A plasma processing apparatus for tubular members

Abstract

The utility model provides a kind of tubular member's plasma processing equipment, including vacuum chamber, electric field generation system and vacuumizing equipment, wherein vacuum chamber inside is equipped with tubular member, its both ends are connected medium inlet and medium outlet to form medium passage respectively;Feed-in electrode and ground electrode are arranged along tubular member axial interval, and both are connected external power supply and ground end respectively by cable, feed-in electrode and ground electrode can form uniform axial electric field distribution in tubular member interior, so that the process gas or organic monomer that pass in is ionized into plasma under electric field, realize the uniform activation or polymerization processing to tubular member inner wall.The utility model can complete the activation cleaning or polymer deposition to pipe inner wall under vacuum environment, not only improve the uniformity and consistency of processing effect, especially suitable for long pipe, micro pipeline and other traditional equipment difficult to handle complex structure.

Description

Technical Field

[0001] This utility model relates to a plasma surface treatment device, and more particularly to a plasma treatment device for tubular components. Background Technology

[0002] Plasma treatment technology, as a highly efficient surface modification method, is widely used in material cleaning, activation, and coating deposition. Its basic principle is to generate highly active plasma through gas discharge, which then reacts physically or chemically with the material surface to achieve modification. In existing technologies, conventional plasma treatment equipment often employs parallel plate electrodes or external coil structures. When treating tubular components, the plasma mainly acts on the outer wall or near the open end of the component, making it difficult to form a uniform electric field and plasma distribution inside closed or long-diameter pipes. This results in unsatisfactory inner wall treatment effects and uneven activation or polymerization layer thickness. Especially for slender tubes, traditional equipment suffers from rapid electric field decay and limited plasma distribution, failing to meet the requirements for high uniformity and high precision inner surface treatment. This limits the application of this technology in microfluidic devices, medical catheters, and precision tubing. Utility Model Content

[0003] To solve the above-mentioned technical problems, this utility model provides a plasma processing device for a tubular component, including a vacuum chamber, on both sides of which a medium inlet and a medium outlet are provided. The tubular component is disposed in the vacuum chamber, and both ends of the tubular component are connected to the medium inlet and the medium outlet, so that a medium channel is formed inside the tubular component.

[0004] And an electric field generating system, the electric field generating system including a feed electrode and a ground electrode electrically connected to the wall of the tubular member, the feed electrode and the ground electrode being spaced apart along the axial direction of the tubular member, such that an electric field distribution for ionizing the treatment medium is formed inside the tubular member.

[0005] Furthermore, the feed electrode and the ground electrode are copper tubes disposed on the outer wall of the tubular component.

[0006] Furthermore, the feed electrode is electrically connected to the feed end via a cable, and the ground electrode is electrically grounded via a cable.

[0007] Furthermore, the feed electrode is disposed in the middle of the tubular member, and the grounding electrode is disposed on both sides of the tubular member.

[0008] Furthermore, the vacuum chamber is formed by a quartz tube, a front upright plate, and a rear upright plate. The quartz tube has a cylindrical structure with openings at both ends, and the front and rear upright plates cover and connect to the openings at both ends.

[0009] Furthermore, a vacuum pumping device is connected to one side of the front upright plate, and the vacuum pumping device is connected to the vacuum chamber.

[0010] Furthermore, the vacuuming device includes a vacuum pump, which is connected to a vacuum plate via a pipeline, and the vacuum plate is detachably connected to the front upright plate.

[0011] Furthermore, vacuum fitting assemblies are provided on both sides of the vacuum chamber, and pagoda connectors are provided on the inner side of the vacuum fitting assemblies, with the pagoda connectors extending into both ends of the tubular component; ventilation equipment is connected to the outer side of the vacuum fitting assemblies.

[0012] Furthermore, the medium is a process gas or an organic monomer.

[0013] Furthermore, the rear plate is connected to a conductive screw. One end of the conductive screw extends into the vacuum chamber and is electrically connected to the feed electrode via a cable, while the other end is connected to an external power source.

