Chamber gas supply structure and vacuum coating equipment

Abstract

The utility model discloses chamber gas supply structure and vacuum coating equipment, including several gas supply main pipes and several gas inlet main pipes of intercommunication chamber different area, each gas supply main pipe with any one gas inlet main pipe all is through independent flow control device intercommunication. The utility model is provided with a plurality of gas supply main pipes, and is connected with the gas inlet main pipe of different area in chamber. Each gas supply main pipe and gas inlet main pipe all are controlled through independent flow control device. On the one hand, the timeliness and uniformity of gas delivery are greatly improved, and the process instability caused by local gas concentration deficiency or supersaturation is avoided, on the other hand, different gas supply main pipes can deliver different kinds of special gas, and realize accurate proportioning through flow control, thereby making the chemical reaction in the reaction cavity more controllable, and improving the uniformity of the film. Finally can significantly improve the uniformity and yield of silicon wafer coating, reduce production cost, and effectively improve the production capacity while ensuring the process stability.

Description

Technical Field

[0001] This utility model relates to the field of gas supply technology, and in particular to a chamber gas supply structure and a vacuum coating equipment. Background Technology

[0002] Vacuum coating equipment is used for surface thin film deposition technology in a vacuum environment. It can be divided into PVD (physical vapor deposition), CVD (chemical vapor deposition), RPD (reactive plasma deposition), ALD (atomic layer deposition), and evaporation technology. Specifically, it refers to the deposition of a thin film of a specific material on a substrate such as silicon wafer or glass, so that the substrate has special optical, electrical, and other properties.

[0003] During the coating process, process gases are introduced into the coating reaction chamber through an air inlet assembly, allowing the furnace to process these gases before depositing the coating onto the silicon wafers inside the furnace. The uniformity of the thin film on the silicon wafer surface is closely related to the process gases; untimely delivery can lead to process instability. Currently, the process gases are delivered to the reaction chamber in a single, untimely manner, resulting in poor coating uniformity and a low yield. This increases costs and hinders production capacity. Utility Model Content

[0004] To solve at least one of the above-mentioned technical problems, on the one hand, this utility model provides a chamber gas supply structure, which uses multiple gas supply pipes to control the precise gas supply to multiple areas of the reaction chamber, thereby rapidly improving the uniformity of the gas in the reaction chamber and ensuring the coating quality.

[0005] On the other hand, this utility model also proposes a vacuum coating equipment with a chamber gas supply structure.

[0006] The technical solution adopted in this utility model is to design a chamber air supply structure, including several air supply mains and several air intake mains connecting different areas of the chamber. Each air supply main is connected to any air intake main through an independent flow control device.

[0007] In some embodiments, the main intake pipe is connected to the chamber via an intake assembly. The intake assembly includes an in-chamber intake assembly and an end-side intake assembly that are respectively connected to different main intake pipes. The in-chamber intake assembly is provided with an in-chamber outlet located inside the chamber and arranged along the length of the chamber. The end-side intake assembly is provided with an end-side outlet located at the end of the chamber for supplying air to the end of the chamber.

[0008] In some embodiments, the intracavitary air intake assembly includes an intracavitary air intake pipe communicating with the main air intake pipe, the two ends of which are connected to the chamber via a first connecting assembly, and an intracavitary air outlet is disposed on the intracavitary air intake pipe; the end-side air intake assembly includes an end-side air intake pipe connected to the chamber, one end of which is connected to the main air intake pipe via a second connecting assembly, and the other end extends into the chamber, and an end-side air outlet is disposed on the end-side air intake pipe.

[0009] In some embodiments, each intracavitary air intake assembly includes several intracavitary air intake pipes surrounding the center of the chamber, and each end-side air intake assembly includes several end-side air intake pipes surrounding the center of the chamber.

[0010] In some embodiments, the in-cavity air inlet pipe and the end-side air inlet pipe are evenly distributed circumferentially on the end side of the chamber and spaced apart from each other.

