wet bench laboratory and silicon wafer production line

Abstract

The application relates to a wet machine laboratory and a silicon wafer production line, and belongs to the technical field of solar cells. The wet machine laboratory comprises a clean room with a clean door, a wet machine arranged in the clean room, a rack arranged in the clean room, a climbing ladder comprising a ladder body and a supporting leg assembly, the supporting leg assembly is arranged at the bottom of the ladder body, the height of the supporting leg assembly is adjustable, so that the total height h of the climbing ladder changes between h1 and h2, when h=h1, the climbing ladder can pass through the clean door, and when h=h2, the ladder body can be docked with the rack. The clean room of the wet machine laboratory is provided with the climbing ladder, the height of the climbing ladder is adjustable, the climbing ladder can smoothly pass through the clean door and can be docked with the rack, and the convenience is high. The application further provides a silicon wafer production line comprising the wet machine laboratory.

Description

Technical Field

[0001] This application relates to the field of solar cell technology, and more specifically, to a wet process laboratory and a silicon wafer production line. Background Technology

[0002] Wet etching machines, as crucial equipment in silicon wafer manufacturing, use chemical liquids to clean, etch, or polish silicon wafers, ensuring surface quality and precision for subsequent processes. These processes demand extremely high cleanliness; even minute contaminants can affect wafer quality. Therefore, wet etching machines must be placed in a cleanroom environment. The laboratory is equipped with workbenches, allowing workers to access the lab through cleanroom doors and use ladders to access the workbenches for maintenance and repair.

[0003] However, conventional ladders cannot pass through cleanroom doors, and setting steps inside the laboratory would waste space and increase the laboratory's operating costs. Utility Model Content

[0004] Therefore, this application proposes a wet process equipment laboratory and a silicon wafer production line. The cleanroom is equipped with a ladder with an adjustable height, which can not only pass through the cleanroom door smoothly, but also connect with the rack, thus providing high convenience.

[0005] The first aspect of this application, an embodiment of a wet processing machine laboratory, includes: a cleanroom with a clean door; a wet processing machine disposed inside the cleanroom; a frame disposed inside the cleanroom; and a ladder comprising a ladder body and a support assembly, the support assembly being disposed at the bottom of the ladder body, the height of the support assembly being adjustable so that the total height h of the ladder varies between h1 and h2; when h = h1, the ladder can pass through the clean door; when h = h2, the ladder body can connect with the frame.

[0006] Optionally, the support assembly includes: a bracket disposed at the bottom of the ladder body, the bracket having a threaded hole; a lifting rod threadedly engaged with the threaded hole; and a support leg disposed at the bottom of the lifting rod; the lifting rod is configured to drive the support leg to rise and fall by rotating about its own axis.

[0007] Optionally, the lifting rod is provided with a handle for a person to hold and rotate the lifting rod.

[0008] Optionally, the ladder body includes: a frame, with the support leg assembly disposed at the bottom of the frame; a docking plate disposed at the front end of the frame for docking with the platform; and a footboard assembly disposed on the frame for connecting the ground and the docking plate.

[0009] Optionally, the end of the docking plate has a connecting portion for detachably connecting to the platform.

[0010] Optionally, the docking plate is foldably disposed on the frame to switch between an extended position and a retracted position; when the docking plate is in the extended position, the docking plate extends away from the frame; when the docking plate is in the retracted position, the docking plate is fitted against the frame.

[0011] Optionally, the ladder body includes a connecting assembly, which includes: a hinge assembly, one side of which is connected to the frame and the other side of which is connected to the docking plate; and a stop for fixing the docking plate in the extended position.

[0012] Optionally, the mating plate is detachably connected to the hinge assembly.

[0013] Optionally, the distance between the platform and the cleanroom door is L1, and the length of the ladder body is L2, satisfying: L1 < L2.

[0014] The silicon wafer production line of the second aspect of this application includes the wet process laboratory described in the first aspect of this application.

