Base station and cleaning system

Abstract

The application provides a base station and a cleaning system. The base station is used for cleaning a to-be-cleaned component of a cleaning device. The base station comprises a base station main body and a cleaning mechanism. The cleaning mechanism comprises an adjusting assembly and a cleaning body connected to the adjusting assembly. The adjusting assembly is rotatably arranged on the base station main body. The adjusting assembly is configured to make the cleaning body contact the to-be-cleaned component and clean the to-be-cleaned component when the to-be-cleaned component moves to a target position. The to-be-cleaned component is cleaned by the cleaning body on the base station main body, so that the problem of secondary pollution of the to-be-cleaned surface caused by the to-be-cleaned object adhering to the to-be-cleaned component can be improved.

Description

Technical Field

[0001] This application relates to the field of cleaning equipment technology, specifically to a base station and a cleaning system. Background Technology

[0002] During the cleaning process, the drive wheels, casters, cleaning mops, and other cleaning components of the cleaning equipment will inevitably come into contact with dust, hair, debris, and other cleaning materials scattered on the surface to be cleaned or in the environment. These cleaning materials will continuously accumulate on the cleaning components.

[0003] When the cleaning equipment moves to a cleaned area, the cleaning residue adhering to the components to be cleaned will fall onto the area, causing secondary pollution. Existing base stations lack a mechanism to clean the components to be cleaned. Therefore, how to provide a base station that can clean the components to be cleaned is a technical problem that urgently needs to be solved in this field. Utility Model Content

[0004] In view of the above problems, this application provides a base station and a cleaning system that can clean the parts to be cleaned by the cleaning equipment, thereby improving the problem of secondary pollution of the surface to be cleaned caused by the adhesion of the cleaning material to the parts.

[0005] To solve the above-mentioned technical problems, the technical solution adopted in this application is conceived as follows:

[0006] In a first aspect, this application provides a base station for cleaning at least a component of a cleaning device. The base station includes: a base station body; and a cleaning mechanism including an adjustment component and a cleaning body connected to the adjustment component. The adjustment component is rotatably disposed on the base station body. The adjustment component is configured to contact the cleaning body with the component to be cleaned and clean the component when the component to be cleaned moves to a target position.

[0007] The cleaning mechanism is located at the target position, and the adjustment component is configured to rotate relative to the base station body when the part to be cleaned moves to the target position and comes into contact with the part to be cleaned, thereby driving the cleaning body away from the part to be cleaned, so that the cleaning body and the part to be cleaned are spaced apart.

[0008] The component to be cleaned can be raised and lowered along the height direction via a lifting mechanism; the adjustment component is also configured to reverse when the component to be cleaned is raised, and drive the cleaning body closer to the component to be cleaned, so that the cleaning body contacts the component to be cleaned.

[0009] The adjustment component is also configured to be spaced apart from the part to be cleaned after the part to be cleaned is raised.

[0010] The base station body is provided with a receiving groove, and the adjustment component is located in the receiving groove. The adjustment component includes a bracket, which includes a first end and a second end that are arranged opposite to each other. The first end is rotatably disposed on the inner wall of the receiving groove, and the second end is connected to the cleaning body. The bracket is used to rotate toward the side away from the cleaning equipment when the part to be cleaned moves to the adjustment component and is supported on the first end, so that the cleaning body moves away from the part to be cleaned. The bracket is also used to rotate toward the side close to the cleaning equipment when the part to be cleaned is lifted, so that the cleaning body contacts the part to be cleaned.

[0011] The base station body is equipped with an entrance and exit for cleaning equipment, with the first end positioned closer to the entrance and exit than the second end.

[0012] The bracket includes the following components connected sequentially from the first end to the second end: a support portion, rotatably disposed on the inner wall of the receiving groove, for supporting the component to be cleaned; a connecting portion, connected to the end of the support portion near the bottom wall of the receiving groove; and a mounting portion, connected to the end of the connecting portion away from the support portion and spaced apart from the support portion, with the cleaning body disposed on the mounting portion.

[0013] The dimension of the support part along the height direction is larger than the dimension of the mounting part along the height direction; and the height direction is parallel to the arrangement direction of the base station and the cleaning equipment.

[0014] The adjustment assembly also includes a reset component, which is located between the bracket and the inner wall of the receiving groove, and is used to provide the bracket with a reset force close to the cleaning equipment.

[0015] The reset component includes a torsion spring.

[0016] The cleaning equipment also includes a body, on which the parts to be cleaned are located; the base station body is equipped with a positioning column, which is used to dock with the body when the parts to be cleaned are moved to the adjustment component, so as to support the body when the parts to be cleaned are lifted.

[0017] The base station also includes a detection component, which is used to detect the location of the cleaning equipment and guide the cleaning equipment into the base station.

[0018] Secondly, this application provides a cleaning system, which includes: a cleaning device including a component to be cleaned; a base station including a base station body and a cleaning mechanism, the cleaning mechanism including an adjustment component and a cleaning body connected to the adjustment component, the adjustment component being rotatably disposed on the base station body; the adjustment component is configured to, when the component to be cleaned moves to a target position, make the cleaning body contact the component to be cleaned and clean the component to be cleaned.

[0019] The cleaning equipment also includes: a body, on which the part to be cleaned is located, and the part to be cleaned is configured to rotate relative to the cleaning body after it comes into contact with the cleaning body; and a lifting mechanism, which is vertically adjustable relative to the body, and is configured to lift the body after the cleaning equipment moves to the adjustment component and the adjustment component moves the cleaning body away from the part to be cleaned.

[0020] The lifting mechanism includes: a first drive assembly located on the machine body; and an auxiliary wheel connected to the first drive assembly, which can be raised and lowered relative to the machine body in the height direction via the first drive assembly.

