Multi-chamber continuous coating apparatus

Abstract

The utility model relates to vacuum coating technology field discloses a kind of multi-chamber continuous coating equipment, including multiple functional chambers and substrate mounting unit, blocking mechanism is used to control the on-off between adjacent two functional chambers, ensure that substrate mounting unit can independently carry out each process step and transmission in different functional chambers;Each functional chamber corresponds to be used for carrying substrate mounting unit's carrying unit;And multiple functional chambers can be combined diversely, due to the number of functional chambers is different, the space occupied by layout is different and the motion path of substrate mounting unit is different and so on Characteristics, avoid the limitation of adjacent chamber synchronous carrying of multi-chamber continuous coating equipment at corner, improve the overall carrying efficiency of multi-chamber coating equipment, more flexible adaptation different use scene, improve the applicability and coating efficiency of equipment, and reduce production cost.

Description

Technical Field

[0001] This utility model relates to the field of vacuum coating technology, and in particular to a multi-chamber continuous coating device. Background Technology

[0002] With the development of the vacuum coating equipment industry, the requirements for coating equipment used in manufacturing various optical products are becoming increasingly stringent. Industry verification items include, but are not limited to, equipment production efficiency, product yield, coating uniformity, and ease of internal maintenance and cleaning. Coupled with the ever-changing market environment and increasing industry competition, these requirements are constantly rising, making it paramount to improve production cycle time and capacity.

[0003] To achieve continuous automated coating of various thin films, multi-chamber continuous coating equipment, including a wafer loading chamber, a coating chamber, and a wafer unloading chamber, is generally used. Existing technologies include linearly arranged multi-chamber equipment, but this type of equipment requires significant space and necessitates a long external automated line. Existing technologies also include multi-chamber layouts with corners, but the conveying mechanisms at the corners generally require special design, limiting the synchronous conveying of adjacent chambers at the corners and significantly impacting the overall conveying efficiency of the multi-chamber coating equipment. Utility Model Content

[0004] The purpose of this invention is to provide a multi-chamber continuous coating device.

[0005] To achieve this objective, the present invention adopts the following technical solution:

[0006] Multi-chamber continuous coating equipment, including:

[0007] Multiple functional chambers are connected in sequence, and a blocking mechanism is selectively provided between two adjacent functional chambers. The blocking mechanism is used to control the connection and disconnection between the functional chambers located on both sides of the blocking mechanism. The functional chambers are used to set up a conveying unit, and the conveying unit is used to convey the substrate mounting unit.

[0008] The plurality of functional chambers include a wafer entry chamber, a first coating chamber, a second coating chamber, and a wafer exit chamber; the wafer entry chamber and the first coating chamber are located on a first straight line, the wafer exit chamber and the second coating chamber are located on a second straight line, and the first coating chamber and the second coating chamber are located on a third straight line;

[0009] The first straight line is set at an angle to the third straight line, and the second straight line is set at an angle to the third straight line. An intermediate buffer chamber is provided between the first coating chamber and the second coating chamber; or, one of the first straight line and the second straight line is set at an angle to the third straight line, and the other coincides with the third straight line.

[0010] As an optional technical solution for multi-chamber continuous coating equipment, the included angle is set as a right angle.

[0011] As an optional technical solution for a multi-chamber continuous coating equipment, when the first straight line is set at an angle to the third straight line, the second straight line is set at an angle to the third straight line, and an intermediate buffer chamber is provided between the first coating chamber and the second coating chamber, the infeed chamber and the outfeed chamber are located on the same side of the third straight line.

[0012] As an optional technical solution for a multi-chamber continuous coating equipment, the conveying unit includes a bottom guide wheel unit, the bottom guide wheel unit includes a guide wheel assembly, at least a portion of the guide wheel assembly is selectively raised and lowered; the guide wheel assembly is raised to abut against the bottom of the substrate mounting unit, and the guide wheel assembly can selectively move the substrate mounting unit to an adjacent bottom guide wheel unit.

[0013] As an optional technical solution for a multi-chamber continuous coating equipment, the bottom guide wheel unit of the first coating chamber and / or the second coating chamber includes two guide wheel assemblies, and the two guide wheel assemblies can move the substrate mounting unit in two non-parallel directions respectively.

[0014] As an optional technical solution for a multi-chamber continuous coating equipment, the guide wheel assembly includes multiple rolling wheels and a guide drive component. The moving direction of the substrate mounting unit is tangent to the rotation direction of the rolling wheels. The multiple rolling wheels are spaced apart along the moving direction of the substrate mounting unit, and the guide drive component can control the rotation of the rolling wheels.

[0015] As an optional technical solution for a multi-chamber continuous coating equipment, when the bottom guide wheel unit includes the guide wheel assembly that can be selectively raised and lowered, the bottom guide wheel unit also includes a lifting cylinder. The output end of the lifting cylinder is connected to the bottom of the guide wheel assembly, and the output end of the lifting cylinder can extend and retract to control the raising and lowering of the guide wheel assembly.

[0016] As an optional technical solution for a multi-chamber continuous coating equipment, the substrate mounting unit includes an outer frame and a cylindrical rotating hub for mounting the substrate. The outer frame is used to abut against the conveying unit, and the cylindrical rotating hub is placed inside the outer frame. The cylindrical rotating hub is connected to the rotating shaft of the outer frame.

