Magnetron driving device and vacuum coating equipment

CN224901464UActive Publication Date: 2026-10-27浙江晟霖益嘉科技有限公司
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Patent Information

Application Number
CN202522493468.5
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-11-25
Publication Date
2026-10-27
Estimated Expiration
2035-11-25

AI Technical Summary

Technical Problem

现有技术的磁控管存在靶材利用率不高的问题,现有技术的磁控管采用固定结构,难以根据靶材的刻蚀情况动态调整磁场强度,随着溅射工艺的进行,靶材不断消耗,此时靶材工作面(溅射表面)与磁控管的间距不断缩小,磁场强度则不断增强,进而影响靶材的蚀刻速度和刻蚀形貌,随着磁场强度的不断增强,靶材工作面的刻蚀凹槽也越来越尖锐,从而降低靶材的利用率和镀膜的均匀性

Benefits of technology

[0004]本申请旨在一定程度上解决相关技术中的技术问题之一。为此,本申请提供了一种磁控管驱动装置及真空镀膜设备,能够根据靶材的刻蚀情况动态调整靶材工作面的磁场强度,进而提高靶材利用率和镀膜的均匀性。

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Abstract

The utility model discloses a magnetron drive arrangement and vacuum coating equipment, wherein, magnetron drive arrangement is used to drive magnetron etching target material and forms etching groove at target material working surface, and the surface of target material towards the side of the workpiece to be coated is working surface, and the back of target material working surface faces magnetron, and the drive arrangement includes drive assembly and ranging assembly respectively located at both sides of target material, and drive assembly includes first drive mechanism and second drive mechanism, and first drive mechanism is used to drive magnetron rotary motion, and second drive mechanism is used to drive magnetron linear motion to adjust the distance between magnetron and the working surface of target material, and ranging assembly is used to detect the etching depth of target material. The utility model can adjust the distance between magnetron and target material working surface according to the etching condition of target material, and then adjust the magnetic field intensity of the magnetic field generated by magnetron on target material working surface, and then improve target material utilization and the uniformity of coating.
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Description

Technical Field

[0001] This application relates to the field of vacuum coating equipment technology, and in particular to a magnetron drive device and vacuum coating equipment. Background Technology

[0002] Physical vapor deposition (PVD) is a technique that uses physical methods under vacuum conditions to vaporize a material source and deposit it onto a substrate surface to form a thin film with special functions.

[0003] Magnetron sputtering is a major category of physical vapor deposition (PVD) technology. With continuous technological advancements, the requirements for existing PVD coatings are becoming increasingly stringent, particularly regarding film thickness uniformity, stress uniformity, and target utilization. In magnetron sputtering systems, the position adjustment and motion optimization of the magnetron significantly impact target utilization and film quality. Existing magnetrons suffer from low target utilization. Their fixed structure makes it difficult to dynamically adjust the magnetic field strength based on target etching progress. As the sputtering process continues, the target is consumed, leading to a decrease in the distance between the target working surface (sputtering surface) and the magnetron, while simultaneously increasing the magnetic field strength. This affects the etching rate and morphology of the target. Furthermore, the increasing magnetic field strength results in sharper etching grooves on the target working surface, further reducing target utilization and coating uniformity. Utility Model Content

[0004] This application aims to address one of the technical problems in related technologies to a certain extent. To this end, this application provides a magnetron drive device and a vacuum coating equipment, which can dynamically adjust the magnetic field strength of the target working surface according to the etching condition of the target, thereby improving the target utilization rate and the uniformity of the coating.

[0005] To achieve the above objectives, this application adopts the following technical solution: a magnetron driving device for driving a magnetron to etch a target material and form an etching groove on the working surface of the target material. The surface of the target material facing the workpiece to be coated is the working surface, and the back surface of the working surface of the target material faces the magnetron. The driving device includes a driving assembly and a ranging assembly located on both sides of the target material. The driving assembly includes a first transmission mechanism and a second transmission mechanism. The first transmission mechanism is used to drive the magnetron to rotate, and the second transmission mechanism is used to drive the magnetron to move linearly to adjust the distance between the magnetron and the working surface of the target material. The ranging assembly is used to detect the etching depth of the target material.

