Wafer inspection apparatus

Abstract

The utility model relates to wafer detection field especially, a kind of wafer detection equipment, include: the rotary table additionally provided on operation surface, and the positioning mechanism maintaining wafer on rotary table, simultaneously, the linear movement mechanism driving scanning code terminal, pattern acquisition unit pickup information on wafer is provided in rotary table upper portion multidimensional change;The utility model is to solve above-mentioned technical problem, include the assembly relationship between rotary table and operation surface, and pattern acquisition unit, scanning code terminal share same linear movement mechanism, under entire layout, multiple functional modules are integrated in single equipment, so as to can solve the problem of low space utilization, and provide higher production efficiency feasibility for producer.

Description

Technical Field

[0001] This utility model relates to the field of wafer inspection, and more particularly to a wafer inspection device. Background Technology

[0002] The quality of a wafer determines the reliability of its electrical performance after it becomes a chip.

[0003] There are many types of inspection items, such as inspecting the appearance of wafers to detect whether there are defects on the wafer surface.

[0004] The process of inspecting the appearance involves a series of actions such as dimensional measurement, wafer scanning, and wafer rotation. Each process corresponds to one piece of equipment. From the perspective of the entire appearance inspection process, at least three pieces of equipment are required to complete the appearance inspection. The basic element to improve efficiency is to increase the number of equipment. However, it is obviously impossible to increase the number of equipment within a fixed production space. Utility Model Content

[0005] To address the aforementioned issues, this invention provides a wafer inspection device that integrates various functional modules into a single device, resulting in a compact design that optimizes space utilization.

[0006] To achieve the above objectives, the technical solution adopted by this utility model is: a wafer inspection device, characterized in that it includes: a rotating stage additionally provided on the working surface, and a positioning mechanism for maintaining the wafer on the rotating stage; at the same time, a multi-dimensional linear movement mechanism is provided above the rotating stage to drive a barcode scanning terminal and a pattern acquisition unit to pick up information on the wafer.

[0007] The beneficial effects of this utility model are:

[0008] To solve the aforementioned technical problems, this utility model includes an assembly relationship between a rotary table and a working surface, and a pattern acquisition unit and a barcode scanning terminal sharing the same linear movement mechanism. In the overall layout, multiple functional modules are integrated into a single device, thereby solving the problem of low space utilization and providing producers with the feasibility of higher production efficiency.

[0009] Furthermore, the design of the positioning mechanism takes into account both manual placement and easy acquisition of the wafer by the scanning terminal and pattern acquisition unit. The positioning mechanism includes a pair of plates that fit the outer circumference of the wafer and a guide component that guides the plates to move closer to or away from the wafer. Under the action of the guide component, the area of ​​the plates surrounding the wafer can be changed. At this time, wafers of different sizes can be placed to assist in the positioning of the wafer.

[0010] Preferably, the guide assembly includes a slide, a slide base, an adjustment knob, and a rack. The slide base has a pre-drilled positioning groove for mounting the rack. The slide base also has a slot to avoid the rack after sliding assembly with the slide base. The end of the adjustment knob has annularly distributed teeth. After the end of the adjustment knob passes through the side of the slide base, it meshes with the teeth on the rack. The rack is fixed in the positioning groove. At this time, turning the adjustment knob will make the entire slide move, and the backing plate set on the slide base will naturally move closer to or further away from the wafer.

[0011] The pattern acquisition unit includes at least two types: a motorized zoom lens and an objective lens. The objective lens is either a high-power objective lens or a low-power objective lens. In some embodiments, it includes both a high-power objective lens and a low-power objective lens.

[0012] The aforementioned linear movement mechanism is existing technology, and its structure will not be described in detail here.

[0013] To address the issue of insufficient light, the working surface is made of glass, which is the surface of the machine. A light source is installed inside the machine, and the light shines from the bottom up onto the wafer, thus compensating for the lack of clear outlines.

[0014] Of course, the position of the light source also needs to be adjusted. The linear movement mechanism contains multiple linear movement components, some of which are located inside the machine tool. The light source is mounted on the movable end of the linear movement component inside the machine tool via a bracket. Attached Figure Description

[0015] Figure 1 This is a perspective view of the present invention.

[0016] Figure 2 yes Figure 1 Enlarged diagram of point A.

[0017] Figure 3 This is a schematic diagram of a wafer set on a rotating stage.

[0018] Figure 4 yes Figure 3 A stereoscopic view from another perspective.

[0019] Figure 5 This is a 3D diagram of the positioning mechanism.

[0020] Figure 6 This is a partial structural diagram of the machine's internal structure. Detailed Implementation

[0021] like Figure 1-6As shown, a wafer inspection device is characterized by comprising: a rotating stage 2 additionally provided on the working surface 100a, and a positioning mechanism 4 for maintaining a wafer 3 on the rotating stage 2. Meanwhile, a multi-dimensional linear movement mechanism 5 is provided above the rotating stage 2 to drive a barcode scanning terminal 6 and a pattern acquisition unit to move toward the wafer 3, and the barcode scanning terminal 6 and the pattern acquisition unit pick up information on the wafer 3.

