A flap valve applied to a continuous coating system and a continuous coating system

Abstract

A flap valve applied to a continuous coating system and the continuous coating system. The flap valve is arranged between adjacent first and second chambers of the continuous coating system to communicate or isolate the first and second chambers. The flap valve comprises a frame body arranged on both sides of the first and second chambers along the movement direction of the device, and a transfer channel is formed between the frame body and the first and second chambers for the device to move from the first chamber to the second chamber. A flap door is arranged between the first and second positions. When the flap door is in the first position, the transfer channel is open. When the flap door is in the second position, the transfer channel is blocked. The technical solution can optimize the coating effect and improve the coating efficiency.

Description

Technical Field

[0001] This utility model relates to the field of coating technology, and in particular to a flap valve for use in a continuous coating system and the continuous coating system. Background Technology

[0002] In many fields such as optics, electronics, and mechanics, coating technology is a key process for improving the surface performance of devices. By depositing a film of a specific material on the surface of a device, the device can obtain a variety of excellent properties such as wear resistance, corrosion resistance, high light transmittance, low reflectivity, or conductivity, thereby meeting the needs of different applications.

[0003] Currently, one of the core requirements of coating technology is to ensure the stability and purity of the coating environment. The preparation of most high-performance films requires a specific vacuum or inert gas protective environment to prevent impurities such as oxygen, water vapor, and dust in the air from reacting with the coating material or device surface, leading to quality defects such as pinholes, bubbles, and reduced adhesion. However, existing coating technologies still have significant shortcomings in environmental control: on the one hand, unreasonable sealing structures in vacuum chambers or sealed cavities are prone to sealing failure, allowing external impurities to easily penetrate the coating area. Simultaneously, residual impurities within the cavity are difficult to completely remove, directly affecting the purity and density of the film. On the other hand, some coating processes require device repositioning or transfer. Existing transfer mechanisms are prone to damaging the cavity's sealing performance during operation, or insufficient device positioning accuracy during transfer can lead to uneven film deposition and excessive film thickness deviation. Utility Model Content

[0004] The technical problem solved by this utility model is to provide an improved flap valve for use in a continuous coating system and a continuous coating system.

[0005] To solve the above-mentioned technical problems, this utility model provides a flap valve for use in a continuous coating system. The continuous coating system is used to coat a device to be coated. The flap valve is at least disposed between adjacent first and second compartments of the continuous coating system to connect or isolate the first and second compartments. The flap valve includes: a frame, along the movement direction of the device, with its two sides respectively connected to the first and second compartments, and the frame enclosing a transfer channel for the device to enter the second compartment from the first compartment; and a flap door, movable between a first position and a second position. The flap door in the first position opens the transfer channel, and the flap door in the second position blocks the transfer channel.

[0006] Optionally, the flap door is hinged to the frame, and the flap door is capable of rotating around the frame toward the interior of the transfer channel to move from the second position to the first position.

[0007] Optionally, the flap valve further includes a first driving unit connected to the flap door, the first driving unit being used to drive the flap door to rotate in order to open or close the transfer channel.

[0008] Optionally, the flip door includes a hinged end hinged to the frame and a free end opposite to it. The first driving part includes: a power part disposed outside the frame; and a connecting rod, one end of which is connected to the power part, and the other end of which is directly or indirectly hinged to the flip door. The flip door rotates about the hinged end as an axis under the drive of the connecting rod.

[0009] Optionally, the flap door is located on the side of the frame closer to the second compartment.

[0010] Optionally, the coverage area of ​​the flip-up door is greater than the exit area of ​​the transfer channel facing the second warehouse.

[0011] Optionally, the flap valve further includes a conveying unit, which is vertically and flexibly disposed on the bottom wall of the frame forming the transfer channel. The conveying unit is used to transport the device toward the second compartment. During the movement of the flap door in the first position and the second position, the conveying unit stops transporting the device and descends to avoid the movement trajectory of the flap door.

[0012] Optionally, the conveying unit includes a roller assembly structure and a horizontal rotating motor, wherein the horizontal rotating motor drives the rollers in the roller assembly structure to rotate in order to transport the device.

[0013] Optionally, the conveying unit also includes a lifting motor for driving the roller assembly structure to rise and fall.

[0014] Optionally, the conveying unit includes a transmission gear, and the horizontal rotation motor includes a horizontal rotation gear. Under the drive of the lifting motor, the roller assembly structure can: rise to the point where the transmission gear meshes with the horizontal rotation gear, and descend to the point where the transmission gear and the horizontal rotation gear are decoupled.

[0015] Optionally, during the movement of the flap door between the first position and the second position, the transport surface of the conveying part is lower than the lower edge of the flap door to avoid the movement trajectory of the flap door.

[0016] To address the aforementioned technical problems, the application also provides a continuous coating system, comprising: a first chamber for receiving a device to be coated; a second chamber for coating the device, the second chamber being disposed downstream of the first chamber; and a vacuum assembly for at least evacuating the first chamber; wherein, while the inlet of the first chamber is open to receive the device, the first chamber and the second chamber are isolated from each other; in response to the device entering the first chamber, the inlet of the first chamber is closed, and the vacuum assembly evacuates the first chamber; in response to the real-time vacuum level in the first chamber being equal to a first preset threshold, the first chamber and the second chamber are connected to each other, and the device enters the second chamber from the first chamber for coating; and a flap valve is disposed between the first chamber and the second chamber to connect or isolate the first chamber and the second chamber.

[0017] Compared with the prior art, the technical solution of this utility model embodiment has the following beneficial effects:

[0018] The technical solution of this application utilizes a flap valve in a continuous coating system. This valve forms a transfer channel by connecting its frame to the first and second chambers, providing a stable path for the movement of components between the two chambers. The movement of the flap valve between the first and second positions precisely controls the opening and closing of the transfer channel. This structural design effectively isolates the internal environments of adjacent chambers, preventing environmental interactions between different chambers from causing impurity intrusion or pressure fluctuations. This ensures the stability of the environment in each chamber and provides a fundamental guarantee for the coating quality of the components.

[0019] Furthermore, the hinged door is attached to the frame and rotates inwards towards the transfer channel, making its movement trajectory more controllable and reducing the likelihood of interference with the frame or other structures during rotation, thus improving the smoothness of the opening and closing action. Simultaneously, the inward rotation allows the door to fit more tightly against the frame when closed, reducing sealing gaps and further enhancing the isolation effect between compartments, thus lowering the risk of impurity penetration.

[0020] Furthermore, the connection between the first drive unit and the flap door enables power control of the flap door's rotation. Compared to manual or passive drive methods, this significantly improves the response speed and accuracy of the flap door's opening and closing actions. This ensures timely action at critical points where it is necessary to connect or isolate the compartment, reducing the time the compartment is exposed to or experiences environmental fluctuations. Especially in coating scenarios with stringent environmental requirements, this effectively guarantees the stability of the coating quality.

[0021] Furthermore, the first drive unit adopts an external power unit and connecting rod structure. Placing the power source outside the frame avoids pollution of the transfer channel environment by the power components, while also reducing the impact of the power components on the special environment inside the channel (such as vacuum, corrosive gases), thus extending the service life of the drive structure. The hinged connection between the connecting rod and the flip door ensures stable power transmission to the flip door, ensuring precise rotation of the flip door around the hinged end as an axis, and improving the reliability of the opening and closing action.

[0022] Furthermore, the liftable transport unit not only ensures stable transfer of components to the second compartment but also effectively avoids interference between the transport unit and the flip door by stopping transport and lowering it during the flip door's movement, guaranteeing smooth operation of the flip door. Simultaneously, the lifting design of the transport unit allows for orderly coordination between component transport and compartment isolation, reducing process stagnation caused by action conflicts, improving overall system efficiency, and preventing component displacement during flip door operation, thus ensuring the positioning accuracy of subsequent coating processes. Attached Figure Description

[0023] Figure 1 This is a schematic diagram of a continuous coating system according to an embodiment of the present invention;

[0024] Figure 2 yes Figure 1 A schematic diagram of the interior of the continuous coating system shown;

[0025] Figure 3 yes Figure 2 A schematic diagram of the vehicle components;

[0026] Figure 4 yes Figure 3 A schematic diagram of the medium-sized vehicle unit;

[0027] Figure 5 yes Figure 4 A magnified view of a portion of region A in the middle;

[0028] Figure 6 yes Figure 5 A schematic diagram of the structure shown from another perspective;

[0029] Figure 7 yes Figure 1 Schematic diagram of the intermediate process warehouse;

[0030] Figure 8 yes Figure 7 The structure shown is a cross-sectional view along the BB direction;

[0031] Figure 9 yes Figure 7 A cross-sectional view of the structure shown along the CC direction;

[0032] Figure 10 yes Figure 7 A schematic diagram of the structure shown from another perspective;

[0033] Figure 11 yes Figure 10 A cross-sectional view of the structure shown along the DD direction;

[0034] Figure 12 yes Figure 1 Schematic diagram of the central flap valve;

[0035] Figure 13 yes Figure 12 The structure shown is a cross-sectional view along the EE direction;

[0036] Figure 14 yes Figure 12 A cross-sectional view of the structure shown along the FF direction;

[0037] Figure 15 yes Figure 1 A schematic diagram of the second valve in the middle;

[0038] Figure 16 yes Figure 15 The diagram shows the second valve in the closed state.

[0039] Figure 17 yes Figure 15 A schematic diagram showing the second valve in the open state;

[0040] Figure 18 yes Figure 15 The diagram shows the second valve under maintenance conditions.

[0041] Figure 19 yes Figure 1 A schematic diagram of a variation of the continuous coating system shown;

[0042] Figure 20 yes Figure 19 Schematic diagram of the in-feed system;

[0043] Figure 21 yes Figure 20 Schematic diagram of the rotary table feeding mechanism;

[0044] Figure 22 yes Figure 21 The structure shown is a cross-sectional view along the GG direction;

[0045] Figure 23 yes Figure 21 A schematic diagram of a photoelectric counting device. Detailed Implementation

[0046] As mentioned in the background section, existing coating systems and methods have low coating efficiency.

[0047] To address the aforementioned technical problems, this application provides a flap valve for use in a continuous coating system and a continuous coating system. The flap valve is at least disposed between adjacent first and second compartments of the continuous coating system to connect or isolate the first and second compartments. The flap valve includes: a frame, along the movement direction of the device, with its two sides respectively connecting to the first and second compartments, the frame enclosing a transfer channel allowing the device to enter the second compartment from the first compartment; and a flap door, movable between a first position and a second position, the flap door in the first position opening the transfer channel, and the flap door in the second position blocking the transfer channel.

[0048] The technical solution of this application utilizes a flap valve in a continuous coating system. This valve forms a transfer channel by connecting its frame to the first and second chambers, providing a stable path for the movement of components between the two chambers. The movement of the flap valve between the first and second positions precisely controls the opening and closing of the transfer channel. This structural design effectively isolates the internal environments of adjacent chambers, preventing environmental interactions between different chambers from causing impurity intrusion or pressure fluctuations. This ensures the stability of the environment in each chamber and provides a fundamental guarantee for the coating quality of the components.

[0049] To make the above-mentioned objectives, features and beneficial effects of this utility model more apparent and understandable, the specific embodiments of this utility model will be described in detail below with reference to the accompanying drawings.

[0050] Figure 1 This is a schematic diagram of a continuous coating system 100 according to an embodiment of the present invention. Figure 2 yes Figure 1 A schematic diagram of the interior of the continuous coating system 100 is shown. This is to more clearly illustrate this embodiment. Figure 2 The functional components inside the continuous coating system 100 are illustrated in simplified form.

