Atmosphere adjusting device for low-temperature deposition of GeN / SiN film

Abstract

The utility model discloses GeN / SiN film low temperature deposition's atmosphere adjusting device belongs to semiconductor film preparation equipment technical field, and the device includes the air inlet cavity, and the top of air inlet cavity is rotatively connected with transmission rod no.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor thin film preparation equipment technology, and in particular to an atmosphere conditioning device for low-temperature deposition of GeN / SiN thin films. Background Technology

[0002] In the low-temperature deposition process of GeN or SiN semiconductor thin films, the gas atmosphere inside the reaction chamber has a decisive influence on the density, uniformity, and final electrical properties of the film. In order to ensure the stable progress of the deposition process, it is necessary not only to precisely and controllably adjust the flow rate of the reaction gas entering the chamber, but also to strictly monitor and maintain the dynamic balance of the internal pressure of the chamber to prevent excessive pressure from damaging the deposition environment or precision equipment components.

[0003] Existing thin film deposition equipment uses separate control elements for its air intake system. This means that the air intake volume is controlled by an independent flow meter, and pressure protection is provided by a separate safety valve. This decentralized structure not only increases the space occupied by the equipment and the complexity of the piping connections, but also lacks an integrated mechanical adjustment mechanism at the air intake port. This makes it difficult for operators to directly make linear fine adjustments to the airflow cross-section at the air intake end and to intuitively observe the adjustment status. More importantly, existing air intake devices often do not have an integrated dual-mode pressure relief function. When encountering an emergency situation of system overpressure, they cannot automatically open the pressure relief channel. When manual intervention is required for venting, there is a lack of convenient manual operation interface. It is difficult to simultaneously meet the integrated requirements of mechanical regulation of gas flow and pressure safety protection in low-temperature deposition environments.

[0004] Therefore, this invention proposes an atmosphere conditioning device for low-temperature deposition of GeN / SiN thin films to address the shortcomings of existing technologies. Utility Model Content

[0005] In view of the problems existing in the air intake system of GeN / SiN thin film low-temperature deposition equipment, such as the dispersed structural layout, difficulty in integrating intuitive mechanical adjustment of flow rate at the air intake end, lack of a dual-mode pressure relief mechanism combining automatic overpressure protection and manual assisted exhaust, and low sealing reliability at the connection point in low-temperature environment, this utility model aims to provide an atmosphere conditioning device for GeN / SiN thin film low-temperature deposition with an improved structure that can effectively solve the above problems.

[0006] This invention provides an atmosphere conditioning device for low-temperature deposition of GeN / SiN thin films, comprising: an air inlet chamber, an adjustment component disposed on the top of the air inlet chamber, and a pressure relief component disposed on the side wall of the air inlet chamber.

[0007] The top of the air intake cavity is rotatably connected to a transmission rod. One end of the transmission rod inside the air intake cavity is fixedly connected to a fixed block. The outer wall of the fixed block is fixedly connected to a blocking plate. The blocking plate is located inside the air intake channel of the air intake cavity.

[0008] Furthermore, a valve cylinder is fixedly installed in the middle of the air intake cavity, and a fixed plate is fixedly connected to the inner wall of the valve cylinder. A transmission rod slidably connects to the fixed plate. One end of the transmission rod slidably inside the valve cylinder is fixedly connected to the middle of the valve core. A pressure relief spring is connected between the valve core and the fixed plate. One end of the pressure relief spring is fixedly connected to the valve core, and the other end of the pressure relief spring is fixedly connected to the inner wall of the fixed plate. In its natural state, the pressure relief spring is in a compressed state and pushes the valve core to seal against the inner wall of the valve cylinder.

[0009] Preferably, in order to make the intake adjustment visible, a scale is fixedly installed in the middle of the transmission rod. The scale is located outside the intake cavity and rotates synchronously with the transmission rod. The surface of the scale is provided with an angle indicator. The operator can judge the deflection angle of the blocking disc by observing the angle indicator.