[0015] Compared with existing technologies, this solution has the following advantages:

[0016] In this embodiment of the wet processing laboratory, the ladder is separated from the cleanroom, and the ladder's overall height is adjustable via a support assembly. On one hand, the ladder can smoothly pass through the cleanroom door and connect with the processing rack, allowing personnel to access the rack for maintenance. On the other hand, when maintenance is not required, it can be placed outside the cleanroom, without occupying internal space. This wet processing laboratory, equipped with an adjustable ladder, not only offers high convenience but also provides ample cleanroom space for arranging the wet processing equipment, thus improving silicon wafer processing efficiency.

[0017] Additional aspects and advantages of this application will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of this application. Attached Figure Description

[0018] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this application and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0019] Figure 1 A schematic diagram illustrating h=h1 of a wet processing laboratory provided in an embodiment of this application;

[0020] Figure 2 A schematic diagram illustrating h = h2 of the wet processing laboratory provided in this embodiment of the application;

[0021] Figure 3 A schematic diagram illustrating L1 < L2 in the wet processing laboratory provided in this embodiment of the application;

[0022] Figure 4 A schematic diagram of the ladder for the wet processing laboratory provided in this application embodiment;

[0023] Figure 5 A schematic diagram of the support assembly of the wet processing laboratory provided in an embodiment of this application;

[0024] Figure 6 A schematic diagram of the connection portion of the docking plate of the wet processing laboratory provided in this application embodiment. Figure 1 ;

[0025] Figure 7 A schematic diagram of the connection portion of the docking plate of the wet processing laboratory provided in this application embodiment. Figure 2 ;

[0026] Figure 8 A schematic diagram of the connection components of the wet processing laboratory provided in this application embodiment.

[0027] Icons: 100-Wet process machine laboratory; 110-Cleanroom; 111-Cleanroom door; 112-Clean space; 120-Wet process machine; 130-Frame; 131-Manual passage; 132-Second slot; 133-U-pin; 140-Ladder; 141-Ladder body; 1411-Frame; 1412-Connecting plate; 1413-Pedal assembly; 1414-Pedal; 1415-Connecting part; 1416-Through hole; 1417-Handrail; 1418-First slot; 1419-Storage surface; 142-Legged assembly; 1421-Bracket; 1422-Threaded hole; 1423-Lifting rod; 1424-Legged foot; 1425-Handle; 143-Connecting assembly; 1431-Hinged assembly; 1432-Stop; 1433-Pin hole. Detailed Implementation

[0028] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. The components of the embodiments of this application described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0029] Therefore, the following detailed description of the embodiments of this application provided in the accompanying drawings is not intended to limit the scope of the claimed application, but merely to illustrate selected embodiments of the application. All other embodiments obtained by those skilled in the art based on the embodiments of this application without inventive effort are within the scope of protection of this application.

[0030] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.

[0031] like Figure 1 , Figure 2 and Figure 3 As shown, in some embodiments of this application, a wet processing laboratory 100 includes a cleanroom 110, a wet processing machine 120, a frame 130, and a ladder 140. The cleanroom 110 has a cleanroom door 111, and both the wet processing machine 120 and the frame 130 are located inside the cleanroom 110. The ladder 140 includes a ladder body 141 and a support assembly 142. The support assembly 142 is located at the bottom of the ladder body 141, and its height is adjustable so that the total height h of the ladder 140 varies between h1 and h2. When h = h1, the ladder 140 can pass through the cleanroom door 111; when h = h2, the ladder body 141 can connect with the frame 130.

[0032] Cleanroom door 111 is located on one side of cleanroom 110 along the first direction X. The interior of cleanroom 110 has clean space 112. Wet lithography machine 120 and frame 130 are both located in clean space 112. Frame 130 has manual passage 131 for staff to use in order to inspect and maintain wet lithography machine 120.

[0033] In this embodiment of the wet processing laboratory 100, the ladder 140 is separately installed from the cleanroom 110, and the ladder 140's total height h can be adjusted via the support assembly 142. On one hand, the ladder 140 can smoothly pass through the cleanroom door 111 and connect with the worktable 130, allowing personnel to access the worktable 130 for maintenance. On the other hand, when maintenance is not required, it can be placed outside the cleanroom 110 without occupying internal space. This wet processing laboratory 100, equipped with an adjustable ladder 140, not only offers high convenience but also provides ample cleanroom space 112 for arranging the wet processing machine 120, thus improving silicon wafer processing efficiency.

