Micro-nano structure regulating device for super-hydrophobic film layer deposition

Abstract

The utility model relates to material surface treatment equipment technical field discloses micro -nano structure regulation and control device for super water -repellent film layer deposition, including work table and fixed installation operation box in work table top left side, and operation box inside left and right sides all are fixedly connected with the installation ring, and the installation ring between fixedly connected with the sliding column, and the sliding column outer wall sliding connection has the sliding block no.

Description

Technical Field

[0001] This utility model relates to the field of material surface treatment equipment technology, and in particular to a micro-nano structure control device for superhydrophobic film deposition. Background Technology

[0002] Superhydrophobic materials have shown great application potential in aerospace, marine engineering and daily life due to their excellent self-cleaning, corrosion resistance and anti-icing properties. The construction of the surface depends on two core elements: the construction of micro-nano rough structures on the substrate surface and the modification of low surface energy materials. At present, laser etching technology is often used in industry to efficiently prepare micro-nano structures, and then magnetron sputtering technology is used to deposit low surface energy thin films to achieve the final superhydrophobic effect.

[0003] Existing fabrication processes separate laser etching and magnetron sputtering equipment into two independent steps. This means that after laser micro / nano structure manipulation, the substrate must undergo unloading, transfer, and re-clamping before entering the magnetron sputtering equipment for coating. This step-by-step and discontinuous operation mode forces the substrate surface, which is in a highly active state after laser high-energy beam etching, to be directly exposed to the atmospheric environment. Oxygen, moisture, and suspended particles in the air are quickly adsorbed into the aspect ratio gaps of the micro / nano structure and undergo oxidation reactions with the substrate surface, forming an invisible contamination layer and oxide layer between the substrate and the subsequently deposited film. This not only severely weakens the interfacial adhesion between the superhydrophobic film and the substrate, causing the film to peel off and fail in actual use, but also changes the surface physicochemical properties of the micro / nano structure, ultimately resulting in the superhydrophobic surface performance failing to meet the expected standards and exhibiting poor stability.

[0004] Therefore, this invention proposes a micro / nano structure control device for superhydrophobic film deposition to address the shortcomings of existing technologies. Utility Model Content

[0005] In the existing technology, the superhydrophobic film preparation process separates laser etching and magnetron sputtering as independent steps, which forces the substrate to be exposed to the air environment during the transfer between different devices, resulting in surface contamination and oxidation, and thus seriously affecting the adhesion and final performance of the film. The present invention aims to provide a micro-nano structure control device for superhydrophobic film deposition with an improved structure that can effectively solve the above problems.

[0006] This utility model provides a micro / nano structure control device for superhydrophobic film deposition, including: a worktable, an operation box fixedly installed on the top left side of the worktable, a laser micro / nano control machine, a magnetron sputtering machine and corresponding moving mechanisms.

[0007] The operation box has mounting rings fixedly connected to both the left and right sides inside, and sliding columns fixedly connected between the mounting rings. A slider one is slidably connected to the outer wall of the sliding column. A laser micro-nano control machine is fixedly connected to the bottom of the slider one. A magnetron sputtering machine is fixedly connected to the rear side of the top inside the operation box. Guide rails are fixedly connected to both the left and right sides of the middle part of the operation box. A slider two is slidably connected to the outer wall of the guide rail. A placement plate is fixedly connected to the top of the slider two. A controller is fixedly connected to the top of the front wall of the operation box.

[0008] Furthermore, the worktable serves as the basic support component, the operating box serves as the sealed reaction chamber, the first slider drives the laser micro-nano control machine to move laterally through the guiding action provided by the sliding column, and the second slider drives the placement plate and substrate to move longitudinally through the guiding action provided by the guide rail. The laser micro-nano control machine and the magnetron sputtering machine are integrated in the same operating box and coordinated by the controller to achieve seamless switching between the substrate micro-nano structure processing station and the magnetron sputtering deposition station in the same sealed space.

[0009] Preferably, in order to prevent the second slider from falling off the track, a baffle is fixedly connected to the front side of the guide rail. The baffle is located at the end of the guide rail and is used to limit the sliding stroke of the second slider, thus playing a mechanical limiting role.

[0010] Preferably, in order to achieve the sealing of the inside of the operating box to meet the vacuum processing conditions, a protrusion is provided on the front side of the operating box, a door is slidably connected to the front side of the protrusion, a sealing ring is slidably connected to the outer wall of the protrusion, and the sealing ring is installed between the door and the operating box, using the elastic deformation of the sealing ring to fill the gap.

