Exhaust gas treatment device and etching system

Abstract

The utility model provides a kind of waste gas treatment device and etching system, waste gas treatment device includes purification pipe, first purification tank and drive part;First purification tank is located in purification pipe, and includes first box, and first box loads granular adsorbent;Drive part includes matrix, first magnet, second magnet and elastic piece;Matrix is rotatably located in purification pipe;First magnet is located in matrix;Second magnet is located in first purification tank;Elastic piece is located between first purification tank and purification pipe;When matrix rotates to the magnetic force between first magnet and second magnet, it drives first purification tank to move along first direction, and make elastic piece store elastic potential energy;When matrix rotates to first magnet and second magnet stagger, elastic piece releases elastic potential energy and drives first purification tank to move along second direction opposite to first direction.Waste gas treatment device when treating waste gas, adsorbent changes position with the movement of first purification tank, improves waste gas purification effect.

Description

Technical Field

[0001] This utility model belongs to the field of semiconductor manufacturing technology, specifically relating to a waste gas treatment device and an etching system. Background Technology

[0002] During semiconductor etching, the material on the semiconductor surface reacts with activating substances in the process gas to generate waste gas. Existing waste gas purification devices typically use activated carbon to adsorb organic matter and other pollutants in the waste gas. However, the activated carbon in existing technologies is designed as a fixed unit, which makes the activated carbon layer prone to local adsorption saturation. Consequently, when the waste gas passes through the fixed activated carbon layer, it cannot make sufficient contact with the activated carbon, reducing the purification effect. Utility Model Content

[0003] The purpose of this invention is to provide a waste gas treatment device and an etching system, which aims to improve the treatment effect of waste gas.

[0004] To achieve the above objectives, this utility model provides a waste gas treatment device, comprising:

[0005] Purification pipe;

[0006] A first purification chamber, disposed within the purification tube, includes a first housing for loading particulate adsorbent; and,

[0007] The driving unit includes a base, a first magnet, a second magnet, and an elastic element; the base is rotatably disposed inside the purification tube, and the rotation axis of the base extends along the axial direction of the purification tube; the base and the first purification box are arranged along the axial direction of the purification tube; the first magnet is disposed on the base; the second magnet is disposed on the first box, and the elastic element connects the first box and the purification tube;

[0008] When the substrate rotates to the point where the first magnet and the second magnet are at least partially aligned in the circumferential direction of the purification tube, a magnetic force is generated between the first magnet and the second magnet, causing the first purification box to move in the axial direction of the purification tube along a first direction, and causing the elastic element to store elastic potential energy; when the substrate rotates to the point where the first magnet and the second magnet are misaligned in the circumferential direction of the purification tube, the elastic element releases the elastic potential energy and causes the first purification box to move in a second direction opposite to the first direction.

[0009] Optionally, the magnetic poles of the end of the first magnet facing the first purification box are opposite to the magnetic poles of the end of the second magnet facing the substrate;

[0010] The first direction is the direction in which the first purification box points to the substrate.

[0011] Optionally, the magnetic poles of the end of the first magnet facing the first purification box are the same as the magnetic poles of the end of the second magnet facing the substrate;

[0012] The first direction is the direction in which the substrate points towards the first purification box.

[0013] Optionally, the drive unit includes a support member, a rotating shaft, and at least one fan blade; the support member is disposed inside the purification pipe and connected to the purification pipe; the rotating shaft extends axially along the purification pipe and is rotatably disposed on the support member; the fan blade is disposed on the rotating shaft, and at least one of the fan blades constitutes the base.

[0014] Optionally, the first housing includes an outer shell and a partition, and the first housing is a hollow structure with an inner cavity; the partition is disposed in the inner cavity and divides the inner cavity into multiple sub-chambers, each of which is used to load the adsorbent.

[0015] Optionally, the first purification chamber further includes the adsorbent.

[0016] Optionally, the purification tube has an axially opposite inlet end and an outlet end; the substrate and the first purification box are arranged along the direction from the inlet end to the outlet end of the purification tube;

[0017] The waste gas treatment device further includes a second purification box, which is disposed inside the purification pipe and located on the side of the first purification box away from the substrate. The second purification box includes a second box body and filter cotton disposed inside the second box body.

[0018] To achieve the above objectives, this utility model also provides an etching system, comprising:

[0019] Etching apparatus, having an air outlet; and,

[0020] As described above, the exhaust gas treatment device has an axially opposite inlet end and an outlet end, with the inlet end connected to the outlet.

[0021] Optionally, the etching apparatus further includes a valve, which is disposed at the air outlet or at the inlet end of the purification pipe.