[0006] In this technical solution, the magnetron is driven to rotate by the first transmission mechanism of the drive assembly to form a magnetic field for etching the target material. The magnetron is driven to move linearly by the second transmission mechanism of the drive assembly to adjust the distance between the magnetron and the working surface of the target material, thereby adjusting the magnetic field strength of the magnetic field formed by the magnetron on the working surface of the target material. This ensures that the magnetic field strength of the working surface of the target material remains stable during the etching process, solving the problem in the prior art where the magnetic field strength of the working surface of the target material continuously increases as the target material is consumed. This technical solution also uses a ranging component to detect the etching depth of the target material, thereby controlling the linear movement distance of the magnetron accordingly. This ensures that the distance between the magnetron and the working surface of the target material is always maintained at a set distance, thereby improving the utilization rate of the target material and the uniformity of the coating.

[0007] Preferably, the ranging component includes a laser rangefinder and a baffle. A shield is provided between the laser rangefinder and the target material. A detection hole is provided on the shield. The baffle is used to control the opening or closing of the detection hole. The detection light emitted by the laser rangefinder passes through the detection hole and is directed towards the working surface of the target material to detect the etching depth of the magnetron on the working surface of the target material.

[0008] Preferably, the baffle is fixedly connected to a transmission rod, and the transmission rod is also fixedly connected to a rotary drive mechanism. The rotary drive mechanism drives the baffle to rotate through the transmission rod to control the opening or closing of the detection hole.

[0009] Preferably, the rotary drive mechanism includes a cylinder, a cylinder seat, a coupling, and an oil seal. The cylinder seat is used to fix the cylinder, the cylinder is used to drive the transmission rod to rotate, the output shaft of the cylinder is fixedly connected to the transmission rod through the coupling, and the oil seal is sleeved on the transmission rod.

[0010] Preferably, the first transmission mechanism includes a first drive motor and a mounting plate. The mounting plate is fixedly connected to the output shaft of the first drive motor. The mounting plate is also used to mount the magnetron so that the first drive motor drives the magnetron to rotate.

[0011] Preferably, the second transmission mechanism includes a second drive motor and a ball screw. The ball screw includes a screw and a nut. One of the screw and the nut is fixedly connected to the output shaft of the second drive motor, and the other is fixedly connected to the first drive motor, so that the second drive motor can drive the first drive motor and the magnetron to move linearly.

[0012] Preferably, the drive assembly further includes a motor mount, the motor mount forming a mounting chamber with an open end, the first drive motor, the second drive motor and the ball screw are all located in the mounting chamber of the motor mount, the second drive motor is fixedly connected to the bottom of the mounting chamber, and the output shaft of the first drive motor extends out of the open end of the mounting chamber.

[0013] Preferably, a plurality of guide rails are provided on the inner side wall of the mounting chamber, and a plurality of sliders corresponding to the guide rails are provided on the outer side wall of the first drive motor, so that the first drive motor moves linearly along the guide rails.

[0014] Preferably, a displacement sensor is also provided at the bottom of the mounting chamber of the motor base, and a detection block that moves with the first drive motor is provided on the outer bottom surface of the first drive motor. The displacement sensor can obtain the position information of the detection block.

[0015] In addition, to achieve the above objectives, this application also proposes a vacuum coating equipment, including a housing, on which a magnetron drive device as described in any of the above technical solutions is disposed, a process chamber is formed inside the housing, a magnetron and a target are disposed inside the process chamber, a chamber cover is disposed above the process chamber, a drive assembly for driving the magnetron is disposed on the chamber cover, and a ranging assembly is disposed at the bottom of the process chamber.

[0016] These features and advantages of this application will be disclosed in detail in the following specific embodiments and accompanying drawings. The best embodiments or means of this application will be shown in detail in conjunction with the accompanying drawings, but are not intended to limit the technical solutions of this application. In addition, each of these features, elements and components appearing in the following text and drawings is multiple and is labeled with different symbols or numbers for convenience, but all represent parts with the same or similar structure or function. Attached Figure Description

[0017] The following description, in conjunction with the accompanying drawings, further illustrates this application: Figure 1 This is a cross-sectional schematic diagram of the vacuum coating equipment according to an embodiment of this application; Figure 2 This is a cross-sectional schematic diagram of the driving component according to an embodiment of this application; Figure 3 This is a cross-sectional schematic diagram of the ranging component according to an embodiment of this application.

