A V-neck dress collar structure

Abstract

A V-neck dress collar structure, the collar structure is designed according to the difference of the main fabric characteristics, including: when adopting chiffon main body, the collar structure contains elastic structure along the V-neck chiffon collar contour line segment; when adopting acetate or silk main body, the collar structure contains lining layer, collar and sewing structure, the acetate or silk lining layer is arranged inside the main body, the acetate or silk front collar and the acetate or silk back collar, the collar is cut from the inside line of the acetate or silk lining layer collar opening 1-2 cm, the acetate or silk front collar is treated by extension tool and the total amount of 0.3-0.5 cm is collected at the eating tendency line segment, the acetate or silk back collar is provided with adhesive lining, the collar level is-1 and the simulated thickness is 0-0.3 mm, the sewing structure is divided into three sections based on the alignment point, the first and third sections are 1:1 sewing, the second section is allocated 0.3-0.5 cm eating tendency and the sewing line segment is provided with a joint type.

Description

Technical Field

[0001] This utility model belongs to the field of clothing design and manufacturing technology, specifically relating to a V-neck dress collar structure. Background Technology

[0002] With the continuous development of the apparel industry, consumers have placed higher demands on the style, fit, and wearing experience of clothing. As a classic and popular style, the V-neck dress's neckline design directly affects its overall aesthetics and wearing effect. However, during the production of V-neck dresses, the significant differences in the characteristics of the fabrics used, such as elasticity, drape, and crispness, can easily lead to various problems with the V-neck design, posing numerous challenges to production and quality control.

[0003] Chiffon fabric is lightweight and has poor elasticity. In the production of V-neck dresses, traditional neckline designs do not take into account the fabric's lack of elasticity. Furthermore, the concealed seam stitching process is often omitted during the simulated garment making process. This can lead to excessive stretching of the neckline in the finished V-neck dress, increasing the distance between the shoulder line and the neckline opening. This results in a significant deviation from the design dimensions, affecting the overall shape and aesthetics of the V-neck dress, and also reducing its fit.

[0004] Acetate and silk fabrics are soft and drape well, but have relatively low strength. V-neck dresses made from these fabrics typically use an inner wrapping technique to ensure the stability and aesthetics of the neckline. However, current technology lacks targeted structural optimization in neckline design, failing to incorporate neckline structures that meet actual manufacturing requirements. Furthermore, the layers, thickness, and sewing methods of the neckline are not properly designed, resulting in significant discrepancies between the simulated neckline and the actual garment. The neckline is prone to stretching and deformation, and the fit is poor, failing to meet consumers' demands for high-quality clothing.

[0005] Cotton fabric has a certain degree of crispness, but its elasticity and drape are relatively average. In the production of V-neck dresses, traditional neckline designs are prone to the neckline bunching up. Current technology lacks effective structural improvement solutions for cotton V-necks, failing to address the bunching issue through proper neckline design, sewing process adjustments, and parameter settings. This results in V-neck dresses with an uneven neckline, affecting both aesthetics and comfort, while also increasing rework rates and costs for manufacturers.

[0006] Furthermore, existing technologies lack solutions for differentiated collar structure design based on the characteristics of different fabrics. They often employ a uniform collar structure and parameter settings to handle various fabrics, failing to adequately adapt to the characteristics of different fabrics. This leads to frequent collar problems in V-neck dresses, making it difficult to meet the needs of actual production and consumers. Therefore, developing a V-neck dress collar optimization structure that can be specifically designed according to the characteristics of different fabrics and effectively solve problems such as neckline stretching deformation and collar gaping has become a crucial issue that urgently needs to be addressed in the current apparel industry. Utility Model Content

[0007] This utility model aims to overcome the shortcomings of the prior art and provide a V-neck dress collar structure to solve the technical problems in the prior art, such as the easy overstretching of the neckline of chiffon V-neck dresses, the distortion of the neckline simulation and neckline stretching deformation of acetate and silk V-neck dresses, the gaping of the collar of cotton V-neck dresses, and the lack of differentiated collar structure design for different fabric characteristics, thereby improving the pattern quality and wearing experience of V-neck dresses.

