A sputtering film deposition heating device

Abstract

The utility model relates to magnetron sputtering equipment technical field, concretely relates to a sputtering coating heating device, including the casing, chamber is opened in the casing, the casing is equipped with two corresponding open ends with chamber intercommunication, open end all is provided with the valve, chamber is equipped with the conveying spare for conveying the sputtering substrate of waiting, the conveying spare one side is provided with the heating plate that sets up in the chamber, the first telescopic push rod is set up outside the casing, the output of first telescopic push rod penetrates the lateral wall of casing and is connected with the heating plate, the second telescopic push rod is set up in the lateral wall of casing, and the auxiliary cover between the heating plate and the chamber wall is connected to the output end of the second telescopic push rod, the opening that is arranged with the center of the heating plate and is matched is opened to the auxiliary cover, the opening of the opening is smaller than the side area of the side of the heating plate and the opening is set to each other, the utility model improves the utilization of heat.

Description

Technical Field

[0001] This utility model relates to the field of magnetron sputtering equipment technology, and in particular to a sputtering coating heating device. Background Technology

[0002] Magnetron sputtering, as a core process in thin film preparation, has been widely applied in industries such as semiconductors, optoelectronic displays, new energy, and hard coatings due to its advantages of fast deposition rate, strong film adhesion, and high controllability of composition. Its principle is to bombard a target material with high-energy particles, causing the target atoms to detach and deposit onto the substrate surface to form a thin film.

[0003] Currently, multi-cavity coating equipment is used for larger-sized coatings. The heating method is mostly to radiate heat into the cavity through heating wires connected to the cavity wall. The heating source is far away from the substrate to be sputtered, which results in a large difference between the set temperature and the actual temperature reached on the substrate, often failing to meet the actual experimental requirements.

[0004] For example, on November 9, 2021, a document with announcement number CN214655228U, entitled "A Continuous Multi-Cavity Vacuum Coating Machine," was published. This machine includes a feeding chamber, a coating chamber, and a discharging chamber. The discharging port of the feeding chamber is connected to the feeding port of the coating chamber, and the discharging port of the coating chamber is connected to the feeding port of the discharging chamber. The feeding port of the feeding chamber is equipped with a first gate valve, the connection between the feeding chamber and the coating chamber is equipped with a second gate valve, the connection between the coating chamber and the discharging chamber is equipped with a third gate valve, and the discharging port of the discharging chamber is equipped with a fourth gate valve. Each of the feeding chamber, coating chamber, and discharging chamber is equipped with a conveying mechanism for transporting materials. The vacuum coating machine also includes a vacuum pumping device and a heating device. Heating grids on the heating device are respectively arranged in the feeding chamber and the coating chamber for baking the coated sheets. However, the distance between the heating device and the coated sheets cannot be adjusted, and the heating effect needs improvement. Summary of the Invention

[0005] In view of this, the purpose of this utility model is to propose a sputtering coating heating device to solve the problem that the heating effect needs to be improved.

[0006] To achieve the above objectives, this utility model provides a sputtering coating heating device, comprising a housing, a chamber within the housing, and two corresponding open ends communicating with the chamber. Each open end is equipped with a valve. A conveying component for conveying a substrate to be sputtered is provided within the chamber. A heating plate is disposed within the chamber on one side of the conveying component. A first telescopic push rod is disposed outside the housing, with its output end penetrating the side wall of the housing and connected to the heating plate. A second telescopic push rod is disposed on the outer side wall of the housing, with its output end connected to an auxiliary cover located between the heating plate and the chamber wall. The auxiliary cover has an opening at the same height as and cooperating with the center of the heating plate, the cross-sectional area of ​​which is smaller than the side surface area of ​​the heating plate facing the opening.

[0007] Optionally, a vacuum pump is installed on the outer wall of the housing, and the vacuum pump is connected to the chamber via a solenoid valve.

[0008] Optionally, a heating wire is provided inside the heating plate, a power supply is provided on the outer wall of the housing, and a transmission wire is connected between the power supply and the heating wire. The transmission wire is electrically connected to the heating wire through an electric wire.

