Process furnace vacuum system and semiconductor production apparatus

Abstract

The utility model discloses a kind of process furnace vacuum system and semiconductor production equipment, including a vacuum pump, and the pipeline system being communicated with the vacuum pump and process furnace, the process furnace includes process cavity, jacket cavity and furnace door sealing cavity, the pipeline system includes the furnace tube branch being communicated with the process cavity, the jacket branch being communicated with the jacket cavity and the furnace door branch being communicated with the furnace door sealing cavity, and detection device and control valve being set on each branch.The utility model is by in the process cavity of process furnace, jacket cavity and furnace door sealing cavity respectively setting branch, and utilize single vacuum pump and main pipe and each branch communication, cooperate flow regulating valve, pressure relief assembly and pressure monitor, realize the vacuum air extraction of multiple parts, inflation break vacuum and overpressure protection.Entire scheme compact structure, control precision, significantly improve the safety, reliability and operating efficiency of process furnace vacuum system.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor process technology, and in particular to a process furnace vacuum system and semiconductor production equipment. Background Technology

[0002] SiC material possesses extremely high chemical stability and hardness, making it more stable under high temperature and high pressure environments. However, this also makes it difficult to directly apply traditional silicon-based processes. After ion implantation, it needs to be heated in a process furnace to activate its electroactivity, i.e., annealing, at temperatures as high as 2000℃. Ordinary metal resistance wires are difficult to meet the requirements. Taking non-metallic resistance graphite heaters as an example, they cannot be directly heated in an atmospheric environment. The heater is located in a jacketed cavity outside the process chamber of the reactor. Therefore, the jacketed cavity needs to be evacuated and an inert gas atmosphere needs to be introduced to protect the heater from oxidation. The process chamber of the process furnace also needs to be evacuated before annealing. In addition, the furnace door needs to have good sealing when the process furnace is working. Vacuuming is required when the furnace door is closed to protect the safety of the equipment during operation, and vacuuming is required when the door is opened to facilitate smooth opening.

[0003] Therefore, multiple parts of the process furnace require vacuum control. If each part requiring vacuum control uses an independent vacuum control device, the equipment structure will become complex and the cost will increase. Utility Model Content

[0004] To solve at least one of the above-mentioned technical problems, on the one hand, this utility model provides a process furnace vacuum system, which uses a pipeline system with only one vacuum pump to achieve vacuum control of multiple parts of the process furnace, and has the advantages of simple structure and convenient control.

[0005] On the other hand, this utility model also proposes a semiconductor manufacturing equipment having the aforementioned process furnace vacuum system.

[0006] The technical solution adopted in this utility model is to design a process furnace vacuum system, including a vacuum pump and a pipeline system connecting the vacuum pump and the process furnace. The process furnace includes a process chamber, a jacketed chamber and a furnace door sealing chamber. The pipeline system includes a furnace tube branch connecting the process chamber, a jacketed branch connecting the jacketed chamber and a furnace door branch connecting the furnace door sealing chamber, as well as detection devices and control valves installed on each branch.

[0007] In some embodiments, a flow regulating valve is provided on the jacket branch, and a pressure relief branch is connected between the flow regulating valve and the jacket cavity, and a pressure relief component is provided on the pressure relief branch.

[0008] In some embodiments, a flow regulating valve is provided on the furnace tube branch, and a pressure relief branch is connected between the flow regulating valve and the process chamber, and a pressure relief component is provided on the pressure relief branch.

[0009] In some embodiments, the flow regulating valve is a two-stage pneumatic angle valve.

[0010] In some embodiments, a one-way valve and a pneumatic valve are provided on the furnace door branch. When the pneumatic valve is open, the one-way valve opens when the vacuum pump draws a vacuum. A pressure relief branch is connected between the one-way valve and the furnace door sealing cavity, and a pressure relief component is provided on the pressure relief branch.

[0011] In some embodiments, the pressure relief assembly includes a pressure relief valve and a filter in communication with the pressure relief valve.

[0012] In some embodiments, the pressure relief assembly includes a pneumatic valve and a check valve. When the pneumatic valve is open, the check valve opens when the air pressure in the pressure relief branch reaches a set pressure.

[0013] In some implementations, the pressure relief assembly includes a pressure monitor.