[0011] In some embodiments, the first connecting assembly includes a first positioning tube connected to the end of the chamber and a connecting tube for connecting to the main intake pipe. The connecting tube is fitted inside the first positioning tube. One end of the intake pipe inside the chamber is an open end fitted between the connecting tube and the first positioning tube, and the other end is a closed end. The connecting tube is provided with a first flange, and the first positioning tube is provided with a second flange corresponding to the first flange. A first variable diameter bracket is fitted between the intake pipe inside the chamber and the first positioning tube. A first sealing ring is fitted outside the first variable diameter bracket. The first sealing ring is located between the first flange and the second flange. A second sealing ring is provided between the first variable diameter bracket and the intake pipe inside the chamber. The second flange and the first flange are locked together by a first fastener.

[0012] In some embodiments, the closed end of the inlet pipe is connected to the chamber by a positioning assembly. The positioning assembly includes a third positioning tube communicating with the chamber. The closed end of the inlet pipe passes through the third positioning tube. A sixth flange located outside the third positioning tube is fixed to the closed end of the inlet pipe. A fifth flange corresponding to the sixth flange is provided on the third positioning tube. A third sealing ring and a third reducing bracket supporting the third sealing ring are provided between the sixth flange and the fifth flange. The sixth flange and the fifth flange are locked together by a third fastener. A connector connecting to the positioning point on the outer end of the chamber is provided on the sixth flange, thereby preventing the inlet pipe from rotating.

[0013] In some embodiments, the positioning point on the outer end of the cavity is a positioning hole, and the connecting part includes a stud. One end of the stud is inserted into the positioning hole, and the other end is connected to the sixth flange through a connecting plate. The stud is threaded with a nut that pushes the positioning hole.

[0014] In some embodiments, the second connecting assembly includes a second positioning tube communicating with the end of the chamber, the port of the second positioning tube having a third flange, an end-side air inlet pipe fitted inside the second positioning tube, a fourth flange corresponding to the third flange on the end-side air inlet pipe of the second positioning tube, a fourth sealing ring and a second variable diameter bracket supporting the fourth sealing ring being provided between the third flange and the fourth flange, and the third flange and the fourth flange being locked relative to each other by a second fastener.

[0015] Vacuum coating equipment includes a chamber gas supply structure, and the chamber is a vacuum coating process furnace.

[0016] Compared with the prior art, the present invention has the following beneficial effects: This invention features multiple main gas supply pipes connected to main gas inlets in different areas of the chamber. Each main gas supply pipe and main gas inlet pipe is controlled by an independent flow control device. On one hand, the timeliness and uniformity of gas delivery are significantly improved, avoiding process instability caused by insufficient or oversaturated local gas concentrations. On the other hand, different main gas supply pipes can deliver different types of specialty gases, and precise proportions can be achieved through flow control, making the chemical reaction within the reaction chamber more controllable and improving the uniformity of the thin film. Ultimately, this significantly improves the uniformity and yield of silicon wafer deposition, reduces production costs, and effectively increases production capacity while ensuring process stability. Attached Figure Description

[0017] The present invention will now be described in detail with reference to specific embodiments and accompanying drawings. To illustrate the details and facilitate understanding of its principles, the drawings are not necessarily to scale, and similar reference numerals may describe similar components in different views. The accompanying drawings generally illustrate the embodiments discussed herein by way of example and not limitation. Wherein: Figure 1 This is a schematic diagram of a chamber gas supply structure applied to a vacuum coating process furnace.

[0018] Figure 2 This is a cross-sectional schematic diagram of the process furnace chamber.

[0019] Figure 3 yes Figure 2 Enlarged diagram of point A in the middle.

[0020] Figure 4 yes Figure 2 Enlarged diagram of point B in the middle.

[0021] Figure 5 yes Figure 2 Enlarged diagram of point C in the middle.

[0022] Figure 6 This is a three-dimensional schematic diagram of the process furnace.

