A three-stage tiered screening device
Patent Information
- Application Number
- CN202522615821.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-12-10
- Publication Date
- 2026-10-27
- Estimated Expiration
- 2035-12-10
AI Technical Summary
[0007]本实用新型的目的在于克服现有筛分设备杂质去除不彻底、分级效果差、单机产量低的缺陷,提供一种三级分层筛分装置,通过三级筛层的协同配合,实现不同粒度杂质的精准分级去除,显著提升净料纯度和单机设备产量
[0022]1、分级明确,针对性强:通过初清筛层、清理筛层和检查筛层的三级结构,分别对应去除超大杂、小杂+大杂和未筛净大杂,实现杂质的阶梯式精准去除;
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Figure CN224894758U_ABST
Abstract
Description
Technical Field
[0001] This utility model belongs to the technical field of material screening equipment, specifically relating to a three-stage layered screen structure. Background Technology
[0002] In grain processing, ore screening, and medicinal herb purification, materials often contain impurities of varying particle sizes (such as oversized impurities, fine particles, and medium-sized impurities). Screening equipment is necessary to remove these impurities and improve the purity of the finished product. Existing screening equipment mostly employs single-stage or two-stage screening structures, which have the following drawbacks:
[0003] 1. Single-stage screening can only remove impurities within a single particle size range and cannot simultaneously remove ultra-large, small, and large impurities. It requires a pre-cleaning process, or the output is low, resulting in a high impurity residue rate.
[0004] 2. Although two-stage screening can separate some impurities, it lacks a secondary inspection and screening of the unscreened impurities, which can easily lead to the problem of "missed screening" of large impurities and grain.
[0005] 3. In traditional screening structures, the functional allocation of each screen layer is unreasonable, resulting in wasted screen surface area in large mixed layers and insufficient screen surface area in small mixed layers, thus affecting output.
[0006] Therefore, there is an urgent need for a multi-stage screening device that has clear grading, thorough screening, and can specifically remove impurities of different particle sizes, in order to solve the problem of low single-machine output in the existing technology. Summary of the Invention
[0007] The purpose of this invention is to overcome the shortcomings of existing screening equipment, such as incomplete impurity removal, poor grading effect, and low single-machine output, and to provide a three-stage layered screening device. Through the coordinated operation of the three-stage screening layers, it can achieve precise grading and removal of impurities of different particle sizes, and significantly improve the purity of the net material and the output of a single machine.
[0008] The technical solution adopted in this utility model is: a three-stage layered screening device, including a primary cleaning screen layer, a cleaning screen layer, an inspection screen layer, and a central channel;
[0009] The primary cleaning screen layer is positioned above the cleaning screen layer and is used to remove oversized impurities.
[0010] The cleaning screen layer is set above the inspection screen layer and includes a small impurity cleaning section and a large impurity cleaning section. The small impurity cleaning section is used to remove small impurities, and the large impurity cleaning section is used to remove large impurities.
[0011] The inspection sieve layer is used to screen out grains that were not completely removed from the impurities in the previous sieve layer;
[0012] The central channel is located below the primary cleaning screen layer and is used for centralized guidance of materials between the cleaning screen layers.
[0013] Furthermore, the cleaning screen layer has a symmetrical structure and is located on both sides of the central channel.
[0014] Furthermore, the small impurity cleaning section of the cleaning screen is located above the large impurity cleaning section, forming a layered screening structure. The material enters the large impurity cleaning section after being processed by the small impurity cleaning section.
[0015] Furthermore, the screening device also includes an extra-large impurity channel, which is located on both sides of the end of the primary cleaning screen layer and is used to guide the extra-large impurities discharged from the primary cleaning screen layer.
[0016] Furthermore, the screening device also includes a small impurity channel; the small impurity channel is located on both sides at the end of the small impurity cleaning section and is used to guide the small impurities discharged from the small impurity cleaning section.
[0017] Furthermore, the screening device also includes a clean grain channel; the clean grain channel is located on both sides at the end of the miscellaneous cleaning section and is used to guide the clean grain discharged from the miscellaneous cleaning section.
[0018] Furthermore, the screening device also includes a large impurity channel, which is used to guide the discharge of impurities from the screen layer.
[0019] Furthermore, the initial cleaning screen layer has an inclined screen structure, and its screen hole size is larger than that of the large impurity cleaning section of the cleaning screen layer.
[0020] Furthermore, the inspection sieve layer has an inclined sieve structure, and its sieve hole size is adapted to the sieve hole size of the large impurity cleaning section in the cleaning sieve layer.
[0021] The beneficial effects of this utility model are:
[0022] 1. Clear grading and strong targeting: Through the three-level structure of initial cleaning screen layer, cleaning screen layer and inspection screen layer, it respectively removes oversized impurities, small impurities + large impurities and large impurities that have not been screened clean, so as to achieve precise removal of impurities in a step-by-step manner.
