An electron beam resist processing ultrasonic cleaning device

Abstract

The utility model relates to electron beam photoresist cleaning technical field discloses an electron beam photoresist processing ultrasonic cleaning device, including work table, the work table top respectively connected with setting has the cleaning tank and the air -dry groove, the cleaning tank surface is connected with setting and has a plurality of ultrasonic oscillator, the cleaning tank inside bottom end connection setting has the heating wire, the cleaning tank top is located the sliding setting of heating wire top has the separation filter plate, the separation filter plate top connection setting has two pull -out handle, the cleaning tank and air -dry groove inner wall both sides are connected with setting and have the support strip, the utility model discloses the cleaning tank and air -dry groove are set respectively at the work table top, realized the integrated operation of cleaning and air -dry, improved the processing efficiency, through the fan that air -dry groove below connection set, cooperate conical air diffuser and through -hole and blow the air evenly to the air -dry groove inside, can fast dry the electron beam photoresist after cleaning, avoided the secondary pollution that the manual wiping possibly brought.

Description

Technical Field

[0001] This utility model relates to the field of electron beam photoresist cleaning technology, specifically to an ultrasonic cleaning device for electron beam photoresist processing. Background Technology

[0002] Photoresist is one of the key materials for micro-patterning in microelectronics technology. In particular, the development of large-scale and very large-scale integrated circuits in recent years has greatly promoted the research, development and application of photoresist.

[0003] During the processing of photoresist, various impurities and contaminants often adhere to its surface. If these impurities and contaminants are not removed in time, they will seriously affect the performance of the photoresist and the quality of subsequent processing. Traditional cleaning methods are often difficult to completely remove these impurities and are prone to damaging the photoresist. Therefore, an ultrasonic cleaning device for electron beam photoresist processing is proposed. Utility Model Content

[0004] The purpose of this invention is to provide an ultrasonic cleaning device for electron beam photoresist processing to solve the problems mentioned in the background art.

[0005] To achieve the above objectives, this utility model provides the following technical solution: A workbench is included, with a cleaning tank and a drying tank connected to its top. Multiple ultrasonic oscillators are connected to the surface of the cleaning tank. A heating wire is connected to the bottom of the cleaning tank. A separator filter plate is slidably mounted above the heating wire at the top of the cleaning tank. Two lifting handles are connected to the top of the separator filter plate. Support bars are connected to the front and rear sides of the inner walls of the cleaning tank and drying tank. A flower basket is connected to the inside of the cleaning tank above the support bars. A drain pipe is connected to the bottom of the cleaning tank, with an electric butterfly valve connected to its surface. A waste storage box is connected to the bottom of the workbench below the cleaning tank, with one end of the drain pipe extending into the waste storage box. A valve is connected to one side of the waste storage box.

[0006] Preferably, a fan is connected to the inside of the workbench below the drying trough, a conical air diffuser is connected to the bottom of the drying trough, the air outlet of the fan extends into the interior of the conical air diffuser, and the air extraction end of the fan extends to the outside of the workbench. Multiple through holes are opened at the bottom of the drying trough, and the through holes are connected to the interior of the conical air diffuser.

[0007] Preferably, an exhaust pipe is connected to one side of the air drying trough, and the exhaust pipe extends to the outside of the workbench, and a pressure relief valve is connected inside the exhaust pipe.

[0008] Preferably, the top of the workbench is hinged with a sealing plate above the washing tank and the drying tank, and a handle is connected to the top of each of the two sealing plates. A first magnet is connected to one side of the bottom of the sealing plate, and a second magnet is connected to the top of the workbench corresponding to the first magnet. Two door panels are hinged to one side of the workbench.

[0009] Preferably, the flower basket includes a support beam placed at the top of two support bars, a plurality of U-shaped frames are connected between the bottom ends of the two support beams, two support columns are connected to both sides of the U-shaped frames, and limit blocks are connected to the top of the U-shaped frames on both sides of the two support columns. The support columns and limit blocks are set as a group of two, and multiple groups are set at the top of the U-shaped frames. A lifting rod is connected between the top ends of the two support beams.

[0010] Preferably, a control component is connected to one side of the workbench, and a heating component is connected to one side of the control component.

[0011] Preferably, the bottom of the workbench is provided with four support legs, which are arranged in a rectangular shape, and each of the four support legs is provided with an adjustable foot.