[0051] It should be understood that in the following detailed description of the embodiments, the first compartment may be, for example, the first buffer compartment 1, and the second compartment may be, for example, the second buffer compartment 2. Therefore, the following description uses the first buffer compartment 1 as the first compartment and the second buffer compartment 2 as the second example for illustrative purposes.

[0052] Combination Figure 1 and Figure 2 The continuous coating system 100 includes: a first buffer chamber 1 for receiving the device 200 to be coated (e.g., ...). Figure 3(As shown); process chamber 2, used for coating the device 200, the process chamber 2 is located downstream of the first buffer chamber 1; vacuum assembly 3, used at least for evacuating the first buffer chamber 1; wherein, while the inlet of the first buffer chamber 1 is open to receive the device 200, the first buffer chamber 1 and the process chamber 2 are isolated from each other; in response to the device 200 entering the first buffer chamber 1, the inlet of the first buffer chamber 1 is closed, and the vacuum assembly 3 evacuates the first buffer chamber 1; in response to the vacuum level in the first buffer chamber 1 being equal to a first preset threshold, the first buffer chamber 1 and the process chamber 2 are connected to each other, and the device 200 enters the process chamber 2 from the first buffer chamber 1 for coating.

[0053] In some embodiments, the vacuum level can be monitored in real time using a vacuum gauge.

[0054] In some embodiments, the first preset threshold may also be taken from 1 millitor (mTorr) to 200 millitor (mTorr).

[0055] Specifically, the coating device 100 has a wide range of applications in multiple fields. For example, in the field of magnetic material production, with the miniaturization of technology, the size of magnetic materials is becoming smaller and smaller. Parylene coating can completely coat these materials without any weak points. Parylene has applications in magnetic materials such as protection and mechanical modification, and it has excellent corrosion resistance, good electrical insulation, moisture resistance, and mildew resistance. In the field of rubber and sealing ring production, rubber and sealing rings may come into contact with various chemicals during use. Parylene coating can effectively isolate corrosive media such as acids, alkalis, and salts, preventing them from eroding the rubber and sealing rings, extending their service life, enhancing wear resistance, while maintaining their original flexibility and elasticity. In the medical industry, it is used for surface treatment of medical devices and biomedical sensors, improving their safety and biocompatibility, enabling medical devices to better meet clinical needs, and promoting technological progress in the medical industry. For example, surface coatings on implantable medical devices such as artificial joints and pacemakers improve their safety and service life in the human body, providing technical support for the development of the medical industry. In the aerospace field, the coating device 100 can be used to protect critical components from radiation, extreme temperatures, and corrosive media in the space environment. In the defense field, it is used to protect military equipment, enhancing its reliability and durability, and ensuring national defense security. This helps improve the technological level and equipment quality of the aerospace and defense industries, and promotes the development of related industries.

[0056] Furthermore, the coating device 100 can also be used in emerging application areas. For example, with the rapid development of emerging industries such as 5G communication, artificial intelligence, the Internet of Things, and new energy vehicles, the application of Parylene in these fields is constantly increasing, bringing new market demand and development opportunities to the Parylene industry and becoming a new economic growth point. For example, the use of Parylene coatings to improve the safety and durability of components such as battery packs, motors, and sensors in new energy vehicles has promoted the development of the new energy vehicle industry and also driven the market growth of the Parylene industry. The electronics industry produces a huge amount of circuit boards and electronic components. Hundreds of millions of circuit boards of various types are produced globally each year, and the number of electronic components is even greater. To improve the stability and reliability of electronic devices, Parylene coatings, with their superior performance in moisture resistance, mildew resistance, and corrosion resistance, make them an ideal choice for high-end electronic products. For example, key components such as motherboards, chips, and printed circuit boards in consumer electronics products such as smartphones, tablets, and laptops have extremely high requirements for protection performance, and their penetration rate in these high-end products is gradually increasing.

[0057] Furthermore, the first buffer chamber 1 is a chamber structure with a closed cavity. Along the travel direction D0 of the device 200, one end of the first buffer chamber 1 forms an entrance for the device 200 to be coated, and the other end is provided with a controllable on / off connection structure (e.g., a flap valve 7) between it and the process chamber 2, so as to realize the switching between isolation or connection between the first buffer chamber 1 and the process chamber 2.

[0058] In specific application scenarios, the device 200 may include, but is not limited to, magnetic material parts, rubber sealing rings, medical device components, automotive electronic components, sensors, electronic components, and other products that require protection or performance modification through coating.

[0059] Furthermore, the process chamber 2 is also a closed chamber structure, located downstream of the first buffer chamber 1, that is, along the transmission direction of the device 200. The process chamber 2 is located behind the first buffer chamber 1. The process chamber 2 forms a working chamber for coating the device 200. This working chamber needs to maintain a preset vacuum level during the coating process to meet the environmental requirements of the coating process (such as Pyrelin coating, vacuum evaporation coating, etc.). The chamber wall of the process chamber 2 can be opened according to the coating requirements for the feeding hole for the coating material and the evacuation hole for maintaining the vacuum environment. The process chamber 2 and the first buffer chamber 1 are connected by the aforementioned connection structure to achieve on / off control, ensuring that the vacuum level in the process chamber 2 is not affected by the first buffer chamber 1 when it is not connected.

[0060] In some embodiments, the vacuum pumping assembly 3 may include a vacuum pump, a vacuum pipe, and a vacuum detection element (such as a vacuum gauge). For example, one end of the vacuum pipe is connected to the cavity of the first buffer chamber 1, and the other end is connected to the vacuum pump. The vacuum pump is used to evacuate the cavity of the first buffer chamber 1 through the vacuum pipe to reduce the air pressure inside the first buffer chamber 1. The vacuum detection element is installed on the wall of the first buffer chamber 1 or on the vacuum pipe to detect the vacuum level inside the first buffer chamber 1 in real time. The start / stop and power of the vacuum pump can be determined according to the vacuum level.

[0061] In some embodiments, the continuous coating system 100 may further include a control unit (not shown) for controlling at least the operating state of the vacuum pump. The vacuum detection element can transmit the detected vacuum level signal to the control unit of the system, which then controls the start and stop of the vacuum pump and the connection / disconnection of the structure between the first buffer chamber 1 and the process chamber 2 based on the vacuum level signal.

[0062] In a specific application scenario, the working process of the continuous coating system 100 is as follows: when it is necessary to deliver the device 200 to be coated to the process chamber 2, firstly control the opening of the switch structure (e.g., the second valve 8) at the entrance of the first buffer chamber 1, and at the same time ensure that the connection structure (flip valve 7) between the first buffer chamber 1 and the process chamber 2 is in the closed state, so that the first buffer chamber 1 and the process chamber 2 are isolated from each other. At this time, the device 200 to be coated can be sent into the cavity of the first buffer chamber 1 through the opened entrance.

[0063] Furthermore, after the device 200 has completely entered the first buffer chamber 1, the switch structure (second valve 8) at the entrance of the first buffer chamber 1 is closed, so that the first buffer chamber 1 forms a closed cavity. Then, the vacuum pumping assembly 3 is started to perform a vacuum pumping operation on the first buffer chamber 1.

[0064] In some embodiments, during the vacuuming process, the vacuum detection element can detect the vacuum level in the first buffer chamber 1 in real time and feed the data back to the control unit. When the control unit determines that the vacuum level in the first buffer chamber 1 is equal to the first preset threshold, it controls the connection structure (flip valve 7) between the first buffer chamber 1 and the process chamber 2 to open, so that the first buffer chamber 1 and the process chamber 2 are connected to each other. At this time, the device 200 in the first buffer chamber 1 can enter the working chamber of the process chamber 2 from the first buffer chamber 1, and the process chamber 2 performs a coating operation on the device 200 according to the preset coating process.

[0065] The first preset threshold can be set according to the preset vacuum level in the process chamber 2. Typically, the error or difference between the first preset threshold and the preset vacuum level in the process chamber 2 is kept within the process tolerance range to avoid excessive pressure difference disrupting the vacuum environment of the process chamber 2 when the two are connected. The process tolerance range can be, for example, ±1% to ±10%. The preset vacuum level in the process chamber can be, for example, 1 millitor (mTorr) to 200 millitor (mTorr), and can be adjusted according to the type of device 200 to be coated, process requirements, and film type.

[0066] Therefore, through the above structural design and working logic, the continuous coating system 100 uses the first buffer chamber 1 as a pre-vacuum transition area, eliminating the need to perform vacuuming operations on the larger process chamber 2 each time the device is transported, greatly shortening the vacuuming time, while ensuring that the process chamber 2 always maintains the vacuum environment required for coating, effectively improving coating efficiency and reducing energy consumption and equipment wear costs caused by repeated vacuuming.

[0067] In some embodiments, there may be multiple process chambers 2, which are connected in series and can be selectively connected to each other.

[0068] In some embodiments, the type of coating process performed in at least one of the plurality of process chambers 2 may be different from the type of coating process performed in other process chambers 2. For example, the types of coating processes performed in two adjacent process chambers 2 may be different. In this scenario, in response to the completion of the coating process performed in the former process chamber 2, the two process chambers 2 can be connected, and the device 200 moves from the former process chamber 2 to the latter process chamber 2. In response to the device 200 being positioned in the latter process chamber 2, the two process chambers 2 are isolated from each other, and then their respective coating processes can begin to be performed.

[0069] In some embodiments, at least one of the process chambers 2 is provided with a discharge module (not shown in the figure).

[0070] In some embodiments, the process chamber 2 equipped with a discharge module can be used to perform plasma-enhanced chemical vapor deposition (PECVD) processes. During this process, the discharge module can excite the reactive gases or process gases (such as silane, ammonia, oxygen, inert gases, hydrocarbons, fluorocarbons, etc.) within the process chamber to generate plasma via radio frequency discharge, microwave discharge, or DC discharge. The active particles (ions, free radicals) in the plasma can reduce the activation energy of the deposition reaction, depositing thin films such as silicon nitride, silicon oxide, diamond-like carbon (DLC), and organic polymer films on the surface of device 200. This is suitable for the preparation of passivation layers for semiconductor devices, antireflection films for optical components, and protective films for electronic components.

[0071] Continue to refer to Figure 1 In some embodiments, the continuous coating system 100 may further include: a second buffer chamber 4 for receiving the coated device 200, the second buffer chamber 4 being disposed downstream of the process chamber 2; wherein, during the coating of the device 200, the outlet of the second buffer chamber 4 is closed, and the process chamber 2 and the second buffer chamber 4 are isolated from each other; in response to the device 200 completing coating, the second buffer chamber 4 connects to the process chamber 2 to receive the device 200; in response to the device 200 entering the second buffer chamber 4, the process chamber 2 and the second buffer chamber 4 are isolated from each other, and the outlet of the second buffer chamber 4 is open to output the device 200; in response to the device 200 leaving the second buffer chamber 4, the outlet of the second buffer chamber 4 is closed, and the vacuum assembly 3 evacuates the second buffer chamber 4 to receive the next device 200.