[0034] like Figure 5 As shown, in some embodiments of this application, the support assembly 142 includes a bracket 1421, a lifting rod 1423, and a support leg 1424. The bracket 1421 is disposed at the bottom of the ladder body 141. The bracket 1421 is provided with a threaded hole 1422. The lifting rod 1423 is threadedly engaged with the threaded hole 1422. The support leg 1424 is disposed at the bottom of the lifting rod 1423. The lifting rod 1423 is configured to drive the support leg 1424 to rise and fall by rotating about its own axis.

[0035] The lifting rod 1423 has a vertically extending first axis P, the support leg 1424 is made of wear-resistant and non-slip material such as rubber, and the bracket 1421 is fixed to the bottom of the frame 1411 of the ladder body 141 by welding or threaded connection. The frame 1411 has a through hole 1416 for the lifting rod 1423 to pass through.

[0036] With this configuration, the height position of the support leg 1424 can be adjusted simply and reliably, thereby adjusting the total height h of the ladder 140.

[0037] In other embodiments, casters may be used instead of legs 1424 to make ladder 140 easy to move; or legs 1424 may be driven to rise and fall in other ways, such as by cylinders or electric cylinders.

[0038] In some embodiments of this application, a handle 1425 is provided on the lifting rod 1423 for a person to hold and rotate the lifting rod 1423.

[0039] The handle 1425 is welded to the lifting rod 1423 or formed as a single piece.

[0040] By setting handle 1425, the lifting rod 1423 can be driven to rotate easily and reliably.

[0041] In other embodiments, the lifting rod 1423 can also be rotated by a motor.

[0042] In some embodiments of this application, four support leg assemblies 142 are provided, respectively located at the four corners of the bottom of the ladder body 141.

[0043] The bottom of the frame 1411 is rectangular or square, and four support components 142 are respectively set at the four corners of the bottom of the frame 1411.

[0044] This design reduces the risk of the ladder body 141 tipping over and increases its load-bearing capacity.

[0045] In other embodiments, the support assembly 142 may also be three, five, six, etc.

[0046] like Figure 4 As shown, in some embodiments of this application, the ladder body 141 includes a frame 1411, a docking plate 1412, and a foot assembly 1413. The foot assembly 142 is disposed at the bottom of the frame 1411, the docking plate 1412 is disposed at the front end of the frame 1411 for docking with the platform 130, and the foot assembly 1413 is disposed on the frame 1411 for connecting the ground and the docking plate 1412.

[0047] The docking plate 1412 is located at one end of the frame 1411 along the first direction X near the platform 130. The pedal assembly 1413 includes multiple pedals 1414, which gradually rise from the ground until they dock with the docking plate 1412. Workers can reach the docking plate 1412 through the pedals 1414.

[0048] The pedal 1414 is welded to the frame 1411, or it can be assembled by threaded parts.

[0049] The top of the frame 1411 has two handrails 1417, which are respectively located on both sides of the top footrest 1414.

[0050] This configuration allows workers to easily ascend the docking plate 1412 via the pedal assembly 1413 and then enter the manual passage 131 of the platform 130 via the docking plate 1412.

[0051] It is understood that the total height of the ladder 140 refers to the distance h from the top of the handrail 1417 to the ground, the height of the manual passage 131 along the vertical direction Z is H1, and the height of the cleanroom door 111 along the vertical direction Z is H2. When E = H1, the docking plate 1412 can dock with the platform 130; when h < H2, the ladder 140 can pass through the cleanroom door 111. By adjusting the support assembly 142, the total height h of the ladder 140 can be adjusted from h2 to h1, where h < H2, allowing the ladder 140 to smoothly enter and exit the cleanroom door 111.

[0052] For example, h1 = 1.35, h2 = 1.55m, H1 = 0.79m, H2 = 1.42m. If h is adjusted from 1.55m to 1.35m, the ladder 140 can pass through the cleanroom door 111 at 1.42m. If h is raised to 1.55, E = 0.79m, and the docking plate 1412 is flush with the manual passage 131, staff can enter the manual passage 131 through the step assembly 1413 and the docking plate 1412.

