A high precision beam adjustment device for electron beam lithography

Abstract

The utility model relates to beam current adjusting technical field discloses a kind of high-precision beam current adjusting device for electron beam lithography, including photoetching machine, the photoetching head is fixedly connected in the top inner wall of photoetching machine, the connecting frame is fixedly connected in the bottom inner wall of photoetching machine, the two-way threaded rod is rotatably connected in the inside of connecting frame, the nut pair is threadedly connected in the outer ring of two-way threaded rod both ends, the limit rod is slidably connected in the inside of nut pair and is fixedly connected with the inner wall of connecting frame in the utility model, and the diaphragm flexible disassembly is realized to adapt beam current demand by gear transmission and radial extrusion structure, and the focusing stability is guaranteed by rotating rod and linkage mechanism to realize condenser lens convenient fixing and disassembly, the maintenance replacement of beam current adjusting and core optical component, satisfy the practical machining to workpiece fixed, beam current control and component maintenance practical demand, have generated the positive effect of improving machining precision, enhancing use flexibility and reliability.

Description

Technical Field

[0001] This utility model relates to the field of beam current adjustment technology, specifically a high-precision beam current adjustment device for electron beam lithography. Background Technology

[0002] As microelectronic devices move down to the nanometer scale, a technology capable of achieving smaller feature sizes and higher precision alignment is needed to meet manufacturing demands. Electron beam lithography has emerged to address this need. It utilizes the fine focusing capability of an electron beam to precisely expose specific areas of semiconductor materials, achieving pattern precision at the nanometer or even sub-nanometer level, thus better meeting the high-precision manufacturing requirements of the future semiconductor industry.

[0003] As semiconductor device dimensions continue to shrink, reaching the nanometer and even sub-nanometer levels, the precision requirements for electron beam lithography are becoming increasingly stringent. The beam current characteristics, such as beam intensity and beam spot size, have a crucial impact on lithography precision. For example, uneven beam current intensity can lead to inconsistent exposure dosage of the photoresist, thus affecting the accuracy and quality of the pattern. High-precision beam current adjustment devices can precisely control various beam current parameters, ensuring more accurate exposure during the electron beam lithography process and meeting the demands of nanoscale manufacturing.

[0004] When changing the processing object, it is time-consuming to readjust the beam current adjustment components, which makes it impossible to achieve rapid process switching and reduces the equipment's adaptability to multi-variety, small-batch production.

[0005] To address the aforementioned issues, a high-precision beam current adjustment device for electron beam lithography is proposed. Utility Model Content

[0006] The purpose of this invention is to provide a high-precision beam current adjustment device for electron beam lithography, which solves the problem in the prior art that when changing the processing object, it is necessary to spend time readjusting the beam current adjustment component, which makes it impossible to achieve rapid process switching and reduces the equipment's adaptability to multi-variety, small-batch production.

[0007] To achieve the above objectives, this utility model provides the following technical solution: a high-precision beam current adjustment device for electron beam lithography, comprising a lithography machine, a lithography head fixedly connected to the inner wall of the top of the lithography machine, a connecting frame fixedly connected to the inner wall of the bottom of the lithography machine, a bidirectional threaded rod rotatably connected inside the connecting frame, a nut pair threadedly connected to the outer rings of both ends of the bidirectional threaded rod, a limit rod penetrating and slidably connected inside the nut pair, and the limit rod being fixedly connected to the inner wall of the connecting frame, a fixing plate fixedly connected to the top of the nut pair, a limit ring fixedly connected to the outer ring on the right side of the bidirectional threaded rod, a condensing lens provided at the bottom of the lithography head, an aperture provided at the bottom of the condensing lens, and an installation assembly provided inside the lithography machine.

[0008] By adopting the above technical solution, the bidirectional threaded rod is controlled by the limit ring and bolts, and the fixing plate fixes the object to be processed.

[0009] As a further description of the above technical solution: the mounting assembly includes a rotating shaft, which is rotatably connected to the inside of the left side of the lithography machine. A drive gear is fixedly connected to the outer ring of the rotating shaft, and a driven gear is meshed with the outer ring of the drive gear. A rotating ring is fixedly connected inside the driven gear, and a support ring is rotatably connected to the bottom of the rotating ring. The support ring is fixedly connected to the inside of the lithography machine. A uniformly distributed arc-shaped groove is opened on the top of the rotating ring, and a uniformly distributed extrusion block is arranged inside the rotating ring.

[0010] By adopting the above technical solution, the rotating shaft is supported by a support plate outside the shaft, and the rotating shaft is limited and controlled by a limiting sleeve.

