Nanochip type uv-fenton reaction integrated device

Abstract

The utility model relates to a kind of nanometer chip formula UV-Fenton reaction integrated device, the device includes reactor body, Fenton reaction component, flow guide pipe and photocatalytic reaction component;Reactor body side wall separately arranged inlet, water outlet, hydrogen peroxide dosing port, ferrous sulfate dosing port, flow guide pipe is vertically arranged in inner cavity center and is communicated with inlet, hydrogen peroxide dosing port, photocatalytic reaction component is set in flow guide pipe and forms annular flow channel, deep ultraviolet light source is coated with light guide cotton loaded photocatalyst. After being mixed with reagent, photocatalytic activation, the sewage to be treated flows through Fenton reaction area reaction, finally is discharged from water outlet. The device realizes function integration, improves reagent mixing and reaction synergy, efficiently degrades refractory organic matter, reduces reagent consumption and sludge amount, and has strong water quality fluctuation resistance.

Description

Technical Field

[0001] This utility model relates to the field of wastewater treatment technology, and in particular to a nanochip-based integrated UV-Fenton reaction device. Background Technology

[0002] With the development of my country's industry, the discharge of industrial wastewater is increasing day by day. Industrial wastewater has a certain impact on the watershed environment and residents' health. In recent years, my country has paid more and more attention to the treatment of industrial wastewater. Among them, industrial wastewater mainly produced by new materials and chemical pharmaceuticals has the problem of complex and variable characteristic pollutants, which can easily cause biochemical system impact. At the same time, the treated wastewater is prone to COD and color exceeding the standard due to the presence of some recalcitrant organic matter. Traditional advanced oxidation technology is limited by treatment effect or treatment cost, which often puts enterprises in a dilemma.

[0003] Fenton's reagent, discovered in 1893 by chemist Fenton HJ, utilizes a mixture of hydrogen peroxide (H₂O₂) and ferrous ions. This mixture possesses strong oxidizing properties, capable of oxidizing many then-known organic compounds such as carboxylic acids, alcohols, and esters into inorganic forms with remarkable efficiency. In the 1970s, Fenton's reagent found its place in environmental chemistry, gaining widespread application in the treatment of dyeing and printing wastewater, oily wastewater, phenolic wastewater, coking wastewater, nitrobenzene-containing wastewater, and diphenylamine wastewater due to its high ability to remove recalcitrant organic pollutants. Its core chemical reaction involves Fe... 2+ + H2O2→Fe 3+ +(OH) - +OH·.

[0004] UV-Fenton advanced oxidation relies on the synergistic effect of ultraviolet light and Fenton reagent to degrade organic matter in water. It is widely used in water treatment and wastewater treatment, and can effectively remove organic matter, heavy metal ions and micropollutants from water. In particular, it can degrade refractory organic matter such as phenol and pesticides. It has the advantages of high efficiency and speed, no need to add additional chemical reagents, low cost, low environmental risk and wide range of water quality requirements. However, it also has obvious drawbacks: ultraviolet light is relatively sensitive to the color and turbidity of wastewater. When the water quality is poor, the penetration ability of ultraviolet light decreases, which will affect the degradation effect. In addition, it has high requirements for the pH value of the reaction and needs to be carried out within a suitable range.

[0005] Currently, traditional Fenton technologies both domestically and internationally generally suffer from limitations in the removal rate of recalcitrant COD, large dosage requirements, and high sludge production. While traditional UV-Fenton technology has improved the removal rate of recalcitrant COD to some extent, the traditional mercury lamps used have an excessively wide spectral range, low efficiency, and pose a risk of secondary pollution. They are also significantly affected by the color and turbidity of the wastewater. Furthermore, many existing UV-Fenton treatment devices suffer from unreasonable structural designs, such as insufficient mixing of reagents and wastewater, unclear division of reaction zones, and poor synergy between photocatalytic components and Fenton reaction components. This results in low reaction efficiency and unstable treatment effects, further limiting its application in the treatment of complex industrial wastewater.