[0021] The component to be cleaned includes: a drive wheel body, which is rotatably mounted on the machine body; and a second drive assembly, which is mounted on the machine body and connected to the drive wheel body. The second drive assembly is configured to drive the drive wheel body to swing close to the machine body after the machine body is raised, so as to raise the drive wheel body.

[0022] The advantages of this application's implementation, unlike existing technologies, are as follows: This application provides a base station and a cleaning system. The base station is used at least to clean components of a cleaning device. The base station includes a base station body and a cleaning mechanism. The cleaning mechanism includes an adjustment component and a cleaning body connected to the adjustment component. The adjustment component is rotatably mounted on the base station body. The adjustment component is configured to bring the cleaning body into contact with the component when it moves to a target position, and then clean the component. By rotatably mounting the adjustment component connected to the cleaning body on the base station body, when the component moves to the target position, the adjustment component can drive the cleaning body to contact the component, facilitating the cleaning body's cleaning of the component. This improves the problem of secondary contamination of the surface to be cleaned due to the adhesion of cleaning materials to the component. Attached Figure Description

[0023] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort, wherein:

[0024] Figure 1 This is a schematic diagram of the structure of the first embodiment of the cleaning system provided in this application;

[0025] Figure 2 This is a schematic diagram of the structure of the second embodiment of the cleaning system provided in this application;

[0026] Figure 3 This is a schematic diagram of the structure of the third embodiment of the cleaning system provided in this application;

[0027] Figure 4 This is a schematic diagram of the fourth embodiment of the cleaning system provided in this application;

[0028] Figure 5 yes Figure 2 or Figure 3 The diagram shows the structure of the cleaning system in which the parts to be cleaned cooperate with the cleaning mechanism.

[0029] Figure 6 yes Figure 4 The diagram shows the structure of the cleaning system, including the components to be cleaned and the cleaning mechanism. Detailed Implementation

[0030] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. It is understood that the specific embodiments described herein are only for explaining this application and not for limiting it. Furthermore, it should be noted that, for ease of description, only the parts related to this application are shown in the accompanying drawings, not all structures. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the scope of protection of this application.

[0031] In the description of this application, it should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," and "counterclockwise," etc., indicating orientation or positional relationships based on the orientation or positional relationships shown in the accompanying drawings, are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, features defined with "first" and "second" may explicitly or implicitly include one or more of the stated features. In the description of this application, "a plurality of" means two or more, unless otherwise explicitly specified.

[0032] In the description of this application, it should be noted that, unless otherwise expressly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection, an electrical connection, or a connection that allows communication between them; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication between two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.

[0033] In this application, unless otherwise expressly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature being directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature being directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0034] In this document, the term "embodiment" means that a particular feature, structure, or characteristic described in connection with an embodiment may be included in at least one embodiment of this application. The appearance of this phrase in various places throughout the specification does not necessarily refer to the same embodiment, nor is it a separate or alternative embodiment mutually exclusive with other embodiments. It will be explicitly and implicitly understood by those skilled in the art that the embodiments described herein can be combined with other embodiments.

[0035] Please see Figures 1 to 4 , Figure 1 This is a schematic diagram of the structure of the first embodiment of the cleaning system provided in this application; Figure 2 This is a schematic diagram of the structure of the second embodiment of the cleaning system provided in this application;

[0036] Figure 3 This is a schematic diagram of the structure of the third embodiment of the cleaning system provided in this application; Figure 4This is a schematic diagram of the fourth embodiment of the cleaning system provided in this application. This application provides a base station 100. The base station 100 is at least used to clean the component 220 to be cleaned of the cleaning device 200. The cleaning device 200 can be a robotic vacuum cleaner, a robotic vacuum and mop combo, a carpet cleaner, or a pool cleaning robot, but is not limited to these. The component 220 to be cleaned is at least used to provide driving force to the cleaning device 200, enabling the cleaning device 200 to move forward, backward, or turn. The component 220 to be cleaned can be a drive wheel, a swivel wheel, a front auxiliary wheel, or a rear auxiliary wheel; of course, the component 220 to be cleaned can also be a cleaning component, such as a mop, a roller brush, or a cleaning sponge, but is not limited to these.

[0037] Base station 100 includes base station body 110 and cleaning mechanism 120. Cleaning mechanism 120 includes adjustment component 121 and cleaning body 122 connected to adjustment component 121. Adjustment component 121 is rotatably disposed on base station body 110. Adjustment component 121 is configured to make cleaning body 122 contact with cleaning component 220 when cleaning component 220 moves to target position, and clean cleaning component 220.

[0038] The base station 100 is used not only to store the cleaning equipment 200, but also to clean the parts 220 of the cleaning equipment 200 that need to be cleaned. In addition, the base station 100 can also monitor the power of the cleaning equipment 200, provide charging services for the cleaning equipment 200, and clean the cleaning tools such as the mop and roller brush of the cleaning equipment 200, but is not limited to these functions.

[0039] The base station body 110 serves as the basic carrier of the base station 100. An adjustment component 121 is rotatably mounted on the base station body 110, and a cleaning body 122 is mounted on the adjustment component 121. The adjustment component 121 adjusts the position of the cleaning body 122 through rotation. The cleaning body 122 can be a brush, a cloth, or a cleaning sponge, but is not limited to these.

[0040] When the component to be cleaned 220 moves to the target position, the cleaning device 200 stops moving. At this time, the adjusting component 121 can drive the cleaning body 122 to contact the component to be cleaned 220. In this embodiment, the adjusting component 121 connected to the cleaning body 122 is rotatably disposed on the base station body 110, so that when the component to be cleaned 220 moves to the target position, the adjusting component 121 can drive the cleaning body 122 to contact the component to be cleaned 220, which facilitates the cleaning body 122 to clean the component to be cleaned 220, thereby improving the problem of secondary contamination of the surface to be cleaned caused by the adhesion of the object to be cleaned to the component to be cleaned 220.