[0011] As a further description of the above technical solution: an electric push rod is fixedly connected to the inner wall of the right side of the lithography machine, a grooved plate is fixedly connected to the output end of the electric push rod, a fixed frame is fixedly connected to the outer wall of the right side of the grooved plate, a rotating rod is rotatably connected inside the fixed frame, and a rotating plate is fixedly connected to the outer wall of the rotating rod.

[0012] By adopting the above technical solution, the condenser lens can be easily replaced by using an electric push rod for extension and retraction.

[0013] As a further description of the above technical solution: the top of the extrusion block is fixedly connected to a limiting post, and the limiting post is slidably connected to the inner wall of the arc-shaped groove.

[0014] By adopting the above technical solution, the limiting post slides on the inner wall of the arc-shaped groove.

[0015] As a further description of the above technical solution: both ends of the rotating plate are rotatably connected to inclined rods, and one end of each inclined rod is fixedly connected to a movable disk.

[0016] By adopting the above technical solution, the moving disk is moved by the diagonal rod.

[0017] As a further description of the above technical solution: a uniformly distributed guide block is fixedly connected to the outer wall of the right side of the groove plate.

[0018] By adopting the above technical solution, the guide block performs guiding and limiting functions.

[0019] As a further description of the above technical solution: a movable block is slidably connected to the outer wall of the guide block, and the movable block is fixedly connected to the movable disk.

[0020] By adopting the above technical solution, the moving block slides on the outer wall of the guide block, driving the moving disk to move.

[0021] As a further description of the above technical solution: a clamping plate is fixedly connected to the left side of the movable disk, and an arc-shaped plate is fixedly connected to the opposite side of the clamping plate.

[0022] By adopting the above technical solution, the condenser lens is fixed by an arc-shaped plate.

[0023] Compared with the prior art, the beneficial effects of this utility model are as follows: This utility model provides a high-precision beam current adjustment device for electron beam lithography. First, it achieves flexible installation and removal of the aperture through gear transmission and radial extrusion structure to adapt to beam current requirements. Second, it achieves convenient fixing and disassembly of the condenser lens through a rotating rod and linkage mechanism to ensure focusing stability. Third, it meets the practical needs of workpiece fixing, beam current control and component maintenance in actual processing for beam current adjustment and maintenance, resulting in positive effects of improving processing accuracy, enhancing usage flexibility and reliability. Attached Figure Description

[0024] Figure 1 This is a schematic diagram of the overall structure of this utility model; Figure 2 This is a schematic diagram of the structure of the electric actuator of this utility model; Figure 3 This is a schematic diagram of the extrusion block of this utility model; Figure 4 This is a schematic diagram of the structure of the bidirectional threaded rod of this utility model.

[0025] In the diagram: 1. Lithography machine; 2. Lithography head; 3. Electric push rod; 4. Rotating shaft; 5. Driving gear; 6. Support ring; 7. Connecting frame; 8. Driven gear; 9. Groove plate; 10. Fixed frame; 11. Rotating rod; 12. Rotating plate; 13. Diagonal rod; 14. Moving disk; 15. Guide block; 16. Moving block; 17. Clamping plate; 18. Arc plate; 19. Condensing lens; 20. Rotating ring; 21. Arc groove; 22. Extrusion block; 23. Limiting post; 24. Aperture; 25. Bidirectional threaded rod; 26. Fixed plate; 27. Nut pair; 28. Limiting rod; 29. ​​Limiting ring. Detailed Implementation

[0026] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0027] To further understand the contents of this utility model, a detailed description of this utility model will be provided with reference to the accompanying drawings.

[0028] Reference Figures 1-4 This utility model discloses a high-precision beam current adjustment device for electron beam lithography, including a lithography machine 1. A lithography head 2 is fixedly connected to the inner wall of the top of the lithography machine 1 by bolts. The lithography head 2 is used to emit an electron beam. A connecting frame 7 is welded and fixed to the inner wall of the bottom of the lithography machine 1. The connecting frame 7 has a U-shaped structure and a bidirectional threaded rod 25 is rotatably connected to it through a bearing. The threads at both ends of the bidirectional threaded rod 25 are opposite in direction, and the outer rings are threaded with a nut pair 27. The nut pair 27 and the bidirectional threaded rod 25 form a helical transmission engagement.

