Automatic switching device for slurry filter of cmp machine

Abstract

The utility model provides a kind of for CMP machine platform's grinding fluid filter automatic switching device, and automatic switching device includes first grinding fluid filter pipeline, second grinding fluid filter pipeline and control pipeline;First grinding fluid filter pipeline is sequentially provided with first grinding fluid filter, first sensor, first permanent magnet switch and first liquid storage buffer bag;Second grinding fluid filter pipeline is sequentially provided with second grinding fluid filter, second sensor, second permanent magnet switch and second liquid storage buffer bag;In first state, when first sensor detects that the flow rate of grinding fluid output by first grinding fluid filter is less than or equal to first threshold value, first permanent magnet switch will close first pipeline valve according to the detection signal of first sensor, open second pipeline valve, and the signal transmission of the change of third sensor detection second fluid flow rate in control pipeline is transmitted to second permanent magnet switch, second permanent magnet switch closes normally open third pipeline valve, and opens fourth pipeline valve to realize the switching of first grinding fluid filter pipeline to second grinding fluid filter pipeline.The device can open spare second grinding fluid filter in the state of not stopping when first grinding fluid filter is seriously blocked or reaches service life, to realize the automatic switching of filter, without stopping machine to carry out the manual replacement of filter.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor manufacturing technology, and in particular to an automatic switching device for polishing slurry filters used in CMP machines. Background Technology

[0002] Chemical mechanical polishing (CMP) is a technology that uses a combination of chemical and mechanical methods to planarize the surface of a wafer. In this process, the filter is a critical component used to remove impurities generated during the process, ensuring the purity of the polishing slurry. When the solids content in the polishing slurry is high, causing filter clogging or reaching the end of the filter's lifespan, existing maintenance procedures rely on proactive intervention by equipment engineers to manually replace the filter.

[0003] While this method is direct and effective, manually changing the filter inevitably requires pausing the CMP equipment, directly interrupting the continuous operation of the production line, reducing overall production efficiency, and resulting in lost production time and a temporary decrease in capacity. Furthermore, relying on manual filter replacement increases labor costs, making it both time-consuming and labor-intensive.

[0004] Therefore, for those skilled in the art, how to design a device that can automatically replace filters is a technical problem that urgently needs to be solved. Utility Model Content

[0005] The purpose of this invention is to provide an automatic switching device for polishing slurry filters in CMP machines. This device can automatically switch the polishing slurry filters without stopping the machine when the first polishing slurry filter is severely clogged or has reached the end of its service life. This eliminates the need to stop the machine to manually replace the polishing slurry filters.

[0006] To achieve the above objectives, this utility model provides an automatic switching device for polishing slurry filters in a CMP machine. The automatic switching device is located between the polishing slurry supply end and the machine. The automatic switching device includes: a first polishing slurry filtration pipeline, a second polishing slurry filtration pipeline, and a control pipeline. The first polishing slurry filtration pipeline, along the polishing slurry delivery direction, is sequentially provided with a first polishing slurry filter, a first sensor, a first permanent magnet switch, and a first liquid storage buffer bag. The second polishing slurry filtration pipeline, along the polishing slurry delivery direction, is sequentially provided with a second polishing slurry filter, a second sensor, a second permanent magnet switch, and a second liquid storage buffer bag. The first permanent magnet switch includes a first pipeline valve and a second pipeline valve, and the second permanent magnet switch includes a third pipeline valve and a fourth pipeline valve. The first pipeline valve is located in the first polishing slurry filtration pipeline, and the fourth pipeline valve is located in the second polishing slurry filtration pipeline. The control pipeline includes the second pipeline valve, the third pipeline valve, a third sensor, and a second fluid supply end.

[0007] In the first state, when the first sensor detects that the flow rate of the polishing fluid output from the first polishing fluid filter is less than or equal to the first threshold, the first permanent magnet switch closes the first pipeline valve and opens the second pipeline valve according to the detection signal of the first sensor. The third sensor detects the signal of the change in the flow rate of the second fluid in the control pipeline and transmits it to the second permanent magnet switch. The second permanent magnet switch closes the normally open third pipeline valve and opens the fourth pipeline valve to realize the switching from the first polishing fluid filter pipeline to the second polishing fluid filter pipeline.