[0022] Optionally, the etching apparatus further includes an air extraction device disposed at the air outlet or the inlet end of the purification pipe.

[0023] Compared with the prior art, the waste gas treatment device and etching system of this utility model have the following advantages:

[0024] The aforementioned waste gas treatment device includes a purification pipe, a first purification chamber, and a drive unit. The first purification chamber is disposed within the first purification pipe and includes a first housing for loading granular adsorbent. The drive unit includes a substrate, a first magnet, a second magnet, and an elastic element. The substrate is rotatably disposed within the purification pipe, and the axis of rotation of the substrate extends along the axial direction of the purification pipe. The substrate and the first purification chamber are arranged along the axial direction of the purification pipe. The first magnet is disposed on the substrate. The second magnet is disposed on the first purification chamber. The elastic element is connected to the first purification chamber. Between the first purification chamber and the purification pipe; the waste gas treatment device is configured such that when the substrate rotates to the point where the first magnet and the second magnet are at least partially aligned circumferentially in the purification pipe, a magnetic force is generated between the first magnet and the second magnet, driving the first purification chamber to move axially in a first direction in the purification pipe, and causing the elastic element to store elastic potential energy; when the substrate rotates to the point where the first magnet and the second magnet are misaligned circumferentially in the purification pipe, the elastic element releases elastic potential energy and drives the first purification chamber to move in a second direction opposite to the first direction. When the waste gas is purified using the waste gas treatment device, the first chamber is loaded with granular adsorbent, and the adsorbent moves and changes position as the first purification chamber moves, thereby allowing the waste gas entering the first purification chamber to fully contact the adsorbent, improving the waste gas purification effect. Attached Figure Description

[0025] The accompanying drawings are provided to better understand this utility model and do not constitute an undue limitation thereof. Wherein:

[0026] Figure 1 This is a schematic diagram of the structure of the waste gas treatment device provided according to an embodiment of the present invention;

[0027] Figure 2 This is a schematic diagram of the structure of the waste gas treatment device according to an embodiment of the present invention. Figure 2 and Figure 1 The observation directions are different;

[0028] Figure 3 This is a schematic diagram of the structure of the first purification box of the waste gas treatment device according to an embodiment of the present invention.

[0029] [The following are explanations of the reference numerals in the attached drawings]: 100-purification pipe, 200-first purification box, 210-first box body, 211-outer shell, 2111-first end wall, 2112-second end wall, 2113-circumferential side wall, 212-separator, 310-base, 320-first magnet, 330-second magnet, 340-elastic element, 350-support element, 360-rotating shaft, 370-fan blade, 400-second purification box. Detailed Implementation

[0030] The following specific examples illustrate the implementation of this utility model. Those skilled in the art can easily understand other advantages and effects of this utility model from the content disclosed in this specification. This utility model can also be implemented or applied through other different specific embodiments, and various details in this specification can be modified or changed based on different viewpoints and applications without departing from the spirit of this utility model. It should be noted that the illustrations provided in this embodiment are only schematic representations of the basic concept of this utility model. Therefore, the drawings only show components related to this utility model and are not drawn according to the actual number, shape, and size of the components in implementation. In actual implementation, the type, quantity, and proportion of each component can be arbitrarily changed, and the component layout may also be more complex.

[0031] Furthermore, while each embodiment described below possesses one or more technical features, this does not imply that users of this utility model must simultaneously implement all technical features in any embodiment, or can only separately implement some or all technical features in different embodiments. In other words, provided it is feasible, those skilled in the art can selectively implement some or all technical features in any embodiment, or selectively implement a combination of some or all technical features in multiple embodiments, based on the disclosure of this utility model and depending on design specifications or implementation requirements, thereby increasing the flexibility in implementing this utility model.

[0032] As used herein, the singular forms “a,” “an,” and “the” include plural objects, and the plural form “multiple” includes two or more objects, unless otherwise expressly indicated. As used herein, the term “or” is generally used to include the meaning of “and / or,” unless otherwise expressly indicated, and the terms “installed,” “connected,” and “linked” should be interpreted broadly, for example, as a fixed connection, a detachable connection, or an integral connection. Connections can be mechanical or electrical. Connections can be direct or indirect through an intermediate medium, and can be internal communication between two elements or an interaction between two elements. Relational terms such as “first,” “second,” etc., are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations, nor do they indicate or imply relative importance or implicitly specify the number of indicated technical features. It should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "axial," "radial," and "circumferential," etc., indicating orientation or positional relationships, are based on the orientation or positional relationships shown in the accompanying drawings and are only for the convenience of describing this utility model and simplifying the description. They do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. For those skilled in the art, the specific meaning of the above terms in this utility model can be understood according to the specific circumstances.

