A plasma cleaning apparatus

Abstract

The utility model relates to a kind of plasma cleaning equipment, belong to plasma cleaning equipment technical field;The plasma cleaning equipment includes: gas source, the gas source is used to provide multiple plasma cleaning gas;Gas mixing tank, the import of gas mixing tank is communicated with gas source, the gas mixing tank is used to mix multiple plasma cleaning gas uniformly;Plasma cleaning tank, the plasma cleaning tank is communicated with the outlet of gas mixing tank;Wherein, gas mixing passage is formed in the gas mixing tank, mixing assembly is arranged in the gas mixing passage, and the mixing assembly includes the spiral extension of the flow direction flow guide curved surface.The plasma cleaning equipment is mixed by the mixing assembly arranged in gas mixing tank, and the kinetic energy generated by mixed gas is forcedly applied to gas, can generate very strong turbulence and shear force, for flow fluctuation big, proportion change big or two kinds of gas density and viscosity difference very big gas, the spiral blade rotating in gas mixing tank can be adapted by adjusting speed, ensure that mixed effect is stable.

Description

Technical Field

[0001] This utility model relates to a plasma cleaning device and belongs to the technical field of plasma cleaning equipment. Background Technology

[0002] Roll-to-roll evaporation equipment is a vacuum device that continuously and extensively deposits functional materials on a flexible substrate (such as a polymer film) to form a functional thin film. When the functional material is metallic copper, this device is a roll-to-roll copper evaporation equipment. Its working process is to unwrap the substrate material from the unwinding shaft like a roll of paper, pass it through the deposition area to complete the coating, and finally rewind it by the take-up shaft.

[0003] Roll-to-roll evaporation equipment requires the use of plasma cleaning equipment during operation. If the substrate is directly fed into the evaporation process before vacuum evaporation of flexible substrates, surface defects on the substrate often result in poor quality functional films. Using plasma cleaning equipment can solve this problem.

[0004] For example, during the production, transportation and storage of flexible substrates, organic pollutants, grease, dust and trace amounts of moisture will be adsorbed on the surface. These pollutants will become the isolation layer between the vapor deposition material (functional material) and the substrate, resulting in poor adhesion of the vapor deposition material to the substrate, and easy peeling and detachment. Plasma cleaning equipment can bombard and decompose these pollutants with high-energy particles and active free radicals in plasma, and vaporize and remove them, thereby obtaining an atomically clean surface.

[0005] Meanwhile, in roll-to-roll evaporation equipment, many polymer substrates have low surface energy and weak chemical activity. The evaporated metal or oxide atoms (functional materials) are difficult to form strong chemical bonds with the substrate, resulting in weak physical adsorption. The film tends to aggregate and form island-like structures rather than continuous and dense films. However, by using plasma cleaning equipment, especially when using gases such as oxygen or air, active functional groups such as hydroxyl, carboxyl, and carbonyl groups can be introduced into the substrate surface, greatly increasing the surface energy of the substrate and making it a hydrophilic active surface. In this way, the atoms of the evaporated material can more easily form strong chemical bonds with the substrate, significantly improving the adhesion.

[0006] However, the related technology provides a plasma cleaning device that supplies gas directly by connecting to a single gas exchange cylinder and a gas supply pipe, with a gas valve on the gas supply pipe; if multiple gases need to be introduced, multiple gas supply cylinders with different gas sources are added next to the plasma cleaning device, and the multiple gas sources output by the gas supply cylinders are combined and mixed through a three-way valve.

[0007] This plasma cleaning device has a simple structural design and can achieve basic gas mixing operations, but it also has obvious problems and defects. For example, by only using pipe fittings such as three-way pipes to combine two or more gases, the gases are not mixed sufficiently before entering the internal chamber of the ion cleaning device, which leads to uneven gas concentration distribution in different areas of the chamber and ultimately causes uneven plasma cleaning. Utility Model Content

[0008] To solve the above-mentioned technical problems, this utility model provides a plasma cleaning device, which solves the problem of uneven gas concentration distribution when mixing gas in the plasma cleaning device for roll-to-roll evaporation equipment in the above-mentioned background art.

