Test device
Patent Information
- Application Number
- CN202521893898.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-09-03
- Publication Date
- 2026-10-30
- Estimated Expiration
- 2035-09-03
AI Technical Summary
目前技术中,光束质量分析仪的标定测试往往需要利用多个激光器,导致测试耗时长且繁琐,测试效率低且测试成本高
[0005]根据本申请的测试装置,一方面,输出光通过分光元件分成第一测试光束和第二测试光束,目标光束质量分析仪和参考光束质量分析仪分别接收第一测试光束和第二测试光束,并根据对应的第一测试光斑和第二测试光斑分别获得第一M2因子和第二M2因子,利用第二M2因子作为参考标准来对比第一M2因子,以判断目标光束质量分析仪是否合格。另一方面,由于测试光斑(包括第一测试光斑和第二测试光斑)均呈椭圆形,在激光器转动的过程中可以使目标光之后质量分析仪和参考光束质量分析仪分别获得多个第一M2因子和第二M2因子,相较于相关技术中需要用多个不同的激光器来测试目标光束质量分析仪,能提高测试效率和测试的灵活性,尽可能降低了测试成本,简化了测试流程。
Smart Images

Figure CN224921396U_ABST
Abstract
Description
Technical Field
[0001] This application belongs to the field of beam quality testing technology, and in particular relates to a testing device. Background Technology
[0002] To ensure the normal operation and expected functionality of far-field laser equipment, it is often necessary to rigorously test and control the quality of the laser beam using a beam quality analyzer. Currently, the calibration and testing of beam quality analyzers often require the use of multiple lasers, resulting in time-consuming and cumbersome testing processes with low efficiency and high costs. Utility Model Content
[0003] This application aims to address at least one of the technical problems existing in the related art. To this end, this application proposes a testing device that not only saves time and effort, but also improves testing efficiency and flexibility, minimizes testing costs, and simplifies the testing process.
[0004] In a first aspect, this application provides a testing apparatus for testing a target beam quality analyzer, the testing apparatus comprising: Installation platform; The laser is rotatably mounted on the mounting platform; A beam splitter is used to split the output light of the laser into a first test beam and a second test beam, so that the target beam quality analyzer receives the first test beam and forms a first test spot. A reference beam quality analyzer is used to receive the second test beam and form a second test spot; wherein, The rotation axis of the laser is parallel to the output light, and both the test spot and the reference spot are elliptical.
[0005] According to the testing apparatus of this application, on the one hand, the output light is split into a first test beam and a second test beam by a beam splitter. A target beam quality analyzer and a reference beam quality analyzer respectively receive the first test beam and the second test beam, and obtain the first M based on the corresponding first test spot and the second test spot. 2 Factor and Second M 2 Factor, using the second M 2 The factor is used as a reference standard to compare the first M. 2 Factors are used to determine whether the target beam quality analyzer is qualified. On the other hand, since the test spots (including the first and second test spots) are both elliptical, during the laser's rotation, the target beam quality analyzer and the reference beam quality analyzer can each obtain multiple first M factors. 2 Factor and Second M 2Compared to related technologies that require multiple different lasers to test the target beam quality analyzer, this factor improves testing efficiency and flexibility, minimizes testing costs, and simplifies the testing process.
[0006] According to one embodiment of this application, the laser M 2 The factor is greater than 1.2.
[0007] According to one embodiment of this application, the optical axis of the first test beam and the optical axis of the second test beam are set at an angle.
[0008] According to one embodiment of this application, the included angle is a right angle.
[0009] According to one embodiment of this application, one of the optical axes of the first test beam and the second test beam coincides with the optical axis of the output light.
[0010] According to one embodiment of this application, it also includes: A first aperture stop is disposed between the beam splitter and the target beam quality analyzer to limit the size of the first test beam.
[0011] According to one embodiment of this application, two first aperture stops are provided, and the two first aperture stops are spaced apart along the optical axis of the first test beam.
[0012] According to one embodiment of this application, it also includes: A second aperture stop is disposed between the beam splitter and the reference beam quality analyzer to limit the size of the second test beam.