[0041] In some embodiments, the cleaning mechanism 120 is located at a target position, and the adjustment component 121 is configured to rotate relative to the base station body 110 when the component to be cleaned 220 moves to the target position and comes into contact with the component to be cleaned 220, and to drive the cleaning body 122 away from the component to be cleaned 220, so that the cleaning body 122 and the component to be cleaned 220 are spaced apart.

[0042] During the process of the cleaning device 200 entering the base station, the front end of the cleaning device 200 passes the adjustment component 121 earlier than the cleaning body 122. When the component to be cleaned 220 moves to the target position, the component to be cleaned 220 can be supported on the adjustment component 121, and the cleaning body 122 is closer to the front end of the cleaning device 200 than the component to be cleaned 220. Since the component to be cleaned 220 will squeeze the adjustment component 121 when it is supported on the adjustment component 121, and drive the adjustment component 121 to rotate relative to the base station body 110, the rotation of the base station body 110 will drive the cleaning body 122 away from the component to be cleaned 220, so that the cleaning body 122 can rotate to a position that can maintain a physical distance from the component to be cleaned 220, so that the component to be cleaned 220 will not squeeze or crush the cleaning body 122, avoiding wear, deformation or cracking of the cleaning body 122 under the squeezing or crushing of the component to be cleaned 220, which helps to extend the service life of the cleaning body 122.

[0043] In some embodiments, the component 220 to be cleaned is vertically movable via a lifting mechanism 230. The adjusting component 121 is also configured to reverse when the component 220 to be cleaned is lifted, and to bring the cleaning body 122 closer to the component 220 to be cleaned, so that the cleaning body 122 contacts the component 220 to be cleaned.

[0044] The adjustment component 121 rotates in the opposite direction when the part to be cleaned 220 is lifted to when it contacts the part 220. That is, when the part 220 is lifted, the adjustment component 121 rotates towards the cleaning device 200; while when the part 220 contacts the adjustment component 121, the adjustment component 121 rotates away from the cleaning device 200 under the pressure of the part 220. The adjustment component 121 can automatically adjust the separation state between the cleaning body 122 and the part 220 in response to the state of the part 220, without manual operation or software control. This not only improves the cleaning efficiency of the part 220 but also reduces costs while maintaining a certain degree of automation.

[0045] After the base station body 110 moves the cleaning body 122 away from the component to be cleaned 220, the component to be cleaned 220 can be lifted under the drive of the lifting mechanism 230. During the lifting process of the component to be cleaned 220, the adjustment component 121 can reverse and return to its original position because it is freed from the restraint of the component to be cleaned 220, and move the cleaning body 122 closer to the component to be cleaned 220, so that the cleaning body 122 can contact the component to be cleaned 220, making it easier for the cleaning body 122 to clean the component to be cleaned 220.

[0046] In some embodiments, when the cleaning body 122 contacts the part 220 to be cleaned, the part 220 to be cleaned can vibrate or rotate around its own axis, thereby increasing the friction between the cleaning body 122 and the part 220 to be cleaned. This helps to improve the cleaning power of the cleaning body 122 on the part 220 to be cleaned, enabling the cleaning body 122 to more efficiently remove dust, hair, debris, and other cleaning materials adhering to the part 220 to be cleaned. Furthermore, the vibration or rotation of the part 220 to be cleaned can provide energy for the cleaning process, causing relative friction between the part 220 to be cleaned and the cleaning body 122. This makes it easier to peel off or brush away the cleaning materials adhering to the part 220 to be cleaned, thereby improving the cleaning effect of cleaning the part 220 to be cleaned. This can further improve problems such as secondary contamination of the surface to be cleaned caused by cleaning materials adhering to the part 220 to be cleaned.

[0047] In some embodiments, after the cleaning body 122 finishes cleaning the component 220, the component 220 can move down and return to the adjustment component 121, triggering the adjustment component 121 to rotate relative to the base station body 110. This causes the adjustment component 121 to move the cleaning body 122 away from the component 220, preventing the component 220 from squeezing the cleaning body 122 during its downward movement to the adjustment component 121. Since the cleaning body 122 is closer to the front end of the cleaning device 200 than the component 220 when it returns to the adjustment component 121, while the inlet / outlet 112 of the base station body 110 is closer to the rear end of the cleaning device 200, the component 220 will not come into contact with the cleaning body 122 when it is pushed out of the base station 100, thus preventing the component 220 from being squeezed or crushed.

[0048] In some embodiments, please continue reading Figure 4 The adjustment component 121 is also configured to be spaced apart from the component 220 to be cleaned after the component 220 to be cleaned is raised.

[0049] By raising the component 220 to be cleaned and then spacing the adjustment component 121 from the component 220, the component 220 will not come into contact with the adjustment component 121 during its rotation around its own axis. This avoids interference between the component 220 and the adjustment component 121, preventing the adjustment component 121 from hindering the rotation of the component 220 and thus improving the rotation efficiency of the component 220. It also avoids wear caused by mutual scraping between the component 220 and the adjustment component 121, thus helping to extend the service life of both the component 220 and the adjustment component 121.

[0050] In some embodiments, the base station body 110 is provided with a receiving groove 111. An adjustment component 121 is disposed within the receiving groove 111. Specifically, the adjustment component 121 is rotatably disposed on the inner wall of the receiving groove 111. By disposing the adjustment component 121 within the receiving groove 111, and making the upper surface of the adjustment component 121 flush with or lower than the edge of the receiving groove 111, it is convenient for the part to be cleaned 220 to move onto the adjustment component 121. This not only avoids climbing slopes and saves energy, but also reduces the impact force of the part to be cleaned 220 on the adjustment component 121, thereby achieving the effects of vibration reduction and noise reduction.