[0014] In some embodiments, the vacuum pump is connected to each branch via a main pipe, and a pressure detector for detecting the pressure of the main pipe is provided on the main pipe.

[0015] A semiconductor manufacturing apparatus, including the aforementioned process furnace vacuum system.

[0016] Compared with the prior art, the present invention has the following beneficial effects:

[0017] This invention establishes branch circuits in the process chamber, jacket chamber, and furnace door sealing chamber of the process furnace, connecting each branch circuit with a single vacuum pump and main pipe. Combined with flow regulating valves, pressure relief components, and pressure monitors, it achieves multi-part vacuum evacuation, vacuum breaking during filling, and overpressure protection. Each branch circuit monitors pressure in real time via vacuum gauges and pressure gauges, and precise flow regulation and safe pressure relief are achieved through switching between pneumatic valves and check valves. This avoids particle disturbance caused by rapid evacuation, shortens the time to reach high vacuum, and prevents overpressure damage during filling. A pressure detector is installed in the main pipe for overall vacuum monitoring, and a KF interface allows for flexible connection of branch circuits, simplifying the structure and reducing costs. The overall solution is compact, provides precise control, and significantly improves the safety, reliability, and operating efficiency of the process furnace vacuum system. Attached Figure Description

[0018] The present invention will now be described in detail with reference to specific embodiments and accompanying drawings. To illustrate the details and facilitate understanding of its principles, the drawings are not necessarily to scale, and similar reference numerals may describe similar components in different views. The accompanying drawings generally illustrate the embodiments discussed herein by way of example and not limitation. Wherein:

[0019] Figure 1 This is a schematic diagram of the vacuum system of the process furnace in the embodiment.

[0020] Figure 2 This is a schematic diagram showing how each branch line connects to the main line.

[0021] Figure 3 This is a schematic diagram of a jacketed branch.

[0022] Figure 4 This is a schematic diagram of the furnace tube branch.

[0023] Figure 5 This is a schematic diagram of the furnace door branch circuit.

[0024] In the diagram, 1. Process chamber; 2. Jacketed chamber; 3. Furnace door sealing chamber; 4. Furnace tube branch; 5. Jacketed branch; 6. Furnace door branch; 7. Double-stage pneumatic angle valve; 8. Pressure relief branch; 9. Pneumatic valve; 10. Check valve; 11. Pressure gauge; 12. Vacuum gauge; 13. Pressure relief valve; 14. Filter; 15. Vacuum pump; 16. Main pipe; 17. Blind flange; 18. KF vacuum flange pipe interface. Detailed Implementation

[0025] The following are specific embodiments of this utility model, and the technical solution of this utility model will be further described with reference to the accompanying drawings. However, this utility model is not limited to these embodiments, and the following embodiments do not limit the utility model involved in the claims. In addition, all combinations of features described in the embodiments are not necessarily necessary for the solution of the utility model.

[0026] The principle and structure of this utility model will be described in detail below with reference to the accompanying drawings and embodiments.

[0027] Example

[0028] like Figure 1 , 2 As shown, the process furnace vacuum system of this utility model includes a vacuum pump 15 and a pipeline system connecting the vacuum pump 15 and the process furnace. The process furnace includes a process chamber 1, a jacketed chamber 2 and a furnace door sealing chamber 3. The pipeline system includes a furnace tube branch 4 connecting the process chamber 1, a jacketed branch 5 connecting the jacketed chamber 2 and a furnace door branch 6 connecting the furnace door sealing chamber 3, as well as detection devices and control valves installed on each branch.

[0029] By setting up branches connected to vacuum pump 15 in process chamber 1, jacket chamber 2 and furnace door sealing chamber 3 respectively, and with the detection device and control valve on the branch, the function of selectively pumping and controlling the pressure of multiple independent vacuum environments at different locations by a single vacuum pump 15 is realized.

[0030] Specifically, when the process chamber 1 needs to be annealed, the control valve of the furnace tube branch 4 can be opened, and the vacuum pump 15 can be used to quickly evacuate the process chamber 1 and the vacuum level can be monitored in real time by the detection device, thereby ensuring the low-pressure environment required for annealing.