[0014] This invention provides a plasma treatment device for tubular components, including a vacuum chamber, an electric field generation system, and a vacuum pumping device. The vacuum chamber is enclosed by a quartz tube, a front plate, and a rear plate, and contains a tubular component with a medium inlet and a medium outlet at its two ends to form a medium channel. The electric field generation system includes a feed electrode and a ground electrode spaced apart along the axial direction of the tubular component. These electrodes are connected to an external power supply and a grounding terminal via cables. When the feed electrode is located in the middle of the tubular component and the ground electrodes are located on both sides, a uniform axial electric field distribution can be formed inside the tubular component. This causes the introduced process gas or organic monomer to ionize into plasma under the action of the electric field, achieving uniform activation or polymerization treatment of the inner wall of the tubular component. This effectively solves the problem that traditional plasma equipment is difficult to use for treating the inner wall of tubular components. This invention can complete the activation cleaning or polymer deposition of the inner wall of tubular components in a vacuum environment, improving the uniformity and consistency of the treatment effect. It is particularly suitable for complex structures such as long tubular components and micro-pipes that are difficult to process with traditional equipment. Attached Figure Description

[0015] Figure 1 This is an internal schematic diagram of a plasma processing device with a tubular component according to the present invention;

[0016] Figure 2 This is a schematic diagram of the structure of a plasma processing device with a tubular component according to this utility model.

[0017] Reference numerals: 1. Tubular component; 2. Vacuum chamber; 3. Medium inlet; 4. Medium outlet; 5. Feed electrode; 6. Grounding electrode; 7. Quartz tube; 8. Front plate; 9. Rear plate; 10. Cable; 11. Vacuum pump; 12. Vacuum plate; 13. Vacuum socket assembly; 14. Conductive screw; 15. Pagoda connector. Detailed Implementation

[0018] like Figure 1 and Figure 2 The diagram illustrates a plasma treatment apparatus for a tubular component 1, used for plasma treatment of the inner wall of the tubular component 1. The apparatus includes a vacuum chamber 2, within which the tubular component 1 is placed, providing and maintaining the required vacuum environment for plasma treatment. A medium inlet 3 and a medium outlet 4 are provided on both sides of the vacuum chamber 2, and the two ends of the tubular component 1 are connected to the medium inlet 3 and the medium outlet 4, forming a medium flow channel inside the tubular component 1.

[0019] The medium used can be process gas or organic monomer. When process gas is introduced, the highly active plasma generated by ionization will bombard and modify the inner surface of the pipe, removing organic pollutants from the surface of the pipe. When organic monomer is introduced, the molecules of the organic monomer will open and polymerize into long-chain macromolecules under the action of plasma, and contact the inner wall of the tubular component 1 to deposit a cross-linked solid film, giving the pipe wall superhydrophobicity, high barrier properties or biocompatibility.

[0020] The processing equipment is equipped with an electric field generation system to provide an electric field distribution for dielectric ionization. The electric field generation system includes a feed electrode 5 and a ground electrode 6 disposed on the outer wall of the tubular component 1. The feed electrode 5 and ground electrode 6 are arranged along the axial direction of the tubular component 1. The feed electrode 5 is electrically connected to the feed end via a cable 10, and the ground electrode 6 is electrically grounded via a cable 10. Through the potential difference generated between the two electrodes, a strong electric field arranged axially is generated inside the conduit. When the process gas passes through the electric field, it is ionized into plasma gas.

[0021] In this embodiment, the feed electrode 5 and the ground electrode 6 are copper tubes disposed on the surface of the tubular member 1, comprising two sets of ground electrodes 6 and one set of feed electrodes 5. The feed electrode 5 is located in the middle of the tubular member 1, and the two sets of ground electrodes 6 are respectively placed on both sides of the tubular member 1, forming two uniform electric fields on both sides of the feed electrode 5. When the medium passes through, it can obtain sufficient and uniform plasma surface treatment. It can be understood that, depending on the length of the tubular member 1, the number of feed electrodes 5 and ground electrodes 6 can be increased along the axial direction of the tubular member 1. The feed electrodes 5 and ground electrodes 6 are spaced apart to form a uniform electric field to maintain the stability of the electric field over a long distance.

[0022] As shown in the figure, the vacuum chamber 2 is formed by a quartz tube 7, a front vertical plate 8, and a rear vertical plate 9. The quartz tube 7 has a cylindrical structure with openings at both ends, and the front vertical plate 8 and the rear vertical plate 9 cover and connect to the openings at both ends. A conductive screw 14 is connected to the rear vertical plate 9. One end of the conductive screw 14 extends into the vacuum chamber 2 and is electrically connected to the feed electrode 5 via a cable 10. The other end is connected to an external power source to provide ionization voltage to the feed electrode 5.