[0011] Preferably, to facilitate the opening, closing, and locking of the door, the left side of the door and the left side of the control box are hinged together by a hinge, a handle is fixedly connected to the front of the door, a lock block is fixedly connected to the right side of the door, and a lock body is fixedly connected to the right side of the control box. The lock block and the lock body engage with each other, and the locking structure resists changes in internal air pressure.

[0012] Preferably, in order to facilitate real-time observation of the internal processing status, an observation window is provided inside the door, and the observation window is made of transparent material.

[0013] Preferably, in order to create the vacuum environment required for magnetron sputtering, an air extraction valve is fixedly connected to the left side of the operation box. The air extraction valve is used to connect to an external air extraction device to extract the air inside the operation box through the interface.

[0014] Preferably, in order to supply process gas into the operating box, a gas storage box is installed on the top right side of the workbench, a gas supply valve is fixedly connected to the top right side of the operating box, a connecting pipe is fixedly connected to the right side of the gas supply valve, and the bottom of the connecting pipe is fixedly connected to the gas storage box, forming a complete gas supply path.

[0015] Preferably, in order to clean up the debris generated by laser processing in a timely manner, a vacuum cleaner is installed on the top right side of the workbench, a vacuum valve is fixedly connected to the bottom right side of the control box, a connecting pipe two is fixedly connected to the right side of the vacuum valve, and the connecting pipe two is fixedly connected to the vacuum cleaner on the right side, forming a negative pressure dust removal passage.

[0016] Preferably, in order to achieve automated integrated control of the equipment, the controller is electrically connected to the first slider, the second slider, the laser micro-nano control machine, the magnetron sputtering machine, the dust suction valve, the dust collector, the air extraction valve, and the air supply valve, respectively, and commands each component to work together through electrical signals.

[0017] This utility model has the following beneficial effects: 1. This utility model integrates a laser micro-nano control machine and a magnetron sputtering machine in a sealed operating box. By using a longitudinal moving mechanism to drive the placement plate to flexibly switch between the laser processing station and the sputtering deposition station, it solves the problem of surface contamination and oxidation caused by the substrate coming into contact with air during the transfer process between the micro-nano processing equipment and the thin film deposition equipment in the prior art. It effectively protects the cleanliness and activity of the micro-nano structure on the substrate surface, significantly improves the adhesion and overall performance of the subsequent superhydrophobic film deposition, and simplifies the process flow and achieves the effect of integrated and efficient processing of micro-nano structure control and film deposition.

[0018] 2. This utility model, by setting up an independent and switchable dust collection system and a vacuum supply system, and coordinating the logical opening and closing of various control valves, opens the dust collection path during the laser processing stage to remove processing debris and fumes in real time, and closes the dust collection path and opens the air extraction path during the magnetron sputtering stage to create a high-cleanliness vacuum environment. This solves the problems of particulate contaminants generated by laser etching affecting the quality of vacuum coating and the difficulty of a single cavity to meet the environmental requirements of atmospheric pressure dust removal and vacuum deposition processes. It achieves seamless connection between two completely different process environments within the same device, ensuring both the cleanliness of laser processing and the vacuum level of magnetron sputtering, thereby improving the yield of the final product.

[0019] 3. This utility model, by setting up a controller to centrally and collaboratively control the transverse moving mechanism, the longitudinal moving mechanism and each processing component, and by utilizing the precise guiding effect of the slider, realizes the automated operation of laser scanning coverage and substrate station conversion. It solves the problems of excessive manual intervention, poor positioning accuracy and low production efficiency in the traditional step-by-step processing mode, and achieves the effect of realizing fully automated operation, ensuring the uniformity of micro-nano structure processing and the consistency of film deposition, reducing manual labor intensity and significantly improving production efficiency. Attached Figure Description

[0020] Figure 1 This is a perspective view of the micro / nano structure control device for superhydrophobic film deposition proposed in this utility model. Figure 2 This is a front view of the micro / nano structure control device for superhydrophobic film deposition proposed in this utility model; Figure 3 This is a cross-sectional view of the operating box in the micro / nano structure control device for superhydrophobic film deposition proposed in this utility model. Figure 4 This is an exploded view of the operating box in the micro / nano structure control device for superhydrophobic film deposition proposed in this utility model.

