An on-line monitoring device for etching solution components

Abstract

The utility model relates to an online monitoring device of etching liquid component, specifically relates to etching technical field, the online monitoring device includes: pH value measurement end, potential titration end and UV measurement end that connect gradually through sample pipeline, pH value measurement end is equipped with sample liquid inlet and sample liquid backflow port, pH value measurement end, potential titration end and UV measurement end are connected with etching liquid blending end through control center. The online monitoring device provided by the utility model can realize the online monitoring of etching liquid component, and the component of etching liquid can be controlled in real time, so that the stable etching process is ensured.

Description

Technical Field

[0001] This utility model relates to the field of etching technology, specifically to an online monitoring device for etching solution components. Background Technology

[0002] Etching is a technique that uses chemical reactions or physical impacts to remove materials. Etching techniques can be divided into two categories: wet etching and dry etching.

[0003] The choice of different etchants in wet etching has a significant impact on the etching rate, the surface properties of the etched material (mainly surface roughness), crystal orientation, and preferred dissolution. Depending on the desired outcome, etchants include inorganic acid systems, organic acid systems, inorganic-organic mixed acid systems, and other systems. Furthermore, to ensure excellent etching results, the proportions of different components in the etchant are adjusted during the specific process.

[0004] After multiple cycles, the reaction rate drops sharply due to the loss of key components, failing to meet product specifications. After a certain number of cycles, the waste liquid must be discharged as waste. This directly leads to increased raw material consumption and higher waste liquid treatment costs in the etching process, severely reducing the profit of the production line.

[0005] Currently, existing technologies extend the etching life by adding key components. However, this addition is mostly done on a timed and quantitative basis, rather than in real-time control. Therefore, online detection of the content of important components in the etching solution, and periodic replenishment of key components through intelligent optimization calculations to achieve regeneration and recycling, can greatly improve the utilization rate of the etching solution. Utility Model Content

[0006] In view of the problems existing in the prior art, the purpose of this utility model is to provide an online monitoring device for etching solution components, so as to realize real-time monitoring of the etching solution composition, thereby realizing dynamic adjustment of the etching solution composition and ensuring the final etching effect.

[0007] To achieve this objective, the present invention adopts the following technical solution:

[0008] This invention provides an online monitoring device for etching solution components, the online monitoring device comprising:

[0009] The sample tubing is connected in sequence to the pH measurement end, the potentiometric titration end, and the UV measurement end.

[0010] The pH measurement terminal is equipped with a sample liquid inlet and a sample liquid reflux outlet;

[0011] The pH measurement terminal, potentiometric titration terminal, and UV measurement terminal are connected to the etching solution mixing terminal via a control center.

[0012] The online monitoring device provided by this invention can realize online monitoring of the components of the etching solution, and ensure the stable progress of the etching process by real-time adjustment of the components of the etching solution.

[0013] As a preferred embodiment of this invention, the potentiometric titration end is provided with at least two titration reagent ends.

[0014] As a preferred embodiment of this invention, the potentiometric titration end is equipped with a cleaning end.

[0015] As a preferred technical solution of this utility model, the potentiometric titration end is equipped with a waste liquid discharge port.

[0016] As a preferred technical solution of this utility model, the UV measuring end is equipped with a waste liquid discharge port.

[0017] As a preferred technical solution of this utility model, the etching solution preparation end includes: an etching solution replenishment unit.

[0018] As a preferred technical solution of this utility model, the online monitoring device further includes an alarm device.

[0019] As a preferred technical solution of this utility model, the alarm device includes: a dosage alarm device, a leakage alarm device, and a temperature alarm device.

[0020] As a preferred technical solution of this utility model, the dosage alarm device includes: a liquid level detection device and an audible and visual alarm device for detecting liquid level;

[0021] The leakage alarm device includes: a leakage detection device and an audible and visual alarm device for detecting leakage;

[0022] The temperature alarm device includes: a temperature detection device for detecting temperature and an audible and visual alarm device.