[0072] Specifically, the second buffer chamber 4 can also be a chamber structure with a closed cavity, located downstream of the process chamber 2 along the travel direction D0 of the device 200. That is, the process chamber 2 is located between the first buffer chamber 1 and the second buffer chamber 4, forming a device transport path of first buffer chamber 1 – process chamber 2 – second buffer chamber 4. A controllable on / off connection structure (e.g., a flap valve 7) is provided between the second buffer chamber 4 and the process chamber 2 to achieve isolation or connection between the second buffer chamber 4 and the process chamber 2. The end of the second buffer chamber 4 facing away from the process chamber 2 forms an outlet for the finished device 200 to be output. A controllable switch structure (e.g., a second valve 8) is provided at the outlet to control the isolation or connection between the second buffer chamber 4 and the external atmosphere. The second buffer chamber 4 can provide a discharge transition space for the finished device 200, avoiding the need to break the vacuum of the process chamber 2 when the device 200 is directly taken out of the process chamber 2, and ensuring that the process chamber 2 always maintains the preset vacuum level required for coating.

[0073] In practical applications, the second buffer chamber 4 can be used in conjunction with the vacuum pumping component 3. The cooperation between the two includes: the vacuum pumping component 3 can be connected to the cavity of the second buffer chamber 4, so that the vacuum pumping component 3 can perform air evacuation operation on the cavity of the second buffer chamber 4.

[0074] In some embodiments, vacuum detection elements (such as vacuum gauges) may also be installed on the walls of the second buffer chamber 4 to detect the vacuum level in the second buffer chamber 4 in real time and transmit the signal to the control unit to provide a basis for the on / off control of the second buffer chamber 4 and the process chamber 2.

[0075] Furthermore, during the coating operation of device 200 in process chamber 2, the outlet of the second buffer chamber 4 is closed, and the flap valve 7 between the second buffer chamber 4 and process chamber 2 is also closed, placing the second buffer chamber 4 in a closed cavity state. In this state, as device 200 is coated in process chamber 2, the second buffer chamber 4 can be pre-evacuated to a state close to the preset vacuum level of process chamber 2 by the vacuum assembly 3 (i.e., the vacuum level is near the first preset threshold, with an error within the process tolerance range of ±1% to ±10%), so as to receive the coated device.

[0076] Once the device 200 has completed the coating process in the process chamber 2, the flap valve 7 between the second buffer chamber 4 and the process chamber 2 is opened, allowing the second buffer chamber 4 and the process chamber 2 to communicate with each other. Since the second buffer chamber 4 has been pre-evacuated to a state that matches the vacuum level of the process chamber 2, no significant pressure fluctuations will occur when the connection is made, which can effectively protect the vacuum environment inside the process chamber 2.

[0077] Whether the device 200 has completed coating in the process chamber 2 can be determined by judging whether the coating time has reached the target time, or by coating process sensors (such as coating time timer, film thickness detection element, etc.).

[0078] Furthermore, the device 200 that has completed coating in process chamber 2 can be driven by the conveying system 102 to enter the cavity of the second buffer chamber 4 along the travel direction D0. After the device 200 has completely entered the second buffer chamber 4, the flap valve 7 between process chamber 2 and the second buffer chamber 4 closes, re-isolating the second buffer chamber 4 from process chamber 2. During this process, process chamber 2 can continuously perform coating operations on the device 200 to be coated that enters from the first buffer chamber 1 without waiting for the unloading to be completed.

[0079] Furthermore, after the second buffer chamber 4 is isolated from the process chamber 2, the second valve 8 at the outlet of the second buffer chamber 4 is opened, allowing the second buffer chamber 4 to communicate with the external atmosphere. The coated device 200 can then be removed or transported to subsequent processes through the outlet. Once the device 200 has completely left the second buffer chamber 4, the outlet of the second buffer chamber 4 is closed, causing the second buffer chamber 4 to reform into a sealed cavity. The vacuum pumping assembly 3 is then activated to perform a vacuum pumping operation on the second buffer chamber 4. The second buffer chamber 4 is reset when the vacuum level inside it equals a first preset threshold, ready to receive the next batch of coated devices 200 output from the process chamber 2.

[0080] Therefore, by adding a second buffer chamber 4, the continuous coating system 100 achieves full-process continuous vacuum transition from pre-vacuum transition during material feeding (first buffer chamber 1), vacuum maintenance during coating (process chamber 2), and vacuum transition during material discharge (second buffer chamber 4). Compared to the traditional single-furnace coating method where the vacuum in the process chamber needs to be broken and the parts removed after coating is completed, and then the vacuum needs to be re-evacuated before the next batch of coating can be carried out, the process chamber 2 in the continuous coating system 100 maintains a preset vacuum level throughout the process of the parts 100 entering and leaving the system. This allows for parallel operations of sending out the previous batch of parts 200 and coating the next batch of parts 200 simultaneously, significantly shortening the process interval time. Taking the Parylene coating process as an example, in the traditional single-furnace mode, each batch requires an additional 20-30 minutes for vacuuming during material feeding and discharging. However, with the addition of the second buffer chamber 4, the downtime and turnaround time of the equipment are greatly reduced, significantly increasing the number of coating batches per unit time. At the same time, it avoids the energy waste caused by repeated vacuuming and breaking of the process chamber 2, further reducing production costs.

[0081] In some embodiments, combined with Figure 1 and Figure 2 Along the travel direction D0 of the device 200, the process chamber 2 is provided with n coating stations P. Each coating station P is used to receive a batch of the device 200. Each batch of the device 200 includes at least one device 200. In response to the first batch of the device 200 completing the coating and leaving the process chamber 2, the remaining batches of the device 200 in the process chamber 2 move towards the travel direction D0 to the next coating station P. The (n+1)th batch of the device 200 enters the process chamber 2, where n is a positive integer and n≥1.

[0082] Specifically, along the travel direction D0 of the device 200, n coating stations P (n is a positive integer and n≥1) are arranged at intervals in the chamber of the process compartment 2, and each coating station P is arranged in a straight line to form a continuous coating operation line.

[0083] In some embodiments, the number of devices 200 in a batch can be set according to the size of the devices 200 and the requirements of the coating process. For example, for small electronic components, each batch can carry dozens of devices; for large medical device components, each batch can carry only 1-2 devices.

[0084] In some embodiments, the (n+1)th batch of devices 200 entering the process chamber 2 and the first batch of devices 200 completing the coating and leaving the process chamber 2 are carried out simultaneously.

[0085] In some embodiments, each batch of the devices 200 stays at each of the coating stations P for the same amount of time.

[0086] In practical applications, the process of transferring devices 200 between coating stations P within the process chamber 2 of the continuous coating system 100 can include, for example, the following: In the initial state, the first to nth batches of devices 200 are located at the first to nth coating stations P respectively, and each coating station P synchronously performs coating operations on the batches of devices 200 it receives.

[0087] In some embodiments, the coating processes at each station P may be the same, or at least some of the coating processes performed at station P may be different from those at other stations P. For example, a preceding station P may perform a base layer coating, while a subsequent station P may perform a surface layer coating. As another example, the coating processes at each station within the cavity unit 20 of the preceding process chamber 2 may be the same, while the coating processes at each station P within the cavity unit 20 of the subsequent process chamber 2 may differ from those in the preceding process chamber 2.

[0088] Furthermore, after the first batch of devices 200 (located at the first coating station P near the exit of process chamber 2) completes all coating processes, the transport system 102 is activated, driving the first batch of devices 200 to move along the travel direction D0 and leave process chamber 2, entering the downstream second buffer chamber 4; at the same time, the remaining batches of devices (the second to the nth batches) in process chamber 2 move synchronously in the travel direction D0 under the drive of the transmission drive mechanism, and enter the next coating station P in sequence (i.e., the second batch enters the first station near the exit of process chamber 2, the third batch enters the second station, ... the nth batch enters the n-1th station); during the above movement process, the flap valve 7 between the first buffer chamber 1 and process chamber 2 opens synchronously, and the n+1th batch of devices to be coated enters process chamber 2 from the first buffer chamber 1 and is accurately positioned to the vacant nth coating station P, then the flap valve 7 closes, and the n+1th batch of devices begins to perform coating operations at the nth station.

[0089] Thus, through this linkage mechanism of batch transfer and new batch replenishment, the n coating stations P in the process warehouse 2 are always in full-load operation: when a batch of devices 200 leaves the process warehouse, the other batches immediately fill the gap, and at the same time, the new batch enters in time, avoiding the idle time of the process warehouse 2 due to waiting for feeding or discharging.

[0090] In some embodiments, combined with Figure 2 and Figure 3 The continuous coating system 100 may further include: a carrier assembly 5 for carrying the device 200 and driving the device 200 to move in the direction of travel D0; a sensing assembly 6 for acquiring the relative positional relationship between the carrier assembly 5 and the coating station P; in response to the sensing assembly 6 detecting that the carrier assembly 5 is located at the corresponding coating station P, the carrier assembly 5 stops moving, and the device 200 carried by the carrier assembly 5 is coated at the corresponding coating station P.

[0091] In some embodiments, the carrier assembly 5 is a transmission carrier adapted to the vacuum environment inside the process chamber 2 and the carrying requirements of the device 200. It can be made of materials that are resistant to high temperature, vacuum and have excellent chemical stability (such as stainless steel, ceramic composite materials, etc.).

[0092] Furthermore, the sensing component 6 is used to monitor the relative position of the carrier component 5 and each coating station P in real time, ensuring that the carrier component 5 can accurately stop at the preset coating position.

[0093] In some embodiments, combined with Figures 3 to 5 The carrier assembly 5 may include at least one carrier unit 51, each of the carrier units 51 being used to carry a plurality of the devices 200.

[0094] In some embodiments, such as Figure 2 As shown, the sensing component 6 includes a sensing part 61 disposed on the carrier component 5 and a detection part 62 disposed on the coating station P. In response to the pairing of the sensing part 61 and the detection part 62, it is determined that the carrier component 5 is located at the corresponding coating station P.

[0095] It should be understood that, in order to ensure that the structure is clearly and neatly presented in the attached diagram, Figure 2 The example only demonstrates the sensing component 6 corresponding to one of the workstations P. Furthermore... Figure 2 The shape, size, and location of the sensing unit 61 and the detection unit 62 are merely illustrative and do not constitute any limitation on the scope of protection of this patent.

[0096] In some embodiments, at least one sensing element 61 may be provided on each of the carrier units 51.

[0097] In a specific implementation plan, combined with Figure 3 and Figure 4The carrier assembly 5 adopts a multi-layer frame design, which is composed of several carrier units 51 stacked and assembled in the vertical direction. It can make full use of the vertical space of the process chamber to realize the synchronous carrying and transmission of multiple batches and multiple quantities of devices 200, and greatly improve the production capacity of a single coating.

[0098] Furthermore, each vehicle unit 51 can be a cuboid frame structure. Furthermore, the top and other areas of the vehicle unit 51 are provided with inserts 511, which not only provide a positioning reference for the assembly of the vehicle unit 51 itself in the vehicle assembly 5, but also ensure the stability of the connection between each vehicle unit 51 when multiple layers are stacked, so that the multi-layer structure of the entire vehicle assembly 5 is solid and reliable.

[0099] Furthermore, an anti-drop net 512 is provided in the bearing area of ​​the carrier unit 51 to prevent the device 200 from falling off when the carrier assembly 5 moves along the travel direction D0, while not hindering the contact between the coating material and the surface of the device 200, ensuring that the coating process is carried out uniformly and fully.