[0017] The multi-chamber continuous coating equipment further includes a positioning and rotating transfer unit, which is configured one-to-one with each of the functional chambers. The positioning and rotating transfer unit includes a positioning component and a rotating component. The top of the rotating shaft of the cylindrical rotating hub is provided with an upper docking groove. The positioning component includes a positioning drive and an upper central shaft. The positioning drive is disposed on the top of the functional chamber. The positioning drive selectively controls the upper central shaft to be coaxially positioned in the upper docking groove. The rotating component is used to drive the cylindrical rotating hub to rotate.

[0018] As an optional technical solution for a multi-chamber continuous coating equipment, the top outer ring of the rotating shaft of the cylindrical rotating hub is provided with a gear part, and the rotating assembly includes a rotating drive and a gear shaft. The rotating drive is located on the top of the functional chamber. When the upper central shaft is placed in the upper docking groove, the rotating drive can control the gear shaft to mesh and transmit power with the gear part.

[0019] Alternatively, the bottom of the rotating shaft of the cylindrical rotating hub is provided with a lower docking groove, the rotating assembly includes a rotating drive and a lower central shaft, the rotating drive is disposed in the conveying unit, the lower central shaft can be placed in the lower docking groove, and the rotating drive can control the lower central shaft to drive the cylindrical rotating hub to rotate coaxially.

[0020] As an optional technical solution for a multi-chamber continuous coating equipment, the multi-chamber continuous coating equipment also includes an atmosphere conversion platform, with a loading position and a unloading position respectively provided at both ends of the atmosphere conversion platform.

[0021] The beneficial effects of this utility model are:

[0022] The multi-chamber continuous coating equipment provided by this utility model includes multiple functional chambers and a substrate mounting unit. The multiple functional chambers are connected sequentially, and a blocking mechanism is selectively provided between adjacent functional chambers. The blocking mechanism controls the connection or disconnection between the functional chambers located on either side of the blocking mechanism. This allows for flexible connection or isolation between the functional chambers, ensuring that the substrate mounting unit can independently perform various process steps such as loading and unloading, pre-, during, and post-coating operations in different functional chambers, as well as post-processing transfer. Each functional chamber is equipped with a corresponding conveying unit for transporting the substrate mounting unit. Each functional chamber can perform one process step. Through structural changes, the multi-chamber continuous coating machine can alter the placement of each functional chamber, allowing for diverse combinations of the multiple functional chambers, resulting in different space requirements and different movement paths for the substrate mounting unit. The multiple functional chambers include a wafer loading chamber, a first coating chamber, a second coating chamber, and a wafer unloading chamber, each corresponding to a different function; the wafer loading chamber and the first coating chamber are located on a first straight line, the wafer unloading chamber and the second coating chamber are located on a second straight line, and the first coating chamber and the second coating chamber are located on a third straight line.

[0023] If the first and third straight lines are set at an angle, and the second and third straight lines are also set at an angle, with an intermediate buffer chamber between the first and second coating chambers, a layout of at least five chambers can be achieved. This ensures that at least two substrate mounting units can perform the coating process simultaneously, or at least three substrate mounting units can move simultaneously in each cycle. The intermediate buffer chamber improves the problem of excessive waiting time for substrate mounting units and insufficient utilization of functional chambers caused by inconsistent coating times between the first and second coating chambers, effectively saving waiting and transport time. Alternatively, if only one of the first and second straight lines is set at an angle to the third straight line, and the other coincides with the third straight line, forming an L-shaped chamber layout, a layout of at least four chambers can be achieved. Simultaneously, a design that reduces one bend in the layout ensures that at least two substrate mounting units can move simultaneously. Both of these solutions avoid the limitation of simultaneous transport of adjacent chambers at corners in multi-chamber continuous coating equipment, improving the overall transport efficiency of the multi-chamber coating equipment. Attached Figure Description

[0024] Figure 1 This is a schematic diagram showing the state and arrangement of multiple functional chambers in the multi-chamber continuous coating equipment provided in a specific embodiment of this utility model;

[0025] Figure 2 This is a schematic diagram of the state-operation of the multi-chamber continuous coating equipment provided in a specific embodiment of this utility model;

[0026] Figure 3This is a schematic diagram of the structure of the atmospheric conversion platform of the multi-chamber continuous coating equipment provided in a specific embodiment of this utility model;

[0027] Figure 4 This is a schematic diagram of the bottom guide wheel unit of the multi-chamber continuous coating equipment provided in a specific embodiment of this utility model;

[0028] Figure 5 This is a partial side view of the bottom guide wheel unit of the multi-chamber continuous coating equipment provided in a specific embodiment of this utility model;

[0029] Figure 6 This is a schematic diagram showing the arrangement of multiple functional chambers with an intermediate buffer chamber in the multi-chamber continuous coating equipment provided in a specific embodiment of this utility model.

[0030] Figure 7 This is a schematic diagram of the closing of the isolation door of the intermediate buffer chamber of the multi-chamber continuous coating equipment provided in a specific embodiment of this utility model;

[0031] Figure 8 This is a schematic diagram showing the opening of the isolation door of the intermediate buffer chamber of the multi-chamber continuous coating equipment provided in a specific embodiment of this utility model;

[0032] Figure 9 This is a schematic diagram of the substrate mounting unit of the multi-chamber continuous coating equipment provided in a specific embodiment of this utility model;

[0033] Figure 10 This is a schematic diagram of the positioning and rotating transfer unit of the multi-chamber continuous coating equipment provided in a specific embodiment of this utility model;

[0034] Figure 11 This is an assembly diagram of the substrate mounting unit and the positioning and rotating transfer unit of the multi-chamber continuous coating equipment in another embodiment of the present utility model.