[0023] A vacuum pump is connected to one side of the front upright plate 8. The vacuum pump is connected to the vacuum chamber 2 and removes the gas in the chamber, reducing its pressure from atmospheric pressure to the vacuum level required for the process. Specifically, the vacuum pump includes a vacuum pump 11, which is connected to a vacuum plate 12 via a pipeline. The vacuum plate 12 is detachably connected to the front upright plate 8. By opening the front upright plate 8, a tubular component 1 can be inserted into the vacuum chamber.

[0024] Vacuum fitting assemblies 13 are also provided on both sides of the vacuum chamber 2 to fix the positions of the two ends of the tubular component 1. Vacuum fitting assemblies 13 are existing technology, including quick-connect external threads and other components, and are widely used in the fixing of components in vacuum equipment. The specific structure of the vacuum fitting assembly 13 will not be described here. The vacuum fitting assembly 13 is hollow in the middle, forming the aforementioned medium inlet 3 and medium outlet 4. A pagoda connector 15 is provided on the inner side of the vacuum fitting assembly 13. The pagoda connector 15 extends into both ends of the tubular component 1, forming a seal on the ends of the tubular component 1. A ventilation device is connected to the outer side of the tubular component 1 to introduce the medium into the tubular component 1.

[0025] Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention. Those skilled in the art can make changes, modifications, substitutions and variations to the above embodiments within the scope of the present invention.

Claims

1. A plasma treatment device for a tubular component, characterized in that: Includes a vacuum chamber (2), on both sides of which are provided a medium inlet (3) and a medium outlet (4), and a tubular member (1) is disposed inside the vacuum chamber (2), and the two ends of the tubular member (1) are connected to the medium inlet (3) and the medium outlet (4), so that a medium channel is formed inside the tubular member (1); And an electric field generating system, the electric field generating system including a feed electrode (5) and a ground electrode (6) electrically connected to the wall of the tubular member (1), the feed electrode (5) and the ground electrode (6) being spaced apart along the axial direction of the tubular member (1) such that an electric field distribution for ionizing the treatment medium is formed inside the tubular member (1).

2. The plasma treatment device for a tubular component as described in claim 1, characterized in that: The feed electrode (5) and the ground electrode (6) are copper tubes installed on the outer wall of the tubular component (1).

3. The plasma treatment device for a tubular component as described in claim 1, characterized in that: The feed electrode (5) is electrically connected to the feed end via cable (10), and the ground electrode (6) is electrically grounded via cable (10).

4. The plasma treatment apparatus for a tubular component as described in claim 1, characterized in that: The feed electrode (5) is located in the middle of the tubular member (1), and the ground electrode (6) is located on both sides of the tubular member (1).

5. The plasma treatment apparatus for a tubular component as described in claim 3, characterized in that: The vacuum chamber (2) is formed by a quartz tube (7), a front plate (8), and a rear plate (9). The quartz tube (7) has a cylindrical structure with openings at both ends, and the front plate (8) and the rear plate (9) cover and connect to the openings at both ends.

6. The plasma treatment apparatus for a tubular component as described in claim 5, characterized in that: A vacuum pumping device is connected to one side of the front upright plate (8), and the vacuum pumping device is connected to the vacuum chamber (2).

7. The plasma treatment apparatus for a tubular component as described in claim 6, characterized in that: The vacuuming device includes a vacuum pump (11), which is connected to a vacuum plate (12) via a pipeline. The vacuum plate (12) is detachably connected to the front upright plate (8).

8. The plasma treatment apparatus for a tubular component as described in claim 6, characterized in that: Vacuum socket assembly (13) is provided on both sides of the vacuum chamber (2). A pagoda connector (15) is provided on the inner side of the vacuum socket assembly (13). The pagoda connector (15) extends into both ends of the tubular component (1). A ventilation device is connected to the outer side of the vacuum socket assembly (13).

9. The plasma treatment apparatus for a tubular component as described in claim 1, characterized in that: The medium is a process gas or an organic monomer.

10. The plasma treatment apparatus for a tubular component as described in claim 6, characterized in that: The rear plate (9) is connected to a conductive screw (14). One end of the conductive screw (14) extends into the vacuum chamber (2) and is electrically connected to the feed electrode (5) via a cable (10). The other end is connected to an external power source.

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