[0100] Furthermore, the carrier unit 51 is also equipped with a limiting post 513 and a support post 514. The limiting post 513 is used to limit the supported device 200 from the side, preventing the device 200 from deviating from the preset coating position due to vibration, movement, etc., and ensuring that the device 200 is accurately within the process range of the coating station P. The support post 514 is located below the device 200 and cooperates with the limiting post 513 to provide bottom support for the device 200, so that the device 200 is placed stably. The roller structure can reduce the contact area between the device 200 and the carrier unit 51, and the line contact can minimize the obstruction of the limiting post 513 and the support post 514, which would lead to uneven coating.

[0101] Furthermore, the carrier unit 51 may be equipped with a sensing unit 61. When the carrier unit 51 moves along the travel direction D0, the sensing unit 61 cooperates with the detection unit 62 at the coating station. For example, after the detection unit 62 detects the sensing unit 61, it can send a signal to the control module to stop the carrier assembly 5 from moving. At this time, the carrier unit 51 can accurately stop at the corresponding coating station P.

[0102] In practical applications, from the perspective of the multi-layer structure, each layer of carrier unit 51 of carrier assembly 5 can carry multiple devices 200 (as shown in the figure, a large number of devices 200 are arranged in each layer). Combined with the n coating stations P in the process chamber, a highly efficient mode of multi-layer carrying combined with multi-station parallel coating can be realized: when carrier assembly 5 moves, each layer of carrier unit 51 can simultaneously transport different batches of devices 200 to the corresponding coating station. After precise positioning, each coating station P is coated synchronously. After coating is completed, carrier assembly 5 can then drive the devices 200 to move to the next coating station P or the outlet of process chamber 2. The process is continuous and efficient, which greatly improves the production capacity of continuous coating system 100.

[0103] In some embodiments, the sensing component 6 is used to monitor the relative position of the carrier component 5 and each coating station P in real time to ensure that the carrier component 5 can accurately stop at the preset coating position, and may specifically include a sensing unit 61 disposed on the carrier component 5 and a detection unit 62 disposed at each coating station P.

[0104] In practical applications, the sensing unit 61 can be a positioning block, a magnet, or a reflector, while the detection unit 62 can be a photoelectric sensor, a Hall sensor, or a laser displacement sensor. For example, when the sensing unit 61 is a metal positioning block, the detection unit 62 can be a proximity switch. When the carrier unit 51 moves to the coating station P, the metal positioning block enters the detection range of the proximity switch, triggering the switch signal. Alternatively, the sensing unit 61 can be a coded reflective strip, and the detection unit 62 can be a laser barcode reader. The identity and position of the carrier unit 51 are confirmed by identifying the coded information on the reflective strip. Another example is when the sensing unit 61 is a magnet, the detection unit 62 can be a Hall sensor. When the carrier unit 51 moves along the travel direction D0 to the target coating station P, the magnet-made sensing unit 61 gradually approaches the Hall sensor. The Hall sensor can sense the magnetic field generated by the magnet. When the magnet enters the detection range of the Hall sensor and the magnetic field strength reaches the trigger threshold of the Hall sensor, the Hall sensor outputs an electrical signal and transmits it to the control module. After receiving the signal, the control module determines that the carrier unit 51 has accurately reached the corresponding coating station P, and then controls the transmission drive mechanism of the carrier assembly 5 to stop moving, so that the device 200 carried by the carrier unit 51 is stably within the range of action of the coating execution component, so as to carry out the coating operation.

[0105] Thus, through the cooperation of carrier assembly 5 and sensing assembly 6, continuous coating system 100 realizes automated and high-precision transmission of device 200 between multiple workstations.

[0106] In some embodiments, combined with Figure 1 and Figures 7 to 11 The process chamber 2 has multiple feed holes 21 on its wall. The coating material enters the process chamber 2 through the feed holes 21 to coat the device 200.

[0107] In practical applications, phenelzine raw materials (phenelzine N powder, C powder, D powder, F powder, HT powder) can be introduced into the process chamber 2 through the feed hole 21 for the preparation of phenelzine coatings by performing chemical vapor deposition process.

[0108] In some embodiments, the feed port 21 can be further divided into a feed port for monomer raw materials and a feed port for perylene raw materials.

[0109] During the ICVD process, the pyrolyzed phenelzine active monomer molecules act as initiators, combining with other organic monomer molecules with different structures in a vacuum environment to form a copolymer coating. Pyrezine, as an initiator, initiates the polymerization of organic monomers, resulting in coatings with higher hydrophobic angles, better wear and corrosion resistance, and superior high-voltage insulation properties compared to coatings made from organic monomers alone.

[0110] In some embodiments, the plurality of feed holes 21 may be formed on the side wall of the process chamber 2.

[0111] Furthermore, the feed holes 21 serve as channels for the coating material to enter the process chamber 2. During the coating process, gaseous or vaporous coating materials (such as perylene raw materials, organic precursor raw materials, inorganic compound raw materials, etc.) can continuously enter the process chamber 2 through these feed holes 21, contacting the surface of the device 200 carried on the carrier assembly 5 and completing the coating operation. The number and distribution of the feed holes 21 are designed based on the volume of the process chamber 2, the arrangement density of the device 200, and the diffusion characteristics of the coating material to ensure that the material can uniformly cover the surface of all the devices 200 to be coated.

[0112] In some embodiments, the feed hole 21 is provided in one of a pair of sidewalls of the process chamber 2, and the other of the pair of sidewalls is provided with an air extraction hole 22.

[0113] Specifically, the process chamber 2 has a pair of opposing sidewalls. A feed port 21 is located on one sidewall, while a corresponding evacuation port 22 is located on the other sidewall. The evacuation port 22 is connected to the vacuum assembly 3. During the coating process, the feed port 21 continuously supplies coating material, while the evacuation port 22 simultaneously performs evacuation. Thus, the opposing arrangement of the feed port 21 and the evacuation port 22 creates a stable directional airflow field within the process chamber 2. The coating material diffuses uniformly from the feed port 21 throughout the entire chamber of the process chamber 2. After making full contact with the device 200, excess coating material or reaction byproducts are promptly discharged by the evacuation port 22, ensuring both the uniformity of the coating on the surface of the device 200 and maintaining the preset vacuum level and pressure stability within the process chamber 2.

[0114] In some embodiments, an observation window 25 may be provided on the side wall of the process chamber 2 for observing the coating progress or status of the device 200 in the process chamber 2.

[0115] In some embodiments, the side of the feed hole 21 facing the interior of the process chamber 2 is covered with an air distribution plate 23.

[0116] Furthermore, there is a non-zero gap between the gas equalization plate 23 and the inner wall of the process chamber 2. After the coating material enters the process chamber 2 from the feed hole 21, it impacts the gas equalization plate 23 and diffuses along the edge of the gas equalization plate 23.

[0117] In practical applications, when the coating material enters the process chamber 2 through the feed port 21, it first impacts the surface of the gas distribution plate 23. Due to the obstruction of the gas distribution plate 23, the coating material cannot diffuse directly in a straight line, but is forced to flow outwards along the gap between the gas distribution plate 23 and the inner wall of the process chamber 2. This diffusion path disperses the originally concentrated airflow into multiple gentle airflows, which then diffuse evenly throughout the entire chamber of the process chamber 2, ensuring that all areas of the device 200 can come into contact with the coating material of a uniform concentration, further improving the coating uniformity.

[0118] In some embodiments, the feed port 21 and the gas equalization plate 23 correspond one-to-one. In other words, each feed port 21 is equipped with an independent gas equalization plate 23. This design allows the coating material output from each feed port to undergo airflow regulation through a dedicated gas equalization plate, avoiding mutual interference between the airflows of multiple feed ports during the gas equalization stage, thereby ensuring that devices at different locations within the process chamber 2 can obtain a consistent coating effect.

[0119] In some embodiments, the air distribution plate 23 is provided with a plurality of air distribution holes 231 arranged in an array.

[0120] Furthermore, the multiple air-distributing holes 231 can be arranged in a regular array (such as a rectangular array or a honeycomb array). In addition to diffusion through the gaps at the edge of the air-distributing plate, some of the coating material will also enter the interior of the process chamber 2 through these air-distributing holes 231.

[0121] In some embodiments, the aperture and number of the uniform air holes 231 can be designed according to the flow rate and diffusion requirements of the coating material, which can further refine the concentrated airflow of the coating material into multiple uniform fine streams, making the distribution of the coating material in the chamber of the process chamber 2 more uniform, and especially improving the coating coverage effect of complex structures (such as grooves and gaps) on the surface of the device 200.

[0122] In some embodiments, at least a portion of the feed holes 21 may be vented with a different type of coating material than the other feed holes 21. For example, some feed holes 21 may be vented with metal oxide vapor for forming the underlayer, while others may be vented with organic polymer vapor for forming the functional layer, or different feed holes may be vented with different types of monomers such as phenelzine C and phenelzine N. This enables multilayer or composite coating to be achieved, meeting the different performance requirements (such as corrosion resistance, insulation, and wear resistance) of the device 200 without requiring process interruptions for material changes, thus improving coating efficiency and process continuity.

[0123] For example, some feed holes 21 can be used to introduce pyrolyzed active raw materials (pyrolyzed N powder, C powder, D powder, F powder, HT powder), while other parts can be used to introduce organic monomer raw materials (such as hydrocarbons and organosilicon compounds). The pyrolyzed active monomer molecules act as initiators to initiate the polymerization of organic monomers and form a polymer coating on the surface of device 200.

[0124] In some embodiments, the gas equalization plate 23 covers at least one pair of feed holes 21 through which different types of coating materials are introduced, and there is a non-zero gap between the gas equalization plate 23 and the inner wall of the process chamber 2 to allow for the premixing of different types of coating materials.

[0125] In practical applications, when different types of coating materials need to be mixed before coating, a gas equalization plate 23 can be used to simultaneously cover at least one pair of feed holes 21 for different materials, with a non-zero gap maintained between the gas equalization plate 23 and the inner wall of the process chamber 2. Different types of coating materials enter through their respective feed holes, first meeting and mixing thoroughly in the gap between the gas equalization plate 23 and the inner wall of the process chamber 2, forming a uniformly mixed airflow. This airflow then diffuses into the chamber through the edge of the gas equalization plate 23 or the gas equalization holes 231. Thus, the premixed design avoids fluctuations in film composition caused by uneven mixing of different materials within the chamber, ensuring consistent mixed coating composition on the device surface.

[0126] Taking the application of paraxylene (P-xylene) coating as an example, paraxylene N monomer vapor and paraxylene C monomer vapor can be premixed as two different types of coating materials. Paraxylene N has excellent dielectric properties and permeability, while paraxylene C has stronger chemical corrosion resistance. If a composite film with both high dielectric properties and strong corrosion resistance is required, paraxylene N monomer vapor and paraxylene C monomer vapor can be introduced into the two feed holes 21 respectively. There is a non-zero gap between the gas distribution plate 23 covering the two feed holes 21 and the inner wall of the process chamber 2. The two monomer vapors are premixed in the gap to form a uniformly mixed vapor, which is then diffused into the process chamber 2 and deposited onto the surface of the device 200, ultimately obtaining a composite coating that has the performance advantages of both.

[0127] In some embodiments, the plurality of air distribution holes 231 are directly or indirectly connected to the feed holes 21. For each air distribution plate 23, the density of the air distribution holes 231 is greater than the density of the feed holes 21 in the area covered by the air distribution plate 23. Therefore, the density difference between the air distribution holes 231 and the feed holes 21 can disperse the concentrated airflow input from the small number of feed holes 21 into more fine streams, further refining the coating material during diffusion, thereby forming a more uniform concentration field within the process chamber 2 and effectively reducing film thickness differences at different locations on the device surface.