[0035] Figure 12 This is a schematic diagram showing the arrangement of multiple functional chambers in the multi-chamber continuous coating equipment provided in a specific embodiment of this utility model.

[0036] Figure 13 This is a schematic diagram of the second state of operation of the multi-chamber continuous coating equipment provided in a specific embodiment of this utility model;

[0037] Figure 14 This is a schematic diagram of the first cycle action of the multi-chamber continuous coating equipment provided in a specific embodiment of this utility model;

[0038] Figure 15 This is a schematic diagram of the second cycle of the multi-chamber continuous coating equipment provided in a specific embodiment of the present invention;

[0039] Figure 16 This is a schematic diagram of the third cycle of the multi-chamber continuous coating equipment provided in a specific embodiment of this utility model;

[0040] Figure 17 This is a schematic diagram of the fourth cycle of the multi-chamber continuous coating equipment provided in a specific embodiment of this utility model;

[0041] Figure 18 This is a schematic diagram of the first cycle action of the existing equipment;

[0042] Figure 19 This is a schematic diagram of the second cycle action of the existing equipment;

[0043] Figure 20 This is a schematic diagram of the third cycle action of the existing equipment;

[0044] Figure 21 This is a schematic diagram of the fourth cycle action of the existing equipment;

[0045] Figure 22 This is a schematic diagram of the fifth beat of the existing equipment.

[0046] In the picture:

[0047] 100. Functional chamber; 101. Film loading chamber; 102. Film unloading chamber; 103. First coating chamber; 104. Second coating chamber; 105. Intermediate buffer chamber;

[0048] 110. Blocking mechanism; 111. Blocking gate valve; 112. Isolation door panel; 120. Bottom guide wheel unit; 121. Guide wheel assembly; 1211. Rolling wheel; 1212. Guide drive component; 1213. Lifting cylinder; 130. Atmospheric conversion platform; 131. Loading position; 132. Unloading position;

[0049] 200, Substrate mounting unit; 210, Outer frame; 220, Cylindrical rotating hub; 221, Upper mating groove; 222, Gear section;

[0050] 300. Positioning and rotating transfer unit; 310. Positioning component; 311. Positioning drive component; 312. Upper central shaft; 320. Rotation component; 321. Rotation drive component; 322. Gear shaft. Detailed Implementation

[0051] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present invention and not intended to limit it. Furthermore, it should be noted that, for ease of description, the accompanying drawings show only the parts relevant to the present invention, not the entire structure.

[0052] In the description of this utility model, unless otherwise explicitly specified and limited, the terms "connected," "linked," and "fixed" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0053] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0054] In the description of this embodiment, the terms "upper," "lower," "right," and "left," etc., refer to the orientation or positional relationship shown in the accompanying drawings. They are used only for ease of description and simplification of operation, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. In addition, the terms "first" and "second" are only used for distinction in description and have no special meaning.

[0055] like Figures 1 to 13As shown, this utility model discloses a multi-chamber continuous coating equipment, including multiple functional chambers 100 and a substrate mounting unit 200. The multiple functional chambers 100 are connected sequentially, and a blocking mechanism 110 is selectively provided between adjacent functional chambers 100. The blocking mechanism 110 is used to control the connection and disconnection between the functional chambers 100 located on both sides of the blocking mechanism 110. The blocking mechanism 110 flexibly connects or isolates the various functional chambers 100, ensuring that the substrate mounting unit 200 can independently perform various process steps such as loading and unloading, pre-, during, and post-coating operations in different functional chambers 100, as well as post-processing transfer. Each functional chamber 100 is equipped with a conveying unit for conveying the substrate mounting unit 200. Multiple functional chambers 100 can be combined in various ways, and each functional chamber 100 corresponds to a process step. In order to improve coating efficiency, the multi-chamber continuous coating equipment can meet the requirements of being able to switch between 1 to 2 different optical products for coating, and can replace at least 2 target materials for coating on the same equipment. The placement of each functional chamber 100 can be changed.

[0056] The multiple functional chambers 100 include a film inlet chamber 101, a first coating chamber 103, a second coating chamber 104, and a film outlet chamber 102, each corresponding to a different function; the film inlet chamber 101 and the first coating chamber 103 are located on a first straight line, the film outlet chamber 102 and the second coating chamber 104 are located on a second straight line, and the first coating chamber 103 and the second coating chamber 104 are located on a third straight line.

[0057] In one embodiment, the first straight line and the third straight line are arranged at an angle, and the second straight line and the third straight line are arranged at an angle. An intermediate buffer chamber 105 is provided between the first coating chamber 103 and the second coating chamber 104, so that there are at least five chambers in the layout, and at least two substrate mounting units 200 can move simultaneously. It is understood that the angle arrangement means a non-parallel arrangement.

[0058] When the first straight line and the third straight line are set at an angle, and the second straight line and the third straight line are set at an angle, and an intermediate buffer chamber 105 is provided between the first coating chamber 103 and the second coating chamber 104, the infeed chamber 101 and the outfeed chamber 102 are located on the same side of the third straight line, forming a C-shaped chamber layout.