[0021] Legend: 1. Workbench; 2. Control box; 3. Air tank; 4. Vacuum cleaner; 5. Exhaust valve; 6. Air supply valve; 7. Connecting pipe one; 8. Dust extraction valve; 9. Connecting pipe two; 10. Protrusion; 11. Door body; 12. Hinge; 13. Handle; 14. Sealing ring; 15. Lock block; 16. Lock body; 17. Mounting ring; 18. Sliding column; 19. Slider one; 20. Laser micro-nano control machine; 21. Magnetron sputtering machine; 22. Guide rail; 23. Baffle; 24. Slider two; 25. Placement plate; 26. Controller; 27. Observation window. Detailed Implementation

[0022] To make the objectives, technical solutions, and advantages of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model. Example

[0023] Please refer to Figures 1 to 4This utility model provides a micro-nano structure control device for superhydrophobic film deposition, which aims to solve the problem in the prior art that the transfer of substrate between micro-nano processing and film deposition equipment leads to surface contamination and oxidation, thereby affecting the adhesion and performance of superhydrophobic films.

[0024] like Figure 1 and Figure 2 As shown, the micro / nano structure control device for superhydrophobic film deposition includes a worktable 1 and an operation box 2 fixedly installed on the top left side of the worktable 1. The worktable 1 serves as a support base for the entire device to provide a stable mounting surface. The operation box 2 is used to construct a sealed process chamber to facilitate micro / nano structure processing and vacuum coating inside. Mounting rings 17 are fixedly connected to both the left and right side walls inside the operation box 2. The mounting rings 17 are used to support and fix the lateral movement mechanism. A sliding column 18 is fixedly connected between the two mounting rings 17. A slider 19 is slidably connected to the outer wall of the sliding column 18. The sliding column 18 is used to provide lateral movement guidance for the slider 19. A laser micro / nano control machine 20 is fixedly connected to the bottom of the slider 19. The slider 19 is used to drive the laser micro / nano control machine 20 to perform lateral reciprocating motion. The laser micro / nano control machine 20 is used to emit a laser beam to etch the surface of the substrate to form a micro / nano rough structure. The laser micro / nano control machine 20 achieves full scanning coverage of the substrate width as the slider 19 moves.

[0025] like Figure 3 and Figure 4 As shown, a magnetron sputtering machine 21 is fixedly connected to the rear side of the top inside the operating box 2. The magnetron sputtering machine 21 is used to deposit a superhydrophobic film on the surface of the substrate in a vacuum environment using the principle of physical vapor deposition. Guide rails 22 are fixedly connected to both the left and right side walls inside the operating box 2 and below the mounting ring 17. The guide rails 22 are used to provide longitudinal movement guidance. Slider 24 is slidably connected to the outer wall of the guide rails 22. The top of the two sliders 24 is fixedly connected to a placement plate 25. The placement plate 25 is used to stably support the substrate to be processed. The sliders 24 are used to slide back and forth along the guide rails 22. The movement causes the placement plate 25 and the substrate to switch between the processing station below the laser micro-nano control machine 20 and the deposition station below the magnetron sputtering machine 21. A controller 26 is fixedly connected to the top of the front side wall of the control box 2. The controller 26 is used to centrally control the operating logic of each electrical component of the equipment. The controller 26 is electrically connected to the laser micro-nano control machine 20 and the magnetron sputtering machine 21 respectively. The controller 26 is also electrically connected to the drive motors that drive the horizontal movement of the first slider 19 and the vertical movement of the second slider 24, thereby realizing precise control of the automated processing flow.

[0026] To ensure the safety and stroke control of the slider 24 on the guide rail 22, a baffle 23 is fixedly connected to the front end of the guide rail 22 by welding. The baffle 23 is located at the end of the sliding path of the slider 24. The baffle 23 is used to mechanically limit the slider 24. The baffle 23 can prevent the slider 24 from slipping off the guide rail 22 when it moves the placement plate 25 out of the operation box 2 for loading and unloading operations.