[0012] Compared with the prior art, the beneficial effects of this utility model are as follows: by setting a cleaning tank and a drying tank at the top of the workbench respectively, the integrated operation of cleaning and drying is realized, which improves the processing efficiency; by connecting the fan below the drying tank, and cooperating with the conical air diffuser and through holes to blow air evenly into the drying tank, the electron beam photoresist after cleaning can be dried quickly, avoiding secondary pollution that may be caused by manual wiping; the unique design of the flower basket allows the electron beam photoresist to be placed stably during the cleaning and drying process, and it is not easy to fall or be damaged. Attached Figure Description

[0013] Figure 1 A front view schematic diagram of an ultrasonic cleaning device for electron beam photoresist processing;

[0014] Figure 2 A top view schematic diagram of an ultrasonic cleaning device for electron beam photoresist processing;

[0015] Figure 3 A schematic cross-sectional view of an ultrasonic cleaning device for electron beam photoresist processing;

[0016] Figure 4 A schematic diagram of the exploded structure of the drying tank of an ultrasonic cleaning device for electron beam photoresist processing.

[0017] Figure 5 This is a schematic diagram of the basket structure of an ultrasonic cleaning device for electron beam photoresist processing.

[0018] In the diagram: 1. Workbench; 2. Washing tank; 3. Drying tank; 4. Ultrasonic oscillator; 5. Heating wire; 6. Separating filter plate; 7. Lifting handle; 8. Support bar; 9. Flower basket; 91. Support beam; 92. U-shaped frame; 93. Support column; 94. Limiting block; 95. Lifting rod; 10. Drain pipe; 11. Electric butterfly valve; 12. Waste storage box; 13. Valve; 14. Fan; 15. Conical diffuser; 16. Through hole; 17. Exhaust pipe; 18. Pressure relief valve; 19. Sealing plate; 20. Handle; 21. First magnet; 22. Second magnet; 23. Door panel; 24. Control assembly; 25. Heating assembly; 26. Support leg; 27. Adjustable feet. Detailed Implementation

[0019] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0020] Please see Figures 1-5 This utility model provides a technical solution, including a workbench 1. A cleaning tank 2 and a drying tank 3 are respectively connected to the top of the workbench 1. Multiple ultrasonic oscillators 4 are connected to the surface of the cleaning tank 2. A heating wire 5 is connected to the bottom of the inside of the cleaning tank 2. A separator filter plate 6 is slidably arranged above the heating wire 5 at the top of the cleaning tank 2. Two lifting handles 7 are connected to the top of the separator filter plate 6. Support bars 8 are connected to the front and rear sides of the inner walls of the cleaning tank 2 and the drying tank 3. A flower basket 9 is connected to the inside of the cleaning tank 2 above the support bars 8. A drain pipe 10 is connected to the bottom of the cleaning tank 2. An electric butterfly valve 11 is connected to the surface of the drain pipe 10. A waste storage box 12 is connected to the bottom of the inside of the workbench 1 below the cleaning tank 2, and one end of the drain pipe 10 extends into the waste storage box 12. A valve 13 is connected to one side of the waste storage box 12.

[0021] Inside the workbench 1, below the drying trough 3, a fan 14 is connected. At the bottom of the drying trough 3, a conical diffuser plate 15 is connected. The air outlet of the fan 14 extends into the interior of the conical diffuser plate 15, and the air extraction end of the fan 14 extends to the outside of the workbench 1. Multiple through holes 16 are opened at the bottom of the drying trough 3, and the through holes 16 are connected to the interior of the conical diffuser plate 15. The function is to draw in external air through the fan 14, and after being evenly dispersed by the conical diffuser plate 15, it is blown out through the through holes 16. This allows for comprehensive and uniform drying of the photoresist components placed in the drying trough 3, effectively improving drying efficiency, while avoiding damage to the components caused by excessive local wind force.

[0022] An exhaust pipe 17 is connected to one side of the air drying trough 3 and extends to the outside of the workbench 1. A pressure relief valve 18 is connected inside the exhaust pipe 17. Its function is to automatically open the pressure relief valve 18 when the air pressure inside the air drying trough 3 increases due to the continuous operation of the fan 14, and discharge excess gas to the outside of the workbench 1 through the exhaust pipe 17, thereby maintaining the stability of the air pressure inside the air drying trough 3.

