A water step conveyor
Patent Information
- Application Number
- CN202522453055.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-11-19
- Publication Date
- 2026-10-27
- Estimated Expiration
- 2035-11-19
AI Technical Summary
[0004]为了解决现有技术中硅片清洗时仅采用机械手转移片盒,难以保证片盒的精确输送,导致不同片盒内的硅片清洗效果不同的技术问题,本实用新型提供了一种水中步进输送装置来解决上述问题
(1)本实用新型所述的水中步进输送装置采用支撑板支撑片盒,并通过支撑板上的限位结构使片盒每次移动后停留的位置确定,机械手则通过抬升和步进的方式使片盒在支撑板的相邻限位结构之间运动,从而保证每个硅片清洗效果一致;且当硅片清洗时,片盒可以由支撑板的限位结构限制移动,机械手可以关闭,从而减少机械手中气缸疲劳损耗。
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Figure CN224910072U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of silicon material cleaning technology, and in particular to an underwater stepping conveyor device. Background Technology
[0002] During the fabrication of solar cells, the cells need to pass through various process tanks, including chemical tanks, water tanks, and drying tanks. In tank-type cleaning equipment, cell boxes are used to hold the cells for easy cleaning and transfer.
[0003] Existing technologies only use robotic arms to transfer wafer cassettes (such as patent number CN117960679A). The transfer distance can only be controlled by the stroke of the cylinder. Since silicon wafers are moved and cleaned in the cleaning tank, different positions of the wafer cassettes will result in different cleaning effects. Relying solely on robotic arms makes it difficult to ensure accurate delivery of wafer cassettes, meaning it is difficult to ensure that each wafer cassette moves in the cleaning tank at the same pace. This will result in different cleaning effects for silicon wafers in different wafer cassettes, affecting the consistency of silicon wafer production. Furthermore, relying solely on the braking force of the cylinder in the robotic arm during silicon wafer cleaning can easily cause cylinder fatigue and wear, reducing the cylinder's service life. Utility Model Content
[0004] To address the technical problem in existing silicon wafer cleaning technologies where only robotic arms are used to transfer wafer cassettes, making it difficult to ensure accurate delivery of the cassettes and resulting in inconsistent cleaning effects for silicon wafers in different cassettes, this invention provides an underwater stepping conveyor device to solve the aforementioned problem.
[0005] The technical solution adopted by this utility model to solve its technical problem is: an underwater stepping conveying device, including a wafer cassette, a support plate, and a robotic arm. The wafer cassette is used to hold multiple silicon wafers; the support plate is fixed in a cleaning tank, and the support plate is adapted to support the wafer cassette. Multiple limiting structures that cooperate with the wafer cassette are arranged at equal intervals along the moving direction of the wafer cassette on the support plate; the robotic arm is adapted to lift the wafer cassette that cooperates with one of the limiting structures and then step it to move it above the next limiting structure; the limiting structure can inhibit the movement of the wafer cassette along the stepping direction.
[0006] In an optional embodiment of this utility model, two support plates are symmetrically arranged, the limiting structure is a groove set on the top of the support plate, and the two sides of the sheet box have limiting rods that fit into the groove.
[0007] In an optional embodiment of this utility model, the groove includes an arcuate portion located at the bottom of the groove and a sloping surface extending outward from both ends of the arcuate portion toward the top surface of the support plate, and the limiting rod can be inserted into the arcuate portion.
[0008] In an optional embodiment of this utility model, the robotic arm includes a translation mechanism, a lifting mechanism, and a stepping frame. The translation mechanism is mounted on the lifting mechanism, and the stepping frame is mounted on the translation mechanism. The stepping frame is adapted to lift the film box and drive the film box to move step by step.
[0009] In an optional embodiment of this utility model, the top of the stepping frame has several limiting grooves, and the bottom of the film box has at least two support rods. When the stepping frame lifts the film box, the support rods are locked in the limiting grooves.