[0029] A limiting rod 28 is internally connected and slidably connected to the nut assembly 27. The axis of the limiting rod 28 is parallel to the axis of the bidirectional threaded rod 25, and both ends of the limiting rod 28 are welded and fixed to the inner wall of the connecting frame 7. The limiting rod 28 can restrict the nut assembly 27 from rotating synchronously with the bidirectional threaded rod 25, so that the nut assembly 27 can only move axially. A fixing plate 26 is welded and fixed to the top of the nut assembly 27. The top surface of the fixing plate 26 is used to support and clamp the workpiece. A limiting ring 29 is welded and fixed to the outer right side of the bidirectional threaded rod 25. The diameter of the limiting ring 29 is larger than the major diameter of the thread of the bidirectional threaded rod 25, which can restrict the axial displacement of the bidirectional threaded rod 25.

[0030] A condenser lens 19 is provided at the bottom of the lithography head 2, which is used to focus the electron beam; an aperture 24 is provided at the bottom of the condenser lens 19, which is used to adjust the amount of light passing through the electron beam; and a mounting assembly for mounting the aperture 24 and the condenser lens 19 is provided inside the lithography machine 1.

[0031] The mounting assembly includes a rotating shaft 4, which is rotatably connected to the inner left wall of the lithography machine 1 via bearings. One end of the rotating shaft 4 extends to the outside of the lithography machine 1 and is fixedly connected to a knob (not shown in the figure) for easy manual rotation. A drive gear 5 is fixedly connected to the outer ring of the rotating shaft 4, and a driven gear 8 is meshed with the outer ring of the drive gear 5. The transmission ratio between the drive gear 5 and the driven gear 8 is 1:2. A rotating ring 20 is welded and fixed inside the driven gear 8. The rotating ring 20 has an annular structure, and a support ring 6 is rotatably connected to its bottom via bearings. The outer ring of the support ring 6 is welded and fixed to the inside of the lithography machine 1 to support the rotating ring 20.

[0032] The rotating ring 20 has three evenly distributed arc-shaped grooves 21 at its top, which are inclined along the circumference of the rotating ring 20. Inside the rotating ring 20, there are three extrusion blocks 22 corresponding to the arc-shaped grooves 21. The extrusion blocks 22 have a fan-shaped structure, and their inner walls can fit against the outer wall of the aperture 24. A limit post 23 is welded and fixed to the top of the extrusion block 22. The diameter of the limit post 23 is adapted to the width of the arc-shaped groove 21, and the limit post 23 is slidably connected to the inner wall of the arc-shaped groove 21. When the rotating ring 20 rotates, the arc-shaped groove 21 can push the extrusion block 22 to move radially through the limit post 23.

[0033] An electric push rod 3, model DTZ100, is bolted to the inner right side of the lithography machine 1. Its output end is bolted to a grooved plate 9, which has a U-shaped structure. A mounting frame 10, a portal frame structure, is welded to its outer right side. Inside the mounting frame 10, a rotating rod 11 is rotatably connected via bearings. One end of the rotating rod 11 extends outside the mounting frame 10 and is fixedly connected to a handle (not shown in the figure). A rotating plate 12, a long strip structure, is welded to the outer wall of the rotating rod 11. Both ends of the rotating plate 12 are rotatably connected to inclined rods 13 via pins. The end of the inclined rod 13 furthest from the rotating plate 12 is fixedly connected to a moving disk 14, which has a ring structure.

[0034] Three evenly distributed guide blocks 15 are welded and fixed to the outer right side of the groove plate 9. The guide blocks 15 are cuboid structures, and movable blocks 16 are slidably connected to their outer walls. The movable blocks 16 and guide blocks 15 form a sliding fit, and the movable blocks 16 are welded and fixed to the movable disk 14. The guide blocks 15 can restrict the movement direction of the movable disk 14. A clamping plate 17 is welded and fixed to the left side of the movable disk 14. The clamping plate 17 is an arc-shaped structure, and an arc-shaped plate 18 is glued and fixed to the opposite side of the clamping plate 17. The arc-shaped plate 18 is made of rubber to avoid damage to the condenser lens 19 during clamping.