[0059] For example Figures 14 to 17As shown, when substrate mounting unit 200 with serial number A is located in the second coating chamber 104 and substrate mounting unit 200 with serial number B is located in the first coating chamber 103, the two substrate mounting units 200 perform the coating process simultaneously. If the next step is to be performed, the multi-chamber continuous coating equipment can move substrate mounting units 200 A and B to the next functional chamber 100 at the same time. Substrate mounting unit 200 with serial number A enters the output chamber 102, substrate mounting unit 200 with serial number B enters the intermediate buffer chamber 105, and substrate mounting unit 200 with serial number C enters the input chamber 101. This is the first cycle of the transport process. A, B, and C move independently without interfering with each other. Next, in the second cycle, substrate mounting unit 200 (numbered A) moves out of the exit chamber 102, substrate mounting unit 200 (numbered B) enters the second coating chamber 104, and substrate mounting unit 200 (numbered C) enters the first coating chamber 103. Substrate mounting units 200 B and C simultaneously undergo coating processes. The process continues into the third cycle, progressing similarly to the first cycle. Substrate mounting unit 200 (numbered B) enters the exit chamber 102 after two coating processes, substrate mounting unit 200 (numbered C) enters the intermediate buffer chamber 105, and simultaneously, a new substrate mounting unit 200 (numbered D) enters the loading chamber 101. Substrate mounting units B, C, and D move independently without interference. The fourth cycle proceeds similarly to the second cycle. Substrate mounting unit 200 (number B) moves out of the ejection chamber 102, substrate mounting unit 200 (number C) enters the second coating chamber 104, and substrate mounting unit 200 (number D) enters the first coating chamber 103. Substrate mounting units 200 C and D perform the coating process simultaneously. Simulation of the transport process of this multi-chamber continuous coating equipment shows that each cycle can guarantee at least two substrate mounting units 200 performing the coating process simultaneously or at least three substrate mounting units 200 moving simultaneously.

[0060] If the above operations are performed using equipment from existing technologies, refer to... Figures 18 to 22In the first cycle, since substrate mounting units A and B are adjacent, due to the limitations of the conveying mechanism, only substrate mounting unit A can move without interference; substrate mounting unit B cannot move. Substrate mounting unit C can be sent into the loading chamber 101. In the second cycle, substrate mounting unit A moves out of the unloading chamber 102, and substrate mounting unit B enters the second coating chamber 104. Only a single substrate mounting unit 200 can perform the coating process; substrate mounting unit C cannot move. In the third cycle, substrate mounting unit B enters the unloading chamber 102, and substrate mounting unit C enters the first coating chamber 103. In the fourth cycle, substrate mounting unit 200 (number B) moves out of the ejection chamber 102, and substrate mounting unit 200 (number C) enters the second coating chamber 104. This is one cycle later than the transport process of the multi-chamber continuous coating equipment in this application, and it performs the second coating process. At this time, substrate mounting unit 200 (number D) can enter the loading chamber 101. In the fifth cycle, substrate mounting unit 200 (number D) enters the second coating chamber 104, again one cycle later than the transport process of the multi-chamber continuous coating equipment in this application, and performs the second coating process. This continues, ensuring that the multi-chamber continuous coating equipment in this application is always one cycle faster than the previous version, avoiding the limitation of simultaneous transport of adjacent chambers at corners and improving the overall transport efficiency of the multi-chamber continuous coating equipment.

[0061] The intermediate buffer chamber 105 can improve the problems caused by the inconsistent coating times between the first coating chamber 103 and the second coating chamber 104, which result in excessively long waiting times for the substrate mounting unit 200 and insufficient utilization of the functional chamber 100. The substrate mounting unit 200 can be stored in the intermediate buffer chamber 105 in advance from the first coating chamber 103. After the coating process in the second coating chamber 104 is completed, the substrate mounting unit 200 located in the intermediate buffer chamber 105 and the substrate mounting unit 200 located in the second coating chamber 104 can be transported to the next functional chamber 100 simultaneously, effectively saving waiting and transportation time.

[0062] In another embodiment, only one of the first and second straight lines is arranged at an angle to the third straight line, while the other coincides with the third straight line, forming an L-shaped chamber layout with at least four chambers. This design reduces one angle, ensuring that at least two substrate mounting units 200 can move simultaneously. Compared to prior art devices, this application arranges at least three functional chambers 100 on the same straight line (i.e., the third straight line), allowing two substrate mounting units 200 arranged on the third straight line to move simultaneously regardless of whether they are adjacent.

[0063] Specifically, the angle between the first and second straight lines and the third straight line is set to a right angle. This layout can minimize the floor space occupied by the multi-chamber continuous coating equipment, thus saving space and improving space utilization efficiency.

[0064] Reference Figure 7 , Figure 12 and Figure 13 . Figure 7 The diagram shown is a schematic diagram of the state one arrangement of a multi-chamber continuous coating equipment (C-type chamber layout). Figure 12 and Figure 13 The diagram shows a schematic of the second state layout of a multi-chamber continuous coating equipment (L-shaped chamber layout). The multi-chamber continuous coating machine, through structural changes and in conjunction with a conveying unit, achieves systematic transport of the substrate mounting unit 200. Due to differences in the number of functional chambers 100, the space occupied by their layout, and the different movement paths of the substrate mounting unit 200, the machine can be more flexibly adapted to different application scenarios and reduce production costs through combination and modification.