[0023] As a preferred technical solution of this utility model, the control center is equipped with an alarm display terminal.

[0024] Compared with existing technical solutions, this utility model has the following beneficial effects:

[0025] The online monitoring device provided by this utility model utilizes a combination of several devices such as a UV-Vis spectrophotometer, pH meter, and automatic potentiometric titrator. It is connected to the WET machine, main equipment, or DCS control system via a communication signal line to realize real-time monitoring of the concentration of each component in the copper acid etching solution. This facilitates the addition of replenishment packs, monitoring of solution life, and data recording and statistics, thereby reducing labor costs. Attached Figure Description

[0026] Figure 1This is a schematic diagram of an online monitoring device for etching solution components provided in an embodiment of the present invention.

[0027] In the diagram: 100 - pH measurement end, 110 - sample solution inlet, 120 - sample solution reflux outlet, 200 - potentiometric titration end, 210 - titration reagent end, 220 - cleaning end, 300 - UV measurement end, 400 - waste liquid discharge outlet.

[0028] The present invention will now be described in further detail. However, the examples described below are merely simplified examples of the present invention and do not represent or limit the scope of protection of the present invention. The scope of protection of the present invention shall be determined by the claims. Detailed Implementation

[0029] To better illustrate this utility model and facilitate understanding of its technical solution, typical but non-limiting embodiments of this utility model are as follows:

[0030] Currently, the etching solution is typically replenished using a timed and quantitative replenishment method to extend its lifespan. However, this method suffers from instability in the etching solution, leading to an unstable etching process. Therefore, this invention designs an online monitoring device for etching solution components. By monitoring the chemical properties and composition of the etching solution in real time, the device can dynamically adjust the components to ensure a stable etching process. The details are as follows:

[0031] This embodiment provides an online monitoring device for etching solution components, such as... Figure 1 As shown, the online monitoring device includes:

[0032] The sample tubing is connected in sequence to the pH measurement end 100, the potentiometric titration end 200, and the UV measurement end 300.

[0033] The pH measurement terminal 100 is equipped with a sample liquid inlet 110 and a sample liquid reflux outlet 120;

[0034] The pH measurement terminal 100, the potentiometric titration terminal 200, and the UV measurement terminal 300 are connected to the etching solution mixing terminal via a control center.

[0035] In this invention, etching solution refers to a liquid used for etching in PCB manufacturing, precision machining, etc., such as acidic etching solution, alkaline etching solution, semiconductor etching solution, etc.

[0036] For example, the acidic etching solution can be selected from copper chloride system, ferric chloride system, sulfuric acid-hydrogen peroxide system; the alkaline etching solution is a copper ammonia complex system, or a sodium hydroxide system for aluminum etching; the semiconductor etching solution uses a hydrofluoric acid system or an HF / NH4F etching system.

[0037] In this invention, the pH measuring end 100 can be selected to be an online pH meter with an automatic calibration function, used to monitor the pH of the drug solution during the production process and determine the service life of the drug solution.

[0038] In this invention, the potentiometric titration end 200 can be selected to use an automatic potentiometric titrator. Different titrants and electrodes can be used to set up test methods to achieve the determination of components. In the specific titration process, the titrant can be added according to actual control, such as adding a fixed volume or adding a fixed mass.

[0039] In this invention, the UV measurement end 300 can be selected to use a UV-Vis spectrophotometer, which performs quantitative analysis by utilizing the absorption spectrum generated by the electronic energy level transitions of molecules at specific wavelengths. With a wavelength selection of 190-1100 nm, it can determine the concentration of some components in the copper acid etching solution. Examples include: using UV spectrophotometry for acetate and nitrate ions; turbidimetry for sulfate ions; molybdenum blue method for fluorosilicate ions; and xylenol orange-zirconium colorimetry for fluoride ions.

[0040] In this invention, the solution volume can be controlled by an injection pump, a metering valve, or a metering pump during testing at the potentiometric titration end 200 and the UV measurement end 300.