[0023] 2. Thorough screening and high purity of net material: The screening results of the previous screening layer are checked again to effectively avoid the presence of large impurities in the grain.
[0024] 3. Compact structure and high efficiency: Each screen layer is set in layers along the material flow direction, and the material is conveyed by gravity and vibration in combination. There is no need for a complicated conveying mechanism and the footprint is small.
[0025] 4. Wide adaptability: By adjusting the screen aperture size of each screen layer, it can adapt to the screening needs of different types of materials such as grains, ores, and medicinal materials, making it highly versatile. Attached Figure Description
[0026] Figure 1 This is a front view schematic diagram of the structure of this utility model;
[0027] Figure 2 This is a top view schematic diagram of the novel structure of this material;
[0028] In the diagram: 1-Initial cleaning screen layer, 2-Central channel, 3-Clean screen layer, 4-Small impurity cleaning section, 5-Large impurity cleaning section, 6-Large impurity channel, 7-Inspection screen layer, 8-Clean grain channel, 9-Small impurity channel, 10-Extra-large impurity channel. Detailed Implementation
[0029] To more clearly illustrate the technical solution of this utility model, the accompanying drawings used in the description will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other embodiments can be obtained based on these drawings without creative effort. To facilitate understanding of this utility model, a more detailed description of this utility model will be provided below in conjunction with the accompanying drawings and specific embodiments.
[0030] This utility model is a three-stage layered screening device, a key component of symmetrical screening and impurity removal equipment, such as... Figure 1 and Figure 2 As shown, the device includes a frame and a primary cleaning screen layer 1, a cleaning screen layer 3, an inspection screen layer 7, a central channel 2, a large impurity channel 6, an inspection screen layer 7, a clean grain channel 8, a small impurity channel 9, and an extra-large impurity channel 10, all suspended on the frame. The primary cleaning screen layer 1, the cleaning screen layer 3, and the inspection screen layer 7 are arranged vertically from top to bottom in a layered manner to form a complete three-stage screening process.
[0031] The primary cleaning screen layer 1 is horizontally positioned at the top of the device, directly above the cleaning screen layer 3. It is a rectangular screen structure with an inclined angle, and its screen surface is made of perforated steel plate or metal woven mesh. The screen hole size can be adjusted according to the characteristics of the raw material to meet the requirements for intercepting oversized impurities. During operation, the raw material is conveyed to the high end of the primary cleaning screen layer 1 through the feeding device. Under the action of vibration and gravity, it flows to the low end. During this process, oversized impurities such as stones and fiber clumps are intercepted by the screen surface and are finally discharged through the discharge port at the low end of the primary cleaning screen layer 1 into the oversized impurity channel 10. The remaining material, which contains clean material, small impurities, and large impurities, falls through the screen holes into the central channel 2 below.
[0032] The central channel 2 is vertically positioned directly below the primary cleaning screen layer 1, with its top end connected to the material outlet of the primary cleaning screen layer 1. Multiple rows of outlets, distributed according to a certain rule, are opened on the left and right sides of the central channel 2 from top to bottom, extending to the upper part of each screen surface on both sides of the corresponding cleaning screen layer 3. This enables the centralized collection and directional flow of the material after primary cleaning, ensuring that the material is evenly distributed to both sides of the cleaning screen layer 3, reducing the problem of material accumulation or uneven distribution.
[0033] The cleaning screen layer 3 has a symmetrical structure, symmetrically distributed on both sides of the central channel 2. Each side includes a small impurity cleaning section 4 and a large impurity cleaning section 5, arranged in a V-shape with respect to the central symmetry line. The small impurity cleaning section 4 is located at the upper end and connects to the branch outlet of the central channel 2. The screen surface is a perforated plate or metal woven mesh to facilitate the separation of small impurities. After the material flows through the central channel 2 to the small impurity cleaning section 4, it flows under vibration. Small-diameter impurities such as dust and fragments fall through the screen holes and are discharged through the corresponding outer small impurity channel 9. The retained material containing clean material and large impurities continues to flow to the lower large impurity cleaning section 5. The large impurity cleaning section 5 is an extension of the small impurity cleaning section 4, and has the same inclination angle as the small impurity cleaning section 4. The screen hole size is larger than the net material particle size but smaller than the screen hole size of the primary cleaning screen layer. After the material enters, the net material falls through the screen hole to the bottom plate and collects in the left and right clean grain channels 8. Finally, it flows into the bottom plate and is discharged through the grain outlet. Large impurities are intercepted and fall into the large impurity channel 6 at the end of the large impurity cleaning section 5. Finally, they are inspected and screened by the inspection screen layer 7. Unscreened grain particles are separated and fall into the lower bottom plate for discharge. Large impurities flow through the inspection screen surface to the end and are discharged through the large impurity outlets 11 on both sides, thus achieving inspection and screening.