[0006] Therefore, there is an urgent need for a new type of UV-Fenton treatment device with optimized structure, capable of efficient mixing of reagents, enhancing the synergistic effect of photocatalysis and Fenton reaction, and reducing the risk of secondary pollution. Summary of the Invention

[0007] The purpose of this application is to solve the problem of unreasonable structural design in existing UV-Fenton treatment devices.

[0008] To achieve the above objectives, this application employs the following technical solution: This application provides a nanochip-based integrated UV-Fenton reaction device, comprising: The reactor body is a cylindrical sealed container. An inlet, an outlet, a hydrogen peroxide dosing port, and a ferrous sulfate dosing port are provided on the side wall of the reactor body. The inlet and outlet are radially opposite to each other and penetrate the upper side wall of the reactor body. The hydrogen peroxide dosing port penetrates the middle side wall of the reactor body and is located on the same circumferential side as the inlet. The ferrous sulfate dosing port penetrates the lower side wall of the reactor body and is located on the same circumferential side as the outlet. The Fenton reaction assembly includes a fluidized bed support and a support layer. The fluidized bed support is horizontally fixed in the middle of the inner cavity of the reactor body, and the support layer is laid at the bottom of the inner cavity of the reactor body and located above the ferrous sulfate dosing port. A guide pipe is vertically installed in the center of the inner cavity of the reactor body. Its top end is higher than the fluidized bed support and is sealed and connected to the water inlet and the hydrogen peroxide dosing port. Its bottom end extends downward and passes through the fluidized bed support and the support layer in sequence. The bottom opening of the guide pipe is at the same height as the inlet of the ferrous sulfate dosing port. A photocatalytic reaction assembly includes a deep ultraviolet light source fixing unit and multiple deep ultraviolet light sources. The deep ultraviolet light source fixing unit is coaxially sleeved inside the guide tube to form an annular flow channel. The multiple deep ultraviolet light sources are spaced apart from top to bottom along the axial direction of the deep ultraviolet light source fixing unit, and each deep ultraviolet light source is surrounded by a light-guiding cotton loaded with photocatalyst. The deep ultraviolet light source is a nanochip-type ultraviolet light-emitting diode.

[0009] The wastewater to be treated is configured to enter from the inlet, flow through the annular channel between the guide pipe and the deep ultraviolet light source fixing unit, and then flow out from the bottom opening of the guide pipe. It then flows upward through the reaction area where the support layer and the fluidized bed support are located, and finally is discharged from the outlet.

[0010] As a further improvement to this application, an aeration component is also included, the aeration component comprising: A perforated aeration pipe is horizontally installed at the bottom of the inner cavity of the reactor body and located below the bottom opening of the guide pipe; An air inlet pipe has one end penetrating the bottom side wall of the reactor body and sealed to the perforated aeration pipe, and the other end connected to an external air source. The aeration direction of the perforated aeration pipe is towards the center of the inner cavity of the reactor body.

[0011] As a further improvement of this application, the inner wall of the guide tube is provided with a reflective layer.

[0012] As a further improvement of this application, an inspection hole is provided on the top of the reactor body, and the axis of the inspection hole coincides with the axis of the guide pipe.

[0013] As a further improvement of this application, the inspection hole is formed by the flow guide extending upward through the top of the reactor body.

[0014] As a further improvement of this application, the bottom outlet of the guide tube is configured as a tapered structure outlet.

[0015] As a further improvement of this application, the height of the tapered structure is 300mm to 500mm, and the diameter of its bottom outlet is 50mm to 200mm.

[0016] As a further improvement of this application, the ratio d / D of the inner diameter d of the guide tube to the diameter D of the reactor body is 0.1:1 to 0.2:1.

[0017] As a further improvement of this application, the deep ultraviolet light source is a nanochip-type ultraviolet light-emitting diode with an emission peak wavelength of 264nm.