[0009] Optionally, a telescopic sleeve is connected between the heating plate and the chamber, and the wire extends into the telescopic sleeve and is electrically connected to the heating wire.

[0010] Optionally, the valve can be a slide gate valve.

[0011] Optionally, the auxiliary cover is connected to the chamber wall via a limiting sleeve, the axis of which is parallel to the axis of the second telescopic push rod.

[0012] Optionally, the heating plate has a first annular protrusion on the side facing the opening, and the auxiliary cover has a second protrusion on the side facing the heating plate.

[0013] Optionally, an insulation layer is provided on the outer side of the auxiliary cover and on the side where the heating plate is connected to the first telescopic push rod.

[0014] The beneficial effects of this utility model are as follows: The sputtering coating heating device provided by this utility model allows for the control of the extension and retraction of the first telescopic push rod when heating the substrate to be sputtered in the chamber. This facilitates the adjustment of the distance between the heating plate and the substrate. Once the position is appropriate, the second telescopic push rod is activated, controlling the auxiliary cover to move towards the heating plate until the auxiliary cover abuts against the heating plate. The heating plate then seals the opening on the auxiliary cover, thus concentrating most of the heat generated by the heating plate within the auxiliary cover. This facilitates the effective utilization of heat, improving the heat utilization rate, coating effect, and production efficiency when the substrate to be sputtered is heated in the heating device. Attached Figure Description

[0015] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0016] Figure 1 This is a schematic diagram of the structure of this utility model;

[0017] Figure 2 This is a schematic diagram of the internal structure of this utility model.

[0018] In the figure: 1. Shell; 2. Chamber; 3. First telescopic push rod; 4. Heating plate; 5. Heating wire; 6. Power supply; 7. Transmission wire; 8. Wire; 9. Telescopic sleeve; 10. Second telescopic push rod; 11. Restriction sleeve; 12. Auxiliary cover; 13. Opening; 14. First protrusion; 15. Second protrusion. Detailed Implementation

[0019] To make the objectives, technical solutions, and advantages of this utility model clearer, the present utility model will be further described in detail below with reference to specific embodiments and accompanying drawings.

[0020] It should be noted that, unless otherwise defined, the technical or scientific terms used in the embodiments of this utility model should have the ordinary meaning understood by one of ordinary skill in the art to which this utility model pertains. The terms "first," "second," and similar terms used in this utility model do not indicate any order, quantity, or importance, but are merely used to distinguish different components. Terms such as "comprising" or "including" mean that the element or object preceding the word encompasses the elements or objects listed following the word and their equivalents, without excluding other elements or objects. Terms such as "connected" or "linked" are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. Terms such as "upper," "lower," "left," and "right" are only used to indicate relative positional relationships; when the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0021] like Figures 1 to 2 As shown, a sputtering coating heating device includes a housing 1, a chamber 2 inside the housing 1, and two corresponding openings communicating with the chamber 2. Each opening is equipped with a valve. A conveyor for conveying a substrate to be sputtered is provided inside the chamber 2. A heating plate 4 is disposed inside the chamber 2 on one side of the conveyor. A first telescopic push rod 3 is disposed outside the housing 1. The output end of the first telescopic push rod 3 passes through the side wall of the housing 1 and is connected to the heating plate 4. A second telescopic push rod 10 is disposed on the outer side wall of the housing 1. The output end of the second telescopic push rod 10 is connected to an auxiliary cover 12 located between the heating plate 4 and the wall of the chamber 2. An opening 13 is provided on the auxiliary cover 12, which is at the same height as the center of the heating plate 4 and cooperates with it. The telescopic end of the first telescopic push rod 3 passes through the center of the opening 13. The cross-sectional area of ​​the opening 13 is smaller than the side area of ​​the side of the heating plate 4 facing the opening 13. The first telescopic push rod 3 and the second telescopic push rod 10 are electric cylinders.