[0010] In an optional embodiment of this utility model, the lifting mechanism includes a lifting drive, a lifting rod, a tripod, and several crossbeams. The lifting drive drives the lifting rod to perform lifting movements. The tripod is fixed to the lifting rod. The crossbeams are arranged and installed on the tripod along the stepping direction of the film box. The stepping frame spans over the crossbeams and rolls in contact with the crossbeams.
[0011] In an optional embodiment of this utility model, a limiting sleeve is rotatably connected to the crossbeam, and the stepping frame is located inside the limiting sleeve.
[0012] In an optional embodiment of this utility model, multiple stepping frames are arranged between two support plates, and the multiple stepping frames are fixedly connected by connecting rods.
[0013] In an optional embodiment of this utility model, the translation mechanism includes a horizontal power output component and a connecting frame. The horizontal power output component is located outside the cleaning tank, and the connecting frame includes a horizontal section connected to the horizontal power output component and a vertical section extending to the stepping frame.
[0014] In an optional embodiment of this utility model, the translation mechanism further includes a linear guide rail and a linear slider. The linear guide rail is fixedly arranged and parallel to the horizontal power output component, and is located between the cleaning tank and the horizontal power output component. The linear slider is slidably engaged with the linear guide rail, and has baffles on both sides of the horizontal section.
[0015] The beneficial effects of this utility model are: (1) The underwater stepping conveying device described in this utility model uses a support plate to support the wafer box, and the position of the wafer box after each movement is determined by the limiting structure on the support plate. The robot arm moves the wafer box between adjacent limiting structures on the support plate by lifting and stepping, thereby ensuring that the cleaning effect of each silicon wafer is consistent. When the silicon wafer is being cleaned, the wafer box can be restricted from moving by the limiting structure of the support plate, and the robot arm can be turned off, thereby reducing the fatigue wear of the cylinder in the robot arm.
[0016] (2) The robotic arm in this utility model drives the tablet box to move through the stepping frame, which can drive multiple tablet boxes to move at the same time, thereby improving the cleaning efficiency.
[0017] Other features and advantages of this invention will be set forth in the description which follows, and will be apparent in part from the description, or may be learned by practicing the invention. The objectives and other advantages of this invention are realized and obtained through the structures particularly pointed out in the description, claims, and drawings.
[0018] To make the above-mentioned objectives, features and advantages of this utility model more apparent and understandable, preferred embodiments are described below in detail with reference to the accompanying drawings. Attached Figure Description
[0019] The present invention will be further described below with reference to the accompanying drawings and embodiments.
[0020] Figure 1 This is a schematic diagram of the underwater stepping conveyor device described in this utility model in a cleaning tank; Figure 2 yes Figure 1 Enlarged view of point a in the middle; Figure 3 This is a perspective view of the underwater stepping conveyor device described in this utility model; Figure 4 yes Figure 2 Enlarged view at point b in the middle; Figure 5 yes Figure 2 Enlarged view at point c; Figure 6 yes Figure 2 Enlarged view at point d; Figure 7 This is a side view of the underwater stepping conveyor device described in this utility model; Figure 8 This is an assembly diagram of the translation mechanism and the stepping frame in this utility model.
[0021] In the diagram, 1. Wafer box, 2. Support plate, 3. Silicon wafer, 4. Cleaning tank, 5. Groove, 501. Arc section, 502. Sloping surface, 6. Limiting rod, 7. Translation mechanism, 701. Horizontal power output component, 702. Connecting frame, 7021. Horizontal section, 7022. Vertical section, 703. Linear guide rail, 704. Linear slider, 705. Baffle, 8. Lifting mechanism, 801. Lifting drive component, 802. Lifting rod, 803. Tripod, 804. Crossbeam, 9. Stepping frame, 10. Limiting groove, 11. Support rod, 12. Limiting sleeve, 13. Connecting rod, 14. Movable window. Detailed Implementation
[0022] The embodiments of this utility model are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this utility model, and should not be construed as limiting this utility model.
