Battery fluff forming device

CN224910046UActive Publication Date: 2026-10-27CHINA NAT BUILDING MATERIALS (JIANGYIN) OPTOELECTRONIC MATERIALS TECH CO LTD
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Patent Information

Application Number
CN202522443438.3
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-11-18
Publication Date
2026-10-27
Estimated Expiration
2035-11-18

AI Technical Summary

Technical Problem

[0003]但是现有的制绒槽中,由于下滚轮与硅片接触的位置固定,导致传输和反应过程中,容易在硅片表面形成滚轮印,硅片背面绒面形貌的均匀性差

Benefits of technology

[0015]本实用新型的优点和有益效果在于:本实用新型电池绒面成型装置设计合理,通过在辊体上设置支撑球,相比于现有技术滚轮与硅片的面接触改进为支撑球与硅片的点接触,减小传输组件与硅片的接触面积,增大硅片与反应液的反应面积,从而提高绒面形貌的均匀性。

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a battery velvet forming device, including the velvet making groove, be provided with transmission subassembly for transmission silicon wafer and the mixing assembly that will reaction liquid mix evenly in the velvet making groove, the transmission subassembly includes a plurality of transmission roller unit, the transmission roller unit includes the roller body with the velvet making groove rotary connection and is fixedly arranged on the support ball of roller body, the ball center of support ball with the axial line of roller body coincident arrangement, a plurality of support ball interval setting along the axial line direction of roller body. The battery velvet forming device structure is reasonable, and the uniformity of velvet appearance is improved.
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Description

Technical Field

[0001] This utility model relates to the field of battery texturing technology, and in particular to a battery texturing forming device. Background Technology

[0002] In the production of solar cells, a textured surface needs to be formed on the cell surface. This process uses chemical etching to treat the silicon wafer surface, creating a good light-trapping effect, reducing light reflectivity, and thus improving photoelectric conversion efficiency. During texturing, upper and lower rollers typically move the silicon wafer within a texturing tank containing a reaction solution. Simultaneously, the upper and lower surfaces of the silicon wafer react with the reaction solution to form the textured surface.

[0003] However, in existing texturing tanks, because the contact position between the lower roller and the silicon wafer is fixed, roller marks are easily formed on the surface of the silicon wafer during the transfer and reaction process, resulting in poor uniformity of the textured surface morphology on the back of the silicon wafer.

[0004] Therefore, it is necessary to improve the existing battery textured forming device. Utility Model Content

[0005] The purpose of this invention is to overcome the defects in the existing technology and provide a battery textured surface forming device to improve the uniformity of the textured surface morphology.

[0006] To achieve the above technical effects, the technical solution of this utility model is as follows: a battery textured surface forming device, including a textured groove, wherein a transfer component for transferring silicon wafers and a mixing component for uniformly mixing reaction liquid are provided in the textured groove, the transfer component includes a plurality of transfer roller units, each transfer roller unit including a roller body rotatably connected to the textured groove and a support ball fixedly disposed on the roller body, the center of the support ball being coincident with the axis of the roller body, and a plurality of the support balls being spaced apart along the axis of the roller body.

[0007] According to one embodiment of the present invention, the surface of the support ball is provided with a plurality of grooves.

[0008] According to one embodiment of the present invention, the support balls of two adjacent transmission roller units are staggered.

[0009] According to one embodiment of the present invention, the transmission assembly includes an upper conveying assembly and a lower conveying assembly for sandwiching and transmitting silicon wafers therein. Both the upper conveying assembly and the lower conveying assembly include a plurality of the transmission roller units, which are arranged to rotate synchronously.

[0010] According to one embodiment of the present invention, a synchronous gear is fixedly provided at the end of the transmission roller unit, and a synchronous belt for fitting all the synchronous gears therein is also included, and the output shaft of the servo motor is connected to the transmission roller unit.

[0011] According to one embodiment of the present invention, the outer wall of the flocking groove is fixedly provided with a mounting base for mounting the servo motor.

[0012] According to one embodiment of the present invention, the mixing component includes a liquid pump and a return pipe. The return pipe draws out the reaction liquid in the texturing tank through the liquid pump and returns it to the texturing tank for mixing.

[0013] According to one embodiment of the present invention, the return pipe includes a lower main pipe and a plurality of lower branch pipes communicating with the lower main pipe. The lower branch pipes are sealed and pass through the side wall of the fabrication tank, and the lower branch pipes are provided with a plurality of lower outlets.