[0018] The components are as follows: 1. Housing; 5. Target material; 7. Cavity cover; 8. Protective cover; 11. Mounting plate; 12. Magnetron; 15. Process shield; 18. Wafer; 19. Detection hole; 20. Laser rangefinder; 21. Etching groove; 100. Rangefinding assembly; 101. Cylinder; 102. Coupling; 103. Transmission rod; 104. Baffle; 105. Cylinder seat; 106. Oil seal; 200. Drive assembly; 202. Mounting base; 204. First drive motor; 206. Motor seat; 207. Second drive motor; 208. Ball screw; 209. Guide rail; 213. Slider; 217. Displacement sensor; 218. Detection block. Detailed Implementation

[0019] The embodiments of this application are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described are intended to explain this application and should not be construed as limiting it.

[0020] The terms "an embodiment," "example," or "example" used in this specification refer to a particular feature, structure, or characteristic described in connection with the embodiment itself that may be included in at least one embodiment disclosed in this application. The phrase "in an embodiment" appearing in various places throughout the specification does not necessarily refer to the same embodiment.

[0021] like Figures 1 to 3 As shown, this embodiment proposes a magnetron 12 driving device for driving the magnetron 12 to etch a target 5 and form an etching groove 21 on the working surface of the target 5. The surface of the target 5 facing the workpiece to be coated is the working surface, and the back surface of the working surface of the target 5 faces the magnetron 12. The driving device includes a driving component 200 and a ranging component 100 located on both sides of the target 5. The driving component 200 includes a first transmission mechanism and a second transmission mechanism. The first transmission mechanism is used to drive the magnetron 12 to rotate, and the second transmission mechanism is used to drive the magnetron 12 to move linearly to adjust the distance between the magnetron 12 and the working surface of the target 5. The ranging component 100 is used to detect the etching depth of the target 5.

[0022] In this technical solution, the magnetron 12 is driven to rotate by the first transmission mechanism of the drive assembly 200 to form a magnetic field for etching the target material 5. The magnetron 12 is driven to move linearly by the second transmission mechanism of the drive assembly 200 to adjust the distance between the magnetron 12 and the working surface of the target material 5, thereby adjusting the magnetic field strength of the magnetic field formed by the magnetron 12 on the working surface of the target material 5. This ensures that the magnetic field strength of the working surface of the target material 5 remains stable during the etching process, solving the problem in the prior art where the magnetic field strength of the working surface of the target material 5 continuously increases as the target material 5 is consumed. This technical solution also uses the ranging assembly 100 to detect the etching depth of the target material 5, thereby controlling the linear movement distance of the magnetron 12 accordingly, so that the distance between the magnetron 12 and the working surface of the target material 5 is always kept at a set distance, thereby improving the utilization rate of the target material 5 and the uniformity of the coating.

[0023] In some embodiments, such as Figure 1 As shown, the ranging component 100 includes a laser rangefinder 20 and a baffle 104. A shield is provided between the laser rangefinder 20 and the target material 5. A detection hole 19 is provided on the shield. The baffle 104 is used to control the opening or closing of the detection hole 19. The detection light emitted by the laser rangefinder 20 passes through the detection hole 19 and is directed towards the working surface of the target material 5 to detect the etching depth of the magnetron 12 on the working surface of the target material 5.

[0024] In some embodiments, such as Figure 3 As shown, the baffle 104 is fixedly connected to a transmission rod 103, and the transmission rod 103 is also fixedly connected to a rotary drive mechanism. The rotary drive mechanism drives the baffle 104 to move via the transmission rod 103, thereby controlling the opening or closing of the detection hole 19. The baffle 104 is used to prevent particles generated during sputtering from damaging or contaminating the lens of the laser rangefinder 20. The detection hole 19 is only opened by controlling the baffle 104 when detection is required. The laser rangefinder 20 uses a high-precision laser sensor, which can accurately measure the etching depth of the working surface of the target material 5.