[0022] When the substrate to be sputtered in chamber 2 needs to be heated, the first telescopic push rod 3 is controlled to extend and retract to adjust the distance between the heating plate 4 and the substrate to be sputtered. After the position is appropriate, the second telescopic push rod 10 is activated to control the auxiliary cover 12 to move toward the heating plate 4 until the auxiliary cover 12 abuts against the heating plate 4. The heating plate 4 seals the opening 13 on the auxiliary cover 12. In this way, most of the heat generated by the heating plate 4 will be concentrated in the auxiliary cover 12. The auxiliary cover 12 will concentrate most of the heat generated by the heating plate 4, which is conducive to the effective utilization of heat. This improves the utilization rate of heat when the substrate to be sputtered is heated in the heating device, and further increases the uniformity of the substrate to be sputtered during the heating process, thereby improving the coating effect and production efficiency.

[0023] A vacuum pump is installed on the outer wall of the housing 1. The vacuum pump is connected to the chamber 2 via a solenoid valve. When the chamber 2 inside the housing 1 is a sealed space, the vacuum pump can be used to evacuate the chamber 2. The housing 1 is provided with an air inlet for inputting gas into the chamber 2 inside the housing 1. The air inlet can be a gas holder. The chamber 2 is provided with a jet nozzle connected to the gas holder. The gas holder can introduce protective gas into the chamber 2 through the jet nozzle. The protective gas can be nitrogen.

[0024] In addition, after the substrate to be sputtered is heated, it can also be annealed. Heating by the heating plate 4 can form a uniform temperature field in the chamber 2, improving the uniformity of the coating. The auxiliary cover 12 provides auxiliary heat preservation for the coating surface, so that the subsequent coating surface can reach the annealing process temperature. The position of the heating plate 4 is adjustable, which can control the distance between the heating plate 4 and the substrate to be sputtered, reduce the probability of the substrate to be sputtered being scratched, and can also adapt to substrates of different thicknesses.

[0025] The heating plate 4 is driven by the first telescopic push rod 3 to quickly approach the substrate to be sputtered, which greatly reduces the interval between the end of the magnetron sputtering process and the start of annealing, reduces the temperature change caused by the substrate to be sputtered staying in vacuum or air, effectively maintains the initial state of the film, and is conducive to improving the performance of the film. Since it is located in a vacuum chamber, the gas environment during annealing can be adjusted by evacuating and breaking the vacuum or by introducing a specific gas, so as to achieve the purpose of efficient annealing.

[0026] The first telescopic push rod 3 has a magnetic fluid seal installed at the through-hole of the housing 1. The magnetic fluid seal is sleeved on the outside of the output end of the first telescopic push rod 3, which can ensure the vacuum sealing performance of the chamber 2 without affecting the telescopic movement of the output end of the first telescopic push rod 3, thus facilitating the precise driving of the heating plate 4.

[0027] The outer edge of the heating plate 4 is circumferentially sealed to the opening 13 of the auxiliary cover 12, reducing the radiative heat loss of the back of the heating plate 4 to the cavity wall of the housing 1; the inner wall of the auxiliary cover 12 is provided with a heat-reflective coating, which directionally reflects the heat loss to the direction of the substrate to be sputtered.

[0028] The heating plate 4 is provided with a heating wire 5, and the outer wall of the housing 1 is provided with a power supply 6. A transmission wire 7 is connected between the power supply 6 and the heating wire 5. The transmission wire 7 is electrically connected to the heating wire 5 through an electric wire 8.

[0029] A telescopic sleeve 9 is connected between the heating plate 4 and the wall of the chamber 2. The wire 8 extends into the telescopic sleeve 9 and is electrically connected to the heating wire 5. The telescopic sleeve 9 facilitates the protection of the wire 8 that extends into the chamber 2 and is connected to the heating wire 5. In addition, the telescopic sleeve 9 restricts the movement of the heating plate 4 to prevent the heating plate 4 from shifting, thereby improving the stability of the device while protecting the circuit.

[0030] The valve can be a slide gate valve.