[0008] Optionally, in the second state, when the second sensor detects that the flow rate of the polishing fluid output by the second polishing fluid filter is less than or equal to the second threshold, the second permanent magnet switch will close the fourth pipeline valve and open the third pipeline valve according to the detection signal of the second sensor. The third sensor detects the signal of the change in the flow rate of the second fluid in the control pipeline and transmits it to the first permanent magnet switch. The first permanent magnet switch closes the normally open second pipeline valve and opens the first pipeline valve to realize the switching from the second polishing fluid filter pipeline to the first polishing fluid filter pipeline.

[0009] Optionally, the fluid in the second fluid supply is deionized water.

[0010] Optionally, the first permanent magnet switch further includes a first permanent magnet and a first housing, one end of the first permanent magnet is placed outside the first housing, and the other end of the first permanent magnet extends into the first housing and can move within the first housing;

[0011] When the first sensor detects that the flow rate of the polishing fluid output from the first polishing fluid filter is less than or equal to the first threshold, the first permanent magnet is driven to move from the first position to the second position, causing the first pipeline valve to close and the second pipeline valve to open; when the third pipeline valve opens and the third sensor detects a signal of a change in the flow rate of the second fluid in the control pipeline, the first permanent magnet is driven to move from the second position to the first position, causing the first pipeline valve to open and the second pipeline valve to close.

[0012] Optionally, the second permanent magnet switch includes a second permanent magnet and a second housing, one end of the second permanent magnet is placed outside the second housing, and the other end of the second permanent magnet extends into the second housing and is able to move within the second housing;

[0013] When the second sensor detects that the flow rate of the polishing fluid output from the second polishing fluid filter is less than or equal to the second threshold, the second permanent magnet is driven to move from the fourth position to the third position, causing the third pipeline valve to open and the fourth pipeline valve to close; when the second pipeline valve is open and the third sensor detects a signal of a change in the flow rate of the second fluid in the control pipeline, the second permanent magnet is driven to move from the third position to the fourth position, causing the third pipeline valve to close and the fourth pipeline valve to open.

[0014] Optionally, the first liquid storage buffer bag is located between the first pipeline valve and the machine tool. The first liquid storage buffer bag can store grinding fluid and can deliver a preset amount of grinding fluid to the machine tool after the first pipeline valve is closed.

[0015] The second liquid storage buffer bag is located between the fourth pipeline valve and the machine. The second liquid storage buffer bag can store grinding fluid and can deliver a preset amount of grinding fluid to the machine after the fourth pipeline valve is closed.

[0016] Optionally, the first liquid storage buffer bag is provided with a first vent hole for the internal gas to be discharged, and / or the second liquid storage buffer bag is provided with a second vent hole for the internal gas to be discharged.

[0017] Optionally, a first one-way valve is also provided on the first grinding fluid filtration pipeline. The first one-way valve is located between the first liquid storage buffer bag and the machine.

[0018] And / or, a second one-way valve is also provided on the second grinding fluid filtration pipeline, the second one-way valve being located between the second liquid storage buffer bag and the machine platform.

[0019] This application provides an automatic switching device for polishing slurry filters in CMP machines. This device can automatically switch between two polishing slurry filter lines after the first polishing slurry filter becomes clogged or reaches the end of its service life, thereby automatically activating the backup second polishing slurry filter. In this way, the first polishing slurry filter in the first polishing slurry filter line can be replaced without stopping the equipment, eliminating the need for manual replacement of the polishing slurry filter, saving replacement time and improving overall production efficiency. Attached Figure Description

[0020] Figure 1 This is a schematic diagram of the automatic filter switching device in a preferred embodiment of the present invention;

[0021] Figure 2 This is a schematic diagram of the structure of the first liquid storage buffer bag in a preferred embodiment of the present invention.