[0128] In some embodiments, the process chamber 2 may include an even number of cavity units 20 connected in series, with the feed port 21 being opened in one of a pair of sidewalls of each cavity unit 20, and the feed ports 21 of two adjacent cavity units 20 being opened on sidewalls on different sides of each other.

[0129] Specifically, the process chamber 2 can be formed by connecting an even number of cavity units 20 in series. These cavity units 20 are arranged sequentially along the travel direction of the device 200 and are interconnected to form a complete coating chamber. Each cavity unit 20 has a feed hole 21 on one side of a pair of opposite sidewalls, and the feed holes 21 of adjacent cavity units 20 are located on different sidewalls. For example, the feed hole 21 of the previous cavity unit 20 is on the left sidewall, and the next one is on the right sidewall, and so on. This alternating arrangement allows for more uniform coating of the device 200.

[0130] In some embodiments, the continuous coating system 100 may further include a suction baffle 24 disposed between two adjacent cavity units 20. For example, see reference Figure 8 and Figure 9 Each cavity unit 20 may have multiple spaced-apart air extraction holes 22 on its wall. For two adjacent cavity units 20, the air extraction guide baffle 24 can block the air extraction hole 22 of the subsequent cavity unit 20 that is close to the preceding cavity unit 20, thus preventing the coating material fed into the feed hole 21 of the preceding cavity unit 20 that is close to the following cavity unit 20 from being directly extracted by the nearest air extraction hole 22, resulting in waste of coating material.

[0131] In some embodiments, reference Figure 1 , Figures 12 to 14 The flap valve 7 can be disposed between the first buffer chamber 1 and the process chamber 2, and the flap valve 7 can connect and isolate the first buffer chamber 1 and the process chamber 2.

[0132] In some embodiments, a flap valve 7 may also be provided between the process chamber 2 and the second buffer chamber 4.

[0133] In one specific embodiment, the flap valve 7 may include: a frame 71, along the movement direction of the device 200, with its two sides respectively connected to the first buffer chamber 1 and the process chamber 2, and the frame 71 enclosing a transfer channel 77 for the device 200 to enter the process chamber 2; a flap door 72, hinged to the side of the frame 71 facing the process chamber 2, the flap door 72 being able to rotate into the transfer channel 77 to connect the first buffer chamber 1 and the process chamber 2; and a first drive unit 73, connected to the flap door 72, the first drive unit 73 being used to drive the flap door 72 to rotate to connect or isolate the first buffer chamber 1 and the process chamber 2.

[0134] The frame 71 can be a frame-shaped three-dimensional structure (such as a cuboid frame). Along the traveling direction D0 of the device 200, the two ends of the frame 71 are respectively connected to the outlet of the first buffer chamber 1 and the inlet of the process chamber 2. The interior of the frame 71 encloses a transfer channel, the size of which is adapted to the shape of the device 200 and the carrier assembly 5, providing guiding and transfer space for the device 200.

[0135] Furthermore, the flap door 72 can be installed at the opening on the side of the frame 71 facing the process compartment 2 via hinges (such as pivots or hinges), and can rotate around the hinge axis into the transfer channel 77. When the flap door 72 is rotated to the open position (such as unfolding or retracting into the transfer channel 77), the transfer channel 77 is completely unobstructed, and the cavities of the first buffer compartment 1 and the process compartment 2 are connected through the channel; when the flap door 72 is rotated to the closed position (such as perpendicular to the cross section of the transfer channel 77, blocking the opening facing the process compartment 2), the transfer channel 77 is isolated, realizing the isolation between the process compartment 2 and the first buffer compartment 1 (or the second buffer compartment 4).

[0136] Furthermore, the first drive unit 73 can be connected to the flip door 72 via a transmission structure to provide power for the rotation of the flip door 72. The first drive unit 73 can be a cylinder, an electric push rod, or a motor with gears / connecting rods, etc. For example, as the cylinder extension rod extends and retracts, and the motor rotates, the flip door 72 can be precisely driven to rotate around the hinge axis through the connecting rod / gear transmission, realizing the switching of the open / closed posture.

[0137] In a typical application scenario, when the vacuum level in the first buffer chamber 1 reaches the first preset threshold (matching the vacuum level of the process chamber 2), the first drive unit 73 drives the flap door 72 to rotate and open into the transfer channel 77. At this time, the first buffer chamber 1 is connected to the process chamber 2, and the device 200 carried by the carrier assembly 5 can enter the process chamber 2 through the transfer channel 77. After the device 200 has completely entered the process chamber 2, the first drive unit 73 reverses its action, and the flap door 72 rotates and closes, isolating the connection between the first buffer chamber 1 and the process chamber 2. The process chamber 2 continues to maintain a vacuum for coating, while the first buffer chamber 1 can start receiving the next batch of devices 200 and vacuuming, thereby supporting the continuous coating process.

[0138] Furthermore, the flap valve 7 may also include a conveying part 74, which is vertically and vertically disposed on the bottom wall of the frame 71 forming the transfer channel 77. The conveying part 74 is used to transfer the device 200 toward the process chamber 2. During the opening of the flap door 72, the conveying part 74 stops transferring the device 200 and descends to avoid the movement trajectory of the flap door 72.

[0139] Specifically, when device 200 passes through transfer channel 77, the transport unit 77 needs to dock with the part of transport system 102 located in the first buffer chamber 1.

[0140] In some embodiments, the specific form of the conveying unit 74 can be designed according to the transmission requirements, such as using a belt conveyor, roller assembly, etc., whose surface is adapted to the bottom of the carrier assembly 5, and can stably drive the carrier and device to move; at the same time, the conveying unit 74 is equipped with a lifting motor 76, which can adjust its height in the vertical direction. Under normal conditions, it is raised to be flush with the transmission plane in the transfer channel 77, ensuring that the device 200 can be smoothly received and transmitted. When the flip door 72 is opened, the conveying unit 74 is lowered to achieve position avoidance.

[0141] More specifically, before the flap door 72 initiates its opening action, the device 200 remains completely within the first buffer chamber 1 (not yet in the transfer channel 77). The transport section 74 of the flap valve 7 is currently unloaded (without device 200 supporting it). To avoid mechanical interference between the flap door 72 and the transport section 74 during rotation, the transport section 74 descends towards the bottom wall of the transfer channel 77, making its top surface lower than the trajectory plane of the flap door 72 during rotation. Further, after the transport section 74 has descended to its designated position, the first drive section 73 drives the flap door 72 to rotate into the transfer channel 77 until it is fully open. After the flap door 72 is fully open, the transport section 74 rises, ensuring its top transport surface is flush with the transport surfaces of the transport system 102 in the first buffer chamber 1 and the transport system 102 in the process chamber 2. Then, the transport system 102 in the first buffer chamber 1 is activated, transporting the carrier assembly 5 carrying the device 200 to the transport section 74 in the transfer channel 77. After receiving device 200, the transport unit 74 initiates a transfer operation, driving the carrier assembly 5 along the travel direction D0 through the transfer channel 77, ultimately delivering device 200 into the transport system inside the process chamber 2, completing the transfer of the device. Once device 200 has completely left the transfer channel 77 and entered the process chamber 2, the transport unit 74 returns to an unloaded state. The transport unit 74 descends again, and after it reaches its final position, the first drive unit 73 drives the flip door 72 to rotate in the opposite direction until the transfer channel 77 is completely blocked, achieving isolation between the first buffer chamber 1 and the process chamber 2.

[0142] In some embodiments, the conveying unit 74 may adopt a roller assembly structure, and the roller assembly is driven to rotate by a horizontal rotating motor 75.

[0143] In some embodiments, the conveying unit 74 includes a transmission gear 741, and the horizontal rotation motor 75 includes a horizontal rotation gear 751. Driven by the lifting motor 76, the roller assembly structure can rise until the transmission gear 741 meshes with the horizontal rotation gear 751, and descend until the transmission gear 741 and the horizontal rotation gear 751 are decoupled or separated. Through the transmission gear 741 and the horizontal rotation gear 751, the torque output by the horizontal rotation motor 75 can be smoothly transmitted to the roller assembly structure.

[0144] It should be understood that the structure and operation of the flap valve 7 located between the process chamber 2 and the second buffer chamber 4 are the same as those of the flap valve 7 located between the first buffer chamber 1 and the process chamber 2, and will not be described in detail here.

[0145] In some embodiments, combined with Figure 1 , Figures 15 to 18 The continuous coating system 100 may further include a second valve 8, which is disposed on the side of the first buffer chamber 1 away from the process chamber 2, and the second valve 8 is used to open and close the inlet of the first buffer chamber 1.

[0146] In some embodiments, the second valve 8 may also be located at the outlet of the second buffer chamber 4.

[0147] In some embodiments, the second valve 8 may include: a body 81 having an opening 811 communicating with the interior of the first buffer chamber 1, through which the device 200 can enter the first buffer chamber 1, along a first direction D1, the body 81 having a first side 812 and a second side 813 opposite to each other, the first direction D1 being perpendicular to the travel direction D0 of the device 200; a baffle 82 movably connected to the first side 812, the baffle 82 being able to extend toward the second side 813 to close the opening 811; and a second drive unit 83 connected to the baffle 82, the second drive unit 83 being used to drive the baffle 82 to extend toward the second side 813 to close the opening 811 or to retract toward the first side 812 to open the opening 811.

[0148] Specifically, taking the second valve 8 located at the inlet of the first buffer chamber 1 as an example, the main body 81 of the second valve 8 is a frame or shell structure adapted to the inlet size of the first buffer chamber 1. An opening 811 is provided inside the main body 81. The shape and size of the opening 811 match the external shape of the device 200 and the carrier assembly 5, serving as the channel for the device 200 to enter the first buffer chamber 1 from the external environment. Along a first direction D1 perpendicular to the travel direction D0 of the device 200, the main body 81 has a first side 812 and a second side 813. A baffle 82 is used to open and close the opening 811.

[0149] In some embodiments, the size of the baffle 82 may be slightly larger than the size of the opening 811 to ensure a sealing effect on the opening 811.

[0150] Furthermore, the baffle 82 is movably connected to the first side 812 of the main body 81. When it is necessary to close the opening 811, the second drive unit 83 drives the baffle 82 to extend from the first side 812 toward the second side 813 until the baffle 82 completely covers the opening 811, at which point the baffle 82 closes the entrance to the first buffer chamber 1. When it is necessary to open the opening 811, the second drive unit 83 drives the baffle 82 to retract toward the first side 812, so that the opening 811 is fully exposed, and the carrier assembly 5 of the carrying device 200 is sent into the first buffer chamber 1 through the opening 811.

[0151] In some embodiments, a sealing structure is provided between the area where the baffle 82 and the body 81 have the opening 811 to further enhance the sealing performance of the baffle 82 in closing the opening 811.

[0152] In practical applications, when the first buffer chamber 1 completes the delivery of the previous batch of devices 200 and is ready to receive the new devices 200, the second drive unit 83 drives the baffle 82 to retract toward the first side 812, opening the opening 811. The external carrier assembly 5 carries the devices 200 through the opening 811 into the interior of the first buffer chamber 1. After the devices 200 have fully entered and are in place, the second drive unit 83 drives the baffle 82 to extend toward the second side 813 until the opening 811 is completely closed. At this time, the first buffer chamber 1 forms a closed cavity, and the vacuum assembly 3 begins to evacuate it until the internal vacuum level reaches the threshold matching the process chamber 2. Subsequently, when the first buffer chamber 1 and the process chamber 2 are connected through the flap valve 7 and the devices 200 are sent into the process chamber, the second valve 8 repeats the above actions to receive the next batch of devices 200, thereby achieving the continuous feeding of the continuous coating system.