[0051] The adjustment assembly 121 includes a bracket 1211, which has a first end 1211a and a second end 1211b disposed opposite to each other. The first end 1211a is rotatably disposed on the inner wall of the receiving groove 111, and the second end 1211b is connected to the cleaning body 122. The bracket 1211 is used to rotate toward the side away from the cleaning device 200 when the part to be cleaned 220 moves to the adjustment assembly 121 and is supported on the first end 1211a, so that the cleaning body 122 moves away from the part to be cleaned 220. The bracket 1211 is also used to rotate toward the side closer to the cleaning device 200 when the part to be cleaned 220 is lifted, so that the cleaning body 122 contacts the part to be cleaned 220.

[0052] The first end 1211a of the bracket 1211 is connected to the inner wall of the receiving groove 111 via a rotating structure, and the second end 1211b is used to connect to the cleaning body 122. When the part to be cleaned 220 moves to the position of the adjusting component 121 and is supported on the first end 1211a of the bracket 1211, the part to be cleaned 220 will apply gravity to the first end 1211a of the bracket 1211, causing the bracket 1211 to rotate around its connection point with the inner wall of the receiving groove 111 toward the side away from the cleaning device 200, and causing the cleaning body 122 to rotate toward the side away from the cleaning device 200, thereby preventing the part to be cleaned 220 from contacting and squeezing the cleaning body 122. When the component to be cleaned 220 is lifted, the gravity exerted by the component to be cleaned 220 on the first end 1211a of the bracket 1211 disappears, allowing the bracket 1211 to reset, that is, to rotate around its connection point with the inner wall of the receiving groove 111 toward the side closer to the cleaning device 200, and to drive the cleaning body 122 to rotate toward the side closer to the cleaning device 200, so that the cleaning body 122 comes into contact with the component to be cleaned 220.

[0053] By rotatably mounting the first end 1211a of the bracket 1211 on the inner wall of the receiving groove 111 and connecting the second end 1211b to the cleaning body 122, the bracket 1211 can be automatically triggered to rotate relative to the inner wall of the receiving groove 111 when the part to be cleaned 220 is supported on the first end 1211a of the bracket 1211 or when the part to be cleaned 220 is lifted. The mechanical linkage of the bracket 1211 enables the separation or contact between the cleaning body 122 and the part to be cleaned 220. This not only improves the system's response rate but also reduces manual intervention, increases the degree of automation, and helps improve the user experience.

[0054] In some embodiments, the base station body 110 is provided with an inlet and outlet 112 for the cleaning equipment 200 to enter and exit. The first end 1211a is disposed closer to the inlet and outlet 112 than the second end 1211b.

[0055] The cleaning equipment 200 mainly enters and exits the base station 100 via the inlet and outlet 112. By setting the first end 1211a closer to the inlet and outlet 112 relative to the second end 1211b, and stopping the cleaning component 220 when it moves to the first end 1211a of the bracket 1211, the bracket 1211 is triggered to move the cleaning body 122 away from the cleaning equipment 200, which can prevent the cleaning component 220 from squeezing the cleaning body 122 and help extend the service life of the cleaning body 122.

[0056] In some embodiments, please continue reading Figure 2The receiving groove 111 includes a first edge 1111 and a second edge 1112 disposed opposite to each other. The first edge 1111 is disposed near the inlet / outlet 112 relative to the second edge 1112. The second edge 1112 is provided with a stop 1113, which is used to limit the displacement of the cleaning device 200. The stop 1113 is fixed to or integrally formed with the second edge 1112, and protrudes upward from the second edge 1112. It is used to limit the excessive displacement of the part 220 to be cleaned by the cleaning device 200 toward the interior of the base station 100, so as to limit the part 220 to be cleaned at the adjustment component 121, thereby limiting the part 220 to be cleaned.

[0057] In some embodiments, the bracket 1211 includes a support portion 1211c, a connecting portion 1211d, and a mounting portion 1211e, which are sequentially connected from a first end 1211a to a second end 1211b. The support portion 1211c is rotatably disposed on the inner wall of the receiving groove 111 for supporting the component 220 to be cleaned. The connecting portion 1211d is connected to the end of the support portion 1211c near the bottom wall of the receiving groove 111. The mounting portion 1211e is connected to the end of the connecting portion 1211d away from the support portion 1211c and is spaced apart from the support portion 1211c. The cleaning body 122 is disposed on the mounting portion 1211e.

[0058] The support portion 1211c is located at the first end 1211a of the bracket 1211, and the mounting portion 1211e is located at the second end 1211b of the bracket 1211. The connecting portion 1211d connects the support portion 1211c and the mounting portion 1211e. When the component to be cleaned 220 moves to the adjusting assembly 121, it is supported on the support portion 1211c. Under the weight of the component to be cleaned 220, the support portion 1211c rotates towards the side away from the cleaning device 200, causing the connecting portion 1211d and the mounting portion 1211e to rotate towards the side away from the cleaning device 200. When the component to be cleaned 220 is lifted, the weight of the component to be cleaned 220 acting on the support portion 1211c disappears, causing the support portion 1211c to rotate towards the side closer to the cleaning device 200, causing the connecting portion 1211d and the mounting portion 1211e to rotate towards the side closer to the cleaning device 200.

[0059] Before the cleaning equipment 200 enters the base station 100 and after the component to be cleaned 220 is lifted, the side of the connecting portion 1211d away from the cleaning equipment 200 is spaced from the bottom wall of the receiving groove 111, and the extending direction of the connecting portion 1211d is inclined relative to the arrangement direction of the supporting portion 1211c and the mounting portion 1211e. When the component to be cleaned 220 is supported on the supporting portion 1211c, and the supporting portion 1211c rotates toward the side away from the cleaning equipment 200, the side of the connecting portion 1211d away from the cleaning equipment 200 contacts the bottom wall of the receiving groove 111, and the extending direction of the connecting portion 1211d is parallel to the arrangement direction of the supporting portion 1211c and the mounting portion 1211e.

