Single crystal furnace thermal field device with double-dimension impurity control structure

Abstract

The utility model discloses a single crystal furnace heat field device with double dimension control miscellaneous structure belongs to single crystal furnace heating device field, including heating bin, the outer wall of heating bin is provided with the miscellaneous component of removing, the miscellaneous component of removing includes the vacuum generator of installing in the heating bin lateral wall, the negative pressure end of vacuum generator is installed with dust absorption pipe, the outer wall sliding sleeve of dust absorption pipe has the miscellaneous filter screen of removing, the inner bottom of slide groove of heating bin is fixedly connected with the connecting block through compression spring, a plurality of connecting blocks are fixedly connected in the outer side wall of miscellaneous filter screen of removing, through the cooperation of each device, in raw material processing, through double screening, remove the impurity in raw material, utilize the miscellaneous filter screen of physical shaking to cooperate dust absorption pipe and vacuum generator's vacuum adsorption to the impurity in material is carried out quick suction to improve the cleaning effect of material, and then improve the production quality of material processing.

Description

Technical Field

[0001] This utility model relates to the technical field of single crystal furnace heating devices, specifically a single crystal furnace thermal field device with a dual-dimensional impurity control structure. Background Technology

[0002] The heating device of the single crystal furnace is a core component used to provide a stable and controllable high-temperature environment for crystal growth. Its main function is to heat the polycrystalline silicon raw material to a molten state (the melting point of silicon is about 1410℃) and maintain the stability of the melt temperature field, thus creating conditions for the directional solidification growth of single crystal silicon.

[0003] An investigation revealed a utility model patent (publication number: CN222524755U) disclosing an oxygen reduction device for the hot zone of a single crystal furnace. The device includes a main heater located on the upper periphery of a quartz crucible for heating it; side heaters located on the lower periphery of the quartz crucible and below the main heater; the side heaters are configured to heat the quartz crucible during the silicon melting stage and to be shut off during the equal-diameter stage; and a water-cooling device connected to the side heaters and configured to activate during the equal-diameter stage to dissipate heat from the side heaters. This application, by shutting off the side heaters during the equal-diameter stage and additionally providing a water-cooling device, reduces oxygen levels by minimizing heat convection at the bottom of the quartz crucible, thereby effectively improving product quality and increasing the capacity of the single crystal furnace.

[0004] Although the aforementioned patent, through the arrangement of components such as side heaters, water cooling devices, and main heaters, and through the cooperation of these components, can rapidly reduce oxygen levels and increase production capacity by reducing heat convection at the bottom of the quartz crucible during the heating process, the presence of certain impurities in the material during heating can lead to a decline in production quality if the raw materials are not screened before uniform heating.

[0005] Therefore, this invention provides a single-crystal furnace thermal field device with a dual-dimensional impurity control structure to solve the above problems. Utility Model Content

[0006] (a) Technical problems to be solved

[0007] This invention provides a single-crystal furnace hot zone device with a dual-dimensional impurity control structure, aiming to solve the problems mentioned in the background art.

[0008] (II) Technical Solution

[0009] To achieve the above objectives, this utility model provides the following technical solution:

[0010] A single-crystal furnace thermal field device with a dual-dimensional impurity control structure includes a heating chamber, the outer wall of which is provided with an impurity removal component;

[0011] The impurity removal assembly includes a vacuum generator installed on the outer wall of the heating chamber. A suction pipe is installed on the negative pressure end of the vacuum generator. An impurity removal filter is slidably sleeved on the outer wall of the suction pipe. A sliding groove is opened on the inner side wall of the heating chamber. A connecting block is fixedly connected to the inner bottom end of the sliding groove by a compression spring. Multiple connecting blocks are fixedly connected to the outer wall of the impurity removal filter.

[0012] In practical use, the impurity removal component can remove impurities mixed in with the material through a double screening method, ensuring the quality of material processing and preparation. The longitudinally moving impurity removal filter screen, combined with the negative pressure adsorption dust suction pipe, can drive the material to be continuously longitudinally stirred, thereby quickly removing dust and lighter impurities.

[0013] As a preferred technical solution of this application, the impurity removal component further includes a device base installed on the inner side wall of the heating chamber, a pneumatic motor installed inside the device base, an abutment plate installed at the output end of the pneumatic motor, and an abutment rod fixedly connected to the outer wall of the abutment plate.

[0014] In practical use, the pneumatic motor can be stably installed through the equipment base, thereby improving its stability during operation. By using the abutment plate at the output end of the pneumatic motor, the abutment rod can be driven to continuously abut against the impurity removal filter screen as the motor runs, thereby driving the material to move longitudinally at the same time.

[0015] As a preferred technical solution of this application, a curved pipe is fixedly connected to the outer wall of the suction pipe, a suction cup is installed at the end of the curved pipe, and the outer surface of the suction cup is coated with a high-temperature resistant coating.