[0013] According to one embodiment of this application, two second aperture stops are provided, and the two second aperture stops are spaced apart along the optical axis of the second test beam.
[0014] According to one embodiment of this application, it also includes: A rotary drive component has its fixed end mounted on the mounting platform and its output end connected to the laser for driving the laser to rotate.
[0015] Additional aspects and advantages of this application will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of this application. Attached Figure Description
[0016] The above and / or additional aspects and advantages of this application will become apparent and readily understood from the description of the embodiments taken in conjunction with the following drawings, in which: Figure 1This is a schematic diagram of the structure of the testing device provided in the embodiments of this application; Figure 2 This is a schematic diagram of the first test spot on the target beam quality analyzer provided in the embodiments of this application; Figure 3 This is a schematic flowchart of the testing method of the testing device provided in the embodiments of this application; Figure 4 This is a schematic diagram of the structure of the control device of the testing apparatus provided in the embodiments of this application; Figure 5 This is a schematic diagram of the structure of the electronic device provided in the embodiments of this application.
[0017] Figure label: 10. Target beam quality analyzer; 20. First test spot; 100. Laser; 200. Beam splitter; 300. Reference beam quality analyzer; 400. First aperture stop; 500. Second aperture stop; 600. Rotation drive. Detailed Implementation
[0018] The embodiments of this application are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this application, and should not be construed as limiting this application.
[0019] The following is for reference. Figures 1-2 This application describes a testing apparatus provided in an embodiment for testing a target beam quality analyzer 10. The testing apparatus includes a mounting platform, a laser 100, a beam splitter 200, and a reference beam quality analyzer 300.
[0020] A laser 100 is rotatably mounted on a mounting platform. A beam splitter 200 splits the output light of the laser 100 into a first test beam and a second test beam, so that a target beam quality analyzer 10 receives the first test beam and forms a first test spot 20. A reference beam quality analyzer 300 receives the second test beam and forms a second test spot. The rotation axis of the laser 100 is parallel to the output light, and both the test spot and the reference spot are elliptical. Exemplarily, the laser 100 includes, but is not limited to, a semiconductor laser 100. The beam splitter 200 includes, but is not limited to, a beam splitter prism.
[0021] Understandably, on the one hand, the output light is split into a first test beam and a second test beam by the beam splitter 200. The target beam quality analyzer 10 and the reference beam quality analyzer 300 receive the first test beam and the second test beam, respectively, and obtain the first M based on the corresponding first test spot 20 and the second test spot. 2 Factor and Second M 2 Factor, using the second M 2 The factor is used as a reference standard to compare the first M. 2 Factors are used to determine whether the target beam quality analyzer 10 is qualified. On the other hand, since the test spots (including the first test spot 20 and the second test spot) are both elliptical, during the rotation of the laser 100, the target beam quality analyzer and the reference beam quality analyzer 300 can obtain multiple first M factors respectively. 2 Factor and Second M 2 Compared to related technologies that require multiple different lasers 100 to test the target beam quality analyzer 10, this factor can improve testing efficiency and flexibility, minimize testing costs, and simplify the testing process.
[0022] For example, such as Figure 1 As shown, L1 represents the output beam, L2 represents the second test beam, and L3 represents the first test beam.
[0023] It should be noted that, in combination Figure 2 As shown, the test spot is elliptical. X' and Y' represent the coordinate system of the test beam (including the first and second test beams), and X and Y represent the coordinate system of the beam quality analyzer (including the target beam quality analyzer 10 and the reference beam quality analyzer 300). dx and dy represent the beam waist width of the laser 100 in the X and Y directions, respectively. Figure 2 As can be seen from this, dx and dy change continuously during the rotation of the test spot, thus affecting the corresponding M. 2 Factors (including the first M) 2 Factor and Second M 2 The factors are also constantly changing.
[0024] The testing apparatus provided in the embodiments of this application not only saves time and effort, but also improves testing efficiency and flexibility, minimizes testing costs, and simplifies the testing process.
