FCVD machine uv cavity cleaning gas uniform device

Abstract

The utility model relates to the technical field of semiconductor manufacturing, concretely is a FCVD machine platform UV cavity clean gas uniform gas device, including the uniform gas main body base, the inside of uniform gas main body base is provided with the annular inner chamber, the bottom of uniform gas main body base is provided with the air inlet connector, the air inlet connector is provided with the air inlet hole that communicates with the inner chamber, the air inlet connector airtightness inserts in the UV cavity air inlet, the top of uniform gas main body base is provided with a plurality of air outlet holes, and the air outlet hole communicates with the inner chamber. The FCVD machine platform UV cavity clean gas uniform gas device improves gas flow rate and direction, realizes efficient uniform diffusion reaction, shortens single cleaning cycle, improves 33% efficiency, saves a large amount of machine platform time every year, and the sealing ring guarantees that gas does not leak; the supporting device stabilizes the position; the adjustable blockage can flexibly control the gas flow direction, and ensures clean, efficient and complete.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor manufacturing technology, specifically to a gas homogenization device for cleaning gas inside the UV cavity of an FCVD machine. Background Technology

[0002] In semiconductor manufacturing fabs, UV chambers are key process equipment, and their cleaning efficiency directly affects machine capacity and product capacity. In the flowable chemical vapor deposition (FCVD) process, fluorine-containing cleaning gas needs to be introduced into the UV chamber in each work cycle to remove impurities deposited on the inner wall of the chamber and the surface of components, ensuring the stability of subsequent processes and product quality.

[0003] However, the original UV chamber design has significant flaws in the distribution of cleaning gas. Due to uneven gas distribution, there are significant differences in cleaning performance inside the chamber. Specifically, the cleaning effect at the end near the air inlet meets the standard, while the distant area still fails to meet the cleaning standard. This unevenness forces customers to extend the cleaning time to 1 hour to ensure the overall cleaning effect. However, in a fab, time cost is equivalent to wafer output. Every minute saved means a considerable increase in efficiency. Excessive cleaning time seriously affects the utilization rate of the machine, reduces production efficiency, and increases production costs.

[0004] Therefore, customers urgently need to optimize hardware design to achieve uniform distribution of cleaning gas within the UV chamber, thereby shortening the cleaning cycle time and achieving the core goal of cost reduction and efficiency improvement. To address this pain point for customers, we proposed an innovative design solution called GasDistributionRing. By reconstructing the airflow path, it enables efficient and uniform diffusion and reaction of cleaning gas within the chamber, thereby significantly improving cleaning efficiency.

[0005] This invention designs a gas homogenizing device for the clean gas inside the UV cavity of an FCVD machine to solve the problem of uneven distribution of clean gas in the prior art. Summary of the Invention

[0006] To address the aforementioned issues, this invention provides a gas homogenization device for cleaning the UV cavity of an FCVD machine. This device improves gas flow rate and direction to achieve efficient and uniform diffusion reaction, shortening the single cleaning cycle and increasing efficiency by 33%, saving significant machine time annually. A sealing ring prevents gas leakage; a support device stabilizes the device's position; and adjustable plugs allow for flexible control of gas flow, ensuring efficient and complete cleaning.

[0007] The technical solution of this utility model is as follows: A gas equalization device for cleaning gas in the UV cavity of an FCVD machine includes a gas equalization main base with an annular inner cavity inside. An air inlet connector is provided at the bottom of the gas equalization main base, and the air inlet connector has an air inlet hole communicating with the inner cavity. The air inlet connector is airtightly inserted into the air inlet in the UV cavity. Several air outlet holes are provided at the top of the gas equalization main base, and the air outlet holes communicate with the inner cavity.

[0008] The bottom of the uniform air distribution base is equipped with an adjustable height support device.

[0009] The support device includes a support rod, which consists of a rod body and a support. The rod body is connected to the gas uniform body base by a threaded connection.

[0010] A nut is fixedly installed on the gas-uniform body base. A through hole is provided on the gas-uniform body base. The through hole is concentric with the center of the nut. The through hole avoids the inner cavity position. The rod passes through the through hole and is threadedly engaged with the nut.

[0011] There should be at least two support rods.

[0012] The air inlet connector is inserted into the air inlet of the UV chamber via a sealing ring.

[0013] The diameter of the air outlet increases sequentially with respect to its distance from the air inlet.

[0014] Optionally, the cleaning gas equalization device in the UV chamber of the FCVD machine also includes a plug that can adjust the size of the air outlet, with a vent hole in the center of the plug, and the plug is fixedly installed in the air outlet.