[0009] The technical solution adopted by this utility model to solve its technical problem is:

[0010] A plasma cleaning device, comprising:

[0011] A gas source, which provides multiple plasma cleaning gases;

[0012] A gas mixing chamber, the inlet of which is connected to a gas source, is used to mix multiple plasma cleaning gases evenly.

[0013] A plasma cleaning chamber, wherein the plasma cleaning chamber is connected to the outlet of the gas mixing chamber;

[0014] The gas mixing chamber contains a gas mixing channel, and a mixing component is provided in the gas mixing channel. The mixing component includes a guide surface that extends spirally along the airflow direction.

[0015] Preferably, inside the gas mixing chamber, a first booster pipe, a gas mixing pipe, and a second booster pipe are sequentially formed from the air inlet position. The first booster pipe, the gas mixing pipe, and the second booster pipe are connected in sequence. A front plate is provided at the position where the first booster pipe connects to the gas mixing pipe, and a rear plate is installed at the position where the gas mixing pipe connects to the second booster pipe. A mixing component is provided between the rear plate and the front plate.

[0016] Preferably, the diameters of the first booster pipe, the gas mixing pipe, and the second booster pipe decrease sequentially.

[0017] Preferably, the mixing component includes a rotating shaft, with its front and rear ends respectively rotatably mounted at the center of the rear disk shaft and the center of the front disk shaft, and helical blades and a turbine arranged on the rotating shaft.

[0018] Preferably, it also includes a gas supply mechanism that provides a gas source, the gas supply mechanism being connected to a gas mixing box, one end of the gas mixing box being connected to a plasma cleaning box via a gas pipe, and an outlet gas flow meter being installed on the gas pipe.

[0019] Preferably, the gas supply mechanism is divided into an inert gas component and an oxygen gas component, and the inert gas component and the oxygen gas component have the same structure.

[0020] Preferably, the inert gas assembly includes an argon cylinder, an air filter, and an inlet gas flow meter. The outlet of the argon cylinder is connected to the inside of the air filter through an inlet pipe. The air filter is connected to the inlet gas flow meter through an outlet pipe. One end of the inlet gas flow meter is connected to the gas mixing chamber.

[0021] Preferably, the air inlet pipe is equipped with an air valve and a pressure gauge, and the connection point between the air inlet pipe and the argon cylinder is sealed and fixed by a sealing plate.

[0022] Preferably, the air filter has an upper and lower temporary air chamber and a water collection chamber, respectively, and a filter element is filled between the water collection chamber and the temporary air chamber.

[0023] Preferably, an air outlet pipe and a backflush pipe are connected to the upper end of the temporary air chamber, the air inlet pipe is located inside the air filter and the air outlet at the end of the filter element is located inside the water collection chamber, and one end of the water collection chamber is connected to a drain pipe.

[0024] Compared with the prior art, the beneficial effects of this utility model are as follows:

[0025] Compared with current plasma cleaning devices, the plasma cleaning equipment of this invention has the following advantages:

[0026] It is equipped with a gas mixing box, in which a first booster pipe, a gas mixing pipe and a second booster pipe are formed sequentially from the air inlet position; a front plate is provided at the position where the first booster pipe and the gas mixing pipe are connected, and a rear plate is installed at the position where the gas mixing pipe and the second booster pipe are connected; a mixing component is provided between the rear plate and the front plate.

[0027] The mixing component includes a rotating shaft, with its front and rear ends respectively rotatably mounted at the center of the rear disk shaft and the center of the front disk shaft. Helical blades and a turbine are arranged on the rotating shaft.

[0028] When the gas to be mixed (at this time the gas is not completely mixed) with increased flow rate enters the gas mixing pipe from the first pressurization pipe, the kinetic energy generated by the flowing gas will drive the turbine to rotate. When the turbine rotates, it will drive the spiral blades installed on the turbine to rotate. The rotating spiral blades actively shear, stir and circulate various gases, and directly transfer mechanical energy to the fluid, which can improve the mixing effect of various gases.

[0029] Compared to the gas mixing method using a three-way pipe, it forcibly applies energy to the gas through the kinetic energy generated by the mixed gas, producing extremely strong turbulence and shear force. This allows the rotating helical blades to adapt to gases with large flow fluctuations, large ratio changes, or large differences in the density / viscosity of the two gases by adjusting the rotation speed, ensuring stable mixing effect. Especially in a short time, it can achieve a uniformity that is difficult for static helical blades to achieve.

