Light path truncation device for nanoimprint and nanoimprint equipment
Patent Information
- Application Number
- CN202522656539.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-12-15
- Publication Date
- 2026-10-23
- Estimated Expiration
- 2035-12-15
AI Technical Summary
[0005]本实用新型的目的在于提供一种用于纳米压印的光路截断装置及纳米压印设备,其能够通过破坏衬底的几何构型以截断光的自然传导,解决高精度、高分辨率图形压印过程中产生的缺陷问题
[0023]与现有技术相比,本实用新型的用于纳米压印的光路截断装置及纳米压印设备,通过控制凸台与凹槽卡合,并结合设置于凸台与凹槽槽壁表面的锥形凸起,使部分衬底被挤压形变,从而破坏衬底的几何构型,实现截断光的自然传导,降低高精度、高分辨率图形压印过程中产生的缺陷。
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Figure CN224889020U_ABST
Abstract
Description
Technical Field
[0001] This utility model belongs to the field of nanoimprint technology, specifically relating to an optical path interruption device and nanoimprint equipment for nanoimprinting. Background Technology
[0002] In current high-precision fully automated UV-curable nanoimprinting technology, the application of the UV-curable imprinting adhesive and the subsequent UV curing process are integrated into the same equipment. This technology usually does not present significant problems when imprinting patterns with larger structural scales; however, it is prone to producing structural inhomogeneities when imprinting high-precision, high-resolution patterns, specifically manifested as the appearance of large-area granular defects and the inhomogeneity of the imprinted structure itself.
[0003] The root of this problem lies in the fact that high-precision fully automated UV-curable nanoimprinting equipment uses continuous polymer substrates. During operation, these polymer substrates form UV total internal reflection waveguides. Some of the UV light passes through these waveguides and prematurely exposes the pre-applied photocurable imprinting adhesive, thus interfering with the normal formation of subsequent nanoimprinted precision structures.
[0004] Therefore, in order to address the above-mentioned technical problems, it is necessary to provide an optical path interruption device and a nanoimprinting apparatus. Utility Model Content
[0005] The purpose of this invention is to provide an optical path interruption device and a nanoimprinting equipment for nanoimprinting, which can interrupt the natural transmission of light by destroying the geometric configuration of the substrate, thereby solving the defect problem generated in the high-precision, high-resolution pattern imprinting process.
[0006] To achieve the above objectives, the technical solution provided by a specific embodiment of this utility model is as follows:
[0007] An optical path interruption device for nanoimprinting, comprising:
[0008] The base has a first surface and a second surface arranged opposite to each other. The first surface has a downwardly recessed groove. The groove wall is configured as two first inclined surfaces that intersect at the bottom of the groove. At least a portion of the groove wall surface is provided with a plurality of first conical protrusions.
[0009] The movable component includes a boss located above the groove and movable in a vertical direction in a controllable manner, the shape of the boss matching the shape of the groove, and at least a portion of the surface of the boss facing the groove having a plurality of second conical protrusions;
[0010] The boss is used to move toward the groove so that the surface of the boss toward the groove and the groove wall together press the substrate located between the base and the moving assembly, and the first tapered protrusion and the second tapered protrusion disrupt the geometry of the substrate.
[0011] In one or more embodiments of this utility model, a black light-absorbing layer is provided on the surface of the boss facing the groove and / or the groove wall surface.
[0012] In one or more embodiments of the present invention, the groove extends along a first direction and the boss extends along a first direction, wherein the first direction is parallel to the first surface.
[0013] In one or more embodiments of this utility model, the dimension of the boss along the first direction is greater than or equal to the dimension of the groove along the first direction.
[0014] In one or more embodiments of the present invention, the dimension of the groove along the first direction is greater than or equal to the dimension of the substrate along the first direction.
[0015] In one or more embodiments of the present invention, the movable component further includes a lifting mechanism connected to the boss, the lifting mechanism being used to adjust the distance between the boss and the groove.
[0016] In one or more embodiments of the present invention, the surface of the boss facing the groove is configured as two intersecting second inclined surfaces, and the included angle between the two second inclined surfaces is equal to the included angle between the two first inclined surfaces.
[0017] In one or more embodiments of this utility model, the included angle between the two second inclined planes is 30°~60°, and the included angle between the two first inclined planes is 30°~60°.