[0008] To achieve the above objectives, this utility model provides a V-neck dress neckline structure, including the main body of the V-neck dress and a neckline structure disposed at the neckline of the main body. The neckline structure is designed differently according to the characteristics of the main body fabric, including: When a chiffon fabric body is used, the neckline structure includes an elastic structure set along the outline of the V-neck chiffon fabric neckline. When using acetate or silk fabric for the body, the collar structure includes a lining layer, a collar patch, and a first sewing structure. The acetate or silk lining layer is located on the inside of the body. The collar patch includes an acetate or silk front collar patch and an acetate or silk back collar patch. The collar patch is made by cutting the inner thread of the acetate or silk lining layer at the neckline by 1-2cm. The acetate or silk front collar patch is treated with an extension tool and has a total weight reduction of 0.3-0.5cm at the ease line segment. The acetate or silk back collar patch is provided with an interfacing. The layer of the acetate or silk front collar patch and the acetate or silk back collar patch is -1 and the simulated thickness is 0-0.3mm. The first sewing structure is sewn in 3 sections based on the alignment point. The first section of sewing thread and the third section of sewing thread are sewn in a 1:1 ratio. The second section of sewing thread is allocated 0.3-0.5cm ease and the sewing thread segment is elastically joined. When using a 100% cotton fabric for the body, the collar structure includes a 100% cotton lining, a 100% cotton front collar patch, and a second sewing structure. The 100% cotton lining is disconnected from the front piece of the body. The collar patch is cut from the 1-2cm inner thread of the 100% cotton lining at the neckline. The 100% cotton front collar patch is treated and reduced by 0.3-0.5cm in the ease allowance. The collar patch also includes a cloned 100% cotton front collar patch. The 100% cotton front collar patch and the cloned 100% cotton front collar patch have a layer of -1 and a simulated thickness of 0-0.3mm. The second sewing structure is sewn in three sections based on the alignment point. The first and third sections are sewn in a 1:1 ratio, and the second section has an ease allowance of 0.3-0.5cm and is a rigid seam. Furthermore, when the body uses chiffon fabric, the elastic structure is made of spandex fiber and is sewn to the body along the neckline outline. Furthermore, when using acetate or silk fabric for the body, the distance between the inner line of the collar patch and the edge of the lining collar is 1.2cm, the ease of the acetate or silk front collar patch is 0.4cm, the simulated thickness of the collar patch is 0.2mm, and the elastic strength of the elastic seam is 0.1. Furthermore, when using acetate or silk fabric for the body, the distance between the inner line of the collar patch and the edge of the collar of the acetate or silk lining is 1cm, the ease of the front collar patch of acetate or silk is 0.3cm, the simulated thickness of the collar patch is 0.1mm, and the elastic strength of the elastic seam is 0.08. Furthermore, when using cotton fabric for the body, the distance between the inner line of the collar patch and the edge of the collar of the cotton lining layer is 1.5cm, the ease of the front collar patch of the all-cotton fabric is 0.5cm, and the simulated thickness of the collar patch is 0.3mm. Furthermore, when using a full-cotton fabric body, the collar patch is pre-shrinked in 30℃ warm water, and the inner side of the collar patch is provided with invisible reinforcing threads of full-cotton material distributed along the edge at 0.2cm. The sewing structure uses full-cotton thread with a diameter 20% thicker than the sewing thread of cotton fabric, and the stitch length is 8 stitches / inch. Furthermore, the collar patch material is consistent with the body fabric. When the body is made of acetate fabric, the acetate or silk back collar patch interfacing is an acetate-specific interfacing; when the body is made of silk fabric, the acetate or silk back collar patch interfacing is a lightweight silk-specific interfacing. Furthermore, when using acetate or silk fabric for the body, a 0.5cm gap is provided between the acetate or silk lining layer and the body, the acetate or silk back collar patch covers 80% of the total area of ​​the back collar patch, and the edge of the patch is 0.3cm away from the edge of the acetate or silk back collar patch. Furthermore, when using a 100% cotton fabric body, the symmetry error between the cloned collar patch and the original collar patch is ≤0.02cm.

[0009] This utility model presents an optimized V-neck dress collar structure suitable for different fabrics. By designing a differentiated collar structure according to the characteristics of different fabrics, it has the following significant advantages: Targeting the characteristics of chiffon fabric, a 100% elastic structure is incorporated into the neckline outline. This effectively compensates for the neckline stretching issue caused by the omission of the concealed seam stitching process in the 3D simulation. This significantly reduces the stretching of the neckline of the chiffon V-neck dress, optimizing the distance from the shoulder line neckline to the neck opening from 4.12cm in the existing technology to 3.6cm, close to the actual sample's 3.5cm. This significantly improves the accuracy and fit of the chiffon V-neck dress neckline, enhancing the overall silhouette.