[0031] The auxiliary cover 12 is connected to the wall of the chamber 2 through a limiting sleeve 11. The axis of the limiting sleeve 11 is parallel to the axis of the second telescopic push rod 10, which restricts the movement of the auxiliary cover 12 and prevents the auxiliary cover 12 from deviating.

[0032] The heating plate 4 has an annular first protrusion 14 on the side facing the opening 13, and the auxiliary cover 12 has a second protrusion 15 on the side facing the heating plate 4. After the auxiliary cover 12 moves toward the heating plate 4, the auxiliary cover 12 and the first protrusion 14 abut against the heating plate 4 and the second protrusion 15. The first protrusion 14 is located inside the second protrusion 15. The arrangement of the first protrusion 14 and the second protrusion 15 reduces the outflow of heat.

[0033] The outer side of the auxiliary cover 12 and the side where the heating plate 4 is connected to the first telescopic push rod 3 are both provided with heat insulation layers. The heat insulation layers facilitate the concentration of heat inside the auxiliary cover 12 and reduce the outflow of heat.

[0034] Those skilled in the art should understand that the discussion of any of the above embodiments is merely exemplary and is not intended to imply that the scope of the present invention is limited to these examples; within the framework of the present invention, the technical features of the above embodiments or different embodiments can also be combined, the steps can be implemented in any order, and there are many other variations of the different aspects of the present invention as described above, which are not provided in the details for the sake of brevity.

[0035] The embodiments of this utility model are intended to cover all such substitutions, modifications, and variations that fall within the broad scope of the appended claims. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this utility model should be included within the protection scope of this utility model.

Claims

1. A sputtering coating heating device, comprising a housing (1), wherein a chamber (2) is formed within the housing (1), characterized in that, The housing (1) has two corresponding openings that communicate with the chamber (2). Each opening is equipped with a valve. The chamber (2) is equipped with a conveyor for conveying the substrate to be sputtered. A heating plate (4) is provided on one side of the conveyor and is located inside the chamber (2). A first telescopic push rod (3) is provided outside the housing (1). The output end of the first telescopic push rod (3) passes through the side wall of the housing (1) and is connected to the heating plate (4). A second telescopic push rod (10) is provided on the outer side wall of the housing (1). The output end of the second telescopic push rod (10) is connected to an auxiliary cover (12) located between the heating plate (4) and the wall of the chamber (2). An opening (13) is provided on the auxiliary cover (12) that is at the same height as the center of the heating plate (4) and cooperates with it. The cross-sectional area of ​​the opening (13) is smaller than the side area of ​​the side of the heating plate (4) facing the opening (13).

2. The sputtering coating heating device according to claim 1, characterized in that, A vacuum pump is installed on the outer wall of the housing (1), and the vacuum pump is connected to the chamber (2) through a solenoid valve.

3. The sputtering coating heating device according to claim 1, characterized in that, The heating plate (4) is provided with a heating wire (5), and the outer wall of the housing (1) is provided with a power supply (6). A transmission wire (7) is connected between the power supply (6) and the heating wire (5). The transmission wire (7) is electrically connected to the heating wire (5) through an electric wire (8).

4. The sputtering coating heating device according to claim 3, characterized in that, A telescopic sleeve (9) is connected between the heating plate (4) and the chamber (2), and the wire (8) extends into the telescopic sleeve (9) and is electrically connected to the heating wire (5).

5. The sputtering coating heating device according to claim 1, characterized in that, The valve is a slide gate valve.

6. The sputtering coating heating device according to claim 1, characterized in that, The auxiliary cover (12) is connected to the wall of the chamber (2) through a limiting sleeve (11), and the axis of the limiting sleeve (11) is set parallel to the axis of the second telescopic push rod (10).

7. The sputtering coating heating device according to claim 1, characterized in that, The heating plate (4) has a first annular protrusion (14) on the side facing the opening (13), and the auxiliary cover (12) has a second protrusion (15) on the side facing the heating plate (4).

8. The sputtering coating heating device according to claim 1, characterized in that, The auxiliary cover (12) and the side where the heating plate (4) is connected to the first telescopic push rod (3) are both provided with heat insulation layers.

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