[0041] In this invention, the monitoring device can also be configured with other monitoring equipment according to the requirements of the etching process, such as temperature monitoring end, pressure monitoring end, surface tension monitoring end, etc.

[0042] The potentiometric titration end 200 is provided with at least two titration reagent ends 210.

[0043] In this invention, the titration reagent end 210 is used to provide the titration reagent required by the potentiometric titration end 200, such as acid titration standard solution, alkali titration standard solution, indicator, solvent, oxidizing titrant, reducing titrant, complexing agent, buffer, etc.

[0044] The potentiometric titration end 200 is equipped with a cleaning end 220.

[0045] In this invention, the cleaning end 220 is used to clean the potentiometric titration end 200 to ensure that the residual liquid from the previous test can be avoided from affecting the test results each time.

[0046] Furthermore, the UV measurement end 300 can also be optionally equipped with a cleaning end 220 for cleaning the container of the measurement sample solution.

[0047] Furthermore, the pH measurement end 100, the potentiometric titration end 200, and the UV measurement end 300 are rinsed with sample solution before testing and drained and cleaned after testing to ensure the suitability of the pipeline or measuring vessel.

[0048] The potentiometric titration end 200 is equipped with a waste liquid discharge port 400.

[0049] The UV measuring end 300 is equipped with a waste liquid discharge port 400.

[0050] In this invention, the waste liquid discharge port 400 can be optionally connected to a waste liquid treatment system for treating the waste liquid, such as recovering useful elements therein, and simultaneously recovering water for reuse as recycled water.

[0051] The etching solution preparation end includes an etching solution replenishment unit.

[0052] In this invention, the etching solution replenishment unit is used to replenish and adjust the etching solution. For example, it includes a pH adjustment terminal, which adjusts the pH value of the etching solution by using acid or alkali solutions. Specifically, the adjustment is achieved by using a metering pump or a pump and metering valve configuration to introduce acid or alkali into the etching solution according to the control unit's regulation to adjust the pH value. At the same time, the pH measurement terminal 100 monitors the pH value of the etching solution and sends the pH value result to the control unit for analysis and confirmation via a communication line.

[0053] For example, it includes an etching solution component inlet, which is used to supply the required etching solution components to the etching solution through a metering pump or a pump and metering valve configuration, according to the control unit's regulation, while monitoring the relevant indicators of the etching solution through a potential titration end 200 and a UV measurement end 300.

[0054] For example, the etching solution components include: copper ion source, iron ion source, acid, alkali, ammonium salt, oxidant such as hydrogen peroxide, fluoride, corrosion inhibitor, etc.

[0055] The online monitoring device also includes an alarm device.

[0056] The alarm devices include: a dosage alarm device, a leakage alarm device, and a temperature alarm device.

[0057] The dosage alarm device includes a liquid level detection device and an audible and visual alarm device for detecting liquid level.

[0058] In this invention, the dosage alarm device is used to monitor the liquid levels in the pH measurement end 100, potentiometric titration end 200, UV measurement end 300, and etching solution replenishment unit of the monitoring device by means of a liquid level detection device, and to issue an alarm when the amount of reagent is insufficient to support the detection.

[0059] The leakage alarm device includes a leakage detection device and an audible and visual alarm device for detecting leakage.

[0060] In this invention, a leakage alarm device is used to monitor whether leakage occurs in the pH measurement terminal 100, the potentiometric titration terminal 200, and the UV measurement terminal 300. Leakage detection can be achieved by monitoring the liquid volume before and after input, or by using visual analysis equipment such as a dynamic camera to monitor whether leakage occurs in the pH measurement terminal 100, the potentiometric titration terminal 200, and the UV measurement terminal 300. When leakage occurs, the alarm device sounds an alarm, and the control unit corrects the detection results based on the leakage volume to ensure the final control effect. It also reminds users to maintain the pH measurement terminal 100, the potentiometric titration terminal 200, and the UV measurement terminal 300.

[0061] The temperature alarm device includes a temperature detection device and an audible and visual alarm device for detecting temperature.