[0025] In some embodiments, such as Figure 3As shown, the rotary drive mechanism includes a cylinder 101, a cylinder seat 105, a coupling 102, and an oil seal 106. The cylinder seat 105 is used to fix the cylinder 101, and the cylinder 101 is used to drive the transmission rod 103 to rotate. The output shaft of the cylinder 101 is fixedly connected to the transmission rod 103 through the coupling 102, and the oil seal 106 is sleeved on the transmission rod 103. The laser rangefinder 20 emits a laser upward through the detection hole 19 on the process shield 15 to detect the depth of the etching groove 21 of the target material 5. The baffle 104 is connected to the transmission rod 103, and the transmission rod 103 is connected to the output shaft of the cylinder 101 through the coupling 102. The cylinder 101 is mounted on the cylinder seat 105, and the cylinder seat 105 is mounted on the housing 1 of the vacuum coating equipment. An oil seal 106 is installed between the transmission rod 103 and the process chamber to achieve the purpose of vacuum sealing. Thus, the cylinder 101 can control the opening and closing of the detection hole 19 by the baffle 104 under vacuum.

[0026] In some embodiments, such as Figure 2 As shown, the first transmission mechanism includes a first drive motor 204 and a mounting plate 11. The mounting plate 11 is fixedly connected to the output shaft of the first drive motor 204. The mounting plate 11 is also used to mount the magnetron 12, so that the first drive motor 204 drives the magnetron 12 to rotate. The first drive motor 204 is a direct drive motor, that is, the output shaft of the first drive motor 204 is fixedly connected to the mounting plate 11 and drives the mounting plate 11 to rotate, thereby driving the magnetron 12 fixedly connected to the mounting plate 11 to rotate.

[0027] In some embodiments, such as Figure 2 As shown, the second transmission mechanism includes a second drive motor 207 and a ball screw 208. The ball screw 208 includes a screw and a nut. One of the screw and the nut is fixedly connected to the output shaft of the second drive motor 207, and the other is fixedly connected to the first drive motor 204, so that the second drive motor 207 can drive the first drive motor 204 and the magnetron 12 to move linearly.

[0028] In some embodiments, such as Figure 1 , 2 As shown, the drive assembly 200 also includes a motor base 206, which forms a mounting chamber with an open end. The first drive motor 204, the second drive motor 207, and the ball screw 208 are all located in the mounting chamber of the motor base 206. The second drive motor 207 is fixedly connected to the bottom of the mounting chamber, and the output shaft of the first drive motor 204 extends out of the open end of the mounting chamber.

[0029] In some embodiments, such as Figure 2As shown, a plurality of guide rails 209 are provided on the inner side wall of the installation chamber, and a plurality of sliders 213 corresponding to the guide rails 209 are provided on the outer side wall of the first drive motor 204. The sliders 213 are slidably connected to the guide rails 209, so that the first drive motor 204, which is fixedly connected to the sliders 213, moves linearly along the guide rails 209, thereby achieving the purpose of adjusting the distance between the magnetron 12 and the working surface of the target material 5.

[0030] In some embodiments, such as Figure 2 As shown, a displacement sensor 217 is also provided at the bottom of the mounting chamber of the motor base 206. A detection block that moves with the first drive motor 204 is provided on the outer bottom surface of the first drive motor 204. The displacement sensor 217 can acquire the position information of the detection block. By acquiring the position information of the detection block through the displacement sensor 217, the moving distance of the first drive motor 204 along the height direction shown in the figure under the drive of the second drive motor 207 can be obtained. The moving distance data of the first drive motor 204 is then fed back to the control system of the second drive motor 207, thereby controlling the driving state of the second drive motor 207, and thus achieving precise control of the moving distance of the magnetron 12 along the height direction.

[0031] like Figure 1 As shown, this application also proposes a vacuum coating apparatus, including a housing 1, on which a magnetron 12 driving device as described in any of the above technical solutions is provided. A process chamber is formed inside the housing 1, and a magnetron 12 and a target material 5 are disposed inside the process chamber. A chamber cover 7 is disposed above the process chamber, and a driving component 200 for driving the magnetron 12 is disposed on the chamber cover 7. A ranging component 100 is disposed at the bottom of the process chamber, and the driving component 200 and the ranging component 100 are respectively located on the upper and lower sides of the target material 5.

[0032] The above are merely specific embodiments of this application, but the scope of protection of this application is not limited thereto. Those skilled in the art should understand that this application includes, but is not limited to, the contents described in the accompanying drawings and the specific embodiments above. Any modifications that do not depart from the functional and structural principles of this application will be included within the scope of the claims.