[0060] The rotatable arrangement of the support portion 1211c, in conjunction with the inner wall of the receiving groove 111 and the stop member 1113 located on the second edge 1112, enables the positioning of the component 220 to be cleaned. By connecting the connecting portion 1211d between the support portion 1211c and the mounting portion 1211e, not only is the structural strength of the bracket 1211 enhanced, but the support portion 1211c and the mounting portion 1211e can also be spaced apart, preventing the component 220 to be cleaned from moving from the support portion 1211c to the mounting portion 1211e and compressing the cleaning body 122.

[0061] In some embodiments, the dimension of the support portion 1211c along the height direction is larger than the dimension of the mounting portion 1211e along the height direction; that is, the height or thickness of the support portion 1211c in the height direction is greater than the height or thickness of the mounting portion 1211e in the height direction. The height direction is parallel to the arrangement direction of the base station 100 and the cleaning equipment 200.

[0062] By making the dimension of the support part 1211c in the height direction larger than the dimension of the mounting part 1211e in the height direction, when the part to be cleaned 220 moves to the adjustment assembly 121 and the mounting part 1211e rotates toward the side closer to the cleaning device 200, the end of the cleaning body 122 toward the cleaning device 200 can be spaced apart from the part to be cleaned 220, so as to avoid the cleaning body 122 being squeezed or crushed by the part to be cleaned 220 and deformed or damaged.

[0063] In some embodiments, the adjustment assembly 121 further includes a reset member 1212. The reset member 1212 is disposed between the bracket 1211 and the inner wall of the receiving groove 111, and is used to provide the bracket 1211 with a reset force close to the cleaning device 200.

[0064] Specifically, the reset member 1212 is located between the side of the support portion 1211c facing away from the cleaning device 200 and the inner wall of the receiving groove 111. The reset member 1212 can store the restoring force toward the cleaning device 200 when the bracket 1211 rotates toward the side away from the cleaning device 200, so as to release the restoring force toward the cleaning device 200 when the part to be cleaned 220 is lifted, and push the bracket 1211 to rotate toward the side closer to the cleaning device 200, thereby causing the bracket 1211 to drive the cleaning body 122 to rotate toward the side closer to the cleaning device 200.

[0065] The reset member 1212 provides a reset force to the cleaning body 122 near the cleaning device 200, so that after the part to be cleaned 220 is lifted, the cleaning body 122 can rotate toward the side near the cleaning device 200 and contact the part to be cleaned 220. After the cleaning body 122 contacts the part to be cleaned 220, the reset member 1212 can also provide a supporting force to the bracket 1211 toward the side of the cleaning device 200, so that the cleaning body 122 and the part to be cleaned 220 can maintain a tight and stable contact state, and prevent the bracket 1211 from deflecting, shaking or pulling the cleaning body 122 away from the part to be cleaned 220 during the cleaning process. This ensures that the cleaning body 122 can provide a continuous and stable friction force to the part to be cleaned 220, so that the cleaning body 122 can clean the part to be cleaned 220 stably and continuously, which helps to improve the cleaning efficiency and cleaning effect of the part to be cleaned 220. Furthermore, when the component to be cleaned 220 rotates around its own axis, the elastic deformation of the reset component 1212 can buffer the impact of the component to be cleaned 220 on the cleaning body 122, reducing the risk of deformation or damage to the cleaning body 122.

[0066] In some embodiments, the reset member 1212 includes a torsion spring. The torsion spring can store energy through torsional deformation and use its elastic deformation to provide a reset force to the support 1211. The torsion spring can be a helical torsion spring made of metal or a helical torsion spring made of highly elastic plastic. The mechanical reset method using a torsion spring does not require an additional power source, has a simple structure, high reliability, and can ensure continuous contact between the cleaning body 122 and the part 220 to be cleaned.

[0067] In some embodiments, the cleaning device 200 further includes a body 210, on which the component 220 to be cleaned is disposed. The body 210 can serve as the basic carrier of the cleaning device 200. The body 210 can be a one-piece structure or a combined structure formed by the cooperation of multiple components. A positioning post 130 is provided on the base station body 110. The positioning post 130 is used to dock with the body 210 when the component 220 to be cleaned moves to the adjustment assembly 121, so as to support the body 210 when the component 220 to be cleaned is lifted.

[0068] When the cleaning equipment 200 enters the base station 100 and the component to be cleaned 220 is supported on the adjustment assembly 121, the positioning post 130 contacts and connects with the body 210. On the one hand, the positioning post 130 can guide the cleaning equipment 200 to align after it enters the base station 100, so as to ensure that the cleaning equipment 200 is accurately positioned in the base station 100, and can independently or in conjunction with the cleaning mechanism 120 to achieve the positioning of the cleaning equipment 200. On the other hand, during the lifting process of the component to be cleaned 220, the positioning post 130 supports the body 210 through physical contact, ensuring that the body 210 can remain stable.

[0069] In some embodiments, the positioning post 130 may be a protruding part on the base station body 110. The body 210 is provided with a docking part (not shown), which may be a groove. When the part to be cleaned 220 is supported on the adjustment assembly 121, the positioning post 130 is inserted into the groove.

[0070] In some embodiments, the base station body 110 includes a first support plate 113 and a second support plate 114. A cleaning mechanism 120 is disposed on the first support plate 113. The second support plate 114 is connected to one end of the first support plate 113, extends along the height direction, and a positioning post 130 is disposed on the second support plate 114. The cleaning device 200 also includes a lifting mechanism 230, which is disposed away from the second support plate 114 relative to the component 220 to be cleaned. The lifting mechanism 230 is vertically movable relative to the body 210. The lifting mechanism 230 is configured to lift the body 210 after the cleaning device 200 moves to the adjustment component 121 and the adjustment component 121 drives the cleaning body 122 away from the component 220 to be cleaned. After the positioning post 130 is docked with the body 210, the body 210 can move or rotate relative to the positioning post 130 so that the positioning post 130 and the body 210 can maintain a stable docking during the lifting process of the body 210, and the body 210 will not rub or break the positioning post 130.