[0022] The beneficial effects of this utility model are:

[0023] In order to solve the above-mentioned technical problems, this utility model includes the assembly relationship between the rotary table 2 and the working surface 100a, and the pattern acquisition unit and the barcode scanning terminal 6 sharing the same set of linear moving mechanism 5. In the whole layout, multiple functional modules are integrated in a single device, so as to solve the problem of low space utilization and provide producers with the feasibility of higher production efficiency.

[0024] Furthermore, the design of the positioning mechanism 4 takes into account both manual placement and ease of acquisition of the wafer 3 by the barcode scanning terminal 6 and the pattern acquisition unit. The positioning mechanism 4 includes a pair of plates 41 that are adapted to the outer peripheral surface of the wafer 3 and a guide component 42 that guides the plates 41 to move closer to or away from the wafer 3. Under the action of the guide component 42, the area of ​​the plates 41 surrounding the wafer 3 can be changed. At this time, wafers 3 of different sizes can be placed to assist in the positioning of the wafer 3.

[0025] Preferably, the guide assembly 42 includes a slide 42a, a slide base 42b, an adjustment knob 42c, and a rack 42d. The slide base 42b has a positioning groove for mounting the rack 42d. Meanwhile, the slide 42a also has a slot to avoid the rack 42d after sliding assembly with the slide base 42b. The end of the adjustment knob 42c has annularly distributed teeth. After the end of the adjustment knob 42c passes through the side of the slide 42a, it meshes with the teeth on the rack 42d. The rack 42d is fixed in the positioning groove. At this time, turning the adjustment knob 42c will make the entire slide 42a move, and the backing plate 41 set on the slide 42a will naturally move closer to or further away from the wafer 3.

[0026] The pattern acquisition unit includes at least two types: an electric zoom lens 71 and an objective lens 72. The objective lens 72 is either a high-power objective lens or a low-power objective lens. In some embodiments, it includes both a high-power objective lens and a low-power objective lens.

[0027] The linear movement mechanism 5 described above is existing technology, and its structure will not be described in detail here.

[0028] To address the issue of insufficient light, the working surface 100a is made of glass, which is the surface of the machine 100. A light source 6 is installed inside the machine 100, and the light source 6 emits light from the bottom to the top of the wafer 3, thereby compensating for the brightness and solving the problem of unclear outlines.

[0029] Of course, taking into account that the position of the light source 6 needs to be adjusted, the linear movement mechanism 5 includes multiple linear movement components, some of which are located inside the machine base 100. The light source 6 is mounted on the movable end of the linear movement component inside the machine base 100 via a bracket.

[0030] It should be noted that the backing plate 41 is preferably made of silicone.

[0031] The above embodiments are merely preferred embodiments of the present utility model and are not intended to limit the scope of the present utility model. Various modifications and improvements made to the technical solutions of the present utility model by those skilled in the art without departing from the spirit of the present utility model should fall within the protection scope defined by the claims of the present utility model.

Claims

1. A wafer inspection device, characterized in that, It includes: a rotating stage additionally provided on the working surface, and a positioning mechanism that holds the wafer on the rotating stage. At the same time, a multi-dimensional linear movement mechanism is provided above the rotating stage to drive the barcode scanning terminal and pattern acquisition unit to pick up information on the wafer.

2. The wafer inspection equipment according to claim 1, characterized in that, The positioning mechanism includes a pair of plates that fit the outer periphery of the wafer and a guide component that guides the plates toward or away from the wafer.

3. The wafer inspection equipment according to claim 2, characterized in that, The guide assembly includes a slide table, a slide base, an adjustment knob, and a rack. The slide base has a pre-drilled positioning groove for mounting the rack. The slide table also has a slot to avoid the rack after sliding assembly with the slide base. The end of the adjustment knob has annularly distributed teeth. After the end of the adjustment knob passes through the side of the slide table, it meshes with the teeth on the rack, and the rack is fixed in the positioning groove.

4. A wafer inspection device according to any one of claims 1-3, characterized in that, The pattern acquisition unit contains at least two types: a motorized zoom lens and an objective lens, wherein the objective lens is either a high-power objective lens or a low-power objective lens.

5. A wafer inspection device according to any one of claims 1-3, characterized in that, It also includes an organic table, the working surface of which is made of glass. A light source is installed inside the table, and the light source emits light from the bottom to the top of the wafer.

6. A wafer inspection device according to claim 5, characterized in that, The linear motion mechanism includes multiple linear motion components, some of which are located inside the machine tool. The light source is mounted on the movable end of the linear motion component inside the machine tool via a bracket.

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