[0010] For acetate and silk fabrics, the inner wrapping process was accurately reproduced by setting a lining layer, a collar patch that meets the actual process requirements, and a reasonable sewing structure. The design of the collar patch's layers, thickness, and segmented sewing method effectively solved the problems of neckline stretching deformation and collar shape simulation distortion in V-neck dresses made of these fabrics. The distance from the shoulder line neckline to the neck opening was optimized from 4.85cm in the existing technology to 3.55cm, which greatly improved the fit and stability of the collar shape, and enhanced the quality and aesthetics of V-neck dresses made of acetate and silk fabrics.

[0011] For all-cotton fabrics, the problem of gaps in the collar of V-neck dresses was successfully solved by optimizing the collar patch design, generating collar patches by cloning symmetrical patterns, and setting reasonable sewing structures and parameters. This made the collar fit better and ensured that key dimensions such as the horizontal opening, vertical opening, and waistline of the collar met the design requirements. This avoided the problem of reduced aesthetics and comfort caused by gaps in the collar and reduced the production rework rate for enterprises. Attached Figure Description

[0012] Figure 1 This is a schematic diagram of the chiffon fabric in this utility model (showing the V-neck collar).

[0013] Figure 2 This is a schematic diagram of the chiffon fabric in this utility model (showing the elastic structure).

[0014] Figure 3 This is a schematic diagram of the acetate or silk fabric used in this utility model (showing the acetate / silk front collar patch).

[0015] Figure 4 This is a schematic diagram of the acetate or silk fabric used in this utility model (showing the acetate / silk back collar patch).

[0016] Figure 5 A schematic diagram of the adhesive liner in this utility model.

[0017] Figure 6This utility model provides a schematic diagram of the sewing process for various structures of acetate or silk fabrics.

[0018] Figure 7 One of the schematic diagrams of the all-cotton fabric in this utility model.

[0019] Figure 8 The second schematic diagram of the all-cotton fabric in this utility model. Detailed Implementation

[0020] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of the present utility model, such as... Figure 1-6 As shown: Example 1: Optimized collar structure of a V-neck dress made of chiffon fabric This embodiment provides an optimized collar structure for a chiffon V-neck dress. The structure includes the main body of the chiffon V-neck dress and a collar structure set at the neckline of the main body. The collar structure includes an elastic structure 2 set at the outline of the V-neck collar 1.

[0021] During the manufacturing process, the outline shape and size of the neckline 1 are first determined based on the design dimensions of the chiffon V-neck dress. Then, an elastic structure 2 is set along the outline of the neckline 1, with an elasticity ratio of 100%. The elastic structure 2 is used to compensate for neckline stretching issues during the manufacturing process of the chiffon V-neck dress.

[0022] Through the above structural design, the neckline of the chiffon V-neck dress has been optimized, effectively reducing the amount of stretch at the neckline. Before optimization, the distance from the shoulder line neckline to the neck opening of the chiffon V-neck dress was 4.12cm. After optimization, the distance is shortened to 3.6cm, close to the 3.5cm size of the actual design. This significantly improves the accuracy and fit of the chiffon V-neck dress neckline, making the neckline more beautiful and the wearer more comfortable.

[0023] In this embodiment, the elastic structure 2 can be made of a highly elastic fiber material, such as spandex fiber, and is sewn to the chiffon fabric body along the outline of the neckline 1 to ensure that the elastic structure 2 fits tightly with the neckline 1, fully exerts its elastic compensation function, and effectively suppresses the stretching deformation of the neckline.

[0024] Example 2: Optimized collar structure of a V-neck dress made of acetate / silk fabric This embodiment provides an optimized collar structure for an acetate / silk V-neck dress. The structure includes the main body 3 of the acetate / silk V-neck dress and a collar structure set at the neckline of the main body. The collar structure includes an acetate / silk lining layer 4, collar patches (including an acetate / silk front collar patch 5 and an acetate / silk back collar patch 6), and a sewing structure.

[0025] The specific manufacturing and assembly process is as follows: Based on the shape and size of the front and back panels of the acetate / silk V-neck dress body 3, a corresponding acetate / silk lining layer 4 is made. The acetate / silk lining layer 4 is placed on the inside of the body 3, and the linkage between the acetate / silk lining layer 4 and the body 3 is removed to ensure that the acetate / silk lining layer 4 can be independently used for subsequent neck patch making and processing.