[0023] Figure 7yes Figure 6 Enlarged diagram of point D in the middle.

[0024] In the diagram, 1 is the first gas supply main pipe; 2 is the second gas supply main pipe; 31 is the flow meter; and 32 is the control valve. 4. Main air inlet pipe; 5. Process furnace; 51. Chamber; 6. Intra-chamber air inlet pipe; 61. Intra-chamber air outlet; 7. End-side air inlet pipe; 71. End-side air outlet; 8. First positioning pipe; 9. Connecting pipe; 10. First reducing bracket; 11. First flange; 12. Second flange; 13. Third flange; 14. Fourth flange; 15. Fifth flange; 16. Sixth flange; 17. First sealing ring; 18. Second sealing ring; 19. First fastener; 20. Third positioning pipe; 21. Third sealing ring; 22. Third reducing bracket; 23. Third fastener; 24. Stud; 25. Connecting plate; 26. Nut; 27. Second positioning pipe; 28. Fourth sealing ring; 29. ​​Second reducing bracket; 30. Second fastener; 33. First connecting assembly; 34. Second connecting assembly; 35. Process boat; 36. Pipe joint; 37. Positioning assembly. Detailed Implementation

[0025] The following are specific embodiments of this utility model, and the technical solution of this utility model will be further described with reference to the accompanying drawings. However, this utility model is not limited to these embodiments, and the following embodiments do not limit the utility model involved in the claims. In addition, all combinations of features described in the embodiments are not necessarily necessary for the solution of the utility model.

[0026] The principle and structure of this utility model will be described in detail below with reference to the accompanying drawings and embodiments.

[0027] Example like Figure 1 As shown, the gas supply structure of chamber 51 includes several main gas supply pipes and several inlet main pipes 4 connecting different areas of chamber 51. Each main gas supply pipe is connected to any one of the inlet main pipes 4 through an independent flow control device. In this embodiment, there are two main gas supply pipes, namely the first main gas supply pipe 1 and the second main gas supply pipe 2. Chamber 51 is the furnace cavity of vacuum coating process furnace 5.

[0028] Multiple main gas supply pipes are provided and connected to the main gas inlet pipes 4 of different areas within chamber 51. Each main gas supply pipe and the main gas inlet pipe 4 are connected and controlled by an independent flow control device, which in this embodiment includes a flow meter 31 and a control valve 32. The working principle is as follows: when the coating process begins, the process gas first enters the main gas supply pipe and is precisely distributed to different main gas inlet pipes 4 through their respective flow control devices. The main gas inlet pipes 4 then introduce the gas into designated areas of the reaction chamber, thus forming a multi-point, multi-directional uniform gas supply mode. Compared with the traditional single-inlet method, this structure can simultaneously meet the differentiated requirements for the flow rate and composition ratio of the process gas at different locations within chamber 51. By independently controlling the inlet volume and gas composition of different areas, it effectively eliminates the differences in film deposition thickness caused by uneven gas distribution within chamber 51. The technical advantages are twofold: firstly, the timeliness and uniformity of gas delivery are significantly improved, avoiding process instability caused by insufficient or oversaturated local gas concentrations; secondly, different gas supply pipes can deliver different types of specialty gases, and precise proportions can be achieved through flow control, making the chemical reaction within the reaction chamber more controllable and improving the density and consistency of the thin film. Ultimately, this significantly improves the uniformity and yield of silicon wafer coating, reduces production costs, and effectively increases production capacity while ensuring process stability.

[0029] Furthermore, such as Figure 2 As shown, the intake manifold 4 is connected to the chamber 51 through the intake assembly. The intake assembly includes an in-chamber intake assembly and an end-side intake assembly that are respectively connected to different intake manifolds 4. The in-chamber intake assembly is provided with an in-chamber outlet 61 located in the chamber 51 and arranged along the length of the chamber 51. The end-side intake assembly is provided with an end-side outlet 71 located on the end side of the chamber 51 that supplies air to the end side of the chamber 51.