[0014] According to one embodiment of the present invention, the return pipe includes an upper main pipe and a plurality of upper branch pipes communicating with the upper main pipe. The upper branch pipes are sealed and pass through the side wall of the texturing tank, and the upper branch pipes are provided with a plurality of upper liquid outlets. The upper main pipe is connected to the lower main pipe.

[0015] The advantages and beneficial effects of this utility model are as follows: The battery textured forming device of this utility model is reasonably designed. By setting support balls on the roller body, the surface contact between the roller and the silicon wafer in the prior art is improved to point contact between the support ball and the silicon wafer, which reduces the contact area between the transmission component and the silicon wafer and increases the reaction area between the silicon wafer and the reaction liquid, thereby improving the uniformity of the textured surface. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of the structure of an embodiment of the battery textured forming device of this utility model; Figure 2 yes Figure 1 An explosion diagram; Figure 3 This is a schematic diagram of the transfer roller unit; Figure 4 This is a schematic diagram of the supporting sphere structure; Figure 5 This is a schematic diagram of the return liquid pipeline; In the diagram: 1. Textile forming trough; 11. Mounting base; 2. Transfer roller unit; 21. Roller body; 22. Support ball; 221. Groove; 23. Synchronous gear; 3. Servo motor; 31. Synchronous belt; 4. Liquid pump; 5. Return pipe; 51. Lower main pipe; 52. Lower branch pipe; 521. Lower outlet; 53. Upper main pipe; 54. Upper branch pipe; 541. Upper outlet. Detailed Implementation

[0017] The specific embodiments of this utility model will be further described below with reference to the accompanying drawings and examples. The following examples are only used to more clearly illustrate the technical solution of this utility model and should not be construed as limiting the scope of protection of this utility model. Example

[0018] like Figure 1-5 As shown, the battery textured surface forming apparatus of the embodiment includes a textured tank 1. The textured tank 1 is provided with a transfer component for transferring silicon wafers and a mixing component for uniformly mixing reaction liquid. The transfer component includes a plurality of transfer roller units 2. The transfer roller unit 2 includes a roller body 21 rotatably connected to the textured tank 1 and a support ball 22 fixedly disposed on the roller body 21. The center of the support ball 22 coincides with the axis of the roller body 21. The plurality of support balls 22 are spaced apart along the axis of the roller body 21.

[0019] Optimize the contact method between the transmission component and the silicon wafer to reduce shading and increase the reaction area: By changing the surface contact between the roller and the silicon wafer in the traditional device to point contact between the support ball and the silicon wafer, the shading area of ​​the transmission component on the silicon wafer surface is greatly reduced, allowing more areas of the silicon wafer to directly contact the reaction liquid in the texturing tank, avoiding incomplete reaction due to local shading; the spaced support balls can also reduce the phenomenon of roller marks on the silicon wafer surface, ensuring that the texturing conditions of each area of ​​the silicon wafer surface are consistent and improving the overall morphology uniformity.

[0020] The mixing component ensures a stable and uniform reaction environment: It avoids uneven concentration and temperature of the reaction solution in the texturing tank, ensuring that the reaction solution conditions are consistent at every point of contact with the silicon wafer during transport; in addition, the support ball point contact reduces shading, allowing the silicon wafer to complete texturing under conditions of uniform reaction solution and full contact, further ensuring the consistency of the texturing surface morphology.

[0021] According to one embodiment of the present invention, the surface of the support ball 22 is provided with a plurality of grooves 221.

[0022] Promotes the flow of the reaction solution in the contact area and avoids uneven local reaction: The reaction solution in the texturing tank can circulate through the grooves on the surface of the support ball and near the contact point of the silicon wafer, replenishing fresh reaction solution in time and carrying away reaction products; at the same time, the grooves can also carry the reaction solution to react with the silicon wafer.

[0023] To help improve the stability of silicon wafer transport and indirectly ensure the uniformity of texturing: the groove can increase the friction coefficient of the support ball surface. When the support ball contacts the silicon wafer for transport, the groove can enhance the friction between the two and reduce the slight sliding or displacement of the silicon wafer caused by vibration and reaction liquid impact during the transport process.

[0024] According to one embodiment of the present invention, the support balls 22 of two adjacent transmission roller units 2 are staggered.