[0025] In some embodiments, at least one of the beam splitter 200, the reference beam quality analyzer 300, and the target beam quality analyzer 10 may be mounted on the installation platform to provide integration of the entire test setup and improve space utilization.
[0026] In some implementations, the M of laser 100 2The factor is greater than 1.2.
[0027] Understandably, M 2 The factor defines the difference between the output light and the ideal Gaussian beam; it represents the ratio of the divergence angle of the output light to that of the ideal Gaussian beam. M 2 A factor of 1 indicates that the output light is an ideal Gaussian beam with the smallest divergence angle and optimal focusing performance. When M... 2 When the factor is greater than 1, the divergence angle of the output light increases, and the focusing performance deteriorates. 2 The larger the factor, the worse the quality of the output light. That is, using M... 2 Output light with a factor greater than 1.2 allows the laser 100 to rotate while multiple M values can be obtained by the same beam quality analyzer. 2 The larger difference between the factors helps to more accurately evaluate the target beam quality analyzer 10 based on the anisotropy of the beam quality itself, thus improving the test accuracy.
[0028] It should be noted that since the reference beam quality analyzer 300 has already been tested and determined to be qualified, the M of the laser 100... 2 A factor greater than 1.2 means that multiple second M values obtained by the reference beam quality analyzer 300 2 All factors must be greater than 1.2.
[0029] In some embodiments, the M of laser 100 2 A factor of 2.0 or less ensures that the output light has a certain divergence angle and focusing performance while reducing the possibility of output light distortion.
[0030] It should be noted that since the reference beam quality analyzer 300 has already been tested and determined to be qualified, the M of the laser 100... 2 A factor greater than 1.2 means that multiple second M values obtained by the reference beam quality analyzer 300 2 All factors must be greater than 1.2 and less than or equal to 2.0.
[0031] In some embodiments, such as Figure 1 As shown, the optical axes of the first test beam and the second test beam are set at an angle. It should be noted that the size of the angle can be designed according to actual needs, and this embodiment does not impose specific limitations on it.
[0032] It is understandable that the optical axes of the first test beam and the second test beam are set at an angle, so that the target beam quality analyzer 10 and the reference beam quality analyzer 300 can measure the beam quality of the same output light in different directions, making the structure of the entire detection device as compact as possible and enhancing the flexibility and comprehensiveness of the test.
[0033] In some embodiments, such as Figure 1 As shown, the included angle is a right angle. That is, the optical axes of the first and second test beams are perpendicular to each other, which ensures that the beam quality of the output light can be measured in two orthogonal directions, thereby improving the test accuracy and reliability.
[0034] In some embodiments, such as Figure 1 As shown, the optical axis of the first test beam and one of the optical axes of the second test beam coincide with the optical axis of the output light.
[0035] It is understandable that aligning the optical axis of the first or second test beam with the optical axis of the output beam ensures that the test beam directly reflects the characteristics of the output beam. This not only provides a reliable benchmark for evaluating the beam quality of the output beam, but also simplifies the alignment process between the test spot and the beam quality analyzer, simplifies the calibration process, and improves test accuracy and reliability.
[0036] In this embodiment, as Figure 1 As shown, the optical axis of the second test beam coincides with the optical axis of the output beam.
[0037] In some embodiments, such as Figure 1 As shown, the testing device also includes a first aperture stop 400, which is disposed between the beam splitter 200 and the target beam quality analyzer 10 to limit the size of the first test beam.
[0038] Understandably, the first aperture stop 400 is positioned between the beam splitter 200 and the target beam quality analyzer 10 to precisely control the diameter of the first measurement beam entering the target beam quality analyzer 10 and ensure that the first measurement beam maintains a consistent size during the measurement process, thereby improving the accuracy and repeatability of the measurement. Simultaneously, the first aperture stop 400 restricts the size of the first measurement beam, reducing edge effects and stray light influences, minimizing measurement errors and distortion of the first measurement spot shape, and improving the accuracy and repeatability of the first measurement. 2 The accuracy of factor measurement.
[0039] In some embodiments, such as Figure 1 As shown, there are two first aperture stops 400, and the two first aperture stops 400 are arranged at intervals along the optical axis of the first test beam.