[0010] Preferably, in order to ensure sealing performance when connected to external equipment, a flange is fixedly connected to one end of the air intake chamber, and a sealing ring is fixedly connected to the inner wall of the flange. The sealing ring is used to form a tight sealing structure when the flange is connected to the external reaction chamber to prevent gas leakage.

[0011] Preferably, in order to optimize the internal structural layout, the pressure relief spring is sleeved on the outer periphery of the transmission rod two, and the pressure relief spring is located in the space between the valve core and the fixed plate, so as to be able to apply a thrust to the valve core stably along the axial direction.

[0012] Preferably, in order to improve the reliability of the sealing fit and prevent the valve core from coming out, the valve core is hemispherical or frustoconical, and the maximum outer diameter of the valve core is larger than the diameter of the through hole in the middle of the fixed plate through which the transmission rod passes, thereby using the fixed plate to form a limit.

[0013] Preferably, the rotation plane of the blocking disc is perpendicular to or at a certain angle to the axis of the air intake cavity. The specific structure of the blocking disc can be designed as a disc or a fan-shaped plate. The flow area of ​​the air intake channel is changed by the rotation position of the blocking disc in the air intake cavity.

[0014] Preferably, in order to ensure the dynamic airtightness of the moving parts, a first dynamic seal is provided at the connection between the transmission rod one and the air inlet cavity, and a second dynamic seal is provided at the sliding fit between the transmission rod two and the fixed plate, to prevent process gas leakage or external air intrusion.

[0015] Preferably, to facilitate manual pressure relief, a push-pull handle is fixedly provided at one end of the transmission rod 2 that passes through the fixed plate and extends to the outside of the valve cylinder. The outer diameter of the push-pull handle is larger than the rod diameter of the transmission rod 2, so that the operator can hold and pull the transmission rod 2.

[0016] This utility model has the following beneficial effects: 1. This utility model solves the problem of crude intake flow regulation and lack of intuitive opening feedback in the prior art by setting a rotatable and adjustable blocking disc structure on the top of the intake chamber and cooperating with an external visual scale. It achieves the effect of accurately controlling the flow cross section of the intake channel according to the scale reading, thereby optimizing the reaction atmosphere ratio.

[0017] 2. This utility model solves the problems of delayed pressure relief protection response and inability to simultaneously meet the needs of automatic safety protection and manual active venting in the prior art by integrating an automatic reset valve core assembly with a spring load on the side wall of the intake chamber and combining it with a manual operating lever design. It achieves a dual-mode safety protection effect of automatically opening the channel to release pressure under overpressure conditions and supporting manual rapid venting during shutdown maintenance.

[0018] 3. This utility model solves the problem that existing technologies cannot simultaneously achieve both mechanical adjustment flexibility and overall airtightness in low-temperature deposition processes by setting a dynamic sealing structure at the mating points of transmission components and using a combination design of flange and low-temperature resistant sealing ring at the connection port. It effectively prevents external air from intruding and polluting the deposition environment and prevents the leakage of toxic process gases from the interior. Attached Figure Description

[0019] Figure 1 This is a perspective view of the atmosphere conditioning device for low-temperature deposition of GeN / SiN thin films proposed in this utility model. Figure 2 This is a cross-sectional view of the blocking plate in the atmosphere conditioning device for low-temperature deposition of GeN / SiN thin films proposed in this utility model. Figure 3 This is a cross-sectional view of the transmission rod 2 in the atmosphere conditioning device for low-temperature deposition of GeN / SiN thin films proposed in this utility model; Figure 4 This is a cross-sectional view of the valve core in the atmosphere conditioning device for low-temperature deposition of GeN / SiN thin films proposed in this utility model.