[0022] The reference numerals in the attached figures are explained as follows:

[0023] First polishing slurry filtration pipeline 1; First polishing slurry filter 11; First sensor 12; First liquid storage buffer bag 13; First vent 131; First one-way valve 14; Second polishing slurry filtration pipeline 2; Second polishing slurry filter 21; Second sensor 22; Second liquid storage buffer bag 23; Second one-way valve 24; Control pipeline 3; Third sensor 31; First permanent magnet switch 4; First pipeline valve 41; Second pipeline valve 42; First permanent magnet 43; First housing 44; Second permanent magnet switch 5; Third pipeline valve 51; Fourth pipeline valve 52; Second permanent magnet 53; Second housing 54; Polishing slurry supply end 6; Machine base 7; Second fluid supply end 8. Detailed Implementation

[0024] The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. The advantages and features of the present invention will become clearer from the following description. It should be noted that the drawings are all in a very simplified form and use non-precise proportions, and are only used to facilitate and clarify the illustration of the embodiments of the present invention.

[0025] The terms “center,” “longitudinal,” “lateral,” “length,” “width,” “thickness,” “upper,” “lower,” “front,” “rear,” “left,” “right,” “vertical,” “horizontal,” “top,” “bottom,” “inner,” “outer,” “clockwise,” “counterclockwise,” “axial,” “radial,” and “circumferential” indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the mechanism or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.

[0026] In this utility model, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "fixation," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection, an electrical connection, or a connection that allows communication between the components; they can refer to a direct connection or a connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise explicitly limited. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.

[0027] The following description illustrates the application of an automatic slurry filter switching device to a chemical mechanical polishing (CMP) machine. However, those skilled in the art will recognize that the automatic filter switching device provided in this application can also be applied to other liquid delivery systems.

[0028] Furthermore, those skilled in the art can combine and integrate the different embodiments or examples described herein, as well as the features of the different embodiments or examples, without contradiction.

[0029] Reference Figure 1 and Figure 2 As shown, a preferred embodiment of this application provides an automatic switching device for polishing slurry filters in a CMP machine. The automatic switching device is disposed between the polishing slurry supply end 6 and the machine 7. The automatic switching device includes a first polishing slurry filtration pipeline 1, a second polishing slurry filtration pipeline 2, and a control pipeline 3. The first polishing slurry filtration pipeline 1 is sequentially provided with a first polishing slurry filter 11, a first sensor 12, a first permanent magnet switch 4, and a first liquid storage buffer bag 13 along the polishing slurry delivery direction x. The first sensor 12 is used to obtain the fluid flow rate in the first polishing slurry filtration pipeline 1. The second polishing slurry filtration pipeline 2 is sequentially provided with a second polishing slurry filter 21, a second sensor 22, a second permanent magnet switch 5, and a second liquid storage buffer bag 23 along the polishing slurry delivery direction x. The second sensor 22 is used to obtain the fluid flow rate in the second polishing slurry filtration pipeline 2.

[0030] The first permanent magnet switch 4 includes a first pipeline valve 41 and a second pipeline valve 42, and the second permanent magnet switch 5 includes a third pipeline valve 51 and a fourth pipeline valve 52. The first pipeline valve 41 is located in the first grinding fluid filter pipeline 1, and the fourth pipeline valve 52 is located in the second grinding fluid filter pipeline 2. The control pipeline 3 is equipped with the second pipeline valve 42, the third pipeline valve 51, a third sensor 31, and a second fluid supply end 8. The third sensor 33 is used to obtain the fluid flow rate in the control pipeline 3. This application does not limit the position of the second pipeline valve 42 and the third pipeline valve 51 on the control pipeline 3.

[0031] Specifically, the inlet of the first polishing slurry filter line 1 and the inlet of the second polishing slurry filter line 2 are respectively connected to the polishing slurry supply end 6 (e.g., raw material tank). The outlet of the first polishing slurry filter line 1 and the outlet of the second filter line 2 are respectively connected to the machine base 7 (e.g., wafer polishing machine).

[0032] Furthermore, the polishing slurry supply end 6 can selectively connect to one of the first polishing slurry filter line 1 and the second polishing slurry filter line 2, while the other of the first polishing slurry filter line 1 and the second polishing slurry filter line 2 is disconnected. The polishing slurry supply end 6 can supply polishing slurry to the machine 7 through the connected polishing slurry filter line.