[0015] Optionally, the cleaning gas equalization device in the UV cavity of the FCVD machine also includes a solid plug that can block the gas outlet, and the plug is fixedly installed in the gas outlet.

[0016] The plug is fixedly installed in the vent hole by threaded connection.

[0017] The beneficial effects of this utility model are as follows: 1. This utility model discloses a gas equalization device for cleaning gas in the UV cavity of an FCVD machine. The gas equalization device improves the flow rate and direction of the cleaning gas by using the coordinated design of the annular inner cavity of the gas equalization main body base, the air inlet connector and the air outlet, and the setting of the air outlet diameter increasing in sequence according to the distance from the air inlet. Combined with the airflow laminarization method (gradually expanding air channel + micropore gradient array), the cleaning gas achieves efficient and uniform diffusion and reaction in the cavity, solving the problem of uneven gas distribution in the original design. The single cleaning cycle is shortened from 60 minutes to 40 minutes, the efficiency is improved by 33%, and hundreds of hours of machine time can be saved for customers every year.

[0018] 2. The present invention discloses a gas equalization device for cleaning gas in the UV cavity of an FCVD machine. The gas equalization device has a base designed with a sealing joint that matches the size of the air inlet of the UV cavity. It is airtightly inserted into the air inlet of the UV cavity through a sealing ring to ensure that the gas cannot be leaked or lost after installation, and to ensure that all the cleaning gas enters the UV cavity to participate in the cleaning work.

[0019] 3. The present invention discloses a gas equalization device for cleaning gas in the UV cavity of an FCVD machine. The bottom of the gas equalization main body base of the gas equalization device is provided with an adjustable height support device, which can fix the position of the gas equalization main body base in the UV cavity. By adjusting the thread of the support rod, the plane and height of the gas equalization main body base can be finely adjusted to ensure that the gas outlet direction is perpendicular to the cavity surface, balance the airflow direction, ensure that the airflow passes through the main body base stably and the gas outlet is stable, and at the same time ensure the stability of the main body base during installation.

[0020] 4. This utility model discloses a gas equalization device for cleaning gas inside the UV cavity of an FCVD machine. The gas equalization device for cleaning gas inside the UV cavity of the FCVD machine is equipped with a plug that can adjust the size of the gas outlet and a solid plug that can block the gas outlet. Based on the information feedback from the map monitored in real time during the cleaning process, when it is necessary to adjust or block the gas flow direction, the corresponding plug is installed in the gas outlet of the gas equalization body base, so as to realize flexible control of the gas flow direction and ensure efficient and complete cleaning.

[0021] 5. The present invention discloses a gas equalization device for cleaning the UV cavity of an FCVD machine. This gas equalization device can uniformly clean the cavity, reduce the situation where the FCVD machine's production efficiency is reduced due to incomplete cleaning caused by uneven gas distribution, improve the working efficiency of the equipment, reduce downtime, and improve the wafer output efficiency and quality of FAB plants. Attached Figure Description

[0022] The advantages and solutions of this application will become clear to those skilled in the art upon reading the following detailed description of preferred embodiments. The accompanying drawings are for illustrative purposes only and are not intended to limit the scope of this invention.

[0023] In the attached diagram: Figure 1 This is a top view of a gas homogenizing device for cleaning gas inside the UV cavity of an FCVD machine according to an embodiment of the present invention. Figure 2 for Figure 1 Sectional view of AA; Figure 3This is a top view of the gas equalization body base of a gas equalization device for cleaning gas in the UV cavity of an FCVD machine according to an embodiment of the present invention. Figure 4 for Figure 3 BB section view; Figure 5 This is a schematic diagram of the structure of a support rod for a gas equalization device for cleaning gas inside the UV cavity of an FCVD machine, according to an embodiment of the present invention. Figure 6 This is a schematic diagram of the blockage structure of a gas equalization device for cleaning gas inside the UV cavity of an FCVD machine according to an embodiment of the present invention. The components represented by the various reference numerals in the diagram are: This utility model comprises: 1. a gas-equalizing main body base, 11. an air inlet connector, 111. an air inlet hole, 12. an air outlet hole, 13. an inner cavity, 14. a through hole, 2. a nut, 3. a support rod, 31. a rod body, 32. a support, 4. a plug, 41. a vent hole, and 5. a sealing ring. Detailed Implementation

[0024] like Figure 1 and Figure 2 As shown, the gas equalization device for the clean gas inside the UV cavity of the FCVD machine mainly consists of a gas equalization base 1, a nut 2, a support rod 3, a plug 4, and a sealing ring 5.