[0020] Legend: 1. Intake chamber; 2. Fixing block; 3. Transmission rod one; 4. Dial; 5. Plug; 6. Valve cylinder; 7. Fixing plate; 8. Pressure relief spring; 9. Valve core; 10. Transmission rod two; 11. Flange; 12. Sealing ring. Detailed Implementation

[0021] To make the objectives, technical solutions, and advantages of this utility model clearer, the technical solutions in the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of this utility model without creative effort are within the protection scope of this utility model. Example

[0022] Please refer to Figures 1 to 4 This utility model provides an atmosphere conditioning device for low-temperature deposition of GeN / SiN thin films, which aims to solve the problems in the prior art where GeN / SiN thin film deposition equipment lacks integrated mechanical precise adjustment of air intake flow and automatic / manual dual-mode pressure relief function, and it is difficult to ensure the connection sealing under low-temperature deposition environment.

[0023] like Figure 1 and Figure 2 As shown, the atmosphere conditioning device for low-temperature deposition of GeN / SiN thin films includes an air inlet chamber 1 and an air inlet regulating mechanism mounted on the top of the air inlet chamber 1 via a rotatable connection. The air inlet chamber 1 serves as a pipeline carrier for the flow of reaction gas and a mounting base for various functional components, and is used to guide gas into the subsequent reaction chamber. In order to achieve mechanical control of the air inlet flow rate, a transmission rod 3 is rotatably connected to the top of the air inlet chamber 1. A first dynamic sealing component is provided at the connection between the transmission rod 3 and the air inlet chamber 1. The first dynamic sealing component is used to maintain the airtightness of the inside and outside of the air inlet chamber 1 during the rotation of the transmission rod 3, and to prevent external air from seeping in and contaminating the deposition atmosphere or internal toxic gas from leaking out.

[0024] like Figure 2 As shown, one end of the transmission rod 3 extending into the air intake chamber 1 is fixedly connected to a fixing block 2 by welding or bolting. The fixing block 2 serves as a transmission connector, and a blocking disc 5 is fixedly connected to its outer wall. The blocking disc 5 is located in the air intake channel of the air intake chamber 1. The blocking disc 5 is disc-shaped or fan-shaped. The rotation plane of the blocking disc 5 is perpendicular to or at a certain angle to the airflow axis of the air intake chamber 1. When the operator rotates the transmission rod 3, the transmission rod 3 drives the fixing block 2 and the blocking disc 5 to rotate synchronously. By changing the rotation position and angle of the blocking disc 5 in the air intake chamber 1, the effective flow area of ​​the air intake channel is changed, thereby achieving linear coarse adjustment or complete cutoff of the intake volume of the reaction atmosphere.

[0025] like Figure 1As shown, in order to assist the operator in accurately controlling the intake volume, a dial 4 is fixedly installed at one end of the transmission rod 3 outside the intake chamber 1. Angle indicators are set on the surface of the dial 4 by laser etching or printing. The dial 4 rotates synchronously with the transmission rod 3 to visually indicate the deflection angle of the blocking plate 5 in the intake chamber 1. In addition, an operating handwheel is fixedly installed on the top of the transmission rod 3. The operating handwheel is located above the dial 4 and is used by the operator to apply force to drive the transmission rod 3 to rotate.

[0026] To solve the above-mentioned technical problems, the core of the technical solution of this embodiment is that the atmosphere conditioning device for low-temperature deposition of GeN / SiN thin films also includes a pressure relief component disposed on the side wall of the air inlet chamber 1, and the pressure relief component and the aforementioned air inlet chamber 1 form a specific communication and sealing relationship.

[0027] Please refer to the following carefully. Figure 1 and Figure 4 The core structure is described in detail below. The middle side wall of the intake chamber 1 is fixedly connected to the valve cylinder 6 by welding or integral casting. The valve cylinder 6 serves as the outer shell and mounting carrier of the pressure relief channel. Inside, there is a fixed plate 7 for support and guidance. The outer peripheral wall of the fixed plate 7 is fixedly connected to the inner peripheral wall of the valve cylinder 6. The middle part of the fixed plate 7 has a guide hole for the transmission rod 10 to pass through. The fixed plate 7 is used to provide precise guidance and limit for the axial movement of the transmission rod 10.