[0065] In order to smoothly install optical coating functional components such as targets, ICP ion sources, heaters, condensation mechanisms, and cryogenic pumps on the sidewalls of functional chamber 100, it is necessary to ensure the consistency of the size and position of the openings of functional chamber 100, match different optical coating functional components, facilitate the application and replacement of the coating functions required by each functional chamber 100, and improve the compatibility and expandability of the equipment.

[0066] For example, a vacuum assembly, including a pumping pipe and a molecular pump assembly, is installed on the side wall and top of the functional chamber 100. The pumping pipe can be connected to a coarse pump and a slow pump, respectively, so that the functional chamber 100 becomes a vacuum state required for the coating process. The vacuum breaking unit and vacuum detection element are installed synchronously on the inner wall of the functional chamber 100 in conjunction with the vacuum assembly. By ensuring the consistency of the opening size and position of the functional chamber 100, the compatibility and expandability of the vacuum assembly and the vacuum detection element are guaranteed.

[0067] Specifically, based on the workflow of the multi-chamber continuous coating equipment, the multi-chamber continuous coating equipment also includes an atmosphere conversion platform 130. The atmosphere conversion platform 130 has a loading position 131 and a unloading position 132 at both ends, so as to further improve the efficiency of the substrate mounting unit 200 before and after entering and exiting the functional chamber 100.

[0068] The conveying unit includes a bottom guide wheel unit 120, and the substrate mounting unit 200 should be placed on one of the bottom guide wheel units 120. The bottom guide wheel unit 120 includes a guide wheel assembly 121, which can be selectively raised and lowered. When the guide wheel assembly 121 is raised, it can abut against the bottom of the substrate mounting unit 200. The guide wheel assembly 121 is used to move the substrate mounting unit 200 to the adjacent bottom guide wheel unit 120. The substrate mounting unit 200 is transferred through the bottom guide wheel unit 120, and together with the blocking mechanism 110 between each functional chamber 100, it is spliced ​​to form a multi-chamber continuous coating equipment.

[0069] like Figure 4 and Figure 5 As shown, the bottom guide wheel unit 120 in the first coating chamber 103 and the second coating chamber 104 includes two guide wheel assemblies 121. The two guide wheel assemblies 121 can move the substrate mounting unit 200 in two non-parallel directions respectively. The transmission between the functional chambers 100 is powered by the bottom guide wheel unit 120. By raising or lowering the guide wheel assembly 121 in the first direction or the guide wheel assembly 121 in the second direction, and in conjunction with the different conveying directions of the substrate mounting unit 200 due to the different connection angles of the functional chambers 100, the versatility and integration of the equipment are improved. By changing the driving direction of the bottom guide wheel unit 120 through different layout structures of the functional chambers 100, different direction conversions and different driving structures of the bottom guide wheel unit 120 can be derived according to the actual working conditions. In this embodiment, the guide wheel assembly 121 includes a plurality of rolling wheels 1211 and a guide drive 1212. The moving direction of the substrate mounting unit 200 is tangent to the rotation direction of the rolling wheels 1211. The plurality of rolling wheels 1211 are spaced apart along the moving direction of the substrate mounting unit 200. The guide drive 1212 can control the rotation of the rolling wheels 1211.

[0070] Furthermore, when the bottom guide wheel unit 120 includes a selectively liftable guide wheel assembly 121, the bottom guide wheel unit 120 should also include a lifting cylinder 1213. The output end of the lifting cylinder 1213 is connected to the bottom of the guide wheel assembly 121. Two sets of lifting cylinders 1213 are fixedly connected to the guide wheel assembly 121 in the first direction and the guide wheel assembly 121 in the second direction, respectively. The output end of the lifting cylinder 1213 can extend and retract to control the lifting and lowering of the guide wheel assembly 121. When the substrate mounting unit 200 needs to move in the first direction, the guide wheel assembly 121 in the first direction is raised by the lifting cylinder 1213, and the guide wheel assembly 121 in the second direction is lowered by the lifting cylinder 1213. The guide wheel assembly 121 in the first direction is higher than the guide wheel assembly 121 in the second direction, so that the guide wheel assembly 121 in the first direction contacts the substrate mounting unit 200 and controls its movement in the first direction. Similarly, when the substrate mounting unit 200 needs to move in the second direction, the guide wheel assembly 121 in the second direction is raised by the lifting cylinder 1213, and the guide wheel assembly 121 in the first direction is lowered by the lifting cylinder 1213. The guide wheel assembly 121 in the second direction is higher than the guide wheel assembly 121 in the first direction, so that the guide wheel assembly 121 in the second direction contacts the substrate mounting unit 200 and controls its movement in the second direction, thereby realizing the conversion between the first direction and the second direction of the substrate mounting unit 200 movement.