[0153] Furthermore, the main body 81 has a slide rail 814 extending along the first direction D1 inside, and the baffle 82 moves between the first side 812 and the second side 813 under the guidance of the slide rail 814.

[0154] In some embodiments, the slide 814 can be configured as a groove or guide rail structure adapted to the edge of the baffle 82, the length of which covers the range of movement from the first side 812 to the second side 813. The edge of the baffle 82 is embedded in the slide 814. When the second drive unit 83 drives the baffle 82 to move along the first direction D1, the slide 814 will precisely constrain the movement trajectory of the baffle, preventing the baffle from shifting laterally or tilting during extension or retraction, ensuring that the baffle 82 can always move directly opposite the opening 811, thereby ensuring that it can completely cover the opening and seal reliably when closed, and retract smoothly without jamming when opened, further improving the stability and sealing of the second valve 8.

[0155] In some embodiments, the slide 814 is formed inside the body 81. The slide 814 extends along a first direction D1 and connects to the opening 811, so that the baffle 82 can move along the slide 814 toward the opening 811. Furthermore, the shape and size of the entrance of the slide 814 are adapted to the side shape and size of the baffle 82 to ensure that the baffle 82 can move smoothly along the slide 814.

[0156] In some embodiments, the length of the slide rail 814 along the first direction D1 can be greater than the width of the baffle 82 along the first direction D1, to ensure that the baffle 82 can be fully retracted into the slide rail 814 when the second valve 8 is open (e.g., Figure 17 As shown), to avoid blocking the opening 811 and affecting the entry of device 200.

[0157] In some embodiments, the second valve 8 further includes: a connecting plate 84 disposed on the first side 812 of the main body 81; the second driving part 83 and the baffle 82 are directly or indirectly connected to the connecting plate 84; the connecting plate 84 is connected to the main body 81 via a telescopic assembly 85; under the action of the telescopic assembly 85, the connecting plate 84 can extend in the direction from the second side 813 toward the first side 812 so that the baffle 82 moves away from the main body 81 from the first side 812 (e.g., ...). Figure 18 (As shown).

[0158] In some embodiments, the connecting plate 84 is detachably connected to the body 81.

[0159] Specifically, the connecting plate 84 of the second valve 8 has a flat plate structure and is integrally fitted onto the outer surface of the first side 812 of the main body 81. That is, it is located on the side of the main body 81 that faces away from the second side 813 and extends in the same direction as the slide rail 814. The connecting plate 84 forms the connection between the second drive unit 83 and the baffle 82, serving as the mounting carrier for both. In terms of connection, the second drive unit 83 and the baffle 82 are associated with the connecting plate 84 directly or indirectly: for example, the drive body 831 of the second drive unit 83 is directly fixed to the surface of the connecting plate 84 by bolts, while the baffle 82 is indirectly connected to the connecting plate 84 through the telescopic part 832 of the second drive unit 83.

[0160] Furthermore, a telescopic component 85 is also assembled between the connecting plate 84 and the main body 81.

[0161] In some embodiments, the telescopic component 85 can extend and retract along a first direction D1 and its opposite direction to achieve relative movement between the connecting plate 84 and the main body 81 in the first direction D1.

[0162] like Figure 18As shown, a pair of telescopic components 85 are disposed on both sides of the main body 81 along the direction of gravity. The direction of gravity, the first direction D1, and the travel direction D0 of the device 200 are perpendicular to each other.

[0163] In some embodiments, the telescopic component 85 may be, for example, a telescopic cylinder, with one end fixed to the main body 81 and the other end fixedly connected to the side of the connecting plate 84 facing the main body 81. When the telescopic component 85 initiates its extension action, it generates a thrust in the opposite direction to the first direction D1, causing the connecting plate 84 to move away from the first side 812 of the main body 81. Since the baffle 82 is linked to the connecting plate 84 through the second drive unit 83, the movement of the connecting plate 84 will synchronously cause the baffle 82 to disengage from the slide rail 814 inside the main body 81, ultimately causing the baffle 82 to completely leave the first side 812 of the main body 81 and no longer be within the constraint range of the slide rail 814 or the main body 81.

[0164] Therefore, during routine coating operations, the telescopic component 85 remains in the retracted state, the connecting plate 84 is pressed against the first side 812 of the main body 81, and the baffle 82 can slide normally within the slide rail 814 to open and close the opening 811. When maintenance is required on the baffle 82 (e.g., cleaning surface seals, replacing worn edge structures) or the slide rail 814 (e.g., cleaning internal dust), the telescopic component 85 can be activated to move the baffle 82 entirely out of the main body 81, preventing the main frame from obstructing the operating space. Alternatively, if an abnormal situation occurs where a component is stuck between the opening 811 and the baffle 82, this structure can also be used to move the baffle away, quickly clearing the obstruction and ensuring the continuity of the continuous coating system 100.

[0165] In some embodiments, continue to refer to Figure 1 The continuous coating system 100 may also include a pretreatment chamber 101. The pretreatment chamber 101 can perform preliminary treatment on the device 200 before it enters the first buffer chamber 1, in preparation for the subsequent vacuum coating process.

[0166] In some embodiments, the continuous coating system may further include a lifting platform 103. The lifting platform 103 is used to adjust the height of the device 200 to precisely match the feeding height requirements of the subsequent handling system 102 or the pretreatment chamber 101.

[0167] In some embodiments, the transport system 102 may include transport sections disposed inside different cavities. These cavities include internal chambers such as a pretreatment chamber 101, a first buffer chamber 1, and a process chamber 2, with a transport section corresponding to each cavity. For example, the transport section in the pretreatment chamber 101 is responsible for transporting the device 200 within the chamber, cooperating with pretreatment processes such as cleaning and drying to complete the position transfer; the transport section in the first buffer chamber 1 receives the device 200 from the pretreatment chamber 101 and maintains the device 200 in a stable position during the vacuuming process in the first buffer chamber 1, and transports the device 200 to the transfer channel 77 after the flap valve 7 is opened; the transport section in the process chamber 2 can drive the device 200 to move along the travel direction D0 during the coating process to complete uniform coating.

[0168] In some embodiments, combined with Figure 1 , Figures 19 to 23 The continuous coating system 100 may further include a feeding system 9, which is used to feed coating material into the process chamber.

[0169] In some embodiments, the feeding system 9 can be used for feeding perylene.

[0170] Furthermore, the feeding system 9 includes: a storage bin 91, connected to the process bin 2, the storage bin 91 being used to input coating material into the process bin 2; and a replenishment bin 92, connected to the storage bin 91, for replenishing coating material into the storage bin 91, the replenishment bin 92 having a replenishment port 921 for filling the replenishment bin 92 with coating material; wherein, in response to the replenishment port 921 opening, the replenishment bin 92 and the storage bin 91 are isolated from each other; in response to the replenishment port 921 closing, the vacuuming component 3 evacuates the replenishment bin 92; the vacuum degree in the storage bin 91 is consistent with the vacuum degree in the process bin 2; in response to the vacuum degree deviation between the replenishment bin 92 and the storage bin 91 being less than or equal to a preset difference and the remaining amount of coating material in the storage bin 91 being less than or equal to a first remaining amount threshold, the replenishment bin 92 connects to the storage bin 91 to deliver coating material to the storage bin 91.

[0171] In some embodiments, the preset difference may be less than or equal to 5%.

[0172] In some embodiments, the first remaining threshold may be, for example, 5%-50% of the maximum capacity of the storage bin 91, such as 5%, 10%, 20%, 30%, 40% or 50%.

[0173] Specifically, the storage bin 91 is directly connected to the process bin 2 to deliver coating material to the process bin 2. Furthermore, the replenishment bin 92 is connected to the storage bin 91 to replenish raw materials to the storage bin 91. The replenishment bin 92 is provided with a replenishment port 921 to replenish coating material into the replenishment bin 92.

[0174] In some embodiments, the replenishment chamber 92 may also be optionally connected to the process chamber 2. This allows the vacuuming component 3 to simultaneously evacuate both the replenishment chamber 92 and the process chamber 2, while also preventing the vacuum in the process chamber 2 from being broken when the coating material is added to the replenishment chamber 92.

[0175] Furthermore, taking the coating material in its original solid state as an example, the storage silo 91, as the main feeding unit, may include a solid material silo 911 and a rotary feeding mechanism 913. The feeding system 9 may also include a processing device 912, wherein the solid material silo 911 is used to store solid coating raw materials, and the rotary feeding mechanism 913 is located at the discharge end of the solid material silo 911, used to continuously and quantitatively transport the solid raw materials to the processing device 912.

[0176] In some embodiments, the solid coating material is spherical parylene, sheet-like parylene, or granular parylene. The parylene includes Parylene N, Parylene C, Parylene D, Parylene F, Parylene HT, etc.

[0177] Furthermore, the processing device 912 may include a sublimation chamber 9121, in which solid raw materials enter the sublimation chamber 9121 and sublimate into a gaseous state at a specific temperature.

[0178] In some embodiments, the processing device 912 may further include a pyrolysis chamber 9122. The gaseous raw material obtained after sublimation in the sublimation chamber 9121 enters the pyrolysis chamber 9122 for pyrolysis reaction to form an active raw material that can be used for coating. Finally, it is transported to the process chamber 2 through a pipeline to meet the coating requirements of the device 200.

[0179] In some embodiments, the sublimation chamber 9121 is provided with a quick-change receiving tray 9123 for receiving solid raw materials.

[0180] Furthermore, the replenishment hopper 92 is connected to the solid material hopper 911 of the storage hopper 91 for replenishing solid coating raw materials to the solid material hopper 911. The top of the replenishment hopper 92 is equipped with a replenishment port 921, serving as an inlet for external material feeding into the replenishment hopper 92. When material needs to be added to the replenishment hopper 92, the connecting valve between the replenishment hopper 92 and the storage hopper 91 is closed, isolating the two hoppers. Then, the replenishment port 921 is opened to prevent outside air from entering the storage hopper 91 through the replenishment hopper 92 during the replenishment process, ensuring that the vacuum environment inside the storage hopper 91 remains unaffected.

[0181] Furthermore, after the feeding port 921 is closed, the vacuuming component 3 will perform a vacuuming operation on the feeding hopper 92, so that the vacuum level in the feeding hopper 92 gradually approaches the vacuum level of the storage hopper 91. When the vacuum level in the feeding hopper 92 deviates from the vacuum level in the storage hopper 91 within the tolerance range (e.g., 1%), and the material level detection device confirms that the coating material in the storage hopper 91 (specifically, the solid material hopper 911) is less than the first residual threshold, the connecting valve between the feeding hopper 92 and the storage hopper 91 opens, and the solid raw material in the feeding hopper 92 enters the solid material hopper 911 of the storage hopper 91 under the action of gravity or a pushing mechanism, completing the feeding action.

[0182] In some embodiments, the feeding bin 92 can be connected to the process bin 2 via a pipe, and the pipe can be equipped with a vacuum breaking valve 94, a vacuum valve 95, and a vacuum gauge 96.

[0183] The vacuum breaking valve 94 is used to introduce gas into the replenishment chamber 92 before replenishment, breaking its vacuum state and restoring the internal air pressure of the replenishment chamber 92 to atmospheric pressure. This allows the replenishment port 921 to be opened safely to fill the replenishment chamber 92 with coating material (such as Pyrelin raw material), avoiding operational difficulties or dangers caused by the vacuum environment during replenishment.