[0028] Meanwhile, transmission rod 2 10 is correspondingly set on the central axis of valve cylinder 6. Transmission rod 2 10 slides through and is slidably fitted in the guide hole in the middle of fixed disk 7. One end of transmission rod 2 10 located inside valve cylinder 6 is fixedly connected to valve core 9. Valve core 9 is hemispherical or frustoconical. The outer diameter of valve core 9 is larger than the diameter of the guide hole in the middle of fixed disk 7. Pressure relief spring 8 is connected between valve core 9 and fixed disk 7. Pressure relief spring 8 is sleeved on the outer periphery of transmission rod 2 10 and is located in the annular space between valve core 9 and fixed disk 7. One end of pressure relief spring 8 is fixedly connected to the end face of valve core 9 facing fixed disk 7, and the other end of pressure relief spring 8 is fixedly connected to the side wall of fixed disk 7.

[0029] In the assembled state, the pressure relief spring 8 is in a compressed state, and the pressure relief spring 8 continuously outputs elastic restoring force, pushing the valve core 9 away from the fixed plate 7, so that the outer circumferential sealing surface of the valve core 9 tightly abuts against the inner circumferential wall of the valve cylinder 6. This spring-loaded sealing structure ensures that the pressure relief channel in the valve cylinder 6 remains normally closed under normal working pressure. Only when the air pressure inside the air inlet chamber 1 exceeds the safety threshold set by the pressure relief spring 8 can the gas pressure overcome the spring force to open the valve core 9 to achieve automatic pressure relief. In addition, in order to facilitate manual intervention, the end of the transmission rod 2 10 away from the valve core 9 extends to the outside of the valve cylinder 6 and is fixedly equipped with a push-pull handle. The outer diameter of the push-pull handle is larger than the rod diameter of the transmission rod 2 10. The operator can push the push-pull handle to drive the transmission rod 2 10 and the valve core 9 to move axially, thereby manually opening the pressure relief channel.

[0030] As a preferred implementation method, to provide intuitive feedback on the adjustment status of the intake airflow and to assist in achieving precise control, please refer to... Figure 1 The transmission rod 3 is located in the middle of the rod body outside the air intake cavity 1 and is fixedly installed with a dial 4 by means of tight fit or key connection. The surface of the dial 4 is set with angle indication marks by laser marking or etching process. The dial 4 can rotate synchronously with the transmission rod 3. By observing the angle change of the angle indication mark on the dial 4 relative to a certain fixed reference point on the top of the air intake cavity 1, the operator can judge the deflection angle of the internal blocking plate 5 and the degree of opening of the air intake channel.

[0031] As another preferred embodiment, to ensure the airtightness of the device when connected to external reaction equipment and to prevent gas leakage during the cryogenic deposition process, please refer to... Figure 1 The end of the air intake chamber 1 away from the valve cylinder 6 is integrally formed or welded with a flange 11. The flange 11 is used to bolt to the docking port of the external reaction chamber. The inner end face of the flange 11 is provided with a recessed annular mounting groove along the circumferential direction. A sealing ring 12 is interference-fitted and fixed in the annular mounting groove. The sealing ring 12 is preferably made of low-temperature resistant fluororubber. When the flange 11 is locked with the reaction chamber, the sealing ring 12 is compressed and undergoes elastic deformation to fill the tiny gaps between the connecting surfaces, thereby forming a reliable static sealing structure.

[0032] As a further preferred embodiment, in order to ensure the dynamic sealing performance of the moving parts during the adjustment process and prevent external air from seeping in or internal process gas from leaking out, a first dynamic sealing component is provided at the rotational engagement point between the transmission rod 1 3 and the top of the air intake cavity 1. The first dynamic sealing component is embedded in the mounting hole at the top of the air intake cavity 1 and fits tightly against the outer circumferential surface of the transmission rod 1 3. At the same time, a second dynamic sealing component is provided between the transmission rod 2 10 and the guide hole in the middle of the fixed disk 7. The second dynamic sealing component is located on the inner wall of the guide hole of the fixed disk 7 and forms a sliding sealing engagement with the outer surface of the transmission rod 2 10. Both the first dynamic sealing component and the second dynamic sealing component can adopt a multi-O-ring series combination or a magnetic fluid sealing structure.