[0071] like Figure 9 Zhihe Figure 10 As shown, the substrate mounting unit 200 includes an outer frame 210 and a cylindrical rotating hub 220 for mounting the substrate. The outer frame 210 abuts against the guide wheel assembly 121, and the cylindrical rotating hub 220 is located inside the outer frame 210 and connected to the rotating shaft of the outer frame 210. The multi-chamber continuous coating equipment also includes a positioning and rotating transfer unit 300, which is arranged in a one-to-one correspondence with the functional chambers 100. The substrate mounting unit 200 is placed in the functional chamber 100, and the positioning and rotating transfer unit 300 drives the cylindrical rotating hub 220 in the substrate mounting unit 200 to rotate to perform uniform optical coating on the substrate. Optical coating functional components such as the target material and ICP ion source are located on the side wall of the functional chamber 100. The cylindrical rotating hub 220 is generally equipped with multiple rectangular hanging plates for placing the substrate. The multiple rectangular hanging plates are evenly spaced around the cylindrical rotating hub 220 and spliced ​​into a similar polygonal cylindrical structure. After the substrate is placed on each rectangular hanging plate, it also forms a similar polygonal cylindrical structure.

[0072] Optionally, in order to improve coating efficiency, multiple sets of targets arranged sequentially around the rotation axis of the cylindrical rotating hub 220 are usually provided in the functional chamber 100 to simultaneously coat the substrates on multiple adjacent rectangular mounting plates.

[0073] Specifically, the positioning and rotating transfer unit 300 includes a positioning component 310 and a rotating component 320; the top of the rotating shaft of the cylindrical rotating hub 220 is provided with an upper docking groove 221; the positioning component 310 includes a positioning drive 311 and an upper central shaft 312; the positioning drive 311 is disposed on the top of the functional chamber 100, and the positioning drive 311 selectively controls the upper central shaft 312 to be coaxially positioned in the upper docking groove 221; the rotating component 320 is used to drive the cylindrical rotating hub 220 to rotate. When the substrate mounting unit 200 reaches the rotation position of each functional chamber 100, the positioning and rotating transfer unit 300 uses the positioning drive 311, which can provide power to the upper central shaft 312, such as a cylinder, to press the upper central shaft 312 into the upper docking groove 221 on the top of the substrate mounting unit 200 for center positioning and connection.

[0074] In this embodiment, a gear portion 222 is provided on the outer ring of the top of the rotating shaft of the cylindrical rotating hub 220. The rotating assembly 320 includes a rotating drive 321 and a gear shaft 322. The rotating drive 321 is disposed on the top of the functional chamber 100. When the upper central shaft 312 is placed in the upper docking groove 221, the rotating drive 321 can control the gear shaft 322 to mesh and transmit power with the gear portion 222. After the substrate mounting unit 200 is positioned and connected to the functional chamber 100, the rotating drive 321 transmits power to the gear shaft 322 to drive the gear portion 222 on the substrate mounting unit 200 to rotate the cylindrical rotating hub 220, thereby completing the work steps such as coating, mounting, or removing the substrate on the substrate mounting unit 200.

[0075] In summary, the application process and transport sequence of this multi-chamber continuous coating equipment can be predicted. Figure 2 The multi-chamber continuous coating equipment shown is arranged in one state as an example:

[0076] Step 1: Close the blocking mechanism 110, and the film output chamber 102, the first coating chamber 103, and the second coating chamber 104 are all converted to a vacuum state.

[0077] Step 2: The substrate mounting unit 200 is placed on the bottom guide wheel unit 120 of the atmospheric conversion platform 130. The cylindrical rotating hub 220 of the substrate mounting unit 200 is rotated by the positioning and rotating transfer unit 300 at the loading position 131 of the atmospheric conversion platform 130 frame, and the substrates are hung in sequence.

[0078] Step 3: After the bottom guide wheel unit 120 of the atmospheric conversion platform 130 provides power to transport the substrate mounting unit 200 to the rotation position of the substrate loading chamber 101 in the first direction, the blocking mechanism 110 between the atmospheric conversion platform 130 and the substrate loading chamber 101 is closed, and the positioning rotation transfer unit 300 on the substrate loading chamber 101 rotates the cylindrical rotating hub of the substrate mounting unit 200 to perform pretreatment such as heating to remove water vapor before coating.

[0079] Step 4: The blocking mechanism 110 between the wafer loading chamber 101 and the first coating chamber 103 is opened. After the bottom guide wheel unit 120 of the wafer loading chamber 101 provides power to transport the substrate mounting unit 200 to the rotation position of the first coating chamber 103 in the first direction, the blocking mechanism 110 between the wafer loading chamber 101 and the first coating chamber 103 is closed. The positioning and rotating transfer unit 300 on the first coating chamber 103 rotates the cylindrical rotating hub of the substrate mounting unit 200 to perform the coating process.

[0080] Step 5: The blocking mechanism 110 between the first coating chamber 103 and the second coating chamber 104 is opened. The bottom guide wheel unit 120 of the first coating chamber 103 changes the power supply from the first direction to the second direction by lowering the guide wheel assembly 121 in the first direction and raising the guide wheel assembly 121 in the second direction. After the bottom guide wheel unit 120 of the first coating chamber 103 provides power to the substrate mounting unit 200 in the second direction to the rotation position of the second coating chamber 104, the blocking mechanism 110 between the first coating chamber 103 and the second coating chamber 104 is closed. The positioning and rotating transfer unit 300 on the second coating chamber 104 rotates the cylindrical rotating hub of the substrate mounting unit 200 to continue the coating process.

