An ultraviolet light cleaning apparatus for a mask

Abstract

The embodiment of the present application provides a kind of UV cleaning equipment for mask, it is characterized in that, the UV cleaning equipment includes body, support device, cleaning device, temperature measuring device and control device;Form cleaning space in body;Support device includes base and clamping piece, multiple clamping pieces are evenly connected to base and form clamping space;Cleaning device includes first ultraviolet component and second ultraviolet component, first ultraviolet component includes first ultraviolet lamp, second ultraviolet component includes second ultraviolet lamp, first ultraviolet lamp and second ultraviolet lamp are located at the two sides of clamping space;Temperature measuring device includes temperature measuring probe, temperature measuring probe is located at one side of clamping space;Control device is electrically connected to first ultraviolet lamp, second ultraviolet lamp and temperature measuring device.In the present application, the double sides of mask are cleaned by setting first ultraviolet component and second ultraviolet component, temperature is monitored by temperature measuring device, and the temperature of mask is regulated, to improve cleaning effect and cleaning efficiency.

Description

Technical Field

[0001] This application relates to the field of semiconductor equipment technology, and in particular to an ultraviolet light cleaning apparatus for photomasks. Background Technology

[0002] Photomasks, or photomask glass substrates, play a crucial role in the semiconductor industry. As the requirements for photomask material properties and processing precision become increasingly stringent, the manufacturing process demands also become more demanding, particularly the cleaning step during photomask processing. If the surface of a quartz photomask is covered with a large number of contaminants such as particles, metals, organic matter, moisture molecules, and oxide films, defects are easily observed in the circuitry passing through the magnification lens, leading to wafer lithography defects and significantly reducing lithography yield.

[0003] If only water or cleaning agents are used to clean the photomask, it is difficult to completely remove organic matter and particulate matter from the surface of the photomask, which will still lead to a decrease in photolithography yield after the photomask is used. Utility Model Content

[0004] To address the aforementioned issues, this application provides an ultraviolet (UV) cleaning device for photomasks. This UV cleaning device utilizes UV light to further clean the photomasks, thoroughly removing organic matter and particulate matter from the surface of the photomasks.

[0005] To achieve the above objectives, the technical solution adopted in this application is as follows:

[0006] This application provides an ultraviolet light cleaning device for photomasks, characterized in that the ultraviolet light cleaning device includes a body, a support device, a cleaning device, a temperature measuring device, and a control device.

[0007] The machine body includes a support platform and side walls, forming a cleaning space for cleaning the mask sheet; the support device includes a base and multiple clamping components, which are evenly connected to the base and are set at approximately the same height, forming a clamping space for fixing the mask sheet; the cleaning device includes a first ultraviolet component and a second ultraviolet component, the first ultraviolet component including a first ultraviolet lamp and the second ultraviolet component including a second ultraviolet lamp, the first ultraviolet lamp being located on one side of the clamping space and the second ultraviolet lamp being located on the other side of the clamping space; the temperature measuring device includes a temperature measuring probe, which is located on one side of the clamping space and is set at approximately the same height as the clamping space; the control device is electrically connected to the first ultraviolet lamp, the second ultraviolet lamp, and the temperature measuring device.

[0008] Furthermore, the direction perpendicular to the support platform is defined as the preset direction. The first ultraviolet component also includes a first driver for driving the first ultraviolet lamp to move along the preset direction. The first ultraviolet component is connected to the first driver. The second ultraviolet component also includes a second driver for driving the second ultraviolet lamp to move along the preset direction. The second ultraviolet component is connected to the second driver. Both the first driver and the second driver are electrically connected to the control device.

[0009] Furthermore, the first ultraviolet component also includes a first limiting member that is at least partially sleeved on the outside of the first driver; the second ultraviolet component also includes a second limiting member that is at least partially sleeved on the outside of the second driver.

[0010] Furthermore, the first actuator is one of a cylinder actuator, a hydraulic actuator, or an electric actuator.

[0011] The second actuator is one of a cylinder actuator, a hydraulic actuator, or an electric actuator.

[0012] Furthermore, the first drive extends through the carrier platform, with at least a portion of the first drive located outside the cleaning space;

[0013] The second drive extends through the carrier platform and at least a portion of the second drive is located outside the cleaning space.

[0014] Furthermore, the ultraviolet cleaning equipment also includes a ventilation device, which includes a ventilation duct and an exhaust fan. The exhaust fan is connected to the ventilation duct and electrically connected to a control device. The ventilation duct is connected to the outside of the cleaning space.