[0018] In another aspect, this utility model provides a nanoimprinting device, comprising: an adhesive application device, an imprinting curing device, and an optical path interruption device; wherein...
[0019] The adhesive applicator is used to coat an adhesive onto a substrate surface, wherein the substrate extends at least from the adhesive applicator to the imprinting and curing apparatus;
[0020] The imprinting and curing device is used to perform nanoimprinting and ultraviolet curing on a substrate coated with adhesive.
[0021] The optical path interruption device is located between the adhesive application device and the imprinting and curing device, and is used to disrupt part of the geometric configuration of the substrate to prevent ultraviolet light from being conducted to the substrate that has not undergone nanoimprinting treatment and has been coated with adhesive.
[0022] In one or more embodiments of the present invention, the nanoimprint apparatus further includes a conveying mechanism for driving the substrate from the adhesive application device to the imprint curing device.
[0023] Compared with the prior art, the optical path interruption device and nanoimprinting equipment of this utility model control the engagement of the boss and the groove, and combine the conical protrusions set on the surface of the boss and the groove wall to squeeze and deform part of the substrate, thereby destroying the geometric configuration of the substrate, realizing the interruption of the natural transmission of light, and reducing the defects generated in the high-precision, high-resolution pattern imprinting process. Attached Figure Description
[0024] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0025] Figure 1 This is a schematic diagram of the optical path interruption device for nanoimprinting in one embodiment of the present invention;
[0026] Figure 2 for Figure 1 A partially enlarged schematic diagram of region A of the optical path interruption device shown;
[0027] Figure 3 for Figure 1 Side view of the optical path interruption device shown;
[0028] Figure 4 for Figure 1 Front view of the optical path interruption device shown;
[0029] Figure 5 This is a schematic diagram of the structure of a nanoimprint apparatus (including a substrate) in one embodiment of the present invention;
[0030] Figure 6 for Figure 5 Front view of the nanoimprint apparatus (including the substrate); Detailed Implementation
[0031] To enable those skilled in the art to better understand the technical solutions in this disclosure, the technical solutions in the embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this disclosure, and not all embodiments. Based on the embodiments in this disclosure, all other embodiments obtained by those skilled in the art without creative effort should fall within the scope of protection of this disclosure.
[0032] As mentioned in the background section, polymer substrates refer to the basic support structures made of polymer materials used to carry functional layers or devices. They are core materials in fields such as organic electronics, flexible electronics, wearable devices, and modern printed electronics, possessing characteristics such as lightweight, flexibility, rollability, low cost, and ease of processing. Common polymer substrates include polyethylene terephthalate, polyimide, and polycarbonate.
[0033] In fully automated UV-curable nanoimprinting technology, continuous polymer substrates are used. For a given substrate, part is configured to receive the adhesive coating process, while another part is configured to receive the imprinting and curing process. Because the substrate forms a total internal reflection waveguide for UV light, a small amount of UV light passes through the waveguide and exposes the pre-coated photocurable imprinting adhesive (which has not yet undergone imprinting and curing), affecting the subsequent formation of precise nanoimprinted structures.
[0034] Combination Figures 1-4 As shown, in order to solve the above-mentioned technical problems, the present invention provides an optical path interruption device 100 for nanoimprinting, including a base 10 and a moving component 20.
[0035] The base 10 has a first surface 101 and a second surface arranged opposite to each other. The first surface 101 has a downwardly recessed groove 11. The groove wall of the groove 11 is configured as two first inclined surfaces 102 intersecting at the bottom of the groove 11. At least a portion of the groove wall surface is provided with a plurality of first conical protrusions 111. (See reference...) Figure 3 It can be seen that the cross section of the groove 11 along the direction perpendicular to the first surface 101 is an inverted triangle.
[0036] The movable component 20 includes a boss 21 and a lifting mechanism 22. The boss 21 is located above the base 10 and is controllably movable in a vertical direction. The shape of the boss 21 matches the shape of the groove 11 (i.e., the shape of the boss 21 is complementary to the shape of the groove 11, and the size of the groove 11 is equal to or slightly larger than the size of the boss 21), and at least a portion of the surface of the boss 21 facing the groove 11 is provided with a plurality of second conical protrusions 211. It is understood that the vertical direction here refers to the direction perpendicular to the first surface 101.