[0031] When the jacket cavity 2 where the heater is located needs inert atmosphere protection, other branches are closed and only the jacket branch 5 is opened, so that the vacuum pump 15 first draws the jacket cavity 2 to a low pressure, and then introduces inert gas to form a protective atmosphere to prevent the graphite heater from oxidizing.

[0032] During the opening and closing of the furnace door, the vacuum or vacuum breaking of the sealing cavity can be achieved through the control valve of the furnace door branch 6. The furnace door evacuation branch can check and judge the sealing condition of the furnace door, ensuring that the furnace door has good sealing performance and safety when closed, and smoothly release the negative pressure difference when opened.

[0033] Since all three circuits are controlled collaboratively by the same vacuum pump 15 and piping system, the structural complexity and increased cost associated with setting up separate vacuum devices for each independent part in traditional solutions are avoided. This simplifies the system structure, increases piping integration, and facilitates operation and maintenance. Furthermore, the coordination between the detection device and the control valve improves the accuracy and reliability of vacuum control in each part, significantly enhancing the overall operating efficiency and safety of the process furnace. The three branches respectively serve the functions of protecting the atmosphere, participating in the reaction, and disrupting the furnace pressure. Structurally, one circuit serves three purposes, improving the working efficiency of the dry pump.

[0034] like Figure 3As shown, the jacket branch 5 is further equipped with a bipolar pneumatic angle valve 7 as a flow regulating valve. The flow regulating valve is connected to the pressure relief branch 8, on which a pneumatic valve 9 and a one-way valve 10 are arranged in sequence, working together with a pressure monitor to achieve pressure regulation and protection functions. When the jacket cavity 2 needs to be filled with gas to break the vacuum, if its pressure exceeds the set upper limit, the pneumatic valve 9 can be opened to allow the gas to be discharged through the one-way valve 10, thereby achieving pressure relief and preventing damage to the cavity or related components due to overfilling. At the same time, the pressure monitor, including a pressure gauge 11 with an alarm function, can not only display the pressure of the jacket cavity 2 in real time, but also has an alarm function to promptly alert the operator in abnormal operating conditions, improving system safety. On the other hand, the pressure monitor also includes a vacuum gauge 12, which can provide feedback detection signals at different vacuum levels to adjust the opening of the bipolar pneumatic angle valve 7. When the jacket cavity 2 is under low vacuum, the system uses a small flow rate for pumping to avoid adverse effects such as particle splashing and vibration caused by rapid pumping. When approaching high vacuum, it switches to a large flow rate pumping mode, effectively shortening the time to reach the required vacuum level and improving pumping efficiency. Thus, through the coordinated action of the bipolar pneumatic angle valve 7, the pressure relief assembly, and the pressure monitor, not only is safe pressure relief and overpressure protection of the jacket cavity 2 achieved, but also refined control and efficiency improvement are achieved during the pumping process, thereby further enhancing the stability and reliability of the process furnace vacuum system.

[0035] A double-stage pneumatic angle valve is an industrial valve that combines pneumatic control with an angle valve structure. Its core feature is the "double-stage" design, typically referring to the combination of a double-acting pneumatic actuator and an angle valve body. Double-stage (double-acting pneumatic actuator): The valve is controlled through two independent air passages (port A and port B), requiring the alternating flow of compressed air into both chambers to drive the piston in both directions (opening and closing). Compared to single-acting valves (relying on spring return), double-acting actuators are springless, resulting in more stable operation and suitability for scenarios requiring frequent operation or maintaining the valve position. The valve body's inlet and outlet are at 90-degree angles, with a compact flow path design, suitable for installations with pipe bends or limited space. The valve core is typically conical or spherical, adjusting flow rate by moving up and down. The double-stage design is similar to two parallel pipes, one for high flow and one for low flow; the double-stage valve replaces this design function.

[0036] In low vacuum environments (e.g., 1000 Pa to 0.1 Pa), gas molecule density is high, and gas flow may exhibit turbulence rather than molecular flow. Particles originate from residual dust and debris inside the furnace or pipelines; metal particles generated by mechanical wear of pumps or valves; and contaminants adsorbed on material surfaces released during pressure changes. If the pumping rate is too high (high-flow pumping), the turbulent airflow will lift particles and transport them into the system, contaminating sensitive components or products (such as semiconductor processes, vacuum coating, etc.). Particles may also be caused by deposits adhering to the inner wall of the exhaust pipe, which can easily detach due to vibration during high-flow pumping at normal pressure.