[0018] As a further improvement of this application, the lower sidewall of the reactor body is also provided with a crystallization discharge hole, which is located above the support layer.

[0019] The beneficial effect of this application is that it provides a nanochip-type UV-Fenton reaction integrated device. This device organically integrates the reactor body, Fenton reaction components, flow guide tube and photocatalytic reaction components through the integrated structural design of a cylindrical sealed container, so as to realize the step-by-step precise addition and efficient mixing of reagents, and avoid the problem of premature reagent loss in traditional devices.

[0020] The inlet and hydrogen peroxide dosing port are located on the same side, and the ferrous sulfate dosing port and outlet are located on the same side. Combined with the design that the bottom opening of the guide pipe is at the same height as the inlet of the ferrous sulfate dosing port, it is ensured that the sewage and hydrogen peroxide are initially mixed before coming into immediate contact with ferrous sulfate, which significantly improves the uniformity of mixing.

[0021] The annular flow channel formed by the deep ultraviolet light source fixing unit and the flow guide tube, combined with the deep ultraviolet light source with photocatalyst-loaded photoconductive cotton on the outer periphery, constructs a dual hydroxyl radical generation pathway of photocatalysis and hydrogen peroxide photolysis, which synergistically enhances the oxidation capacity and has an outstanding degradation effect on recalcitrant organic matter.

[0022] The fluidized bed support and the supporting layer not only provide a stable three-phase reaction interface, but also promote the conversion of ferric sludge into recyclable crystals that can participate in the reaction, thereby reducing reagent consumption and sludge production.

[0023] The closed structure of the annular flow channel reduces the impact of wastewater color and turbidity on ultraviolet light, improves the device's resistance to water quality fluctuations, and solves the pain point of traditional UV-Fenton technology being sensitive to water quality.

[0024] With a compact overall structure and clear functional zoning, the deep synergy between photocatalysis and Fenton reaction significantly improves treatment efficiency and stability, providing an efficient and economical solution for the treatment of complex industrial wastewater. Attached Figure Description

[0025] Figure 1 This is a schematic diagram of the nanochip-based UV-Fenton reaction integrated device of this application; Figure 2 This is a partially enlarged structural schematic diagram of the nanochip-based UV-Fenton reaction integrated device of this application.

[0026] In the diagram: 1. Reactor body; 2. Inlet; 3. Outlet; 4. Hydrogen peroxide dosing port; 5. Ferrous sulfate dosing port; 6. Fluidized bed support; 7. Support layer; 8. Guide pipe; 81. Optical fiber; 82. Deep ultraviolet light source; 83. Deep ultraviolet light source fixing unit; 9. Perforated aeration pipe; 10. Air inlet pipe; 11. Inspection hole; 12. Crystallization discharge hole. Detailed Implementation