[0025] This device is used to connect the air inlet in the UV chamber and is placed below the heater. It is designed to improve the flow rate and direction of the cleaning gas, achieve uniform cleaning of the chamber, improve equipment efficiency, reduce downtime, and improve wafer production efficiency and quality.

[0026] like Figure 3 and Figure 4 As shown, the gas equalization main body base 1 adopts an internal cavity vacuum welding structure. The gas equalization main body base 1 is designed with a sealed air inlet connector 11 that is consistent with the size of the air inlet of the UV cavity. It has an annular inner cavity 13 inside and an air inlet connector 11 at the bottom. The air inlet connector 11 has an air inlet hole 111 that communicates with the inner cavity 13. The air inlet connector 11 is inserted into the air inlet of the UV cavity through a sealing ring 5 to ensure that the gas cannot leak or be lost after installation.

[0027] The gas distribution base 1 adopts a double-layer electron beam welded structure of aluminum alloy. The upper cover plate is designed with air outlet holes 12 of different diameters. The air outlet holes 12 are connected to the inner cavity 13, and the diameter of the air outlet holes 12 increases sequentially according to the distance from the air inlet hole 111. Through simulation by finite element software, the flow velocity and flow rate are calculated to obtain the aperture distribution cloud map of the reasonable position, so as to achieve uniform gas distribution.

[0028] Nut 2 is fixedly installed on the gas equalization main body base 1 by welding or other means. The gas equalization main body base 1 is provided with a through hole 14, which is concentric with the center of nut 2. The through hole 14 avoids the position of the inner cavity 13. Nut 2 cooperates with support rod 3 to adjust and lock the fixed position of gas equalization main body base 1 in UV cavity and balance the airflow direction, so as to ensure the stable flow direction and exhaust of air when passing through the main body base, and to ensure the stability of the main body base during installation.

[0029] like Figure 5 As shown, the support rod 3 consists of a rod body 31 and a support 32. The rod body 31 passes through the through hole 14 on the gas equalization body base 1 and is threadedly engaged with the nut 2, and is connected to the gas equalization body base 1 through the threaded engagement. At least two support rods 3 are provided. After the gas equalization body base 1 is installed in the UV cavity, the plane and height of the gas equalization body base 1 can be finely adjusted by rotating and adjusting the support rods 3 to ensure that the direction of the gas outlet is perpendicular to the surface of the cavity.

[0030] There are two types of blockage 4. One type is a blockage 4 with adjustable vent size 12, such as... Figure 6 As shown, a vent 41 is provided in the center of the plug 4; another type is a solid plug 4 that can block the vent 12; the plug 4 is fixedly installed in the vent 12 by threaded connection. The plug 4 is installed in the vent 12 of the gas distribution body base 1 to block the small hole where the gas flow needs to be adjusted and blocked according to the information feedback from the map map monitored in real time during the cleaning process.

[0031] The sealing ring 5 is installed at the air inlet connector 11 of the gas equalization body base 1. When the air inlet connector 11 is inserted into the air inlet of the UV cavity, the sealing ring 5 plays a sealing role to prevent gas leakage and loss.

[0032] The working process and principle of the gas equalization device for the UV cavity of the FCVD machine are as follows: Install the sealing ring 5 onto the air inlet connector 11 of the gas equalization main body base 1, ensuring a secure installation and good sealing effect; install the gas equalization main body base 1 at the air inlet of the UV cavity, ensuring the air inlet connector 11 is accurately inserted into the air inlet, relying on the sealing ring 5 to prevent gas leakage after installation; pass the rod 31 of the support rod 3 through the through hole 14 on the gas equalization main body base 1, and connect it with the nut 2 fixedly installed on the gas equalization main body base 1 via threaded engagement, thus achieving the desired gas equalization effect. After the two support rods 3 are installed, the plane and height of the gas-distributing main body base 1 are finely adjusted by adjusting the threads of the support rods 3 to ensure that the direction of the gas outlet is perpendicular to the cavity surface and to ensure the stable installation of the gas-distributing main body base 1. When the clean gas enters the inner cavity 13 of the gas-distributing main body base 1 through the air inlet 111 of the air inlet connector 11, the gas undergoes initial buffering and diffusion in the inner cavity 13 due to its annular structure. The gas flows from the inner cavity 13 to each air outlet 12, and the diameter of the air outlet 12 increases sequentially according to the distance from the air inlet 111. This gradual diffusion of the gas... The design incorporates a microporous gradient array (distribution of air outlets 12 with different pore sizes) to achieve efficient and uniform diffusion of cleaning gas within the cavity through laminar airflow. Finite element analysis software simulation yields a reasonable pore size distribution cloud map, further optimizing gas distribution and ensuring gas uniformity within the cavity. After all components are installed, cleaning begins. With the introduction of cleaning gas, it enters the UV cavity uniformly through the air outlets 12 of the gas distribution base 1, cleaning the cavity. During the cleaning process, the equipment's monitoring system... Analysis is conducted, and based on the map information obtained from monitoring, it is understood which areas have good cleaning effects and which areas have problems. For areas where gas flow needs to be adjusted, a plug 4 (with a vent 41) that can adjust the size of the vent 12 is installed into the corresponding vent 12, and the gas flow is adjusted by changing the size of the vent 41. For areas where gas flow needs to be blocked, a solid plug 4 is installed into the corresponding vent 12 to block the small hole and prevent gas from flowing out. By adding or removing the position of the plug 4 in a timely manner, efficient and complete cleaning can be ensured.