[0037] like Figure 4 As shown, the furnace tube branch 4 is also equipped with a bipolar pneumatic angle valve 7 as a flow regulating valve. A pressure relief branch 8 connects the flow regulating valve to the process chamber 1. A pneumatic valve 9 and a one-way valve 10 are sequentially arranged on the pressure relief branch 8, working in conjunction with a pressure monitor to achieve pressure control and safety protection of the process chamber 1. During the evacuation process, the vacuum gauge 12 can monitor the vacuum level of the process chamber 1 in real time and output the detection signal to the control system in analog form. The control system can adjust the opening of the bipolar pneumatic angle valve 7 according to the vacuum level: when the process chamber 1 is in a low vacuum state, the valve operates at a small opening to achieve a small flow rate of evacuation, thereby avoiding particle disturbance or vibration problems caused by excessively fast evacuation; when the process chamber 1 enters a high vacuum stage, the valve switches to a large opening to achieve a large flow rate of evacuation, effectively shortening the time to reach the background vacuum and improving the overall evacuation efficiency. Meanwhile, the pressure monitor, acting as a pressure gauge 11 with an alarm function, can preset the pressure alarm value for process chamber 1. During the gas filling and vacuum breaking process, if the pressure exceeds the set upper limit, the system can automatically control the pneumatic valve 9 to open, and use the one-way valve 10 to release the gas, thereby restoring the pressure balance of process chamber 1 and preventing the failure of the chamber seal or damage to equipment components due to overpressure. Thus, through the synergistic action of the flow regulating valve, the pressure relief component, and the pressure monitor, not only is dynamic and precise control of the pressure in process chamber 1 achieved, but also automatic overpressure relief and safety protection functions are provided, ensuring the stability, reliability, and equipment safety of process chamber 1 during annealing and gas filling processes.

[0038] Background vacuum refers to the vacuum level achieved by using a vacuum pumping system in vacuum coating to bring the gas in a certain space to a certain level, which is just enough to meet the vacuum level required for the deposition of the item being coated (different products have different requirements for background vacuum).

[0039] like Figure 5As shown, the furnace door branch 6 is further equipped with a one-way valve 10 and a pneumatic valve 9. When the pneumatic valve 9 is opened, the vacuum pump 15 draws air through the one-way valve 10 and acts on the furnace door sealing cavity 3, thereby quickly establishing a negative pressure environment. This negative pressure can not only be used as a means of testing the sealing performance of the furnace door, but also form a protective vacuum during process operation to avoid affecting the stability of the process due to furnace door leakage.

[0040] Meanwhile, a pressure relief branch 8 is provided between the one-way valve 10 and the furnace door sealing cavity 3. A pressure relief valve 13 and a filter 14 are connected in series on the pressure relief branch 8. When the furnace door needs to be opened, the pressure relief valve 13 is opened, so that the furnace door sealing cavity 3 is connected to the atmosphere through the filter 14.

[0041] The filter 14 is connected to the atmosphere, which can purify the incoming air and ensure that no particles or impurities are introduced during the inflation and vacuum breaking process.

[0042] The pressure monitor includes a pressure gauge 11 and a vacuum gauge 12, which can respectively realize pressure alarm and real-time vacuum detection. The vacuum gauge 12 detects pressure changes in the vacuum zone of the furnace door to accurately determine the sealing and operating status of the furnace door. The pressure gauge 11 can issue an alarm signal when the pressure is abnormal. Thus, through the coordinated action of the pneumatic valve 9, the one-way valve 10, the pressure relief assembly, and the pressure monitor, the furnace door sealing cavity 3 can maintain a reliable vacuum seal during the evacuation phase and can achieve controlled pressure relief and clean vacuum breaking operations under purging or abnormal conditions, thereby significantly improving the safety, reliability, and service life of the process furnace.