[0071] In some embodiments, the base station 100 further includes a detection component (not shown). The detection component is used to detect the position of the cleaning device 200 and guide the cleaning device 200 into the base station 100.

[0072] The detection component can be a visual sensor or an infrared receiver. The visual sensor or infrared sensor can capture the position of the cleaning device 200. The visual sensor generates a movement path by calculating the relative position to guide the cleaning device 200 into the base station 100. The infrared sensor includes at least one infrared receiver located at the base station 100 and multiple infrared emitters located on the cleaning device 200. The infrared receiver can receive infrared signals from the multiple infrared emitters and compare the differences in infrared signal intensity of different infrared emitters at the same time to determine the offset direction and distance of the cleaning device 200 relative to the entrance / exit 112 of the base station 100, thereby generating a movement path to guide the cleaning device 200 into the base station 100. Of course, the detection component can also be an ultrasonic sensor, lidar, etc., but is not limited to these.

[0073] In some embodiments, the detection component can plan the movement path of the cleaning device 200 outside the area where the cleaning device 200 has performed a cleaning task, so as to avoid the cleaning component 220 causing secondary pollution to the area where the cleaning task has been performed, thereby improving the cleaning efficiency and cleaning effect of the cleaning device 200 and helping to improve the user experience.

[0074] Please continue reading. Figures 1 to 4 This application also provides a cleaning system 1000. The cleaning system 1000 includes a cleaning device 200 and a base station 100. The cleaning device 200 includes a component 220 to be cleaned. The base station 100 includes a base station body 110 and a cleaning mechanism 120. The cleaning mechanism 120 includes an adjustment component 121 and a cleaning body 122 connected to the adjustment component 121. The adjustment component 121 is rotatably disposed on the base station body 110. The adjustment component 121 is configured to, when the component 220 to be cleaned moves to a target position, cause the cleaning body 122 to contact the component 220 to be cleaned and clean the component 220.

[0075] In this embodiment, the adjustment component 121 connected to the cleaning body 122 is rotatably disposed on the base station body 110, so that when the part to be cleaned 220 moves to the target position, the adjustment component 121 can drive the cleaning body 122 to contact the part to be cleaned 220, so that the cleaning body 122 can clean the part to be cleaned 220, thereby improving the problem of secondary pollution of the surface to be cleaned caused by the object to be cleaned adhering to the part to be cleaned 220.

[0076] In some embodiments, the cleaning device 200 further includes a body 210. A component 220 to be cleaned is disposed on the body 210. The component 220 to be cleaned is at least used to provide driving force to the body 210 to move the body 210 forward, backward, or turn.

[0077] A positioning post 130 is provided on the base station body 110. The positioning post 130 is used to dock with the body 210 when the part to be cleaned 220 moves to the adjustment assembly 121, and at least to support the body 210 when the part to be cleaned 220 is lifted. The cleaning device 200 also includes a lifting mechanism 230, which is vertically movable relative to the body 210 and is located away from the positioning post 130 relative to the part to be cleaned 220. The lifting mechanism 230 is configured to lift the body 210 after the cleaning device 200 moves to the adjustment assembly 121 and the adjustment assembly 121 moves the cleaning body 122 away from the part to be cleaned 220.

[0078] In some embodiments, the lifting mechanism 230 can be used to lift the component 220 to be cleaned. However, the lifting mechanism 230 does not directly lift the component 220; instead, it lifts the machine body 210 so that the machine body 210 drives the component 220 to be cleaned to be lifted. Alternatively, the lifting mechanism 230 can only lift the machine body 210 and not the component 220 to be cleaned. The lifting mechanism 230 serves as a new fulcrum for the machine body 210 and provides rotational space for the autonomous lifting of the component 220. In either case, the lifting mechanism 230 replaces the component 220 to be cleaned as a new fulcrum for the machine body 210, maintaining the stability of the machine body 210. This not only allows the component 220 to be cleaned to be effectively lifted but also reduces or eliminates the risk of the machine body 210 shaking, tipping over, or collapsing during the cleaning process, which could lead to cleaning interruption or damage to the cleaning mechanism 120.

[0079] One end of the body 210 is supported by the positioning column 130. The lifting mechanism 230 is used to lift the other end of the body 210 away from the positioning column 130, so that the body 210 can remain stable during the process of the lifting mechanism 230 extending and retracting relative to the body 210 in the height direction, and to prevent the cleaning equipment 200 from shaking, tipping over or collapsing, so that the cleaning body 122 can stably and continuously clean the cleaning component 220.

[0080] In some embodiments, since the cleaning body 122 is positioned closer to the second edge 1112 of the receiving groove 111 than the adjusting assembly 121, in order for the part to be cleaned 220 to contact the cleaning body 122 after being raised, the part to be cleaned 220 should swing and rise towards the second edge 1112 during the lifting process. Therefore, the specific height of the lifting of the body 210 can be based on the height of the stop 1113 of the second edge 1112 of the receiving groove 111. When the body 210 is raised, the lowest point of the part to be cleaned 220 can be higher than the top of the stop 1113 of the second edge 1112, so that the part to be cleaned 220 will not interfere with the stop 1113 during the lifting process, thereby improving the reliability of the cleaning system 1000.