[0023] The top of the workbench 1 is hinged with sealing plates 19 above the cleaning tank 2 and the drying tank 3. Each sealing plate 19 has a handle 20 connected to its top. A first magnet 21 is connected to one side of the bottom of the sealing plate 19. A second magnet 22 is connected to the top of the workbench 1 corresponding to the first magnet 21. Two door panels 23 are hinged to one side of the workbench 1. Their function is to prevent the cleaning liquid from splashing or external impurities from entering by closing the sealing plates 19 and using the adsorption effect of the first magnet 21 and the second magnet 22 during the cleaning or drying process. At the same time, the sealing plates 19 can be easily opened through the handles 20 for operation. The door panels 23 facilitate the inspection or maintenance of the internal components of the workbench 1.

[0024] The flower basket 9 includes a support beam 91 placed at the top of two support bars 8. Multiple U-shaped frames 92 are connected between the bottom ends of the two support beams 91. Two support columns 93 are connected to both sides of the U-shaped frames 92. Limiting blocks 94 are connected to both sides of the top of the U-shaped frames 92 on both sides of the two support columns 93. The support columns 93 and limiting blocks 94 are set as a group, and multiple groups are set at the top of the U-shaped frames 92. A lifting rod 95 is connected between the top ends of the two support beams 91. Its function is to place the photoresist component to be cleaned on the U-shaped frame 92. The support columns 93 can provide stable support for the component, and the limiting blocks 94 can prevent the component from shifting or falling off during the cleaning process, ensuring the cleaning effect. At the same time, the multiple U-shaped frames 92 and multiple groups of support columns 93 and limiting blocks 94 can place multiple components at one time, improving cleaning efficiency. The lifting rod 95 makes it easy to lift the flower basket 9 as a whole or put it into the cleaning tank 2.

[0025] A control component 24 is connected to one side of the workbench 1, and a heating component 25 is connected to the other side of the control component 24. The function of the control component 24 is to allow the operator to set and adjust various parameters of the device, such as controlling the start and stop of the ultrasonic oscillator 4, adjusting the temperature of the heating wire 5, and controlling the wind speed of the fan 14. The heating component 25 can heat the cleaning solution in the cleaning tank 2 according to actual needs to meet the cleaning requirements of different photoresist components and improve the cleaning effect.

[0026] The bottom of the workbench 1 is connected to four support legs 26, which are arranged in a rectangular shape. Each of the four support legs 26 is connected to an adjustable foot 27. The purpose of the four support legs 26 is to provide stable support for the workbench 1, ensuring that the device will not tip over due to vibration or external force during operation. At the same time, the rectangular arrangement enhances the stability and balance of the support. The adjustable feet 27 allow the height of the workbench 1 to be adjusted according to the actual use environment, so that the device can adapt to different operating platforms or ground heights. When the ground is uneven, the adjustable feet 27 can also be adjusted to keep the workbench 1 level, ensuring the normal operation of the device.

[0027] Working Principle: Before use, adjust the adjustable feet 27 to ensure the worktable 1 is level and at a suitable height, guaranteeing stable placement of the device. Next, set various parameters using the control component 24, such as setting the heating temperature of the heating wire 5 according to the cleaning requirements of the photoresist components, and adjusting the power of the ultrasonic oscillator 4. Open the sealing plate 19 and place the photoresist components to be cleaned on the U-shaped frame 92 of the basket 9. Use the support column 93 and the limiting block 94 to stably support and fix the components, preventing displacement or detachment during cleaning. Then, place the basket 9 into the cleaning tank 2, close the sealing plate 19, and use the attraction between the first magnet 21 and the second magnet 22 to achieve a seal, preventing cleaning fluid splashing. Turn on the heating wire 5 to heat the cleaning fluid, and simultaneously start the ultrasonic oscillator 4, using the cavitation effect of ultrasound to clean the photoresist components. After cleaning, open the electric butterfly valve 11 to allow the waste liquid in the cleaning tank 2 to flow into the waste storage tank 12 through the drain pipe 10. When the waste storage tank 12 needs to be cleaned, open the valve 13 to discharge the waste liquid. Then, lift the basket 9 out of the cleaning tank 2 and place it into the drying tank 3. Close the sealing plate 19 and start the fan 14. The fan 14 draws in external air and evenly disperses it through the conical diffuser 15 before blowing it out through the through hole 16, thus thoroughly and evenly drying the photoresist components. When the air pressure inside the drying tank 3 increases due to the continuous operation of the fan 14, the pressure relief valve 18 automatically opens, and the excess gas is discharged to the outside of the workbench 1 through the exhaust pipe 17, maintaining a stable air pressure inside the drying tank 3. After drying, open the sealing plate 19 and lift the basket 9 using the lifting rod 95 to remove the cleaned and dried photoresist components. If it is necessary to inspect or maintain the internal components of the workbench 1, the hinged door panel 23 on one side of the workbench 1 can be opened for operation.