[0015] Furthermore, the ventilation device also includes valves, which are connected between the ventilation duct and the exhaust fan.

[0016] Furthermore, the temperature measuring device also includes a support member connected to the support platform, and the temperature probe is connected to the end of the support member.

[0017] Furthermore, the distance between the temperature probe and the clamping space ranges from 7mm to 13mm.

[0018] Furthermore, the machine body also includes a top cover, and the cleaning space is a sealed space.

[0019] In this application, a first ultraviolet (UV) component and a second UV component are used to clean both sides of the mask, which improves both the cleaning effect and efficiency. Furthermore, a temperature measuring device monitors the temperature of the mask during the cleaning process and dynamically regulates the surface temperature to prevent changes in the microstructure of the mask surface due to excessive temperature, thereby enhancing the cleaning effect. Attached Figure Description

[0020] Figure 1This is a schematic diagram of the structure of the ultraviolet cleaning equipment in the embodiments of this application;

[0021] Figure 2 This is a schematic diagram of the structure of the ultraviolet cleaning equipment after removing the sidewalls and top cover in an embodiment of this application;

[0022] Figure 3 This is a schematic diagram of a first electrical connection structure between the control device and other components in an embodiment of this application;

[0023] Figure 4 This is a schematic diagram of another structure of the ultraviolet cleaning equipment after removing the sidewalls and top cover in the embodiments of this application;

[0024] Figure 5 This is a schematic diagram of a second electrical connection structure between the control device and other components in an embodiment of this application;

[0025] Figure 6 This is a simplified schematic diagram of the structure between the ventilation device and the machine body in the embodiments of this application.

[0026] In the diagram: UV cleaning equipment 100, body 11, support platform 111, side wall 112, top cover 113, support device 12, base 121, clamping component 122, cleaning device 13, first UV component 131, first UV lamp 1311, first driver 1312, first limiting component 1313, second UV component 132, second UV lamp 1321, second driver 1322, second limiting component 1323, temperature measuring device 14, temperature probe 141, support component 142, control device 15, ventilation device 16, ventilation duct 161, exhaust fan 162, valve 163. Detailed Implementation

[0027] To enable those skilled in the art to better understand the present application, the technical solutions in specific embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings.

[0028] This application provides an ultraviolet (UV) cleaning device 100 for photomasks. The UV cleaning device 100 uses UV light to clean the surface of the photomask, removing organic matter and particulate matter that remain on the surface of the photomask after chemical cleaning.

[0029] like Figure 1 and Figure 2 As shown, the ultraviolet cleaning equipment 100 includes a body 11, a support device 12, a cleaning device 13, a temperature measuring device 14, and a control device 15. Figure 1(Not shown in the image). The main body 11 forms the basic framework of the ultraviolet cleaning equipment 100, and other components are directly or indirectly connected to the main body 11. The support device 12 is used to fix and point the mask to be cleaned. The cleaning device 13 is used to clean the surface of the mask using ultraviolet light. The temperature measuring device 14 is used to monitor the temperature of the mask surface during the ultraviolet cleaning process to avoid damage to the mask surface due to excessive temperature. The control device 15 can control the entire cleaning process. At the same time, the control device 15 can also receive the temperature obtained by the temperature measuring device 14 and adjust the temperature of the mask surface through the cleaning device 13, etc., so that the temperature of the mask surface meets the requirements during the cleaning process.

[0030] The main body 11 includes a support platform 111 and side walls 112. The support platform 111 is mainly used to support other components in the ultraviolet cleaning equipment 100. The support platform 111 and side walls 112 cooperate with each other to form a cleaning space within the main body 11. The cleaning process in the ultraviolet cleaning equipment 100 is basically completed within this cleaning space, and most of the other components in the ultraviolet cleaning equipment 100, except for the main body 11, are also located within this cleaning space.

[0031] The support device 12 includes a base 121 and multiple clamping members 122. The multiple clamping members 122 are connected to the base 121 in a substantially uniform manner and are arranged at approximately the same height. The clamping members 122 form a clamping space, in which the mask sheet is fixed during the cleaning process. In addition, the middle area of ​​the base 121 is hollowed out. After the mask sheet is fixed to the clamping space, both sides of the mask sheet are completely exposed, which facilitates simultaneous cleaning of both surfaces of the mask sheet.