[0033] As another preferred embodiment, to prevent the valve core 9 from accidentally dislodging at its extreme position and to facilitate manual operation, please refer to... Figure 4 The valve core 9 is machined into a smooth sealing surface in the shape of a hemispherical or frustum on the side facing the inner wall of the valve cylinder 6. The maximum outer diameter of the valve core 9 is designed to be larger than the diameter of the guide hole in the middle of the fixed plate 7. Thus, the fixed plate 7 is used as the limit stop for the valve core 9 to move inward. In addition, a push-pull handle is fixedly connected to one end of the transmission rod 10 that extends to the outside of the valve cylinder 6. The outer diameter of the push-pull handle is larger than the rod diameter of the transmission rod 10. The surface of the push-pull handle is provided with anti-slip texture so that the operator can apply pulling or pushing force steadily when manual pressure relief is required.

[0034] Working principle: When it is necessary to adjust the gas flow rate into the subsequent reaction chamber to meet the requirements of the low temperature deposition process, the operator manually rotates the transmission rod 3 located at the top of the air intake chamber 1. Since one end of the transmission rod 3 located inside the air intake chamber 1 is fixedly connected to the fixed block 2 and the fixed block 2 is fixedly connected to the blocking plate 5, the rotation of the transmission rod 3 will be synchronously transmitted to the blocking plate 5 through the fixed block 2, causing the blocking plate 5 to rotate in the air intake channel of the air intake chamber 1. As the deflection angle of the blocking plate 5 relative to the axis of the air intake chamber 1 changes, the blocking area of ​​the blocking plate 5 on the airflow changes, thereby linearly and smoothly adjusting the effective flow cross-sectional area of ​​the air intake channel. At the same time, the scale 4 fixedly installed outside the transmission rod 3 rotates synchronously with the transmission rod 3. The operator can accurately know the current position of the blocking plate 5 by observing the angle indicator on the scale 4, thereby achieving precise quantitative control of the air intake flow rate. When the gas pressure inside the intake chamber 1 rises and exceeds the set safety threshold due to abnormal reaction, pipeline blockage, or uncontrolled gas supply, the device activates the automatic pressure relief protection mechanism. The high-pressure gas in the intake chamber 1 acts directly on the surface of the valve core 9. The gas pressure generates thrust and overcomes the elastic preload applied to the valve core 9 by the pressure relief spring 8, forcing the valve core 9 to move axially toward the fixed plate 7. This causes the outer circumferential sealing surface of the valve core 9 to disengage from the sealing contact with the inner wall of the valve cylinder 6, thereby opening the pressure relief channel in the valve cylinder 6 to quickly discharge the overpressure gas. When the pressure inside the intake chamber 1 drops below the safety set value, the thrust of the gas on the valve core 9 decreases, the pressure relief spring 8 releases the stored elastic potential energy, and uses the elastic restoring force to push the valve core 9 to move in the opposite direction until it is tightly pressed against the inner wall of the valve cylinder 6 again, closing the pressure relief channel and restoring the sealing state. In the event of equipment shutdown for maintenance, pipeline cleaning, or emergency manual intervention to reduce internal pressure, the operator can actively pull the transmission rod 10 located outside the valve cylinder 6 or its push-pull handle. Under the action of external pulling force, the transmission rod 10 slides axially along the guide hole in the middle of the fixed plate 7. The transmission rod 10 drives the valve core 9 fixed thereto to overcome the resistance of the pressure relief spring 8 and move towards the fixed plate 7. The valve core 9 is manually forced to separate from the inner wall of the valve cylinder 6 to open the pressure relief channel for venting. After completing the manual pressure relief operation, the operator removes the external force applied to the transmission rod 10. The pressure relief spring 8 drives the valve core 9 and the transmission rod 10 to automatically reset, ensuring that the device always remains normally closed and sealed when not in operation. When the device is mechanically connected to the external reaction chamber via flange 11, the sealing ring 12 embedded in flange 11 undergoes elastic deformation under the connection pressure, tightly filling the microscopic gap between flange 11 and the reaction chamber docking end face, thereby constructing a reliable static sealing structure during the low-temperature deposition process. Together with the dynamic sealing components set at transmission rod 1 3 and transmission rod 2 10, it effectively prevents the leakage of toxic process gases or the intrusion of external air into the air intake chamber 1, ensuring the purity and safety of the thin film deposition atmosphere.