[0030] The main air intake pipe 4 is connected to the chamber 51 via an air intake assembly, which includes an internal air intake assembly and an end-side air intake assembly. The internal air intake assembly has multiple internal air outlets 61 along the length of the chamber 51, enabling uniform air supply to all areas within the chamber 51 under normal operating conditions. However, in certain situations, such as when gas consumption is too rapid in a localized area of ​​the chamber 51 or when the internal air intake flow is insufficient, relying solely on the internal air outlets 61 may be insufficient to meet process requirements. In this case, the end-side air intake assembly comes into play, rapidly replenishing the process gas to the end area of ​​the furnace body through the end-side air outlets 71 located at the end of the chamber 51, effectively compensating for the insufficient internal air intake. Because the end-side air supply can directly enter the end area of ​​the reaction chamber via a short path, complementing the internal air intake, a multi-directional, multi-layered gas delivery pattern is formed throughout the entire chamber 51. The technical benefits of this working method are as follows: on the one hand, it improves the uniformity of the distribution of process gas in chamber 51, avoiding uneven film thickness or edge effects caused by insufficient gas at the ends; on the other hand, the synergistic effect of gas supply inside the chamber and at the ends enhances the overall process stability of the reaction chamber, making the quality of the film deposited on the silicon wafer surface more uniform, significantly improving product yield, and helping to reduce the production capacity loss caused by process fluctuations.

[0031] Furthermore, the intracavity air intake assembly includes an intracavity air intake pipe 6 connected to the main air intake pipe 4. Both ends of the intracavity air intake pipe 6 are connected to the chamber 51 through the first connecting component 33. The intracavity air outlet 61 is provided on the intracavity air intake pipe 6, which is simply a through hole opened on the wall of the intracavity air intake pipe 6. The end-side air intake assembly includes an end-side air intake pipe 7 connected to the chamber 51. One end of the end-side air intake pipe 7 is connected to the main air intake pipe 4 through the second connecting component 34, and the other end extends into the chamber 51. The end-side air outlet 71 is provided on the end-side air intake pipe 7.

[0032] The intracavity air intake assembly is connected to the main air intake pipe 4 via the intracavity air intake pipe 6. Both ends of the intracavity air intake pipe 6 are sealed to the chamber 51 via the first connecting component 33, ensuring a stable and leak-free introduction of gas into the chamber 51. The intracavity air intake pipe 6 is arranged along the length of the chamber 51 and has multiple intracavity air outlets 61 evenly distributed on it. During process operation, the process gas enters the intracavity air intake pipe 6 via the main air intake pipe 4 and is then evenly released into the chamber 51 through each intracavity air outlet 61, thus achieving continuous gas supply to different locations within the chamber 51. Simultaneously, the end-side air intake assembly is connected to the main air intake pipe 4 via the end-side air intake pipe 7. One end of the end-side air intake pipe 7 is connected to the main air intake pipe 4 via the second connecting component 34, while the other end extends directly into the chamber 51. The end-side air outlet 71 on it can directly replenish the process gas in the end region of the chamber 51, forming a bidirectional gas supply mode for the longitudinal and end regions of the chamber 51. Its working principle is to ensure that the required gas can be obtained in a timely manner in different directions and areas inside the chamber 51 through the synergistic effect of the internal gas outlet 61 and the end-side gas outlet 71. The technical effects are: on the one hand, the internal gas inlet pipe 6 provides uniform gas supply along the direction of the chamber 51, allowing the gas to diffuse fully in the deposition area; on the other hand, the end-side gas inlet pipe 7 can quickly replenish the end gas, avoiding film thickness deviations due to thinner end gas. The combination of these two improves the overall uniformity and stability of gas distribution, thereby significantly improving the reliability of the coating process and the uniform quality of the silicon wafer film.