[0027] As is known from the background art, existing UV-Fenton treatment devices often suffer from unreasonable structural design problems, such as insufficient mixing of reagents and wastewater, unclear division of reaction zones, and poor synergy between photocatalytic components and Fenton reaction components, resulting in low reaction efficiency and unstable treatment effects. To solve these problems, this application provides a nanochip-based integrated UV-Fenton reaction device, such as... Figure 1 and Figure 2 As shown, it includes: The reactor body 1 is a cylindrical sealed container. An inlet 2, an outlet 3, a hydrogen peroxide dosing port 4, and a ferrous sulfate dosing port 5 are provided on the side wall of the reactor body 1. The inlet 2 and the outlet 3 are radially opposite to each other and penetrate the upper side wall of the reactor body 1. The hydrogen peroxide dosing port 4 penetrates the middle side wall of the reactor body 1 and is located on the same circumferential side of the reactor body 1 as the inlet 2. The ferrous sulfate dosing port 5 penetrates the lower side wall of the reactor body 1 and is located on the same circumferential side of the reactor body 1 as the outlet 3. The Fenton reaction assembly includes a fluidized bed support 6 and a support layer 7. The fluidized bed support 6 is horizontally fixed in the middle of the inner cavity of the reactor body 1, and the support layer 7 is laid at the bottom of the inner cavity of the reactor body 1 and located above the ferrous sulfate dosing port 5. The guide pipe 8 is vertically installed in the center of the inner cavity of the reactor body 1. Its top end is higher than the fluidized bed support 6 and is sealed and connected to the water inlet 2 and the hydrogen peroxide dosing port 4. Its bottom end extends downward and passes through the fluidized bed support 6 and the support layer 7 in sequence. The bottom opening of the guide pipe 8 is at the same height as the inlet of the ferrous sulfate dosing port 5. A photocatalytic reaction assembly includes a deep ultraviolet light source fixing unit 83 and multiple deep ultraviolet light sources 82. The deep ultraviolet light source fixing unit 83 is coaxially sleeved inside the guide tube 8 to form an annular flow channel. The multiple deep ultraviolet light sources 82 are spaced apart from top to bottom along the axial direction of the deep ultraviolet light source fixing unit 83, and each deep ultraviolet light source 82 is surrounded by a light-guiding cotton 81 loaded with photocatalyst. The deep ultraviolet light source 82 is a nano-chip type ultraviolet light-emitting diode. Preferably, the deep ultraviolet light source fixing unit 83 is a deep ultraviolet light source fixing rod or a deep ultraviolet light source fixing wire. The wastewater to be treated is configured to enter from the inlet 2, flow through the annular channel between the guide pipe 8 and the deep ultraviolet light source fixing unit 83, and then flow out from the bottom opening of the guide pipe 8. It then flows upward through the reaction zone where the support layer 7 and the fluidized bed support 6 are located, i.e., the Fenton reaction zone, and finally is discharged from the outlet 3.

[0028] Based on the above technical solution, the industrial wastewater to be treated (especially high-concentration wastewater containing recalcitrant organic matter in fields such as new materials and chemical pharmaceuticals) enters from the upper inlet 2 of the reactor body 1 and is directly introduced into the annular flow channel formed by the guide pipe 8 in the center of the inner cavity and the deep ultraviolet light source fixing unit 83. At the same time, hydrogen peroxide is precisely injected into the annular flow channel through the dosing port on the same side in the middle, and the two are initially mixed in the flow channel. Ferrous sulfate is added from the lower dosing port on the opposite side. Since the bottom opening of the guide pipe 8 is at the same height as the inlet of the ferrous sulfate dosing port 5, the wastewater can be instantly and evenly mixed with ferrous sulfate after flowing out of the guide pipe 8, avoiding premature reaction and loss of the reagent.

[0029] Within the annular flow channel, multiple deep ultraviolet light sources 82 are arranged at intervals along the axial direction of the deep ultraviolet light source fixing unit 83. The deep ultraviolet light sources 82 focus on the key wavelength band for pollutant degradation around 264nm. The photocatalyst-loaded photoconductive cotton 81 covering their outer periphery can uniformly diffuse ultraviolet light. On the one hand, it directly excites the photocatalyst to generate electron-hole pairs. The electrons react with oxygen and hydrogen ions in the wastewater to generate hydroxyl radicals (·OH), while the holes directly oxidize organic pollutants. On the other hand, the deep ultraviolet light simultaneously activates hydrogen peroxide in the mixed liquid, promoting its rapid decomposition to generate a large amount of ·OH. More importantly, the electron-hole pairs generated by photocatalysis can also accelerate the decomposition rate of hydrogen peroxide, breaking the reaction limitations of single photocatalysis or single hydrogen peroxide decomposition, forming a dual hydroxyl radical generation pathway of photocatalytic activation and hydrogen peroxide photolysis, achieving a synergistic effect and significantly enhancing the oxidation capacity for organic pollutants.