[0034] The inspection screen layer 7 is horizontally set directly below the cleaning screen layer 3. It is also a screen structure with an inclined angle. The material falling through the cleaning screen layer 3 flows on the inspection screen layer 7. Large impurities containing grain that are not completely screened are intercepted and discharged through the discharge port 11 at the bottom of the inspection screen layer 7. Finally, the material that passes through the screen holes is discharged through the clean material collection port at the bottom of the device.
[0035] The advantage of this embodiment is that:
[0036] 1. The symmetrical structure of the cleaning screen layer 3, combined with the bifurcated flow guide of the central channel 2, doubles the screening area without increasing the footprint of the device, thereby increasing the throughput per unit time and adapting to the needs of large-scale material screening.
[0037] 2. The layered design of the small impurity cleaning section 4 and the large impurity cleaning section 5 allows the material to be separated into small impurities first and then large impurities, which rationally allocates the proportion of impurity removal sections and greatly improves screening efficiency and output.
[0038] 3. The centralized flow guiding function of the central channel 2 reduces the loss of materials scattered between screen layers and improves the material utilization rate. The directional discharge and re-screening design of the large impurity channel 6 effectively improves the screening effect and reduces the loss.
[0039] 4. The screen hole sizes of the initial cleaning screen layer 1, cleaning screen layer 3, and checking screen layer 7 are matched in sequence. Combined with the inclined screen body and vibration drive, a step-by-step screening process of "pre-removal of ultra-large impurities → grading and removal of small impurities + grading and removal of large impurities → re-screening of large impurities to remove grains that have leaked through the screen" is achieved, which improves the final screening effect and yield.
[0040] The various embodiments described in this specification are presented in a progressive manner, with each embodiment focusing on its differences from other embodiments. Similar or identical parts between embodiments can be referred to interchangeably. The above description of the disclosed embodiments enables those skilled in the art to implement or use this invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of this invention. Therefore, this invention is not to be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims
1. A three-stage layered screening device, characterized in that, This includes initial cleaning of the screen layer (1), cleaning of the screen layer (3), inspection of the screen layer (7), and the central channel (2); The primary cleaning screen layer (1) is positioned above the cleaning screen layer (3) and is used to remove oversized impurities. The cleaning screen layer (3) is set above the inspection screen layer (7) and includes a small impurity cleaning section (4) and a large impurity cleaning section (5). The small impurity cleaning section (4) is used to remove small impurities, and the large impurity cleaning section (5) is used to remove large impurities. The inspection sieve layer (7) is used to screen out grains that have not been cleaned in the previous sieve layer; The central channel (2) is located below the primary cleaning screen layer (1) and is used for the centralized flow of materials between the cleaning screen layers (3).
2. The three-stage layered screening device according to claim 1, characterized in that, The cleaning screen (3) has a left-right symmetrical structure and is located on both sides of the central channel (2).
3. The three-stage layered screening device according to claim 1, characterized in that, The small impurity cleaning section (4) of the cleaning screen layer (3) is located above the large impurity cleaning section (5) and has a layered screening structure. After the material is processed by the small impurity cleaning section (4), it enters the large impurity cleaning section (5).
4. The three-stage layered screening device according to claim 1, characterized in that, The screening device also includes an extra-large impurity channel (10), which is located on both sides of the end of the primary cleaning screen layer (1) and is used to guide the extra-large impurities discharged from the primary cleaning screen layer (1).
5. A three-stage layered screening device according to claim 1, characterized in that, The screening device also includes a small impurity channel (9); the small impurity channel (9) is located on both sides of the end of the small impurity cleaning section (4) and is used to guide the small impurities discharged from the small impurity cleaning section (4).
6. The three-stage layered screening device according to claim 1, characterized in that, The screening device also includes a clean grain channel (8); the clean grain channel (8) is located on both sides of the end of the miscellaneous cleaning section (5) and is used to guide the clean grain discharged from the miscellaneous cleaning section (5).
7. A three-stage layered screening device according to claim 1, characterized in that, The screening device also includes a large impurity channel (6), which is used to guide the discharge of impurities from the screen layer (3).
8. A three-stage layered screening device according to claim 1, characterized in that, The initial cleaning screen layer (1) is an inclined screen structure, and its screen hole size is larger than that of the large impurity cleaning section (5) of the cleaning screen layer (3).
9. A three-stage layered screening device according to claim 1, characterized in that, The inspection sieve layer (7) is an inclined sieve structure, and its sieve hole size is adapted to the sieve hole size of the large impurity cleaning section (5) in the cleaning sieve layer (3).