[0033] In the initial state, the first pipeline valve 41 is open, and the polishing slurry supply end 6 and the machine base 7 are connected through the first polishing slurry filter pipeline 1. The polishing slurry in the polishing slurry supply end 6 is filtered through the first polishing slurry filter 11. The second pipeline valve 42 is closed, and the third pipeline valve 51 is open. The fourth pipeline valve 52 is closed, and the second polishing slurry filter pipeline 2 is disconnected.

[0034] In the first state, when the first sensor 12 detects that the flow rate of the polishing slurry output from the first polishing slurry filter 11 is less than or equal to the first threshold, that is, when the fluid flow rate in the first polishing slurry filter pipeline 1 decreases to the first threshold, the first polishing slurry filter pipeline 1 is blocked or has reached its service life. Based on the detection signal from the first sensor 12, the first permanent magnet switch 4 will close the first pipeline valve 41 and open the second pipeline valve 42, allowing the fluid to begin circulating in the control pipeline 3. After the first polishing slurry filter pipeline 1 is disconnected, the operator can clean or replace the first polishing slurry filter 11.

[0035] Furthermore, the third sensor 31 detects a change in the flow rate of the second fluid in the control pipeline 3 and transmits the signal to the second permanent magnet switch 5. The second permanent magnet switch 5 closes the normally open third pipeline valve 51, disconnecting the control pipeline 3. Simultaneously, the second permanent magnet switch 5 opens the fourth pipeline valve 52, connecting the second polishing slurry filter pipeline 2, thus switching from the first polishing slurry filter pipeline 1 to the second polishing slurry filter pipeline 2. At this time, the polishing slurry supply end 6 and the machine base 7 are connected through the second polishing slurry filter pipeline 2, and the fluid in the polishing slurry supply end 6 is filtered through the second polishing slurry filter 21.

[0036] This application provides an automatic switching device for polishing slurry filters in CMP machines. This device can automatically switch between two polishing slurry filtration lines after the first polishing slurry filter 11 becomes clogged or reaches the end of its service life, thereby automatically activating the backup second polishing slurry filter 21. In this way, the first polishing slurry filter 11 in the first polishing slurry filtration line 1 can be replaced without stopping the equipment, eliminating the need for manual replacement of the polishing slurry filter, saving replacement time and improving overall production efficiency.

[0037] It should be noted that the first polishing slurry filter 11 and the second polishing slurry filter 21 can purify the polishing slurry in the first polishing slurry filter line 1 and the second polishing slurry filter line 2, respectively. More specifically, both the first polishing slurry filter 11 and the second polishing slurry filter 21 can filter the polishing slurry flowing out of the polishing slurry supply end 6 to remove any impurities or contaminants that may be present in the polishing slurry, thus preventing impurities from entering subsequent pipelines and polishing processes.

[0038] Furthermore, in the second state, when the second sensor 22 detects that the flow rate of the polishing slurry output from the second polishing slurry filter 21 is less than or equal to the second threshold, that is, when the fluid flow rate in the second polishing slurry filter pipeline 2 decreases to the second threshold, the second polishing slurry filter pipeline 2 is blocked or has reached its service life. Based on the detection signal from the second sensor 22, the second permanent magnet switch 5 will close the fourth pipeline valve 52 and open the third pipeline valve 51, allowing the fluid to resume circulating within the control pipeline 3. After the second polishing slurry filter pipeline 2 is disconnected, the operator can clean or replace the second polishing slurry filter 21.

[0039] Then, the third sensor 31 detects a signal indicating a change in the flow rate of the second fluid in the control pipeline 3 and transmits it to the first permanent magnet switch 4. The first permanent magnet switch 5 closes the normally open second pipeline valve 42, disconnecting the control pipeline 3. Simultaneously, the first pipeline valve 41 is opened to connect the first polishing slurry filter pipeline 1, thus switching from the second polishing slurry filter pipeline 2 to the first polishing slurry filter pipeline 2. At this time, the polishing slurry supply end 6 and the machine 7 are connected through the first polishing slurry filter pipeline 1, and the fluid in the polishing slurry supply end 6 is filtered through the first polishing slurry filter 11.