[0023] Example 1, as Figures 1-3 As shown, an underwater stepping conveying device includes a wafer cassette 1, a support plate 2, and a robotic arm. The wafer cassette 1 is used to hold multiple silicon wafers 3. The support plate 2 is fixed in a cleaning tank 4 and is adapted to support the wafer cassette 1. Multiple limiting structures that cooperate with the wafer cassette 1 are evenly spaced on the support plate 2 along the moving direction of the wafer cassette 1. The limiting structures can inhibit the movement of the wafer cassette 1 along the stepping direction. The robotic arm is adapted to lift the wafer cassette 1 that cooperates with one of the limiting structures and then step it to move it above the next limiting structure.
[0024] Compared to existing technologies, this invention does not rely on a robotic arm for support when the silicon wafer 3 is in the cleaning state. Instead, it relies on a fixed support plate 2. The robotic arm is only used to move the wafer cassette 1. When the silicon wafer 3 is placed on the support plate 2, the robotic arm can be turned off and does not need to be continuously turned on, thereby reducing fatigue wear on the cylinders in the robotic arm. At the same time, the limiting structure on the support plate 2 can limit the stopping position of the wafer cassette 1. The limiting structure is arranged at equal intervals, so that the wafer cassette 1 moves forward in a regular manner and ensures the consistency of the movement trajectory of each wafer cassette 1.
[0025] For ease of description, in this invention, the direction in which the sheet cassette 1 moves stepwise within the cleaning tank 4 is taken as the length direction, and the direction perpendicular to the length direction is taken as the width direction. For example... Figure 3 As shown, the wafer cassette 1 has several slots arranged along its width, into which silicon wafers 3 can be inserted.
[0026] Support plate 2: The support plate 2 can be a thick plate with a relatively large width, as long as it can stably support the sheet box 1. In this embodiment, two support plates 2 are symmetrically arranged, located on both sides of the width direction within the cleaning tank 4. The limiting structure is a groove 5 set on the top of the support plate 2, and the two sides of the sheet box 1 have limiting rods 6 that fit into the groove 5.
[0027] robotic arm: The robotic arm includes a translation mechanism 7, a lifting mechanism 8, and a stepping frame 9. The translation mechanism 7 is mounted on the lifting mechanism 8, and the stepping frame 9 is mounted on the translation mechanism 7. The stepping frame 9 is adapted to lift the film cassette 1 and drive the film cassette 1 to move step by step. The lifting mechanism 8 drives the translation mechanism 7, the stepping frame 9, and the film cassette 1 to rise and fall as a whole, and the translation mechanism 7 drives the stepping frame 9 and the film cassette 1 to translate. When it is necessary to move the film cassette 1, the lifting mechanism 8 is used to lift the stepping frame 9 first. After the stepping frame 9 reaches the height of the film cassette 1, it lifts the film cassette 1, causing the limiting rod 6 of the film cassette 1 to leave the groove 5. Then, the translation mechanism 7 drives the stepping frame 9 to step forward one step, so that the limiting rod 6 of the film cassette 1 is directly above the next groove 5. Finally, the lifting mechanism 8 drives the stepping frame 9 to move downward, so that the limiting rod 6 of the film cassette 1 is locked in the groove 5.
[0028] The lifting mechanism 8 may, but is not limited to, adopt the following structure: such as Figure 3 As shown, it includes a lifting drive 801, a lifting rod 802, a tripod 803, and several crossbeams 804. The lifting drive 801 drives the lifting rod 802 to move up and down. The tripod 803 is fixed to the lifting rod 802. The crossbeams 804 are arranged and installed on the tripod 803 along the stepping direction of the film box 1. The stepping frame 9 spans across the crossbeams 804 and rolls in contact with the crossbeams 804.
[0029] The lifting drive component 801 can be a motor or a cylinder, used to output linear reciprocating motion. This can be achieved through a screw and nut or a gear and rack structure. The tripod 803 has a triangular structure and can accommodate multiple crossbeams 804 arranged along its length. Figure 1 As shown, the lifting drive component 801 is located outside the cleaning tank 4, and the tripod 803 is located inside the cleaning tank 4. The rolling contact between the stepper frame 9 and the crossbeam 804 is to ensure that the crossbeam 804 remains stationary when the stepper frame 9 moves horizontally; the stepper frame 9 and the crossbeam 804 only need to perform synchronous lifting movements. To avoid interference from the support plate 2 on the lifting movement of the crossbeam 804, the support plate 2 is preferably provided with an movable window 14 for the vertical movement of the crossbeam 804 (e.g., ...). Figure 7 (As shown).