[0081] Furthermore, by raising the body 210, the displacement of the component 220 to be cleaned when it swings near the body 210 can be increased, allowing the component 220 to be cleaned to be raised higher. This ensures that the component 220 to be cleaned is in close contact with the cleaning body 122, while being spaced apart from the adjustment component 121, the base station 100 body, and the stop component 1113. This allows the component 220 to rotate smoothly around its own axis, which not only improves the cleaning efficiency of the cleaning body 122 on the component 220 to be cleaned, but also reduces the risk of wear and tear on the component 220 from the adjustment component 121, the base station 100 body, and the stop component 1113.

[0082] In some embodiments, the lifting mechanism 230 includes a first drive assembly (not shown) and an auxiliary wheel 231. The first drive assembly is disposed on the fuselage 210. The auxiliary wheel 231 is connected to the first drive assembly and is vertically movable relative to the fuselage 210 via the first drive assembly.

[0083] The first drive assembly is connected between the body 210 and the auxiliary wheel 231. The first drive assembly is at least used to drive the auxiliary wheel 231 to extend and retract along the height direction. When the cleaning device 200 is in normal operating condition, the first drive assembly can be in a retracted state. When the part to be cleaned 220 triggers the adjustment assembly 121 to rotate in a direction away from the cleaning device 200, the first drive assembly is in an extended state to drive the auxiliary wheel 231 to move along the height direction toward the support surface of the base station 100 used to support the cleaning device 200 and to contact the support surface. After the auxiliary wheel 231 contacts the support surface, the first drive assembly continues to extend to lift the body 210 under the reaction force of the support surface and the auxiliary wheel 231, so that the body 210 is raised.

[0084] In some embodiments, the auxiliary wheel 231 is a caster wheel. On the one hand, the caster wheel can rotate freely 360° to help the cleaning device 200 quickly adjust its direction while in motion; on the other hand, the caster wheel can support the body 210 under the drive of the first drive component to cooperate with the positioning column 130 on the base station 100 to keep the center of gravity of the cleaning device 200 stable.

[0085] The auxiliary wheel 231 can be located on the side of the part to be cleaned 220 near the front or rear end of the body 210, and exposed on the bottom of the body 210 when the cleaning equipment 200 is in motion, so as to support the front or rear end of the body 210 when the front end of the body 210 sinks or rises, thereby reducing the risk of the body 210 tipping forward or backward.

[0086] Please refer to the following: Figures 5 to 6 , Figure 5 yes Figure 2 or Figure 3The diagram shows the structure of the cleaning system in which the parts to be cleaned cooperate with the cleaning mechanism. Figure 6 yes Figure 4 The diagram shows the structure of the cleaning system in which the component to be cleaned cooperates with the cleaning mechanism. The component to be cleaned 220 includes a drive wheel body 221 and a second drive assembly 222. The drive wheel body 221 is rotatably mounted on the machine body 210. The second drive assembly 222 is mounted on the machine body 210 and connected to the drive wheel body 221. The second drive assembly 222 is configured to drive the drive wheel body 221 to swing close to the machine body 210 after the machine body 210 is raised, thereby raising the drive wheel body 221.

[0087] The drive wheel body 221 is a component that contacts the running surface and drives the machine body 210 to move during the movement of the cleaning device 200. The cleaning body 122 is used to clean the drive wheel body 221. The drive wheel body 221 can swing relative to the machine body 210 via the second drive assembly 222.

[0088] In some embodiments, the second drive assembly 222 includes a drive member 2221 and a swing arm 2222. One end of the swing arm 2222 is connected to the drive member 2221, and the other end is connected to the drive wheel body 221. The drive member 2221 drives the swing arm 2222 to move along a first direction XX intersecting the height direction, so that the swing arm 2222 causes the drive wheel body 221 to swing relative to the fuselage 210, thereby causing the drive wheel body 221 to move closer to or away from the fuselage 210.

[0089] The drive component 2221 can be a ball screw structure. Of course, the drive component 2221 can also be a gear and rack structure, a lifting drive structure, or an electric pump structure, but is not limited to these.

[0090] After the body 210 is raised, the drive component 2221 drives the swing arm 2222 to swing away from the stop member 1113 along the first direction XX, so that the swing arm 2222 drives the drive wheel body 221 to swing and rise towards the stop member 1113, thereby moving the drive wheel body 221 away from the adjustment component 121 and into contact with the cleaning body 122. After the drive wheel body 221 is cleaned, the drive component 2221 drives the swing arm 2222 to swing towards the stop member 1113 along the first direction XX, so that the swing arm 2222 drives the drive wheel body 221 to swing and move downward away from the stop member 1113, so that it is supported on the adjustment component 121, thereby separating the drive wheel body 221 from the cleaning body 122. After the drive wheel body 221 separates from the cleaning body 122, the first drive component can switch from the extended state to the retracted state to drive the auxiliary wheel 231 towards the body 210, thereby lowering the height of the body 210.

[0091] In some embodiments, the component 220 to be cleaned further includes a reduction gearbox 223 and a limiting member 224. The output end of the reduction gearbox 223 is connected to the drive wheel body 221. The limiting member 224 is disposed on the reduction gearbox 223 and is used to limit the displacement of the swing arm 2222 when the drive wheel body 221 swings close to the machine body 210 to a preset angle.

[0092] The output end of the reduction gearbox 223 is connected to the drive wheel body 221, enabling it to transmit power to the drive wheel body 221 and adjust the rotational speed of the drive wheel body 221 around its own axis. By setting the reduction gearbox 223, the rotational speed of the drive wheel body 221 can be effectively adjusted and power can be stably transmitted to the drive wheel body 221, making the rotation of the drive wheel body 221 more stable and controllable during the cleaning process.