[0026] First, an inner line conforming to the actual size of the collar patch is generated at the neckline of the acetate / silk lining layer 4. The distance between this inner line and the edge of the neckline of the acetate / silk lining layer 4 is set to 1.2cm. This distance is determined based on the characteristics of the acetate fabric and the actual inner wrapping process requirements, which can ensure the stability and aesthetics of the collar patch.

[0027] Then, the acetate / silk lining layer 4 is cut according to the generated internal lines to produce preliminary acetate / silk front collar patch 5 and acetate / silk back collar patch 6 blanks.

[0028] For the acetate / silk front collar patch 5 fabric, a 0.4cm reduction in total weight is applied at the marked ease lines. This ease adjustment compensates for shrinkage of the acetate fabric during sewing, preventing wrinkles or stretching deformation of the collar. Next, the edge curves of the acetate / silk front collar patch 5 are smoothed to make them smoother, more aesthetically pleasing, and meet design requirements.

[0029] For the acetate / silk back collar patch 6 blank, an adhesive backing 7 is provided. The material of the adhesive backing 7 is selected to be compatible with the acetate fabric. The provision of the adhesive backing 7 can enhance the strength and stiffness of the back collar patch 6, prevent the acetate / silk back collar patch 6 from deforming during use, and ensure the stability of the collar shape.

[0030] The layer thickness of both the finished acetate / silk front collar patch 5 and the acetate / silk back collar patch 6 is set to -1. This layer setting ensures a reasonable overlap between the collar patch and the body 3 and the acetate / silk lining layer 4, preventing the collar patch from protruding or sinking and guaranteeing a good fit for the collar. Simultaneously, the thickness of both the acetate / silk front collar patch 5 and the acetate / silk back collar patch 6 is set to 0.2mm. This thickness parameter is determined based on the lightweight characteristics of acetate fabric, ensuring both support for the collar patch and avoiding adding bulk to the neckline, thus guaranteeing wearing comfort.

[0031] The collar patch is connected to the body 3 using a segmented sewing method. First, using the alignment point 8 of the front collar edge as a reference, the sewing process is divided into 3 segments, marked as segment 1 sewing thread 9, segment 2 sewing thread 10, and segment 3 sewing thread 11. Among them, segment 1 sewing thread 9 and segment 3 sewing thread 11 use a 1:1 sewing ratio to ensure that the collar patch in these two sewing sections fits tightly to the body 3 without excess wrinkles or gaps; segment 2 sewing thread 10 is allocated with an ease allowance of 0.4cm, which matches the ease allowance when the acetate / silk front collar patch 5 is treated, further compensating for fabric shrinkage and ensuring an overall flat collar shape. Finally, select all the sewing lines of the collar patch and body 3, and in the sewing parameter settings interface, set the seam type to "elastic seam", adjust the elasticity to 0.1, and keep the ratio at 100%. By setting the elastic seam, the sewing part has a certain degree of elasticity, which is suitable for the draping characteristics of acetate fabric and avoids the sewing thread breaking or the collar shape deforming during wear.

[0032] Through the above structural optimization, the stability and accuracy of the neckline of the acetate fabric V-neck dress have been significantly improved. Before optimization, the distance from the shoulder line neckline to the neck opening was 4.85cm, exceeding the actual design size; after optimization, this distance was shortened to 3.55cm, with a deviation from the actual size of only 0.05cm. Moreover, the neckline showed no stretching deformation and the neckline fit well, completely restoring the design effect of the acetate fabric V-neck dress. At the same time, it solved the problem of distortion in the simulation of the inner wrapping process in traditional processes.

[0033] Example 3: Optimized collar structure of a 100% cotton V-neck dress This embodiment provides an optimized collar structure for a cotton V-neck dress. The structure includes a cotton body 12, a collar structure positioned at the neckline of the cotton body 12, and a cotton lining layer 13, collar patches (including a cotton front collar patch 14 and a cloned cotton front collar patch 15), and sewing details. The specific manufacturing and assembly process is as follows: Based on the shape and size of the front piece of the all-cotton fabric body 12, a corresponding lining layer 13 is made (the cotton fabric collar optimization only requires the front lining layer, not the back lining layer, to suit the high stiffness of cotton fabric and the characteristic that the back collar is not easily deformed). The all-cotton fabric lining layer 13 is placed inside the front piece of the all-cotton fabric body 12, and the linkage between the all-cotton fabric lining layer 13 and the front piece of the all-cotton fabric body 12 is removed, so as to ensure that the all-cotton fabric lining layer 13 can be independently made for the collar patch.