[0040] This cycle allows the first grinding fluid filter line 1 and the second grinding fluid filter line 2 to alternately supply grinding fluid to the machine 7. This enables the filters in the disconnected grinding fluid filter lines to be cleaned or replaced without stopping the equipment, saving filter replacement time and improving overall production efficiency.

[0041] Since different filters have different lifespans, in order to set the replacement requirements of different types and specifications of filters, this application can design specific values ​​of the first threshold and the second threshold according to the lifespan and replacement requirements of the first polishing fluid filter 11 and the second polishing fluid filter 21. Then, the usage time of the first polishing fluid filter pipeline 1 and the second polishing fluid filter pipeline 2 can be set by the first permanent magnet switch 4 and the second permanent magnet switch 5 to achieve a precise definition of the lifespan of different filters.

[0042] For example, as the usage time of the first polishing slurry filter 11 or the second polishing slurry filter 21 increases, the fluid flow rate in the first polishing slurry filter line 1 or the second polishing slurry filter line 2 gradually decreases. If it is necessary to extend the usage time of the first polishing slurry filter 11 and the second polishing slurry filter 21, the specific values ​​of the first threshold and the second threshold can be decreased. Conversely, if it is necessary to shorten the usage time of the first polishing slurry filter 11 and the second polishing slurry filter 21, the specific values ​​of the first threshold and the second threshold can be increased.

[0043] Furthermore, the fluid in the second fluid supply end 8 is deionized water. The second fluid supply end 8 can supply fluid to the control line 3 so that the fluid circulates within the control line 3.

[0044] In some preferred embodiments, the first permanent magnet switch 4 is fixed on the outer wall of the first polishing fluid filter pipe 1 or the outer wall of the control pipe 3, and the second permanent magnet switch 5 is fixed on the outer wall of the second polishing fluid filter pipe 2 or the outer wall of the control pipe 3.

[0045] Reference Figure 1 As shown, in one example, the first permanent magnet switch 4 is fixed on the outer wall of the first polishing fluid filter pipe 1 and the outer wall of the control pipe 3, and the second permanent magnet switch 5 is fixed on the outer wall of the second polishing fluid filter pipe 2 and the outer wall of the control pipe 3.

[0046] Continue to refer to Figure 1 The first permanent magnet switch 4 also includes a first permanent magnet 43 and a first housing 44. One end of the first permanent magnet 43 is placed outside the first housing 44, and the other end of the first permanent magnet 43 extends into the first housing 44 and can move within the first housing 44.

[0047] Furthermore, when the first permanent magnet 43 is located at the first position a (e.g., the position corresponding to the first polishing slurry filter pipe 1), the first permanent magnet switch 4 can drive the first pipe valve 41 to open and drive the second pipe valve 42 to close. When the first sensor 12 detects that the polishing slurry flow rate output by the first polishing slurry filter 11 is less than or equal to the first threshold, the first permanent magnet 43 is driven to move from the first position a to the second position b, causing the first pipe valve 41 to close and the second pipe valve 42 to open. That is, when the first permanent magnet 43 is located at the second position b (e.g., the position corresponding to the control pipe 3), the first permanent magnet switch 4 can drive the second pipe valve 42 to open and drive the first pipe valve 41 to close. When the third pipe valve 51 opens and the third sensor 31 detects a signal of a change in the flow rate of the second fluid in the control pipe 3, the first permanent magnet 43 is driven to move from the second position b to the first position a, causing the first pipe valve 41 to open and the second pipe valve 42 to close.

[0048] Reference Figure 1 As shown, similarly, the second permanent magnet switch 5 also includes a second permanent magnet 53 and a second housing 54. One end of the second permanent magnet 53 is placed outside the second housing 54, and the other end of the second permanent magnet 53 extends into the second housing 54 and can move within the second housing 54.