Claims

1. An atmosphere conditioning device for low-temperature deposition of GeN / SiN thin films, including an air inlet chamber (1); Its features are, The top of the air intake cavity (1) is rotatably connected to a transmission rod (3). One end of the transmission rod (3) located inside the air intake cavity (1) is fixedly connected to a fixed block (2). The outer wall of the fixed block (2) is fixedly connected to a blocking plate (5). The blocking plate (5) is located in the air intake channel of the air intake cavity (1). A valve cylinder (6) is fixedly provided in the middle of the air intake cavity (1). A fixed plate (7) is fixedly connected to the inner wall of the valve cylinder (6). A transmission rod (10) is slidably connected through the fixed plate (7). One end of the transmission rod (10) located inside the valve cylinder (6) is fixedly connected to the middle of the valve core (9). A pressure relief spring (8) is connected between the valve core (9) and the fixed plate (7). One end of the pressure relief spring (8) is fixedly connected to the valve core (9), and the other end of the pressure relief spring (8) is fixedly connected to the inner wall of the fixed plate (7). In its natural state, the pressure relief spring (8) is in a compressed state and pushes the valve core (9) to seal against the inner wall of the valve cylinder (6).

2. The atmosphere conditioning device for low-temperature deposition of GeN / SiN thin films according to claim 1, characterized in that, A dial (4) is fixedly installed in the middle of the transmission rod (3). The dial (4) is located outside the air intake cavity (1) and rotates synchronously with the transmission rod (3). Angle indicator marks are provided on the surface of the dial (4).

3. The atmosphere conditioning device for low-temperature deposition of GeN / SiN thin films according to claim 1, characterized in that, A flange (11) is fixedly connected to one end of the air intake chamber (1), and a sealing ring (12) is fixedly connected to the inner wall of the flange (11). The sealing ring (12) is used to form a sealing structure when the flange (11) is connected to the external reaction chamber.

4. The atmosphere conditioning device for low-temperature deposition of GeN / SiN thin films according to claim 1, characterized in that, The pressure relief spring (8) is sleeved on the outer periphery of the transmission rod (10), and the pressure relief spring (8) is located in the space between the valve core (9) and the fixed plate (7).

5. The atmosphere conditioning device for low-temperature deposition of GeN / SiN thin films according to claim 1, characterized in that, The valve core (9) is hemispherical or frustoconical, and the maximum outer diameter of the valve core (9) is greater than the diameter of the through hole in the middle of the fixed plate (7) through which the transmission rod (10) passes.

6. The atmosphere conditioning device for low-temperature deposition of GeN / SiN thin films according to claim 1, characterized in that, The rotation plane of the blocking disc (5) is perpendicular to or at a certain angle to the axis of the air intake cavity (1). The flow area of ​​the air intake channel is changed by the rotation position of the blocking disc (5) in the air intake cavity (1).

7. The atmosphere conditioning device for low-temperature deposition of GeN / SiN thin films according to claim 1, characterized in that, A first dynamic seal is provided at the connection between the transmission rod one (3) and the air intake cavity (1), and a second dynamic seal is provided at the sliding fit between the transmission rod two (10) and the fixed disk (7).

8. The atmosphere conditioning device for low-temperature deposition of GeN / SiN thin films according to claim 1, characterized in that, The transmission rod 2 (10) passes through the fixed plate (7) and extends to the outside of the valve cylinder (6) with a push-pull handle fixed at one end. The outer diameter of the push-pull handle is larger than the rod diameter of the transmission rod 2 (10).

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