[0033] To make the objectives, advantages, and features of this utility model clearer, the following detailed description is provided in conjunction with the accompanying drawings. It should be noted that the drawings are all in a very simplified form and use non-precise proportions, and are only used to conveniently and clearly illustrate the objectives of the embodiments of this utility model. The same or similar reference numerals in the drawings represent the same or similar parts.

[0034] Figure 1 and Figure 2 The following are schematic diagrams of the waste gas treatment device provided in the embodiments of this utility model from different perspectives. Figure 1 and Figure 2 The exhaust gas treatment device includes a purification pipe 100, a first purification chamber 200, and a drive unit (not shown in the figure). The purification pipe 100 is a hollow tubular structure. The first purification chamber 200 is disposed within the cavity of the purification pipe 100, and the first purification chamber 200 includes a first chamber body 210 (e.g., ...). Figure 3 As indicated in the diagram), the first box 210 is used to load granular adsorbent 220 (such as...). Figure 3 (As indicated in the diagram). The driving unit includes a base 310, a first magnet 320, a second magnet 330, and an elastic element 340. The base 310 is rotatably disposed within the cavity of the purification tube 100, and the axis of rotation of the base 310 extends along the axial direction of the purification tube 100. The base 310 and the first purification chamber 200 are arranged along the axial direction of the purification tube 100. The first magnet 320 is disposed on the base 310. The second magnet 330 is disposed on the first purification chamber 200. The elastic element 340 connects the first purification chamber 200 and the purification tube 100.

[0035] The exhaust gas treatment device is configured such that when the base 310 rotates to a point where the first magnet 320 and the second magnet 330 are at least partially aligned circumferentially in the purification tube 100, a magnetic force is generated between the first magnet 320 and the second magnet 330. This magnetic force drives the first purification chamber 200 to move axially in a first direction along the purification tube 100, and the elastic member 340 deforms and stores elastic potential energy as the first purification chamber 200 moves along the first direction. The exhaust gas treatment device is further configured such that when the base 310 rotates to a point where the first magnet 320 and the second magnet 330 are misaligned circumferentially in the purification tube 100, the magnetic force between the first magnet 320 and the second magnet 330 ceases to be generated, the elastic member 340 releases its elastic potential energy, and drives the first purification chamber 200 to move in a second direction opposite to the first direction. That is, in this embodiment of the invention, the driving unit is configured to drive the first purification chamber 200 to perform reciprocating linear motion along the axial direction of the purification tube 100.

[0036] When treating waste gas using the aforementioned waste gas treatment device, the first housing 210 contains the adsorbent 220, such as activated carbon. During the waste gas treatment process, the drive unit drives the first purification housing 200 to reciprocate along the axial direction of the purification pipe 100, causing the adsorbent to move and change position, thereby ensuring sufficient contact between the waste gas and the adsorbent and improving the waste gas purification effect. It is understood that the first purification housing 200 may also include the adsorbent 220.

[0037] It should be noted that the cross-section of the purification tube 100 can be circular or other shapes, such as rectangular or elliptical. When the cross-section of the purification tube 100 is not circular, the circumferential direction of the purification tube 100 refers to the direction surrounding the axis of the purification tube 100.

[0038] In the first embodiment, the magnetic pole of the end of the first magnet 320 facing the first purification chamber 200 is opposite to the magnetic pole of the end of the second magnet 330 facing the base 310. Thus, when the base 310 is rotated until the first magnet 320 and the second magnet 330 are at least partially aligned circumferentially in the purification tube 100, the first magnet 310 and the second magnet 320 are attracted to each other, generating an attractive force that drives the first purification chamber 200 to move in a direction closer to the base 310. That is, the first direction is the direction from the first purification chamber 200 to the base 310, and the second direction is the direction from the base 310 to the first purification chamber 200.

[0039] In the first embodiment, as Figure 1 and Figure 2 As shown, when the end of the elastic element 340 near the base 310 is connected to the first purification chamber 200 and the end away from the base 300 is connected to the purification pipe 100, the elastic element 340 is stretched and deformed when the first purification chamber 200 moves along the first direction. When the end of the elastic element 340 near the base 310 is connected to the purification pipe 100 and the end away from the base 310 is connected to the first purification chamber 200 (not shown in the figure), the elastic element 340 is compressed and deformed when the first purification chamber 200 moves along the first direction.