[0049] Furthermore, when the second permanent magnet 53 is located at the fourth position d (e.g., the position corresponding to the second polishing slurry filter pipe 2), the second permanent magnet switch 5 can drive the fourth pipe valve 52 to open and the third pipe valve 51 to close. When the second sensor 22 detects that the polishing slurry flow rate output by the second polishing slurry filter 21 is less than or equal to the second threshold, the second permanent magnet 53 is driven to move from the fourth position d to the third position c, causing the fourth pipe valve 52 to close and the third pipe valve 51 to open. That is, when the second permanent magnet 53 is located at the third position c (e.g., the position corresponding to the control pipe 3), the second permanent magnet switch 5 can drive the third pipe valve 51 to open and the fourth pipe valve 52 to close. When the second pipe valve 42 is open and the third sensor 31 detects a signal of a change in the second fluid flow rate in the control pipe 3, the second permanent magnet 53 is driven to move from the third position c to the fourth position d, causing the fourth pipe valve 52 to open and the third pipe valve 51 to close.

[0050] It should be noted that when the first permanent magnet 43 is in the first position a, the first permanent magnet switch 4 can transmit a first open signal and a first close signal to the control terminal. After receiving the first open signal and the first close signal, the control terminal drives the first pipeline valve 41 to open and drives the second pipeline valve 42 to close. When the first permanent magnet 43 is in the second position b, the first permanent magnet switch 4 can transmit a second open signal and a second close signal to the control terminal. After receiving the second open signal and the second close signal, the control terminal drives the first pipeline valve 41 to close and drives the second pipeline valve 42 to open.

[0051] Similarly, when the second permanent magnet 53 is in the third position c, the second permanent magnet switch 5 can transmit a third open signal and a third close signal to the control terminal. After receiving the third open signal and the third close signal, the control terminal drives the third pipeline valve 51 to open and drives the fourth pipeline valve 52 to close. When the second permanent magnet 53 is in the fourth position d, the second permanent magnet switch 5 can transmit a fourth open signal and a fourth close signal to the control terminal. After receiving the fourth open signal and the fourth close signal, the control terminal drives the third pipeline valve 51 to close and drives the fourth pipeline valve 52 to open.

[0052] Reference Figure 1 and Figure 2 As shown, the first liquid storage buffer bag 13 is located between the first pipeline valve 41 and the machine base 7. The first liquid storage buffer bag 13 can store grinding fluid and can deliver a preset amount of grinding fluid to the machine base 7 after the first pipeline valve 41 is closed.

[0053] Similarly, the second liquid storage buffer bag 23 is located between the fourth pipeline valve 52 and the machine 7. The second liquid storage buffer bag 23 can store grinding fluid and can deliver a preset amount of grinding fluid to the machine 7 after the fourth pipeline valve 52 is closed.

[0054] To minimize the impact on production caused by the interruption of grinding fluid during filter switching, this invention introduces a first storage buffer bag 13 and a second storage buffer bag 23. The first storage buffer bag 13 and the second storage buffer bag 23 can store a certain amount of grinding fluid during the filter switching interval, ensuring that there is still enough grinding fluid to supply the machine 7 during the filter switching process, and ensuring that the machine 7 can operate normally during filter switching.

[0055] In one specific example, the first liquid storage buffer bag 13 and the second liquid storage buffer bag 23 have the same structure.

[0056] More preferably, the first liquid storage buffer bag 13 is provided with a first vent 131 for the internal gas to be discharged (see reference). Figure 2Similarly, the second liquid storage buffer bag 23 is provided with a second vent for the internal gas to escape. The first vent 131 and the second vent enable the first liquid storage buffer bag 13 and the second liquid storage buffer bag 23 to automatically vent air from the pipeline without human intervention.