[0037] The boss 21 is used to move toward the groove 11. During the process of the boss 21 and the groove 11 gradually engaging, the surface of the boss 21 and the groove wall of the groove 11 together press the substrate 30 located between the base 10 and the moving component 20, so that one side of the substrate contacts the groove wall of the groove 11 and the other side contacts the surface of the boss 21 toward the groove 11. The geometry of the substrate is disrupted by the first conical protrusion 111 and the second conical protrusion 211.
[0038] The lifting mechanism 22 is connected to the boss 21 and is used to adjust the distance between the boss 21 and the groove 11, that is, to drive the boss 21 to move toward or away from the groove 11.
[0039] It is understood that the lifting mechanism 22 is well known in the prior art, and therefore its function and working principle will not be described in detail here. Any known or unknown lifting mechanism or drive component may be used without restriction.
[0040] Combination Figure 3 As shown, but it is understandable that the substrate 30 is spread between the protrusion 21 and the base 10. When the protrusion 21 is above the first surface 101, the substrate is parallel to the first surface 101. As the protrusion 21 gradually approaches the groove 11 until it engages with the groove 11, the substrate 30 is just squeezed into the groove 11. Under the action of the first conical protrusion 111 and the second conical protrusion 211, the substrate structure changes, its optical waveguide performance is destroyed, and ultraviolet light cannot or can hardly propagate between the substrates on both sides of the structural destruction point.
[0041] Combination Figure 2 As shown, the first conical protrusion 111 and the second conical protrusion 211 are both arranged in a periodic and dense pattern. In one embodiment, both the first conical protrusion 111 and the second conical protrusion 211 are pyramidal in shape. In another alternative embodiment, both the first conical protrusion 111 and the second conical protrusion 211 are conical in shape.
[0042] Combination Figure 3 As shown, in one embodiment, a plurality of first conical protrusions 111 are provided on the surface of the groove wall away from the bottom of the groove 11, the surface of the boss 21 facing the groove 11 is provided with two intersecting second inclined surfaces 201, and a plurality of second conical protrusions 211 are provided on the surface of the boss 21 away from the intersection of the second inclined surfaces 201.
[0043] That is, the first conical protrusion 111 is not densely arranged on the entire groove wall of the groove 11, and the first conical protrusion 111 is not provided on the groove wall near the bottom of the groove 11. Correspondingly, the second conical protrusion 211 is not densely arranged on the entire surface of the boss 21 facing the groove 11, and the second conical protrusion 211 is not provided on the surface near the intersection of the second inclined surface 201.
[0044] In another embodiment, the entire surface of the groove wall away from the bottom of the groove 11 is provided with a plurality of first conical protrusions 111, and the entire surface of the boss 21 facing the groove 11 is provided with a plurality of second conical protrusions 211.
[0045] Combination Figure 4 As shown, the groove 11 extends along the first direction x, and the boss 21 extends along the first direction x, wherein the first direction x is parallel to the first surface 101. The dimension of the boss 21 along the first direction x is greater than or equal to the dimension of the groove 11 along the first direction x.
[0046] Furthermore, the dimension of the groove 11 along the first direction x is greater than or equal to the dimension of the substrate along the first direction x (which can be understood as the width of the substrate), ensuring that the propagation of ultraviolet light is blocked along the first direction x.
[0047] Combination Figure 3 As shown, the surface of the boss 21 facing the groove 11 is configured with two intersecting second inclined surfaces 201, and the included angle between the two second inclined surfaces 201 is equal to the included angle between the two first inclined surfaces 102. The included angle between the two second inclined surfaces 201 is 30°~60°, and the included angle between the two first inclined surfaces 102 is 30°~60°.
[0048] For example, the included angle between the two second inclined planes 201 is 35°, and the included angle between the two first inclined planes 102 is 35°.
[0049] Furthermore, a black light-absorbing layer is provided on the surface of the boss 21 facing the groove 11 and on the surface of the groove wall of the groove 11.
[0050] The core function of the black light-absorbing layer is to absorb ultraviolet light, scatter light, and change the refractive index of the substrate, thereby interrupting the total internal reflection propagation of ultraviolet light within the substrate.