[0027] Regarding the sealing structure of the control box 2, an integrally formed protrusion 10 is provided on the front side of the control box 2. The front surface of the protrusion 10 is slidably connected to the door body 11. A groove is provided on the circumferential side of the outer wall of the protrusion 10 to slidably connect a sealing ring 14. The sealing ring 14 is located between the mating surfaces of the door body 11 and the control box 2. The sealing ring 14 is made of compression-resistant rubber. The sealing ring 14 is used to generate elastic deformation when the door body 11 is closed to fill the tiny gaps between the door body 11 and the protrusion 10. The sealing ring 14 thus ensures the airtightness of the inside of the control box 2 to meet the vacuum processing conditions.

[0028] The left edge of the door 11 is hinged to the left outer wall of the control box 2 via two hinges 12. The hinges 12 are used to support the door 11 and provide rotational opening and closing freedom. A handle 13 is welded to the front surface of the door 11. The handle 13 is used to facilitate the operator to pull the door 11 to rotate around the axis of the hinge 12.

[0029] To keep the door 11 tightly closed during vacuuming and processing, a locking block 15 is fixedly connected to the right edge of the door 11. A lock body 16 is fixedly connected to the right outer wall of the control box 2 at the position corresponding to the locking block 15. The lock body 16 has a buckling mechanism inside that matches the locking block 15. The locking block 15 and the lock body 16 are engaged and connected. The lock body 16 is used to lock the door 11 and resist the rebound force of the sealing ring 14 and changes in internal air pressure. A through hole is opened at the center of the door 11 and an observation window 27 is embedded therein. The observation window 27 is made of transparent tempered glass. The observation window 27 is used to allow personnel to observe the real-time status of internal laser micro-nano control and magnetron sputtering deposition while maintaining a seal.

[0030] To create a vacuum environment inside the operating box 2 to meet the requirements of the magnetron sputtering process, a vacuum valve 5 is fixedly connected to the outer left side wall of the operating box 2 by welding. The inner port of the vacuum valve 5 passes through the side wall of the operating box 2 and communicates with the internal cavity of the operating box 2. The outer port of the vacuum valve 5 is designed as a standard vacuum interface for connecting external vacuum pumping equipment. The vacuum valve 5 is used to control the opening and closing of the vacuum pipeline.

[0031] To supply the process gas required for magnetron sputtering into the control box 2, a gas storage box 3 is fixedly installed on the top right surface of the workbench 1 via a bracket. A gas supply valve 6 is fixedly connected to the top of the right side wall of the control box 2. The right interface of the gas supply valve 6 is sealed and connected to the gas outlet of the gas storage box 3 via a connecting pipe 7. The connecting pipe 7 is made of high-pressure resistant metal pipe and engineering plastic pipe. The gas supply valve 6 is used to adjust the gas flow rate and switch status.

[0032] To promptly clean up dust and debris generated during laser micro-nano processing, a vacuum cleaner 4 is fixedly installed on the top right side of the workbench 1, in front of the air storage box 3. A vacuum valve 8 is fixedly connected to the bottom of the right side wall of the control box 2. The right side interface of the vacuum valve 8 is sealed and connected to the air inlet of the vacuum cleaner 4 through a connecting pipe 2 9. The connecting pipe 2 9 is used to construct a dust removal air duct. The vacuum valve 8 is used to open during the laser processing stage to cooperate with the vacuum cleaner 4 and to close during the coating stage to ensure a seal.

[0033] To achieve automated control of the device and coordinated operation of various components, a controller 26 is fixedly connected to the top of the front side wall of the control box 2 by bolts. The controller 26 integrates a PLC and a single-chip microcomputer control circuit. The controller 26 is electrically connected to the control terminals of the laser micro-nano control machine 20 and the magnetron sputtering machine 21 through wires. The output terminal of the controller 26 is electrically connected to the electrical control terminals of the vacuum cleaner 4, the vacuum valve 8, the air extraction valve 5, and the air supply valve 6. The controller 26 is also electrically connected to the moving motors of the drive slider 19 and the slider 24.