[0057] Specifically, when the first pipeline valve 41 is open and the second pipeline valve 42 is closed, the grinding slurry flows into the first grinding slurry filter pipeline 1, and the initial liquid flows into the first storage buffer bag 13 of the first filter pipeline 1. The gas in the first storage buffer bag 13 is automatically discharged through the first vent 131. When the fourth pipeline valve 52 is open and the first pipeline valve 41 is closed, the first storage buffer bag 13 can provide a sufficient amount of grinding slurry to the machine 7 to ensure normal production. At the same time, after the fourth pipeline valve 52 is opened, it can replenish the grinding slurry into the second storage buffer bag 23 of the second grinding slurry filter pipeline 2. When the fourth pipeline valve 52 is open, the grinding slurry flows into the second grinding slurry filter pipeline 2, and the initial liquid flows into the second storage buffer bag 23. The gas in the second storage buffer bag 23 is automatically discharged through the second vent. When the first pipeline valve 41 is open and the fourth pipeline valve 52 is closed, the second storage buffer bag 23 can provide a sufficient amount of fluid to the machine 7. At the same time, after the first pipeline valve 41 is opened, grinding fluid can be added to the first liquid storage buffer bag 13, and so on, to ensure the normal operation of production.

[0058] Continue to refer to Figure 1 The first grinding fluid filtration pipeline 1 is also equipped with a first one-way valve 14 (i.e., an anti-backflow valve), which is located between the first liquid storage buffer bag 13 and the machine base 7. In one example, the first grinding fluid filtration pipeline 1 is provided with a first grinding fluid filter 11, a first sensor 12, a first pipeline valve 41, a first permanent magnet switch 4, a first liquid storage buffer bag 13, and a first one-way valve 14 in sequence along the fluid flow direction.

[0059] Similarly, a second check valve 24 (i.e., an anti-backflow valve) is also provided on the second polishing slurry filter line 2. The second check valve 24 is located between the second liquid storage buffer bag 23 and the machine base 7. In one example, the second polishing slurry filter line 2 is provided with the second polishing slurry filter 21, the second sensor 22, the fourth pipeline valve 52, the second permanent magnet switch 5, the second liquid storage buffer bag 23, and the second check valve 24 in sequence along the fluid flow direction.

[0060] The first check valve 14 and the second check valve 24 can ensure that the grinding fluid can only move along the direction of the grinding fluid supply end 6 towards the machine platform 7, preventing the grinding fluid from flowing back.

[0061] In summary, this utility model provides an automatic switching device for polishing slurry filters in CMP machines. This device can automatically switch between two polishing slurry filtration pipelines after the first polishing slurry filter 11 becomes clogged or reaches the end of its service life, thereby automatically activating the backup second polishing slurry filter 21. In this way, the first polishing slurry filter 11 in the first polishing slurry filtration pipeline 1 can be replaced without stopping the equipment, eliminating the need for manual replacement of the polishing slurry filter, saving replacement time and improving overall production efficiency.

[0062] The above description is only a description of the preferred embodiment of the present utility model and is not intended to limit the scope of the present utility model in any way. Any changes or modifications made by those skilled in the art based on the above disclosure shall fall within the protection scope of the present utility model.

Claims

1. An automatic switching device for polishing slurry filters in a CMP machine, characterized in that, The automatic switching device is located between the polishing slurry supply end and the machine. The automatic switching device includes: a first polishing slurry filtration pipeline, a second polishing slurry filtration pipeline, and a control pipeline. The first polishing slurry filtration pipeline, along the polishing slurry delivery direction, is sequentially equipped with a first polishing slurry filter, a first sensor, a first permanent magnet switch, and a first liquid storage buffer bag. The second polishing slurry filtration pipeline, along the polishing slurry delivery direction, is sequentially equipped with a second polishing slurry filter, a second sensor, a second permanent magnet switch, and a second liquid storage buffer bag. The first permanent magnet switch includes a first pipeline valve and a second pipeline valve, and the second permanent magnet switch includes a third pipeline valve and a fourth pipeline valve. The first pipeline valve is located in the first polishing slurry filtration pipeline, and the fourth pipeline valve is located in the second polishing slurry filtration pipeline. The control pipeline is equipped with the second pipeline valve, the third pipeline valve, a third sensor, and a second fluid supply end. In the first state, when the first sensor detects that the flow rate of the polishing fluid output from the first polishing fluid filter is less than or equal to the first threshold, the first permanent magnet switch will close the first pipeline valve and open the second pipeline valve according to the detection signal of the first sensor; the third sensor detects the signal of the change in the flow rate of the second fluid in the control pipeline and transmits it to the second permanent magnet switch, the second permanent magnet switch closes the normally open third pipeline valve and opens the fourth pipeline valve to realize the switching from the first polishing fluid filter pipeline to the second polishing fluid filter pipeline.