Claims

1. A magnetron driving device for driving a magnetron (12) to etch a target (5) and form an etching groove (21) on the working surface of the target (5), wherein the surface of the target (5) facing the workpiece to be coated is the working surface, and the back surface of the working surface of the target (5) faces the magnetron (12), characterized in that, The driving device includes a driving assembly (200) and a ranging assembly (100) located on both sides of the target (5). The driving assembly (200) includes a first transmission mechanism and a second transmission mechanism. The first transmission mechanism is used to drive the magnetron (12) to rotate. The second transmission mechanism is used to drive the magnetron (12) to move linearly to adjust the distance between the magnetron (12) and the working surface of the target (5). The ranging assembly (100) is used to detect the etching depth of the target (5).

2. The magnetron drive device according to claim 1, characterized in that, The ranging component (100) includes a laser rangefinder (20) and a baffle (104). A shield is provided between the laser rangefinder (20) and the target material (5). A detection hole (19) is provided on the shield. The baffle (104) is used to control the opening or closing of the detection hole (19). The detection light emitted by the laser rangefinder (20) passes through the detection hole (19) and is directed towards the working surface of the target material (5) to detect the etching depth of the magnetron (12) on the working surface of the target material (5).

3. The magnetron drive device according to claim 2, characterized in that, The baffle (104) is fixedly connected to a transmission rod (103), and the transmission rod (103) is also fixedly connected to a rotary drive mechanism. The rotary drive mechanism drives the baffle (104) to rotate through the transmission rod (103) to control the opening or closing of the detection hole (19).

4. The magnetron drive device according to claim 3, characterized in that, The rotary drive mechanism includes a cylinder (101), a cylinder seat (105), a coupling (102), and an oil seal (106). The cylinder seat (105) is used to fix the cylinder (101). The cylinder (101) is used to drive the transmission rod (103) to rotate. The output shaft of the cylinder (101) is fixedly connected to the transmission rod (103) through the coupling (102). The oil seal (106) is sleeved on the transmission rod (103).

5. The magnetron drive device according to any one of claims 1 to 4, characterized in that, The first transmission mechanism includes a first drive motor (204) and a mounting plate (11). The mounting plate (11) is fixedly connected to the output shaft of the first drive motor (204). The mounting plate (11) is also used to mount the magnetron (12) so that the first drive motor (204) drives the magnetron (12) to rotate.

6. The magnetron drive device according to claim 5, characterized in that, The second transmission mechanism includes a second drive motor (207) and a ball screw (208). The ball screw (208) includes a screw and a nut. One of the screw and the nut is fixedly connected to the output shaft of the second drive motor (207), and the other is fixedly connected to the first drive motor (204), so that the second drive motor (207) can drive the first drive motor (204) and the magnetron (12) to move linearly.

7. The magnetron drive device according to claim 6, characterized in that, The drive assembly (200) further includes a motor mount (206), which forms a mounting chamber with an open end. The first drive motor (204), the second drive motor (207), and the ball screw (208) are all located in the mounting chamber of the motor mount (206). The second drive motor (207) is fixedly connected to the bottom of the mounting chamber, and the output shaft of the first drive motor (204) extends out of the open end of the mounting chamber.

8. The magnetron drive device according to claim 7, characterized in that, The inner wall of the installation chamber is provided with a plurality of guide rails (209), and the outer wall of the first drive motor (204) is provided with a plurality of sliders (213) that are slidably connected to the guide rails (209) so that the first drive motor (204) moves linearly along the guide rails (209).

9. The magnetron drive device according to claim 7, characterized in that, A displacement sensor (217) is also provided at the bottom of the mounting chamber of the motor base (206). A detection block that moves with the first drive motor (204) is provided on the outer bottom surface of the first drive motor (204). The displacement sensor (217) can obtain the position information of the detection block.

10. A vacuum coating apparatus, comprising a housing (1), characterized in that, The housing (1) is provided with a magnetron drive device as described in any one of claims 1 to 9. A process chamber is formed inside the housing (1). A magnetron (12) and a target material (5) are provided inside the process chamber. A chamber cover (7) is provided above the process chamber. A drive assembly (200) for driving the magnetron (12) is provided on the chamber cover (7). A ranging assembly (100) is provided at the bottom of the process chamber.