[0034] Working principle: When using the equipment, the door 11 is opened by pulling the handle 13 and rotating around the hinge 12. The substrate to be processed is placed on the placement plate 25. The door 11 is pushed to close, so that the lock block 15 and the lock body 16 are engaged. The sealing ring 14 is deformed by pressure, thereby sealing the operation box 2. Controller 26 controls slider 24 to move along guide rail 22, which moves placement plate 25 and substrate to below laser micro-nano control machine 20. At the same time, controller 26 drives slider 19 to move along sliding column 18 and links laser micro-nano control machine 20 to start. Laser micro-nano control machine 20 performs micro-nano structure control on substrate surface. Controller 26 simultaneously starts dust collection valve 8 and dust collector 4. Dust collector 4 removes processing debris from operation box 2 through connecting pipe 29. After the micro-nano structure is controlled, the dust collection valve 8 and the dust collector 4 are closed. The air extraction valve 5 is started by the controller 26. The external air extraction equipment extracts the air in the operation box 2 to form a vacuum chamber inside the operation box 2. The controller 26 controls the slider 24 to move along the guide rail 22 to move the substrate to the bottom of the magnetron sputtering machine 21. The controller 26 starts the gas supply valve 6. The process gas in the gas storage box 3 enters the operation box 2 through the connecting pipe 7 and the gas supply valve 6. The controller 26 starts the magnetron sputtering machine 21, which deposits a superhydrophobic film on the substrate surface. After the film deposition is completed, the controller 26 shuts off the magnetron sputtering machine 21 and the gas supply valve 6, pulls the handle 13 to open the door 11, and moves the placement plate 25 and the processed substrate out of the operation box 2 by the slider 24, so that the substrate completes the integrated processing of micro-nano structure control and superhydrophobic film deposition.

Claims

1. A micro / nano structure control device for superhydrophobic film deposition, comprising: Workbench (1), and operation box (2) fixedly installed on the top left side of the workbench (1); Its features are, The operation box (2) is fixedly connected to the left and right sides of the inside, and a sliding column (18) is fixedly connected between the mounting rings (17). A slider (19) is slidably connected to the outer wall of the sliding column (18). A laser micro-nano control machine (20) is fixedly connected to the bottom of the slider (19). A magnetron sputtering machine (21) is fixedly connected to the rear side of the top inside the operation box (2). The operation box (2) is fixedly connected to the left and right sides of the middle part of the control box (2). A slider (24) is slidably connected to the outer wall of the guide rail (22). A placement plate (25) is fixedly connected to the top of the slider (24). The controller (26) is fixedly connected to the top of the front side wall of the control box (2).

2. The micro / nano structure control device for superhydrophobic film deposition according to claim 1, characterized in that, A baffle (23) is fixedly connected to the front side of the guide rail (22), and the baffle (23) is used to limit the sliding stroke of the slider (24).

3. The micro / nano structure control device for superhydrophobic film deposition according to claim 1, characterized in that, The operation box (2) has a protrusion (10) on the front side, and a door (11) is slidably connected to the front side of the protrusion (10). A sealing ring (14) is slidably connected to the outer wall of the protrusion (10), and the sealing ring (14) is installed between the door (11) and the operation box (2).

4. The micro / nano structure control device for superhydrophobic film deposition according to claim 3, characterized in that, The left side of the door (11) is hinged to the left side of the control box (2) via a hinge (12). A handle (13) is fixedly connected to the front of the door (11). A lock block (15) is fixedly connected to the right side of the door (11). A lock body (16) is fixedly connected to the right side of the control box (2). The lock block (15) and the lock body (16) engage with each other. An observation window (27) is provided inside the door (11).

5. The micro / nano structure control device for superhydrophobic film deposition according to claim 1, characterized in that, An air extraction valve (5) is fixedly connected to the left side of the control box (2), and the air extraction valve (5) is used to connect to an external air extraction device.

6. The micro / nano structure control device for superhydrophobic film deposition according to claim 1, characterized in that, An air storage box (3) is installed on the top right side of the workbench (1). An air supply valve (6) is fixedly connected to the top right side of the operation box (2). A connecting pipe (7) is fixedly connected to the right side of the air supply valve (6). The bottom of the connecting pipe (7) is fixedly connected to the air storage box (3).

7. The micro / nano structure control device for superhydrophobic film deposition according to claim 1, characterized in that, A vacuum cleaner (4) is installed on the top right side of the workbench (1). A vacuum valve (8) is fixedly connected to the bottom right side of the operation box (2). A connecting pipe (9) is fixedly connected to the right side of the vacuum valve (8). The connecting pipe (9) is fixedly connected to the vacuum cleaner (4) on the right side.

8. The micro / nano structure control device for superhydrophobic film deposition according to claim 1, characterized in that, The controller (26) is electrically connected to the slider one (19), the slider two (24), the laser micro-nano control machine (20), the magnetron sputtering machine (21), the dust suction valve (8), the dust collector (4), the air extraction valve (5), and the air supply valve (6).

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