[0016] In practical use, the curved tube on the outer wall of the suction pipe can be used to absorb the materials inside the equipment while the suction pipe is used in conjunction with the suction cup to quickly suck up the dust and impurities on the filter screen due to shaking and undulation, thereby removing the impurities at the same time and maintaining the quality and efficiency of material processing and preparation. The high-temperature resistant coating can prevent the high temperature of the preparation from affecting the curved tube during processing.

[0017] As a preferred technical solution of this application, an air pump is installed on the outer wall of the heating chamber. The output end of the air pump is fixedly connected to the input end of the vacuum generator through a high-pressure pipe, and the other output end of the air pump is fixedly connected to the input end of the pneumatic motor through a flexible hose.

[0018] In practical use, an air pump can be used to quickly pump compressed air into a high-pressure pipe, which is then delivered to a vacuum generator. This causes the negative pressure end of the vacuum generator to generate negative pressure suction, thereby ensuring the adsorption efficiency of dust. A flexible hose can be used to deliver compressed air to a pneumatic motor, enabling it to run quickly and stably, which in turn drives the contact plate to rotate.

[0019] As a preferred technical solution of this application, the side wall of the heating chamber is threaded with a locking pin, the outer wall of the locking pin is threaded with a locking block, the bottom end of the locking block is fixedly connected with a bottom filter plate, and the top end of the locking block is fixedly connected with a lifting ring.

[0020] In practical use, the locking pins and locking blocks can be used to quickly and stably install the bottom filter disc.

[0021] As a preferred technical solution of this application, the outer wall of the heating chamber is fixedly connected with a support rod, and the bottom end of the plurality of support rods is fixedly connected with a base.

[0022] In actual use, the support rod can be used to maintain the stability of the connection between the base and the heating chamber.

[0023] As a preferred technical solution of this application, the outer side wall of the base is fixedly connected to a mounting seat, and the inner wall of the mounting seat is provided with a mounting groove.

[0024] In practical use, the mounting base allows for quick installation with the installation environment, maintaining stable performance during use.

[0025] (III) Beneficial Effects

[0026] By incorporating the impurity removal components, the various parts work together to remove impurities from the raw materials through double screening during processing. The physical vibration of the impurity removal filter, combined with the vacuum suction pipe and vacuum generator, rapidly extracts impurities from the materials, thereby improving the cleanliness of the materials and ultimately enhancing the production quality of the material processing. Attached Figure Description

[0027] Figure 1 This is a schematic diagram of the overall structure of this utility model;

[0028] Figure 2 This is a schematic diagram of the suction cup structure in this utility model;

[0029] Figure 3 This is a schematic diagram of the structure of the equipment base in this utility model;

[0030] Figure 4 for Figure 3 Schematic diagram of the structure at point A;

[0031] Figure 5 This is a schematic diagram of the structure of the bottom filter disc of this utility model.

[0032] In the picture:

[0033] 1. Heating chamber; 2. Vacuum generator; 3. Dust suction pipe; 4. Impurity removal filter screen; 5. Slide groove; 6. Compression spring; 7. Connecting block; 8. Equipment base; 9. Pneumatic motor; 10. Abutment plate; 11. Abutment rod; 12. Bend; 13. Suction cup; 14. Air pump; 15. High pressure pipe; 16. Hose; 17. Locking pin; 18. Locking block; 19. Bottom filter plate; 20. Support rod; 21. Base; 22. Mounting base. Detailed Implementation

[0034] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0035] This invention provides a single-crystal furnace thermal field device with a dual-dimensional impurity control structure, such as... Figures 1-5 As shown, the single crystal furnace hot zone device with a dual-dimensional impurity control structure includes a heating chamber 1, and the outer wall of the heating chamber 1 is provided with an impurity removal component;

[0036] The impurity removal assembly includes a vacuum generator 2 installed on the outer wall of the heating chamber 1. A suction pipe 3 is installed on the negative pressure end of the vacuum generator 2. A filter screen 4 is slidably sleeved on the outer wall of the suction pipe 3. A groove 5 is opened on the inner side wall of the heating chamber 1. A connecting block 7 is fixedly connected to the inner bottom end of the groove 5 by a compression spring 6. Multiple connecting blocks 7 are fixedly connected to the outer wall of the filter screen 4. Through the arrangement of the impurity removal assembly, impurities mixed in with the material can be removed by double screening during material processing through the cooperation of various components, thereby improving the processing quality of the material. The negative pressure of the vacuum generator 2 is used to adsorb and quickly evacuate the impurities on the filter screen 4, while the compression spring 6 can drive the filter screen 4 to drive the connecting block 7 to slide inside the groove 5 and continuously reset.

[0037] The impurity removal assembly also includes an equipment base 8 installed on the inner wall of the heating chamber 1. A pneumatic motor 9 is installed inside the equipment base 8. An abutment plate 10 is installed at the output end of the pneumatic motor 9. An abutment rod 11 is fixedly connected to the outer wall of the abutment plate 10. Through the pneumatic motor 9 inside the equipment base 8, the continuously rotating abutment plate 10 can drive the abutment rod 11 to abut against the impurity removal filter screen 4, thereby quickly driving the material to perform longitudinal screening, and then quickly removing impurities in conjunction with vacuum adsorption.