[0025] To avoid fixed, obstructed areas on the silicon wafer surface and ensure sufficient contact with the reaction solution: If the support balls are not misaligned, the support balls of adjacent transport roller units may form overlapping obstruction points on the silicon wafer transport path, significantly reducing the contact time and area between this area and the reaction solution, easily leading to localized, shallow texturing. However, with misaligned support balls, the contact points of the support balls on adjacent rollers are staggered, eliminating fixed, long-term obstructed areas on the silicon wafer surface. Each area can be alternately exposed to the reaction solution, fully participating in the chemical etching reaction and reducing uneven texturing caused by obstruction.

[0026] According to one embodiment of the present invention, the transmission assembly includes an upper conveying assembly and a lower conveying assembly for sandwiching and transmitting silicon wafers therein. Both the upper conveying assembly and the lower conveying assembly include a plurality of the transmission roller units 2, which are arranged to rotate synchronously.

[0027] To achieve stable clamping and transport of silicon wafers and avoid deviation affecting texturing: The upper and lower conveying components clamp the silicon wafers and form stable constraints from the upper and lower sides of the wafers. This counteracts the impact force caused by the flow of reaction liquid in the texturing tank and the rotation of the conveying rollers, preventing the silicon wafers from shifting left and right, warping up and down, or floating during transport, and ensuring that the silicon wafers always move forward at a constant speed along a fixed trajectory.

[0028] According to one embodiment of the present invention, a synchronous gear 23 is fixedly provided at the end of the transmission roller unit 2, and a synchronous belt 31 for fitting all the synchronous gears 23 therein is also included, and the output shaft of the servo motor 3 is connected to the transmission roller unit 2.

[0029] To ensure all transfer roller units rotate synchronously and prevent silicon wafer transfer deviation, the coordination of synchronous gears and synchronous belts ensures that the power of the servo motor is evenly transmitted to all transfer roller units. Whether it's the upper or lower conveyor assembly, the transfer rollers rotate at the same speed, preventing some rollers from rotating faster than others. This synchronization prevents the silicon wafer from being pulled or slipping during transfer, ensuring that the wafer moves smoothly along a fixed trajectory.

[0030] According to one embodiment of the present invention, the outer wall of the flocking groove 1 is fixedly provided with a mounting base 11 for mounting the servo motor 3.

[0031] According to one embodiment of the present invention, the mixing component includes a liquid pump 4 and a liquid return pipe 5. The liquid return pipe 5 draws out the reaction liquid in the texturing tank 1 through the liquid pump 4 and returns it to the texturing tank 1 for mixing.

[0032] To avoid uneven concentration and temperature in the reaction solution and ensure uniform texturing conditions across all areas of the silicon wafer: During texturing, the chemical corrosion reaction between the silicon wafer and the reaction solution consumes the effective components in the local reaction solution, potentially releasing heat. If the reaction solution remains stagnant, uneven phenomena will occur within the texturing tank, such as localized decreases in the concentration of effective components and localized increases in temperature. A pump can extract the reaction solution from the texturing tank and return it to the tank through a return pipe, creating a circulating flow. This ensures thorough mixing of the reaction solution in different locations within the tank, balancing the concentration and temperature in each area.

[0033] Timely removal of reaction products ensures continuous and efficient reaction: The silicon wafer texturing reaction produces corrosion products. If these products accumulate on the silicon wafer surface or at the bottom of the texturing tank, they will hinder the contact between fresh reaction solution and the silicon wafer surface, leading to localized reaction stagnation or decreased efficiency. The extraction and reflux circulation of the liquid pump can actively remove the reaction products adhering to the silicon wafer surface and the impurities deposited at the bottom of the tank, while continuously delivering fresh reaction solution to the periphery of the silicon wafer, further improving the uniformity and integrity of the textured surface.

[0034] According to one embodiment of the present invention, the return pipe 5 includes a lower main pipe 51 and a plurality of lower branch pipes 52 communicating with the lower main pipe 51. The lower branch pipes 52 are sealed and pass through the side wall of the fabrication tank 1, and the lower branch pipes 52 are provided with a plurality of lower outlets 521.

[0035] To achieve uniform distribution of the reaction solution in the lower part of the texturing tank and avoid uneven concentration and level in certain areas, the design of the lower main pipe connecting to several lower branch pipes allows the reaction solution drawn by the pump to be distributed to multiple lower branch pipes, and then synchronously returned to the texturing tank through several lower outlets on the lower branch pipes. This allows the returned reaction solution to be evenly injected from different positions on the side wall of the texturing tank. The lower part of the texturing tank is the core area for silicon wafer transport; the uniform distribution of the reaction solution here ensures that the lower surface of the silicon wafer is in full and consistent contact with the reaction solution.