[0184] Vacuum valve 95 acts as a "switch" between the material replenishment chamber 92 and the process chamber 2. Normally closed, it maintains isolation between the two chambers, preventing disruption of the vacuum environment in the process chamber 2. During pre-coating preparation, it can be opened to ensure consistent vacuum levels in both chambers, allowing for synchronized vacuuming and improved efficiency.

[0185] Vacuum gauge 96 is used to detect the vacuum level in the replenishment bin 92 in real time, providing quantitative data for the replenishment process. For example, when vacuum gauge 96 detects that the vacuum level in the replenishment bin reaches a first preset threshold (within tolerance of the process bin vacuum level, such as ±1%-10%), and the material in storage bin 91 is insufficient, it will trigger the opening of the valve connecting the replenishment bin 92 and storage bin 91. This ensures that the vacuum environment of process bin 2 will not be disrupted due to excessive pressure difference during replenishment. Thus, through this collaborative mechanism, the components in the feeding system 9 ensure a continuous supply of qualified coating materials to process bin 2 while replenishing coating materials without affecting the vacuum environment of process bin 2, further achieving the continuity of the coating process.

[0186] Figures 20 to 23 A feeding system 9 according to an embodiment of this application is shown.

[0187] Combination Figures 20 to 23 The rotary feeding mechanism 913 controllably transports the solid coating material into the sublimation chamber 9121 at a set feeding rate.

[0188] Specifically, the rotary feeding mechanism 913 includes a rotary disk 9131, a feeding channel 9132, and a stop block 9133. The rotary disk 9131 is disposed within the solid material hopper 911 and is capable of rotating around its own central axis. The rotary disk 9131 has a central protrusion 9135 and a plurality of rotary disk holes 9134 evenly arranged around the central protrusion 9135. The size of the rotary disk holes 9134 corresponds to the size of the solid coating material or pellet, and one rotary disk hole 9134 is used to accommodate one solid coating material or pellet.

[0189] Furthermore, a magnetic fluid sealing transmission device 9138 is provided below the turntable 9131. A servo motor on the outside of the solid material hopper 911 drives the magnetic fluid sealing transmission device 9138 to rotate via a pulley, thereby driving the turntable 9131 to rotate. The material discharge channel 9132 is located below the turntable 9131, connecting the solid material hopper 911 and the sublimation chamber 9121.

[0190] In some embodiments, the stop 9133 may be one, two or more, located above the turntable 9131, allowing the solid coating material or pellet in the turntable hole 9134 to rotate to the feeding channel 9132, and blocking the remaining solid coating material other than the solid coating material or pellet in the turntable hole 9134 from rotating to the feeding channel 9132, so that the solid coating material or pellet in the feeding channel 9132 continues to enter the sublimation chamber 9121.

[0191] In some embodiments, the turntable feeding mechanism 913 further includes an indexing device for controlling the rotation angle of the turntable 9131. For example, when there are six turntable holes 9134, the angle between two adjacent turntable holes 9134 is 60°. The indexing device can control the turntable 9131 to rotate 60° each time, so that the solid coating material or pellets in the turntable holes 9134 can fall into the feeding channel 9132 and then be transported to the sublimation chamber 9121. The indexing device can be a photoelectric indexing mechanism, thereby improving the accuracy of the turntable 9131 rotation and solving the errors caused by synchronous wheel slippage and servo motor rotation.

[0192] In some embodiments, the turntable feeding mechanism 913 further includes a photoelectric detection device 93 for detecting the feeding status of the solid coating material.

[0193] In some embodiments, the turntable 9131 has a waiting position and a discharging position, which correspond to two adjacent turntable holes 9134 of the turntable 9131, respectively. The photoelectric detection device 93 includes a first photoelectric switch sensor 931 and a second photoelectric switch sensor 932. The first photoelectric switch sensor 931 is used to detect whether there is solid coating material at the waiting position of the turntable 9131, and the second photoelectric switch sensor 932 is used to detect whether there is solid coating material at the discharging position of the turntable 9131. The stop block 9133 has a first channel 9136 corresponding to the waiting position and a second channel 9137 corresponding to the discharging position.

[0194] In some embodiments, the first photoelectric switch sensor 931 and the second photoelectric switch sensor 932 are disposed on the upper cover 9111 of the solid material hopper 911, and the first photoelectric switch sensor 931 is installed above the first channel 9136, and the second photoelectric switch sensor 932 is installed above the second channel 9137.

[0195] When the first photoelectric switch sensor 931 at the waiting position detects the presence of pellets, but the second photoelectric switch sensor 932 at the unloading position does not, this is recorded as one instance of pellets being present. When both the first and second photoelectric switch sensors 931 and 932 at the waiting and unloading positions detect pellets, this is recorded as one instance of pellet jamming. When neither the first nor the second photoelectric switch sensor 931 or 932 at the waiting and unloading positions detects pellets, this is recorded as one instance of empty feed. Upon detecting pellets, the control valve actuates, allowing the pellets to enter the sublimation chamber 9121, and the system feed count increases by one. Upon detecting jamming or empty feed, the control valve remains inactive, the system feed count does not increase, and the turntable 9131 continues to rotate for the next feed cycle.

[0196] In some embodiments, the photoelectric detection device 93 further includes a third photoelectric switch sensor 933, which is disposed above the center of the central protrusion 9135 and is used to detect whether there is solid coating material or pellet at the center of the central protrusion 9135 of the turntable 9131.

[0197] In some embodiments, the photoelectric detection device 93 further includes an alarm (not shown) that when the third photoelectric switch sensor 933 detects that there is no solid coating material or pellet at the center of the central protrusion 9135 of the turntable 9131, the alarm will issue an alarm signal.

[0198] Specifically, when the amount of solid coating material or pellets remaining reaches a certain level (e.g., less than 30% of the total capacity), the screw in the center of the turntable 9131 will protrude, triggering the pellet balance alarm line and alerting the hopper to a shortage of material.

[0199] In some embodiments, a groove (not shown) is also provided below the turntable 9131. The groove can solve the problem of broken material caused by half a pellet in the turntable 9131. During normal operation, the solid material bin 911 is full of pellets. The pellets enter the turntable hole 9134 on the outer ring of the turntable 9131 and rotate with the turntable 9131. When it rotates to the waiting position, the stop block 9133 blocks the remaining pellets on the turntable 9131. Only the pellets in the turntable hole 9134 can enter the waiting position. Then it continues to rotate to the unloading position for unloading. When incomplete or broken pellets enter the turntable hole 9134, if the incomplete pellets are small, the turntable 9131 will rotate, and the pellets will fall into the groove below the turntable 9131. The next pellet will continue to enter the turntable hole 9134, and the pellets in the groove will be rotated synchronously by the groove, without affecting the rotation of other pellets. When passing the discharge position, the pellets in the turntable hole 9134 will be discharged. If the incomplete pellets are large, the pellets will rotate with the turntable 9131, and there will be a complete pellet above the pellets. When they reach the stop block 9133, the complete pellets will be pushed out of the turntable hole 9134, and only the pellets in the turntable hole 9134 will be discharged.

[0200] Combined Figure 19 In some embodiments, the continuous coating system 100 further includes a vacuum assembly 3 for at least evacuating the process chamber 2.

[0201] The vacuum assembly 3 includes an air extraction pipeline 105, which is equipped with a pump unit for extracting air from the process chamber 2. The air extraction pipeline 105 includes a coarse extraction pipeline and a fine extraction pipeline. The coarse extraction pipeline is connected to the process chamber 2, and the fine extraction pipeline is connected to the process chamber 2 via a cold trap 104, which is used to capture condensable gases in the extracted air. Before coating, the chamber is evacuated; first, a coarse vacuum is performed, and then a fine vacuum is performed after a certain vacuum level is reached.

[0202] In some embodiments, the continuous coating system 100 further includes an exhaust gas treatment device 106, which is connected to an extraction pipeline 105 and is used to treat and discharge the gas extracted through the extraction pipeline 105. The exhaust gas treatment device 106 includes, but is not limited to, the recovery or pollution-free treatment of reaction raw materials, process gases, or auxiliary gases containing doping elements such as nitrogen, inert gases, hydrogen, and hydrocarbon gases, before discharging them to the outside environment to prevent environmental pollution and to enable recycling.

[0203] According to an embodiment of this utility model, the process chamber 2 is connected to the pump unit via two pipelines: a coarse extraction pipeline and a fine extraction pipeline. The coarse extraction pipeline is directly connected to the process chamber 2, and a cold trap 104 is added between the fine extraction pipeline and the process chamber 2. During the vacuuming stage, the coarse extraction pipeline is opened first to quickly remove most of the air from the process chamber 2. After reaching a certain pressure, the fine extraction pipeline is opened. The low-temperature condensation and adsorption effect of the cold trap 104 can accelerate the vacuuming rate and simultaneously enable the process chamber 2 to obtain a lower ultimate vacuum. During the coating process, the fine extraction pipeline is used. The process mixed gas extracted from the process chamber 2 is condensed and adsorbed at low temperature by the cold trap 104 before being pumped away by the pump unit and discharged after passing through the exhaust gas treatment device 106. This significantly reduces the impurities entering the pump unit, extends the service life of the pump unit, and effectively filters out exhaust gas, making the equipment more environmentally friendly.

[0204] In some embodiments, the vacuum assembly 3 further includes a valve 108 that can control the opening degree, used to adjust the pumping speed of the pumping line 105 to control the stability of the vacuum pressure in the process chamber 2.

[0205] In some embodiments, the vacuum assembly 3 further includes a first vacuum pressure sensor 107 for detecting the pressure in the vacuum line 105.

[0206] As described above, using the technical solution of this application, the flap valve 7 applied to the continuous coating system 100 forms a transfer channel 77 through the docking of the frame 71 with the first and second compartments, providing a stable path for the device 200 to pass between the two compartments. The movement of the flap door 72 between the first and second positions can precisely realize the opening and closing of the transfer channel 77. This structural design can effectively isolate the internal environment of adjacent compartments, avoid environmental interaction between different compartments that could lead to impurity intrusion or pressure fluctuations, thereby ensuring the stability of the environment in each compartment and providing a basic guarantee for the coating quality of the device 200.

[0207] Furthermore, the flap door 72 is hinged to the frame 71 and rotates inward toward the transfer channel 77, making the movement trajectory of the flap door 72 more controllable. During rotation, it is less likely to interfere with the frame 71 or other structures, improving the smoothness of the opening and closing action. At the same time, the inward rotation allows the flap door 72 to fit more tightly with the frame 71 when closed, reducing sealing gaps and further enhancing the isolation effect between the compartments, reducing the risk of impurity penetration.

[0208] Furthermore, the connection between the first drive unit 73 and the flap door 72 enables power control of the flap door 72's rotation. Compared to manual or passive drive methods, this significantly improves the response speed and accuracy of the flap door 72's opening and closing actions. This ensures timely action at critical points where it is necessary to connect or isolate the compartment, reducing the time the compartment is exposed to or fluctuates in the environment. Especially in coating scenarios with stringent environmental requirements, this effectively guarantees the stability of the coating quality.

[0209] Furthermore, the first drive unit 73 adopts a structure in which an external power unit cooperates with a connecting rod. Placing the power source outside the frame 71 avoids contamination of the internal environment of the transfer channel 77 by the power components, while also reducing the impact of special environments (such as vacuum or corrosive gases) on the power components within the channel, thus extending the service life of the drive structure. The hinged cooperation between the connecting rod and the flip door 72 ensures that the power is stably transmitted to the flip door 72, ensuring that the flip door 72 rotates precisely around the hinged end, thereby improving the reliability of the opening and closing action.