[0030] The mixture then flows upward through the bottom support layer 7 into the Fenton reaction zone, where ferrous iron reacts with hydrogen peroxide in a classic Fenton reaction (Fe2+). 2+ +H₂O₂→Fe 3+ +(OH) - The fluidized bed support 6 is in a fluidized state under the action of the upflow, which not only provides a stable three-phase contact interface for the reaction, but also converts the ferric sludge (Fe(OH)3) into FeOOH crystals that can be recycled to participate in the reaction. Finally, the treated wastewater is discharged from the upper outlet 3 after the fluidized bed support 6 intercepts the small sludge particles. The FeOOH crystals can be collected periodically.

[0031] This device, leveraging the deep synergistic effect of photocatalysis and the Fenton reaction, can achieve highly efficient and deep removal of recalcitrant COD from high-concentration industrial wastewater containing recalcitrant organic matter (such as wastewater from amine catalyst production and pesticide production containing toluene / aniline) in fields like new materials and pharmaceuticals. It also exhibits excellent degradation effects on characteristic pollutants such as formaldehyde and phenol. The closed design of the annular flow channel effectively reduces the interference of wastewater color and turbidity on ultraviolet light penetration, maintaining stable treatment efficiency even under conditions of significant water quality fluctuations, and demonstrating significantly better shock resistance than traditional UV-Fenton technology. Utilizing fluidized bed crystallization technology, ferric sludge can be converted into recyclable crystals that participate in the reaction, significantly reducing the dosage of ferrous sulfate and the amount of Fenton sludge generated, thus lowering sludge disposal pressure. The deep ultraviolet light source 82, with its precise spectral design focusing on key wavelengths for pollutant degradation, avoids the energy waste of traditional broadband light sources, significantly improving hydrogen peroxide utilization and further reducing overall operating costs from the reagent consumption perspective.

[0032] Meanwhile, the device adopts an integrated structure of a cylindrical sealed container, highly integrating functions such as photocatalysis, Fenton reaction, fluidized bed crystallization, and solid-liquid separation. This significantly reduces the footprint and pipeline complexity. The modular arrangement of the light source and the adaptable maintenance structure also provide convenience for daily equipment maintenance and component replacement. In addition, the device can break down recalcitrant organic macromolecules into small molecules that are easily utilized by microorganisms, significantly improving the biodegradability of wastewater. This lays a good foundation for subsequent deep biological treatment units and completely solves the core pain points of traditional Fenton technology in the industry, such as limited removal effect of recalcitrant COD, high reagent consumption and sludge production, as well as the low light source efficiency, risk of secondary pollution, and sensitivity to water quality conditions of traditional UV-Fenton technology. It provides an advanced oxidation technology solution that is both economical and efficient for industrial wastewater treatment scenarios with variable water quality and stringent treatment requirements.

[0033] In an optional implementation, an aeration assembly is also included, the aeration assembly comprising: The perforated aeration pipe 9 is horizontally installed at the bottom of the inner cavity of the reactor body 1 and is located below the bottom opening of the guide pipe 8. An air inlet pipe 10 has one end penetrating the bottom side wall of the reactor body 1 and being sealed to the perforated aeration pipe 9, and the other end being connected to an external air source. The aeration direction of the perforated aeration pipe 9 is towards the middle of the inner cavity of the reactor body 1.

[0034] In an optional implementation, the inner wall of the guide tube 8 is provided with a reflective layer.

[0035] In an optional embodiment, the top of the reactor body 1 is provided with an inspection hole 11, the axis of which coincides with the axis of the guide pipe 8.

[0036] In an optional embodiment, the inspection hole 11 is formed by the flow guide 8 extending upward through the top of the reactor body 1.

[0037] In an optional implementation, the bottom outlet of the guide tube 8 is configured as a tapered outlet.

[0038] In an optional implementation, the height of the tapered structure is 300 mm to 500 mm, and the diameter of its bottom outlet is 50 mm to 200 mm.

[0039] In an optional embodiment, the ratio d / D of the inner diameter d of the guide pipe 8 to the diameter D of the reactor body 1 is 0.1:1 to 0.2:1.