[0040] Understandably, on the one hand, based on the principle that "two points determine a straight line," the optical axis of the first measuring beam can be precisely adjusted by adjusting the beam splitter 200, thereby improving the accuracy of the first measuring beam aligned with the target beam quality analyzer 10 and enhancing the reliability of the measurement results. On the other hand, the spacing between the two first aperture stops 400 can further reduce the edge effects and stray light of the first measuring beam, thus improving the accuracy of the measurement.
[0041] In some embodiments, such as Figure 1 As shown, the testing apparatus also includes a second aperture stop 500, which is disposed between the beam splitter 200 and the reference beam quality analyzer 300 to limit the size of the second test beam.
[0042] Understandably, the second aperture stop 500 is positioned between the beam splitter 200 and the reference beam quality analyzer 300 to precisely control the diameter of the second measurement beam entering the reference beam quality analyzer 300 and ensure that the second measurement beam maintains a consistent size during the measurement process, thereby improving the accuracy and repeatability of the measurement. Simultaneously, the second aperture stop 500 restricts the size of the second measurement beam, reducing edge effects and stray light influences, minimizing measurement errors, and reducing distortion of the second measurement spot shape, thus improving the accuracy and repeatability of the second measurement. 2 The accuracy of factor measurement.
[0043] In some embodiments, such as Figure 1 As shown, there are two second aperture stops 500, which are spaced apart along the optical axis of the second test beam.
[0044] Understandably, on the one hand, based on the principle that "two points determine a straight line," the optical axis of the second measuring beam can be precisely adjusted by adjusting the beam splitter 200, thereby improving the accuracy of the second measuring beam alignment with the reference beam quality analyzer 300 and enhancing the reliability of the measurement results. On the other hand, the spacing between the two second aperture stops 500 can further reduce the influence of edge effects and stray light on the second measuring beam, thus improving the accuracy of the measurement.
[0045] In some embodiments, such as Figure 1 As shown, the testing device also includes a rotary drive 600. The fixed end of the rotary drive 600 is disposed on the mounting platform, and the output end of the rotary drive 600 is connected to the laser 100 to drive the laser 100 to rotate. The rotary drive 600 includes, but is not limited to, a rotary motor.
[0046] Understandably, the fixed end of the rotary drive 600 is mounted on the installation platform, and its output end is connected to the laser 100, enabling precise control of the rotation angle and speed of the laser 100, thereby achieving beam quality measurement at multiple angles. Simultaneously, the use of the rotary drive 600 automates the testing process, reduces manual operation, and improves testing efficiency and measurement accuracy.
[0047] This application also provides a testing method using the above-described testing device.
[0048] The testing method of the testing device provided in this application embodiment can be executed by an electronic device or a functional module or functional entity in an electronic device that can implement the testing method of the testing device. The electronic devices mentioned in this application embodiment include, but are not limited to, mobile phones, tablets, computers, cameras and wearable devices. The testing method of the testing device provided in this application embodiment will be described below using an electronic device as the execution subject.
[0049] like Figure 3 As shown, the testing method of this testing device includes steps 710 and 720.
[0050] Step 710: Control the laser 100 to rotate, and obtain multiple first M values through the target beam quality analyzer 10. 2 Factors, obtained by a reference beam quality analyzer 300, are multiple second M factors. 2 Factor, first M 2 Factor and Second M 2 One-to-one correspondence between factors.
[0051] It should be noted that multiple first M 2 Factors and obtaining multiple second M 2 The factors can be obtained in a specific order or at the same time; this embodiment does not impose any specific restrictions on this.
[0052] It is understandable that after the laser 100 rotates by a certain angle, the target beam quality analyzer 10 obtains the first M based on the first test spot 20. 2 The factor, the reference beam quality analyzer 300 obtains the second M based on the second test spot. 2 factor.
[0053] It should be noted that, since the test spot is elliptical, the corresponding dx and dy are obtained in the x and y directions respectively, and the corresponding M is obtained based on dx and dy. 2 Factor. It should be noted that M is determined based on the waist width. 2 Factors are a common technique in this field, and will not be described in detail in this embodiment.