[0053] like Figure 6 and Figure 7 As shown, in some embodiments of this application, the end of the docking plate 1412 has a connecting portion 1415 for detachably connecting to the stand 130.

[0054] The docking plate 1412 is provided with a first slot 1418 on the side of the platform 130 along the first direction X, and the platform 130 is provided with a second slot 132. By inserting a U-shaped pin 133 into the first slot 1418 and the second slot 132, the relative positions of the docking plate 1412 and the platform 130 in the first direction X and the second direction Y can be fixed.

[0055] This configuration allows the connecting plate 1412 of the ladder 140 to be assembled with the platform 130, preventing the ladder 140 from shifting or tipping over and ensuring the safety of the staff.

[0056] In other embodiments, the relative position between the docking plate 1412 and the platform 130 can also be fixed in other ways.

[0057] like Figure 4 As shown, in some embodiments of this application, the docking plate 1412 is foldably disposed on the frame 1411 to switch between an extended position and a retracted position; when the docking plate 1412 is in the extended position, the docking plate 1412 extends away from the frame 1411; when the docking plate 1412 is in the retracted position, the docking plate 1412 is fitted to the frame 1411.

[0058] The docking plate 1412 is hinged to the frame 1411 via a hinge assembly 1431 to switch between an extended position and a retracted position.

[0059] Specifically, when the connecting plate 1412 is in the extended position, the connecting plate 1412 extends horizontally and is set perpendicular to the storage surface 1419 of the frame 1411; when the connecting plate 1412 is in the retracted position, the connecting plate 1412 is vertically downward and is set in close contact with the storage surface 1419.

[0060] With this configuration, when the docking plate 1412 is in the retracted position, the center of gravity of the entire ladder 140 is close to the geometric center of the ladder body 141, reducing the risk of tipping over during transport.

[0061] like Figure 8 As shown, in some embodiments of this application, the ladder body 141 includes a connecting assembly 143, which includes a hinge assembly 1431 and a stop 1432. One side of the hinge assembly 1431 is connected to the frame 1411, and the other side is connected to the docking plate 1412. The stop 1432 is used to fix the docking plate 1412 in the extended position.

[0062] The hinge assembly 1431 is a hinge, with its two sides connected to the frame 1411 and the mating plate 1412, respectively. The frame 1411 is provided with a stop 1432, and the mating plate 1412 is provided with a corresponding pin hole 1433. The stop 1432 is a pin, which is inserted horizontally into the corresponding pin hole 1433 to lock the mating plate 1412 in the extended position.

[0063] This configuration allows the docking plate 1412 to be fixed in the extended position, ensuring that the docking plate 1412 is flush with the manual passage 131 of the platform 130, thus improving the safety of workers.

[0064] In other embodiments, the docking plate 1412 can also be locked in the extended position in other ways. For example, a gas spring is connected between the frame 1411 and the docking plate 1412, and the docking plate 1412 is fixed in the extended position by the gas spring.

[0065] In some other embodiments of this application, the connecting assembly 143 also includes a cam handle. The cam handle is manually held and rotated counterclockwise by 90° to lift the docking plate 1412 upward, connecting the docking plate 1412 to the frame 130 via a U-shaped pin 133. The cam handle is then turned clockwise by 90° to lock the docking plate 1412, and the stop 1432 is inserted to lock the docking plate 1412 in the extended position.

[0066] In some embodiments of this application, the mating plate 1412 is detachably connected to the hinge assembly 1431.

[0067] For example, the mating plate 1412 and the hinge assembly 1431 are assembled and connected by threaded parts and bolts; another example is that the mating plate 1412 and the hinge assembly 1431 are snap-fit ​​connected, and so on.

[0068] This configuration allows for the replacement of docking plates 1412 of different lengths to match different stands 130.

[0069] like Figure 3As shown, in some embodiments of this application, the distance between the stand 130 and the clean door 111 is L1, and the length of the ladder body 141 is L2, satisfying: L1 < L2.