[0040] In an optional implementation, the deep ultraviolet light source 82 is a nanochip-type ultraviolet light-emitting diode with an emission peak wavelength of 264nm, which catalyzes the light-conducting cotton to generate hydroxyl radicals ·OH.

[0041] In an optional implementation, the optical fiber contains a photocatalytic semiconductor material, also known as a photocatalyst, which produces a photocatalytic reaction similar to photosynthesis under light, generating highly oxidizing free hydroxyl radicals (·OH) and active oxygen, which have a strong photo-oxidation and reduction function and can oxidize and decompose various organic compounds and some inorganic substances.

[0042] In an optional embodiment, the lower sidewall of the reactor body 1 is further provided with a crystallization discharge hole 12, which is located above the support layer 7.

[0043] To make the objectives, technical solutions, and advantages of this application clearer, the technical solutions of this application will be clearly and completely described below in conjunction with specific embodiments and accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, not all of them, and are not intended to limit the scope of this application. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the scope of protection of this application.

[0044] In one specific embodiment, this application also provides a nanochip-based UV-Fenton reaction integrated device, comprising a reactor body 1, a Fenton reaction component, a guide pipe 8, a photocatalytic reaction component, and is also equipped with an aeration component and auxiliary structures for maintenance, crystallization discharge, etc., as follows: The reactor body 1 is a cylindrical sealed container, with its upper sidewall radially penetrating the inlet 2 and outlet 3, its middle sidewall penetrating a hydrogen peroxide dosing port 4 on the same circumferential side as the inlet 2, and its lower sidewall penetrating a hydrogen peroxide dosing port 4 on the same circumferential side as the outlet 3. The ferrous sulfate dosing port 5 on the side has a crystallization discharge hole 12 located above the subsequent support layer 7 on the lower side wall, and an inspection hole 11 with its axis coinciding with the axis of the guide pipe 8 and its diameter larger than the outer diameter of the guide pipe 8 is located at the top; the Fenton reaction assembly includes a fluidized bed support 6 (which is fluidized under the action of water flow, providing a three-phase contact interface) horizontally fixed in the middle of the inner cavity of the reactor body 1, and a support layer 7 (which supports the support, distributes water evenly, and intercepts sludge) laid at the bottom of the inner cavity and above the ferrous sulfate dosing port 5; the guide pipe 8 is vertically installed on the side of the reactor body 1. The reactor body 1 has a central cavity, with its top end higher than the fluidized bed support 6 and sealed to the inlet 2 and hydrogen peroxide dosing port 4. Its bottom end penetrates the fluidized bed support 6 and the support layer 7, with the bottom opening at the same height as the ferrous sulfate dosing port 5 inlet. A reflective layer is provided on the inner wall. The bottom outlet is a tapered conical structure with a height of 400mm and a bottom diameter of 125mm. The ratio of the inner diameter d of its guide pipe 8 to the diameter D of the reactor body 1 is 0.15:1. The photocatalytic reaction assembly includes a deep ultraviolet light source fixed unit coaxially sleeved within the guide pipe 8 to form an annular flow channel. The reactor body 1 has a fixed unit 83 and multiple deep ultraviolet light sources 82 (which are nano-chip ultraviolet light-emitting diodes with a peak emission wavelength of 264nm and photoconductive cotton 81 with a photocatalyst loaded on the outer periphery) spaced apart along the axial direction of the fixed unit 83; the aeration component includes a perforated aeration pipe 9 horizontally located at the bottom of the inner cavity of the reactor body 1 and below the bottom opening of the guide pipe 8, with the aeration direction facing the middle of the inner cavity, and an air inlet pipe 10 with one end passing through the bottom side wall of the reactor body 1 and sealed to the perforated aeration pipe 9, and the other end connected to an external air source. Wastewater to be treated enters through inlet 2 and flows through the annular channel of guide pipe 8 and deep ultraviolet light source fixing unit 83, where it is initially mixed with hydrogen peroxide. Under the synergy of deep ultraviolet light source 82 and light guide cotton 81, a photocatalytic reaction occurs, activating hydrogen peroxide to generate hydroxyl radicals. The hydroxyl radicals then flow out from the conical outlet at the bottom of guide pipe 8 and mix with ferrous sulfate. The wastewater flows upward through support layer 7 and enters the fluidized bed support 6 area, where a Fenton reaction occurs to degrade organic matter (part of the ferric sludge is converted into FeOOH crystals). Finally, after the sludge is intercepted by the fluidized bed support 6, the wastewater is discharged from outlet 3. The FeOOH crystals are collected periodically through crystallization discharge hole 12. The whole system achieves multi-functional integration, improving treatment efficiency and reducing costs.