[0033] After adopting this gas equalization device, the single cleaning cycle was shortened from 60 minutes to 40 minutes, improving efficiency by 33% and saving customers hundreds of hours of machine time each year. The first test passed, and the cleaning uniformity fully met the standards, gaining high recognition from customers. This gas equalization ring is a high-frequency consumable, which is expected to bring stable repurchases every year and is expected to be promoted to similar equipment. With "deep customization + technological innovation" as the core, it not only solved the engineering problem of uneven gas distribution, but also provided customers with high-value-added technical services through a closed-loop process of "measurement-design-simulation-verification".

Claims

1. A gas homogenization device for cleaning gas inside the UV cavity of an FCVD machine, characterized in that, The system includes a gas equalization main body base (1), which has an annular inner cavity (13) inside. The bottom of the gas equalization main body base (1) is provided with an air inlet connector (11), which has an air inlet hole (111) communicating with the inner cavity (13). The air inlet connector (11) is airtightly inserted into the air inlet of the UV cavity. The top of the gas equalization main body base (1) is provided with several air outlet holes (12), which communicate with the inner cavity (13).

2. The gas homogenizing device for cleaning gas in the UV cavity of an FCVD machine according to claim 1, characterized in that, The bottom of the gas-uniform main body base (1) is provided with an adjustable height support device.

3. The gas homogenizing device for cleaning gas in the UV cavity of an FCVD machine according to claim 2, characterized in that, The support device includes a support rod (3), which is composed of a rod body (31) and a support (32). The rod body (31) is connected to the gas-equalizing main body base (1) by a threaded connection.

4. The gas homogenizing device for cleaning gas in the UV cavity of an FCVD machine according to claim 3, characterized in that, A nut (2) is fixedly installed on the gas equalization body base (1). A through hole (14) is provided on the gas equalization body base (1). The center of the through hole (14) is concentric with the center of the nut (2). The through hole (14) avoids the position of the inner cavity (13). The rod (31) passes through the through hole (14) and is threadedly engaged with the nut (2).

5. The gas homogenizing device for cleaning gas in the UV cavity of an FCVD machine according to claim 3, characterized in that, At least two support rods (3) are provided.

6. The gas homogenizing device for cleaning gas in the UV cavity of an FCVD machine according to claim 1, characterized in that, The air inlet connector (11) is inserted into the air inlet of the UV cavity through the sealing ring (5).

7. The gas homogenizing device for cleaning gas in the UV cavity of an FCVD machine according to claim 1, characterized in that, The diameter of the air outlet (12) increases sequentially with respect to the distance from the air inlet (111).

8. The gas homogenizing device for cleaning gas in the UV cavity of an FCVD machine according to claim 1, characterized in that, It also includes a plug (4) that can adjust the size of the vent (12), with a vent (41) in the center of the plug (4), and the plug (4) is fixedly installed in the vent (12).

9. A gas homogenizing device for cleaning gas in the UV cavity of an FCVD machine according to claim 1, characterized in that, It also includes a solid plug (4) that can block the air outlet (12), and the plug (4) is fixedly installed in the air outlet (12).

10. A gas homogenizing device for cleaning gas in the UV cavity of an FCVD machine according to claim 8 or 9, characterized in that, The plug (4) is fixedly installed in the vent (12) by threaded connection.

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