[0033] Furthermore, each intracavity air intake assembly includes several intracavity air intake pipes 6 surrounding the center of the chamber 51, and each end-side air intake assembly includes several end-side air intake pipes 7 surrounding the center of the chamber 51.

[0034] During film deposition, the process boat 35 carrying the silicon wafer is located in the central region of the chamber 51, allowing the process gas to be evenly sprayed onto the process boat 35, improving the uniformity of the thin film. Each chamber inlet assembly is not composed of a single chamber inlet pipe 6, but rather multiple chamber inlet pipes 6 symmetrically distributed around the center of the chamber 51. This allows the process gas to enter the chamber 51 simultaneously from multiple directions during intake, forming a surrounding airflow distribution through the outlets on the chamber inlet pipes 6, thus avoiding flow field deviations caused by unilateral gas supply. Similarly, each end-side inlet assembly is also composed of multiple end-side inlet pipes 7, which are also arranged around the center of the chamber 51, allowing end-side gas to enter from multiple angles at the ends of the chamber 51, ensuring a more uniform gas supply to the end region of the chamber 51. Its working principle lies in utilizing a surrounding inlet structure, so that the gas supply inside the chamber 51 no longer relies on a single point or unidirectional flow, but rather forms a stable and balanced gas distribution field through multi-point, multi-directional coordinated gas supply. The technical advantages are twofold: firstly, it enhances the symmetry of gas flow within chamber 51, avoiding differences in deposition thickness caused by uneven airflow; secondly, the surrounding gas supply improves the mixing and diffusion efficiency of gas within chamber 51, resulting in a denser and more uniform deposition of the thin film on the silicon wafer surface. Ultimately, this effectively improves the consistency and repeatability of the coating process, increases the yield of silicon wafer products, and simultaneously meets the flexible control requirements under different process conditions.

[0035] Furthermore, the internal air inlet pipe 6 and the end-side air inlet pipe 7 are evenly distributed and spaced apart from each other on the circumferential side of the end side of the chamber 51. This three-point even distribution structure forms a symmetrical gas distribution path, allowing the process specialty gas to enter the chamber 51 uniformly from multiple directions, avoiding localized excessively high or insufficient gas concentrations. This multi-point symmetrical gas supply significantly improves the uniformity of gas distribution within the chamber 51, creating a more consistent atmosphere on the silicon wafer surface. This ensures uniformity in coating thickness and quality, improves product yield, and enhances process stability.

[0036] Furthermore, such as Figure 4As shown, the first connecting assembly 33 includes a first positioning tube 8 connected to the end of the chamber 51 and a connecting tube 9 for connecting the main intake pipe 4. The connecting tube 9 is fitted inside the first positioning tube 8. One end of the internal intake pipe 6 is an open end fitted between the connecting tube 9 and the first positioning tube 8, and the other end is a closed end. The connecting tube 9 is provided with a first flange 11, and the first positioning tube 8 is provided with a second flange 12 corresponding to the first flange 11. A first reducing bracket 10 is fitted between the internal intake pipe 6 and the first positioning tube 8. A first sealing ring 17 is fitted on the outside of the first reducing bracket 10. The first sealing ring 17 is located between the first flange 11 and the second flange 12. A second sealing ring 18 is provided between the first reducing bracket 10 and the internal intake pipe 6. The second flange 12 and the first flange 11 are locked together by a first fastener 19, which is a clamp. The upper end of the connecting sleeve is provided with a pipe joint 36 for connecting the external main intake pipe 4.