[0051] In one embodiment, a carbon nanotube (CNT) film, an acrylic / epoxy resin-based black coating, graphene, or carbon black is coated onto the surface of the boss 21 and the surface of the groove wall to form a black light-absorbing layer.
[0052] In another embodiment, black nickel is electroplated on the surface of the boss 21 and the surface of the tank wall by electrochemical means to form a black light-absorbing layer.
[0053] Combination Figure 5 and Figure 6 As shown, another aspect of this disclosure provides a nanoimprinting apparatus, including: an optical path interruption device 100, an adhesive application device 200, an imprinting curing device 300, and a conveying mechanism 400.
[0054] The adhesive application apparatus 200 is used to coat an adhesive solution onto the surface of a substrate 30, wherein the substrate extends at least from the adhesive application apparatus 200 to the imprinting curing apparatus 300.
[0055] The imprinting and curing apparatus 300 is used to perform nanoimprinting and ultraviolet curing on a substrate 30 coated with adhesive, wherein... Figure 5 and Figure 6 Components related to nanoimprint processing are not shown.
[0056] The optical path interruption device 100 is located between the adhesive application device 200 and the imprinting and curing device 300. It is used to disrupt the geometry of part of the substrate 30 to prevent ultraviolet light from being transmitted to the substrate 30 that has not undergone nanoimprinting treatment and has been coated with adhesive.
[0057] The conveying mechanism 400 is used to drive the substrate 30 from the adhesive application device 200 to the imprinting and curing device 300. The conveying mechanism 400 in this disclosure includes a plurality of rollers.
[0058] The nanoimprinting equipment is a fully automated UV-curable nanoimprinting system used for processing continuous polymer substrates. A conveying structure drives the continuous substrates sequentially through an adhesive application unit 200, an optical path interruption unit 100, and an imprinting and curing unit 300. After a portion of the substrate passes through the adhesive application unit 200, the surface of the substrate 30 is coated with an imprinting adhesive of a preset thickness, and then it is conveyed to the imprinting and curing unit 300, where this portion of the substrate 30 undergoes both nanoimprinting and UV curing treatment sequentially.
[0059] Understandably, when a portion of the substrate is transferred to the imprinting and curing apparatus 300, another portion of the substrate will be transferred to the adhesive application apparatus 200 for adhesive application. This disclosure uses the optical path interruption device 100 to deform the structure of a small portion of the substrate 30, preventing it from propagating ultraviolet light. This avoids ultraviolet light from propagating through the continuous substrate 30 to the portion of the substrate that has just been adhesive-applied but has not yet been transferred to the imprinting and curing apparatus 300, thereby reducing or eliminating the influence of ultraviolet light on the imprinting adhesive that has not undergone nanoimprinting.
[0060] It should be noted that the optical path interruption device 100 does not process every part of the substrate 30 passing through it. It can periodically deform the structure of a portion of the substrate 30 according to the fabrication requirements (e.g., the size of the target nanodevice). For example, if the substrate length covered by the imprinting and curing device 300 is 40 nm each time it performs nanoimprinting and ultraviolet curing, then the processing cycle of the optical path interruption device 100 is at least 40 nm.
[0061] This can also be understood as the optical path interruption device 100 following the processing cycle of the imprint curing device 300 to process the substrate currently located between the base 10 and the moving component 20, specifically:
[0062] Before the imprint curing device 300 is started, the substrate 30 is in a stationary state, and the optical path interruption device 100 processes the substrate currently located between the base 10 and the moving component 20.
[0063] After the imprint curing device 300 is started and completes one imprint curing process, the conveying mechanism 400 works and conveys the newly coated substrate to the imprint curing device 300. Before the imprint curing device 300 is started again, the optical path interruption device 100 processes the substrate currently located between the base 10 and the moving component 20.
[0064] Furthermore, the above control process is only an example to illustrate the working process of this nanoimprint apparatus and optical path interruption device 100, and does not involve any improvement in program algorithms or methods.