[0032] The cleaning device 13 includes a first ultraviolet (UV) component 131 and a second UV component 132. The first UV component 131 includes a first UV lamp 1311, and the second UV component 132 includes a second UV lamp 1321. The first UV lamp 1311 and the second UV lamp 1321 are respectively located on one side of the clamping space. During the cleaning process, the mask is fixed to the clamping space, and the first UV lamp 1311 and the second UV lamp 1321 are responsible for cleaning one surface of the mask, simultaneously cleaning both surfaces of the mask.

[0033] The temperature measuring device 14 includes a temperature measuring probe 141, which is located on one side of the clamping space and is set at approximately the same height as the clamping space. Because the temperature measuring probe 141 is positioned close to the clamping space, it is close to the mask during the cleaning process, enabling real-time detection of the temperature on the surface of the mask. This allows for real-time temperature monitoring and corresponding processing.

[0034] like Figure 3As shown, the control device 15 is electrically connected to the first ultraviolet lamp 1311, the second ultraviolet lamp 1321, and the temperature probe 141 in the temperature measuring device 14. During the cleaning process, the control device 15 controls the operation of the first ultraviolet lamp 1311 and the second ultraviolet lamp 1321 to clean the surface of the mask. Furthermore, the control device 15 can also acquire the temperature of the mask area in real time and adjust the first ultraviolet lamp 1311 and the second ultraviolet lamp 1321 according to the temperature of the mask area. For example, when the temperature of the mask area is too high, the temperature can be reduced by appropriately decreasing the power of the first ultraviolet lamp 1311 and / or the second ultraviolet lamp 1321; when the temperature of the mask area is too low, the power of the first ultraviolet lamp 1311 and / or the second ultraviolet lamp 1321 can be appropriately increased while ensuring a suitable temperature to improve cleaning efficiency and cleaning effect.

[0035] By incorporating a first ultraviolet component 131 and a second ultraviolet component 132 into the ultraviolet cleaning equipment 100 to clean both sides of the mask, both the cleaning effect and efficiency are improved. Furthermore, a temperature measuring device 14 is installed to monitor the mask temperature in real time during the cleaning process and can dynamically regulate the mask surface temperature to prevent changes in the mask surface microstructure due to excessive temperature, thereby improving the mask surface cleaning effect.

[0036] As an optional implementation, the direction perpendicular to the support platform 111 is defined as a preset direction, such as... Figure 4As shown, the first ultraviolet component 131 further includes a first driver 1312 for driving the first ultraviolet lamp 1311 to move along a preset direction. The first ultraviolet component 131 is connected to the first driver 1312. The second ultraviolet component 132 further includes a second driver 1322 for driving the second ultraviolet lamp 1321 to move along a preset direction. The second ultraviolet component 132 is connected to the second driver 1322. Both the first driver 1312 and the second driver 1322 are electrically connected to the control device 15. The first driver 1312 and the second driver 1322 are respectively capable of driving the first ultraviolet lamp 1311 and the second ultraviolet lamp 1321 to move. Specifically, the first driver 1312 is capable of driving the first ultraviolet lamp 1311 to move along a preset direction, that is, the first driver 1312 drives the first ultraviolet lamp 1311 to move closer to or further away from the clamping space and the mask located in the clamping space. The second driver 1322 can drive the second ultraviolet lamp 1321 to move in a preset direction, that is, the second driver 1322 drives the second ultraviolet lamp 1321 to move closer to or further away from the clamping space and the mask located in the clamping space. Simultaneously, both the first driver 1312 and the second driver 1322 are electrically connected to the control device 15, and both the first driver 1312 and the second driver are controlled by the control device 15. More specifically, the control device 15 can acquire the temperature of the mask area in real time and adjust the distance between the first ultraviolet lamp 1311 and the second ultraviolet lamp 1321 and the mask according to the temperature of the mask area. For example, when the temperature of the mask area is too high, the first ultraviolet lamp 1311 and / or the second ultraviolet lamp 1321 can be controlled to move away from the mask by the first driver 1312 and / or the second driver 1322, thereby reducing the temperature of the mask area; when the temperature of the mask area is low, the first ultraviolet lamp 1311 and / or the second ultraviolet lamp 1321 can be controlled to move closer to the mask by the first driver 1312 and / or the second driver 1322, thereby increasing the temperature of the mask area.