[0034] At the neckline of the 13th layer of cotton lining fabric, use the editing pattern tool to create an inner line. Set the distance between the inner line and the edge of the neckline of the 13th layer of cotton lining fabric to 1.5cm, which is wider than that of acetate or silk fabrics. Because cotton fabric has high stiffness, a wider collar patch can enhance the neckline support and prevent the collar from bunching up. Cut the 13th layer of cotton lining fabric along the inner line to obtain the blank of the 14th layer of cotton front collar patch.

[0035] The 14mm cotton front collar patch fabric is processed by reducing the total amount by 0.5cm at the marked ease line. Cotton fabric has a higher shrinkage rate than acetate or silk fabrics, so a larger ease allowance effectively compensates for shrinkage after sewing, preventing the collar from shrinking or deforming. Then, a curve tool is used to smooth the edge curve of the collar patch, ensuring the edge matches the crisp texture of the cotton fabric and avoids excessive rounding that could cause it to sag.

[0036] Using the center line of the cotton front collar patch 14 as the axis of symmetry, generate a cloned cotton front collar patch 15 to ensure that the size and shape of the collar patches on both sides are completely consistent, avoiding the errors when making symmetrical collar patches by hand, ensuring the left and right symmetry of the collar, while reducing production time and improving production efficiency.

[0037] Set the layer of both the cotton front collar patch 14 and the cloned cotton front collar patch 15 to -1 and the thickness to 0.3mm. This thickness is suitable for the crispness of cotton fabric, enhancing the support of the collar patch and preventing the collar from lifting up. During sewing, using the front collar edge alignment point 8 as a reference, divide the sewing process into 3 segments. The first and third segments use a 1:1 sewing ratio, and the second segment is allocated 0.5cm of ease, matching the ease used in the front collar patch processing. Select the sewing line segment between the collar patch and the cotton fabric body 12, and set the seam type to rigid seam (cotton fabric has high crispness, so elastic seams are not needed) to ensure a tight fit and prevent the collar from lifting up due to looseness.

[0038] Before optimization, the collar of the all-cotton V-neck dress had a noticeable gap, with the gap between the collar tip and the body reaching up to 1.2cm, affecting the appearance of the dress. After optimization, the collar gap problem was completely solved, the collar patch fits tightly to the all-cotton body, the gap at the collar tip was reduced to less than 0.1cm, and the dimensions of the horizontal, vertical, and waistline collars are completely consistent with the actual sample, preserving the crisp texture of the cotton fabric.

[0039] This utility model adopts a differentiated structural design scheme, fully considering the characteristics of different fabrics. It provides targeted solutions for optimizing the neckline of V-neck dresses made of chiffon, acetate, silk, and cotton, filling the gap in existing technologies that lack differentiated neckline structural designs for different fabric characteristics. At the same time, it improves the accuracy and efficiency of V-neck dress neckline design, shortens the sample development cycle, reduces the number of physical sample productions, and lowers production costs for enterprises. It has good economic benefits and practical value, and can meet the actual production needs of the garment industry and consumers' demand for high-quality V-neck dresses.

[0040] The solutions generated in the above embodiments can be used in Style3D Studio software. Specific operation buttons are integrated within the software; no new development is required. Implementation can be performed by following the steps disclosed in the above embodiments. Those skilled in the art will understand that the above embodiments focus on 3D software simulation optimization of V-neck dress collars. Considering the differences in characteristics of different fabrics such as chiffon, silk, and cotton, exclusive 3D software simulation parameters can be designed for chiffon, silk, and cotton, breaking the limitations of traditional uniform parameters. Through chiffon, silk, and cotton, the actual processes missing in the 3D software simulation, such as concealed seam stitching and inner binding, are reproduced. The sewing is innovatively divided into 3 segments, with precise allocation of 0.3-0.5cm ease to specific segments to improve collar fit. An algorithm for automatically generating 1-2cm internal lines is developed to quickly generate collar patches that match the actual sample, improving simulation efficiency.