[0045] To verify the excellent performance of the nanochip-based UV-Fenton reaction integrated device of this application, two application examples are provided as follows: Example 1 The wastewater in this embodiment is high-concentration process wastewater generated during the production of two amine catalysts: DMCHA (N,N-dimethylcyclohexylamine) and PMDETA (pentamethyldiethylenetriamine). After homogenization and equalization in a regulating tank and pH adjustment to 3-4 in a pH adjustment tank, the wastewater enters the nanochip-type UV-Fenton reaction integrated device. The water quality indicators upon entering the treatment system are as follows: CODcr: 269500 ​​mg / L; Formaldehyde: 910 mg / L Phenol: 74 mg / L The project water volume is 100m³ 3 The process conditions for the nanochip-based integrated UV-Fenton reaction device are as follows: / d Dwell time inside the device: 1.0 h; Reactor body dimensions: The diameter of the cylindrical sealed container is φ1.2m, and the height is 5.0m; Temperature: 20-35℃; After being homogenized and homogenized in a regulating tank and adjusted to pH 3-4 in a pH adjustment tank, the wastewater enters the nanochip-type UV-Fenton reaction integrated device. The effluent quality indicators of the system after treatment are as follows: CODcr: 21520 mg / L; Formaldehyde: 180 mg / l Phenol: 15 mg / l Therefore, this embodiment demonstrates excellent removal rates for COD, formaldehyde, and phenol.

[0046] Example 2 The wastewater used in this embodiment is high-concentration process wastewater generated during the production of products such as thiamethoxam, fluopyram, bromoxynil octanoate technical grade, betaine, betaine sulfadiazine technical grade, metalaxyl technical grade, pyraclostrobin technical grade, suspension concentrates, emulsions, water-in-oil emulsions, and wettable powders. After evaporation pretreatment and defluorination pretreatment, and pH adjustment to 3-4, the wastewater enters the nanochip-type UV-Fenton reaction integrated device. The water quality indicators upon entering the treatment system are as follows: CODcr: 26000 mg / L; Toluene: 456 mg / L Aniline: 324 mg / L The project water volume is 75m³ 3 The process conditions for the nanochip-based integrated UV-Fenton reaction device are as follows: / d Dwell time inside the device: 1.0 h; Reactor body dimensions: The diameter of the cylindrical sealed container is φ1.2m, and the height is 5.0m; Temperature: 20-35℃; After evaporation pretreatment and defluorination pretreatment, and pH adjustment to 3-4, the wastewater enters the nanochip-based UV-Fenton reaction integrated device. The effluent quality indicators of the system after treatment are as follows: CODcr: 20800 mg / L; Toluene: 92 mg / L; Aniline: 129 mg / L.

[0047] Therefore, this embodiment demonstrates excellent removal rates for COD, toluene, and aniline.

[0048] Although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

[0049] The detailed descriptions listed above are merely specific descriptions of feasible implementation methods of this application and are not intended to limit the scope of protection of this application. All equivalent implementation methods or modifications made without departing from the spirit of the art of this application should be included within the scope of protection of this application.