[0065] Figure 5 and Figure 6 The fixing components for securing the conveying mechanism 400 and the optical path interruption device 100, as well as other internal structures of the nanoimprinting equipment, are not shown. However, those skilled in the art will clearly understand the basic structures required for the normal operation of the nanoimprinting equipment. It is understood that the gluing device, conveying mechanism, and imprinting curing device are well known in the prior art, and therefore their structure, function, and working principle will not be described in detail here. Any known or unknown gluing device, conveying mechanism, and imprinting curing device may be used without restriction.
[0066] As can be seen from the above technical solutions, this utility model has the following beneficial effects:
[0067] By controlling the engagement of the boss 21 and the groove 11, and combining the conical protrusions set on the surface of the boss 21 and the groove 11, part of the substrate is squeezed and deformed, thereby destroying the geometric configuration of the substrate, cutting off the natural transmission of light, and reducing the defects generated during the high-precision, high-resolution pattern imprinting process.
[0068] It will be apparent to those skilled in the art that this disclosure is not limited to the details of the exemplary embodiments described above, and that this disclosure can be implemented in other specific forms without departing from its spirit or essential characteristics. Therefore, the embodiments should be considered in all respects as exemplary and non-limiting, and the scope of this disclosure is defined by the appended claims rather than the foregoing description. Thus, all variations falling within the meaning and scope of equivalents of the claims are intended to be included within this disclosure. No reference numerals in the claims should be construed as limiting the scope of the claims.
[0069] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.
Claims
1. An optical path interruption device for nanoimprinting, characterized in that, include: The base has a first surface and a second surface arranged opposite to each other. The first surface has a downwardly recessed groove. The groove wall is configured as two first inclined surfaces that intersect at the bottom of the groove. At least a portion of the groove wall surface is provided with a plurality of first conical protrusions. The movable component includes a boss located above the groove and movable in a vertical direction in a controllable manner, the shape of the boss matching the shape of the groove, and at least a portion of the surface of the boss facing the groove having a plurality of second conical protrusions; The boss is used to move toward the groove so that the surface of the boss toward the groove and the groove wall together press the substrate located between the base and the moving assembly, and the first tapered protrusion and the second tapered protrusion disrupt the geometry of the substrate.
2. The optical path interruption device for nanoimprinting according to claim 1, characterized in that, A black light-absorbing layer is provided on the surface of the boss facing the groove and / or on the groove wall surface.
3. The optical path interruption device for nanoimprinting according to claim 1, characterized in that, The groove extends along a first direction, and the boss extends along a first direction, wherein the first direction is parallel to the first surface.
4. The optical path interruption device for nanoimprinting according to claim 3, characterized in that, The dimension of the boss along the first direction is greater than or equal to the dimension of the groove along the first direction.
5. The optical path interruption device for nanoimprinting according to claim 3, characterized in that, The dimension of the groove along the first direction is greater than or equal to the dimension of the substrate along the first direction.
6. The optical path interruption device for nanoimprinting according to claim 1, characterized in that, The movable component also includes a lifting mechanism connected to the boss, the lifting mechanism being used to adjust the distance between the boss and the groove.
7. The optical path interruption device for nanoimprinting according to claim 1, characterized in that, The surface of the boss facing the groove is configured as two intersecting second inclined surfaces, and the included angle between the two second inclined surfaces is equal to the included angle between the two first inclined surfaces.
8. The optical path interruption device for nanoimprinting according to claim 7, characterized in that, The included angle between the two second inclined planes is 30°~60°, and the included angle between the two first inclined planes is 30°~60°.
9. A nanoimprinting device, characterized in that, The nanoimprinting equipment includes an adhesive application device, an imprinting curing device, and an optical path interruption device as described in any one of claims 1 to 8; wherein... The adhesive applicator is used to coat an adhesive onto a substrate surface, wherein the substrate extends at least from the adhesive applicator to the imprinting and curing apparatus; The imprinting and curing device is used to perform nanoimprinting and ultraviolet curing on a substrate coated with adhesive. The optical path interruption device is located between the adhesive application device and the imprinting and curing device, and is used to disrupt part of the geometric configuration of the substrate to prevent ultraviolet light from being conducted to the substrate that has not undergone nanoimprinting treatment and has been coated with adhesive.
10. The nanoimprint apparatus according to claim 9, characterized in that, The nanoimprinting apparatus further includes a conveying mechanism for driving the substrate from the coating device to the imprinting curing device.