[0081] Step Six: The blocking mechanism 110 between the second coating chamber 104 and the wafer exit chamber 102 is opened. The bottom guide wheel unit 120 of the second coating chamber 104 changes the power supply from the second direction to the first direction by lowering the guide wheel assembly 121 in the second direction and raising the guide wheel assembly 121 in the first direction. After the bottom guide wheel unit 120 of the second coating chamber 104 provides power supply to the substrate mounting unit 200 in the first direction to the rotation position of the wafer exit chamber 102, the blocking mechanism 110 between the second coating chamber 104 and the wafer exit chamber 102 is closed. The positioning rotation transfer unit 300 on the wafer chamber rotates the cylindrical rotating hub of the substrate mounting unit 200 to continue other process steps.

[0082] Step 7: The blocking mechanism 110 between the film exit chamber 102 and the atmospheric conversion platform 130 is opened. After the bottom guide wheel unit 120 of the film exit chamber 102 provides power to transport the substrate mounting unit 200 to the rotation position of the unloading position 132 of the atmospheric conversion platform 130 in the first direction, the blocking mechanism 110 between the film exit chamber 102 and the atmospheric conversion platform 130 is closed. The positioning rotation transfer unit 300 on the unloading position 132 of the atmospheric conversion platform 130 rotates the cylindrical rotating hub of the substrate mounting unit 200 and removes the substrates in sequence.

[0083] Step 8: The bottom guide wheel unit 120 of the unloading position 132 of the atmospheric conversion platform 130 changes the power supply from the first direction to the second direction by lowering the guide wheel assembly 121 in the first direction and raising the guide wheel assembly 121 in the second direction. After the substrate mounting unit 200 is moved to the rotation position of the loading position 131 of the atmospheric conversion platform 130, the positioning and rotation transfer unit 300 on the loading position 131 of the atmospheric conversion platform 130 rotates the cylindrical rotating hub of the substrate mounting unit 200 and re-mounts the substrates sequentially. The bottom guide wheel unit 120 of the atmospheric conversion platform 130 restores the power supply from the second direction to the first direction by lowering the guide wheel assembly 121 in the second direction and raising the guide wheel assembly 121 in the first direction. This process is repeated cyclically starting from step 3, realizing the closed-loop coating process of the multi-chamber continuous coating equipment.

[0084] In another embodiment, the driving method of the rotating component 320 can also be changed to a driving structure using the bottom electrode, as appropriate. Figure 11 As shown, the bottom of the rotating shaft of the cylindrical rotating hub 220 is provided with a lower docking groove. The rotating assembly 320 includes a rotating drive 321 and a lower central shaft. The rotating drive 321 is located in the bottom guide wheel unit 120. When the guide wheel assembly 121 descends, the lower central shaft is placed in the lower docking groove. At this time, the upper central shaft 312 can extend as a shaft with a positive alignment function and connect with the upper positioning groove in the substrate mounting unit 200. This ensures that the cylindrical rotating hub 220 is always in a central vertical state during rotation. Finally, the rotating drive 321 provides a power source to control the lower central shaft to drive the cylindrical rotating hub 220 to rotate coaxially.

[0085] It is understood that multi-chamber continuous coating equipment includes multiple substrate mounting units 200. By increasing the number of substrate mounting units 200, up to one substrate mounting unit 200 can be allocated to each functional chamber 100 simultaneously for operation, and the substrate mounting units 200 are passed sequentially, accelerating the production cycle and greatly increasing capacity. For example, a multi-chamber continuous coating equipment that covers two or more target materials typically has about two substrate mounting units 200, which can meet the requirement of simultaneously coating two different optical products on the same equipment.

[0086] like Figures 6 to 8As shown, a blocking mechanism 110 is provided between two adjacent functional chambers 100. The blocking mechanism 110 can be a blocking gate valve 111 or an isolation door 112. Specifically, the blocking mechanism 110 between any two adjacent functional chambers 100 can be a blocking gate valve 111. In some cases, due to the optimization of the intermediate buffer chamber 105 between the first coating chamber 103 and the second coating chamber 104, isolation doors 112 are preferably provided at both ends of the intermediate buffer chamber 105. The isolation doors 112 selectively isolate the intermediate buffer chamber 105 from the adjacent functional chambers 100. By isolating the first coating chamber 103 and the second coating chamber 104 with the isolation doors 112, it is ensured that the first coating chamber 103 and the second coating chamber 104 can perform coating operations without interference under different operating conditions. The isolation doors 112 at both ends of the intermediate buffer chamber 105 can be selectively opened and closed. During the coating process, the isolation doors 112 of the first coating chamber 103 and the second coating chamber 104 are closed, effectively isolating them. When the substrate mounting unit 200 is transported from the first coating chamber 103 to the intermediate buffer chamber 105 via the bottom guide wheel unit 120, the isolation door 112 on that side opens; when the substrate mounting unit 200 is transported from the intermediate buffer chamber 105 to the second coating chamber 104 via the bottom guide wheel unit 120, the isolation door 112 on the other side opens. By adding the intermediate buffer chamber 105, the multi-chamber continuous coating equipment offers more optional application effects and allows for more combination and arrangement options according to customer requirements.

[0087] Obviously, the above embodiments of this utility model are merely examples for clearly illustrating the present utility model, and are not intended to limit the implementation of the present utility model. Those skilled in the art can make various obvious changes, readjustments, and substitutions without departing from the protection scope of this utility model. It is neither necessary nor possible to exhaustively describe all embodiments here. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this utility model should be included within the protection scope of the claims of this utility model.