[0030] Moreover, it does not require the installation of other power supply equipment such as motors and transmission boxes. It only uses the kinetic energy generated by the gas flow. Furthermore, the rotational speed of the spiral blades can be automatically controlled and adjusted by the gas flow rate, which reduces the energy consumption of the entire mixing component. Attached Figure Description

[0031] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on the structures shown in these drawings without creative effort.

[0032] Figure 1 This is a schematic diagram of the structure of a plasma cleaning device according to the present invention.

[0033] Figure 2 This is an exploded view of a plasma cleaning device according to the present invention.

[0034] Figure 3 This is a schematic diagram of the gas supply mechanism of a plasma cleaning device according to the present invention.

[0035] Figure 4 This is a schematic diagram of the internal structure of an air filter in a plasma cleaning device according to this utility model.

[0036] Figure 5 This is a schematic diagram of the structure of the gas mixing box in a plasma cleaning device according to this utility model. Figure 1 .

[0037] Figure 6This is a schematic diagram of the structure of the gas mixing box in a plasma cleaning device according to this utility model. Figure 2 .

[0038] In the diagram: 1-Plasma cleaning box, 2-Outlet gas flow meter, 3-Gas pipe, 4-Gas mixing box, 5-Inlet gas flow meter, 6-Air filter, 7-Argon cylinder, 8-Oxygen cylinder, 9-Outlet pipe, 10-Inlet pipe, 11-Gas valve, 12-Barometer, 13-Sealing plate, 14-Backflush pipe, 15-Temporary gas chamber, 16-Filter element, 17-Water collection chamber, 18-Drain pipe, 19-First booster pipe, 20-Front plate, 21-Gas mixing pipe, 22-Shaft, 23-Turbine, 24-Helical blade, 25-Rear plate, 26-Second booster pipe. Detailed Implementation

[0039] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0040] Please see Figure 1 and Figure 5 This utility model provides a technical solution:

[0041] A plasma cleaning device, comprising:

[0042] Gas mixing box 4 is used to mix the various gases required for plasma cleaning box 1 for plasma gas cleaning.

[0043] Inside the gas mixing chamber 4, a first booster pipe 19, a gas mixing pipe 21, and a second booster pipe 26 are formed sequentially from the air inlet. The first booster pipe 19, the gas mixing pipe 21, and the second booster pipe 26 are connected in sequence, and the diameters of the first booster pipe 19, the gas mixing pipe 21, and the second booster pipe 26 decrease in sequence. A front plate 20 is provided at the connection between the first booster pipe 19 and the gas mixing pipe 21, and a rear plate 25 is installed at the connection between the gas mixing pipe 21 and the second booster pipe 26. A mixing component is provided between the rear plate 25 and the front plate 20.

[0044] When the various gases are transported into the gas mixing box 4, they first enter the first pressurization pipe 19. The first pressurization pipe 19 is shaped like a trumpet opening. Therefore, after the various gases enter the first pressurization pipe 19, they flow from the position with a larger diameter to the position with a smaller diameter, and the flow velocity will increase, thus increasing the kinetic energy.

[0045] After the kinetic energy is increased, the various gases enter the gas mixing tube 21 and drive the mixing component set inside the gas mixing tube 21 to operate. Through the operation of the mixing component, the various gases can be mixed and discharged from the second booster tube 26.

[0046] Since the structure of the second booster tube 26 is the same as that of the first booster tube 19, when the mixed gases are discharged from the position of the second booster tube 26, the flow rate of the mixed gases will increase and the flow will be accelerated.

[0047] Please see Figure 5 In one embodiment of the present invention, the mixing component includes a rotating shaft 22, with the front and rear ends of the rotating shaft 22 respectively rotatably mounted at the axial position of the rear disk 25 and the axial position of the front disk 20, and spiral blades 24 arranged on the rotating shaft 22.

[0048] In an embodiment of this utility model, when the mixed gas with increased turbulence force enters the gas mixing pipe 21 from the first pressurization pipe 19, the flowing gas will rotate along the stationary spiral blade 24. The spiral blade 24 stirs and circulates various gases to achieve the mixing of various gases.