[0037] Furthermore, such as Figure 4 As shown, the first ultraviolet component 131 further includes a first limiting member 1313 at least partially sleeved on the outside of the first driver 1312; the second ultraviolet component 132 further includes a second limiting member 1323 at least partially sleeved on the outside of the second driver 1322. The first limiting member 1313 and the second limiting member 1323, provided on the outside of the first driver 1312 and the second driver 1322, can limit the movement range of the first ultraviolet lamp 1311 and the second ultraviolet lamp 1321, preventing the first ultraviolet lamp 1311 and the second ultraviolet lamp 1321 from touching the mask or other components in the ultraviolet cleaning equipment 100 during movement, and preventing bumps and damage to the mask, the first ultraviolet lamp 1311, the second ultraviolet lamp 1321, or other components in the ultraviolet cleaning equipment 100.

[0038] Specifically, the first actuator 1312 is one of a cylinder actuator, a hydraulic actuator, or an electric actuator, and the second actuator 1322 is one of a cylinder actuator, a hydraulic actuator, or an electric actuator. The first actuator 1312 and the second actuator 1322 can be any actuator capable of driving the first ultraviolet lamp 1311 and the second ultraviolet lamp 1321 along a preset direction. Cylinder actuators, hydraulic actuators, and electric actuators can achieve linear drive and have a relatively compact structure, facilitating the arrangement of the actuators in the ultraviolet cleaning equipment 100 of this application.

[0039] As an optional implementation, the first driver 1312 is disposed through the support platform 111, with at least a portion of the first driver 1312 located outside the cleaning space; the second driver 1322 is disposed through the support platform 111, with at least a portion of the second driver 1322 located outside the cleaning space. In this configuration, a portion of the first driver 1312 is located within the cleaning space, while the other portion is outside the cleaning space. Specifically, the portion of the first driver 1312 that is connected to the first ultraviolet lamp 1311 is located within the cleaning space to drive the first ultraviolet lamp 1311, while components of the first driver 1312 that do not need to contact the first ultraviolet lamp 1311, as well as other control or power components, are located outside the cleaning space. This ensures a spacious cleaning space while preventing these components from being damaged by ultraviolet light within the cleaning space. Similarly, for similar reasons, the portion of the second driver 1322 that needs to be connected to the second ultraviolet lamp 1321 is located within the cleaning space, while other portions of the second driver 1322 are located outside the cleaning space.

[0040] As an optional implementation, the ultraviolet cleaning equipment 100 also includes a ventilation device 16 (such as...). Figure 1 As shown). Figure 6As shown, the ventilation device 16 includes a ventilation duct 161 and an exhaust fan 162. The exhaust fan 162 is connected to the ventilation duct 161 and electrically connected to the control device 15. The ventilation duct 161 extends to the outside of the cleaning space. The ventilation device 16 can promptly exhaust the waste gas generated by ultraviolet light cleaning in the cleaning space, and it can also control the temperature within the cleaning space through air exchange. Specifically, the exhaust fan 162 is electrically connected to and controlled by the control device 15. After acquiring the temperature of the mask area in real time, the control device 15 adjusts the operating power and airflow of the exhaust fan 162 according to the temperature of the mask area. For example, when the temperature of the mask area is too high, the power and airflow of the exhaust fan can be increased to accelerate air exchange in the cleaning space, quickly expelling the hot air and thus lowering the temperature inside the cleaning space; when the temperature of the mask area is low, the power and airflow of the exhaust fan can be appropriately reduced to slow down air exchange in the cleaning space, keeping the air temperature within the cleaning space within a suitable range.

[0041] Furthermore, the ventilation device 16 also includes a valve 163, which is connected between the ventilation duct 161 and the exhaust fan. The valve 163 can open the gas exhaust channel during cleaning operations and maintain a relatively sealed interior of the cleaning space when cleaning operations are not in progress, thus preventing outside air from contaminating the cleaning space.

[0042] As an optional implementation, the temperature measuring device 14 also includes a support member 142 (such as...). Figure 2 As shown in the diagram, support member 142 is connected to support platform 111, and temperature probe 141 is connected to the end of support member 142. Support member 142 can fix temperature probe 141 to a suitable height.

[0043] As an optional implementation, the distance between the temperature probe 141 and the clamping space ranges from 7mm to 13mm. Maintaining the distance between the temperature probe 141 and the clamping space within this range avoids interference with the cleaning process due to excessive proximity, as well as inaccurate temperature measurements caused by direct ultraviolet light from the first ultraviolet lamp 1311 or the second ultraviolet lamp 1321, and also avoids underestimating the temperature due to excessive distance. Further, the distance between the temperature probe 141 and the clamping space ranges from 8mm to 12mm. Even further, the distance between the temperature probe 141 and the clamping space ranges from 9mm to 11mm.