[0036] According to one embodiment of the present invention, the return pipe 5 includes an upper main pipe 53 and a plurality of upper branch pipes 54 communicating with the upper main pipe 53. The upper branch pipes 54 are sealed and pass through the side wall of the fabrication tank 1, and the upper branch pipes 54 are provided with a plurality of upper outlets 541. The upper main pipe 53 is connected to the lower main pipe 51.

[0037] Achieving dual-path reflux, covering the entire texturing tank, and avoiding reaction liquid stratification and uneven distribution: The design of the upper and lower main pipes being connected allows the reaction liquid drawn by the pump to be simultaneously distributed to the lower and upper branch pipes, avoiding the problems of slow flow, concentration, and temperature stratification of the upper reaction liquid caused by traditional single-path reflux. The upper outlets of the upper branch pipe can evenly inject the reaction liquid from the upper side wall of the texturing tank. Together with the lower outlet of the lower branch pipe, the reaction liquid can form vertical convection and full-area mixing in the tank, ensuring that the composition and temperature of the reaction liquid in the upper and lower areas of the silicon wafer transport path are completely consistent, and ensuring that the texture of the upper and lower surfaces is uniform.

[0038] The design of multiple upper outlets on the upper branch pipe allows the refluxed reaction liquid to be evenly distributed to different positions on the upper part of the tank, avoiding local accumulation caused by the reaction liquid being injected from only a single outlet, and further ensuring the uniformity of the reaction liquid in the upper part.

[0039] The above description is only a preferred embodiment of the present utility model. It should be noted that for those skilled in the art, several improvements and modifications can be made without departing from the technical principles of the present utility model, and these improvements and modifications should also be considered within the protection scope of the present utility model.

Claims

1. A battery textured surface forming device, characterized in that, The system includes a texturing tank (1), which is equipped with a transfer component for transferring silicon wafers and a mixing component for mixing the reaction liquid. The transfer component includes several transfer roller units (2). Each transfer roller unit (2) includes a roller body (21) rotatably connected to the texturing tank (1) and a support ball (22) fixedly disposed on the roller body (21). The center of the support ball (22) coincides with the axis of the roller body (21), and several support balls (22) are spaced apart along the axis of the roller body (21).

2. The battery textured surface forming apparatus according to claim 1, characterized in that, The surface of the support ball (22) is provided with several grooves (221).

3. The battery textured surface forming apparatus according to claim 1, characterized in that, The support balls (22) of two adjacent transmission roller units (2) are staggered.

4. The battery textured surface forming apparatus according to claim 1, characterized in that, The transmission assembly includes an upper conveying assembly and a lower conveying assembly for sandwiching and transmitting silicon wafers. Both the upper and lower conveying assemblies include a plurality of the transmission roller units (2), which are arranged to rotate synchronously.

5. The battery textured surface forming apparatus according to claim 4, characterized in that, The end of the transmission roller unit (2) is fixedly provided with a synchronous gear (23), and also includes a synchronous belt (31) for fitting all the synchronous gears (23) therein. The output shaft of the servo motor (3) is connected to the transmission roller unit (2).

6. The battery textured surface forming apparatus according to claim 5, characterized in that, The outer wall of the flocking trough (1) is fixedly provided with a mounting base (11) for mounting the servo motor (3).

7. The battery textured surface forming apparatus according to claim 1, characterized in that, The mixing assembly includes a liquid pump (4) and a return pipe (5). The return pipe (5) uses the liquid pump (4) to extract the reaction liquid from the texturing tank (1) and return it to the texturing tank (1) for mixing.

8. The battery textured surface forming apparatus according to claim 7, characterized in that, The return pipe (5) includes a lower main pipe (51) and several lower branch pipes (52) communicating with the lower main pipe (51). The lower branch pipes (52) are sealed and pass through the side wall of the fabrication tank (1). The lower branch pipes (52) are provided with several lower outlets (521).

9. The battery textured surface forming apparatus according to claim 8, characterized in that, The return pipe (5) includes an upper main pipe (53) and several upper branch pipes (54) communicating with the upper main pipe (53). The upper branch pipes (54) are sealed and pass through the side wall of the fabrication tank (1). The upper branch pipes (54) are provided with several upper outlets (541). The upper main pipe (53) is connected to the lower main pipe (51).