[0037] The first connecting assembly 33 consists of a first positioning tube 8, a connecting tube 9, a flange structure, a reducing bracket, and a sealing ring. One end of the connecting tube 9 is connected to the main intake pipe 4, and the other end is inserted into and fixed inside the first positioning tube 8. One end of the inlet pipe 6 is sleeved between the connecting tube 9 and the first positioning tube 8 with an open end, and the other end is closed, ensuring that gas can be introduced into the inlet pipe 6 from the main intake pipe 4 through the connecting tube 9. The connecting tube 9 is provided with a first flange 11, and the first positioning tube 8 is provided with a corresponding second flange 12. The two are locked together by a first fastener 19, thereby achieving a stable fixation of the whole assembly. To ensure airtightness, a first reducing bracket 10 is provided between the inlet pipe 6 and the first positioning tube 8, and a first sealing ring 17 is sleeved on its outer side. This sealing ring is located between the two flanges and can provide a reliable circumferential seal after locking. At the same time, a second sealing ring 18 is also provided between the reducing bracket and the inlet pipe 6 to further prevent gas leakage. The connection components are detachable and reliably fixed through the locking method of flanges and fasteners, facilitating installation and maintenance. The double-layer sealing ring design significantly improves airtightness, preventing the adverse effects of special gas leakage on the process and safety. The variable-diameter bracket serves as both transitional support and enhances structural stability. Overall, this solution ensures that the process special gas can be stably and leak-freely delivered to the inlet pipe 6 inside the chamber, thereby guaranteeing the stability of the gas supply to the reaction chamber and the reliability of the coating process.

[0038] Furthermore, such as Figure 5 , 6As shown in Figure 7, the closed end of the inlet pipe 6 is connected to the chamber 51 by a positioning component 37. The positioning component 37 includes a third positioning tube 20 that communicates with the chamber 51. The closed end of the inlet pipe 6 passes through the third positioning tube 20. A sixth flange 16 located outside the third positioning tube 20 is fixed on the closed end of the inlet pipe 6. A fifth flange 15 corresponding to the sixth flange 16 is provided on the third positioning tube 20. A third sealing ring 21 and a third variable diameter bracket 22 supporting the third sealing ring 21 are provided between the sixth flange 16 and the fifth flange 15. The sixth flange 16 and the fifth flange 15 are locked together by a third fastener 23, which is a clamp. A connector connecting the positioning point on the outer end of the chamber 51 is provided on the sixth flange 16 to prevent the inlet pipe 6 from rotating.

[0039] The closed end of the inlet pipe 6 is fixedly connected to the chamber 51 via a positioning assembly 37. Specifically, the closed end of the inlet pipe 6 extends out of the chamber through a third positioning tube 20 mounted on the chamber 51, and a sixth flange 16 is fixed to its end. A fifth flange 15 corresponding to the sixth flange 16 is mounted on the third positioning tube 20, with a sealing ring and a third reducing bracket 22 for supporting the sealing ring sandwiched between them. When the sixth flange 16 and the fifth flange 15 are locked together by the third fastener 23, the sealing ring forms a reliable seal under axial pressure, effectively isolating the interior of the chamber 51 from the outside and preventing leakage of process gas. At the same time, a connector is mounted on the sixth flange 16, which connects to the positioning point on the outer end of the chamber 51 to limit the rotation or displacement of the inlet pipe 6 during installation and operation, thereby ensuring that the outlet on the inlet pipe 6 is always kept in the designed position. Its working principle is to achieve a stable seal by locking the flange and pressing it with the sealing ring, and then provide additional anti-rotation support with the help of the connector. Its technical advantages are as follows: Firstly, it improves the sealing reliability between the air inlet pipe 6 and the chamber 51, preventing special gas leakage from affecting the process environment or causing safety hazards; secondly, the positioning component prevents the air inlet pipe from rotating, ensuring a fixed gas injection direction and a stable and consistent gas distribution within the chamber 51, further improving the uniformity and repeatability of the coating process. It also facilitates maintenance and replacement, exhibiting high structural stability and process adaptability. Furthermore, the positioning point on the outer end of the chamber 51 is a positioning hole, and the connecting part includes a stud 24. One end of the stud 24 is inserted into the positioning hole and the other end is connected to the sixth flange 16 through the connecting plate 25. The stud 24 is threaded with a nut 26 that pushes the positioning hole.