[0030] like Figure 2 The translation mechanism 7 shown may include, but is not limited to, a horizontal power output component 701 and a connecting frame 702. The connecting frame 702 is connected to the stepper frame 9. The horizontal power output component 701 drives the connecting frame 702 to translate along its length, and the stepper frame 9 translates synchronously with the connecting frame 702. The horizontal power output component 701 is used to output horizontal linear motion and can be driven by a motor or a cylinder, such as... Figure 1 and Figure 2 As shown, the horizontal power output component 701 is located outside the cleaning tank 4, and the connecting frame 702 includes a horizontal section 7021 connected to the horizontal power output component 701 and a vertical section 7022 extending to the stepping frame 9.
[0031] like Figure 4 As shown, the top of the stepper frame 9 has several limiting grooves 10, and the bottom of the disc box 1 has at least two support rods 11. When the stepper frame 9 lifts the disc box 1, the support rods 11 are locked in the limiting grooves 10.
[0032] By first lifting the tablet box 1 in the water (the limiting groove 10 on the stepper frame 9 engages with the support rod 11 of the tablet box 1) and then moving it forward, and then lowering it, the limiting rods 6 on both sides of the tablet box 1 fall into the grooves 5 of the two support plates 2, thereby moving the tablet box 1 forward one step (the distance between the grooves 5). When the next tablet box 1 enters, the above steps are repeated. At this time, the two tablet boxes 1 will move forward one step at the same time, and so on, until the support plate 2 is full of tablet boxes 1.
[0033] In Example 2, based on Example 1, to facilitate the sliding of the limiting rod 6 into the bottom of the groove and achieve precise positioning of the cassette 1, the shape of the groove 5 is further designed in this example, such as... Figure 6 As shown, the groove 5 in this embodiment includes an arc portion 501 located at the bottom of the groove 5 and a sloping surface 502 extending outward from both ends of the arc portion 501 toward the top surface of the support plate 2. The limiting rod 6 can be inserted into the arc portion 501.
[0034] In embodiment three, based on the above embodiments, the rolling contact between the stepper frame 9 and the crossbeam 804 is achieved through a structure: a limiting sleeve 12 is rotatably connected to the crossbeam 804, and the stepper frame 9 is located within the limiting sleeve 12. For example... Figure 5 As shown, the limiting sleeve 12 is fitted on the crossbeam 804, and there are ball bearings between the two to achieve rotational engagement. The limiting sleeve 12 can limit the width of the stepper frame 9, so that the stepper frame 9 can only translate along the length direction.
[0035] In a preferred embodiment, multiple stepping frames 9 are arranged between two support plates 2, and the multiple stepping frames 9 are fixedly connected by connecting rods 13.
[0036] In Example 4, since the connecting frame 702 is the final output end of the robot arm, and the connecting frame 702 extends into the cleaning tank 4 in a cantilever shape, the connecting frame 702 is prone to shaking, resulting in a decrease in the stepping accuracy of the cassette 1. Therefore, as follows... Figure 8 As shown, the translation mechanism 7 in this embodiment also includes a linear guide rail 703 and a linear slider 704. The linear guide rail 703 is fixedly installed and arranged parallel to the horizontal power output component 701, and is located between the cleaning tank 4 and the horizontal power output component 701. The linear slider 704 is slidably engaged with the linear guide rail 703, and has baffles 705 on both sides of the horizontal section 7021. The two baffles 705 assist the connecting frame 702 in translation, so that the horizontal section 7021 can be translated synchronously as a whole, avoiding end swaying.
[0037] In the description of the embodiments of this utility model, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.