[0054] Step 720, based on the first M 2 Factor and Second M 2 Factors are used to determine whether the target beam quality analyzer 10 is qualified.
[0055] Understandably, this can be achieved by directly comparing the first M. 2 The value of the factor and the second M 2 The difference between the values of the factors is used, and if all differences are less than a first threshold, the target beam quality analyzer 10 is deemed qualified; otherwise, it is deemed unqualified. Alternatively, multiple first M values can be considered. 2 Factor and Second M 2 Statistical analysis is performed on each factor separately, that is, statistical measures such as the mean or standard deviation are calculated. For example, in multiple first M factors... 2 The average of the factors and multiple second M 2 If the average value of the factors is within the allowable error range and the standard deviation is less than the second threshold, the target beam quality analyzer 10 is considered qualified; otherwise, it is considered unqualified. The first M can also be compared using graphical representations or regression models. 2 Factor and Second M 2 Factors, but this embodiment does not impose specific limitations on them.
[0056] The testing method of the testing device provided in the embodiments of this application not only saves time and effort, but also improves testing efficiency and flexibility, minimizes testing costs, and simplifies the testing process.
[0057] The testing method of the testing apparatus provided in this application can be executed by the control device of the testing apparatus. This application uses the example of the control device of the testing apparatus executing the testing method to illustrate the control device of the testing apparatus provided in this application.
[0058] This application also provides a control device for a testing apparatus.
[0059] like Figure 4 As shown, the control unit of the testing apparatus includes an acquisition module 750 and a judgment module 760. The acquisition module 750 is used to control the rotation of the laser 100 and obtain multiple first M values through the target beam quality analyzer 10. 2 Factors, obtained by a reference beam quality analyzer 300, are multiple second M factors. 2 Factor, first M 2 Factor and Second M 2 One-to-one correspondence between factors; the judgment module 760 is used to determine the first M. 2 Factor and Second M 2 Factors are used to determine whether the target beam quality analyzer 10 is qualified.
[0060] The control device of the testing apparatus provided in the embodiments of this application not only saves time and effort, but also improves testing efficiency and flexibility, minimizes testing costs, and simplifies the testing process.
[0061] The control device of the testing apparatus in this application embodiment can be an electronic device or a component of an electronic device, such as an integrated circuit or a chip. The electronic device can be a terminal or other devices besides a terminal. For example, the electronic device can be a mobile phone, tablet computer, laptop computer, handheld computer, in-vehicle electronic device, mobile internet device (MID), augmented reality (AR) / virtual reality (VR) device, robot, wearable device, ultra-mobile personal computer (UMPC), netbook or personal digital assistant (PDA), etc. It can also be a server, network attached storage (NAS), personal computer (PC), television (TV), ATM or self-service machine, etc. The embodiments of this application do not specifically limit it.
[0062] The control device of the testing apparatus in this application embodiment can be a device with an operating system. This operating system can be a Microsoft (Windows) operating system, an Android operating system, an iOS operating system, or other possible operating systems; this application embodiment does not specifically limit the specific operating system.
[0063] The control device of the testing apparatus provided in this application embodiment can realize... Figure 3 The various processes implemented in the method implementation examples will not be described again here to avoid repetition.
[0064] In some embodiments, such as Figure 5 As shown, this application embodiment also provides an electronic device 800, including a processor 801, a memory 802, and a computer program stored in the memory 802 and executable on the processor 801. When the program is executed by the processor 801, it implements the various processes of the test method embodiment of the above-mentioned test device and can achieve the same technical effect. To avoid repetition, it will not be described again here.
[0065] It should be noted that the electronic devices in the embodiments of this application include the aforementioned mobile electronic devices and non-mobile electronic devices.
[0066] This application also provides a non-transitory computer-readable storage medium storing a computer program. When the computer program is executed by a processor, it implements the various processes of the test method embodiment of the above-described test apparatus and achieves the same technical effect. To avoid repetition, it will not be described again here.