[0049] Please see Figure 6 In one embodiment of the present invention, the mixing component includes a rotating shaft 22, with the front and rear ends of the rotating shaft 22 respectively rotatably mounted at the axial position of the rear disk 25 and the axial position of the front disk 20. The rotating shaft 22 is provided with spiral blades 24 and turbines 23.

[0050] In an embodiment of this utility model, when the mixed gas with increased kinetic energy enters the gas mixing pipe 21 from the first pressurization pipe 19, the kinetic energy generated by the flowing gas will drive the turbine 23 to rotate. When the turbine 23 rotates, it will drive the spiral blades 24 installed on the turbine 23 to rotate. The rotating spiral blades 24 actively shear, stir and circulate various gases, and directly transfer mechanical energy to the fluid, which can improve the mixing effect of various gases.

[0051] Compared with the current method of arranging stationary spiral blades 24 inside the mixing tube, it relies on the kinetic energy generated by the mixed gas to forcibly apply energy to the gas, generating extremely strong turbulence and shear force. In this way, for gases with large flow fluctuations, large ratio changes, or large differences in density / viscosity between the two gases, the rotating spiral blades 24 can adapt by adjusting the speed to ensure stable mixing effect. Especially in a short time, it can achieve a uniformity that is difficult for static spiral blades 24 to achieve.

[0052] In addition, it does not require the installation of other power supply equipment such as motors combined with transmission boxes, but only uses the kinetic energy generated by the gas flow. Moreover, the rotation speed of the spiral blades 24 can be automatically controlled and adjusted by the amount of gas supply, which reduces the energy consumption of the entire mixing component.

[0053] Please see Figure 1-3 In one embodiment of this utility model, the plasma cleaning device further includes:

[0054] The plasma cleaning chamber 1 and the gas supply mechanism are divided into an inert gas component and an oxygen gas component. The inert gas component and the oxygen gas component have the same structure, only the gas source is different. Both the inert gas component and the oxygen gas component are connected to the gas mixing chamber 4. One end of the gas mixing chamber 4 is connected to the plasma cleaning chamber 1 through the gas pipe 3. The gas pipe 3 is equipped with an outlet gas flow meter 2.

[0055] By combining the inert gas component and the oxygen gas component, inert gas and oxygen can be simultaneously delivered into the gas mixing box 4. After the inert gas and oxygen are mixed in the gas mixing box 4, they are delivered to the plasma cleaning box 1 through the gas pipe 3. The flow rate of the mixed gas can be controlled by the gas flow meter 2.

[0056] Please see Figure 3 In one embodiment of the present invention, the inert gas assembly includes an argon cylinder 7, an air filter 6, and an inlet gas flow meter 5. The outlet of the argon cylinder 7 is connected to the inside of the air filter 6 through an inlet pipe 10. The air filter 6 is connected to the inlet gas flow meter 5 through an outlet pipe 9. One end of the inlet gas flow meter 5 is connected to the gas mixing box 4.

[0057] Argon cylinder 7 is used to transport inert gas sources such as argon. The discharged argon is transported to the air filter 6 through the air inlet pipe 10. The air filter 6 filters and purifies the transported argon, removing impurities and water vapor. Finally, the purified argon is controlled by the air inlet gas flow meter 5 to transport a fixed amount of gas into the gas mixing box 4 for mixing with other gases.

[0058] Specifically, an air valve 11 and a pressure gauge 12 are installed on the air inlet pipe 10, and the connection between the air inlet pipe 10 and the argon cylinder 7 is sealed and fixed by a sealing plate 13.

[0059] The barometer 12 is used to monitor the pressure of the inert gas in real time, while the installed valve 11 is used to control the output and shut-off of the gas source.

[0060] The structure of the oxygen gas assembly is the same as that of the inert gas assembly, except that the argon gas cylinder 7 is replaced with an oxygen cylinder 8.

[0061] Please see Figure 4 In one embodiment of the present invention, an air filter 6 has an upper and lower temporary air chamber 15 and a water collection chamber 17 respectively. A filter element 16 is filled between the water collection chamber 17 and the temporary air chamber 15. The filter element 16 is made of glass fiber combined with PTFE membrane. Glass fiber is mainly used for dust removal, while PTFE membrane, due to its hydrophobic properties, is mainly used to filter dust and remove water vapor.