[0040] In the second embodiment, the magnetic pole of the end of the first magnet 320 facing the first purification chamber 200 is the same as the magnetic pole of the end of the second magnet 330 facing the base 310. Thus, when the base 310 is rotated until the first magnet 320 and the second magnet 330 are at least partially aligned circumferentially in the purification tube 100, the first magnet 310 and the second magnet 320 are repulsive to each other, generating a repulsive force that drives the first purification chamber 200 to move away from the base 310. That is, the first direction is the direction from the base 310 to the first purification chamber 200, and the second direction is the direction from the first purification chamber 200 to the base 310.

[0041] In the second embodiment, as Figure 1 and Figure 2As shown, when the end of the elastic element 340 near the base 310 is connected to the first purification chamber 200 and the end away from the base 300 is connected to the purification pipe 100, the elastic element 340 is compressed and deformed when the first purification chamber 200 moves along the first direction. When the end of the elastic element 340 near the base 310 is connected to the purification pipe 100 and the end away from the base 310 is connected to the first purification chamber 200, the elastic element 340 is stretched and deformed when the first purification chamber 200 moves along the first direction.

[0042] Preferably, the first magnet 320 is disposed on the side of the base 310 facing the first housing 200. The second magnet 330 is disposed on the side of the first housing 210 facing the base 310.

[0043] The structure of the base 310 is not particularly limited in this embodiment, as long as it can rotate about a rotation axis extending axially along the purification pipe 100. In an optional embodiment, the drive unit includes a fan, which includes a support member 350, a rotating shaft 360, and at least one fan blade 370. The support member 350 is disposed inside the purification pipe 100 and fixedly connected to it. The rotating shaft 360 extends axially along the purification pipe 100 and is rotatably disposed on the support member 350. The fan blades 370 are fixedly disposed on the rotating shaft 360. When there are multiple fan blades 370, the multiple fan blades 370 can be circumferentially spaced around the rotating shaft 360. At least a portion of the fan blades 370 are provided with the first magnet 310, and each fan blade 370 provided with the first magnet 310 constitutes one base 310. The fan here can be any suitable fan in the prior art.

[0044] Furthermore, such as Figure 3 As shown, the first housing 210 includes an outer shell 211 and a partition 212. The outer shell 211 is a hollow structure with an inner cavity. The partition 212 is disposed in the inner cavity (not shown in the figure) and divides the inner cavity into multiple sub-chambers (not shown in the figure). Each sub-chamber is used to load the adsorbent 220. The advantage of this arrangement is that it can improve the uniformity of the distribution of the adsorbent 220 within the first housing 210, reduce accumulation, and further improve the exhaust gas purification effect.

[0045] In this embodiment of the invention, the multiple sub-chambers can be arranged in any suitable manner, for example, arranged sequentially along the circumference of the purification pipe 100 (e.g., Figure 3 (as shown), or arranged sequentially along the axial direction of the purification tube, or arranged irregularly, etc.

[0046] It should be noted that at least a portion of the wall of the outer casing 211 is a porous wall to allow exhaust gas to enter and exit the inner cavity. For example, the outer casing 211 is an integral cylindrical structure coaxial with the purification pipe 100, and includes a first end wall 2111, a second end wall 2112, and circumferential side walls 2113 (e.g., Figure 1 and Figure 2 As indicated, the first end wall 2111, the circumferential side wall 2113, and the second end wall 2112 are sequentially connected and enclose the inner cavity, with the first end wall 2111 facing the inlet end of the purification pipe 100 and the second end wall 2112 facing the outlet end of the purification pipe 100. The first end wall 2111 has a porous structure to allow exhaust gas to enter the first purification chamber 200, and the second end wall 2112 has a porous structure to allow exhaust gas to exit the first purification chamber 200. The separator 212 may also have a porous structure to allow exhaust gas to flow between the various sub-chambers.

[0047] It is readily understood that the purification pipe 100 has an axially opposite inlet end and an outlet end. In a preferred embodiment, the base 310 and the first purification box 200 are arranged along the direction from the inlet end to the outlet end of the purification pipe 100. Furthermore, as... Figure 1 and Figure 2 As shown, the exhaust gas treatment device further includes a second purification chamber 400, which is disposed within the purification pipe 100 and located on the side of the first purification chamber 200 away from the substrate 310. The second purification chamber 400 includes a second chamber body (not shown in the figure) and filter cotton (not shown in the figure) disposed within the second chamber body. Thus, after the exhaust gas is treated by the first purification chamber 200, it flows into the second purification chamber 400 for further treatment. It is understood that at least a portion of the wall of the second chamber body has a perforated structure to allow exhaust gas to enter and exit the second purification chamber 400.