[0070] The distance between the outer edge of the platform 130 and the clean door 111 along the first direction X is L1, and the length of the bottom of the ladder body 141 along the first direction X is L2. That is to say, the distance in which the ladder 140 can be arranged inside the clean door 111 is L1. This distance is less than the distance required for the ladder 140. When the ladder 140 is connected to the platform 130, part of the ladder 140 is located outside the clean door 111.

[0071] For example, L1 = 1m, L2 = 1.2m.

[0072] When the docking plate 1412 is in the extended position, the docking plate 1412 can be connected to the platform 130 or at least partially rest on the platform 130.

[0073] This configuration improves the space utilization of the cleanroom 110, allows for the placement of more wet cleaning machines 120, and enhances the compactness of the cleanroom 110 layout.

[0074] In some embodiments of this application, the frame 1411 is also provided with a grounding copper wire. After the ladder 140 is connected to the platform 130, the grounding copper wire is connected to the main grounding busbar of the wet processing machine 120, which improves the safety of the workers.

[0075] Some embodiments of the silicon wafer production line in this application include a wet processing laboratory 100.

[0076] Due to the characteristics of the wet process laboratory 100 in this embodiment, the silicon wafer production line in this embodiment has a compact layout and reduces manufacturing costs.

[0077] It should be noted that, where there is no conflict, the features in the embodiments of this application can be combined with each other.

[0078] The above description is merely a preferred embodiment of this application and is not intended to limit this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A wet process laboratory apparatus (100), characterized in that, include: A clean room (110) with a clean door (111); A wet processing machine (120) is installed inside the cleanroom (110); A stand (130) is installed inside the cleanroom (110); A ladder (140) includes a ladder body (141) and a support assembly (142). The support assembly (142) is disposed at the bottom of the ladder body (141). The height of the support assembly (142) is adjustable so that the total height h of the ladder (140) varies between h1 and h2. When h = h1, the ladder (140) can pass through the cleanroom door (111); When h = h2, the ladder body (141) can dock with the platform (130).

2. The wet process laboratory (100) according to claim 1, characterized in that, The support assembly (142) includes: A bracket (1421) is provided at the bottom of the ladder body (141), and the bracket (1421) is provided with a threaded hole (1422); The lifting rod (1423) is threaded into the threaded hole (1422); Support legs (1424) are provided at the bottom of the lifting rod (1423); The lifting rod (1423) is configured to drive the outrigger (1424) to rise and fall by rotating about its own axis.

3. The wet process laboratory (100) according to claim 2, characterized in that, The lifting rod (1423) is provided with a handle (1425) for a person to hold and drive the lifting rod (1423) to rotate.

4. The wet process laboratory (100) according to claim 1, characterized in that, The ladder body (141) includes: A frame (1411), wherein the support leg assembly (142) is disposed at the bottom of the frame (1411); A docking plate (1412) is disposed at the front end of the frame (1411) for docking with the platform (130); A pedal assembly (1413), disposed on the frame (1411), is used to connect the ground to the docking plate (1412).

5. The wet process laboratory (100) according to claim 4, characterized in that, The end of the docking plate (1412) has a connecting part (1415) for detachably connecting to the platform (130).

6. The wet process laboratory (100) according to claim 5, characterized in that, The docking plate (1412) is foldably disposed on the frame (1411) to switch between an extended position and a retracted position; When the docking plate (1412) is in the extended position, the docking plate (1412) extends away from the frame (1411); When the docking plate (1412) is in the retracted position, the docking plate (1412) is fitted to the frame (1411).

7. The wet process laboratory (100) according to claim 6, characterized in that, The ladder body (141) includes a connecting component (143), the connecting component (143) comprising: A hinge assembly (1431), one side of which is connected to the frame (1411) and the other side is connected to the mating plate (1412); A stop (1432) is used to fix the docking plate (1412) in the extended position.

8. The wet process laboratory (100) according to claim 7, characterized in that, The docking plate (1412) is detachably connected to the hinge assembly (1431).

9. The wet process laboratory (100) according to claim 1, characterized in that, The distance between the platform (130) and the cleanroom door (111) is L1, and the length of the ladder body (141) is L2, satisfying: L1 < L2.

10. A silicon wafer production line, characterized in that, Includes the wet processing laboratory (100) as described in any one of claims 1 to 9.

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