[0040] A positioning hole is provided on the outer end of chamber 51 as a fixing point for the air inlet pipe 6 inside the chamber. The connecting component consists of a stud 24. One end of the stud 24 is inserted into the positioning hole, and the other end is connected to the sixth flange 16 through the connecting plate 25. A nut 26 is used to lock the stud 24 in place with the threaded connection. After the stud 24 is inserted into the positioning hole, it provides a precise positioning reference. Tightening the nut 26 securely connects the stud 24 to the connecting plate 25, thereby achieving stable fixing of the end of the air inlet pipe. The technical advantages of this structure are: it can effectively prevent the air inlet pipe 6 inside the chamber from shaking or rotating during operation, ensure that the direction of the air outlet remains accurate, guarantee the stability of the gas distribution in chamber 51 and the consistency of film deposition, and at the same time, the structure is simple and easy to install and maintain.

[0041] Furthermore, such as Figure 3 As shown, the second connecting assembly 34 includes a second positioning tube 27 connected to the end of the chamber 51. The port of the second positioning tube 27 is provided with a third flange 13. An end-side air inlet pipe 7 is fitted inside the second positioning tube 27. A fourth flange 14 corresponding to the third flange 13 is provided on the end-side air inlet pipe 7 of the second positioning tube 27. A fourth sealing ring 28 and a second reducing bracket 29 supporting the fourth sealing ring 28 are provided between the third flange 13 and the fourth flange 14. The third flange 13 and the fourth flange 14 are locked together by a second fastener 30, which is a clamp. The end-side air inlet pipe 7 is fixedly connected to the fourth flange 14. The upper end of the end-side air inlet pipe 7 is connected to the main air inlet pipe 4 outside the chamber via a pipe connector 36.

[0042] The end-side air intake assembly is sealed to the chamber 51 via the second connecting assembly 34. Specifically, a second positioning tube 27 is provided at the end of the chamber 51, and a third flange 13 is installed on the port of the second positioning tube 27. The end-side air intake pipe 7 is inserted through the second positioning tube 27 and a fourth flange 14 is provided at its end, which corresponds to the third flange 13 on the end-side air intake pipe 7. A sealing ring and a second variable-diameter bracket 29 supporting the sealing ring are sandwiched between the two flanges. When the third flange 13 and the fourth flange 14 are locked relative to each other by the second fastener 30, the sealing ring forms a tight seal under axial pressure, and the second variable-diameter bracket 29 ensures the compression stability and uniformity of the sealing ring, thereby achieving a firm and reliable connection between the end-side air intake pipe 7 and the second positioning tube 27. Its working principle is to ensure that the end-side air intake pipe 7 can stably remain in place when providing process special gas, and that the connection has good airtightness, by using a combination of sleeve and flange locking. On the one hand, it effectively avoids leakage of process gases at the interface, ensuring the purity and stability of the atmosphere in the reaction chamber; on the other hand, the structure of the flange and fasteners makes installation and disassembly more convenient, facilitating the inspection or replacement of the end-side air inlet pipe 7. At the same time, the combination of the second diameter reducing bracket 29 and the sealing ring further improves the sealing reliability and durability of the connection, ensuring a stable and continuous end-side gas supply, thereby improving the uniformity of the overall gas distribution in the chamber 51 and the consistency of the coating process.

[0043] A vacuum coating equipment, wherein the chamber 51 of the chamber gas supply structure is a vacuum coating process furnace 5.

[0044] The specific embodiments described herein are merely illustrative examples illustrating the spirit of this utility model. Those skilled in the art to which this utility model pertains may make various modifications or additions to the described specific embodiments or use similar methods to replace them, without departing from the spirit of this utility model or exceeding the scope defined by the appended claims.

Claims

1. A chamber air supply structure, characterized in that, It includes several main gas supply pipes and several main gas inlet pipes connecting different areas of the chamber. Each of the main gas supply pipes is connected to any one of the main gas inlet pipes through an independent flow control device.