[0210] Furthermore, the liftable transport unit 74 not only enables stable transfer of the device 200 to the second compartment, but also effectively avoids motion interference between the transport unit 74 and the flip door 72 by stopping the transfer and lowering it to avoid interference during the movement of the flip door 72, ensuring the smooth opening and closing of the flip door 72. Simultaneously, the lifting design of the transport unit 74 allows for the orderly connection between the transfer of the device 200 and the isolation of the compartment, reducing process stagnation caused by action conflicts, improving the overall system operating efficiency, and preventing the device 200 from shifting position when the flip door 72 moves, ensuring the positioning accuracy of subsequent coating.

[0211] By setting the first buffer chamber 1 as a pre-vacuum transition area for the device 200 to be coated, when the inlet of the first buffer chamber 1 is open to receive the device 200, the first buffer chamber 1 remains isolated from the process chamber 2 to avoid disrupting the vacuum environment of the process chamber 2. After the device 200 has fully entered the first buffer chamber 1, the inlet is closed and the first buffer chamber 1 is evacuated by the vacuum pumping component 3 until its internal vacuum level reaches a first preset threshold within the tolerance range of the preset vacuum level of the process chamber 2. At this point, the first buffer chamber 1 and the process chamber 2 are connected again, allowing the device 200 to enter the process chamber 2 for coating. Thus, compared with the traditional single-furnace coating mode that requires repeated evacuation of the process chamber 2, the evacuation time can be significantly shortened, and the process chamber 2 always maintains the vacuum state required for coating, without interrupting the coating process due to the introduction of the device 200 to be coated. This significantly improves the production efficiency of the continuous coating system 100, while significantly reducing energy consumption and equipment wear costs.

[0212] Furthermore, a second buffer chamber 4 is added downstream of process chamber 2 as a transition structure for the unloading of the coated device 200. When the device 200 completes coating in process chamber 2, it is first transferred to the second buffer chamber 4. At this time, process chamber 2 and the second buffer chamber 4 are isolated to ensure that the vacuum environment of process chamber 2 is not affected by the unloading. After the device 200 enters the second buffer chamber 4, the connection between process chamber 2 and the second buffer chamber 4 is sealed, and then the outlet of the second buffer chamber 4 is opened to output the device 200. After the output is completed, the second buffer chamber 4 is evacuated to prepare for receiving the next batch of devices 200. Thus, the unloading process and the coating process of process chamber 2 are completely decoupled. In traditional technology, the vacuum of process chamber 2 needs to be broken during unloading, which means that the vacuum needs to be re-evacuated before the coating of subsequent batches. However, in this solution, process chamber 2 can still carry out the coating operation of subsequent batches simultaneously during unloading, realizing the continuous operation of the continuous coating system 100 throughout the entire process. It is especially suitable for scenarios that require 24-hour uninterrupted production and significantly improves the efficiency of the coating process.

[0213] Furthermore, an air extraction baffle 24 is provided between adjacent cavity units 20 to guide the airflow direction between cavity units 20, avoid airflow turbulence, and at the same time work with the air extraction port 22 to promptly discharge excess gas and reaction products in each cavity unit 20, maintain stable air pressure and vacuum environment in each cavity unit 20, ensure uniform distribution of coating material in each cavity unit 20, and improve the overall coating efficiency and quality of the continuous coating system 100.

[0214] Furthermore, by setting up a storage bin 91 and a replenishment bin 92, the replenishment port 921 is opened during replenishment, while the replenishment bin 92 is isolated from the storage bin 91. After replenishment, a vacuum is drawn, and materials are replenished when conditions are met. Thus, the replenishment of coating materials can be completed without disrupting the vacuum environment of the storage bin 91 and the process bin 2, avoiding production interruptions caused by replenishment, ensuring continuous coating process, improving production efficiency, and reducing manual intervention by automating the replenishment process, thereby enhancing the stability and material utilization of the continuous coating system 100.

[0215] This utility model embodiment also provides a continuous coating method, comprising: sending a device to be coated into a first buffer chamber; closing the entrance of the first buffer chamber in response to the device entering the first buffer chamber; evacuating the first buffer chamber in response to the closure of the entrance of the first buffer chamber; and connecting the first buffer chamber and a process chamber in response to the vacuum level in the first buffer chamber being equal to a first preset threshold, and sending the device from the first buffer chamber into the process chamber for coating.

[0216] Furthermore, the method further includes: in response to the device completing the coating, connecting the second buffer chamber and the process chamber to receive the device; in response to the device entering the second buffer chamber, isolating the process chamber and the second buffer chamber, and opening the outlet of the second buffer chamber to output the device; in response to the device leaving the second buffer chamber, closing the outlet of the second buffer chamber, and evacuating the second buffer chamber to receive the next device.

[0217] Furthermore, the outlet of the second buffer chamber is closed, and the process chamber and the second buffer chamber are isolated from each other.

[0218] In some embodiments, during the coating process of the device, in response to the fact that the coating material in the storage bin is insufficient to a first allowance threshold, coating material is replenished to the storage bin via a replenishment bin; wherein the storage bin is optionally connected to the process bin, the storage bin is used to input coating material into the process bin; and the replenishment bin is optionally connected to the storage bin, and is used to replenish coating material to the storage bin.

[0219] Furthermore, the replenishment hopper has a replenishment port for filling the replenishment hopper with coating material; in response to the replenishment port being opened, the replenishment hopper and the storage hopper are isolated; in response to the replenishment of the replenishment hopper being completed, the replenishment port is closed and the replenishment hopper is evacuated; in response to the vacuum degree in the replenishment hopper being equal to a first preset threshold and the coating material in the storage hopper being less than a first surplus threshold, the replenishment hopper and the storage hopper are connected to replenish the coating material in the storage hopper.

[0220] It should be understood that the continuous coating method described above can be achieved through the aforementioned Figures 1 to 23 The continuous coating system 100 shown is implemented, so the implementation method of each step and the cooperation method between the components to implement the steps can be referred to the relevant description above, and will not be repeated here.

[0221] Therefore, the continuous coating method of this application involves sending the device into the first buffer chamber, closing the inlet to create a vacuum, and then connecting it to the process chamber for coating. This avoids frequent vacuum breaking in the process chamber, reduces vacuuming time, achieves continuous coating process, improves production efficiency, reduces energy consumption and time costs, and ensures that the process chamber maintains the vacuum environment required for coating, thus guaranteeing the stability of coating quality.

[0222] It should be understood that the term "and / or" in this document is merely a description of the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A alone, A and B simultaneously, and B alone. Additionally, the character " / " in this document indicates that the preceding and following related objects are in an "or" relationship. As used herein, unless explicitly stated otherwise, the term "or" covers all possible combinations unless impractical. For example, if a component is declared to include A or B, then unless explicitly stated otherwise or impractical, the component can include A, or B, or A and B. As a second example, if a component is declared to include A, B, or C, then unless explicitly stated otherwise or impractical, the component can include A, or B, or C, or A and B, or A and C, or B and C, or A and B and C.

[0223] The term "multiple" in the embodiments of this application refers to two or more entities. Relational terms appearing in the embodiments of this application, such as "first," "second," etc., are used only to distinguish an entity or operation from another entity or operation, without requiring or implying any actual relationship or order between these entities or operations. Furthermore, the words "comprising," "having," and "including," and other similar forms, are intended to be equivalent in meaning and are open-ended; one or more items following any of these words do not imply an exhaustive list of such items or that they are limited to only the listed items. Exemplary embodiments have been disclosed in the drawings and specification. However, many variations and modifications can be made to these embodiments. Therefore, although specific terminology is used, it is used only in a general and descriptive sense and not for limiting purposes.

[0224] While the present invention has been disclosed above, it is not limited thereto. Any person skilled in the art can make various modifications and alterations without departing from the spirit and scope of the present invention; therefore, the scope of protection of the present invention should be determined by the scope defined in the claims.

Claims

1. A flap valve for use in a continuous coating system, characterized in that, The continuous coating system is used to coat a device to be coated. The flap valve is at least disposed between adjacent first and second compartments of the continuous coating system to connect or isolate the first and second compartments. The flap valve includes: The frame, along the direction of movement of the device, has its two sides respectively docking with the first compartment and the second compartment, and the frame encloses a transfer channel for the device to enter the second compartment from the first compartment; The flip-door can move between a first position and a second position. The flip-door in the first position opens the transfer channel, while the flip-door in the second position blocks the transfer channel.

2. The flap valve according to claim 1, characterized in that, The flap door is hinged to the frame and can rotate around the frame toward the interior of the transfer channel to move from the second position to the first position.

3. The flap valve according to claim 1, characterized in that, Also includes: A first drive unit is connected to the flip door, and the first drive unit is used to drive the flip door to rotate in order to open or block the transfer channel.

4. The flap valve according to claim 3, characterized in that, The flip door includes a hinged end hinged to the frame and a corresponding free end. The first driving unit includes: The power unit is located outside the frame. A connecting rod, one end of which is connected to the power unit, and the other end of which is directly or indirectly hinged to the flip door. The flip door rotates around the hinged end under the drive of the connecting rod.

5. The flap valve according to claim 1, characterized in that, The flap door is located on the side of the frame closer to the second compartment; and / or The coverage area of ​​the flap door is greater than the exit area of ​​the transfer channel facing the second warehouse.

6. The flap valve according to claim 1, characterized in that, Also includes: The transport unit is vertically mounted on the bottom wall of the frame that forms the transfer channel. The transport unit is used to transport the device toward the second compartment. During the movement of the flip door in the first position and the second position, the transport unit stops transporting the device and descends to avoid the movement trajectory of the flip door.

7. The flap valve according to claim 6, characterized in that, The conveying unit includes a roller assembly structure and a horizontal rotating motor, wherein the horizontal rotating motor drives the rollers in the roller assembly structure to rotate in order to transport the device.

8. The flap valve according to claim 7, characterized in that, The conveying unit also includes a lifting motor for driving the roller assembly structure to rise and fall.

9. The flap valve according to claim 8, characterized in that, The conveying unit includes a transmission gear, and the horizontal rotation motor includes a horizontal rotation gear. Driven by the lifting motor, the roller assembly structure can: The transmission gear rises until it meshes with the horizontal rotating gear, and... The gear descends until it is decoupled from the transmission gear.

10. The flap valve according to claim 6, characterized in that, During the movement of the flip door between the first position and the second position, the transport surface of the conveying unit is lower than the lower edge of the flip door to avoid the movement trajectory of the flip door.

11. A continuous coating system, characterized in that, include: The first compartment is used to receive devices to be coated; The second compartment is used to coat the device, and the second compartment is located downstream of the first compartment; A vacuuming assembly, used at least to evacuate the first chamber; wherein... While the entrance to the first compartment is open to receive the device, the first compartment and the second compartment are isolated from each other; In response to the device entering the first chamber, the inlet of the first chamber is closed, and the vacuuming assembly evacuates the first chamber; In response to the real-time vacuum level in the first chamber being equal to a first preset threshold, the first chamber and the second chamber are connected to each other, and the device enters the second chamber from the first chamber for coating. The flap valve as described in any one of claims 1-10 is disposed between the first compartment and the second compartment to connect or isolate the first compartment and the second compartment.

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