[0062] In addition, an air outlet pipe 9 and a backflush pipe 14 are connected to the upper end of the temporary air chamber 15 respectively. The air inlet pipe 10 is located inside the air filter 6 and the air outlet at the end of the filter element 16 is located inside the water collection chamber 17. One end of the water collection chamber 17 is connected to the drain pipe 18.

[0063] In an embodiment of this utility model, after the air source enters the air filter 6 through the air inlet pipe 10, it is released directly from the water collection chamber 17, then diffuses and rises, and after being filtered and purified by the filter element 16, it becomes clean air and is discharged from the air outlet pipe 9.

[0064] Later, gas can be supplied to the air filter 6 through the backflush pipe 14 to pressurize it and generate backflush, which is used to discharge the impurities and water vapor trapped inside the filter element 16 and finally discharge it from the drain pipe 18.

[0065] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A plasma cleaning device, characterized in that: include: A gas source, which provides multiple plasma cleaning gases; Gas mixing box (4), the inlet of the gas mixing box (4) is connected to the gas source, the gas mixing box (4) is used to mix multiple plasma cleaning gases evenly; A plasma cleaning chamber, which is connected to the outlet of the gas mixing chamber (4); The gas mixing box (4) has a gas mixing channel, and a mixing component is provided in the gas mixing channel. The mixing component includes a guide surface that extends spirally along the airflow direction.

2. The plasma cleaning equipment according to claim 1, characterized in that... Inside the gas mixing chamber (4), a first booster pipe (19), a gas mixing pipe (21), and a second booster pipe (26) are formed sequentially from the air inlet. The first booster pipe (19), the gas mixing pipe (21), and the second booster pipe (26) are connected in sequence. A front plate (20) is provided at the position where the first booster pipe (19) and the gas mixing pipe (21) are connected. A rear plate (25) is installed at the position where the gas mixing pipe (21) and the second booster pipe (26) are connected. A mixing component is provided between the rear plate (25) and the front plate (20).

3. The plasma cleaning equipment according to claim 2, characterized in that: The diameters of the first booster pipe (19), the gas mixing pipe (21), and the second booster pipe (26) decrease sequentially.

4. The plasma cleaning equipment according to claim 2, characterized in that: The mixing assembly includes a rotating shaft (22), which is rotatably mounted at the front and rear ends of the rear disk (25) and the front disk (20) respectively. The rotating shaft (22) is provided with helical blades (24) and turbines (23).

5. The plasma cleaning equipment according to claim 1, characterized in that: It also includes a gas supply mechanism that provides a gas source, which is connected to one end of the gas mixing box (4), and the other end of the gas mixing box (4) is connected to the plasma cleaning box (1) through a gas pipe (3).

6. The plasma cleaning equipment according to claim 5, characterized in that: The gas pipe (3) is equipped with an outlet gas flow meter (2), and the gas supply mechanism is divided into an inert gas component and an oxygen gas component. The inert gas component and the oxygen gas component have the same structure.

7. The plasma cleaning equipment according to claim 6, characterized in that: The inert gas assembly includes an argon cylinder (7), an air filter (6), and an inlet gas flow meter (5); the outlet of the argon cylinder (7) is connected to the inside of the air filter (6) through an inlet pipe (10), the air filter (6) is connected to one end of the inlet gas flow meter (5) through an outlet pipe (9), and the other end of the inlet gas flow meter (5) is connected to the gas mixing box (4).

8. The plasma cleaning equipment according to claim 7, characterized in that: The air inlet pipe (10) is equipped with an air valve (11) and a pressure gauge (12). The air inlet pipe (10) is sealed and fixed at the connection point with the argon cylinder (7) by a sealing plate (13).

9. The plasma cleaning equipment according to claim 7, characterized in that: The air filter (6) has an upper and lower temporary air chamber (15) and a water collection chamber (17) respectively, and the water collection chamber (17) and the temporary air chamber (15) are filled with a filter element (16).

10. The plasma cleaning equipment according to claim 9, characterized in that: An air outlet pipe (9) and a backflush pipe (14) are connected to the upper end of the temporary air chamber (15); the air inlet pipe (10) is located inside the air filter (6) and passes through the end of the filter element (16); the air outlet of the air inlet pipe (10) is located inside the water collection chamber (17); one end of the water collection chamber (17) is connected to the drain pipe (18).

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