[0044] As an optional implementation, the body 11 also includes a top cover 113 (e.g., Figure 1As shown in the diagram, the cleaning space is a sealed space. The interior of the machine body 11, i.e., the cleaning space, is a sealed space, which can reduce the pollution of related components and masks in the cleaning equipment in the cleaning space by the external environment, and can also ensure the cleanliness of the air in the cleaning space. At the same time, it is also conducive to collecting the exhaust gas generated after ultraviolet light cleaning, preventing the exhaust gas from escaping into the external environment, and facilitating the centralized treatment of exhaust gas.

[0045] Finally, it should be noted that the above are only some preferred embodiments of this application and are not intended to limit this application. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A UV cleaning device for photomasks, characterized in that, include: The body (11) includes a support platform (111) and a side wall (112), and a cleaning space for cleaning the mask is formed inside the body (11); A support device (12) includes a base (121) and a plurality of clamping members (122), the plurality of clamping members (122) being evenly connected to the base (121), the plurality of clamping members (122) being arranged at approximately the same height, and the plurality of clamping members (122) forming a clamping space for fixing the mask sheet; a cleaning device (13) includes a first ultraviolet component (131) and a second ultraviolet component (132), the first ultraviolet component (131) being... 1) Includes a first ultraviolet lamp (1311), and a second ultraviolet component (132) including a second ultraviolet lamp (1321). The first ultraviolet lamp (1311) is located on one side of the clamping space, and the second ultraviolet lamp (1321) is located on the other side of the clamping space; a temperature measuring device (14) including a temperature measuring probe (141) located on one side of the clamping space, and the temperature measuring probe (141) is set at approximately the same height as the clamping space; A control device (15) is electrically connected to the first ultraviolet lamp (1311), the second ultraviolet lamp (1321), and the temperature measuring device (14).

2. The ultraviolet cleaning equipment according to claim 1, characterized in that: The direction perpendicular to the support platform (111) is defined as a preset direction. The first ultraviolet component (131) further includes a first driver (1312) for driving the first ultraviolet lamp (1311) to move along the preset direction. The first ultraviolet component (131) is connected to the first driver (1312). The second ultraviolet component (132) further includes a second driver (1322) for driving the second ultraviolet lamp (1321) to move along the preset direction. The second ultraviolet component (132) is connected to the second driver (1322). Both the first driver (1312) and the second driver (1322) are electrically connected to the control device (15).

3. The ultraviolet cleaning equipment according to claim 2, characterized in that: The first ultraviolet component (131) also includes a first limiting member (1313) that is at least partially sleeved on the outside of the first driver (1312); The second ultraviolet component (132) also includes a second limiting member (1323) that is at least partially sleeved on the outside of the second driver (1322).

4. The ultraviolet cleaning equipment according to claim 2, characterized in that: The first actuator (1312) is one of a cylinder actuator, a hydraulic actuator, or an electric actuator, and the second actuator (1322) is one of a cylinder actuator, a hydraulic actuator, or an electric actuator.

5. The ultraviolet cleaning equipment according to claim 2, characterized in that: The first drive (1312) is disposed through the support platform (111), and at least a portion of the first drive (1312) is located outside the cleaning space; The second drive (1322) is positioned through the carrier platform (111), and at least a portion of the second drive (1322) is located outside the cleaning space.

6. The ultraviolet cleaning equipment according to claim 1, characterized in that: The ultraviolet cleaning equipment (100) further includes a ventilation device (16), which includes a ventilation duct (161) and an exhaust fan (162). The exhaust fan (162) is connected to the ventilation duct (161) and electrically connected to the control device (15). The ventilation duct (161) is connected to the outside of the cleaning space.

7. The ultraviolet cleaning equipment according to claim 6, characterized in that: The ventilation device (16) also includes a valve (163) connected between the ventilation duct (161) and the exhaust fan.

8. The ultraviolet cleaning equipment according to claim 1, characterized in that: The temperature measuring device (14) also includes a support member (142), which is connected to the bearing platform (111), and the temperature probe (141) is connected to the end of the support member (142).

9. The ultraviolet cleaning equipment according to claim 1, characterized in that: The distance between the temperature probe (141) and the clamping space is greater than or equal to 7 mm and 13 mm.

10. The ultraviolet cleaning equipment according to claim 1, characterized in that: The body (11) also includes a top cover (113), and the cleaning space is a closed space.

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