[0038] A bend 12 is fixedly connected to the outer wall of the suction pipe 3. A suction cup 13 is installed at the end of the bend 12. The outer surface of the suction cup 13 is coated with a high-temperature resistant coating. The suction cup 13 installed at the end of the bend 12 can use its large area to adsorb impurities mixed in the material.

[0039] An air pump 14 is installed on the outer wall of the heating chamber 1. The output end of the air pump 14 is fixedly connected to the input end of the vacuum generator 2 through a high-pressure pipe 15. The other output end of the air pump 14 is fixedly connected to the input end of the pneumatic motor 9 through a hose 16. Compressed gas can be delivered to the vacuum generator 2 through the high-pressure pipe 15 at the end of the air pump 14, and gas can be delivered to the pneumatic motor 9 through the hose 16, so that it can quickly drive the abutment rod 11 to rotate.

[0040] The side wall of the heating chamber 1 is threaded with a locking pin 17, and the outer wall of the locking pin 17 is threaded with a locking block 18. The bottom end of the locking block 18 is fixedly connected to a bottom filter plate 19, and the top end of the locking block 18 is fixedly connected to a lifting ring. By cooperating with the locking pin 17 and the locking block 18, the bottom filter plate 19 can be quickly fixed, thereby intercepting the material.

[0041] Support rods 20 are fixedly connected to the outer wall of the heating chamber 1. The bottom ends of multiple support rods 20 are fixedly connected to bases 21. The support rods 20 on the outer wall of the heating chamber 1 can be used to abut the heating chamber 1 through the bases 21, thereby improving the stability of the heating chamber 1.

[0042] The outer side wall of the base 21 is fixedly connected to the mounting seat 22, and the inner wall of the mounting seat 22 is provided with a mounting groove. The mounting seat 22 can be quickly installed with the outside, thereby providing stable support.

[0043] The above description is only a preferred embodiment of the present utility model, but the protection scope of the present utility model is not limited thereto. Any equivalent substitutions or changes made by those skilled in the art within the technical scope disclosed in the present utility model, based on the technical solution and the inventive concept of the present utility model, should be included within the protection scope of the present utility model.

Claims

1. A single-crystal furnace thermal field device with a dual-dimensional impurity control structure, comprising a heating chamber (1), characterized in that: The outer wall of the heating chamber (1) is provided with a cleanliness removal component; The impurity removal assembly includes a vacuum generator (2) installed on the outer wall of the heating chamber (1), a dust suction pipe (3) installed on the negative pressure end of the vacuum generator (2), an impurity removal filter (4) slidably sleeved on the outer wall of the dust suction pipe (3), a sliding groove (5) is provided on the inner wall of the heating chamber (1), and a connecting block (7) is fixedly connected to the inner bottom end of the sliding groove (5) by a compression spring (6), and multiple connecting blocks (7) are fixedly connected to the outer wall of the impurity removal filter (4).

2. The single-crystal furnace hot zone device with a dual-dimensional impurity control structure according to claim 1, characterized in that: The impurity removal assembly also includes an equipment base (8) installed on the inner side wall of the heating chamber (1), a pneumatic motor (9) is installed inside the equipment base (8), an abutment plate (10) is installed at the output end of the pneumatic motor (9), and an abutment rod (11) is fixedly connected to the outer wall of the abutment plate (10).

3. The single-crystal furnace hot zone device with a dual-dimensional impurity control structure according to claim 2, characterized in that: The outer wall of the suction pipe (3) is fixedly connected to a bend (12), and a suction cup (13) is installed at the end of the bend (12). The outer surface of the suction cup (13) is coated with a high-temperature resistant coating.

4. The single-crystal furnace hot zone device with a dual-dimensional impurity control structure according to claim 2, characterized in that: An air pump (14) is installed on the outer wall of the heating chamber (1). The output end of the air pump (14) is fixedly connected to the input end of the vacuum generator (2) through a high-pressure pipe (15). The other output end of the air pump (14) is fixedly connected to the input end of the pneumatic motor (9) through a hose (16).

5. A single-crystal furnace hot zone device with a dual-dimensional impurity control structure according to claim 4, characterized in that: The heating chamber (1) has a locking pin (17) threadedly connected to its side wall. The locking pin (17) has a locking block (18) threadedly fitted to its outer wall. The bottom end of the locking block (18) is fixedly connected to a bottom filter plate (19), and the top end of the locking block (18) is fixedly connected to a lifting ring.

6. The single-crystal furnace hot zone device with a dual-dimensional impurity control structure according to claim 5, characterized in that: The outer wall of the heating chamber (1) is fixedly connected to a support rod (20), and the bottom ends of the multiple support rods (20) are fixedly connected to a base (21).

7. A single-crystal furnace hot zone device with a dual-dimensional impurity control structure according to claim 6, characterized in that: The outer wall of the base (21) is fixedly connected to the mounting seat (22), and the inner wall of the mounting seat (22) is provided with a mounting groove.

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