[0028] It should be noted that, in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus.

[0029] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. An ultrasonic cleaning apparatus for electron beam photoresist processing, comprising a worktable (1), characterized in that: The top of the workbench (1) is respectively connected to a cleaning tank (2) and a drying tank (3). Multiple ultrasonic oscillators (4) are connected to the surface of the cleaning tank (2). A heating wire (5) is connected to the bottom of the cleaning tank (2). A separator filter plate (6) is slidably installed above the heating wire (5) at the top of the cleaning tank (2). Two lifting handles (7) are connected to the top of the separator filter plate (6). The front and rear sides of the inner walls of the cleaning tank (2) and the drying tank (3) are both connected to... Support bar (8), a flower basket (9) is connected and installed inside the cleaning tank (2) above the support bar (8), a drain pipe (10) is connected and installed at the bottom of the cleaning tank (2), an electric butterfly valve (11) is connected and installed on the surface of the drain pipe (10), a waste storage box (12) is connected and installed at the bottom of the workbench (1) below the cleaning tank (2), and one end of the drain pipe (10) extends into the waste storage box (12), and a valve (13) is connected and installed on one side of the waste storage box (12).

2. The ultrasonic cleaning apparatus for electron beam photoresist processing according to claim 1, characterized in that: Inside the workbench (1), a fan (14) is connected below the drying trough (3). A conical air diffuser (15) is connected to the bottom of the drying trough (3). The air outlet of the fan (14) extends into the conical air diffuser (15), and the air extraction end of the fan (14) extends to the outside of the workbench (1). Multiple through holes (16) are opened at the bottom of the drying trough (3), and the through holes (16) are connected to the inside of the conical air diffuser (15).

3. The ultrasonic cleaning apparatus for electron beam photoresist processing according to claim 1, characterized in that: An exhaust pipe (17) is connected to one side of the air drying trough (3), and the exhaust pipe (17) extends to the outside of the workbench (1). A pressure relief valve (18) is connected inside the exhaust pipe (17).

4. The ultrasonic cleaning apparatus for electron beam photoresist processing according to claim 1, characterized in that: The top of the workbench (1) is hinged to a sealing plate (19) above the washing tank (2) and the drying tank (3). The top of the two sealing plates (19) is connected to a handle (20). A first magnet (21) is connected to one side of the bottom of the sealing plate (19). A second magnet (22) is connected to the top of the workbench (1) corresponding to the first magnet (21). Two door panels (23) are hinged to one side of the workbench (1).

5. The ultrasonic cleaning apparatus for electron beam photoresist processing according to claim 1, characterized in that: The flower basket (9) includes a support beam (91) placed at the top of two support bars (8), and multiple U-shaped frames (92) are connected between the bottom ends of the two support beams (91). Two support columns (93) are connected to both sides of the U-shaped frame (92). Limiting blocks (94) are connected to both sides of the top of the U-shaped frame (92) on both sides of the two support columns (93). The support columns (93) and the limiting blocks (94) are set as a group, and multiple groups are set at the top of the U-shaped frame (92). A lifting rod (95) is connected between the top ends of the two support beams (91).

6. The ultrasonic cleaning apparatus for electron beam photoresist processing according to claim 1, characterized in that: A control component (24) is connected to one side of the workbench (1), and a heating component (25) is connected to one side of the control component (24).

7. The ultrasonic cleaning apparatus for electron beam photoresist processing according to claim 1, characterized in that: The workbench (1) is provided with four support legs (26) at the bottom, and the four support legs (26) are arranged in a rectangular shape. Each of the four support legs (26) is provided with an adjustable foot (27) at the bottom.

Images