2. The chamber air supply structure according to claim 1, characterized in that, The main intake pipe is connected to the chamber via an intake assembly. The intake assembly includes an in-chamber intake assembly and an end-side intake assembly that are respectively connected to different main intake pipes. The in-chamber intake assembly is provided with an in-chamber outlet located inside the chamber and arranged along the length of the chamber. The end-side intake assembly is provided with an end-side outlet located at the end of the chamber and supplying air to the end of the chamber.

3. The chamber air supply structure according to claim 2, characterized in that, The intracavity air intake assembly includes an intracavity air intake pipe communicating with the main air intake pipe. Both ends of the intracavity air intake pipe are connected to the chamber via a first connecting assembly. The intracavity air outlet is disposed on the intracavity air intake pipe. The end-side air intake assembly includes an end-side air intake pipe connected to the chamber. One end of the end-side air intake pipe is connected to the main air intake pipe via a second connecting assembly, and the other end extends into the chamber. The end-side air outlet is disposed on the end-side air intake pipe.

4. The chamber air supply structure according to claim 3, characterized in that, Each of the intracavity air intake assemblies includes several intracavity air intake pipes surrounding the center of the chamber, and each of the end-side air intake assemblies includes several end-side air intake pipes surrounding the center of the chamber.

5. The chamber air supply structure according to claim 4, characterized in that, The intracavity air inlet pipe and the end-side air inlet pipe are evenly distributed and spaced apart from each other on the circumferential side of the end of the chamber.

6. The chamber air supply structure according to claim 3, characterized in that, The first connecting assembly includes a first positioning tube connected to the end of the chamber and a connecting tube for connecting the main air intake pipe. The connecting tube is sleeved inside the first positioning tube. One end of the air intake pipe is an open end that is sleeved between the connecting tube and the first positioning tube, and the other end is a closed end. The connecting tube is provided with a first flange, and the first positioning tube is provided with a second flange corresponding to the first flange. A first variable diameter bracket is sleeved between the air intake pipe and the first positioning tube. A first sealing ring is sleeved on the outside of the first variable diameter bracket. The first sealing ring is located between the first flange and the second flange. A second sealing ring is provided between the first variable diameter bracket and the air intake pipe. The second flange and the first flange are locked together by a first fastener.

7. The chamber air supply structure according to claim 6, characterized in that, The closed end of the air inlet pipe is connected to the chamber by a positioning assembly. The positioning assembly includes a third positioning tube communicating with the chamber. The closed end of the air inlet pipe passes through the third positioning tube. A sixth flange located outside the third positioning tube is fixed to the closed end of the air inlet pipe. A fifth flange corresponding to the sixth flange is provided on the third positioning tube. A third sealing ring and a third reducing bracket supporting the third sealing ring are provided between the sixth flange and the fifth flange. The sixth flange and the fifth flange are locked together by a third fastener. A connector connecting to the positioning point on the outer end of the chamber is provided on the sixth flange, thereby preventing the air inlet pipe from rotating.

8. The chamber air supply structure according to claim 7, characterized in that, The positioning point on the outer end of the cavity is a positioning hole. The connector includes a stud. One end of the stud is inserted into the positioning hole, and the other end is connected to the sixth flange through a connecting plate. A nut that pushes against the positioning hole is threaded on the stud.

9. The chamber air supply structure according to claim 3, characterized in that, The second connecting assembly includes a second positioning tube communicating with the end of the chamber. The port of the second positioning tube is provided with a third flange. The end-side air inlet pipe is sleeved inside the second positioning tube. The end-side air inlet pipe of the second positioning tube is provided with a fourth flange corresponding to the third flange. A fourth sealing ring and a second variable diameter bracket supporting the fourth sealing ring are provided between the third flange and the fourth flange. The third flange and the fourth flange are locked together by a second fastener.

10. A vacuum coating equipment, characterized in that, Includes the chamber gas supply structure as described in any one of claims 1 to 9, wherein the chamber is a vacuum coating process furnace.

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