Claims

1. A nanochip-based integrated UV-Fenton reaction device, characterized in that, include: The reactor body is a cylindrical sealed container. An inlet, an outlet, a hydrogen peroxide dosing port, and a ferrous sulfate dosing port are provided on the side wall of the reactor body. The inlet and outlet are radially opposite to each other and penetrate the upper side wall of the reactor body. The hydrogen peroxide dosing port penetrates the middle side wall of the reactor body and is located on the same circumferential side as the inlet. The ferrous sulfate dosing port penetrates the lower side wall of the reactor body and is located on the same circumferential side as the outlet. The Fenton reaction assembly includes a fluidized bed support and a support layer. The fluidized bed support is horizontally fixed in the middle of the inner cavity of the reactor body, and the support layer is laid at the bottom of the inner cavity of the reactor body and located above the ferrous sulfate dosing port. A guide pipe is vertically installed in the center of the inner cavity of the reactor body. Its top end is higher than the fluidized bed support and is sealed and connected to the water inlet and the hydrogen peroxide dosing port. Its bottom end extends downward and passes through the fluidized bed support and the support layer in sequence. The bottom opening of the guide pipe is at the same height as the inlet of the ferrous sulfate dosing port. A photocatalytic reaction assembly includes a deep ultraviolet light source fixing unit and multiple deep ultraviolet light sources. The deep ultraviolet light source fixing unit is coaxially sleeved inside the guide tube to form an annular flow channel. The multiple deep ultraviolet light sources are spaced apart from top to bottom along the axial direction of the deep ultraviolet light source fixing unit, and each deep ultraviolet light source is surrounded by a light-guiding cotton loaded with a photocatalyst. The deep ultraviolet light source is a nano-chip ultraviolet light-emitting diode. The wastewater to be treated is configured to enter from the inlet, flow through the annular channel between the guide pipe and the deep ultraviolet light source fixing unit, and then flow out from the bottom opening of the guide pipe. It then flows upward through the reaction area where the support layer and the fluidized bed support are located, and finally is discharged from the outlet.

2. The nanochip-based UV-Fenton reaction integrated device according to claim 1, characterized in that, It also includes an aeration assembly, which includes: A perforated aeration pipe is horizontally installed at the bottom of the inner cavity of the reactor body and located below the bottom opening of the guide pipe; An air inlet pipe has one end penetrating the bottom side wall of the reactor body and sealed to the perforated aeration pipe, and the other end connected to an external air source. The aeration direction of the perforated aeration pipe is towards the center of the inner cavity of the reactor body.

3. The nanochip-based UV-Fenton reaction integrated device according to claim 1, characterized in that, The inner wall of the guide tube is provided with a reflective layer.

4. The nanochip-based UV-Fenton reaction integrated device according to claim 1, characterized in that, The reactor body has an inspection hole at the top, and the axis of the inspection hole coincides with the axis of the guide pipe.

5. The nanochip-based UV-Fenton reaction integrated device according to claim 4, characterized in that, The inspection hole is formed by the flow guide extending upward through the top of the reactor body.

6. The nanochip-based UV-Fenton reaction integrated device according to claim 1, characterized in that, The bottom outlet of the guide tube is constructed as a tapered outlet structure.

7. The nanochip-based UV-Fenton reaction integrated device according to claim 6, characterized in that, The height of the tapered structure is 300mm to 500mm, and the diameter of its bottom outlet is 50mm to 200mm.

8. The nanochip-based UV-Fenton reaction integrated device according to claim 1, characterized in that, The ratio d / D of the inner diameter d of the guide pipe to the diameter D of the reactor body is 0.1:1 to 0.2:

1.

9. The nanochip-based UV-Fenton reaction integrated device according to claim 1, characterized in that, The deep ultraviolet light source has an emission peak wavelength of 264nm.

10. The nanochip-based UV-Fenton reaction integrated device according to claim 1, characterized in that, The lower sidewall of the reactor body is also provided with a crystallization discharge hole, which is located above the support layer.

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