[0048] Furthermore, this embodiment of the invention also provides an etching system (not shown in the figure), which includes an etching apparatus and the exhaust gas treatment apparatus. The etching apparatus is provided with an exhaust port. The inlet end of the purification pipe 100 of the exhaust gas treatment apparatus is connected to the exhaust port. Thus, the exhaust gas generated when the etching apparatus performs an etching operation on the semiconductor can enter the exhaust gas treatment apparatus through the exhaust port for purification.

[0049] Preferably, the etching system further includes a valve, which is located at the air outlet or at the inlet of the purification pipe 100, and is used to control the connection between the etching device and the waste gas treatment device. Specifically, when the valve is open, the etching device is connected to the waste gas treatment device, and the waste gas generated during etching can enter the waste gas treatment device; when the valve is closed, the etching device is isolated from the waste gas treatment device, preventing waste gas from entering the waste gas treatment device.

[0050] Preferably, the etching system further includes an exhaust device, such as an exhaust fan. The exhaust device is located at the exhaust port or at the inlet end of the purification pipe 100. The exhaust device is used to draw the waste gas in the etching device into the purification pipe 100 when the etching device is connected to the waste gas treatment device.

[0051] While the present invention has been disclosed above, it is not limited thereto. Those skilled in the art can make various modifications and variations to the present invention without departing from its spirit and scope. Therefore, if such modifications and variations fall within the scope of the claims of the present invention and their equivalents, the present invention also intends to include such modifications and variations.

Claims

1. A waste gas treatment device, characterized in that, include: Purification pipe; A first purification chamber, disposed within the purification tube, includes a first housing for loading particulate adsorbent; and, The driving unit includes a base, a first magnet, a second magnet, and an elastic element; the base is rotatably disposed inside the purification tube, and the rotation axis of the base extends along the axial direction of the purification tube; the base and the first purification box are arranged along the axial direction of the purification tube; the first magnet is disposed on the base; the second magnet is disposed on the first box, and the elastic element connects the first box and the purification tube; When the substrate rotates to the point where the first magnet and the second magnet are at least partially aligned in the circumferential direction of the purification tube, a magnetic force is generated between the first magnet and the second magnet, causing the first purification box to move in the axial direction of the purification tube along a first direction, and causing the elastic element to store elastic potential energy; when the substrate rotates to the point where the first magnet and the second magnet are misaligned in the circumferential direction of the purification tube, the elastic element releases the elastic potential energy and causes the first purification box to move in a second direction opposite to the first direction.

2. The waste gas treatment device according to claim 1, characterized in that, The magnetic poles of the first magnet at the end facing the first purification box are opposite to the magnetic poles of the second magnet at the end facing the substrate; The first direction is the direction in which the first purification box points to the substrate.

3. The waste gas treatment device according to claim 1, characterized in that, The magnetic poles of the first magnet at the end facing the first purification box are the same as the magnetic poles of the second magnet at the end facing the substrate; The first direction is the direction in which the substrate points towards the first purification box.

4. The waste gas treatment device according to claim 1, characterized in that, The drive unit includes a support member, a rotating shaft, and at least one fan blade; the support member is disposed inside the purification pipe and connected to the purification pipe; the rotating shaft extends axially along the purification pipe and is rotatably disposed on the support member; the fan blade is disposed on the rotating shaft, and at least one of the fan blades constitutes the base.

5. The waste gas treatment device according to claim 1, characterized in that, The first housing includes an outer shell and a partition. The first housing is a hollow structure with an inner cavity. The partition is disposed in the inner cavity and divides the inner cavity into multiple sub-chambers, each of which is used to load the adsorbent.

6. The waste gas treatment device according to claim 1, characterized in that, The first purification chamber also includes the adsorbent.

7. The waste gas treatment device according to claim 1, characterized in that, The purification tube has an axially opposite inlet end and an outlet end; the substrate and the first purification box are arranged along the direction from the inlet end to the outlet end of the purification tube. The waste gas treatment device further includes a second purification box, which is disposed inside the purification pipe and located on the side of the first purification box away from the substrate. The second purification box includes a second box body and filter cotton disposed inside the second box body.

8. An etching system, characterized in that, include: An etching apparatus, which is equipped with an air outlet; as well as, According to any one of claims 1-7, the exhaust gas treatment device has an axially opposite inlet end and an outlet end, the inlet end being connected to the outlet.

9. The etching system according to claim 8, characterized in that, The etching device also includes a valve, which is disposed at the air outlet or at the inlet end of the purification pipe.

10. The etching system according to claim 8, characterized in that, The etching apparatus also includes an air extraction device, which is disposed at the air outlet or the inlet end of the purification tube.

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