[0035] Working principle: When the bidirectional threaded rod 25 is rotated, the nut pair 27 connected to the outer rings at both ends is restricted by the limiting rod 28 fixed to the inner wall of the connecting frame 7, and can only move in opposite directions along the bidirectional threaded rod 25. The fixing plate 26 at the top of the nut pair 27 moves synchronously, thereby clamping or releasing the workpiece. The limiting ring 29 on the right outer ring of the bidirectional threaded rod 25 effectively restricts the axial displacement of the bidirectional threaded rod 25, ensuring the stability of the adjustment process. Rotating the rotating shaft 4 can drive the driving gear 5 to rotate, and then the driven gear 8 meshing with the driving gear 5 will rotate accordingly. The rotating ring 20 fixed inside the driven gear 8 rotates synchronously under the support of the bottom support ring 6. The inner wall of the arc groove 21 opened at the top of the rotating ring 20 will squeeze the limiting post 23 at the top of the extrusion block 22, so that the extrusion block 22 moves radially, realizing the installation and removal of the aperture 24. It is suitable for different beam focusing and light transmission. The rotating plate 12 is driven to rotate by the rotating rod 11. The inclined rods 13 at both ends of the rotating plate 12 pull the moving disk 14. The moving disk 14 moves horizontally through the moving block 16 which is slidably connected to the guide block 15 on the right side of the groove plate 9. Finally, the clamping plate 17 on the left side of the moving disk 14 and the arc plate 18 on the opposite side fix and remove the condenser lens 19. After the electron beam emitted by the photolithography head 2 is focused by the condenser lens 19 and controlled by the aperture 24, a high-precision beam adjustment effect can be achieved.

[0036] It should be noted that, in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus.

[0037] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A high-precision beam current adjustment device for electron beam lithography, comprising a lithography machine (1), characterized in that: The lithography machine (1) has a lithography head (2) fixedly connected to the top inner wall, and a connecting frame (7) fixedly connected to the bottom inner wall. A bidirectional threaded rod (25) is rotatably connected inside the connecting frame (7). Nut pairs (27) are threadedly connected to the outer rings at both ends of the bidirectional threaded rod (25). A limit rod (28) is slidably connected through the nut pair (27), and the limit rod (28) is fixedly connected to the inner wall of the connecting frame (7). A fixing plate (26) is fixedly connected to the top of the nut pair (27). A limit ring (29) is fixedly connected to the outer ring on the right side of the bidirectional threaded rod (25). A condenser lens (19) is provided at the bottom of the lithography head (2). An aperture (24) is provided at the bottom of the condenser lens (19). An installation assembly is provided inside the lithography machine (1).

2. The high-precision beam current adjustment device for electron beam lithography according to claim 1, characterized in that: The mounting assembly includes a rotating shaft (4), which is rotatably connected to the inside of the left side of the lithography machine (1). The outer ring of the rotating shaft (4) is fixedly connected to a drive gear (5), and the outer ring of the drive gear (5) is meshed with a driven gear (8). The driven gear (8) is fixedly connected to a rotating ring (20) inside. The bottom of the rotating ring (20) is rotatably connected to a support ring (6), and the support ring (6) is fixedly connected to the inside of the lithography machine (1). The top of the rotating ring (20) is provided with evenly distributed arc-shaped grooves (21), and the inside of the rotating ring (20) is provided with evenly distributed extrusion blocks (22).

3. The high-precision beam current adjustment device for electron beam lithography according to claim 1, characterized in that: An electric push rod (3) is fixedly connected to the inner wall of the right side of the lithography machine (1). A groove plate (9) is fixedly connected to the output end of the electric push rod (3). A fixed frame (10) is fixedly connected to the outer wall of the right side of the groove plate (9). A rotating rod (11) is rotatably connected inside the fixed frame (10). A rotating plate (12) is fixedly connected to the outer wall of the rotating rod (11).

4. A high-precision beam current adjustment device for electron beam lithography according to claim 2, characterized in that: The top of the extrusion block (22) is fixedly connected to a limiting post (23), and the limiting post (23) is slidably connected to the inner wall of the arc groove (21).

5. A high-precision beam current adjustment device for electron beam lithography according to claim 3, characterized in that: Both ends of the rotating plate (12) are rotatably connected to inclined rods (13), and one end of the inclined rod (13) is fixedly connected to a movable disk (14).

6. A high-precision beam current adjustment device for electron beam lithography according to claim 3, characterized in that: The groove plate (9) has a uniformly distributed guide block (15) fixedly connected to the outer wall of its right side.

7. A high-precision beam current adjustment device for electron beam lithography according to claim 6, characterized in that: The guide block (15) has a sliding connection to a moving block (16) on its outer wall, and the moving block (16) is fixedly connected to the moving disk (14).

8. A high-precision beam current adjustment device for electron beam lithography according to claim 5, characterized in that: A clamping plate (17) is fixedly connected to the left side of the movable disk (14), and an arc-shaped plate (18) is fixedly connected to the opposite side of the clamping plate (17).

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