed inside the groove. The top and bottom of the isolation door (2) are slidably connected to the inner wall of the body (1). A front sealing frame (3) is fixedly connected to the front of the body (1), with the back of the front sealing frame (3) fitting against the front of the isolation door (2). A handle (4) is fixedly connected to the right side of the isolation door (2), with a through-hole in the center of the handle (4), and an anti-loosening bolt (5) threaded inside the hole. The back of the body (1) has four through holes at the four corners, and a round rod (6) is slidably connected inside the holes. The front end of the round rod (6) extends to the front side inside the body (1) of the vapor deposition reaction chamber and is fixedly connected to a moving frame (7). The four sides of the moving frame (7) are slidably connected to the inner wall of the body (1) of the vapor deposition reaction chamber. A first sealing frame (8) is fixedly connected to the front of the moving frame (7). A follower frame (9) is fixedly connected to the rear end of the round rod (6). A second sealing frame (10) is fixedly connected to the front of the follower frame (9). A linkage rod (11) is fixedly connected to the center of the right side of the follower frame (9) through a connecting plate. A nut seat (12) that works with the anti-loosening bolt (5) is fixedly connected to the front end of the linkage rod (11).

2. The anti-pollution isolation door mechanism for a chemical vapor deposition reactor according to claim 1, characterized in that, A slidable seat (13) is connected to the surface of the linkage rod (11). The left side of the slidable seat (13) is fixedly connected to the right side of the vapor deposition reaction chamber body (1). A baffle (14) is fixedly connected to the rear of the surface of the linkage rod (11). A compression spring (15) is sleeved on the surface of the linkage rod (11). The front end of the compression spring (15) is fixedly connected to the rear side of the slidable seat (13), and the rear end of the compression spring (15) is fixedly connected to the front side of the baffle (14).

3. The anti-pollution isolation door mechanism for a chemical vapor deposition reactor according to claim 2, characterized in that, The top and bottom of the isolation door (2) are fixedly connected with sliding strips (16) that have a sealing effect. The front of the top and bottom of the inner wall of the vapor deposition reaction chamber body (1) is provided with a sliding groove (17) that works with the sliding strip (16). The surface of the sliding strip (16) is slidably connected to the inner wall of the sliding groove (17).

4. The anti-pollution isolation door mechanism for a chemical vapor deposition reactor according to claim 3, characterized in that, A groove is provided on the front left side of the inner wall of the vapor deposition reaction chamber body (1), and a first magnetic sealing strip (18) is fixedly connected inside the groove. A second magnetic sealing strip (19) that works in conjunction with the first magnetic sealing strip (18) is fixedly connected to the left side of the isolation door (2).

5. The anti-pollution isolation door mechanism for a chemical vapor deposition reactor according to claim 4, characterized in that, The isolation door (2) has an observation window (20) on its surface, and the interior of the observation window (20) is fixedly connected with explosion-proof transparent glass (21) by high-strength sealant.

6. The anti-pollution isolation door mechanism for a chemical vapor deposition reactor according to claim 5, characterized in that, The depth of the nut seat (12) is greater than the distance from the front of the first sealing frame (8) to the back of the isolation door (2), and the distance from the front of the first sealing frame (8) to the back of the isolation door (2) is the same as the distance from the front of the second sealing frame (10) to the back of the vapor deposition reaction chamber body (1).

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