[0043] Furthermore, the vacuum pump 15 is connected to the process chamber 1 branch, the jacket branch 5, and the furnace door branch 6 via a main pipe 16. One end of the main pipe 16 is sealed with a blind flange 17, and the other end is connected to the suction port of the vacuum pump 15, forming the main suction channel. A pressure detector, which can be a vacuum gauge 12 or a pressure gauge 11, is installed on the main pipe 16 to detect changes in the vacuum level or pressure of the main pipe 16 in real time. By monitoring the vacuum level of the main pipe 16, the overall suction status of the vacuum pump 15 can be accurately reflected, and this information can be used as a basis for controlling the start and stop of the vacuum pump 15, speed adjustment, or suction mode switching, thereby achieving centralized management of the entire vacuum system. The jacket branch 5 and the process chamber 1 branch can be conveniently connected to the main pipe 16 via a KF vacuum flange pipe interface 18. This interface features reliable sealing and easy disassembly and assembly, facilitating modular assembly and maintenance of the system. When a branch line needs evacuation, simply opening the corresponding control valve allows vacuum pump 15 to connect to that branch line via main pipe 16, forming an evacuation channel. A pressure detector provides real-time feedback on the overall pressure level, ensuring the system remains stable and under control. Therefore, by installing a pressure detector on main pipe 16 and connecting each branch line using a KF interface, precise control and monitoring of vacuum pump 15 are achieved, while also simplifying the piping structure, improving the flexibility of installation, maintenance, and expansion, and ensuring the reliability and safety of the entire process furnace vacuum system. Furnace door branch line 6 is located beside main pipe 16, with its evacuation end connected to main pipe 16 via a VCR (Vacuum Coupling Radius Seal) connector.

[0044] A semiconductor manufacturing apparatus having the aforementioned process furnace vacuum system.

[0045] The specific embodiments described herein are merely illustrative examples illustrating the spirit of this utility model. Those skilled in the art to which this utility model pertains may make various modifications or additions to the described specific embodiments or use similar methods to replace them, without departing from the spirit of this utility model or exceeding the scope defined by the appended claims.

Claims

1. A vacuum system for a process furnace, characterized in that, The system includes a vacuum pump and a piping system connecting the vacuum pump to the process furnace. The process furnace includes a process chamber, a jacketed chamber, and a furnace door sealing chamber. The piping system includes a furnace tube branch connecting the process chamber, a jacketed branch connecting the jacketed chamber, and a furnace door branch connecting the furnace door sealing chamber, as well as detection devices and control valves installed on each branch.

2. The process furnace vacuum system according to claim 1, characterized in that, A flow regulating valve is provided on the jacket branch, and a pressure relief branch is connected between the flow regulating valve and the jacket cavity. A pressure relief component is provided on the pressure relief branch.

3. The process furnace vacuum system according to claim 1, characterized in that, A flow regulating valve is installed on the furnace tube branch, and a pressure relief branch is connected between the flow regulating valve and the process chamber. A pressure relief component is installed on the pressure relief branch.

4. The process furnace vacuum system according to claim 2 or 3, characterized in that, The flow regulating valve is a two-stage pneumatic angle valve.

5. The process furnace vacuum system according to claim 1, characterized in that, A one-way valve and a pneumatic valve are provided on the furnace door branch. When the pneumatic valve is open, the one-way valve is opened when the vacuum pump draws a vacuum. A pressure relief branch is connected between the one-way valve and the furnace door sealing cavity, and a pressure relief component is provided on the pressure relief branch.

6. The process furnace vacuum system according to claim 5, characterized in that, The pressure relief assembly includes a pressure relief valve and a filter connected to the pressure relief valve.

7. The process furnace vacuum system according to claim 2, 3, or 5, characterized in that, The pressure relief assembly includes a pneumatic valve and a check valve. When the pneumatic valve is open, the check valve opens when the air pressure in the pressure relief branch reaches the set pressure.

8. The process furnace vacuum system according to claim 2, 3, or 5, characterized in that, The pressure relief assembly includes a pressure monitor.

9. The process furnace vacuum system according to any one of claims 1-6, characterized in that, The vacuum pump is connected to each branch via a main pipe, and a pressure detector is installed on the main pipe to detect the pressure of the main pipe.

10. A semiconductor manufacturing apparatus, characterized in that, Includes the process furnace vacuum system as described in any one of claims 1-9.

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