[0038] In the description of this utility model, it should be noted that the terms "upper", "lower", "front", "vertical", "horizontal", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limiting the present invention.
[0039] Spatially relative terms, such as “inside,” “outside,” “below,” “above,” etc., may be used herein to describe the relationship between one element or feature and another, as shown in the figures. In addition to the orientations depicted in the figures, spatially relative terms may be intended to cover different orientations of the device in use or operation. For example, if the device in the figure is flipped, an element described as “below” or “under” other elements or features would be oriented as “above” other elements or features. Thus, the example term “below” can cover both above and below orientations. The device may be oriented in other ways (rotated 90 degrees or in other orientations), and the spatially relative descriptors used herein are interpreted accordingly.
[0040] Based on the above-described preferred embodiments of this utility model, and through the foregoing description, those skilled in the art can make various changes and modifications without departing from the technical concept of this utility model. The technical scope of this utility model is not limited to the contents of the specification, but must be determined according to the scope of the claims.
Claims
1. A water-based stepping conveyor device, characterized in that, include: A wafer cassette is used to hold multiple silicon wafers. A support plate is fixed inside the cleaning tank. The support plate is suitable for supporting the tablet box, and multiple limiting structures that cooperate with the tablet box are provided at equal intervals along the moving direction of the tablet box on the support plate. A robotic arm, the robotic arm being adapted to lift a cassette that engages with one of the limiting structures and then move it stepwise above the next limiting structure; The limiting structure can suppress the movement of the tablet cartridge along the stepping direction.
2. The underwater stepping conveyor device according to claim 1, characterized in that: Two support plates are symmetrically arranged. The limiting structure is a groove set on the top of the support plate. The two sides of the cassette have limiting rods that fit into the groove.
3. The underwater stepping conveyor device according to claim 2, characterized in that: The groove includes an arcuate portion at the bottom of the groove and a sloping surface extending outward from both ends of the arcuate portion toward the top surface of the support plate. The limiting rod can be inserted into the arcuate portion.
4. The underwater stepping conveyor device according to claim 2, characterized in that: The robotic arm includes a translation mechanism, a lifting mechanism, and a stepping frame. The translation mechanism is mounted on the lifting mechanism, and the stepping frame is mounted on the translation mechanism. The stepping frame is adapted to lift the film box and drive the film box to move step by step.
5. The underwater stepping conveyor device according to claim 4, characterized in that: The top of the stepper frame has several limiting grooves, and the bottom of the film box has at least two support rods. When the stepper frame lifts the film box, the support rods are locked in the limiting grooves.
6. The underwater stepping conveyor device according to claim 4, characterized in that: The lifting mechanism includes a lifting drive, a lifting rod, a tripod, and several crossbeams. The lifting drive drives the lifting rod to move up and down. The tripod is fixed to the lifting rod. The crossbeams are arranged and installed on the tripod along the stepping direction of the film box. The stepping frame spans over the crossbeams and rolls in contact with the crossbeams.
7. The underwater stepping conveyor device according to claim 6, characterized in that: A limiting sleeve is rotatably connected to the crossbeam, and the stepping frame is located inside the limiting sleeve.
8. The underwater stepping conveyor device according to claim 7, characterized in that: Multiple stepping frames are arranged between two support plates, and the multiple stepping frames are fixedly connected by connecting rods.
9. The underwater stepping conveyor device according to claim 4, characterized in that: The translation mechanism includes a horizontal power output component and a connecting frame. The horizontal power output component is located outside the cleaning tank, and the connecting frame includes a horizontal section connected to the horizontal power output component and a vertical section extending to the stepping frame.
10. The underwater stepping conveyor according to claim 9, characterized in that: The translation mechanism also includes a linear guide rail and a linear slider. The linear guide rail is fixedly installed and arranged parallel to the horizontal power output component. The linear guide rail is located between the cleaning tank and the horizontal power output component. The linear slider is slidably engaged with the linear guide rail and has baffles on both sides of the horizontal section.
Citation Information
Patent Citations
Silicon wafer cleaning equipment
CN117960679A