[0067] The processor is the processor in the electronic device described in the above embodiments. The readable storage medium includes computer-readable storage media, such as computer read-only memory (ROM), random access memory (RAM), magnetic disk, or optical disk.
[0068] This application also provides a computer program product, including a computer program that, when executed by a processor, implements the testing method of the above-described testing apparatus.
[0069] The processor is the processor in the electronic device described in the above embodiments. The readable storage medium includes computer-readable storage media, such as computer read-only memory (ROM), random access memory (RAM), magnetic disk, or optical disk.
[0070] This application also provides a chip, which includes a processor and a communication interface. The communication interface and the processor are coupled. The processor is used to run programs or instructions to implement the various processes of the test method embodiment of the above-described test device, and can achieve the same technical effect. To avoid repetition, it will not be described again here.
[0071] It should be understood that the chip mentioned in the embodiments of this application may also be referred to as a system-on-a-chip, system chip, chip system, or system-on-a-chip, etc.
[0072] The terms "first," "second," etc., used in the specification and claims of this application are used to distinguish similar objects and not to describe a specific order or sequence. It should be understood that such use of data can be interchanged where appropriate so that embodiments of this application can be implemented in orders other than those illustrated or described herein, and the objects distinguished by "first," "second," etc., are generally of the same class and the number of objects is not limited; for example, a first object can be one or more. Furthermore, in the specification and claims, "and / or" indicates at least one of the connected objects, and the character " / " generally indicates that the preceding and following objects are in an "or" relationship.
[0073] In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.
[0074] In the description of this application, "first feature" and "second feature" may include one or more of the features.
[0075] In the description of this application, "multiple" means two or more.
[0076] In the description of this application, the first feature being "above" or "below" the second feature may include the first and second features being in direct contact, or the first and second features being in contact through another feature between them.
[0077] In the description of this application, the terms "above," "over," and "on top" for the first feature and the second feature include the first feature being directly above or diagonally above the second feature, or simply indicate that the first feature is at a higher horizontal level than the second feature.
[0078] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of this application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.
[0079] Although embodiments of this application have been shown and described, those skilled in the art will understand that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of this application, the scope of which is defined by the claims and their equivalents.
Claims
1. A testing apparatus for testing a target beam quality analyzer (10), characterized in that, include: Installation platform; A laser (100) is rotatably mounted on the mounting platform; A beam splitter (200) is used to split the output light of the laser (100) into a first test beam and a second test beam, so that the target beam quality analyzer (10) receives the first test beam and forms a first test spot (20). A reference beam quality analyzer (300) is used to receive the second test beam and form a second test spot; wherein, The rotation axis of the laser (100) is parallel to the output light, and both the test spot and the reference spot are elliptical.
2. The testing apparatus according to claim 1, characterized in that, The laser (100) M 2 The factor is greater than 1.
2.
3. The testing apparatus according to claim 1, characterized in that, The optical axes of the first test beam and the second test beam are set at an angle.
4. The testing apparatus according to claim 3, characterized in that, The included angle is a right angle.
5. The testing apparatus according to claim 1, characterized in that, One of the optical axes of the first test beam and the second test beam coincides with the optical axis of the output light.
6. The testing apparatus according to any one of claims 1 to 5, characterized in that, Also includes: A first aperture stop (400) is disposed between the beam splitter (200) and the target beam quality analyzer (10) to limit the size of the first test beam.
7. The testing apparatus according to claim 6, characterized in that, There are two first aperture stops (400), and the two first aperture stops (400) are arranged at intervals along the optical axis of the first test beam.
8. The testing apparatus according to any one of claims 1 to 5, characterized in that, Also includes: A second aperture stop (500) is disposed between the beam splitter (200) and the reference beam quality analyzer (300) to limit the size of the second test beam.
9. The testing apparatus according to claim 8, characterized in that, There are two second aperture stops (500), and the two second aperture stops (500) are spaced apart along the optical axis of the second test beam.
10. The testing apparatus according to any one of claims 1 to 5, characterized in that, Also includes: A rotary drive (600) is provided with its fixed end on the mounting platform and its output end connected to the laser (100) for driving the laser (100) to rotate.