2. The automatic switching device for polishing slurry filters for CMP machines as described in claim 1, characterized in that, In the second state, when the second sensor detects that the flow rate of the polishing fluid output by the second polishing fluid filter is less than or equal to the second threshold, the second permanent magnet switch will close the fourth pipeline valve and open the third pipeline valve according to the detection signal of the second sensor. The third sensor detects the signal of the change in the flow rate of the second fluid in the control pipeline and transmits it to the first permanent magnet switch. The first permanent magnet switch closes the normally open second pipeline valve and opens the first pipeline valve to realize the switching from the second polishing fluid filter pipeline to the first polishing fluid filter pipeline.

3. The automatic switching device for polishing slurry filters in a CMP machine as described in claim 1, characterized in that, The fluid in the second fluid supply end is deionized water.

4. The automatic switching device for polishing slurry filters in a CMP machine as described in claim 2, characterized in that, The first permanent magnet switch is fixed on the outer wall of the first polishing fluid filter pipe and / or the outer wall of the control pipe, and the second permanent magnet switch is fixed on the outer wall of the second polishing fluid filter pipe and / or the outer wall of the control pipe.

5. The automatic switching device for polishing slurry filters in a CMP machine as described in claim 2, characterized in that, The first permanent magnet switch further includes a first permanent magnet and a first housing. One end of the first permanent magnet is placed outside the first housing, and the other end of the first permanent magnet extends into the first housing and can move within the first housing. When the first sensor detects that the flow rate of the polishing fluid output from the first polishing fluid filter is less than or equal to the first threshold, the first permanent magnet is driven to move from the first position to the second position, causing the first pipeline valve to close and the second pipeline valve to open; when the third pipeline valve opens and the third sensor detects a signal of a change in the flow rate of the second fluid in the control pipeline, the first permanent magnet is driven to move from the second position to the first position, causing the first pipeline valve to open and the second pipeline valve to close.

6. The automatic switching device for polishing slurry filters in a CMP machine as described in claim 2, characterized in that, The second permanent magnet switch includes a second permanent magnet and a second housing. One end of the second permanent magnet is placed outside the second housing, and the other end of the second permanent magnet extends into the second housing and can move within the second housing. When the second sensor detects that the flow rate of the polishing fluid output from the second polishing fluid filter is less than or equal to the second threshold, the second permanent magnet is driven to move from the fourth position to the third position, causing the third pipeline valve to open and the fourth pipeline valve to close; when the second pipeline valve is open and the third sensor detects a signal of a change in the flow rate of the second fluid in the control pipeline, the second permanent magnet is driven to move from the third position to the fourth position, causing the third pipeline valve to close and the fourth pipeline valve to open.

7. The automatic switching device for polishing slurry filters for CMP machines as described in claim 1, characterized in that, The first liquid storage buffer bag is located between the first pipeline valve and the machine tool. The first liquid storage buffer bag can store grinding fluid and can deliver a preset amount of grinding fluid to the machine tool after the first pipeline valve is closed. The second liquid storage buffer bag is located between the fourth pipeline valve and the machine. The second liquid storage buffer bag can store grinding fluid and can deliver a preset amount of grinding fluid to the machine after the fourth pipeline valve is closed.

8. The automatic switching device for polishing slurry filters in a CMP machine as described in claim 7, characterized in that, The first liquid storage buffer bag is provided with a first vent hole for the internal gas to be discharged, and / or the second liquid storage buffer bag is provided with a second vent hole for the internal gas to be discharged.

9. The automatic switching device for polishing slurry filters for CMP machines as described in claim 7, characterized in that, The first grinding fluid filtration pipeline is also equipped with a first one-way valve, which is located between the first liquid storage buffer bag and the machine platform. And / or, a second one-way valve is also provided on the second grinding fluid filter pipeline, the second one-way valve being located between the second liquid storage buffer bag and the machine platform.

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