Claims

1. A multi-chamber continuous coating equipment, characterized in that, include: Multiple functional chambers (100) are connected in sequence, and a blocking mechanism (110) is selectively provided between two adjacent functional chambers (100). The blocking mechanism (110) is used to control the connection and disconnection between the functional chambers (100) located on both sides of the blocking mechanism (110). The functional chambers (100) are used to set up a conveying unit, which is used to convey the substrate mounting unit (200). The plurality of functional chambers (100) include a wafer entry chamber (101), a first coating chamber (103), a second coating chamber (104), and a wafer exit chamber (102); the wafer entry chamber (101) and the first coating chamber (103) are located on a first straight line, the wafer exit chamber (102) and the second coating chamber (104) are located on a second straight line, and the first coating chamber (103) and the second coating chamber (104) are located on a third straight line; The first straight line is set at an angle to the third straight line, the second straight line is set at an angle to the third straight line, and an intermediate buffer chamber (105) is provided between the first coating chamber (103) and the second coating chamber (104); or, one of the first straight line and the second straight line is set at an angle to the third straight line, and the other coincides with the third straight line.

2. The multi-chamber continuous coating equipment according to claim 1, characterized in that, The included angle is set to a right angle.

3. The multi-chamber continuous coating equipment according to claim 1, characterized in that, When the first straight line is set at an angle to the third straight line, the second straight line is set at an angle to the third straight line, and an intermediate buffer chamber (105) is provided between the first coating chamber (103) and the second coating chamber (104), the infeed chamber (101) and the outfeed chamber (102) are located on the same side of the third straight line.

4. The multi-chamber continuous coating equipment according to claim 1, characterized in that, The conveying unit includes a bottom guide wheel unit (120), the bottom guide wheel unit (120) includes a guide wheel assembly (121), at least a portion of the guide wheel assembly (121) is selectively raised and lowered; the guide wheel assembly (121) is raised to abut against the bottom of the substrate mounting unit (200), and the guide wheel assembly (121) is selectively able to move the substrate mounting unit (200) to an adjacent bottom guide wheel unit (120).

5. The multi-chamber continuous coating equipment according to claim 4, characterized in that, The bottom guide wheel unit (120) of the first coating chamber (103) and / or the second coating chamber (104) includes two guide wheel assemblies (121), which are capable of moving the substrate mounting unit (200) in two non-parallel directions respectively.

6. The multi-chamber continuous coating equipment according to claim 4, characterized in that, The guide wheel assembly (121) includes multiple rolling wheels (1211) and a guide drive (1212). The moving direction of the substrate mounting unit (200) is tangent to the rotation direction of the rolling wheels (1211). The multiple rolling wheels (1211) are spaced apart along the moving direction of the substrate mounting unit (200). The guide drive (1212) can control the rotation of the rolling wheels (1211).

7. The multi-chamber continuous coating equipment according to claim 4, characterized in that, When the bottom guide wheel unit (120) includes the selectively liftable guide wheel assembly (121), the bottom guide wheel unit (120) also includes a lifting cylinder (1213), the output end of the lifting cylinder (1213) is connected to the bottom of the guide wheel assembly (121), and the output end of the lifting cylinder (1213) can extend and retract to control the lifting of the guide wheel assembly (121).

8. The multi-chamber continuous coating equipment according to claim 1, characterized in that, The substrate mounting unit (200) includes an outer frame (210) and a cylindrical rotating hub (220) for mounting the substrate. The outer frame (210) is used to abut against the conveying unit. The cylindrical rotating hub (220) is placed inside the outer frame (210). The cylindrical rotating hub (220) is connected to the rotating shaft of the outer frame (210). The multi-chamber continuous coating equipment further includes a positioning and rotating transfer unit (300), which is configured one-to-one with the functional chambers (100). The positioning and rotating transfer unit (300) includes a positioning component (310) and a rotating component (320). The top of the rotating shaft of the cylindrical rotating hub (220) is provided with an upper docking groove (221). The positioning component (310) includes a positioning drive (311) and an upper central shaft (312). The positioning drive (311) is located on the top of the functional chamber (100). The positioning drive (311) selectively controls the upper central shaft (312) to be coaxially positioned in the upper docking groove (221). The rotating component (320) is used to drive the cylindrical rotating hub (220) to rotate.

9. The multi-chamber continuous coating apparatus according to claim 8, characterized in that, The top outer ring of the rotating shaft of the cylindrical rotating hub (220) is provided with a gear part (222). The rotating assembly (320) includes a rotating drive (321) and a gear shaft (322). The rotating drive (321) is located on the top of the functional chamber (100). When the upper central shaft (312) is placed in the upper docking groove (221), the rotating drive (321) can control the gear shaft (322) to mesh and transmit power with the gear part (222). Alternatively, the bottom of the rotating shaft of the cylindrical rotating hub (220) is provided with a lower docking groove, and the rotating assembly (320) includes a rotating drive (321) and a lower central shaft. The rotating drive (321) is disposed in the conveying unit, and the lower central shaft can be placed in the lower docking groove. The rotating drive (321) can control the lower central shaft to drive the cylindrical rotating hub (220) to rotate coaxially.

10. The multi-chamber continuous coating apparatus according to any one of claims 1-9, characterized in that, The multi-chamber continuous coating equipment also includes an atmosphere conversion platform (130), with a loading position (131) and a unloading position (132) respectively at both ends of the atmosphere conversion platform (130).

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