[0093] The limiting member 224 is located at the end of the gearbox 223 away from the drive wheel body 221. When the drive member 2221 drives the swing arm 2222 to swing away from the stop member 1113 in the first direction XX, and the drive wheel body 221 swings towards the stop member 1113 to a preset angle, the swing arm 2222 contacts the limiting member 224. The limiting member 224 restricts the displacement of the swing arm 2222 through mechanical blocking, so that the height of the drive wheel body 221 is fixed and can stably contact the cleaning body 122. The setting of the limiting member 224 can prevent the swing arm 2222 from excessively displacing, thereby accurately controlling the swing angle of the drive wheel body 221 as it swings closer to the machine body 210, reducing or avoiding the risk of the drive wheel body 221 failing to contact or making poor contact with the cleaning equipment 200 due to excessive displacement of the swing arm 2222, and improving the cleaning efficiency and cleaning effect of the drive wheel body 221.

[0094] In this embodiment, the specific structure of the base station 100 is the same as that in the above embodiments. Since the cleaning system 1000 adopts all the technical solutions of all the embodiments of the base station 100, it has at least all the beneficial effects brought about by the technical solutions of the above embodiments, which will not be described in detail here.

[0095] The above description is merely an embodiment of this application and does not limit the patent scope of this application. Any equivalent structural or procedural transformations made using the content of this application's specification and drawings, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of this application.

Claims

1. A base station, used for cleaning at least the components of a cleaning device, characterized in that, The base station includes: Base station main body; A cleaning mechanism includes an adjustment component and a cleaning body connected to the adjustment component, wherein the adjustment component is rotatably mounted on the base station body; The adjustment component is configured to bring the cleaning body into contact with the part to be cleaned and clean the part when the part to be cleaned moves to the target position.

2. The base station according to claim 1, characterized in that, The cleaning mechanism is located at the target position, and the adjustment component is configured to rotate relative to the base station body when the component to be cleaned moves to the target position and comes into contact with the component to be cleaned, and to drive the cleaning body away from the component to be cleaned, so that the cleaning body and the component to be cleaned are spaced apart.

3. The base station according to claim 2, characterized in that, The component to be cleaned is movable up and down in the height direction via a lifting mechanism; the adjustment component is also configured to reverse when the component to be cleaned is lifted, and to bring the cleaning body closer to the component to be cleaned, so that the cleaning body contacts the component to be cleaned.

4. The base station according to claim 2, characterized in that, The adjustment component is also configured to be spaced apart from the component to be cleaned after the component to be cleaned is raised.

5. The base station according to any one of claims 1 to 4, characterized in that, The base station body is provided with a receiving groove, and the adjustment component is disposed in the receiving groove; the adjustment component includes a bracket, the bracket includes a first end and a second end disposed opposite to each other, the first end is rotatably disposed on the inner wall of the receiving groove, and the second end is connected to the cleaning body; The bracket is used to rotate toward the side away from the cleaning device when the part to be cleaned moves to the adjustment assembly and is supported on the first end, so that the cleaning body moves away from the part to be cleaned; the bracket is also used to rotate toward the side close to the cleaning device when the part to be cleaned is lifted, so that the cleaning body contacts the part to be cleaned.

6. The base station according to claim 5, characterized in that, The base station body is provided with an entrance and exit for the cleaning equipment to enter and exit, and the first end is positioned closer to the entrance and exit than the second end.

7. The base station according to claim 5, characterized in that, The bracket comprises components sequentially connected from the first end to the second end: A support portion is rotatably disposed on the inner wall of the receiving groove to support the component to be cleaned; A connecting part is attached to one end of the support part near the bottom wall of the receiving groove; The mounting part is connected to the end of the connecting part away from the support part and is spaced apart from the support part, and the cleaning body is located on the mounting part.

8. The base station according to claim 7, characterized in that, The dimension of the support part along the height direction is larger than the dimension of the mounting part along the height direction; wherein, the height direction is parallel to the arrangement direction of the base station and the cleaning equipment.

9. The base station according to claim 5, characterized in that, The adjustment assembly also includes a reset member disposed between the bracket and the inner wall of the receiving groove, which is used to provide the bracket with a reset force close to the cleaning device.

10. The base station according to claim 9, characterized in that, The reset element includes a torsion spring.

11. The base station according to claim 1, characterized in that, The cleaning equipment also includes a body, and the component to be cleaned is disposed on the body; The base station body is provided with a positioning column, which is used to dock with the body when the part to be cleaned moves to the adjustment component, so as to support the body when the part to be cleaned is lifted.

12. The base station according to claim 1, characterized in that, The base station also includes a detection component for detecting the location of the cleaning equipment and guiding the cleaning equipment into the base station.

13. A cleaning system, characterized in that, The cleaning system includes: Cleaning equipment, including parts to be cleaned; A base station includes a base station body and a cleaning mechanism. The cleaning mechanism includes an adjustment component and a cleaning body connected to the adjustment component. The adjustment component is rotatably mounted on the base station body. The adjustment component is configured to bring the cleaning body into contact with the part to be cleaned and clean the part when the part to be cleaned moves to the target position.

14. The cleaning system according to claim 13, characterized in that, The cleaning equipment also includes: The machine body, wherein the component to be cleaned is disposed on the machine body, and the component to be cleaned is configured to rotate relative to the cleaning body after it comes into contact with the cleaning body; The lifting mechanism is vertically adjustable relative to the machine body. The lifting mechanism is configured to lift the machine body after the cleaning equipment moves to the adjustment component and the adjustment component moves the cleaning body away from the part to be cleaned.

15. The cleaning system according to claim 14, characterized in that, The lifting mechanism includes: A first drive assembly is located on the fuselage; An auxiliary wheel is connected to the first drive assembly and is movable up and down relative to the body along the height direction via the first drive assembly.

16. The cleaning system according to claim 14, characterized in that, The components to be cleaned include: The drive wheel body is rotatably mounted on the machine body; A second drive assembly is disposed on the fuselage and connected to the drive wheel body. The second drive assembly is configured to drive the drive wheel body to swing close to the fuselage after the fuselage is raised, so as to raise the drive wheel body.

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