Claims

1. A V-neck dress neckline structure, comprising the main body of the V-neck dress and a neckline structure disposed at the neckline of the main body, characterized in that: The collar structure is designed differently based on the characteristics of the body fabric, including: When a chiffon fabric body is used, the collar structure includes an elastic structure (2) set along the outline of the V-neck chiffon fabric collar (1). When using acetate or silk fabric for the body (3), the collar structure includes a lining layer, a collar patch, and a first sewing structure. The acetate or silk lining layer (4) is located on the inside of the body. The collar patch includes an acetate or silk front collar patch (5) and an acetate or silk back collar patch (6). The collar patch is made by cutting the inner thread of the acetate or silk lining layer (4) at the neckline with 1-2cm of thread. The acetate or silk front collar patch (5) is treated with an extension tool and the total amount is reduced by 0.3-0.5cm at the ease line. The acetate or silk back collar patch (6) is provided with an interfacing (7). The layer of the acetate or silk front collar patch (5) and the acetate or silk back collar patch (6) is -1 and the simulated thickness is 0-0.3mm. The first sewing structure is sewn in 3 sections based on the alignment point. The first section of sewing thread and the third section of sewing thread are sewn in a 1:1 ratio. The sewing thread is distributed with an ease of 0.3-0.5cm, and the sewing thread segment is an elastic seam. When a cotton body (12) is used, the collar structure includes a cotton lining (13), a cotton front collar patch (14), and a second sewing structure. The cotton lining (13) is disconnected from the front piece of the body. The collar patch is made by cutting the inner thread of the cotton lining (13) at the neckline with 1-2cm of thread. The cotton front collar patch (14) is processed and reduced by 0.3-0.5cm in the ease line. The collar patch also includes a cloned cotton front collar patch (15). The cotton front collar patch (14) and the cloned cotton front collar patch (15) are layered as -1 and have a simulated thickness of 0-0.3mm. The second sewing structure is sewn in 3 sections based on the alignment point. The first section of sewing thread and the third section of sewing thread are sewn in a 1:1 ratio. The second section of sewing thread is allocated 0.3-0.5cm. The seam is rigid and the sewing line segment is rigid.

2. The V-neck dress collar structure according to claim 1, characterized in that: When the body is made of chiffon fabric, the elastic structure (2) is made of spandex fiber and is sewn to the body along the outline of the neckline (1).

3. The V-neck dress collar structure according to claim 1, characterized in that: When using acetate or silk fabric for the body (3), the distance between the inner line of the collar patch and the edge of the lining collar is 1.2cm, the ease of the acetate or silk front collar patch (5) is 0.4cm, the simulated thickness of the collar patch is 0.2mm, and the elastic strength of the elastic seam is 0.

1.

4. The V-neck dress collar structure according to claim 1, characterized in that: When using acetate or silk fabric for the body (3), the distance between the inner line of the collar patch and the edge of the collar of the acetate or silk lining layer (4) is 1cm, the ease of the acetate or silk front collar patch (5) is 0.3cm, the simulated thickness of the collar patch is 0.1mm, and the elastic strength of the elastic seam is 0.

08.

5. The V-neck dress collar structure according to claim 1, characterized in that: When the body of the all-cotton fabric (12) is used, the distance between the inner line of the collar patch and the edge of the collar of the cotton lining layer (13) is 1.5cm, the ease of the front collar patch (14) of the all-cotton fabric is 0.5cm, and the simulated thickness of the collar patch is 0.3mm.

6. The V-neck dress collar structure according to claim 1, characterized in that: When the body is made of pure cotton fabric (12), the collar patch is pre-shrinked by 30°C warm water. The inner side of the collar patch is provided with invisible reinforcing lines of pure cotton material distributed along the edge at 0.2cm. The sewing structure uses pure cotton thread with a diameter 20% thicker than the sewing thread of cotton fabric, and the stitch length is 8 stitches / inch.

7. The V-neck dress collar structure according to claim 1, characterized in that: The collar patch material is the same as the body fabric. When the body is made of acetate fabric, the acetate or silk back collar patch lining (7) is an acetate-specific lining; when the body is made of silk fabric, the acetate or silk back collar patch lining (7) is a lightweight silk-specific lining.

8. The V-neck dress collar structure according to claim 1, characterized in that: When using acetate or silk fabric for the body (3), a 0.5cm gap is provided between the acetate or silk lining layer (4) and the body (3), the area covered by the acetate or silk back collar patch (7) is 80% of the total area of ​​the back collar patch (6), and the edge of the patch (7) is 0.3cm away from the edge of the acetate or silk back collar patch (6).

9. The V-neck dress collar structure according to claim 1, characterized in that: When using all-cotton fabric for the body (12), the symmetry error between the cloned collar patch and the original collar patch is ≤0.02cm.

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