[0062] In this invention, the temperature monitoring device is used to monitor the temperature of the pH measuring end 100, the potentiometric titration end 200, and the UV measuring end 300. When the temperature exceeds the limit temperature, an alarm is triggered, and the pH measuring end 100, the potentiometric titration end 200, and the UV measuring end 300 are reminded that maintenance and repair are required.

[0063] The control center is equipped with an alarm display terminal.

[0064] In this invention, the alarm display terminal is used in conjunction with the alarm equipment to remind operators of warning information such as equipment malfunction, need for maintenance, or excessive liquid concentration.

[0065] The operation process of the online monitoring device provided by this utility model is exemplarily as follows:

[0066] The etching solution in the etching solution tank is fed into the pH measurement terminal 100 through the sample solution inlet 110 for pH measurement. Then, part of the sample solution is fed into the potentiometric titration terminal 200 and the UV measurement terminal 300 through the pipeline for related component measurement. The remaining sample solution is returned to the etching tank through the sample solution return port 120. The residual liquid after the potentiometric titration terminal 200 and the UV measurement terminal 300 are measured is discharged through the waste liquid discharge port 400. If insufficient sample solution, leakage, or excessive temperature occurs during the process, the alarm device will sound an alarm. At the same time, after each test, the potentiometric titration terminal 200 is cleaned by the washing solution such as water through the cleaning terminal 220 before the next test.

[0067] In summary, the online monitoring device provided by this utility model can realize online monitoring of the components of the etching solution, and ensure the stable progress of the etching process by real-time adjustment of the components of the etching solution.

[0068] The preferred embodiments of the present invention have been described in detail above. However, the present invention is not limited to the specific details of the above embodiments. Within the scope of the technical concept of the present invention, various simple modifications can be made to the technical solution of the present invention, and these simple modifications all fall within the protection scope of the present invention.

[0069] It should also be noted that the various specific technical features described in the above specific embodiments can be combined in any suitable way without contradiction. In order to avoid unnecessary repetition, this utility model will not describe the various possible combinations separately.

[0070] Furthermore, various different embodiments of this utility model can be combined in any way, as long as they do not violate the spirit of this utility model, they should also be regarded as the content disclosed by this utility model.

Claims

1. An online monitoring device for etching solution components, characterized in that, The online monitoring device includes: The sample tubing is connected in sequence to the pH measurement end, the potentiometric titration end, and the UV measurement end. The pH measurement terminal is equipped with a sample liquid inlet and a sample liquid reflux outlet; The pH measurement terminal, potentiometric titration terminal, and UV measurement terminal are connected to the etching solution mixing terminal via a control center.

2. The online monitoring device as described in claim 1, characterized in that, The potentiometric titration end is equipped with at least two titration reagent ends.

3. The online monitoring device as described in claim 1, characterized in that, The potentiometric titration end is equipped with a cleaning end.

4. The online monitoring device as described in claim 1, characterized in that, The potentiometric titration end is equipped with a waste liquid discharge port.

5. The online monitoring device as described in claim 1, characterized in that, The UV measurement terminal is equipped with a waste liquid discharge port.

6. The online monitoring device as described in claim 1, characterized in that, The etching solution preparation end includes an etching solution replenishment unit.

7. The online monitoring device as described in claim 1, characterized in that, The online monitoring device also includes an alarm device.

8. The online monitoring device as described in claim 7, characterized in that, The alarm devices include: a dosage alarm device, a leakage alarm device, and a temperature alarm device.

9. The online monitoring device as described in claim 8, characterized in that, The dosage alarm device includes: a liquid level detection device and an audible and visual alarm device for detecting liquid level; The leakage alarm device includes: a leakage detection device and an audible and visual alarm device for detecting leakage; The temperature alarm device includes: a temperature detection device for detecting temperature and an audible and visual alarm device.

10. The online monitoring device as described in claim 1, characterized in that, The control center is equipped with an alarm display terminal.

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